JP2008198241A - Dryer of substrate, and holder - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a dryer of a substrate capable of simultaneously performing spin-drying of a plurality of substrates and reliably removing dust and the like adhering to the substrates and having high drying performance. <P>SOLUTION: A holder 2 which can house a plurality of workpieces W in parallel has a bearing part 10 rotating the workpieces W around a rotational center axis passing through respective centers of the workpieces W and vertical to the workpieces W and has three or more supporting rods 11 for holding the workpieces W so as to enclose the workpieces W from outer peripheral parts thereof. A plurality of supporting grooves 13 for fixing and holding the workpieces W respectively in separated positions are provided in inside surfaces of the supporting rods 11 and a plurality of through holes 14 penetrating the supporting rods 11 are provided in outside surfaces of the supporting rods 11. Notching parts by which the supporting grooves 13 and the through holes 14 communicate with each other are formed in the supporting rods 11 and each through hole 14 has a function as a passageway for scattering an adhering matter adhering to the workpiece W to the outside of the supporting rod 11 when the workpieces W are rotated. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a drying apparatus for a substrate such as a magnetic recording medium used in information equipment and the like.

  Magnetic recording medium substrates used as hard disk drives for information equipment, etc., are made of aluminum alloy or glass material and are formed into a donut-shaped disk shape with a through hole in the center, and various surface treatment processes It is manufactured through. The surface treatment process includes a grinding process, a polishing process, a sputtering process, a plating process, and the like. After these processes are performed, the substrate surface is cleaned and dried.

In recent years, the recording density of magnetic recording media is increasing due to the demand for larger recording media and smaller information equipment, and the head on the magnetic recording surface is lowered more than the magnetic recording media substrate. In order to remove dust adhering in various surface treatment processes such as polishing, an advanced cleaning technique for a magnetic recording medium substrate and a cleaned magnetic recording medium substrate are required. There is a need for a drying device for clean drying.
That is, even if dust attached to the magnetic recording medium substrate is separated from the magnetic recording medium substrate using a high-performance cleaning device, the cleaning liquid containing the separated dust is surely scattered from the magnetic recording medium substrate. Otherwise, the cleaning liquid dries on the magnetic recording medium substrate, and dust or the like reattaches to the magnetic recording medium substrate. Further, if any cleaning liquid remains on the magnetic recording medium substrate, dust in the atmosphere easily adheres to the remaining portion.

Conventionally, as a method for cleaning and drying a substrate, in a large-diameter substrate, a large number of substrates are accommodated in a container called a carrier, scrubbed with a large number of cleaning brushes while being transported in the cleaning liquid, and thereafter The substrate was spin-dried.
For example, in Patent Document 1, a magnetic disk substrate or the like is used as a work, and after performing surface treatment such as polishing on the surface, a plurality of cleaning tanks are provided in order to remove foreign matters attached to the work surface. A cleaning apparatus is described that uses a liquid to clean a workpiece while being conveyed by a conveyor.
In Patent Document 2, a semiconductor substrate is used as a wafer, and a cassette containing a plurality of wafers is stored in a cradle. A wafer drying device is described in which the cradle is rotated while being held apart in parallel.
However, with a small-diameter substrate, it is difficult to apply such a cleaning and drying method, and conventionally, the substrate is pulled and dried as it is after being dipped in a cleaning solution.
JP 2001-96245 A JP-A-8-45894

  In the technique described in Patent Document 1, even if workpieces are cleaned by batch processing, the workpieces that have been cleaned are dried one by one with a spin dryer, so that the workpieces are stored in a container until spin drying is performed. There was a problem in terms of installation space and drying efficiency.

  On the other hand, in order to spin dry a plurality of substrates at the same time, it is necessary to store a plurality of substrates in a cassette or the like, and water droplets remain on the portion in contact with the cassette and are difficult to dry. Takes a long time. Further, there is a problem that dust remaining on the surface of the substrate is collected in the previous water droplet retention portion by the rotational centrifugal force and remains as a contaminant on the surface of the substrate, causing a serious defect in the quality of the subsequent process.

  In the technique described in Patent Document 2, when a wafer support bar is provided in the apparatus and a cassette storing a plurality of wafers is stored in the cradle, the wafer is pushed up by the two wafer support bars to reduce the contact portion with the apparatus. However, the two wafer support rods have problems with stability, and because they are close to the cassette in which the wafers are stored, water droplets and dust do not scatter sufficiently and are stored in the cassette. There is also a concern of reattachment. In addition, the rotational speed of the wafer is as slow as 1400 rpm, and the drying time is as long as 210 seconds.

