JP2008224601A - Stirring apparatus and automatic analysis apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a stirring apparatus that suppresses generation of heat in a piezoelectric substrate and a vessel wall along the propagation pathway of sound waves, and to provide an automatic analysis apparatus. <P>SOLUTION: The stirring apparatus 20 and the automatic analysis apparatus are provided, and the apparatus 20 includes a vessel 5 for retaining a liquid and a vibrator consisting of a plurality of interdigital electrodes that are formed on a piezoelectric substrate 23a, a surface acoustic wave element 23 for generating sound waves while the surface acoustic wave element is in contact with the vessel. With regard to the vessel or the acoustic wave element 23, a reflection edge surface 23e that is inclined or curved or the reflection edge surface that diffusely reflects propagation waves to a surface that is perpendicular to the propagation direction of some sound waves, which propagate the in-wall of the vessel or the inside of the piezoelectric substrate while reflecting, of sound waves generated by the acoustic wave element 23 is formed on the wall of the vessel or the piezoelectric substrate 23a. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a stirring device and an automatic analyzer.

  Conventionally, an automatic analyzer analyzes a component concentration and the like in a specimen by stirring and reacting a liquid sample containing the specimen and a reagent and measuring optical characteristics of the reaction liquid. At this time, a stirring device that stirs a liquid sample is known as a stirring device that performs non-contact stirring by irradiating a liquid sample containing a specimen and a reagent with a sound wave generated by a sound wave generating means so as to avoid so-called carryover. (For example, refer to Patent Document 1). The sound wave generating means used in the stirring device disclosed in Patent Document 1 is formed by forming a vibrator composed of comb-like electrodes (IDT) on a piezoelectric substrate and using it attached to the wall surface of a container. generate.

JP 2006-90791 A

  By the way, in the stirring device disclosed in Patent Document 1, the vibrator generates heat by driving the sound wave generation means, and the piezoelectric substrate and the wall of the container through which the sound wave propagates generate heat along the propagation path of the sound wave. The temperature of the liquid sample as a target sometimes excessively increased. In this case, because the piezoelectric substrate and the wall of the container are close to the liquid sample, such as in contact with the liquid sample to be agitated, the thermal effect on the liquid sample is large, and the amount of liquid sample becomes small. Since the heat capacity of the liquid sample is reduced, there is a problem that the temperature rise of the liquid sample is increased. In particular, since the biochemical analyzer analyzes a biological sample such as blood, the object to be stirred is denatured due to a rise in the temperature of the liquid sample, which may hinder accurate analysis of the specimen.

  The present invention has been made in view of the above, and an object thereof is to provide a stirring device and an automatic analyzer that suppress heat generation of a piezoelectric substrate and a container wall along a sound wave propagation path.

  In order to achieve the above object, the present inventors have studied heat generation along the propagation path of the sound wave on the piezoelectric substrate and the container wall. As a result, for example, when a sound wave propagated in the piezoelectric substrate along the propagation path while being reflected is reflected by the end surface of the piezoelectric substrate, which is a discontinuous surface of acoustic impedance, and the 180 ° propagation direction changes, this reflected sound wave and vibration It was observed that the outgoing sound wave propagating from the child interferes with the heat generation along the propagation path of the sound wave, which is larger than the case where the heat generation does not interfere. The heat generation phenomenon accompanying this interference was also observed in the case of sound waves propagating in the container wall.

  The present invention has been made on the basis of the above-described knowledge. In order to solve the above-described problems and achieve the object, the stirring device of the present invention includes a container for holding a liquid and a plurality of combs on a piezoelectric substrate. An agitator for agitating the liquid held in the container by the sound waves generated by the sound wave generating means, and a sound wave generating means for generating a sound wave in a state of being in contact with the container. In the apparatus, the container or the sound wave generation unit is inclined with respect to a plane orthogonal to a propagation direction of the sound wave propagating in the wall of the container or in the piezoelectric substrate while reflecting the sound wave generated by the sound wave generation unit. Alternatively, a curved reflection end face or a reflection end face for irregularly reflecting the propagating sound wave is formed on the wall of the container or the piezoelectric substrate.

  Further, in one aspect of the stirring device of the present invention, in the above invention, the reflection end surface is at least in the sound wave propagation region in which the cross width of the plurality of comb-like electrodes is extended in the sound wave propagation direction. It is characterized by comprising an inclined surface inclined with respect to a surface orthogonal to the propagation direction of a sound wave propagating inside or a curved surface with a tangent inclined.

  Further, according to one aspect of the stirring device of the present invention, in the above invention, the container protrudes from the wall, and a sound wave propagating through the wall is guided in a direction away from the container by an acoustic impedance boundary. Is provided.

  Moreover, one aspect of the stirring device of the present invention is characterized in that, in the above-mentioned invention, the guide portion is formed at an end portion from which a reflection end face for irregularly reflecting the propagating sound wave projects.

  In order to solve the above-described problems and achieve the object, the automatic analyzer of the present invention causes a plurality of different liquids to stir and react, measures the optical properties of the reaction liquid, and analyzes the reaction liquid. In this automatic analyzer, the sample and the reagent are stirred using the stirring device, and the reaction solution is optically analyzed.

  The container or the sound wave generating means of the stirring device according to the present invention is inclined or curved with respect to a surface orthogonal to the propagation direction of the sound wave propagating in the wall of the container or in the piezoelectric substrate while reflecting the sound wave generated by the sound wave generating means. The reflection end face or the reflection end face for irregularly reflecting the propagating sound wave is formed on the container wall or the piezoelectric substrate, and the automatic analyzer of the present invention includes the above-described stirring device. Since the propagating sound wave and the sound wave reflected by the reflection end face do not interfere with each other or the interference is suppressed, heat generation of the piezoelectric substrate and the container wall along the sound wave propagation path due to the sound wave interference can be suppressed.

(Embodiment 1)
Hereinafter, Embodiment 1 concerning the stirring apparatus and automatic analyzer of this invention is demonstrated in detail, referring drawings. FIG. 1 is a schematic configuration diagram showing an automatic analyzer according to Embodiment 1 including a stirring device of the present invention. FIG. 2 is a block diagram illustrating configurations of the automatic analyzer and the agitation device according to the first embodiment. FIG. 3 is a perspective view showing a surface acoustic wave element of the stirring device used in the automatic analyzer of Embodiment 1 and a reaction vessel equipped with the surface acoustic wave element. FIG. 4 is a perspective view showing a reaction vessel together with a power transmission body, to which a surface acoustic wave element is attached and used in the automatic analyzer according to the first embodiment.

  As shown in FIGS. 1 and 2, the automatic analyzer 1 includes reagent tables 2 and 3, a reaction table 4, a specimen container transfer mechanism 8, an analysis optical system 12, a cleaning mechanism 13, a control unit 15, and a stirring device 20. ing.

  As shown in FIG. 1, the reagent tables 2 and 3 hold a plurality of reagent containers 2a and 3a arranged in the circumferential direction, respectively, and are rotated by a driving unit to convey the reagent containers 2a and 3a in the circumferential direction.

  As shown in FIG. 1, the reaction table 4 has a plurality of reaction vessels 5 arranged in the circumferential direction, and is rotated forward or reverse by a driving means different from the driving means of the reagent tables 2 and 3 so that the reaction container 5 Transport. The reaction table 4 rotates clockwise (1 turn-1 reaction vessel) / 4 turns in one cycle and rotates (1 turn-1 reaction vessel) in four cycles.

  The reaction container 5 is a very small container having a capacity of several nL to several tens of μL, and transmits 80% or more of the light contained in the analysis light (340 to 800 nm) emitted from the light emitting part 12a of the analysis optical system 12. Transparent materials such as glass including heat-resistant glass, synthetic resins such as cyclic olefin and polystyrene are used. As shown in FIGS. 3 and 4, the reaction vessel 5 has a side wall 5a, 5b and a bottom wall to form a liquid holding portion having a quadrangular horizontal section for holding the liquid, and has an opening 5c at the top of the liquid holding portion. It is a square tube-shaped cuvette. The reaction container 5 constitutes the stirring device 20 together with the surface acoustic wave element 23 attached to the side wall 5a, and the inner surface of the liquid holding part is subjected to affinity processing for liquids such as a specimen and a reagent. The reaction container 5 is arranged on the reaction table 4 with the surface acoustic wave element 23 facing the traveling direction, and the reagent containers 2a and 3a of the reagent tables 2 and 3 are provided by the reagent dispensing mechanisms 6 and 7 provided in the vicinity of the reaction table 4. The reagent is dispensed from

  Here, the reagent dispensing mechanisms 6 and 7 are respectively provided with probes 6b and 7b for dispensing reagents on arms 6a and 7a that rotate in the direction of the arrow in a horizontal plane, and wash the probes 6b and 7b with washing water. Has cleaning means.

  As shown in FIG. 1, the sample container transfer mechanism 8 is a transfer unit that transfers a plurality of racks 10 arranged in the feeder 9 one by one along the arrow direction, and transfers the racks 10 while stepping. The rack 10 holds a plurality of sample containers 10a containing samples. Here, the sample container 10a is sampled by the sample dispensing mechanism 11 having the drive arm 11a and the probe 11b that rotate in the horizontal direction each time the step of the rack 10 transferred by the sample container transfer mechanism 8 stops. Is dispensed into each reaction vessel 5. For this reason, the specimen dispensing mechanism 11 has a cleaning means for cleaning the probe 11b with cleaning water.

  The analysis optical system 12 emits analysis light (340 to 800 nm) for analyzing the liquid in the reaction vessel 5 in which the reagent and the sample have reacted. As shown in FIG. 12b and a light receiving portion 12c. The analysis light emitted from the light emitting unit 12a passes through the liquid in the reaction vessel 5 and is received by the light receiving unit 12c provided at a position facing the spectroscopic unit 12b. The light receiving unit 12 c is connected to the control unit 15 and outputs a light amount signal of the received analysis light to the control unit 15.

