JP2008231525A - Winding type composite vacuum surface treatment device, and surface treatment method for film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a compact and low-cost winding type composite vacuum surface treatment device by multi-functionalization. <P>SOLUTION: Regarding the winding type composite vacuum surface treatment device, the inside of an almost cylindrical vacuum vessel provided with a vacuum pump evacuating the whole of the vacuum vessel is equipped with a pair of film winding/rewinding rolls and a rotatable can roll whose axial center is made almost coincident with that of the vacuum vessel. The device comprises: a plurality of surface treatment means fixed to the circumferential wall of the vessel so as to be confronted with the can roll; a pair of first shielding plates separating a treatment zone at which the surface treatment means are arranged from the pair of winding/rewinding rolls so as to almost shield the space between the circumferential wall of the vessel and the can roll; a plurality of second shielding plates fixed to the circumferential wall of the vessel, elongating to the vicinity of the can roll, and dividing the inside of the treatment zone into a plurality of treatment chambers including at least two surface treatment means; and vacuum pumps for respective treatment chambers respectively installed in the circumference wall of the vessel, and, in the respective treatment chambers, surface treatments with mutually different pressures and gaseous species can be performed. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a roll-up type composite surface treatment apparatus capable of performing various surface treatments such as drying, pretreatment, and thin film formation on a film, and a method for performing film surface treatment using this apparatus.

  In recent years, a functional film having a thin film formed on the surface of a plastic film or the like as a base material has been actively developed. For example, in the packaging field, by forming a thin film made of at least one kind of metal oxide selected from SiOx, MgO, AlOx, etc. on the film surface, it is transparent and preserves food having gas barrier properties such as oxygen and water vapor. A gas barrier film having excellent properties is provided.

In the electronics field, antireflection films and the like that prevent reflection on the display surface and improve visibility are widely used as display applications. This film is a multilayer thin film having different refractive indexes in which a high refractive index layer such as TiO ₂ , ZrO, and Nb ₂ O ₅ , a middle refractive index layer such as Al ₂ O ₃ , and a low refractive index layer such as SiO ₂ are laminated. Is formed on a film.

  In addition, in liquid crystal displays, with the progress of pixel miniaturization, a flexible circuit board connected to the liquid crystal display requires a highly accurate pattern, and at the same time, there is a further demand for ensuring electrical reliability associated with a narrow pitch. . Therefore, recently, copper with high adhesive strength without using an adhesive can be obtained by providing a different metal layer such as nickel or chromium as a base on a polyimide film by sputtering or vapor deposition, and applying electrolytic copper plating on it. A polyimide flexible substrate is used.

  When manufacturing these functional films, it is necessary to form a thin film in order to impart functionality to the film that is the base material. It is desirable to form a thin film while moving it. As an apparatus for that purpose, a winding-type vacuum film forming apparatus for continuously forming a thin film while moving a film between rolls in a vacuum environment is generally used.

  As the most basic winding-type vacuum film forming apparatus used conventionally, there is one having a structure described in Japanese Patent Application Laid-Open No. 2002-60931. That is, as shown in FIG. 1, a thin film forming section 3 having a thin film forming means (not shown) is installed in the vacuum chamber 1 together with a film 2 conveying means, and the inside of the vacuum chamber 1 is a vacuum pump or the like. It is exhausted to a high vacuum by an exhaust system 4 comprising The film 2 continuously fed from the unwinding roll 5 is formed into a film by the thin film forming unit 3 on one film forming drum 7 while being wound by the winding roll 6.

  As for the above thin film forming means, there are a vacuum deposition method and a sputtering method as a physical film formation method, and a chemical vapor deposition method (CVD) or the like is used as a chemical film formation method. The vacuum deposition method is a method of forming a thin film on a substrate by heating and evaporating a film forming material by resistance heating or electron gun irradiation. A plasma-assisted vapor deposition method is also known in which plasma is formed between an evaporation source and a substrate for the purpose of adhesion and densification of a thin film during vapor deposition. The plasma is formed by applying a DC or AC voltage to a discharge electrode installed in a vacuum film forming apparatus or irradiating a microwave with a microwave using a waveguide. can do.