  The present invention has been made in view of the above circumstances, and can stably spin-dry a plurality of substrates at a high speed in a short time while stably holding a small-diameter substrate, and is a conventional substrate drying apparatus. Compared to the above, an object of the present invention is to provide a substrate drying apparatus having high drying performance capable of reliably removing dust and the like adhering to the substrate.

As a result of diligent efforts to solve the above problems, the present inventor has found that a large amount of dust and the like remaining on the substrate after cleaning and drying of the substrate is distributed around the chuck portion of the substrate of the drying apparatus. Furthermore, as a result of studying the reason, in the drying equipment using centrifugal force, the spraying direction of the cleaning liquid at the chuck part is important. By adjusting the scattering direction, dust etc. can be reliably removed, and high drying performance can be achieved. The present invention has been completed. That is, the present invention provides the following means.
(1) A substrate drying apparatus that rotates a disk-shaped substrate and scatters deposits on the substrate by centrifugal force, and has a holder that can store a plurality of the substrates separately in parallel, The holder passes through the center of the substrate and rotates around a rotation center axis perpendicular to the substrate, and three or more supports for holding the substrate so as to surround the outer periphery. A plurality of support grooves for fixing and holding the substrate at positions spaced apart from each other on the inner side surface of the support rod, and a through hole penetrating the support rod on the outer side surface of the support rod. And a notch that communicates the support groove and the passage hole is formed in the support rod, and the passage hole is configured to remove deposits attached to the substrate when the substrate rotates. In Drying device for the substrate, characterized in that it has a function as a cause dispersion passages.
(2) The substrate drying apparatus according to (1), wherein the shape of the support groove is substantially V-shaped.
(3) The holder has a fixture that can fix both ends of the support rod at both ends of the support rod. In the fixture, at least one of the support rods attaches the substrate to another support rod. The substrate drying apparatus according to (1) or (2), further comprising a spring mechanism that can be pressed.
(4) In the holder, at least one of the support rods is detachable from the fixture, and is released from the holder when the substrate is attached to or detached from the holder (1). The substrate drying apparatus according to any one of to (3).
(5) The method according to any one of (1) to (4), further comprising: a spindle capable of rotating the entire holder while holding the fixture, and a mechanism for supplying cleaning liquid from the outside to the holder by a nozzle. The substrate drying apparatus according to claim 1.
(6) A movable cleaning cover capable of covering the entire holder during the cleaning process, a movable drying cover capable of covering the entire holder during the drying process, a ventilation port for feeding dry air, and rotation (1) to (5) characterized in that it has an automatic cleaning and drying system that has a discharge port for discharging scattered matter caused by the above, and the cleaning cover and the drying cover can alternately cover the holder. The substrate drying apparatus according to claim 1.
(7) The substrate drying apparatus according to (6), wherein the plurality of nozzles are arranged in at least one row inside the cleaning cover.
(8) A holder capable of separately storing the objects to be processed in parallel and rotating around a rotation center axis that passes through the centers of the objects to be processed and is perpendicular to the objects to be processed; Three or more support rods for holding the target object so as to surround the outer periphery of the target object, and for fixing and holding the target object on the inner surface of the support rod at positions spaced apart from each other. A plurality of support grooves, a plurality of passage holes penetrating the support rods are provided on the outer surface of the support rod, and a notch for communicating the support grooves and the passage holes is formed. A holder having a function as a passage for scattering deposits adhering to the object to be processed to the outside of the support rod when the object to be processed is rotated.

As described above, according to the substrate drying apparatus of the first aspect of the present invention, the plurality of disk-shaped substrates are each provided with the holders that can be separated and stored in parallel, and the holders are provided for each of the substrates. Since it has a rotation mechanism that rotates around the center axis of rotation that passes through the center and is perpendicular to the substrate, it can be rotated with the holder while storing the substrate efficiently in a small space, and multiple sheets can be spin-dried simultaneously it can.
In addition, the rotation mechanism uses the center of the substrate as the rotation center axis so that the spraying direction of the cleaning liquid at the time of spin drying becomes a concentric symmetrical shape in the disk-shaped substrate, so that the dry state on the surface to be processed of the substrate Can be controlled to be uniform.
In addition, the holder holds the substrate using three or more support rods having a plurality of support grooves on the inner surface for fixing and holding the substrate at positions separated from each other, thereby separating the substrates from each other. Therefore, it is possible to reduce the contact portion with the substrate while keeping the cleaning liquid stably, and to minimize the residue of the cleaning liquid at the contact portion.
By the way, when a very high degree of drying performance is required as in the object of the present invention, the cleaning liquid that remains slightly in the contact portion in the conventional structure is scattered in the direction of the substrate due to the vortex of the air generated by the high-speed rotation. As a result, the cleaning liquid was reattached to the substrate.
However, in the present invention, on the outer surface of the support rod, a plurality of passage holes penetrating the support rod are provided, and a notch for communicating the support groove and the passage hole is formed in the support rod, and is attached to the substrate. By allowing the adhering material to scatter to the outside of the support rod using the passage hole as a passage, the cleaning liquid remaining very slightly in the contact portion does not reattach to the substrate even by high-speed rotation. Since it scatters to the outside of the holder, dust and the like adhering to the substrate can be reliably removed and high drying performance can be obtained as compared with the conventional substrate drying apparatus.

