JP2010170637A - Spin dryer - Google Patents

Spin dryer Download PDF

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JP2010170637A
JP2010170637A JP2009014719A JP2009014719A JP2010170637A JP 2010170637 A JP2010170637 A JP 2010170637A JP 2009014719 A JP2009014719 A JP 2009014719A JP 2009014719 A JP2009014719 A JP 2009014719A JP 2010170637 A JP2010170637 A JP 2010170637A
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substrate
inner peripheral
contact
pair
spin
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Takahiro Kushino
高宏 久志野
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Resonac Holdings Corp
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Showa Denko KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a spin dryer preventing the generation of drying stain. <P>SOLUTION: The spin dryer spin-drying a disk like substrate 2A having a center hole by rotating the substrate 2A after washing it by a washing liquid includes a plurality of chucking members 1A holding an inner peripheral part of the substrate 2A and a spindle motor rotationally driving the substrate 2A held by the chucking members 1A. A groove 3 with which an inner peripheral part of the substrate 2A is engaged is formed at an outer peripheral part of the chucking members 1A, and the groove 3 includes: a bottom surface 3a abutting on an inner peripheral end surface 2c of the substrate 2A; a pair of abutment surfaces 3b formed to obliquely stand toward the outer side from both ends of the bottom surface 3a and abutting on inclined surfaces 2d formed between both principal surfaces 2a and 2b and the inner peripheral end surface 2c of the substrate 2A; and a pair of non-contact surfaces 3c formed to obliquely stand toward the outer side from the pair of abutment surfaces 3b and not contacting with the inner peripheral part of the substrate 2A. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、中心孔を有する円盤状の基板を洗浄液で洗浄した後に、この基板を回転させることによってスピン乾燥させるスピン乾燥装置に関する。   The present invention relates to a spin drying apparatus for cleaning a disk-shaped substrate having a central hole with a cleaning liquid and then spinning the substrate by rotating the substrate.

例えば、情報機器等に搭載されるハードディスクドライブなどには、中心孔を有する円盤状の磁気記録媒体用基板が使用されている。このような磁気記録媒体用基板は、アルミニウム合金やガラスなどからなる基板を用いて、切削工程や、研削工程、研磨工程、スパッタリング工程、めっき工程などの種々の処理工程を経ることによって製造される。また、これらの処理工程が行われた後に、基板の表面を洗浄し乾燥させる工程が行われる。   For example, a disk-shaped magnetic recording medium substrate having a central hole is used in a hard disk drive or the like mounted on an information device or the like. Such a magnetic recording medium substrate is manufactured by using a substrate made of an aluminum alloy, glass, or the like, through various processing steps such as a cutting step, a grinding step, a polishing step, a sputtering step, and a plating step. . Further, after these processing steps are performed, a step of cleaning and drying the surface of the substrate is performed.

ところで、近年、記録媒体の大容量化と情報機器等の小型化に対する要望から、磁気記録媒体の記録密度はますます高まっている。また、このような磁気記録媒体用基板に対しては、その記録面上を浮上走行する磁気ヘッドの低浮上化に対応できる高い平坦度が求められている。   By the way, in recent years, the recording density of magnetic recording media has been increasing more and more due to the demand for larger capacity of recording media and downsizing of information equipment. Also, such a magnetic recording medium substrate is required to have a high flatness that can cope with a low flying height of a magnetic head that floats on the recording surface.

このため、磁気記録媒体用基板では、研磨加工などの様々な表面処理を施した後に、基板表面に付着した塵埃などを除去できる高度な洗浄方法と、洗浄した磁気記録媒体用基板を清浄に乾燥するための乾燥方法が求められている。   For this reason, in the magnetic recording medium substrate, after performing various surface treatments such as polishing, an advanced cleaning method that can remove dust and the like adhering to the substrate surface, and the cleaned magnetic recording medium substrate is cleanly dried. There is a need for a drying method.

従来、基板の洗浄及び乾燥方法としては、大径の基板の場合、キャリアと呼ばれる容器の中に多数枚の基板を収容し、洗浄液の中を搬送しながら、多数の洗浄ブラシによってスクラブ洗浄した後に、基板を回転させてスピン乾燥させることが行われている。   Conventionally, as a method for cleaning and drying a substrate, in the case of a large-diameter substrate, a large number of substrates are housed in a container called a carrier, and after scrub cleaning with a large number of cleaning brushes while transporting the cleaning liquid. The substrate is rotated and spin-dried.

また、磁気ディスク基板などをワークとし、この表面に研磨加工などの表面処理を行った後に、ワークの表面に付着している異物などを除去するため、複数の洗浄槽を用いてワークをコンベアにより搬送しながら、液体を用いて洗浄する洗浄装置が提案されている(特許文献1を参照。)。   In addition, after a surface treatment such as polishing is performed on the surface of a magnetic disk substrate or the like, the work is moved by a conveyor using a plurality of cleaning tanks in order to remove foreign matters adhering to the surface of the work. There has been proposed a cleaning apparatus that uses a liquid while transporting (see Patent Document 1).