  In addition, the sputtering method uses a target formed into a plate shape as a film forming material, generates plasma between the substrate and the target using the plasma generation method using the target as a discharge electrode, and uses a potential gradient. In this method, a target material is knocked out by irradiating and colliding ions with a target surface to form a thin film of the target material on a substrate. Furthermore, chemical vapor deposition (CVD) is a method in which an inorganic or organic material or a mixture thereof is vaporized and introduced as a raw material gas in the vicinity of a substrate, and a thin film is formed on the substrate by a chemical reaction using heating or plasma. It is a method of forming. When plasma is used, an apparatus configuration similar to sputtering can be used.

  In any of the above-described thin film forming means, it has been confirmed that the use of plasma during film formation has an effect on the adhesion and densification of the thin film. Therefore, the means for forming a thin film using plasma is to improve gas barrier properties for gas barrier films, improve optical properties for antireflection films, and improve adhesion to copper layers for copper polyimide flexible substrates. It has been put to practical use as an effective method.

  However, in the winding type vacuum film forming apparatus as shown in FIG. 1, it is easy to form a single layer thin film. However, when laminating a plurality of thin films, a plurality of thin film formations are performed along the running direction of the film. It is necessary to arrange the means or to make the film reciprocate so that a plurality of thin film forming means can be passed depending on the number of times required for lamination.

  As a wind-up type vacuum film forming apparatus used for forming such a thin film, Japanese Patent Application Laid-Open No. 2003-178436 discloses a plurality of film forming drums 7a capable of temperature control inside a vacuum chamber 1, as shown in FIG. , 7b is described. According to this film forming apparatus, the film 2 fed from the unwinding roll 5 and taken up by the take-up roll 6 passes through the plurality of film forming drums 7a and 7b. Thin films of different materials can be sequentially formed on the film 2 at a low temperature by the plurality of cathode assemblies 8 provided to face the circumferential surface.

  In the case of the conventional winding type vacuum surface treatment apparatus described above, it has been difficult to perform a plurality of surface treatments simultaneously with one apparatus. For example, if various surface treatment means are arranged so as to be continuously in contact with the peripheral portions of the film formation drum in the apparatus and a plurality of processes are to be carried out at different film processing positions, the apparatus is not only enlarged. There are problems that the film is wrinkled and the quality is deteriorated. Therefore, in order to perform a plurality of surface treatments on the film, it is necessary to use different processing apparatuses. However, in the method using different processing apparatuses, the processing man-hours and costs are increased, and at the same time, the film is exposed to the air while being transferred between the apparatuses. There was a problem that it was easy.

  In addition, as pointed out in Patent Document 3, when manufacturing a copper polyimide flexible substrate capable of forming a copper conductor layer directly on an insulator film without applying an adhesive as described above, insulation is required. As a means for forming a copper conductor layer having a uniform thickness on a body film at a low price, an electrolytic copper plating method is usually employed. In general, a thin metal seed layer is formed to impart conductivity to the entire surface, and an electrolytic copper plating process is performed thereon. In the etching process for forming a wiring pattern on this copper polyimide flexible substrate, if any undissolved metal component called etching residue remains between the wirings, it will cause a short circuit failure. Inspection to detect the presence or absence of is becoming important and becoming increasingly strict. Here, this etching residue is mainly found around the filler (filler) present in the insulator film, and it is considered that these are the cause.

  Further, in order to form a thin metal seed layer on an insulator film, it is common to use a dry plating method such as a sputtering method or a vacuum evaporation method on the film surface. It can be seen that pinholes with a size of 3 to 10 μm may occur mainly in the coating layer obtained by this method, and disconnection may occur after circuit processing due to the presence of pinholes with a diameter of 10 μm or less. I came.

