JP2003066589A - Photomask for color filter and method for producing color filter, using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photomask for a color filter capable of forming colored pixels whose four corners are right-angled and a black matrix whose four corners are right-angled even if a close exposure is carried out when colored pixels and a black matrix are formed on a substrate and to provide a method for producing a color filter having colored pixels whose four corners are right- angled and a black matrix whose four corners are right-angled. SOLUTION: Nearly triangular light transmissive parts 5 are extendedly disposed on the four corners of each rectangular light transmissive part 1 or nearly triangular light shielding parts 35 are extendedly disposed on the four corners of each rectangular light shielding part 32. Rectangular colored pixels 3 and a resin black matrix 33 are formed using the resulting photomask for a color filter.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter for a liquid crystal display device, and more particularly to a photomask capable of forming four corners of a rectangular colored pixel and four corners of a resin black matrix at right angles, and a photomask having the same. The present invention relates to a method for manufacturing a used color filter.

[0002]

2. Description of the Related Art FIG. 7 is a plan view schematically showing the concept of a color filter used in a liquid crystal display device or the like.
8 is a cross-sectional view of the color filter shown in FIG. 7 taken along the line XX '. As shown in FIGS. 7 and 8,
A color filter used in a liquid crystal display device or the like is one in which a black matrix (72) and colored pixels (71) are formed on a substrate (70).

The black matrix (72) is in the form of a matrix having a light-shielding property, and is composed of colored pixels (7).
1) has a red, green, and blue filter function, for example. The black matrix makes the size of the colored pixel of the color filter a fixed position and makes the size uniform, and when it is used in a display device, it blocks undesired light so that the image of the display device is uniform. It has a function of forming a uniform image with improved contrast. It also has a function of blocking light to the TFT element that drives the liquid crystal.

Most of the liquid crystal display devices that have been put into practical use are transmissive liquid crystal display devices. This transmissive liquid crystal display device is provided with illumination behind the liquid crystal panel, and the liquid crystal display device is viewed by illumination light from the rear. Many of the transmissive liquid crystal display devices use a color filter including the black matrix having the above structure.

The black matrix (72) is a thin film formed by forming a thin film on the substrate (70) using a metal such as chromium (Cr) or chromium oxide (CrOX) or a metal compound. On top, form an etching resist pattern using a positive photoresist,
Next, the exposed portion of the formed metal thin film is etched and the etching resist pattern is peeled off to form a black matrix. Chrome (Cr)
A black matrix formed by using a metal such as is called a chromium black matrix and is widely used.

There is also a black matrix formed by using a resin as the black matrix. This is formed by a photolithography method using, for example, a light-shielding photoresist (photosensitive coloring resin composition) as a material for forming the black matrix. A black matrix formed by using a resin instead of a metal such as chromium (Cr) is called a resin black matrix.

The resin black matrix suppresses internal reflection in a liquid crystal display device which occurs when a metal such as chrome is used as a black matrix when a high-luminance backlight is used, such as a television. For this reason, when a resin black matrix with low reflection is desired, or, for example, IPS (In PlaneS)
In order to suppress the disturbance of the electric field in the liquid crystal display device when used in the (wiching) method, it is adopted when a highly insulating resin black matrix is desired.

On the other hand, the reflective liquid crystal display device has been actively developed as a display device for mobile equipment. In this reflective liquid crystal display device, no illumination is provided behind the liquid crystal panel, and the liquid crystal display device is viewed by the light from the viewing side periphery in the environment where the liquid crystal display device is viewed. In the reflective liquid crystal display device, as in the transmissive liquid crystal display device, there is a device using a color filter including the black matrix having the above structure. Since the contrast is significantly inferior to the transmissive liquid crystal display device,
A color filter that does not have a black matrix is used because of the balance between the effect of improving the contrast of an image when a black matrix is provided and economical efficiency (cost).
There is a direction to spread it.

As described above, the photolithography method is widely used for forming the chrome black matrix and for forming the resin black matrix in both cases.

As a method of forming a colored pixel on a substrate, a pigment dispersion method is the mainstream. The pigment dispersion method is a method of forming a colored pixel by a photolithography method using a photosensitive colored resin composition. The photosensitive colored resin composition used for forming colored pixels is, for example, a pigment dispersed in a polymer resin using a dispersant, and a polymerizable monomer, a photopolymerization initiator, a sensitizer, a solvent and the like are added to the dispersion. It is prepared by adding.