また、半導体基板をウェーハとし、複数枚のウェーハを収納したカセットをクレードルに収納し、ウェーハに水滴や塵埃が滞留するのを防ぐため、V字溝を有する部材でウェーハを平行に離間させて保持しながら、クレードルを回転させるウェーハ乾燥装置が提案されている(特許文献2を参照。)。   In addition, a semiconductor substrate is used as a wafer, and a cassette containing a plurality of wafers is stored in a cradle. On the other hand, a wafer drying apparatus that rotates a cradle has been proposed (see Patent Document 2).

また、中央に開口部がある円盤状ディスクに付着した洗浄液を、このディスクを回転することにより除去するスピン乾燥装置において、外周部をチャックするチャック部材とチャックされるディスクとが接触する接触部の一部を、チャック部材とディスクとが接触しない非接触部とし、チャック部材に滞留する洗浄液を効率的に除去することが提案されている(特許文献3を参照。)。   Further, in the spin drying apparatus that removes the cleaning liquid adhering to the disk-shaped disk having an opening in the center by rotating the disk, the contact portion where the chuck member that chucks the outer periphery and the disk to be chucked contacts It has been proposed that a part is a non-contact portion where the chuck member and the disk are not in contact with each other, and the cleaning liquid staying on the chuck member is efficiently removed (see Patent Document 3).

また、中央に開口部がある円盤状ディスクに付着した洗浄液を、このディスクを回転することにより除去するスピン乾燥装置において、内周部をチャックするチャック部材によってディスクを立てた状態でチャックさせて、チャック部材とディスクとの当接部の回転方向における後方側に向けてエアを供給するエア供給部を設け、チャック部材に滞留する洗浄液を効率的に除去することが提案されている(特許文献4を参照。)。   Further, in the spin drying apparatus that removes the cleaning liquid adhering to the disk-shaped disk having an opening in the center by rotating the disk, the disk is chucked in a state where the disk is set up by the chuck member that chucks the inner peripheral part, It has been proposed to provide an air supply part for supplying air toward the rear side in the rotation direction of the contact part between the chuck member and the disk, and to efficiently remove the cleaning liquid staying on the chuck member (Patent Document 4). See).

しかしながら、このような高性能な洗浄装置を用いて磁気記録媒体用基板に付着した塵埃などを基板表面から分離しても、その分離した塵埃などを含む洗浄液を基板表面から確実に除去しない限り、塵埃などが磁気記録媒体用基板に再付着するといった問題が生じてしまう。すなわち、磁気記録媒体用基板を洗浄した後に、洗浄液が少しでも基板上に残留すると、乾燥後に残留した洗浄液に含まれる塵埃などが基板表面に再付着することになる。また、残留した洗浄液によって大気中の塵埃などが付着し易くなるといった問題も発生してしまう。   However, even if the dust attached to the magnetic recording medium substrate is separated from the substrate surface using such a high-performance cleaning device, unless the cleaning liquid containing the separated dust is reliably removed from the substrate surface, There arises a problem that dust or the like reattaches to the magnetic recording medium substrate. That is, after cleaning the magnetic recording medium substrate, if any cleaning liquid remains on the substrate, dust or the like contained in the cleaning liquid remaining after drying will reattach to the substrate surface. In addition, there is a problem that dust in the atmosphere is easily attached by the remaining cleaning liquid.

ここで、磁気記録媒体用基板を洗浄液で洗浄した後に、この基板を回転させることによってスピン乾燥させるスピン乾燥装置において、基板を保持する(チャッキングという。)方法としては、例えば、図4に示すように、基板Wの内周部を複数のチャック部材100でチャッキングする方法と、図5に示すように、基板Wの外周部を複数のチャック部材200でチャッキングする方法とがある。しかしながら、何れの方法も、スピン乾燥後にチャック部分に水滴が残存する可能性があり、その残存した水滴によって基板の主面上に乾燥染みを生じさせることがある。   Here, as a method of holding the substrate (referred to as chucking) in a spin drying apparatus in which the magnetic recording medium substrate is washed with a cleaning liquid and then spin-dried by rotating the substrate, for example, as shown in FIG. As described above, there are a method of chucking the inner peripheral portion of the substrate W with a plurality of chuck members 100 and a method of chucking the outer peripheral portion of the substrate W with a plurality of chuck members 200 as shown in FIG. However, in any of the methods, water droplets may remain on the chuck portion after spin drying, and the residual water droplets may cause a dry stain on the main surface of the substrate.

例えば、図4に示すように、基板Wの内周部を複数のチャック部材100でチャッキングする方法では、チャック部材100の回転モーメントが小さく、また、回転時のセンター出しが容易なので、高速回転性には優れているものの、チャック部材100に加わる遠心力は基板Wの外周部に比べ小さいため、基板Wの内周部に水滴が残存する可能性が高くなる。また、基板Wの内周部に残存した水滴は、基板Wが回転している間、特に基板表面が乾燥した後に、チャック部材100より基板表面を外周部に向かって移動するため、乾燥染みが発生し易くなる。   For example, as shown in FIG. 4, in the method of chucking the inner periphery of the substrate W with the plurality of chuck members 100, the rotational moment of the chuck member 100 is small and the centering at the time of rotation is easy. Although excellent in performance, the centrifugal force applied to the chuck member 100 is smaller than that of the outer peripheral portion of the substrate W, so that the possibility that water droplets remain on the inner peripheral portion of the substrate W increases. Further, the water droplets remaining on the inner peripheral portion of the substrate W move from the chuck member 100 toward the outer peripheral portion while the substrate W is rotating, in particular, after the substrate surface is dried. It tends to occur.