As a result of investigating and examining the cause of pinholes, it was found that the cause is often that the filler in the insulator film protrudes from the film. It is conceivable that the pinhole due to the protrusion of the filler occurs when the insulator film is exposed to a high temperature during the dry plating process. Therefore, in the production of a two-layer flexible substrate, it is common to dehydrate the moisture contained in the insulator film as a pretreatment for forming the metal seed layer. It is said that it is necessary to carry out within the range below the temperature which starts a decomposition reaction.
JP 2002-60931 A JP 2003-178436 A JP 2006-269689 A

  In view of such a conventional situation, the present invention performs a plurality of surface treatments at the same time after heating the film within a temperature equal to or lower than the temperature at which the film starts a decomposition reaction and dehydrating moisture contained in the film. In addition to being able to be implemented, defects such as pinholes and reduced adhesion are not generated in the formed thin film, and wrinkles are not generated on the film. An object of the present invention is to provide a windable composite vacuum surface treatment apparatus and a film surface treatment method.

  In order to achieve the above-mentioned object, the take-up type composite vacuum surface treatment apparatus provided by the present invention includes a pair of film take-up and unwinding units in a substantially cylindrical vacuum vessel provided with a vacuum pump for evacuating the entire vacuum vessel. A roll, and a rotatable can transporting film roll whose axial center is substantially aligned with the vacuum container, and is unwound or wound between the film winding and unwinding rolls in accordance with the rotation of the can roll. A surface treatment apparatus for performing a surface treatment on a film moving along a plurality of surface treatment means fixed to a vacuum vessel peripheral wall so as to face the can roll, and to substantially shield between the vacuum vessel peripheral wall and the can roll A pair of first shielding plates that are fixed to the peripheral wall of the vacuum vessel and separate the processing zone in which the surface treatment means is disposed from the pair of film winding and unwinding rolls, and fixed to the vacuum vessel peripheral wall. A plurality of second shielding plates extending to near the roll and partitioning the inside of the processing zone into a plurality of processing chambers including at least two surface processing means, and the processing chamber vacuum pumps installed on the peripheral wall of the vacuum chamber, respectively. Each of the processing chambers can be subjected to surface treatments of different pressures and gas types, and the can roll surface is provided with lattice-like grooves capable of exhausting gas components, or It has a plurality of holes that penetrate the surface of the can roll and the inside of the can roll so that the gas component generated on the back side of the film can be exhausted, and the can roll can be heated and temperature controlled inside the can roll. The heater is installed, and the film is processed by using various surface treatment sources mounted around the vacuum vessel.

  In the take-up type composite vacuum surface treatment apparatus of the present invention, the cross-sectional shape of the grid-like grooves formed on the can roll is a rectangle or a trapezoid having a wide surface on the can roll surface. Components can be exhausted.

  Alternatively, in the above-described winding-type composite vacuum surface treatment apparatus of the present invention, the shape of the through hole of the can roll is a cylindrical shape or a mortar shape having a spread on the can roll surface side, and gas can be easily supplied from the inside of the can roll. Components can be exhausted.

  The surface treatment means is any one of a heater means for drying a film, a plasma generation means for film pretreatment, and a sputtering means for forming a thin film.

  Further, the present invention uses the above-described roll-up type composite vacuum surface treatment apparatus of the present invention to heat and control the temperature of the can roll by the heater inside the can roll while moving the film in one direction along the can roll. The gas component generated from the film is exhausted from the grid-like grooves on the surface of the can roll, or exhausted from the inside of the can roll through a plurality of exhaust holes penetrating the surface of the can roll and the inside of the can roll. The surface treatment of the film is performed by one surface treatment means facing the film treatment position in each treatment chamber while moving the film in the reverse direction along the can roll, and the surface treatment means is switched after the surface treatment is finished. Again, move the film along the can roll in the opposite side of the side while facing the film processing position in each processing chamber. Surface treatment of the film by the surface treatment means for providing a surface treatment method of the film characterized.

  According to the present invention, in the same apparatus, the film is heated within a range below the temperature at which the decomposition reaction begins, and the can roll surface is provided with lattice-like grooves capable of exhausting gas components, or It has a plurality of holes that penetrate the surface of the can roll and the inside of the can roll, and after dehydrating the moisture contained in the film by a simple exhaust structure provided in the can roll, a plurality of surface treatments are simultaneously performed. A roll-up type composite vacuum surface treatment apparatus that can be implemented and is relatively small and low in cost can be provided.

