JP2008233539A - 偏光回折格子の形成方法及び偏光回折格子 - Google Patents
偏光回折格子の形成方法及び偏光回折格子 Download PDFInfo
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Abstract
【解決手段】偏光楕円率が0.05〜0.5の間にあり、かつ偏光方位角が互いに直交している2光波の干渉光を光架橋機能を有する高分子液晶に照射し、特別な分子配列構造を有する熱安定的な異方性格子を形成する。
【選択図】図4
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Claims (6)
- 光反応性の側鎖型高分子液晶に2光波を干渉させることで生じる干渉光を照射して、液晶性メソゲンを周期的に配向させて成る回折格子の形成方法において、前記側鎖型高分子液晶に照射される干渉光を生ぜしめる2光波の偏光楕円率が、共に0.05〜0.5の範囲であることを特徴とする偏光回折格子の形成方法。
- 前記側鎖型高分子液晶に照射される干渉光を生ぜしめる2光波の偏光方位角が互いに直交していることを特徴とする請求項1記載の偏光回折格子の形成方法。
- 前記側鎖型高分子液晶は側鎖に光架橋性の液晶性メソゲンを有する高分子液晶であってそのメソゲン末端に光反応基を有するものであることを特徴とする請求項1,2のいずれか1項に記載の偏光回折格子の形成方法。
- 前記側鎖型高分子液晶を透明基板上に塗布した後、この透明基板上に塗布された前記側鎖型高分子液晶を前記干渉光によって露光し、続いて、露光された前記側鎖型高分子液晶を50℃〜250℃の温度で熱処理して前記回折格子を形成することを特徴とする請求項1〜3のいずれか1項に記載の偏光回折格子の形成方法。
- 請求項1〜5のいずれか1項に記載の偏光回折格子の形成方法を用いて形成された偏光回折格子であって、入射光の偏光楕円率に対して出射光の偏光楕円率を低下させる機能を有することを特徴とする偏光回折格子。
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Cited By (1)
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JP7430906B2 (ja) | 2020-06-10 | 2024-02-14 | 国立大学法人長岡技術科学大学 | 光線走査広角化システム |
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JP2001305343A (ja) * | 2000-04-21 | 2001-10-31 | Fuji Xerox Co Ltd | 位相差板およびその作製方法 |
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JP2001305343A (ja) * | 2000-04-21 | 2001-10-31 | Fuji Xerox Co Ltd | 位相差板およびその作製方法 |
Cited By (1)
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JP7430906B2 (ja) | 2020-06-10 | 2024-02-14 | 国立大学法人長岡技術科学大学 | 光線走査広角化システム |
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