一方、図5に示すように、基板Wの外周部を複数のチャック部材200でチャッキングする方法では、このような乾燥染みは発生し難いものの、高速回転時に基板Wの把持力を維持するためのバランサー201が必要となるため、このバランサー201が高速回転中に基板周辺に乱流を発生させて、基板表面に対する汚れや液滴などの再付着を誘発することがある。   On the other hand, as shown in FIG. 5, in the method of chucking the outer peripheral portion of the substrate W with the plurality of chuck members 200, such a dry stain is unlikely to occur, but in order to maintain the gripping force of the substrate W during high-speed rotation. Therefore, the balancer 201 may generate turbulent flow around the substrate during high-speed rotation, and induce reattachment of dirt and droplets to the substrate surface.

特開2001−96245号公報JP 2001-96245 A 特開平8−45894号公報JP-A-8-45894 特開2003−257017号公報Japanese Patent Laid-Open No. 2003-257017 特許第2782838号公報Japanese Patent No. 2782838

本発明は、このような従来の事情に鑑みて提案されたものであり、中心孔を有する円盤状の基板を洗浄液で洗浄した後に、この基板を回転させることによってスピン乾燥させるスピン乾燥装置において、乾燥染みが発生することを防止したスピン乾燥装置を提供することを目的とする。   The present invention has been proposed in view of such conventional circumstances, in a spin drying apparatus that spin-drys by rotating the substrate after cleaning the disc-shaped substrate having a central hole with a cleaning liquid, An object of the present invention is to provide a spin drying apparatus that prevents the occurrence of dry stain.

上記課題を解決するため、本発明は以下の手段を提供する。
(1) 中心孔を有する円盤状の基板を洗浄液で洗浄した後に、前記基板を回転させることによってスピン乾燥させるスピン乾燥装置であって、
前記基板の内周部を保持する複数のチャック部材と、
前記チャック部材により保持された基板を回転駆動するスピンドルモータとを備え、
前記チャック部材の外周部には、前記基板の内周部が係合される溝部が設けられ、
前記溝部は、前記基板の内周端面と当接される底面と、前記底面の両端から外側に向かって斜めに立ち上がり形成されて、前記基板の両主面と内周端面との間に設けられた傾斜面と当接される一対の当接面と、前記一対の当接面から外側に向かって斜めに立ち上がり形成されて、前記基板の内周部とは非接触とされる一対の非接触面とを有することを特徴とするスピン乾燥装置。
In order to solve the above problems, the present invention provides the following means.
(1) A spin drying apparatus that spin-drys the substrate by rotating the substrate after cleaning the disc-shaped substrate having a central hole with a cleaning liquid,
A plurality of chuck members for holding the inner periphery of the substrate;
A spindle motor that rotationally drives the substrate held by the chuck member;
In the outer peripheral portion of the chuck member, a groove portion that is engaged with the inner peripheral portion of the substrate is provided,
The groove portion is formed between a bottom surface that is in contact with the inner peripheral end surface of the substrate and an obliquely rising outward from both ends of the bottom surface, and is provided between both main surfaces of the substrate and the inner peripheral end surface. A pair of contact surfaces that are in contact with the inclined surfaces and a pair of non-contacts that are formed to rise obliquely outward from the pair of contact surfaces and are not in contact with the inner peripheral portion of the substrate A spin drying apparatus having a surface.

以上のように、本発明に係るスピン乾燥装置では、チャック部材の外周部に設けられた溝部に基板の内周部が係合されたときに、溝部の底面が基板の内周端面と当接されると共に、一対の当接面が基板の傾斜面と当接されることによって、これらチャック部材の溝部と基板の内周部との間に隙間が生じないようにする。これにより、チャック部材の溝部と基板の内周部との間に洗浄液が残存することを防止することができる。   As described above, in the spin drying apparatus according to the present invention, when the inner peripheral portion of the substrate is engaged with the groove portion provided on the outer peripheral portion of the chuck member, the bottom surface of the groove portion contacts the inner peripheral end surface of the substrate. At the same time, the pair of contact surfaces are in contact with the inclined surface of the substrate, so that no gap is generated between the groove portion of the chuck member and the inner peripheral portion of the substrate. Thereby, it is possible to prevent the cleaning liquid from remaining between the groove portion of the chuck member and the inner peripheral portion of the substrate.

また、チャック部材に付着した水滴は、基板が回転する間に遠心力によって非接触面を伝って振り切られるため、このチャック部材に水滴が残存し難くなる。したがって、基板の回転を停止した後に、溝部から出た水滴が基板の両主面上を移動するといったことを防ぐことができる。   Further, since the water droplets adhering to the chuck member are spun off along the non-contact surface by the centrifugal force while the substrate rotates, the water droplets hardly remain on the chuck member. Therefore, it is possible to prevent water droplets coming out of the groove from moving on both main surfaces of the substrate after the rotation of the substrate is stopped.