  The cleaning mechanism 13 sucks and discharges the liquid in the reaction vessel 5 through the nozzle 13a, and then injects and sucks a cleaning liquid such as a detergent and cleaning water from the nozzle 13a, and repeats the suction operation a plurality of times, whereby the analysis optical system 12 The inside of the reaction vessel 5 in which the photometry is completed is washed.

  For example, a microcomputer or the like is used as the control unit 15 and is connected to each component of the automatic analyzer 1 as shown in FIGS. 1 and 2 to control the operation thereof, and the amount of light emitted from the light emitting unit 12a. The component concentration of the specimen is analyzed based on the absorbance of the liquid in the reaction container 5 based on the amount of light received by the light receiving unit 12c. The control unit 15 executes the analysis operation while controlling the operation of each component of the automatic analyzer 1 based on the analysis command input from the input unit 16 such as a keyboard, and inputs the analysis result and warning information as well as the input Various information based on the display command input from the unit 16 is displayed on the display unit 17 such as a display panel.

  The stirring device 20 stirs the liquid held in the reaction vessel 5 by sound waves generated by driving the surface acoustic wave element 23. In addition to the reaction vessel 5, as shown in FIGS. It has a body 21 and a surface acoustic wave element 23.

  The power transmission body 21 is disposed in a position facing the reaction vessel 5 in a horizontal direction at positions facing each other on the outer periphery of the reaction table 4, and power supplied from a high frequency AC power source of about several MHz to several hundred MHz is supplied to the surface acoustic wave element 23. Power to. The power transmission body 21 includes a drive circuit and a controller, and has a brush-like contactor 21a that abuts against an electrical terminal 23d of the surface acoustic wave element 23 as shown in FIG. At this time, as shown in FIG. 1, the power transmission body 21 is supported by the arrangement determining member 22, and transmits power from the contactor 21 a to the electrical terminal 23 d when the reaction table 4 stops rotating.

  The arrangement determining member 22 moves the power transmission body 21 during power transmission to transmit power from the power transmission body 21 to the electric terminal 23d, and thereby arranges the relative arrangement in the circumferential direction and the radial direction of the reaction table 4 between the power transmission body 21 and the electric terminal 23d. For example, a two-axis stage is used. Specifically, the arrangement determining member 22 stops its operation when the reaction table 4 rotates and power is not transmitted from the power transmission body 21 to the electrical terminal 23d, and the operation is stopped between the power transmission body 21 and the electrical terminal 23d. The distance is kept at a certain distance.

  Then, when the reaction table 4 stops rotating, the arrangement determining member 22 moves the power transmission body 21 under the control of the control unit 15, and the circumference of the reaction table 4 is set so that the power transmission body 21 and the electrical terminal 23d face each other. Adjust the position along the direction and determine the relative placement. Thus, when the reaction table 4 stops rotating, the power transmitting body 21 contacts the electrical terminal 23d with the contact 21a, and transmits power from the contact 21a to the electrical terminal 23d.

  As shown in FIGS. 3 and 5, the surface acoustic wave element 23 is provided with a vibrator 23b made of a plurality of comb-like electrodes (IDT) on one surface of a piezoelectric substrate 23a made of lithium niobate (LiNbO3) or the like. And a sound wave generating means provided with an electric terminal 23d serving as a power receiving means at the end of the bus bar 23c. The vibrator 23 b generates sound waves by the power transmitted from the power transmission body 21. The surface acoustic wave element 23 is attached to the side wall 5a of the reaction vessel 5 through an acoustic matching layer such as an epoxy resin or an ultraviolet curable resin with the vibrator 23b and the electric terminal 23d facing outward.

  At this time, as shown in FIG. 5, the surface acoustic wave element 23 is inclined in the width direction of the piezoelectric substrate 23a with respect to the plane orthogonal to the propagation directions Dp1 and Dp2 of the sound waves propagating in the piezoelectric substrate 23a while being reflected. A reflection end face 23e made of an inclined surface is formed. That is, the surface acoustic wave element 23 is formed by inclining a plurality of comb-like electrodes constituting the vibrator 23b with respect to the reflection end face 23e, so that the arrangement direction of the plurality of comb-like electrodes is changed to the reflection end face 23e. It is inclined with respect to. In addition, the reflection end face 23e is a boundary between the piezoelectric substrate 23a and the atmosphere having greatly different acoustic impedances, and thus becomes a discontinuous surface of acoustic impedance.

  Here, since the surface acoustic wave element 23 uses a comb-like electrode (IDT) as the vibrator 23b, the structure can be made simple and small. Therefore, the surface acoustic wave element 23 including the electrical terminal 23d is attached to the side wall 5a while avoiding the side wall 5b serving as a photometric window, as shown in FIG. 3, so as not to hinder the photometry by the analysis optical system 12. It is desirable.

  The automatic analyzer 1 configured as described above operates under the control of the control unit 15, and the reagent dispensing mechanism 6 is supplied to the plurality of reaction containers 5 conveyed along the circumferential direction by the rotating reaction table 4. , 7 sequentially dispenses the reagents from the reagent containers 2a, 3a. In the reaction container 5 into which the reagent has been dispensed, the specimen is dispensed sequentially from the plurality of specimen containers 10 a held in the rack 10 by the specimen dispensing mechanism 11.

  Then, each time the reaction table 4 stops, the reaction container 5 into which the reagent and the sample have been dispensed is sequentially stirred by the stirring device 20 so that the reagent and the sample react, and the reaction table 4 rotates again. Pass through system 12. At this time, the reaction solution in the reaction vessel 5 is photometrically measured by the light receiving unit 12c, and the concentration of the component is analyzed by the control unit 15. Then, after the photometry of the reaction liquid is completed, the reaction container 5 is washed by the washing mechanism 13 and then used again for analyzing the specimen.

  At this time, when the stirring device 20 transmits power from the power transmission body 21 and drives the surface acoustic wave element 23, as shown in FIG. 6, the sound wave (bulk wave) generated by the vibrator 23b is transmitted to the piezoelectric substrate 23a and the side wall. The liquid sample Ls propagates through 5a and enters the liquid sample Ls held in the reaction vessel 5, and an acoustic stream is generated in the liquid sample Ls to stir the liquid sample Ls. In this case, the sound wave (bulk wave) generated by the vibrator 23b includes a sound wave WbA that propagates in the piezoelectric substrate 23a while being reflected, a sound wave WbB that propagates in the side wall 5a while being reflected, and a sound wave that enters the liquid sample Ls. There is WbC. Of these sound waves, only the sound wave WbC contributes to the stirring of the liquid sample Ls, and the sound waves WbA and WbB are attenuated by propagating through the piezoelectric substrate 23a and the side wall 5a while being subjected to multiple reflections. 6 omits an acoustic matching layer disposed between the piezoelectric substrate 23a and the side wall 5a, and omits the acoustic matching layer in other drawings used in the following description. ing.

  Here, FIG. 7 shows sound waves and sound waves in the surface acoustic wave element 24 in which the surfaces orthogonal to the propagation directions Dp1 and Dp2 of the sound waves propagating in the piezoelectric substrate 24a and the reflection end surface 24e are parallel to the side wall 5a of the reaction vessel 5. FIG. With reference to FIG. 7, the propagation direction Dp of the emitted sound wave and the propagation direction Dr of the reflected sound wave generated by the vibrator 23b used in this specification will be described. In FIG. 7, out of the sound wave (bulk wave) generated by the vibrator 24b, the outgoing sound wave WbA propagating through the piezoelectric substrate 24a while reflecting and the outgoing sound wave WbB propagating through the side wall 5a while reflecting correspond to the vibrator 24b. With this position as a reference, the light propagates rightward and leftward in the longitudinal direction along the arrangement direction of the plurality of comb-like electrodes, and is reflected by the end surfaces of the piezoelectric substrate 24a and the side wall 5a to become reflected sound waves.

  At this time, in this specification, one of the propagation directions of the outgoing sound waves WbA and WbB is referred to as a propagation direction Dp1, and the other of the 180 ° propagation directions is referred to as a propagation direction Dp2. The sound waves reflected by the end surfaces of the piezoelectric substrate 24a and the side wall 5a are referred to as reflected sound waves WbAR and WbBR, and are indicated by broken lines in FIGS. 6, 7 and the drawings used in the following description, and the propagation directions are denoted by Dr1 and Dr2. Represent. However, since the lines are complicated, the propagation direction Dr2 is not shown in FIG. Furthermore, the propagation directions Dp1 and Dp2 of the emitted sound waves WbA and WbB and the propagation directions Dr1 and Dr2 of the reflected sound waves WbAR and WbBR are merely indicative of directions, and do not indicate the magnitude or strength of the sound waves. The same applies to examples and other embodiments.

  The surface acoustic wave element 23 shown in FIG. 5 is a reflection inclined with respect to a plane orthogonal to the propagation directions Dp1 and Dp2 of the sound wave propagating while reflecting in the piezoelectric substrate 23a among the sound waves generated by the vibrator 23b. An end face 23e is formed. For this reason, when the stirring device 20 is driven, as shown in FIG. 8, the sound wave generated by the vibrator 23b propagates in the propagation directions Dp1 and Dp2 through the piezoelectric substrate 23a while being reflected. When the sound wave is reflected by the reflection end face 23e, the sound wave propagates along propagation directions Dr1 and Dr2 different from the propagation directions Dp1 and Dp2.