A first-color, for example, red photosensitive coloring resin composition is applied on a substrate on which a black matrix is formed in advance, and exposure, development and post-baking are performed through a first-color photomask. By doing so, a red colored pixel of the first color is formed. In the same manner, as the second color, a green photosensitive coloring resin composition and a second color photomask are used to form the second color green colored pixels. Similarly, there is a method of forming a blue colored pixel of the third color. This pigment dispersion method has a major feature that high-quality colored pixels can be stably manufactured at low cost.

When a color filter used in a liquid crystal display device is manufactured by, for example, mounting a large-sized substrate on a large-sized substrate by a pigment dispersion method, a large-sized substrate of which the entire large surface is drawn. A method of exposing the entire multi-sided surface to the photoresist coated on a large-sized substrate by one exposure using the photomask of (1) is adopted. This exposure method is a method called a collective exposure method. This is because a photoresist applied on a wafer substrate in IC manufacturing is exposed to a large number of times by changing the position on the wafer substrate by using, for example, a photomask on which one IC is drawn. This is the name for the method of exposing the IC in a state where it is mounted, that is, the step-and-repeat exposure method. Conventionally, a batch exposure method has been widely adopted as an exposure method for manufacturing a color filter used in a liquid crystal display device in terms of cost.

In this one-shot exposure method, in the exposure apparatus, in order to prevent scratches caused by the photomask being in close contact with the substrate, and when dust is attached to the photomask, pixels become defective. The substrate coated with a photoresist (photosensitive coloring resin composition) for preventing the photomask and the photomask having a substantially substrate size are, for example, 50 μm.
Proximity exposure is performed while maintaining a gap of about 80 μm.

FIG. 10A is an enlarged plan view showing an example of a pattern drawn on a photomask having a large substrate. Further, FIG. 10B is an enlarged plan view showing a colored pixel formed using the photomask shown in FIG. As shown in FIG. 10A, this photomask is composed of a light transmitting portion (101) and a light shielding portion (102), and the light transmitting portion (101) has a length (h) of about 300 μm and a width (i) of about 100 μm. It is a rectangular shape with a desired colored pixel shape. The four corners (j) of the rectangular light transmitting portion (101) are at right angles. Further, this photomask is for a negative type photoresist in which the light transmitted through the light transmitting portion (101) cures the photoresist film provided on the substrate.

When the negative type photoresist (negative type photosensitive coloring resin composition) film provided on the substrate is exposed through such a photomask and development processing is performed, FIG.
As shown in (b), colored pixels (103) with rounded corners (j ') are obtained on the substrate (104). Thus, the four corners (j) of the light transmitting portion (101) of the photomask are
The reason why the four corners (j ′) of the obtained colored pixel (103) are rounded even when the angle is a right angle is mainly due to the effect of light diffraction in proximity exposure.

FIG. 9 shows the positional relationship between a photomask in an exposure apparatus and a substrate provided with a negative photoresist (negative photosensitive coloring resin composition) film when proximity exposure is performed. It is explanatory drawing shown in a cross section. FIG. 9 is an enlarged view of the boundary portion between the light transmitting portion (101) and the light shielding portion (102) of the pattern drawn on the photomask. As shown in FIG. 9, the chromium film (94) is formed on the mask substrate (93) above the substrate (90) provided with the negative photoresist (negative photosensitive coloring resin composition) film (91). The provided photomask (95) is arranged with the proximity gap (d1) maintained.

The light transmitting portion (10) of the photomask (95)
The light (96) applied to 1) is applied to the mask substrate (93),
The negative photoresist (negative photosensitive coloring resin composition) film (91) is passed through the proximity gap (d1),
Scattered in the negative photoresist (negative photosensitive colored resin composition) film (91) having a thickness d2. In addition, the light transmitting portion (101) and the light shielding portion (1) of the photomask (95)
The light (97) irradiated to the boundary of (02) passes through the mask substrate (93), is diffracted at the edge of the chromium film (94), passes through the proximity gap (d1), and is a negative photoresist diagonally below in the figure. (Negative photosensitive colored resin composition) Film (9
1) and scattered in the negative photoresist (negative photosensitive coloring resin composition) film (91) having a thickness d2. That is, the light transmitting portion (1) of the photomask (95)
01) and the light shielding part (102) from the boundary between the light shielding part (102)
The light reaches the width indicated by (w) on the side.