したがって、本発明に係るスピン乾燥装置では、このような複数のチャック部材により保持された基板をスピンドルモータで回転駆動することによって、基板に付着した洗浄液を効率良く除去することが可能であり、また、基板の表面に乾燥染みが発生することを防止することが可能である。   Therefore, in the spin drying apparatus according to the present invention, it is possible to efficiently remove the cleaning liquid adhering to the substrate by rotationally driving the substrate held by the plurality of chuck members with a spindle motor. It is possible to prevent dry stains from occurring on the surface of the substrate.

図1は、本発明を適用したスピン乾燥装置で使用されるチャック部材の一例を示す側面図である。FIG. 1 is a side view showing an example of a chuck member used in a spin drying apparatus to which the present invention is applied. 図2は、本発明を適用したスピン乾燥装置で使用されるチャック部材の他例を示す側面図である。FIG. 2 is a side view showing another example of the chuck member used in the spin drying apparatus to which the present invention is applied. 図3は、比較例として示す従来のチャック部材の側面図である。FIG. 3 is a side view of a conventional chuck member shown as a comparative example. 図4は、基板の内周部を複数のチャック部材で保持する機構の側面図である。FIG. 4 is a side view of a mechanism for holding the inner periphery of the substrate with a plurality of chuck members. 図5は、基板の外周部を複数のチャック部材で保持する機構の側面図である。FIG. 5 is a side view of a mechanism for holding the outer peripheral portion of the substrate with a plurality of chuck members.

以下、本発明を適用したスピン乾燥装置について、図面を参照して詳細に説明する。
本発明を適用したスピン乾燥装置は、中心孔を有する円盤状の基板を洗浄液で洗浄した後に、この基板を回転させることによってスピン乾燥させるものである。
Hereinafter, a spin drying apparatus to which the present invention is applied will be described in detail with reference to the drawings.
In the spin drying apparatus to which the present invention is applied, a disk-shaped substrate having a central hole is washed with a cleaning solution, and then the substrate is rotated to spin-dry.

具体的に、本発明を適用したスピン乾燥装置は、基板の内周部を保持する複数のチャック部材と、これら複数のチャック部材により保持された基板を回転駆動するスピンドルモータとを備えて概略構成されている。   Specifically, a spin drying apparatus to which the present invention is applied includes a plurality of chuck members that hold the inner periphery of the substrate and a spindle motor that rotationally drives the substrate held by the plurality of chuck members. Has been.

複数のチャック部材は、スピンドルモータの回転軸の先端に取り付けられた内周チャック機構を介して、基板の中心孔の内側に進入可能とされると共に、基板の内周部に対して接離可能な方向に移動可能に支持されている。   The plurality of chuck members can enter the inside of the center hole of the substrate via the inner periphery chuck mechanism attached to the tip of the spindle of the spindle motor, and can contact and separate from the inner periphery of the substrate. It is supported so that it can move in any direction.

また、複数のチャック部材は、基板の内周部を少なくとも3点で支持するように、スピンドルモータの回転軸を中心にして、その周囲に一定の間隔(例えば120゜間隔)で並んで配置されている。さらに、複数のチャック部材は、長尺状の軸体からなり、互いの軸線をスピンドルモータの回転軸と一致した方向に平行に並べた状態で配置されている。   The plurality of chuck members are arranged side by side at a fixed interval (for example, 120 ° interval) around the rotation axis of the spindle motor so as to support the inner periphery of the substrate at at least three points. ing. Further, the plurality of chuck members are formed of a long shaft body, and are arranged in a state in which the axis lines of the chuck members are arranged in parallel in a direction coinciding with the rotation axis of the spindle motor.

ここで、本発明を適用したスピン乾燥装置の特徴部分として、チャック部材の外周部には、基板の内周部が係合される溝部が設けられている。そして、この溝部は、基板の内周端面と当接される底面と、この底面の両端から外側に向かって斜めに立ち上がり形成されて、基板の両主面と内周端面との間に設けられた傾斜面と当接される一対の当接面と、これら一対の当接面から外側に向かって斜めに立ち上がり形成されて、基板とは非接触とされる一対の非接触面とを有することを特徴としている。   Here, as a characteristic part of the spin drying apparatus to which the present invention is applied, a groove portion that is engaged with the inner peripheral portion of the substrate is provided on the outer peripheral portion of the chuck member. Then, the groove is formed between the bottom surface of the substrate and the inner peripheral end surface, which is formed so as to rise obliquely outward from both ends of the bottom surface. A pair of contact surfaces that are in contact with the inclined surfaces, and a pair of non-contact surfaces that are formed to rise obliquely outward from the pair of contact surfaces and are not in contact with the substrate. It is characterized by.