  The film can be dehydrated in the same equipment to complete multiple surface treatments, eliminating the need to replace the film in the middle of processing with another equipment, shortening the processing steps and keeping processing costs low. In addition, the film is not exposed to the atmosphere, and the quality of the thin film does not deteriorate, such as pinholes and defects such as poor adhesion.

  Furthermore, if each of the partitioned processing chambers is shielded in an almost airtight state and a processing chamber vacuum pump is installed in each processing chamber, each processing chamber can be differentially evacuated. It is possible to perform more various surface treatments by selecting the treatment conditions of pressure and gas type.

  The winding type composite vacuum surface treatment apparatus of the present invention and a film processing method using the same will be described in detail with reference to the drawings.

  Conventionally, when various surface treatments are applied to a film using a surface treatment device such as a winding type sputtering device, moisture and solvent components remaining in the film affect the surface treatment characteristics of the film in advance. However, in order to efficiently remove residual moisture without causing wrinkles on the film, it has been necessary to use an apparatus having a precise film transport system. In addition, in order to suppress the occurrence of wrinkles and dimensional deformation of the film, it is necessary to perform the treatment at a temperature lower than the temperature at which the residual moisture can be efficiently removed, and to perform removal using the treatment time as a parameter. In addition, there is a problem in processing cost and equipment cost by increasing the size of the apparatus.

  As shown in FIGS. 3 to 4, for example, the surface treatment apparatus of the present invention has a pair of film winding and winding inside a substantially cylindrical vacuum vessel 10 equipped with a vacuum pump (not shown) for the entire apparatus. Out rolls 11a and 11b, and a vacuum roll 10 and a can roll 12 for transporting a film which are rotatably provided with their axial centers substantially coincident with each other. For example, the film 13 is wound on the rotating can roll 12 while being unwound from one film winding / unwinding roll 11a and wound on the other film winding / unwinding roll 11b in accordance with the rotation of the can roll 12. Surface treatment is performed while moving along. Moreover, it is preferable that the can roll 12 is provided with a heating / cooling means such as a heater, hot water, or a refrigerant so that the surface temperature can be controlled.

  The vacuum vessel 10 includes a substantially cylindrical vacuum vessel peripheral wall 10a, a vacuum vessel bottom plate 10b, and a vacuum vessel top plate (not shown). Inside the vacuum vessel 10, a plurality of surface treatment means pairs 17, 18 and 19 each comprising two surface treatment means are arranged substantially opposite to the can roll 12, and specifically, the vacuum vessel peripheral wall A plurality of surface treatment means, for example, a heater means 17 for drying a film, a plasma generation means 18 for film pretreatment, and a sputtering means 19 for forming a thin film are attached to the surface 10a. The apparatus is evacuated by a vacuum pump (not shown) that exhausts the entire vacuum container and vacuum pumps 23a, 23b, and 23c that exhaust the processing zone locally.

  Further, in order to separate the processing zone in which the plurality of surface treatment means are disposed from the pair of film winding / unwinding rolls 11a and 11b, the pair of first shielding plates 20 are fixed to the vacuum container bottom plate 10b, and the vacuum container The space between the peripheral wall 10a and the can roll 12 is shielded in an almost airtight state. Further, in the processing zone in which a plurality of surface processing means are arranged, three processing chambers A, B, and C are provided by two second shielding plates 21 that are fixed to the vacuum vessel peripheral wall 10a and extend to the vicinity of the can roll 12. It is divided into.

  Each of the processing chambers A, B, and C includes two surface processing means. As described above, the pair of first shielding plates 20 and the two second shielding plates 21 are arranged at the boundaries between the processing chambers A, B, and C, and the processing chambers A and B are formed by two of the shielding plates. , C is isolated from other processing chambers. In each of the processing chambers, a mask plate (not shown) is disposed between the can roll 12 and the surface treatment means, and is held on the vacuum vessel bottom plate 10b. It can also be covered. Therefore, for example, in the processing chamber A in the state of FIG. 3, only the drying process of the film 13 by the heater means 17 is performed at the film processing position at the position facing the heater means 17 of the can roll 12. The mask plate can be operated so as to cover one of the positions facing the surface treatment means of the can roll 12 in the treatment chamber, so that only one of the two surface treatment means in the treatment chamber can be covered. It can also be used. Thus, the two surface treatment means in the treatment chamber can be provided with different surface treatment means to form treatment chambers for performing different surface treatments.