As a result, the negative photoresist (in the central portion of the light transmitting portion (101) shown by (B) on the light transmitting portion (101) side of the boundary between the light transmitting portion (101) and the light shielding portion (102) ( The negative photosensitive coloring resin composition) film (91) is irradiated with a normal exposure amount, and is near the boundary on the light transmitting portion (101) side of the boundary between the light transmitting portion (101) and the light shielding portion (102). , (A), the exposure amount of the negative photoresist (negative photosensitive colored resin composition) film (91) is less than normal.

Particularly, the light transmitting portion (10) shown in FIG.
The amount of exposure is small in the vicinity of the boundaries of the four corners (j) of 1) on the side of the light transmitting portion (101). Therefore, the negative photoresist (negative photosensitive colored resin composition) film (91) in the portion shown in (A) is insufficiently photo-cured and is easily dissolved by the developing treatment, and therefore, as shown in FIG. ), The four corners (j ') of the colored pixel (103) are rounded.

Further, since the developing process is a wet process, the negative photoresist (negative photosensitive colored resin composition) film (91) is swollen, the adhesion to the substrate is deteriorated, and the colored pixel ( The four corners (j ') of 103) are encouraged to be rounded.

As described above, when the four corners of the rectangular shape of the colored pixel are formed in a rounded shape instead of the right angle of the desired shape, the black matrix is provided in the color filter as described above. At this time, the black matrix is uniform in size with the position of the colored pixel being a fixed position, but this is not preferable because it causes troubles when forming finer colored pixels.
Further, as described above, particularly in the reflective liquid crystal display device, when the color filter is not provided with the black matrix, the shape of the colored pixel becomes inaccurate, which is not preferable.

The above is an example of forming a colored pixel by using a negative photoresist and a negative photoresist photomask, but a positive photoresist and a positive photoresist photomask are used. Similarly, when the colored pixel is formed by using the colored pixel, the four corners of the colored pixel are rounded. That is, when the positive photoresist (positive photosensitive color resin composition) film at the center of the light transmitting portion on the light transmitting portion side of the boundary between the light shielding portion and the light transmitting portion is irradiated with a normal exposure amount, The positive photoresist (positive photosensitive colored resin composition) film in the vicinity of the boundary on the light-shielding portion side of the boundary between the light-transmitting portion and the light-transmitting portion is also irradiated with light by diffraction. This is because the photo-decomposition of the film of the photosensitive colored resin composition) proceeds to some extent and the four corners are easily dissolved by the development processing.

Further, the above is an example of the case where the negative type photoresist and the photomask for the negative type photoresist are used to form the colored pixels, but when forming the black matrix, the black matrix grid is similarly formed. The four corners are rounded. The same applies to the case of a black matrix using a positive photoresist and a photomask for positive photoresist. That is, although the four corners of the lattice of the black matrix should originally have a right angle without roundness, the roundness is not preferable because it slightly reduces the aperture ratio of the pixel.

[0024]

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and is intended for forming colored pixels of a color filter and a black matrix on a substrate by a photolithography method. Even if proximity exposure is performed on a substrate through a photomask by the batch exposure method, a rectangular colored pixel with a non-rounded rectangular shape at the four corners and a black matrix with a rectangular-shaped shape without rounding at the four corners can be formed. An object is to provide a photomask for a filter. Another object is to provide a method for manufacturing a color filter using the color filter photomask.

[0025]

According to the present invention, in a photomask for a color filter used when forming a rectangular colored pixel using a negative photoresist, a substantially triangular shape is formed at four corners of a rectangular light transmitting portion. It is a photomask for a color filter, which is characterized in that a light transmitting portion is extended.

The present invention is also the photomask for a color filter according to the above-mentioned invention, wherein the negative photoresist is a negative photosensitive colored resin composition.

Further, according to the present invention, in a photomask for a color filter used when forming a rectangular colored pixel using a positive photoresist, a substantially triangular light-shielding portion is extended to four corners of the rectangular light-shielding portion. It is a photomask for a color filter, which is characterized by being provided.

The present invention is also the photomask for a color filter according to the above-mentioned invention, wherein the positive photoresist is a positive photosensitive colored resin composition.

Further, according to the present invention, in a photomask for a color filter used when forming a resin black matrix using a negative photoresist, a substantially triangular light-shielding portion is extended at four corners of a rectangular light-shielding portion. A photomask for a color filter, which is provided.