そして、このスピン乾燥装置は、例えば磁気記録媒体用基板に対して水洗浄等を行った後に、濡れた磁気記録媒体用基板を高速で回転させることによって、水滴を遠心力で振り切りながら乾燥させる場合に好適に用いられる。   In this spin drying apparatus, for example, after performing water cleaning or the like on the magnetic recording medium substrate, the wet magnetic recording medium substrate is rotated at a high speed to dry the water droplets while shaking off with centrifugal force. Is preferably used.

以下、本発明の実施形態として図1及び図2に示すチャック部材1A,1Bを用いた場合と、比較例として図3(a),(b)に示す従来のチャック部材100Aを用いた場合との比較から、本発明をより具体的に説明するものとする。   Hereinafter, the case where the chuck members 1A and 1B shown in FIGS. 1 and 2 are used as an embodiment of the present invention, and the case where the conventional chuck member 100A shown in FIGS. 3A and 3B is used as a comparative example. From this comparison, the present invention will be described more specifically.

図1〜図3に示す磁気記録媒体用基板は、何れも中心孔を有する円盤状の基板2A,2Bであり、この基板2A,2Bには、基板加工時において端面に発生するバリを除去する目的で、また基板のハンドリングに際して基板の端部が尖っていると、この部分でチャック部材が削れてダストが発生するため、これを防ぐ目的で、その両主面2a,2bと内周端面2cとの間のエッジ部分に面取りを施すチャンファー加工が行われている。そして、この基板2A,2Bには、このようなチャンファー加工を施すことによって、その両主面2a,2bと内周端面2cとの間に傾斜面となる一対のチャンファー面2d,2dが設けられている。   Each of the magnetic recording medium substrates shown in FIGS. 1 to 3 is a disk-shaped substrate 2A, 2B having a center hole, and the burrs generated on the end face during substrate processing are removed from the substrates 2A, 2B. If the end of the substrate is sharp for the purpose and when handling the substrate, the chuck member is scraped off at this portion and dust is generated. For this purpose, both the main surfaces 2a and 2b and the inner peripheral end surface 2c are prevented. Chamfering is performed to chamfer the edge between the two. Then, by applying such chamfering to the substrates 2A and 2B, a pair of chamfer surfaces 2d and 2d which are inclined surfaces between the main surfaces 2a and 2b and the inner peripheral end surface 2c are formed. Is provided.

なお、図1に示す基板2Aと図2に示す基板2Bとは内周端面2cの幅とチャンファー面2dの傾斜角が異なる場合を示している。また、図3(a)に示す基板は、図1に示す基板2Aと同じ形状であり、図3(b)に示す磁気記録媒体用基板は、図2に示す基板2Bと同じ形状である。なお、図示を省略するが、基板2A,2Bの外周部にも、同様のチャンファー加工が施されている。   In addition, the board | substrate 2A shown in FIG. 1 and the board | substrate 2B shown in FIG. 2 have shown the case where the width | variety of the inner peripheral end surface 2c and the inclination angle of the chamfer surface 2d differ. 3A has the same shape as the substrate 2A shown in FIG. 1, and the magnetic recording medium substrate shown in FIG. 3B has the same shape as the substrate 2B shown in FIG. In addition, although illustration is abbreviate | omitted, the same chamfer process is given also to the outer peripheral part of board | substrate 2A, 2B.

ここで、本発明のチャック部材1Aは、図1に示すように、その外周部に基板2の内周部が係合される溝部3を有している。この溝部3は、基板2の内周端面2cと当接される底面3aと、この底面3aの両端から外側に向かって斜めに立ち上がり形成されて、基板2のチャンファー面2dと当接される一対の当接面3b,3bと、これら一対の当接面3b,3bから外側に向かって斜めに立ち上がり形成されて、基板2の内周部とは非接触とされる一対の非接触面3c,3cとを有して、チャック部材1Aの全周に亘って設けられている。   Here, as shown in FIG. 1, the chuck member 1A according to the present invention has a groove portion 3 with which the inner peripheral portion of the substrate 2 is engaged. The groove portion 3 is formed so as to rise obliquely outward from both ends of the bottom surface 3a and a bottom surface 3a that contacts the inner peripheral end surface 2c of the substrate 2, and contacts the chamfer surface 2d of the substrate 2. A pair of contact surfaces 3b, 3b and a pair of non-contact surfaces 3c that are formed to rise obliquely outward from the pair of contact surfaces 3b, 3b and are not in contact with the inner periphery of the substrate 2 , 3c, and is provided over the entire circumference of the chuck member 1A.

このうち、溝部3の底面3aの幅は、基板2の内周端面2cの幅と略々一致している。また、溝部3の底面3aに対して一対の当接面3b,3bがなす角度は、基板2の内周端面2cに対してチャンファー面2dがなす角度と略々一致している。また、一対の非接触面3c,3cは、この底面3aに対して当接面3bがなす角度よりも大きな角度で傾斜している。   Among these, the width of the bottom surface 3 a of the groove portion 3 substantially matches the width of the inner peripheral end surface 2 c of the substrate 2. Further, the angle formed by the pair of contact surfaces 3 b and 3 b with respect to the bottom surface 3 a of the groove portion 3 is substantially the same as the angle formed by the chamfer surface 2 d with respect to the inner peripheral end surface 2 c of the substrate 2. The pair of non-contact surfaces 3c and 3c are inclined at an angle larger than the angle formed by the contact surface 3b with respect to the bottom surface 3a.