  By using the surface treatment apparatus of the present invention described above, each treatment in the treatment zone can be carried out continuously in one direction in the vacuum vessel if the treatment is possible under the same gas type and the same pressure. By using a plurality of surface treatment means in a chamber, different treatments can be carried out simultaneously in a plurality of treatment chambers, or the same treatment can be carried out simultaneously in a plurality of treatment chambers by selecting the arrangement of the surface treatment means. it can.

  For example, in the state of FIG. 3, the film processing positions in each processing chamber are as follows: two heater means 17 in the processing chamber A, two plasma generating means 18 in the processing chamber B, and two sputtering means in the processing chamber C. 19, respectively. Therefore, the inside of the vacuum vessel 10 or its processing zone is set to the same gas type and the same pressure, and the film 13 unwound from one film winding / unwinding roll 11a is wound around the other film winding / unwinding roll 11b. In addition, the film 13 moving along the can roll 12 is dried by the heater means 17 in the processing chamber A. Thereafter, the film surface is pretreated with plasma by the plasma generating means 18 in the processing chamber B while moving the film 10 in the opposite direction. At that time, the inside of the vacuum vessel 10 can be evacuated by an overall vacuum pump connected to the vacuum vessel bottom plate 10b, and further, a plasma processing gas can be supplied and maintained at a predetermined pressure.

  Next, a thin film can be formed on the film 13 by the sputtering means 19 in the processing chamber C while moving again in the opposite direction (in this case, the same direction as in the drying process). In the sputtering step, after the surface treatment is completed for one roll of film roll, the inside of the vacuum vessel 10 is evacuated by an overall vacuum pump connected to the vacuum vessel bottom plate 10b, and further for sputtering. Can be performed by supplying an argon gas or the like and maintaining the pressure at a predetermined pressure.

  In the above drying process by the heater means 17 in the processing chamber A, the film 13 unwound from one film winding / unwinding roll 11a is wound on the other film winding / unwinding roll 11b. Is transferred from the film 13 moving along the can roll 12 onto the can roll by heat conduction from the can roll heated to a temperature suitable for removing moisture and the like, and radiant heat from the heater means 17 in the processing chamber A. A gas component such as moisture is exhausted through the formed lattice-shaped grooves 24, whereby the moisture contained in the film is dehydrated and dried.

Another embodiment of the present invention includes FIG.
FIG. 4 is a diagram of another embodiment showing a cross-sectional structure of the device structure of the present invention. In this embodiment, three processing chambers are provided, and each processing chamber has a heater means for drying, a film surface treatment means such as an ion source and a plasma electrode, and a sputtering means comprising a sputtering cathode for forming a thin film. 3 is the same as in FIG.

  Further, a vacuum pump for exhausting the entire vacuum container and a vacuum pump for locally exhausting the processing chamber are provided. Further, a vacuum pump for exhausting air from the can roll internal exhaust port 16 through the fine exhaust hole 25 on the surface of the can roll from the can roll internal exhaust port 16 is provided.

  In FIG. 4 as well, the film is dried by heat conduction from the can roll heated to a temperature suitable for removing moisture and the like, and radiant heat from the drying heater installed in the inner periphery of the vacuum vessel. The can roll is provided with a heater that can heat and control the temperature of the can roll, and has a plurality of exhaust holes 25 penetrating the can roll surface and the inside of the can roll. It is possible to exhaust gas components generated in The exhaust is exhausted by a vacuum pump or the like through the exhaust hole on the surface of the can roll from the exhaust port inside the can roll.

  Thereby, in the drying process by the heater means 17 in the processing chamber A, while the film 13 unwound from one film winding / unwinding roll 11a is wound on the other film winding / unwinding roll 11b, the film 13 The surface of the can roll is transferred from the film 13 moving along the can roll 12 by heat conduction from the can roll heated to a temperature suitable for removing moisture and the like, and radiant heat from the heater means 17 in the processing chamber A. Then, gas components such as moisture are exhausted through a plurality of exhaust holes 25 penetrating through the interior of the can roll, whereby the moisture contained in the film is dehydrated and dried.