The present invention is also the color filter photomask according to the above-mentioned invention, wherein the negative photoresist is a negative photosensitive colored resin composition.

Further, according to the present invention, in a photomask for a color filter used when forming a resin black matrix by using a positive type photoresist, a substantially triangular light transmitting portion is extended at four corners of a rectangular light transmitting portion. A photomask for a color filter, which is provided by

The present invention is also the photomask for a color filter according to the above-mentioned invention, wherein the positive photoresist is a positive photosensitive colored resin composition.

The present invention also provides a method of manufacturing a color filter, wherein rectangular colored pixels are formed using the photomask for a color filter according to any one of claims 1 to 4. is there.

Further, according to the present invention, a resin black matrix is formed by using the photomask for a color filter according to any one of claims 5 to 8, and the resin black matrix is formed according to any one of claims 1 to 4. The method for producing a color filter is characterized in that rectangular colored pixels are formed using the color filter photomask described in the item.

[0035]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described below based on an embodiment. FIG. 1A is an enlarged plan view showing a part of a pattern of an embodiment of a color filter photomask according to the present invention. This color filter photomask is for forming colored pixels, and is one using a negative photosensitive colored resin composition as a photoresist for forming colored pixels. That is, it is a photomask for a color filter according to claim 2. Further, FIG. 1B is an enlarged plan view showing a colored pixel formed using the color filter photomask shown in FIG.

As shown in FIG. 1A, this color filter photomask is composed of a light transmitting portion (1) and a light shielding portion (2), and the light transmitting portion (1) is approximately 300 μm in length (a), The width (b) is a rectangle of about 100 μm, and has a size of a desired colored pixel. Light-transmitting portions (5) having a substantially triangular shape are provided at four corners of the rectangular light-transmitting portion (1) so as to extend. Through such a color filter photomask, proximity exposure is performed on the film of the negative photosensitive colored resin composition provided on the substrate, and development processing is performed. The negative photosensitive colored resin composition film in the vicinity of the boundary on the side of the light transmitting portion and in the portion shown in (A) above is irradiated with a normal exposure amount, and as shown in FIG. ), Colored pixels (3) which are not rounded and have a right angle are obtained on the substrate (4).

FIG. 5 is an explanatory view showing the extending directions of the substantially triangular light transmitting portions (5) extending to the four corners of the rectangular light transmitting portion (1). As shown in FIG. 5, the extending direction of the substantially triangular light transmitting portion (5) of the color filter photomask according to the present invention is defined by xy coordinates with the center of the light transmitting portion (1) as the origin (O). At the corner of the light transmitting portion (1) in the first quadrant (I), the light is in the direction of a line rotated by 45 degrees to the left with reference to the upper side of the light transmitting portion (1). The substantially triangular light transmitting portion (5I) is extended so that the apex of the transmitting portion (5I) is located.

Further, in the corner of the light transmitting portion (1) in the second quadrant (II), there is a line direction of an angle of 45 ° clockwise rotation with respect to the lower side of the light transmitting portion (1), and on this line The substantially triangular light transmitting portion (5II) is extended so that the apex of the substantially triangular light transmitting portion (5II) comes. Similarly, the substantially triangular light transmitting portion (5III) is in the linear direction of the angle left rotation 45 degrees with the lower side as the reference, and the substantially triangular light transmitting portion (5IV) has the angle right rotation 45 with the upper side as the reference. It is on the line of degrees. By extending the substantially triangular light-transmitting portions that extend to the four corners in each of these directions, the effect of light diffraction can be effectively compensated.

Further, FIGS. 6A, 6B, and 6C are explanatory views showing examples of the shape of the substantially triangular light transmitting portions extending to the four corners of the rectangular light transmitting portion (1). . The substantially triangular shape is a substantially isosceles triangle as shown in (a) to (c). Further, the sharpness of the isosceles triangle is a as shown in FIG.
This is represented by the ratio of b, and for example, in FIG. 6A, the ratio of a: b in the example shown in Table 1 is obtained. The substantially triangular shape and area are appropriately selected depending on conditions such as photoresist, exposure, and development.
a is about 3 to 10 μm, and b is about 1 to 5 μm.