  In the substrate drying apparatus according to claim 2 of the present invention, the substantially V-shaped support groove is the most stable shape for holding the substrate in the holder. Since it can be rotated stably at high speed and the contact point between the substrate and the support rod can be reduced as much as possible, water droplets and dust scattered by the rotating centrifugal force are stored at the contact point. You can avoid it.

  In the substrate drying apparatus according to claim 3 of the present invention, the holder has a fixture that can fix both ends of the support rod at both ends of the support rod, so that the support composed of three or more is supported. The holder can be placed in the apparatus through the fixture while stably fixing the rod, and at least one of the support rods has a spring mechanism that can press the substrate against the other support rod. As a result, the force for fixing the substrate is buffered, and the plurality of substrates can be stably fixed and held without the substrate being displaced by rotation and without damaging the substrate.

  In the substrate drying apparatus according to claim 4 of the present invention, in the holder, at least one of the support rods is detachable from the fixture, so that the holder is not disassembled. The substrate can be attached and detached, and when the substrate can be opened from the holder, the substrate can be easily operated without contacting the other part of the holder.

  The substrate drying apparatus according to claim 5 of the present invention includes a spindle that can rotate the entire holder while holding the fixture, and a nozzle that supplies cleaning liquid to the holder from the outside. Therefore, since the cleaning liquid can be supplied more continuously from the nozzle while rotating the substrate, the cleaning can be performed without drying the substrate during the cleaning process, and the dirty cleaning liquid after cleaning the substrate is rotated. Therefore, it can be washed efficiently while maintaining the purity of the washing liquid.

According to the substrate drying apparatus of the sixth aspect of the present invention, the movable cleaning cover that can cover the entire holder during the cleaning process and the movable cleaning cover that can cover the entire holder during the drying process. By having the drying cover, the cleaning liquid can be sufficiently spread over the entire holder by covering the entire holder with the cleaning cover during the cleaning process while installing and rotating the holder on the spindle. In the drying process, the entire holder is covered with the drying cover, so that the cleaning liquid can be prevented from scattering due to rotation. Moreover, by having the ventilation port which sends in dry air, dry air can be drawn in to the board | substrate vicinity at the time of finish drying, and finish drying can be accelerated. In addition, because it has a discharge port that discharges scattered matter due to rotation, dirty cleaning liquid and scattered matter after cleaning do not stay in the automatic cleaning and drying device. Can be prevented.
Furthermore, in the automatic cleaning / drying system provided in the substrate drying apparatus according to claim 6 of the present invention, the cleaning cover and the drying cover can alternately cover the holder. Without removing the holder from the spindle, the cleaning cover can be opened to cover the holder with the drying cover, and the cleaning process and the drying process can be performed continuously.

  Further, according to the substrate drying apparatus of claim 7 of the present invention, the nozzle is installed inside the cleaning cover, so that the cleaning liquid can be supplied from a position close to the holder, The cleaning liquid can be sufficiently distributed throughout the holder. Further, since the nozzle is separated from the holder together with the cleaning cover during the drying process, the drying process can be prevented.

According to the holder of claim 8 of the present invention, the objects to be processed can be separated and stored in parallel, pass through the centers of the objects to be processed, and around the rotation center axis perpendicular to the objects to be processed. Therefore, the holder can be rotated with the processing object stored efficiently in a small space, and a plurality of sheets can be spin-dried simultaneously.
In addition, since the rotation mechanism uses the center of the object to be processed as the center axis of rotation, the scattering direction of the cleaning liquid at the time of spin drying becomes a concentric symmetrical shape in the object to be processed. The state can be controlled to be uniform.
In addition, the object to be processed is separated by holding the object to be processed using three or more support rods having a plurality of support grooves on the inner surface for fixing and holding the object to be separated at respective positions. In addition, the contact portion with the object to be processed can be reduced while the liquid is stably held at the position, and the residue of the cleaning liquid at the contact portion can be minimized.
By the way, when a very high degree of drying performance is required as in the object of the present invention, the cleaning liquid that remains slightly in the contact portion in the conventional structure is scattered in the direction of the object by the air vortex generated by the high-speed rotation. As a result, the cleaning liquid was reattached to the object to be processed.
However, in the present invention, a plurality of passage holes penetrating the support rod are provided on the outer surface of the support rod, and a notch portion that communicates the support groove and the passage hole is formed in the support rod. By adhering the adhering material adhering to the outside to the outside of the support rod using the passage hole as a passage, the cleaning liquid remaining very slightly at the contact portion is reattached to the object to be processed even by high-speed rotation. Therefore, the dust scattered on the outside of the holder can be removed reliably, and high drying performance can be obtained.
In addition to the cleaning process and the drying process, the holder according to the eighth aspect of the present invention can improve the working efficiency because the holder can be transferred together with the object to be processed in the transfer process.