  The present invention is a winding for surface-treating a film 13 while transporting the film 13 along a can roll 12 for film transport and temperature control installed in a vacuum vessel 10 having a cylindrical shape or a shape close to a cylindrical shape. A take-type dry film surface treatment apparatus, the central axis of the vacuum container and the can roll being the same or substantially the same, and a plurality of exhaust holes penetrating the can roll surface and the inside of the can roll contacting the back surface of the film. However, a gas component such as water vapor discharged from the film can be exhausted, and a heater 15 that can heat and control the temperature of the can roll is installed inside the can roll, so that moisture and solvent remaining in the film Components and the like can be efficiently implemented while suppressing wrinkles and dimensional deformation. Furthermore, it is possible to give excellent processing characteristics to a thin film formed by a surface treatment of a film by an ion source or plasma treatment that is subsequently performed and a sputtering method.

  In the surface treatment apparatus of the present invention, it is possible to carry out the next surface treatment step after the heating and drying step with the can roll and the heater, but the heating of the film with the can roll is performed with respect to the next treatment step. If there is no problem, it is possible to perform different surface treatments by controlling the gas pressure by using a vacuum pump for the processing chamber so that the processing atmosphere is different for each processing zone. Thereby, for example, drying, plasma treatment, and sputtering film formation can be carried out continuously in a single film transport step.

  In this way, in the surface treatment apparatus of the present invention provided with a plurality of different surface treatment means, a plurality of treatments can be performed with the same apparatus without mounting the film in the vacuum container and then taking it out of the vacuum apparatus. It can be carried out. Moreover, the same or different surface treatment can be given to a film in several places simultaneously. Therefore, complex processing of complex processes is possible, and even when the same kind of thin film is formed, even if one cathode target is consumed, a film can be formed using another target. , A long-time treatment or a thickening treatment can be performed.

EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to the examples.
(Example 1)
In the winding type dry film surface treatment apparatus shown in FIG. 3, two various surface treatment sources were set in each treatment zone. In the first processing zone A, a heater 17 was installed, and differential evacuation was performed by a vacuum pump 23 a separately from the entire vacuum vessel 10. A plasma electrode 18 is installed in the processing zone B, and differential evacuation is performed by a vacuum pump 23b separately from the entire vacuum vessel. A cathode 19 was installed in the processing zone C, and differential evacuation was performed by a vacuum pump 23c separately from the entire vacuum vessel. The cathode 19 was equipped with Cr and Cu targets, respectively.

  The surface of the can roll 12 is provided with a grid-like groove 24 capable of exhausting gas components, and the cross-sectional shape of the grid-like groove has a trapezoidal shape slightly wider on the surface of the can roll, The gas component generated on the back side of the film can be easily exhausted from the end of the can roll of the grid-like groove 24 communicating with the film.

  A polyimide film having a length of 1000 m and a thickness of 25 μm is attached to the winding / unwinding roll 11 a in the vacuum vessel 10, and a vacuum pump installed on the end face of the cylindrical vacuum vessel 10, and vacuum pumps 23 a and 23 b in each processing zone. 23c, after evacuating the vacuum vessel 10 and each processing zone A, B, C, the processing zone A is kept evacuated, and the heater 15 inside the can roll and the heater 17 inside the vacuum vessel are connected. The temperature was maintained at 180 ° C., oxygen gas was supplied to the processing zone B and maintained at 6.7 Pa (50 mm Torr), and 3 kW of power was supplied to the plasma electrode 18 from a high frequency power source to generate plasma discharge. While the polyimide film mounted on the winding / unwinding roll 11a is conveyed at a speed of 5 m / minute and wound on the winding / unwinding roll 11b, the polyimide film is dried by a heater and the polyimide film is surface-treated by plasma. Conducted continuously for a minute.