  For this reason, the reflected sound wave reflected by the reflection end face 23e does not interfere with the emitted sound wave that is emitted from the vibrator 23b and propagates in the piezoelectric substrate 23a along the propagation directions Dp1 and Dp2. For this reason, the stirring device 20 has some heat generation in the piezoelectric substrate 23a along the propagation path of the sound wave generated by driving the surface acoustic wave element 23, but the reflected sound wave and the emitted sound wave do not interfere with each other. The heat generation of the piezoelectric substrate 23a along the sound wave propagation path due to the interference can be suppressed.

  At this time, the stirrer replaces the surface acoustic wave element 23, and the conventional surface elasticity shown in FIG. 9 in which the surface orthogonal to the propagation direction of the sound wave propagating in the piezoelectric substrate 24a while reflecting and the reflection end surface 24e are parallel to each other. It is assumed that the wave element 24 is used. Then, in the stirrer using the surface acoustic wave element 24, if the sound wave propagated along the propagation directions Dp1 and Dp2 in the piezoelectric substrate 24a while being reflected is reflected by the reflection end face 24e which is a discontinuous surface of the acoustic impedance, it propagates. Propagation occurs along propagation directions Dr1 and Dr2, which are opposite to the directions Dp1 and Dp2, by 180 degrees. For this reason, the reflected sound wave and the emitted sound wave interfere with each other, and the piezoelectric substrate 24a generates heat over the piezoelectric substrate 23a of the surface acoustic wave element 23 described above along the propagation path of the sound wave. Here, the surface acoustic wave elements described below, including the surface acoustic wave element 24, use corresponding reference numerals for the components corresponding to the surface acoustic wave element 23.

  That is, the stirrer using the surface acoustic wave element 24 is reflected by the sound wave WbA propagating while reflecting in the piezoelectric substrate 24a and the reflection end face 24e, as seen in the piezoelectric substrate 24a, as shown in FIGS. As a result of the interference with the reflected sound wave WbAR, the region Ai of the piezoelectric substrate 24a on the propagation path of the sound waves WbA and WbAR generates heat more than the piezoelectric substrate 23a where there is no sound wave interference.

  Further, looking at the side wall 5a of the reaction vessel 5, the stirrer using the surface acoustic wave element 24 propagates from the piezoelectric substrate 24a and reflects inside the side wall 5a as shown in FIGS. As a result of the interference between the sound wave WbB and the reflected sound wave WbBR reflected by the reflection end face 24e, the region Ai of the side wall 5a on the propagation path of the sound waves WbB and WbBR generates heat more than when there is no sound wave interference.

  As described above, the stirrer according to the first embodiment is compared with the stirrer using the surface acoustic wave element 24 having the reflection end surface 24e parallel to the surface orthogonal to the propagation direction of the sound wave propagating through the piezoelectric substrate 24a while reflecting. The apparatus 20 uses a surface acoustic wave element 23 having a reflection end face 23e that is inclined with respect to a plane orthogonal to the propagation direction of a sound wave propagating in the piezoelectric substrate 23a while being reflected.

  Therefore, in the stirring device 20, the piezoelectric substrate 23a generates heat along the propagation path of the sound wave generated by driving the surface acoustic wave element 23, but the reflected sound wave and the emitted sound wave do not interfere with each other. Compared with the agitator using 24, the heat generation of the piezoelectric substrate 23a along the sound wave propagation path due to sound wave interference can be suppressed.

  As shown in FIG. 5, the reflection end face 23e of the surface acoustic wave element 23 propagates a sound wave in which at least the crossing width Cw intersected by a plurality of comb-like electrodes constituting the vibrator 23b is extended in the sound wave propagation direction. The region may be an inclined surface inclined with respect to a surface orthogonal to the propagation direction of the sound wave propagating in the piezoelectric substrate 23a.

(Modification 1)
Here, the sound wave generating means used in the stirring device 20 may be attached to the bottom wall 5d of the reaction vessel 5 like a surface acoustic wave element 25 shown in FIG. In the surface acoustic wave element 25, a reflection end face 25e (see FIG. 15) inclined with respect to a plane orthogonal to the propagation direction of the sound wave propagating through the piezoelectric substrate 25a while reflecting the generated sound wave is formed on the piezoelectric substrate 25a. ing. Thus, even when the surface acoustic wave element 25 cannot be attached to the side wall 5a (see FIG. 10), the same effect can be obtained by attaching the surface acoustic wave element 25 to the bottom wall 5d. This increases the choice of the part where the sound wave generating means is arranged by design.

  FIG. 15 is a diagram schematically showing the propagation direction Dp1 of the outgoing sound wave that propagates while reflecting the surface acoustic wave element 25 and the piezoelectric substrate 25a, and the propagation direction Dr1 of the reflected sound wave. At this time, when the stirrer using the surface acoustic wave element 25 drives the surface acoustic wave element 25, the emitted sound wave propagated along the propagation direction Dp1 while reflecting inside the piezoelectric substrate 25a is a discontinuous surface of acoustic impedance. When reflected from the reflection end face 25e, the light propagates in a propagation direction Dr1 different from the propagation direction Dp1.

  Accordingly, in the surface acoustic wave element 25, the reflected sound wave reflected by the reflection end face 25e and propagating in the propagation direction Dr1 does not interfere with the emitted sound wave propagating in the piezoelectric substrate 25a along the propagation direction Dp1. For this reason, in the stirring device 20 using the surface acoustic wave element 25, the piezoelectric substrate 25a generates heat along the propagation path of the sound wave generated by driving the surface acoustic wave element 25, but the reflected sound wave and the emitted sound wave are generated. Since there is no interference, heat generation of the piezoelectric substrate 25a along the sound wave propagation path due to sound wave interference can be suppressed.

  Here, FIG. 16 shows a state in which a stirrer using a conventional surface acoustic wave element 26 in which a surface orthogonal to the propagation direction of a sound wave propagating in the piezoelectric substrate 26a while reflecting and a reflection end surface 26e are driven is driven. FIG. 3 is a diagram schematically showing propagation directions Dp1 and Dp2 of outgoing sound waves that propagate while reflecting inside the surface acoustic wave element 26 and the piezoelectric substrate 26a, and propagation directions Dr1 and Dr2 of reflected sound waves. FIG. 17 is a color image obtained by imaging the surface acoustic wave element 26 that is in a heat generation state by driving with a thermal infrared thermography apparatus.

  As shown in FIG. 17, when the outgoing sound wave propagating along the propagation directions Dp1 and Dp2 in the piezoelectric substrate 26a while being reflected is reflected by the reflection end face 26e which is a discontinuous surface of the acoustic impedance, the propagation direction changes by 180 °. Then, it propagates along the propagation directions Dr1 and Dr2 opposite to the propagation directions Dp1 and Dp2. Therefore, in the surface acoustic wave element 26, the reflected sound wave and the emitted sound wave interfere with each other on the sound wave propagation path, and the piezoelectric substrate 26a in the region H along the sound wave propagation path between the transducer 26b and the reflection end surface 26e. It can be seen that the heat generation is remarkable.

  On the other hand, FIG. 18 is a color image in which the surface acoustic wave element 25 that is in a heat generation state by driving is imaged by a thermal infrared thermography device, and the portion along the sound wave propagation direction Dp1 at the center of the piezoelectric substrate 25a becomes high temperature. I can read that. At this time, in order to see the heat generation part of the piezoelectric substrate 25a in detail, when viewing the black and white image shown in FIG. 19 in which the contrast of FIG. 18 is changed, the piezoelectric substrate 25a reflects the outgoing sound wave in different directions on the reflection end face 25e. Thus, it can be seen that the propagation path along the propagation direction Dp1 of the outgoing sound wave has a higher temperature than the propagation path along the propagation direction Dr1 of the reflected sound wave. However, it can be seen that the piezoelectric substrate 25a has a lower temperature on the propagation path than the piezoelectric substrate 26a of FIG. 17, and heat generation is suppressed.

(Modification 2)
The sound wave generating means used in the stirring device 20 has a reflection end surface that is inclined or curved with respect to a surface perpendicular to the propagation direction of the sound wave propagating in the piezoelectric substrate while reflecting the generated sound wave on the piezoelectric substrate. It only has to be. Therefore, in place of the reflection end face inclined with respect to the plane orthogonal to the sound wave propagation direction, the sound wave propagation direction with respect to the surface orthogonal to the sound wave propagation direction, such as the surface acoustic wave element 27 shown in FIG. A convex end surface 27e may be formed on the piezoelectric substrate 27a.

  At this time, as shown in FIG. 20, the reflection end face 27e is in a sound wave propagation region in which at least the crossing width Cw where the plurality of comb-like electrodes constituting the vibrator 27b cross is extended in the sound wave propagation directions Dp1 and Dp2. A curved convex surface having a tangent line T inclined with respect to a plane orthogonal to the propagation directions Dp1 and Dp2 of the sound wave propagating in the piezoelectric substrate 27a. Therefore, in the surface acoustic wave element 27, for example, the outgoing sound wave propagating in the propagation direction Dp1 is reflected in the propagation direction Dr1 different from the propagation direction Dp1 on the reflection end surface 27e, and the outgoing sound wave and the reflected sound wave interfere with each other. Therefore, heat generation of the piezoelectric substrate 27a along the propagation path of the sound wave due to the interference between the emitted sound wave and the reflected sound wave is suppressed.

  Further, like the surface acoustic wave element 28 shown in FIG. 21, a reflective end face 28e that is concavely curved in the sound wave propagation direction with respect to the surface orthogonal to the sound wave propagation direction may be formed on the piezoelectric substrate 28a. At this time, as shown in FIG. 21, the reflection end face 28e is piezoelectric in a sound wave propagation region in which a cross width Cw where at least a plurality of comb-like electrodes constituting the vibrator 28b cross is extended in the sound wave propagation direction Dp1. A curved concave surface having a tangent line T inclined with respect to a plane orthogonal to the propagation direction Dp1 of the sound wave propagating in the substrate 28a is used.