これにより、チャック部材1Aは、その外周部に設けられた溝部3に基板2の内周部が係合されたときに、溝部3の底面3aが基板2の内周端面2cと当接されると共に、一対の当接面3b,3bが基板2のチャンファー面2d,2dと当接されることによって、この溝部3と基板2の内周部との間に隙間が生じないようにしている。   As a result, the chuck member 1A has the bottom surface 3a of the groove portion 3 in contact with the inner peripheral end surface 2c of the substrate 2 when the inner peripheral portion of the substrate 2 is engaged with the groove portion 3 provided on the outer peripheral portion thereof. At the same time, the pair of contact surfaces 3b and 3b are in contact with the chamfer surfaces 2d and 2d of the substrate 2, so that no gap is generated between the groove 3 and the inner peripheral portion of the substrate 2. .

一方、本発明のチャック部材1Bは、図2に示すように、その外周部に基板2の内周部が係合される溝部4を有している。この溝部4は、基板2の内周端面2cと当接される底面4aと、この底面4aの両端から外側に向かって斜めに立ち上がり形成されて、基板2のチャンファー面2dと当接される一対の当接面4b,4bと、これら一対の当接面4b,4bから外側に向かって斜めに立ち上がり形成されて、基板2の内周部とは非接触とされる一対の非接触面4c,4cとを有して、チャック部材1Bの全周に亘って設けられている。   On the other hand, as shown in FIG. 2, the chuck member 1B of the present invention has a groove portion 4 with which the inner peripheral portion of the substrate 2 is engaged with the outer peripheral portion thereof. The groove portion 4 is formed so as to rise obliquely outward from both ends of the bottom surface 4a and a bottom surface 4a that is in contact with the inner peripheral end surface 2c of the substrate 2, and is in contact with the chamfer surface 2d of the substrate 2. A pair of contact surfaces 4b, 4b and a pair of non-contact surfaces 4c that are formed to rise obliquely outward from the pair of contact surfaces 4b, 4b and are not in contact with the inner periphery of the substrate 2. , 4c, and is provided over the entire circumference of the chuck member 1B.

このうち、溝部4の底面4aの幅は、基板2の内周端面2cの幅と略々一致している。また、溝部4の底面4aに対して一対の当接面4b,4bがなす角度は、基板2の内周端面2cに対してチャンファー面2dがなす角度と略々一致している。また、一対の非接触面4c,4cは、この底面3aに対して当接面3bがなす角度と同じ角度で傾斜しており、一対の当接面4b,4bに連続して形成されている。   Among these, the width of the bottom surface 4 a of the groove portion 4 substantially coincides with the width of the inner peripheral end surface 2 c of the substrate 2. Further, the angle formed by the pair of contact surfaces 4 b and 4 b with respect to the bottom surface 4 a of the groove portion 4 is substantially the same as the angle formed by the chamfer surface 2 d with respect to the inner peripheral end surface 2 c of the substrate 2. Further, the pair of non-contact surfaces 4c, 4c are inclined at the same angle as the angle formed by the contact surface 3b with respect to the bottom surface 3a, and are formed continuously with the pair of contact surfaces 4b, 4b. .

これにより、チャック部材1Bは、その外周部に設けられた溝部4に基板2の内周部が係合されたときに、溝部4の底面4aが基板2の内周端面2cと当接されると共に、一対の当接面4b,4bが基板2のチャンファー面2d,2dと当接されることによって、この溝部4と基板2の内周部との間に隙間が生じないようにしている。   As a result, the chuck member 1B has the bottom surface 4a of the groove portion 4 in contact with the inner peripheral end surface 2c of the substrate 2 when the inner peripheral portion of the substrate 2 is engaged with the groove portion 4 provided on the outer peripheral portion thereof. At the same time, the pair of contact surfaces 4 b and 4 b are in contact with the chamfer surfaces 2 d and 2 d of the substrate 2, so that no gap is generated between the groove portion 4 and the inner peripheral portion of the substrate 2. .

一方、従来のチャック部材100Aは、図3(a),(b)に示すように、基板2の内周部が当接される位置にくびれ101aを有する円柱状のロッド部101にビニールチューブ102を被せた構造を有している。   On the other hand, in the conventional chuck member 100A, as shown in FIGS. 3A and 3B, a vinyl tube 102 is attached to a cylindrical rod portion 101 having a constriction 101a at a position where the inner peripheral portion of the substrate 2 abuts. It has a structure covered.

これにより、チャック部材100Aは、くびれ101aが形成された位置において基板2の内周部をビニールチューブ102に当接させながら、このビニールチューブ102を僅かに撓ませた状態で、基板2の内周部を保持することが可能となっている。   Thus, the chuck member 100A allows the inner periphery of the substrate 2 to be slightly bent while the inner periphery of the substrate 2 is in contact with the vinyl tube 102 at the position where the constriction 101a is formed. It is possible to hold the part.