After the drying treatment and the plasma treatment, while the polyimide film 10 is moved in the opposite direction, argon gas is supplied to the treatment zone C and maintained at 1.3 Pa (10 mTorr). A power of 10 kW and 50 kW was respectively supplied from a sputtering power source to generate a sputtering discharge, and a laminated film of a Cr film 10 nm and a Cu film 100 nm was formed on a polyimide film by sputtering film formation.
(Example 2)
In the winding type vacuum film surface treatment apparatus shown in FIG. 4, two various surface treatment sources were set in each treatment zone. In the first processing zone A, a heater 17 was installed, and differential evacuation was performed by a vacuum pump 23 a separately from the entire vacuum vessel 10. A plasma electrode 18 was installed in the processing zone B, and differential evacuation was performed by a vacuum pump 23b separately from the entire vacuum vessel. A cathode 19 was installed in the processing zone C, and differential evacuation was performed by a vacuum pump 23c separately from the entire vacuum vessel. The cathode 19 was equipped with Cr and Cu targets, respectively.

  On the surface of the can roll 12, holes that penetrate the can roll surface and the inside of the can roll can be exhausted at almost equal intervals in the entire surface of the can roll. The cross-sectional shape of the roll exhaust hole 25 is a mortar shape having a spread on the front side of the can roll. During film transport, gas components generated on the back side of the film are passed through the through hole and connected to the through hole. It can exhaust with a vacuum pump etc. from an exhaust port.

  In the take-up type composite vacuum surface treatment apparatus of the present invention, the cross-sectional shape of the grid-like grooves formed on the can roll is a rectangle or a trapezoid having a wide surface on the can roll surface. Components can be exhausted. Alternatively, in the above-described take-up type composite vacuum surface treatment apparatus of the present invention, the shape of the through hole of the can roll can be cylindrical or the gas component can be easily exhausted from the inside of the can roll.

  A polyimide film having a length of 1000 m and a thickness of 25 μm is attached to the winding / unwinding roll 11 a in the vacuum vessel 10, and a vacuum pump installed on the end face of the cylindrical vacuum vessel 10, and vacuum pumps 23 a and 23 b in each processing zone. , 23c, and a vacuum pump (not shown) for exhausting the inside of the can roll, the vacuum container 10, each of the processing zones A, B, C, and the inside of the can roll are further evacuated, and then the processing zone A is evacuated. The heater 15 inside the can roll and the heater 17 inside the vacuum vessel were held at 180 ° C.

  Oxygen gas was supplied to the processing zone B and maintained at 6.7 Pa (50 mm Torr), and 3 kW of electric power was supplied to the plasma electrode 18 from a high frequency power source to generate plasma discharge. While the polyimide film with a thickness of 25 μm attached to the winding / unwinding roll 11a is conveyed at a speed of 5 m / minute and wound on the winding / unwinding roll 11b, the polyimide is dried with a heater and the polyimide is surface-treated with plasma. Conducted continuously for 200 minutes.

After the drying treatment and the plasma treatment, while the polyimide film 10 is moved in the opposite direction, argon gas is supplied to the treatment zone C and maintained at 1.3 Pa (10 mTorr). A power of 10 kW and 50 kW was respectively supplied from a sputtering power source to generate a sputtering discharge, and a laminated film of a Cr film 10 nm and a Cu film 100 nm was formed on a polyimide film by sputtering film formation.
(Comparative Example 1)
The can roll is similar to the wind-up dry film surface treatment apparatus shown in FIG. 1 except that it does not have a grid-like groove that allows vacuum evacuation from the back side of the film and does not have a built-in heater for can heating. Using the apparatus, the polyimide film was dried and plasma-treated, and then sputtering film formation was performed.

In order to sufficiently dry a polyimide film having a thickness of 25 μm using only a heater set in a vacuum vessel and set to a temperature of 180 ° C., it is necessary to set the conveyance speed to 2 m / min. Compared with Example 1, it was necessary to reduce the processing strength of the plasma processing and the sputtering film formation to about 40%. Therefore, it took about 500 minutes to process a 1000 m roll.
(Comparative Example 2)
In order to sufficiently dry the polyimide film at a conveyance speed of about 5 m / min using a take-up dry film processing apparatus having the same can roll structure as in Comparative Example 1, three processing zones A, B, The surface treatment source installed in C was replaced with a heater, and it was examined whether the same effect as in Example 1 could be obtained. As a result, it was found that there was an effect equivalent to that of Example 1 only after 6 heaters were installed and the film was dried.