  When the reflection end surface 28e is formed into such a curved concave surface, the surface acoustic wave element 28 generates heat of the piezoelectric substrate 28a along the propagation path of the sound wave due to the interference between the emitted sound wave and the reflected sound wave, similarly to the surface acoustic wave element 27. Is suppressed. Here, FIG. 21 shows only the tangent line T on the propagation region of the sound wave extended in the propagation direction Dp1, but in the propagation region of the sound wave extended in the propagation direction Dp2 having a different 180 ° propagation direction, the inside of the piezoelectric substrate 28a is shown. Needless to say, a curved concave surface whose tangent line is inclined with respect to a plane orthogonal to the propagation direction Dp2 of the propagating sound wave is also provided.

  However, as in the surface acoustic wave element 29 shown in FIG. 22, even if the reflection end face 29e is a curved convex surface, at least the crossing width Cw at which the plurality of comb-like electrodes constituting the vibrator 29b cross is set to the sound wave propagation direction. In the propagation region of the sound wave extended to Dp1 and Dp2, those in which the tangent line T is not inclined with respect to the plane orthogonal to the propagation direction Dp1 and Dp2 of the sound wave propagating in the piezoelectric substrate 29a are not used in the stirring device 20. In the surface acoustic wave element 29, the tangent line T is parallel to the plurality of comb-like electrodes constituting the vibrator 29b, so that the emitted sound wave and the reflected sound wave interfere with each other on the propagation path of the sound wave. This is because heat is generated more than when the piezoelectric substrate 29a does not interfere along the sound wave propagation path. This relationship is the same when the reflecting end surface is a curved concave surface.

  Further, when the reflection end surface is a curved convex surface, like the surface acoustic wave element 31 shown in FIG. 23, the piezoelectric substrate 31a is formed into an elliptical shape, and the vibrator 31b is disposed at one focal point (F1). When the sound wave generated by the vibrator 31b is reflected by the reflection end face 31e, the reflected sound wave is focused on the other focal point (F2) in the piezoelectric substrate 31a and interferes with each other, and local heat generation of the piezoelectric substrate 31a occurs. . For this reason, when the reflection end surface is a curved convex surface, at least the crossing width where the plurality of comb-like electrodes constituting the vibrator 31b cross is extended in the sound wave propagation direction, and propagates in the piezoelectric substrate 31a. Even if the tangent line is inclined with respect to the plane orthogonal to the propagation direction of the sound wave to be transmitted, the piezoelectric substrate 31a is formed into an ellipse and the vibrator 31b is not disposed at one focal point.

(Modification 3)
Furthermore, if the sound wave generating means used in the stirring device 20 can suppress the interference between the emitted sound wave and the reflected sound wave, it is orthogonal to the propagation direction Dp of the emitted sound wave as in the surface acoustic wave element 32 shown in FIG. A reflection end face 32e having a diffused reflection surface may be formed on the piezoelectric substrate 32a. When such a reflection end face 32e is formed, the surface acoustic wave element 32 has, as shown in FIG. 25, for example, an outgoing sound wave propagating in the propagation direction Dp1 is transmitted in the propagation direction Dr1, Dr2,. (n-1), diffusely reflected to Drn, and interference between the reflected sound wave and the emitted sound wave on the propagation path of the sound wave is suppressed. The same applies to the outgoing sound wave propagating in the propagation direction Dp2, which is different from the propagation direction Dp1 by 180 °.

  For this reason, since the stirring device 20 using the surface acoustic wave element 32 can suppress the interference between the reflected sound wave and the emitted sound wave, the heat generation of the piezoelectric substrate 32a along the sound wave propagation path due to the sound wave interference can be suppressed. it can. In this case, the reflective end face 32e is processed into an irregularly reflective surface, for example, by subjecting the piezoelectric substrate 32a to chemical treatment with chemicals or physical treatment such as sandblasting.

(Embodiment 2)
Next, a second embodiment of the stirring device and the automatic analyzer according to the present invention will be described in detail with reference to the drawings. FIG. 26 is a perspective view showing a surface acoustic wave element of a stirrer used in the automatic analyzer of the second embodiment and a reaction vessel equipped with the surface acoustic wave element. FIG. 27 is a cross-sectional view of an essential part for explaining the reflection of sound waves in the piezoelectric substrate of the surface acoustic wave device by cutting the reaction container of FIG. 26 in the vertical direction. Although the stirrer of the first embodiment suppresses heat generation of the piezoelectric substrate by the shape in the width direction of the end face of the piezoelectric substrate in the surface acoustic wave element to be used, the stirrer of the second embodiment uses the piezoelectric substrate in the surface acoustic wave element. Heat generation of the piezoelectric substrate is suppressed by the shape of the end face in the thickness direction. Here, since the automatic analyzer and the stirring device of each embodiment described below are the same as the automatic analyzer 1 and the stirring device 20 of the first embodiment, description thereof is omitted.

  The stirring device 20 used in the automatic analyzer according to the second embodiment uses the surface acoustic wave element 34 shown in FIG. 26 attached to the side wall 5 a of the reaction vessel 5.

  As shown in FIGS. 26 and 27, the surface acoustic wave element 34 has a thickness with respect to a surface orthogonal to the propagation directions Dp1 and Dp2 of the sound waves that propagate while reflecting the inside of the piezoelectric substrate 34a among the sound waves generated by the vibrator 34b. A reflection end face 34e inclined in the vertical direction is formed.

  Accordingly, when the agitator 20 is driven, the surface acoustic wave element 34 propagates while the reflected sound wave WbA generated by the vibrator 34b is reflected inside the piezoelectric substrate 34a and is reflected by the reflection end face 34e, as shown in FIG. The reflected sound wave WbAR propagates in a direction different from that of the emitted sound wave WbA.

  For this reason, the surface acoustic wave element 34 includes a reflected sound wave WbAR reflected by the reflection end face 34e and an emitted sound wave WbA that is emitted from the transducer 34b and propagates in the piezoelectric substrate 34a along the propagation directions Dp1 and Dp2. Does not interfere. Therefore, the surface acoustic wave element 34 can suppress the heat generation of the piezoelectric substrate 34a due to the interference of sound waves in the sound wave propagation path in the vicinity of the reflection end face 34e.

  However, as shown in FIGS. 27 and 28, the surface acoustic wave element 34 has an angle formed by the side wall 5a of the reaction vessel 5 and the reflection end surface 34e in the atmosphere θ1, and the piezoelectric wave of the emitted sound wave WbA generated by the vibrator 34b. When the radiation angle to the substrate 34a is α1, the angle θ1 is set to a different angle from the radiation angle α1. In the surface acoustic wave element 34, when the angle θ1 is equal to the radiation angle α1, as shown in FIG. 28, the emitted sound wave WbA is incident perpendicularly to the reflection end face 34e and reflected in directions different by 180 °. For this reason, in the surface acoustic wave element 34, the reflected sound wave WbAR and the emitted sound wave WbA interfere in the vicinity of the reflection end face 34e, and the region Ai on the propagation path of the piezoelectric substrate 34a generates heat.

  In the case where the piezoelectric substrate 34a has the shape shown in FIG. 29, if the angle θ1 is equal to the radiation angle 180 ° −α1, the reflected sound wave WbAR and the emitted sound wave WbA interfere with each other in the vicinity of the reflection end surface 34e, and propagate through the piezoelectric substrate 34a. The area on the path generates heat.

  Here, the case where the angle θ1 formed between the side wall 5a and the reflection end face 34e in the atmosphere is equal to the radiation angle α1 or the radiation angle 180 ° −α1 at both locations has been described, but one of the angles θ1 is the radiation angle α1. Even if the other of the angles θ1 is equal to the radiation angle 180 ° −α1, the region on the propagation path of the piezoelectric substrate 34a generates heat as described above.

  In FIG. 27, the reaction vessel 5 is hatched, but for the piezoelectric substrate 34a, the outgoing sound wave WbA, the reflected sound wave WbAR, the angle θ1, the radiation angle α1, and the like are clearly shown to avoid the complication of lines in the drawing. Hatching is omitted. Also in the drawings used in the following description, in order to avoid the complication of lines in the drawings, the front part or part of hatching is omitted as necessary.

(Modification 1)
Here, the sound wave generating means used in the stirring device 20 may be used by being attached to the bottom wall 5d of the reaction vessel 5, like a surface acoustic wave element 34 shown in FIG. Thereby, the stirrer 20 increases the degree of freedom of arrangement of the surface acoustic wave element 34 by design.

(Modification 2)
Further, the sound wave generating means used in the stirring device 20 is a reflective end face curved convexly outward in the thickness direction, like a surface acoustic wave element 35 shown in FIG. 31, instead of the reflective end face inclined in the thickness direction. 35e may be formed on the piezoelectric substrate 35a.

  When such a reflection end face 35e is formed, the surface acoustic wave element 35, as shown in FIG. 31, reflects the outgoing sound wave WbA propagating through the piezoelectric substrate 35a while being reflected at the reflection end face 35e, and the outgoing sound wave WbA. Are reflected in different directions. For this reason, since the surface acoustic wave element 35 does not interfere with the outgoing sound wave WbA and the reflected sound wave WbAR on the propagation path, the piezoelectric substrate along the sound wave propagation path due to the interference between the outgoing sound wave WbA and the reflected sound wave WbAR. The heat generation of 35a is suppressed.