しかしながら、従来のチャック部材100Aの構成では、基板2A,2Bのチャンファー面2dとの間に水滴が僅かに残存する場合がある。すなわち、このチャック部材100Aでは、ビニールチューブ102の撓み量やビニールチューブ102の摩耗量に依存して乾燥染みが不規則に発生することがあった。   However, in the configuration of the conventional chuck member 100A, a slight amount of water droplets may remain between the chamfer surfaces 2d of the substrates 2A and 2B. That is, in this chuck member 100A, dry stains may occur irregularly depending on the amount of bending of the vinyl tube 102 and the amount of wear of the vinyl tube 102.

これに対して、本発明のチャック部材1A,1Bでは、上述したように溝部3,4に基板2A,2Bの内周部が係合されたときに、この溝部3,4の底面3a,4aが基板2A,2Bの内周端面2cと当接されると共に、一対の当接面3b,4bが基板2のチャンファー面2d,2dと当接されることによって、溝部3,4と基板2の内周部との間に隙間が生じないようにするため、この部分に水滴が残存し難くなっている。   On the other hand, in the chuck members 1A and 1B of the present invention, when the inner peripheral portions of the substrates 2A and 2B are engaged with the groove portions 3 and 4 as described above, the bottom surfaces 3a and 4a of the groove portions 3 and 4 are engaged. Is brought into contact with the inner peripheral end surface 2c of the substrates 2A and 2B, and the pair of contact surfaces 3b and 4b are brought into contact with the chamfer surfaces 2d and 2d of the substrate 2, whereby the grooves 3 and 4 and the substrate 2 are contacted. In order to prevent a gap from being formed between the inner peripheral portion and the inner peripheral portion, water droplets hardly remain in this portion.

また、チャック部材1A,1Bに付着した水滴は、基板2A,2Bが回転する間に遠心力によって非接触面3c,4cを伝って振り切られるため、このチャック部材1A,1Bに水滴が残存し難くなる。したがって、基板2A,2Bの回転を停止した後に、溝部3,4から出た水滴が基板2A,2Bの両主面2a,2b上を移動するといったことを防ぐことができる。   Further, since the water droplets adhering to the chuck members 1A and 1B are spun off along the non-contact surfaces 3c and 4c by the centrifugal force while the substrates 2A and 2B rotate, the water droplets hardly remain on the chuck members 1A and 1B. Become. Therefore, it is possible to prevent the water droplets coming out of the grooves 3 and 4 from moving on both the main surfaces 2a and 2b of the substrates 2A and 2B after the rotation of the substrates 2A and 2B is stopped.

さらに、本発明のチャック部材1A,1Bでは、溝部3,4と基板2A,2Bの内周部との接触面積が大きく、このチャック部材1A,1Bの変形(撓み)も少ないことから、摩耗が減り、基板2A,2Bにダストが付着することが少なくなる。   Further, in the chuck members 1A and 1B of the present invention, since the contact area between the groove portions 3 and 4 and the inner peripheral portions of the substrates 2A and 2B is large, and the deformation (deflection) of the chuck members 1A and 1B is small, wear is reduced. And less dust adheres to the substrates 2A and 2B.

以上のように、本発明を適用したスピン乾燥装置では、上述した複数のチャック部材1A,1Bにより保持された基板2A,2Bをスピンドルモータで回転駆動することによって、基板2A,2Bに付着した水滴を効率良く除去することが可能であり、また、基板2A,2Bの表面に乾燥染みが発生することを防止することが可能である。   As described above, in the spin drying apparatus to which the present invention is applied, the water droplets attached to the substrates 2A and 2B are driven by rotating the substrates 2A and 2B held by the plurality of chuck members 1A and 1B with the spindle motor. Can be efficiently removed, and it is possible to prevent dry stains from occurring on the surfaces of the substrates 2A and 2B.

なお、本発明は、上記実施形態のものに必ずしも限定されるものではなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることが可能である。
例えば、本発明を適用したスピン乾燥装置は、上述した磁気記録媒体用基板を乾燥させる場合に限らず、中心孔を有する円盤状の基板を洗浄液で洗浄した後に、この基板をスピン乾燥させる場合に幅広く利用することが可能である。
In addition, this invention is not necessarily limited to the thing of the said embodiment, A various change can be added in the range which does not deviate from the meaning of this invention.
For example, the spin drying apparatus to which the present invention is applied is not limited to the case of drying the magnetic recording medium substrate described above, but when the disk-shaped substrate having the central hole is washed with a cleaning liquid and then the substrate is spin-dried. It can be used widely.

以下、実施例により本発明の効果をより明らかなものとする。なお、本発明は、以下の実施例に限定されるものではなく、その要旨を変更しない範囲で適宜変更して実施することができる。   Hereinafter, the effects of the present invention will be made clearer by examples. In addition, this invention is not limited to a following example, In the range which does not change the summary, it can change suitably and can implement.