It is a schematic sectional drawing which shows the most basic structure of the conventional winding type vacuum film-forming apparatus. It is general | schematic sectional drawing which shows the other structure of the conventional winding type vacuum film-forming apparatus. It is general | schematic sectional drawing which shows one Example of the winding type | mold composite vacuum surface treatment apparatus of this invention. It is general | schematic sectional drawing which shows the other Example of the winding type composite vacuum surface treatment apparatus of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Vacuum chamber 2 Film 3 Thin film formation part 5 Unwinding roll 6 Winding roll 7, 7a, 7b Film-forming drum 8 Cathode assembly 10 Vacuum container 10a Vacuum container surrounding wall 10b Vacuum container bottom plate 11a, 11b Winding unwinding roll 12 Can Roll 13 Film 14 Perimeter wall projection 15 Can roll built-in heater 16 Exhaust port inside can roll 17 Heater means 18 Plasma generating means 19 Sputtering means 20 First shielding plate 21 Second shielding plates 23a, 23b, 23c Vacuum pump for processing chamber 24 Can roll surface groove 25 Can roll exhaust hole

Claims (5)

In a substantially cylindrical vacuum vessel equipped with a vacuum pump that evacuates the entire vacuum vessel, a film is provided with a pair of film winding and unwinding rolls, and a rotatable can roll whose axial center substantially coincides with the vacuum vessel. A surface treatment apparatus that performs surface treatment on a film that is unwound or wound between winding and unwinding rolls and moves along a can roll,
A plurality of surface treatment means fixed to the vacuum vessel peripheral wall facing the can roll;
A pair of first shielding plates fixed to the vacuum container peripheral wall so as to substantially shield between the vacuum container peripheral wall and the can roll, and separating the processing zone in which the surface treatment means is disposed from the pair of film winding and unwinding rolls;
A plurality of second shielding plates that are fixed to the peripheral wall of the vacuum vessel and extend to near the can roll, and divide the inside of the processing zone into a plurality of processing chambers including at least two surface processing means;
Each processing chamber has a processing chamber vacuum pump installed on the peripheral wall of the vacuum vessel,
Each treatment chamber can perform surface treatments with different pressures and gas types, and the can roll surface is provided with grid-like grooves that can exhaust gas components, or the can roll surface and the can It has a plurality of holes that penetrate through the inside of the roll, it is possible to exhaust gas components generated on the back side of the film, and a heater that can heat and control the temperature of the can roll is installed inside the can roll A roll-up type composite vacuum surface treatment apparatus characterized in that the film is further treated by using various surface treatment sources mounted around the vacuum vessel.   2. The winding type composite vacuum surface treatment apparatus according to claim 1, wherein the cross-sectional shape of the lattice-shaped grooves formed on the can roll is a rectangle or a trapezoid having a wide surface on the can roll surface side.   The winding type composite vacuum surface treatment apparatus according to claim 1, wherein the shape of the through hole of the can roll is a cylindrical shape or a mortar shape having a spread on the can roll surface side.   The winding type composite according to any one of claims 1 to 3, wherein the surface treatment means is any one of a heater means for film drying, a plasma generation means for film pretreatment, and a sputtering means for thin film formation. Vacuum surface treatment equipment.   Heating and temperature control of the can roll with a heater inside the can roll while moving the film in one direction along the can roll using the take-up type composite vacuum surface treatment apparatus according to any one of claims 1 to 4. The gas component generated from the film is exhausted from the grid-like grooves on the surface of the can roll, or exhausted from the inside of the can roll through a plurality of exhaust holes penetrating the can roll surface and the inside of the can roll, Then, while moving the film in the reverse direction along the can roll, the surface treatment of the film is performed by one surface treatment means facing the film treatment position in each treatment chamber, and after the surface treatment is finished, the surface treatment means is Switch and again move the film along the can roll in the opposite direction again, while at the film processing position in each processing chamber. The surface treatment method of the film characterized in that the surface treatment means for treating the surface of the film.