  However, as shown in FIG. 32, the surface acoustic wave element 35 has an angle formed by the tangent T1 at the incident point where the outgoing sound wave WbA is perpendicularly incident on the reflection end face 35e and the side wall 5a of the reaction vessel 5 in the atmosphere θ2 ( <90 °), and when the emission angle of the emitted sound wave WbA generated by the transducer 35b to the side wall 5a is α1, the angle θ2 is set to an angle different from the emission angle α1 (θ2 ≠ α1). This is because when the outgoing sound wave WbA is perpendicularly incident on the reflection end face 35e, the reflected sound wave WbAR and the outgoing sound wave WbA interfere with each other in the vicinity of the reflection end face 35e, and the region on the propagation path of the piezoelectric substrate 35a. This is because Ai generates heat. At this time, the condition under which the emitted sound wave WbA is perpendicularly incident on the reflection end face 35e is from θ2 + (90 ° −α1) = 90 ° to θ2 = α1 as shown in FIG.

  On the other hand, for the same reason, the surface acoustic wave element 35 has an angle θ3 (> 90) between the tangent T2 at the incident point where the outgoing sound wave WbA is perpendicularly incident on the reflection end face 35e and the side wall 5a of the reaction vessel 5 in the atmosphere. )), And when the radiation angle of the emitted sound wave WbA generated by the transducer 35b is α1, the angle θ3 is set to an angle different from 180 ° −α1 (θ3 ≠ 180 ° −α1).

  Further, like the surface acoustic wave element 36 shown in FIG. 33, a reflective end face 36e that is concavely curved inward in the thickness direction may be formed on the piezoelectric substrate 36a. In this case, the inclination angle of the tangent line with respect to the reflection end face 36e is determined in the same manner as the surface acoustic wave element 35.

(Modification 3)
Further, if the sound wave generating means used in the stirring device 20 can suppress the interference between the emitted sound wave and the reflected sound wave on the piezoelectric substrate, the propagation direction Dp of the emitted sound wave as in the surface acoustic wave element 37 shown in FIG. A reflection end surface 37e having a surface orthogonal to the irregular reflection surface may be formed on the piezoelectric substrate 37a. When such a reflection end surface 37e is formed, the surface acoustic wave element 37, as shown in FIG. 35, for example, the emitted sound wave WbA propagating upward in the piezoelectric substrate 37a is irregularly reflected on the reflection end surface 37e and is reflected in the reflection direction. Since it becomes a plurality of different reflected sound waves WbAR, interference between the reflected sound wave and the emitted sound wave on the propagation path of the sound wave is suppressed. The same applies to the outgoing sound wave WbA propagating downward in the piezoelectric substrate 37a having a propagation direction different by 180 °.

  For this reason, since the stirring device 20 using the surface acoustic wave element 37 can suppress the interference between the reflected sound wave and the emitted sound wave, it can suppress the heat generation of the piezoelectric substrate 37a along the propagation path of the sound wave due to the interference of the sound wave. it can.

(Embodiment 3)
Next, a third embodiment of the stirring device and the automatic analyzer according to the present invention will be described in detail with reference to the drawings. FIG. 36 is a perspective view showing a surface acoustic wave element of a stirrer used in the automatic analyzer according to the third embodiment and a reaction vessel equipped with the surface acoustic wave element. FIG. 37 is a front view of the reaction vessel shown in FIG. Although the stirrers of the first and second embodiments suppress the heat generation of the piezoelectric substrate by the shape of the piezoelectric substrate in the surface acoustic wave element to be used, the stirrer of the third embodiment has a wall surface shape by the shape of the wall surface of the reaction vessel. The fever is suppressed.

  As shown in FIG. 36, the stirring device 20 used in the automatic analyzer of Embodiment 3 uses the surface acoustic wave element 24 attached to the side wall 5a of the reaction vessel 5A.

  As shown in FIG. 36, the reaction vessel 5A has a reflection end face 5e formed of an inclined surface inclined in the width direction of the wall surface of the reaction vessel 5A with respect to a surface orthogonal to the propagation direction of the sound wave propagating in the side wall 5b while reflecting. Is formed on the bottom wall 5d. That is, in the reaction vessel 5A, the bottom wall 5d is inclined by making the length of the lower part of the opposite side wall 5b different, and the reflection end face 5e is formed in the lower part of the side wall 5a.

  Therefore, when the stirring device 20 is driven, the surface acoustic wave element 24 propagates from the piezoelectric substrate 24a to the side wall 5a among the sound waves generated by the vibrator 24b, and reflects inside the side wall 5a while reflecting as shown in FIG. The sound wave propagating along the propagation direction Dp2 is reflected by the reflection end face 5e and propagates along the propagation direction Dr2 different from the propagation direction.

  For this reason, in the reaction vessel 5A, the reflected sound wave reflected by the reflection end face 5e does not interfere with the emitted sound wave that is emitted from the transducer 24b and propagates in the side wall 5a along the propagation direction Dp2. Therefore, when the stirring device 20 is driven, the reaction vessel 5A can suppress heat generation of the side wall 5a due to sound wave interference in the sound wave propagation path in the vicinity of the reflection end face 5e.

  The reaction vessel 5A used in the stirring device 20 has a reflection end surface composed of an inclined surface inclined in the width direction of the wall surface of the reaction vessel 5A with respect to a surface orthogonal to the propagation direction of the sound wave propagating in the side wall 5a while reflecting. If so, as shown in FIG. 38, a reflective end face 5e may be formed on the upper part of the side wall 5a. In this case, the reaction vessel 5A has the reflection end faces 5e formed on the two side walls 5a, but the reflection end face 5e may be formed only on the side walls 5a to which the surface acoustic wave elements 24 are attached.

(Modification 1)
Here, the reaction vessel used in the stirring device 20 has a reflection end surface that is inclined or curved in the width direction of the wall surface of the reaction vessel with respect to the surface orthogonal to the propagation direction of the sound wave propagating in the side wall 5b while reflecting. If so, a reflective end face 5f made of a curved surface curved in the width direction of the side wall 5b may be formed on the bottom wall 5d as in the reaction vessel 5B shown in FIG. That is, the reaction vessel 5B is formed with a reflection end face 5f in which the bottom wall 5d is curved in the width direction of the side wall 5b and the bottom wall 5a is curved in the width direction.

  Therefore, when the stirring device 20 is driven, the surface acoustic wave element 24 propagates from the piezoelectric substrate 24a to the side wall 5a among the sound waves generated by the vibrator 24b, and reflects inside the side wall 5a while reflecting as shown in FIG. The sound wave propagating along the propagation direction Dp2 is reflected by the reflection end face 5f and propagates along the propagation direction Dr2 different from the propagation direction.

  For this reason, in the reaction vessel 5B, the reflected sound wave reflected by the reflection end face 5f does not interfere with the emitted sound wave that is emitted from the transducer 24b and propagates through the side wall 5a. Therefore, when the stirring device 20 is driven, the reaction vessel 5B can suppress the heat generation of the side wall 5a along the sound wave propagation path due to the sound wave interference in the sound wave propagation path near the reflection end face 5f.

  If the reaction vessel 5B is a reflection end face made of a curved surface inclined in the width direction of the wall surface of the reaction vessel 5B with respect to the surface orthogonal to the propagation direction of the sound wave propagating in the side wall 5a while reflecting, FIG. As shown in FIG. 5, the upper end of the side wall 5a to which the surface acoustic wave element 24 is attached may be extended upward, and the upper end of the side wall 5a may be curved in the width direction to form the reflection end face 5f.

(Modification 2)
Further, if the reaction vessel used in the stirring device 20 can suppress interference between the emitted sound wave and the reflected sound wave, the surface orthogonal to the propagation direction Dp of the emitted sound wave is diffusely reflected as in the reaction vessel 5C shown in FIG. The reflection end face 5g as a surface may be formed on the upper and lower end faces of the side wall 5a. When such a reflection end face 5g is formed, the reaction vessel 5C, as shown in FIG. 43, for example, emits a sound wave propagating in the upper propagation direction Dp1 in the side wall 5a, and propagates in the propagation directions Dr1, Dr2,. ... diffusely reflected to Dr (n-1) and Drn, and interference between the reflected sound wave and the emitted sound wave on the propagation path of the sound wave is suppressed. The same applies to the outgoing sound wave propagating downward in the side wall 5a having a propagation direction different by 180 °.

  For this reason, the stirring device 20 using the reaction vessel 5C can suppress the interference between the reflected sound wave and the emitted sound wave, and therefore can suppress the heat generation of the side wall 5a along the propagation path of the sound wave due to the interference of the sound wave.

(Modification 3)
Furthermore, if the reaction vessel used in the stirring device 20 can suppress the interference between the emitted sound wave and the reflected sound wave on the wall of the reaction vessel, the reaction vessel 5D shown in FIG. The both sides in the longitudinal direction of the circular bottom wall 5d may be the reflection end surfaces 5h, and the surface acoustic wave element 24 may be attached to the lower surface of the oval bottom wall 5d.

  When the bottom wall 5d is made into an oval shape, the reaction vessel 5D is emitted from the vibrator 24b of the surface acoustic wave element 24 when the stirrer 20 is driven, and reflected in the propagation directions Dp1 and Dp2 while reflecting inside the bottom wall 5d. When the propagating outgoing sound wave is reflected by the reflection end face 5h, it propagates along propagation directions Dr1 and Dr2 different from the propagation directions Dp1 and Dp2.

  For this reason, in the reaction vessel 5D, the reflected sound wave reflected by the reflection end surface 5h does not interfere with the emitted sound wave that is emitted from the transducer 24b and propagates through the side wall 5a. Therefore, when the stirring device 20 is driven, the reaction vessel 5D can suppress the heat generation of the bottom wall 5d along the sound wave propagation path due to the sound wave interference in the sound wave propagation path near the reflection end face 5h.