Next, the present invention will be described in detail with reference to the drawings.
The substrate for cleaning and drying a magnetic recording medium substrate according to the first embodiment of the present invention is a manufacturing process of a disk-shaped substrate W (hereinafter referred to as a workpiece W) such as a magnetic recording medium used as a hard disk drive for information equipment or the like. In various surface treatment processes, for example, a grinding process, a polishing process, a sputtering process, and a plating process are performed, and then the surface of the workpiece W is washed and dried by using this washing and drying apparatus. A desired workpiece W is obtained.

  As shown in FIG. 1, a cleaning / drying apparatus 1 for a magnetic recording medium substrate according to this embodiment includes a spindle 3 that rotates a holder 2 that stores a workpiece W, and a movable type that can cover the holder 2 during a cleaning process. A cleaning cover 4, a movable drying cover 5 capable of covering the holder 2 during the drying process, a cleaning liquid supply mechanism 7 for supplying a cleaning liquid from the outside to the holder 2 by a nozzle 6, a ventilation port 8 for supplying dry air, and The cover body C includes a holder 2, a cleaning cover 4, a drying cover 5, and a cover body C that covers the entire nozzle 6.

In this embodiment, since the cleaning cover 4 and the drying cover 5 are movable, the holder 2 can be covered alternately. As shown in FIG. 1, the cleaning process and the drying are performed while the holder 2 is mounted on the spindle 3. The process can be performed alternately and continuously.
Further, a cleaning liquid supply mechanism 7 for supplying a cleaning liquid from the outside to the holder 2 by a nozzle 6 is provided, and a plurality of nozzles 6 are provided inside the cleaning cover 4 along the length direction of the holder 2. (For example, 14 in 7 × 2 rows are provided.)
In the cleaning process, the holder 2 is covered with the cleaning cover 4, and the spindle 3 is rotated at a low speed while the cleaning liquid is supplied by the plurality of nozzles 6, thereby rinsing and cleaning the plurality of workpieces W.
In the drying process, the holder 2 is covered with the drying cover 5 and the spindle 3 is rotated at a high speed, so that the deposits of the workpieces W are scattered by the centrifugal force. While sending dry air from the ventilation port 8 for finishing, high-speed rotation is continued and spin drying of a plurality of workpieces W can be completed.

As shown in FIGS. 2 to 4, the holder 2 can store a plurality of workpieces W separated from each other in parallel, passes through the center of each workpiece W, and is perpendicular to the surface of the workpiece W. The bearing unit 10 is configured to rotate around the support W, the three support rods 11 are used to hold the workpiece W vertically, and the fixtures 12 and 12 are used to support both ends of each support rod 11.
In the present embodiment, the entire holder 2 can be rotated via the bearing portion 10 of the fixtures 12 and 12 with the center of the workpiece W as the center of rotation.

As shown in FIG. 5, the fixture 12 of the holder 2 is attached to the other side of the main body 12a by attaching a cylindrical main body 12a, a saddle type support plate 12b integrated on one side of the main body 12a, and the main body 12a. A cover member 12c that covers 12a and a mounting plate 12d that is attached to the cover member 12c. A bearing portion 10 is formed at the center of the outer surface of the mounting plate 12d, and the bearing portions 10 are sandwiched between both sides of the bearing portion 10. In this way, triangular chuck claws 12e, 12e are formed. One surface of these chuck claws 12e is a locking surface perpendicular to the outer surface of the mounting plate 12d, and the other surface is a slope inclined to the outer surface of the mounting plate 12c.
The chuck claws 12e, 12e are engaged with a bearing portion of a rotating shaft of a motor provided in the cleaning / drying apparatus 1, so that the rotational driving force of the motor is transmitted and the holder 2 is rotated. In the state where the main bodies 12a and 12a are arranged opposite to the left and right, the three support rods 11 are arranged at intervals of 120 ° in the circumferential direction of the support plate 12b between the support columns 12b and 12b.