[0040]

[Table 1]

A color filter photomask according to a first aspect of the present invention is, for example, a color filter photomask used when a non-photosensitive colored resin composition is used for forming colored pixels. In forming the colored pixels at this time, first, a film of the non-photosensitive colored resin composition is formed on the substrate, and an etching resist pattern is formed on the film by using a negative photoresist. When forming this etching resist pattern, the photomask for a color filter according to claim 1 is used. Next, the exposed portion of the non-photosensitive colored resin composition is etched, and the etching / resist pattern is peeled off to form a colored pixel.

The area of the substantially triangular extended portion of the color filter photomask according to claim 2 is generally larger than the area of the substantially triangular extended portion of the color filter photomask according to claim 1. It will be a little big. This is because, in claim 2, since the negative photoresist is a negative photosensitive colored resin composition, the light dispersion in the film is increased by the pigment constituting the negative photosensitive colored resin composition. .

FIG. 2A is an enlarged plan view showing a part of the pattern of an example of the color filter photomask according to the fourth aspect. This color filter photomask is for forming colored pixels, and is one using a positive photosensitive colored resin composition as a photoresist for forming colored pixels. Also, FIG.
FIG. 2B is an enlarged plan view showing a colored pixel formed using the color filter photomask shown in FIG.

As shown in FIG. 2A, this color filter photomask has a light transmitting portion (21) and a light shielding portion (2).
2), and the light-shielding part (22) is about 300μ in length (a).
It is a rectangle of m and width (b) of about 100 μm, and has a desired size of a colored pixel. Approximately triangular light shields (25) are extended and provided at the four corners of the rectangular light shield (22).
When the film of the positive photosensitive colored resin composition provided on the substrate is exposed through such a photomask for a color filter and subjected to development processing, the light-shielding portion is closer to the light-shielding portion than the boundary between the light-shielding portion and the light-transmitting portion. The positive photosensitive colored resin composition film in the vicinity of the boundary is not irradiated with light due to diffraction, and as shown in FIG. 2 (b), the four corners (c) are not rounded but colored pixels (23 ) Is obtained on the substrate (24).

The extending direction of the substantially triangular light-shielding portion (25) extending to the four corners of the rectangular light-shielding portion (22) is the same as in the case of the negative photosensitive colored resin composition. Further, the shape and area of the substantially triangular shape are appropriately selected depending on conditions such as photoresist, exposure, and development. Also,
The color filter photomask according to claim 3 is used, for example, in the case of using a non-photosensitive coloring resin composition for forming colored pixels, as in the case of the negative photosensitive coloring resin composition. Photo mask for.

FIG. 3A is an enlarged plan view showing a part of the pattern of an example of the color filter photomask according to the sixth aspect. This color filter photomask is for forming a resin black matrix, and is for using a negative photosensitive colored resin composition as a photoresist for forming the resin black matrix. 3B is an enlarged plan view showing a resin black matrix formed using the color filter photomask shown in FIG. 3A.

As shown in FIG. 3A, this color filter photomask has a light transmitting portion (31) and a light shielding portion (3).
2), and the light-shielding portion (32) has a vertical length (e) of about 300 μm.
It is a rectangle of m and width (f) of about 100 μm, and has a desired opening size of the resin black matrix. At the four corners of the rectangular light-shielding portion (32), the light-shielding portion (3
5) is provided as an extension. When the film of the negative photosensitive colored resin composition provided on the substrate is exposed through such a photomask for a color filter and subjected to development processing, as shown in FIG. 3B, four corners ( In (g), a resin black matrix (33) having openings (36) which are not rounded but at right angles is obtained on the substrate (34).

The extending direction of the substantially triangular light-shielding portion (35) extending to the four corners of the rectangular light-shielding portion (32) is the same as in the case of the colored pixel. Further, the shape and area of the substantially triangular shape are appropriately selected depending on conditions such as photoresist, exposure, and development.

A resin black matrix (33) shown in FIG. 3 (b) is formed on the substrate, and subsequently, FIG. 1 (b) is formed.
For example, when manufacturing the color filter used in the transmissive liquid crystal display device by forming the colored pixel shown in (1), the size of the opening (36) of the resin black matrix and the size of the colored pixel (3) are set. The relationship is a> e, b> f, and (a × b)> (e × f). This is because, as shown in FIGS. 7 and 8, the position of the colored pixel of the color filter is fixed and the resin black matrix has a function of making the size uniform.

Further, the color filter photomask according to the fifth aspect of the present invention is the same as in the case of the colored pixel, for example, the color filter used when the non-photosensitive colored resin composition is used for forming the resin black matrix. Photo mask for.