  At this time, in the reaction vessel 5D used in the stirring device 20, as described in the surface acoustic wave element 29 according to the second modification of the first embodiment, a plurality of comb-like electrodes constituting the vibrator 24b intersect. In the sound wave propagation region in which the crossing width is extended in the sound wave propagation directions Dp1 and Dp2, only the tangent line of the reflection end face 5h is inclined with respect to the surface orthogonal to the sound wave propagation directions Dp1 and Dp2 propagating in the piezoelectric substrate 24a. Do not use the one whose tangent is not inclined. Alternatively, the reaction vessel 5D may be formed into a square tube shape by the side walls 5a and 5b, and only the bottom wall 5d may be formed into an oval shape. If it does in this way, processing of reaction container 5D will become easy.

(Embodiment 4)
Next, a fourth embodiment of the stirring device and the automatic analyzer according to the present invention will be described in detail with reference to the drawings. FIG. 45 is a perspective view showing a surface acoustic wave element of a stirrer used in the automatic analyzer of the fourth embodiment and a reaction vessel equipped with the surface acoustic wave element. Although the stirring device of Embodiment 3 suppressed heat generation of the wall surface by the shape of the wall surface in the reaction vessel to be used, the stirring device of Embodiment 4 has a wall surface by the shape of the wall surface of the reaction vessel in the thickness direction. The fever is suppressed.

  The stirring apparatus 20 of Embodiment 4 uses a reaction vessel 5E shown in FIG. In the reaction vessel 5E, a reflection end face 5i made of an inclined surface inclined inward of the vessel is formed at the intersection of the side wall 5a to which the surface acoustic wave element 24 is attached and the bottom wall 5d. The reflection end face 5i is inclined in the thickness direction of the side wall 5a with respect to the plane orthogonal to the propagation direction of the sound wave propagating in the side wall 5b while reflecting.

  Therefore, when the stirring device 20 is driven, the sound wave generated by the vibrator 24b propagates from the piezoelectric substrate 24a to the side wall 5a, and as shown in FIG. Reflected by the reflection end face 5i. At this time, if the radiation angle of the sound wave incident from the piezoelectric substrate 24a to the side wall 5a is α2, and the angle formed by the bottom surface 5d of the reflection end surface 5i is β1, the emitted sound wave WbB is incident perpendicularly to the reflection end surface 5i. As shown in FIG. 46, the condition is from α2 + β1 = 90 ° to β1 = 90 ° −α2.

  Therefore, the reaction vessel 5E sets the angle β1 of the reflection end surface 5i to β1 ≠ 90 ° −α2 with respect to the radiation angle α2 of the sound wave incident on the side wall 5a. When the stirrer 20 using the reaction vessel 5E set in this way drives the surface acoustic wave element 24, if the outgoing sound wave WbB propagating in the side wall 5a is reflected at the reflection end face 5i, the direction is different from that of the outgoing sound wave WbB. Reflected to. As a result, in the reaction vessel 5E, the emitted sound wave WbB and the reflected sound wave WbBR do not interfere with each other on the propagation path, so that the heat generation of the side wall 5a along the sound wave propagation path due to the interference between the emitted sound wave WbB and the reflected sound wave WbBR. Is suppressed.

  Here, in the reaction vessel 5E, as shown in FIG. 47, the surface acoustic wave element 24 may be attached to the bottom wall 5d. Thereby, the design of the stirring device 20 increases the degree of freedom when the surface acoustic wave element 24 is arranged in the reaction vessel 5E.

  Further, if the reaction vessel 5E can suppress the heat generation of the side wall 5a along the propagation path of the sound wave due to the interference between the emitted sound wave and the reflected sound wave, as shown in FIG. 48, as shown in FIG. You may form in. At this time, as shown in FIG. 49, the radiation angle of the sound wave incident on the side wall 5a from the piezoelectric substrate 24a is α2, and the angle formed with respect to the side wall 5a of the reflection end face 5i is β2. Then, the reaction vessel 5E sets the angle β2 of the reflection end surface 5i to β2 ≠ α2 in consideration of the condition (β2 + (90 ° −α2) = 90 °) where the outgoing sound wave WbB is perpendicularly incident on the reflection end surface 5i. .

  Further, when the angle β2 of the reflection end face 5i with respect to the sound wave emission angle α2 is set as β2 <90 °, β2 ≠ α2, 180 ° −α2, the reaction vessel 5E generates sound waves due to interference between the emitted sound waves and the reflected sound waves. In addition to the effect that the heat generation of the heat generation side wall 5a of the side wall 5a along the propagation path of the liquid crystal can be suppressed, the reflection end surface 5i is inclined toward the inside of the reaction vessel 5E. There is an advantage that the droplet Dr of the sample Ls can be easily introduced.

(Modification 1)
Here, the reaction vessel used in the stirring device 20 is replaced with a reflection end face formed of an inclined surface, as shown in a reaction vessel 5F shown in FIG. You may form the reflection end surface 5j which consists of a curved surface which curves inside a container in a crossing part. That is, the reaction vessel 5B has a reflection end face 5j that is curved in the thickness direction at the lower part of the side wall 5a.

  Therefore, when the agitator 20 is driven, the surface acoustic wave element 24 is generated by the vibrator 24b and propagates from the piezoelectric substrate 24a to the side wall 5a, and as shown in FIG. The sound wave WbB is reflected by the reflection end face 5j, and the reflected sound wave WbBR propagates in a direction different from the outgoing sound wave WbB.

  For this reason, in the reaction vessel 5F, the reflected sound wave WbBR reflected by the reflection end face 5j does not interfere with the emitted sound wave WbB emitted from the transducer 24b and propagating through the side wall 5a. Therefore, when the stirring device 20 is driven, the reaction vessel 5F can suppress heat generation of the side wall 5a along the sound wave propagation path in the vicinity of the reflection end face 5j due to sound wave interference.

  However, in the reaction vessel 5F, as shown in FIG. 50, the radiation angle of the sound wave incident on the side wall 5a from the piezoelectric substrate 24a is α2, and the tangent line T of the sound wave incident on the reflection end surface 5j is a line extending the bottom wall 5d. When the angle formed is β3, the angle β3 of the reflection end surface 5i is set to β3 + α2 ≠ 90 ° in consideration of the condition (β3 + α2 = 90 °) that the outgoing sound wave WbB is perpendicularly incident on the reflection end surface 5j.

(Modification 2)
Moreover, if the reaction container used with the stirring apparatus 20 can suppress interference with an emitted sound wave and a reflected sound wave, as shown in the reaction container 5G shown in FIG. 51, the arrow of the side wall 5a and bottom wall 5d of the crossing part will be shown. The reflection end surface 5k may be formed with the surface in the range indicated by the irregular reflection surface. When such a reflection end face 5k is formed, the reaction vessel 5G, as shown in FIG. 51, for example, the outgoing sound wave WbB propagating downward in the side wall 5a is irregularly reflected by the reflection end face 5k. For this reason, in the reaction vessel 5G, interference between the reflected sound wave WbBR and the emitted sound wave WbB on the propagation path of the sound wave is suppressed.

  For this reason, since the stirring device 20 using the reaction vessel 5G can suppress the interference between the reflected sound wave and the emitted sound wave, the heat generation of the side wall 5a along the sound wave propagation path due to the sound wave interference can be suppressed.

(Embodiment 5)
Next, a fifth embodiment of the stirring device and the automatic analyzer according to the present invention will be described in detail with reference to the drawings. FIG. 52 is a perspective view showing a surface acoustic wave element of a stirring device used in the automatic analyzer of Embodiment 5 and a reaction vessel equipped with the surface acoustic wave element. FIG. 53 is a cross-sectional view of the reaction vessel cut in the longitudinal direction at the center of the surface acoustic wave device. Although the stirrers of the third and fourth embodiments suppress the heat generation of the wall surface by the shape related to the wall surface of the reaction vessel to be used, the stirrer of the fifth embodiment is provided with a guiding portion that guides the sound wave away from the reaction vessel. This suppresses heat generation on the wall surface.

  The stirring device 20 of Embodiment 5 uses a reaction vessel 5H shown in FIG. As shown in FIGS. 52 and 53, the reaction vessel 5E is provided with a projecting edge-shaped guiding portion 5m projecting outward from the side wall 5a to the lower portion of the side wall 5a to which the surface acoustic wave element 24 is attached. A bottom wall is formed. The guiding portion 5m is a portion that guides the sound wave propagating in the side wall 5a in a direction away from the reaction vessel 5H. The guiding portion 5m is formed from the same material as the side wall 5a, and has a reflection end surface 5n formed of an irregular reflection surface on the end surface. The bottom surface member 51 is a quadrangular member having an inclined surface that decreases outward and formed around the bottom surface member 51, and is bonded to the lower portions of the side walls 5a and 5b by an adhesive layer 52. At this time, the surface of the adhesive layer 52 on the side of the guiding portion 5m serves as an acoustic impedance boundary.

  Therefore, the reaction vessel 5H has the side wall 5a when the acoustic impedances of the guiding portion 5m, the bottom member 51, and the adhesive layer 52 are Z1, Z2, and Z3, respectively, and the wavelength of the sound wave is L. In order to propagate the sound wave propagating through the inside to the guiding portion 5m away from the reaction vessel 5H instead of the bottom surface member 51, it is necessary to satisfy the relationship of the following equation.

Z3 ≠ (Z1 + Z2) / 2
Z1 <Z2 <Z3, or Z3 <Z1 <Z2, or Z2 <Z1 <Z3, or Z3 <Z2 <Z1
L ≠ (λ / 2) · n (n is a natural number)

  However, since the induction | guidance | derivation part 5m and the bottom face member 51 may be the same raw materials, what is necessary is just to satisfy | fill the following formula | equation about acoustic impedance.