A mounting plate 12f is formed on the inner side of the support plate 12b. The mounting plate 12f has a shape in which a part of the disk is cut out. The mounting plate 12f rotates around the support plate 12b at the periphery of the notch 12g. A locking plate 12h that operates to open or close the notch 12g is rotatably attached by a pin 12n. Note that one of the three support rods 11 is configured to be movable by the rotation of the locking plates 12h and 12h that rotate along the support plate 12b, and the remaining two support rods 11 are mounted. It is fixed to the plate 12f. A mounting hole 12i is formed so as to penetrate the mounting plate 12d, the main body 12a, and the support plate 12b in the thickness direction, and a lock pin 12j that can be inserted into the mounting hole 12i is mounted via a spring member 12k. The lock pin 12j is inserted through the mounting hole 12i, and the distal end portion 12l thereof is inserted into the insertion hole 12m of the locking plate 12h described above or removed from the insertion hole 12m. It is configured so that the rotation can be locked or unlocked. (See FIGS. 8A and 8B)
Of the three support rods 11, the remaining two are fixed so as to be sandwiched between the left and right mounting plates 12f, 12f, so that the other one support rod 11 is rotated according to the rotation of the locking plate 12h. However, it can move with respect to the other two support rods 11. In addition, as shown in FIG. 7, the locking plate 12h that is pivotally supported by the pin 12n and the one supporting rod 11 that moves with the pin 12n rotate the locking plate 12h in the direction farthest away from the notch 12g. In the moved position, it is configured to leave a space where the workpiece W can pass between the other two support rods 11, 11 away from the original position.

The support rod 11 is a rod-shaped member having a pentagonal cross section as shown in FIGS. 12 to 15, and L-shaped support pieces 11 </ b> A are evenly spaced on one outer surface 11 a of the five outer surfaces. 11 is formed with a plurality of gaps 11b in the length direction. These support pieces 11 </ b> A are aligned and formed so as to cover one outer surface of the pentagonal support rod 11.
Each support piece 11A includes a base portion 11c erected at one end portion in the width direction of the outer surface 11a and a plate-shaped receiving portion 11d formed to extend in parallel with the outer surface 11a at a substantially right angle to the tip of the base portion 11c. Thus, the tip of the receiving portion 11d extends to the other end of the outer surface 11a, and a support groove 13 is formed at the center of the tip of the receiving portion 11d.
As shown in FIG. 15, the support groove 13 is formed by combining two triangular inclined surfaces formed on the top surface on the tip side of the receiving portion 11d to deepen the center on the tip side of the receiving portion 11d. 13a, a receiving groove side portion 13b obtained by combining two inclined surfaces so that the end surface 11e on the leading end side of the receiving portion 11d is deeper in the center, and the receiving groove upper portion 13a on the back surface on the leading end side of the receiving portion 11d. And a receiving groove lower portion 13c formed in a similar shape. In addition, an auxiliary receiving groove 13d having an appearance in which the receiving groove 13b is extended is formed at a corner portion of the outer surface 11a of the support rod 11 at a position facing the tip of the receiving portion 11d. When the portion 13a and the auxiliary receiving groove 13d are viewed as shown in FIG. 15, their outer shapes are arranged in a diamond shape.

Next, a passage hole 14 is formed in the center portion of the base portion 11c of the support piece 11A so as to penetrate the base portion 11c and communicate with the outer surface 11a side and the outer side of the base portion 11c. Since a plurality of support pieces 11 a are formed in the length direction of the support rod 11, the length direction of the support rod 11 is between the plurality of formed support pieces 11 A... And the outer surface 11 a of the support rod 11. The portion of the notch 15 that is continuous with the notch 15 is provided so that the portion extending from the notch 15 to the passage hole 14 or the gap 11b functions as a deposit passage to be described later.
As shown in FIG. 14, a screw hole type support hole 11 f that penetrates the support rod 11 in the length direction is formed at the center of the support rod 11, and is formed in the support hole openings at both ends of the support rod 11. Is formed with a protruding portion 11f used when the support rod 11 is attached to the mounting plate 12f or the locking plate 12g of the fixture 12 described above.
As shown in FIGS. 16A and 16B, the support piece 11A of the support rod 11 configured as described above receives the outer peripheral edge of the work W by bringing the work W into contact with the support groove 13 formed at the tip thereof. Each supporting piece 11A is configured to be able to bend appropriately by bringing the workpiece W into contact with the supporting piece 11A so as not to damage the outer peripheral edge of the workpiece W.