FIG. 4A is an enlarged plan view showing a part of the pattern of an example of the color filter photomask according to the eighth aspect. This color filter photomask is for forming a resin black matrix, and is for using a positive photosensitive colored resin composition as a photoresist for forming the resin black matrix. 4B is an enlarged plan view showing a resin black matrix formed using the color filter photomask shown in FIG. 4A.

As shown in FIG. 4A, this color filter photomask has a light transmitting portion (41) and a light shielding portion (4).
2), and the light transmissive part (41) has a vertical length (e) of about 300.
It is a rectangle having a width of about 100 μm and a width (f) of about 100 μm, and has a desired opening size of the resin black matrix.
Light-transmitting portions (45) each having a substantially triangular shape are provided so as to extend at four corners of the light-transmitting portion (41) having a rectangular shape. When the film of the positive type photosensitive colored resin composition provided on the substrate is exposed through such a photomask for a color filter and subjected to development processing, as shown in FIG. 4B, the four corners ( In g), a resin black matrix (43) having an opening (46) which is not rounded and has a right angle is obtained on the substrate (44).

The extending directions of the substantially triangular light transmitting portions (45) extending to the four corners of the rectangular light transmitting portion (41) are the same as in the case of the colored pixel. Further, the shape and area of the substantially triangular shape are appropriately selected depending on conditions such as photoresist, exposure, and development.

A photomask for a color filter according to claim 7 is a photomask for a color filter used when a non-photosensitive colored resin composition is used for forming a resin black matrix, as in the case of the colored pixels. It is a mask. At this time, the resin black matrix is formed.
First, a film of a non-photosensitive coloring resin composition is formed on the substrate,
Etching on this film with a positive photoresist
A resist pattern is formed. When forming this etching resist pattern, the photomask for a color filter according to claim 7 is used. Next, the exposed portion of the non-photosensitive colored resin composition is etched, and the etching / resist pattern is peeled off to form a resin black matrix.

[0055]

According to the present invention, the substantially triangular light transmitting portions are provided at the four corners of the rectangular light transmitting portion, or the substantially triangular light shielding portions are provided at the four corners of the rectangular light shielding portion. Since it is a photomask for a color filter, when the colored pixels of the color filter and the black matrix are formed on the substrate, if the substrate is subjected to proximity exposure through the photomask according to the present invention, the four corners are not rounded and have a rectangular shape. A rectangular colored pixel and four corners can form a right-angled black matrix without rounding. As a result, there is no problem in forming finer colored pixels. Further, particularly in the reflective liquid crystal display device, when the color filter is not provided with the black matrix, the shape of the colored pixel becomes accurate.

Further, the present invention is a method for manufacturing a color filter in which a rectangular colored pixel is formed by using the above color filter photomask, so that the four corners have rectangular rectangular colored pixels which are not rounded but have a right angle. A method of manufacturing a color filter is provided. Further, the present invention is a method of manufacturing a color filter in which a resin black matrix is formed using the color filter photomask and rectangular colored pixels are formed using the color filter photomask. Is a rectangular colored pixel with a right-angled shape without rounding,
The four corners are a manufacturing method of a color filter having a black matrix which is not rounded and has a right angle.

[Brief description of drawings]

FIG. 1A is an enlarged plan view showing a part of a pattern of an embodiment of a color filter photomask according to the present invention. (B) is an enlarged plan view showing a colored pixel formed using the color filter photomask shown in (a).

FIG. 2A is an enlarged plan view showing a part of the pattern of an example of the color filter photomask according to claim 4; (B) is an enlarged plan view showing a colored pixel formed using the color filter photomask shown in (a).

FIG. 3A is a plan view showing an enlarged part of the pattern of an example of the color filter photomask according to claim 6; (B) is an enlarged plan view showing a resin black matrix formed using the color filter photomask shown in (a).

FIG. 4A is an enlarged plan view showing a part of the pattern of an example of the color filter photomask according to claim 8; (B) is an enlarged plan view showing a resin black matrix formed using the color filter photomask shown in (a).

FIG. 5 is an explanatory diagram showing an extension direction of a substantially triangular light transmitting portion extending to four corners of a rectangular light transmitting portion.

6A, 6B, 6C, 6D, 6E, 6F, 6G, 6H, 6H, 6I, and 6C are explanatory views showing examples of the shape of a substantially triangular light transmitting portion extending to the four corners of a rectangular light transmitting portion.