Z1 = Z2 <Z3, or Z3 <Z1 = Z2

  Therefore, when the agitator 20 is driven, among the sound waves generated by the vibrator 24b, as shown in FIG. 54, the emitted sound wave WbB that propagates from the piezoelectric substrate 24a to the side wall 5a and propagates in the side wall 5a while being reflected is Due to the difference in acoustic impedance, the light is reflected on the surface of the adhesive layer 52 and propagates to the guiding portion 5m moving away from the reaction vessel 5H. The outgoing sound wave WbB propagated to the guiding part 5m in this way is irregularly reflected by the reflection end face 5n. For this reason, in the reaction vessel 5H, interference between the reflected sound wave WbBR and the emitted sound wave WbB on the propagation path of the guiding portion 5m is suppressed.

  For this reason, the stirring device 20 using the reaction vessel 5H guides the outgoing sound wave WbB to the guiding portion 5m moving away from the reaction vessel 5H and suppresses the interference between the reflected sound wave and the outgoing sound wave in the guiding portion 5m. Heat generation of the guiding portion 5m along the sound wave propagation path due to interference can be suppressed.

  At this time, as shown in FIG. 54, the radiation angle of the sound wave incident on the side wall 5a from the piezoelectric substrate 24a is α2, and the adhesive layer 52 disposed between the guiding portion 5m and the bottom member 51 is on the bottom surface of the bottom member 51. Assuming that the angle formed by β4 is β4, the condition for the outgoing sound wave WbB to be perpendicularly incident on the adhesive layer 52 is (90 ° −α2) + β4 = 180 ° to β4 = α2 + 90 °.

  Therefore, the reaction vessel 5H sets an angle β4 formed by the adhesive layer 52 with respect to the bottom surface of the bottom member 51 to β4 ≠ α2 + 90 ° with respect to the radiation angle α2 of the sound wave incident on the side wall 5a. In the stirring device 20 using the reaction vessel 5H set in this way, when the surface acoustic wave element 24 is driven and the emitted sound wave WbB propagating in the side wall 5a is reflected by the adhesive layer 52, the direction is different from that of the emitted sound wave WbB. Reflected to. As a result, in the reaction vessel 5H, the outgoing sound wave WbB and the reflected sound wave WbBR do not interfere with each other on the propagation path, and the reflected sound wave WbBR is irregularly reflected on the reflection end face 5n, so that the sound wave interference is suppressed. Heat generation of the guiding portion 5m along the path is suppressed.

(Modification 1)
Here, the reaction vessel used in the stirring device 20 may be provided with the guide member 53 at the lower part of the two side walls 5a as in the reaction vessel 5I shown in FIG. The guiding member 53 is a part that guides the sound wave propagating in the side wall 5a in a direction away from the reaction vessel 5I, and an adhesive surface 53a cut obliquely is formed on one side, and a reflection end surface 53b made of a diffuse reflection surface is formed on the other end surface. Is formed. Further, the reaction vessel 5I is formed with an inclined surface 5p inclined on the side surface of the bottom wall 5d corresponding to the adhesive surface 53a. In the reaction vessel 5I, the inclined surface 5p and the bonding surface 53a are bonded by the bonding layer 54.

  Therefore, the reaction container 5I has the adhesive layer 54 when the acoustic impedances of the side wall 5a, the guide member 53, and the adhesive layer 54 are Z1, Z4, and Z3, and the wavelength of the sound wave is L. Becomes a boundary portion of acoustic impedance, and the sound wave propagating in the side wall 5a needs to satisfy the relationship of the following equation in order to propagate to the guiding member 53 moving away from the reaction vessel 5I.

Z3 = (Z1 + Z4) / 2
L = (λ / 2) · n (n is a natural number)

  Accordingly, when the agitating device 20 is driven, the surface acoustic wave element 24 is generated by the vibrator 24b and propagates from the piezoelectric substrate 24a to the side wall 5a, and as shown in FIG. The sound wave WbB passes through the adhesive layer 54 and propagates to the guide member 53. At this time, a part of the emitted sound wave WbB is reflected by the adhesive layer 54 and propagates toward the bottom wall 5d.

  And since the emitted sound wave WbB propagated to the guiding member 53 is irregularly reflected by the reflection end face 53b, interference between the reflected sound wave and the emitted sound wave is suppressed. For this reason, when the stirring device 20 is driven, the reaction vessel 5I can suppress the heat generation of the guide member 53 along the propagation path of the sound wave due to the interference of the sound wave.

  At this time, as shown in FIG. 56, the reaction vessel 5I has a sound wave emitted from the piezoelectric substrate 24a that is incident on the side wall 5a as α2 and an angle between the adhesive layer 54 and the bottom wall 5d lower surface as β5. The angle β5 of the adhesive layer 54 is set to β5 = 90 ° + α2 in consideration of the condition (β5−90 ° = α2) where WbB is perpendicularly incident on the adhesive layer 54.

(Modification 2)
Here, the reaction vessel used in the stirring device 20 may be provided with a recess 5q formed of a semicircular groove between the guiding portion 5m and the bottom wall 5d, as in the reaction vessel 5J shown in FIGS. Good. In the reaction vessel 5J, since the concave portion 5q serves as a sound wave reflection end surface as a boundary portion of the acoustic impedance, the emitted sound wave propagating in the side wall 5a while being reflected can be guided to the guide portion 5m by the difference in acoustic impedance.

  Therefore, when the agitator 20 is driven, the surface acoustic wave element 24 is generated by the vibrator 24b and propagates from the piezoelectric substrate 24a to the side wall 5a, and as shown in FIG. The sound wave WbB is reflected by the recess 5q due to the difference in acoustic impedance, and the reflected sound wave WbBR propagates in a direction different from that of the outgoing sound wave WbB.

  For this reason, the reaction vessel 5J does not interfere with the reflected sound wave WbBR reflected by the recess 5q and the emitted sound wave WbB emitted from the transducer 24b and propagating through the side wall 5a. Moreover, since the sound wave guided to the guiding portion 5m side is irregularly reflected by the reflection end face 5n as shown in FIG. 59, interference between the reflected sound waves WbBR and interference between the reflected sound wave WbBR and the emitted sound wave WbB are suppressed. . Therefore, when the stirring device 20 is driven, the reaction vessel 5J can suppress the heat generation of the guiding portion 5m along the propagation path of the sound wave due to the interference of the sound wave.

  However, in the reaction vessel 5J, as shown in FIG. 59, the radiation angle of the sound wave incident on the side wall 5a from the piezoelectric substrate 24a is α2, and the tangent line T of the emitted sound wave WbB incident on the recess 5q is the bottom surface of the guiding portion 5m. If the angle is β6, the angle β6 of the tangent line T is set to β6 ≠ 90 + α2 ° in consideration of the condition (180−β6) + α2 = 90 °) where the emitted sound wave WbB is perpendicularly incident on the recess 5q.

  Here, if the reaction vessel 5J becomes a reflection end face of a sound wave as a boundary portion of acoustic impedance, instead of the concave portion 5q formed of a semicircular groove, as shown in FIG. 60, the reaction vessel 5J is formed between the guiding portion 5m and the bottom wall 5d. You may provide the recessed part 5r which consists of a triangular groove | channel between them. In this case, in the reaction vessel 5J, the reflected sound wave WbBR reflected by the inclined surface of the recess 5r does not interfere with the emitted sound wave WbB emitted from the vibrator 24b and propagating through the side wall 5a. In addition, since the sound wave guided to the guiding portion 5m side is irregularly reflected by the reflecting end face 5n, interference between the reflected sound waves WbBR and interference between the reflected sound wave WbBR and the emitted sound wave WbB are suppressed, and heat generation of the guiding portion 5m is suppressed. can do. At this time, the angle formed by the inclined surface of the concave portion 5r and the bottom surface of the guiding portion 5m can be determined in the same manner as the above-described normal incidence condition.

  In addition, you may use the reaction container used with the stirring apparatus of this invention combining the shape of each aspect demonstrated in Embodiment 1-5 in multiple numbers.

  Moreover, although the automatic analyzer of this invention demonstrated what has the two reagent tables 2 and 3, the reagent table may be one. Furthermore, the automatic analyzer of the present invention may include a single automatic analyzer as a unit.