On the other hand, as shown in FIG. 3, the movable support rod 11 is provided with five elastic members (spring mechanisms) 16 such as leaf springs in series in the length direction so as to face the part where the workpiece W is placed. It has been. In one elastic member 16, a groove 16a having a shape similar to the support groove 13 of the other support rod 11 is provided in the length direction so that the five workpieces W can be fixedly held on the side surface in contact with the workpiece W. Are provided at equal intervals, and between the support rod 11 to which the elastic member 16 is attached and the groove 16a, there are linear recesses 16b in the length direction, and two recesses 16c cut from both ends in the length direction. It is on the support rod 11 side. When the portion sandwiched between the linear hole 16b and the concave portion 16c is appropriately bent, the elastic member 16 functions as a spring mechanism by buffering the force for pressing the workpiece W.
Because the elastic member 16 can adjust the force with which the support rod 11 fixes the workpiece W, the workpiece W can be stably held without being displaced by the rotation and without damaging the workpiece W. .

FIG. 17 shows a support mechanism for the holder 2, and the spindle 3 is configured by including spindle support portions 50 and 51 fitted to the bearing portions 10 of the mounting plates 12 d provided on both ends of the holder 2. ing. These spindle support portions 50 and 51 are provided so as to be supported by a support body 52 provided at the center of the cleaning / drying apparatus 1 shown in FIG. The spindle support portion 50 is provided with a support shaft 53 inserted into one bearing portion 10 of the holder 2, and the spindle support portion 51 is provided with a support shaft 54 inserted into the other bearing portion 10 of the holder 2. The holder 2 is rotated with the rotation of the spindle support portion 51.
The spindle support portion 51 is adjusted so that the rotational driving force of the motor 55 installed below the cover main body C shown in FIG. A mechanism (not shown) is provided. Therefore, the holder 2 can be rotated at a desired speed by widening the interval between the spindle support portions 50 and 51, sandwiching the holder 2 therebetween, and rotating the spindle support portion 51 by the motor 55.

Next, a method for cleaning and drying the workpiece W using the cleaning / drying apparatus 1 will be described.
First, the lock pins 12j and 12j at both ends of the holder 2 are extracted, and the locking plates 12h and 12h are rotated along the main bodies 12a and 12a, thereby releasing the movable support rod 11 from the holder 2. Then, 25 workpieces W are installed in the support grooves 13 having 25 pieces in each support rod 11, the locking plates 12 h and 12 h are closed in the reverse order of the previous procedure in which the holder 2 is opened, and the support rod 11 holds the holder. Close 2 and lock.
When the holder 2 storing 25 workpieces W is mounted on the spindle support portions 50 and 51 of the cleaning / drying apparatus 1 using the chuck claws 12e and 12e as shown in FIG. Since 51 holds both ends of the holder 2, the cleaning cover 4 is closed and the cleaning process is performed.
In the cleaning process, the cleaning liquid is sprayed from the nozzle 6 while rotating the spindle 3 at a low speed (for example, 20 to 30 seconds at 1000 rpm), and the 25 workpieces W are rinse-cleaned evenly.
After the cleaning cover 4 is opened, the drying cover 5 is closed and a drying process is performed.
In the drying process, the spindle 3 is rotated at a high speed (for example, 15 seconds at 5000 rpm), and the 25 workpieces W are uniformly spin-dried.
Further, with the drying cover 5 opened and the cleaning cover 4 opened, the drying air is drawn into the vicinity of the workpiece W from the ventilation port 8 while rotating the spindle 3 at a high speed, and finish drying is performed.
Then, the holder 2 is removed from the main body of the cleaning / drying apparatus 1, the holder 2 is opened, and the cleaned and dried work W is taken out.

  In the present embodiment, the structure is such that 25 workpieces W are held in one holder 2, but this is intended to increase the processing capability of the workpieces W as a dryer. Any number of workpieces W may be mounted.

In general, in a drying apparatus using centrifugal force, in order to increase centrifugal force, a holder holding an object to be dried is often rotated around a point outside the holder. However, when rotating in such a manner, the spraying direction of the cleaning liquid in the workpiece W is not symmetrical in the disk-shaped workpiece W, and in particular, the cleaning liquid scattering direction in the chuck portion of the workpiece W is highly controlled. And high drying performance cannot be obtained.
Therefore, in the present embodiment, by rotating the entire holder 2 through the bearing portion 10 with the center of the workpiece W as the rotation center, it is possible to highly control the spraying direction of the cleaning liquid in the chuck portion of the workpiece W. High drying performance is obtained.