FIG. 7 is a plan view schematically showing the concept of a color filter used in a liquid crystal display device or the like.

8 is a cross-sectional view taken along line XX 'of the color filter shown in FIG.

FIG. 9 is an explanatory diagram showing, in a cross section, a positional relationship between a photomask and a substrate provided with a negative photoresist film when proximity exposure is performed.

FIG. 10A is an enlarged plan view showing an example of a pattern drawn on a photomask. (B) is an enlarged plan view showing a colored pixel formed using the photomask shown in (a).

[Explanation of symbols]

1, 21, 31, 41, 101 ... Photomask light transmitting portions 2, 22, 32, 42, 102 ... Photomask light shielding portions 3, 23, 91, 103 ... Colored pixels 4, 24, 34, 44, 70 , 90, 104 ... Substrate 5, 45 ... Substantially triangular light transmitting portion 5I ... Substantially triangular light transmitting portion 5II at corner of light transmitting portion in first quadrant ... Light transmitting portion in second quadrant Light-transmissive portion 5III having substantially triangular shape at the corners ... Light-transmissive portion 5IV having substantially triangular shape at the corners of light-transmitting portion within the third quadrant ... Light-transmitting portion having substantially triangular shape at the corners of light-transmitting portion within the fourth quadrant Parts 25, 35 ... Light-shielding parts 33, 43 having a substantially triangular shape ... Resin black matrix 36, 46 ... Opening part 72 of resin black matrix ... Black matrix 91 ... Negative photoresist (negative photosensitive coloring resin composition) film 93 ... Mask substrate 94 ... Chrome film 5 ... Photomask 96 ... Light irradiating the light transmitting portion 97 ... Light irradiating the boundary between the light transmitting portion and the light shielding portion d1 ... Proximity gap a, h ... Light transmitting portion of the photomask for colored pixels or light shielding Vertical b, i ... Light-transmitting portion of photomask for colored pixel, horizontal of light-shielding portion e ... Light-shielding portion of resin black matrix photomask, or light-transmitting portion vertical f ... Light-shielding of resin black matrix photomask Section or side of light transmitting portion g ... four corners of resin black matrix j ... four corners of light transmitting portion j, c ... four corners of colored pixel O ... origin centering on light transmitting portion of light mask or light shielding portion

   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H048 BA02 BA11 BA45 BA48 BB01                       BB02 BB42                 2H091 FA02 FA35 FB08 FC10 FC26                       FC29 FD04 FD22 FD24 LA03                       LA12 LA15                 2H095 BA12 BB02 BB36 BC05 BC08                       BC09                 2H097 FA02 FA03 FA09 GA45 GB02                       JA02 LA17

Claims (10)

[Claims] 1. A photomask for a color filter used when forming a rectangular colored pixel using a negative photoresist, in which substantially triangular light transmitting portions are provided at four corners of a rectangular light transmitting portion. A photomask for a color filter, which is characterized in that 2. The photomask for a color filter according to claim 1, wherein the negative photoresist is a negative photosensitive colored resin composition. 3. A photomask for a color filter used when forming a rectangular colored pixel using a positive photoresist, wherein substantially triangular light-shielding portions are provided at four corners of the rectangular light-shielding portion. A photomask for color filters. 4. The photomask for a color filter according to claim 3, wherein the positive photoresist is a positive photosensitive colored resin composition. 5. A color filter photomask used for forming a resin black matrix using a negative photoresist, wherein substantially triangular light-shielding portions are provided at four corners of a rectangular light-shielding portion. Characteristic color filter photomask. 6. The photomask for a color filter according to claim 5, wherein the negative photoresist is a negative photosensitive colored resin composition. 7. A photomask for a color filter used when forming a resin black matrix using a positive photoresist, wherein substantially rectangular light-transmitting portions are extended at four corners of a rectangular light-transmitting portion. A photomask for a color filter, which is characterized in that 8. The photomask for a color filter according to claim 7, wherein the positive photoresist is a positive photosensitive colored resin composition. 9. A method of manufacturing a color filter, which comprises forming a rectangular colored pixel by using the color filter photomask according to claim 1. Description: 10. A resin black matrix is formed using the color filter photomask according to claim 5, and a resin black matrix is formed according to claim 1. A method for manufacturing a color filter, which comprises forming rectangular colored pixels using a color filter photomask.