本実施例では、実際に以下の条件にて基板の洗浄及びスピン乾燥を行った。
<基板の形状>
基板の外径:65mm
基板の厚み:1.27mm
中心孔の口径:20mm
チャンファー面の長さ:0.15mm
主面に対するチャンファー面の傾斜角:25゜
In this example, the substrate was actually cleaned and spin-dried under the following conditions.
<Board shape>
Board outer diameter: 65mm
Substrate thickness: 1.27 mm
Center hole diameter: 20 mm
Chamfer surface length: 0.15mm
Tilt angle of chamfer surface to main surface: 25 °

本実施例では、図1に示す形状のチャック部材1Aを3本用いて、基板の内周部を保持しながら、スピンドルモータにより基板を低速(1000rpm)で回転させ、ノズルから洗浄液として純水を均等に噴射し、基板の洗浄を30秒間行った。そして、洗浄液の噴出を停止した後、スピンドルモータにより基板を高速(5000rpm)で回転させ、この基板のスピン乾燥を15秒間行った。   In this embodiment, three chuck members 1A having the shape shown in FIG. 1 are used, the substrate is rotated at a low speed (1000 rpm) by a spindle motor while holding the inner peripheral portion of the substrate, and pure water is supplied as a cleaning liquid from the nozzle. The substrate was sprayed uniformly and the substrate was cleaned for 30 seconds. Then, after stopping the ejection of the cleaning liquid, the substrate was rotated at a high speed (5000 rpm) by a spindle motor, and the substrate was spin-dried for 15 seconds.

そして、乾燥後の基板の表面を微分干渉光学顕微鏡(600倍)で観察したところ、スピン乾燥後の基板表面には、乾燥むらや水ジミなどの付着物は一切観察されなかった。   When the surface of the substrate after drying was observed with a differential interference optical microscope (600 times), no deposits such as uneven drying and water spots were observed on the substrate surface after spin drying.

1A,1B…チャック部材 2A,2B…基板 2a,2b…主面 2c…内周端面 2d…チャンファー面(傾斜面)3…溝部 3a…底面 3b…当接面 3c…非接触面 4a…底面 4b…当接面 4c…非接触面   DESCRIPTION OF SYMBOLS 1A, 1B ... Chuck member 2A, 2B ... Board | substrate 2a, 2b ... Main surface 2c ... Inner peripheral end surface 2d ... Chamfer surface (inclined surface) 3 ... Groove 3a ... Bottom surface 3b ... Contact surface 3c ... Non-contact surface 4a ... Bottom surface 4b: Contact surface 4c: Non-contact surface

Claims (1)

中心孔を有する円盤状の基板を洗浄液で洗浄した後に、前記基板を回転させることによってスピン乾燥させるスピン乾燥装置であって、
前記基板の内周部を保持する複数のチャック部材と、
前記チャック部材により保持された基板を回転駆動するスピンドルモータとを備え、
前記チャック部材の外周部には、前記基板の内周部が係合される溝部が設けられ、
前記溝部は、前記基板の内周端面と当接される底面と、前記底面の両端から外側に向かって斜めに立ち上がり形成されて、前記基板の両主面と内周端面との間に設けられた傾斜面と当接される一対の当接面と、前記一対の当接面から外側に向かって斜めに立ち上がり形成されて、前記基板とは非接触とされる一対の非接触面とを有することを特徴とするスピン乾燥装置。
A spin drying apparatus that spin-drys the substrate by rotating the substrate after cleaning the disc-shaped substrate having a central hole with a cleaning liquid,
A plurality of chuck members for holding the inner periphery of the substrate;
A spindle motor that rotationally drives the substrate held by the chuck member;
In the outer peripheral portion of the chuck member, a groove portion that is engaged with the inner peripheral portion of the substrate is provided,
The groove portion is formed between a bottom surface that is in contact with the inner peripheral end surface of the substrate and an obliquely rising outward from both ends of the bottom surface, and is provided between both main surfaces of the substrate and the inner peripheral end surface. A pair of contact surfaces that are in contact with the inclined surfaces, and a pair of non-contact surfaces that are formed to rise obliquely outward from the pair of contact surfaces and are not in contact with the substrate. A spin dryer characterized by that.
JP2009014719A 2009-01-26 2009-01-26 Spin dryer Pending JP2010170637A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013015752A1 (en) * 2011-07-28 2013-01-31 Hoya Glass Disk (Thailand) Ltd. Chamfering apparatus and method of manufacturing glass substrate for information recording medium

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0391687A (en) * 1989-09-01 1991-04-17 Hitachi Electron Eng Co Ltd Spin drying apparatus for disk
JPH03113827A (en) * 1989-09-27 1991-05-15 Hitachi Electron Eng Co Ltd Spin drier for disk
JP2003257017A (en) * 2002-02-28 2003-09-12 Hitachi Electronics Eng Co Ltd Spin drier for disk

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0391687A (en) * 1989-09-01 1991-04-17 Hitachi Electron Eng Co Ltd Spin drying apparatus for disk
JPH03113827A (en) * 1989-09-27 1991-05-15 Hitachi Electron Eng Co Ltd Spin drier for disk
JP2003257017A (en) * 2002-02-28 2003-09-12 Hitachi Electronics Eng Co Ltd Spin drier for disk

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013015752A1 (en) * 2011-07-28 2013-01-31 Hoya Glass Disk (Thailand) Ltd. Chamfering apparatus and method of manufacturing glass substrate for information recording medium

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