Further, in the configuration of the present embodiment, three support rods 11 are provided in one holder 2, but the workpiece W to be washed and dried in the configuration of the present embodiment is a disc shape, so that the workpiece W can be stabilized. This is because it is preferable to hold at three points.
Further, as shown in FIG. 5, one of the three support rods 11 is a detachable support rod 11a fixed to the rotatable locking plates 12h, 12h, and the holder 2 is disassembled. The workpiece W can be attached and detached without being removed, and at that time, the workpiece W is released from the holder 2, so that the workpiece W can be easily operated without contacting the other portions of the holder 2.
Any number of support rods 11 can be used as long as the number is three or more. However, if the number of support rods is more than necessary, the number of contact points between the workpiece W and the support rods 11 is not preferable. Moreover, the open part in the holder 2 is also reduced, and the cleaning liquid is hardly scattered efficiently. Therefore, in the present embodiment, the number is three so that the minimum number can be stably supported.

  The leaf spring type elastic member 16 used in the present embodiment may be provided on at least one of the support rods 11 or may be provided on another support rod 11. Moreover, although you may have in the some support rod 11, sufficient effect is acquired by having in one.

As described above, conventionally, in this type of drying apparatus, a simple V-shaped chuck is often used for a holding portion of an object to be dried. However, there is a problem that a large amount of dust or the like remaining on the workpiece W after the workpiece W is washed and dried is distributed around the chuck portion of the workpiece W of the drying device. As a result of examining the cause, a drying device using centrifugal force is used. Then, it discovered that the spraying direction of the washing | cleaning liquid in the chuck | zipper part was important.
Therefore, in this embodiment, by having the notch part 15 in the center part of the support groove | channel 13, the scattering direction of a washing | cleaning liquid can be adjusted with this notch part 15. FIG.

When a very high level of drying performance is required as in the present invention, the cleaning liquid that remains slightly on the chuck portion of the conventional structure is scattered in the direction of the workpiece W by the air vortex generated by the high-speed rotation of the holder. As a result, the cleaning liquid was reattached to the workpiece W.
On the other hand, in the present embodiment, the support groove 13 of the support rod 11 has the passage hole 14 penetrating from the cut portion 15 at the center portion thereof, so that the cleaning liquid that seems to remain very slightly in the chuck portion, Without being reattached to the workpiece W, it can be scattered outside by the centrifugal force and removed reliably.
In addition to the passage hole 14, the gap 11 b between the support pieces 11 </ b> A and 11 </ b> A also serves as a passage for the cleaning liquid, so that the cleaning liquid can be reliably scattered outside.

Next, examples of the present invention will be described.
Under the following conditions, 25 workpieces were spin-dried using a substrate cleaning and drying apparatus as shown in FIGS.

"conditions"
Workpiece: A disk-shaped 0.85 inch substrate having a diameter of 21.6 mm and a thickness of 0.381 mm.
Holder: 60 mm in diameter and 259 mm in length.
Support rod: 3 pieces, maximum width 21 mm, depth of support groove 2 mm.
Cleaning liquid: pure water 25 pieces of the above-mentioned workpieces were set in a holder and mounted on the drying apparatus main body, and both ends of the holder were held with a spindle to close the cleaning cover.
First, rinsing was performed for 30 seconds while rotating the spindle at a low speed (1000 rpm) and spraying the cleaning liquid uniformly with the nozzle.
Next, after opening the cleaning cover, the drying cover was closed, the spindle was rotated at a high speed (5000 rpm), and the first spin drying was performed for 15 seconds.
Finally, the drying cover was opened and the cleaning cover was opened, the spindle was rotated at a high speed (5000 rpm), and the second spin drying was performed for 10 seconds while feeding the drying air from the ventilation port.

"result"
The test was performed under the above conditions, and the surface of the workpiece after washing with pure water was observed with a differential interference optical microscope (600 times). No deposits such as uneven drying and water spots were observed on the work surface after spin drying.

  Therefore, the substrate drying apparatus of the present invention can spin-dry a plurality of substrates simultaneously in a short time with high-speed rotation while stably holding a small-diameter substrate, and moreover, compared with a conventional substrate drying apparatus, It has high drying performance that can reliably remove dust adhering to the surface.