It is a schematic block diagram which shows the automatic analyzer of Embodiment 1 provided with the stirring apparatus of this invention. It is a block diagram which shows the structure of the automatic analyzer of Embodiment 1, and a stirring apparatus. FIG. 2 is a perspective view showing a surface acoustic wave element of a stirring device used in the automatic analyzer of Embodiment 1 and a reaction vessel equipped with the surface acoustic wave element. It is a perspective view which shows the reaction container with which a surface acoustic wave element is attached and is used with the automatic analyzer of Embodiment 1 with a power transmission body. FIG. 3 is a perspective view of the surface acoustic wave device used in the stirrer according to Embodiment 1 as viewed from the front side. FIG. 3 is a cross-sectional view of a main part for explaining a mode of a sound wave emitted from a surface acoustic wave element in the stirring device according to the first embodiment. It is a figure which shows the propagation direction of the sound wave and sound wave in a surface acoustic wave element and the side wall of reaction container in model. In the stirring apparatus of Embodiment 1, it is a front view of the reaction container explaining the relationship between the emitted sound wave and reflected sound wave which the surface acoustic wave element emitted. It is a perspective view of the reaction container explaining the relationship between the emitted sound wave and the reflected sound wave which the conventional surface acoustic wave element emitted. It is principal part sectional drawing explaining reflection of the sound wave in the piezoelectric substrate of the conventional surface acoustic wave element. It is the A section enlarged view of FIG. It is principal part sectional drawing explaining reflection of the sound wave in the side wall of the reaction container in the stirring apparatus using the conventional surface acoustic wave element. It is the B section enlarged view of FIG. It is the perspective view which looked at the reaction container which attached the surface acoustic wave element used with the stirring apparatus of Embodiment 1 to the bottom face from the downward direction. It is a figure which shows typically the propagation direction of the outgoing sound wave which propagates reflecting a surface acoustic wave element and the inside of a piezoelectric substrate, and the propagation direction of a reflected sound wave. It is a figure which shows typically the outgoing sound wave which propagates while reflecting the inside of a surface piezoelectric substrate, and the propagation direction of a reflected sound wave when driving the stirring apparatus using the conventional surface acoustic wave element. FIG. 17 is a color image obtained by imaging the surface acoustic wave element of FIG. 16 in a heat generation state using a thermal infrared thermography apparatus. FIG. 15 is a color image obtained by imaging the surface acoustic wave element of FIG. 14 in a heat generation state using a thermal infrared thermography apparatus. It is the figure of the monochrome image which changed the contrast of the color image shown in FIG. It is a front view which shows the modification 1 of the surface acoustic wave element used with the stirring apparatus of Embodiment 1 with a reaction container. It is a front view which shows the other example of the surface acoustic wave element which concerns on the modification 2 with reaction container. 10 is a front view of a surface acoustic wave element showing an example of a surface acoustic wave element excluded from Modification 2. FIG. FIG. 10 is a front view of a surface acoustic wave element showing another example of the surface acoustic wave element excluded from Modification 2. It is a front view which shows the surface acoustic wave element which concerns on the modification 3 with reaction container. It is the C section enlarged view of FIG. It is a perspective view which shows the surface acoustic wave element of the stirring apparatus used with the automatic analyzer of Embodiment 2, and the reaction container which attached the surface acoustic wave element. FIG. 27 is a cross-sectional view of an essential part for explaining reflection of a sound wave in a piezoelectric substrate of a surface acoustic wave device by cutting the reaction container of FIG. 26 in a vertical direction. It is the D section enlarged view of FIG. It is principal part sectional drawing of the reaction container explaining the other angle which the side wall of a reaction container and the reflective end surface of a surface acoustic wave element make in air | atmosphere. It is principal part sectional drawing which shows the modification 1 of the sound wave generation means used with the stirring apparatus of Embodiment 2. It is principal part sectional drawing which shows the modification 2 of a sound wave generation means. It is explanatory drawing which expands the reflective end surface of the sound wave generation means which concerns on the modification 2, and explains a shape. It is principal part sectional drawing which shows the other example of the modification 2 of a sound wave generation means. It is principal part sectional drawing which shows the modification 3 of a sound wave generation means. It is a figure which expands the E section of FIG. 34, and shows the irregular reflection of the emitted sound wave in a reflective end surface and a reflective end surface. It is a perspective view which shows the surface acoustic wave element of the stirring apparatus used with the automatic analyzer of Embodiment 3, and the reaction container which attached the surface acoustic wave element. It is a front view of the reaction container shown in FIG. It is a perspective view which shows the other example of the reaction container shown in FIG. FIG. 10 is a perspective view showing a first modification of the reaction vessel used in the stirring device according to the third embodiment. It is a front view of the reaction container which shows the propagation direction of an output sound wave, and the propagation direction of a reflected sound wave when driving the stirring apparatus using the reaction container of the modification 1. 10 is a perspective view showing another example of a reaction vessel according to Modification 1. FIG. 10 is a front view showing a reaction vessel according to Modification 2. FIG. FIG. 43 is an enlarged view of a portion F in FIG. 42, illustrating a reflection end surface, a propagation direction of an outgoing sound wave on the reflection end surface, and a propagation direction of a reflected sound wave that is irregularly reflected. It is the perspective view which looked at the reaction container concerning the modification 3 from the bottom face. FIG. 10 is a perspective view showing a surface acoustic wave element of a stirring device used in the automatic analyzer of Embodiment 4 and a reaction vessel equipped with the surface acoustic wave element. It is principal part sectional drawing explaining the relationship between the radiation angle to the side wall of the emitted sound wave which propagates the inside of a side wall while reflecting, and the inclination angle of a reflective end surface. It is a perspective view which shows the other example of the reaction container shown in FIG. FIG. 46 is a perspective view showing still another example of the reaction container shown in FIG. 45. 49 is a cross-sectional view of the principal part for explaining the relationship between the radiation angle of the emitted sound wave propagating in the side wall while reflecting and the inclination angle of the reflection end surface in the reaction container shown in FIG. 48. FIG. FIG. 10 is a perspective view showing a first modification of the reaction vessel used in the stirring device according to the fourth embodiment. FIG. 10 is a perspective view showing a second modification of the reaction vessel used in the stirring device according to the fourth embodiment. It is a perspective view which shows the surface acoustic wave element of the stirring apparatus used with the automatic analyzer of Embodiment 5, and the reaction container which attached the surface acoustic wave element. It is sectional drawing of the reaction container cut | disconnected in the vertical direction in the center of the surface acoustic wave element. 52 is a cross-sectional view of the main part for explaining the relationship between the state in which the outgoing sound wave propagating in the side wall while being reflected is guided to the guiding portion, and the radiation angle of the outgoing sound wave to the side wall and the inclination angle of the adhesive layer in the reaction container of FIG. It is. 10 is a cross-sectional view of a reaction vessel according to Modification 1. FIG. 55 is a cross-sectional view of an essential part of the reaction vessel shown in FIG. 55 for explaining the relationship between the state in which the outgoing sound wave propagating in the side wall while being reflected is guided to the guiding portion, and the radiation angle of the outgoing sound wave to the side wall and the inclination angle of the adhesive layer. It is. 10 is a perspective view of a reaction container according to Modification 2. FIG. 10 is a cross-sectional view of a reaction vessel according to Modification 2. FIG. FIG. 58 is a diagram for explaining the relationship between the state in which the emitted sound wave propagating in the side wall while being reflected is guided to the guiding portion, and the angle of radiation of the emitted sound wave to the side wall and the inclination angle of the tangent in the concave portion formed of a semicircular groove. It is principal part sectional drawing of a reaction container. FIG. 10 is a cross-sectional view of a principal part showing another example of a recess of a reaction container according to Modification 2.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Automatic analyzer 2, 3 Reagent table 4 Reaction table 5 Reaction container 5a Side wall 5d Bottom wall 5e, 5f Reflective end surface 5g, 5h Reflective end surface 5i, 5j Reflective end surface 5k, 5n Reflective end surface 5m Guiding part 5q, 5r Concave part 5A-5J Reaction container 6, 7 Reagent dispensing mechanism 8 Specimen container transfer mechanism 9 Feeder 10 Rack 11 Specimen dispensing mechanism 12 Analytical optical system 13 Washing mechanism 15 Control unit 16 Input unit 17 Display unit 20 Stirring device 21 Power transmission unit 22 Arrangement determining member 23 Surface acoustic wave element 23a Piezoelectric substrate 23b Vibrator 23e Reflective end face 24, 25 Surface acoustic wave element 24a, 25a Piezoelectric board 24b, 25b Vibrator 24e, 25e Reflective end face 27, 28 Surface acoustic wave element 27a, 28a Piezoelectric board 27b, 28b Vibrator 27e, 28e Reflective end face 32 Surface acoustic wave element 32a Piezoelectric Substrate 32b Vibrator 32e Reflective end face 34, 35 Surface acoustic wave element 34a, 35a Piezoelectric substrate 34b, 35b Vibrator 34e, 35e Reflective end face 36, 37 Surface acoustic wave element 36a, 37a Piezoelectric substrate 36b, 37b Vibrator 36e, 37e Reflected End face 51 Bottom face member 52, 54 Adhesive layer 53 Guide member 53b Reflective end face Dp1, Dp2 Propagation direction of outgoing sound wave Dr1, Dr2 Propagation direction of reflected sound wave WbA, WbB Outgoing sound wave WbAR, WbBR Reflected sound wave

Claims (5)

A container for holding a liquid;
A sound wave generating means for generating a sound wave in a state in which a vibrator composed of a plurality of comb-like electrodes is formed on a piezoelectric substrate and in contact with the container;
In a stirrer that stirs the liquid held in the container by sound waves generated by the sound wave generating means,
The container or the sound wave generation means is inclined or curved with respect to a surface orthogonal to the propagation direction of the sound wave propagating in the wall of the container or in the piezoelectric substrate while reflecting the sound wave generated by the sound wave generation means. A stirrer characterized in that a reflection end face or a reflection end face for irregularly reflecting the propagating sound wave is formed on the wall of the container or the piezoelectric substrate.   The reflection end surface is inclined with respect to a plane perpendicular to the propagation direction of the sound wave propagating in the piezoelectric substrate in a sound wave propagation region in which the cross width of at least the plurality of comb-like electrodes is extended in the sound wave propagation direction. The stirring device according to claim 1, wherein the stirring device is formed of an inclined surface or a curved surface having a tangent line inclined.   2. The stirring according to claim 1, wherein the container is provided with a guiding portion that protrudes from the wall and guides a sound wave propagating through the wall in a direction away from the container by a boundary portion of acoustic impedance. apparatus.   The stirring device according to claim 3, wherein the guide portion is formed at an end portion from which a reflection end face that irregularly reflects the propagating sound wave protrudes.   An automatic analyzer that analyzes a reaction liquid by stirring a plurality of different liquids and measuring optical characteristics of the reaction liquid, wherein the stirring apparatus according to any one of claims 1 to 4 is used. An automatic analyzer characterized by using a sample and a reagent to stir and optically analyzing a reaction solution.