It is sectional drawing of the washing-drying apparatus in embodiment of this invention. It is a top view of the holder in the embodiment of the present invention. It is a front view of the holder in the embodiment of the present invention. In embodiment of this invention, it is a perspective view of the holder at the time of attaching or detaching a workpiece | work to a holder. It is an expanded view of the holder in embodiment of this invention. It is sectional drawing which follows the BB 'line of FIG. 3, and is a figure which shows the state which the holder closed. It is sectional drawing which follows the BB 'line of FIG. 3, and is a figure which shows the state which the holder opened. It is a front view of a lock pin in an embodiment of the present invention, and is a figure (A) showing a state where a lock pin is inserted in a fixture, and a figure (B) showing a state pulled out. It is sectional drawing which follows the CC 'line of FIG. It is a left view of the holder in embodiment of this invention. It is sectional drawing which follows the AA 'line of FIG. In embodiment of this invention, it is the perspective view seen from the surface which has the notch part of a support rod. In embodiment of this invention, it is the perspective view seen from the surface which has the support piece of a support rod. It is an enlarged view of the support piece in embodiment of this invention. It is an enlarged view of the support groove | channel in embodiment of this invention. FIG. 14A is a cross-sectional view taken along the line DD ′ in FIG. 13A and FIG. 14B is a diagram illustrating a state in which a workpiece adhering material is scattered, and FIG. It is a front view of the spindle in an embodiment of the present invention, and is a figure explaining mounting of a holder.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Substrate drying apparatus, 2 ... Holder, 3 ... Spindle, 4 ... Cleaning cover, 5 ... Drying cover, 6 ... Nozzle, 7 ... Cleaning liquid supply mechanism, 8 ... Ventilation port, 9 ... Discharge port, 10 ... Bearing part, 11 ... Support rod, 11A ... Support piece, 11a ... Outer surface, 11b ... Gap, 11c ... Base part, 11d ... receiving part, 11e ... end face, 11f ... support hole, 12 ... fixing tool, 12a ... main body, 12b ... support plate, 12c ... cover member, 12d ... Mounting plate, 12e ... Chuck claw, 12f ... Mounting plate, 12g ... Notch, 12h ... Locking plate, 12i ... Mounting hole, 12j ... Lock pin, 12k ..Spring member, 12l ... tip, 12m ... insertion hole, 12n ... pin, 13 ... Holding groove, 13a ... receiving groove upper part, 13b ... receiving groove side part, 13c ... receiving groove lower part, 13d ... auxiliary receiving groove, 14 ... passing hole, 15 ... notch part , 16 ... elastic member, 50, 51 ... spindle support, 52 ... support body, 53, 54 ... support shaft, 55 ... motor

Claims (8)

A substrate drying apparatus that rotates a disk-shaped substrate and scatters deposits on the substrate by centrifugal force,
A plurality of the substrates, each having a holder that can be separated and stored in parallel;
The holder passes through the center of the substrate and rotates around a rotation center axis perpendicular to the substrate, and three or more supports for holding the substrate so as to surround the outer periphery. A rod,
A plurality of support grooves are provided on the inner surface of the support rod for fixing and holding the substrates at positions separated from each other,
On the outer surface of the support rod, a plurality of passage holes that penetrate the support rod are provided,
Forming a notch in the support rod to communicate the support groove and the passage hole;
The substrate drying apparatus according to claim 1, wherein the passage hole has a function as a passage for scattering deposits attached to the substrate to the outside of the support rod when the substrate is rotated.   The substrate drying apparatus according to claim 1, wherein a shape of the support groove is substantially V-shaped. The holder has a fixture that can fix both ends of the support rod at both ends of the support rod;
3. The substrate drying apparatus according to claim 1, wherein at least one of the support rods has a spring mechanism capable of pressing the substrate against another support rod.   4. The holder according to claim 1, wherein at least one of the support rods is detachable from the fixture, and is released from the holder when the substrate is attached to or detached from the holder. The substrate drying apparatus according to claim 1.   5. The apparatus according to claim 1, further comprising: a spindle capable of rotating the entire holder while holding the fixture, and a mechanism for supplying cleaning liquid from the outside to the holder by a nozzle. The substrate drying apparatus as described. A movable cleaning cover that can cover the entire holder during the cleaning process, a movable drying cover that can cover the entire holder during the drying process, an air vent that feeds dry air, and a scattered object by rotation And a discharge port for discharging
The substrate drying apparatus according to any one of claims 1 to 5, further comprising an automatic cleaning / drying system capable of alternately covering the holder with the cleaning cover and the drying cover.   The substrate drying apparatus according to claim 6, wherein the plurality of nozzles are installed in at least one row inside the cleaning cover. It is a holder that can store the objects to be processed in parallel with each other,
A rotation mechanism that rotates around a rotation center axis that passes through each center of the object to be processed and is perpendicular to the object to be processed, and three or more for holding the object to be surrounded from the outer periphery thereof And a support rod of
A plurality of support grooves are provided on the inner surface of the support rod to fix and hold the objects to be processed at positions separated from each other,
On the outer surface of the support rod, a plurality of passage holes that penetrate the support rod are provided,
Forming a cut portion communicating the support groove and the passage hole;
The holder, wherein the passage hole has a function as a passage for scattering deposits adhering to the target object to the outside of the support rod when the target object rotates.

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