JP2008158524A - Method of forming cell gap for liquid crystal panel - Google Patents

Method of forming cell gap for liquid crystal panel Download PDF

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JP2008158524A
JP2008158524A JP2007326934A JP2007326934A JP2008158524A JP 2008158524 A JP2008158524 A JP 2008158524A JP 2007326934 A JP2007326934 A JP 2007326934A JP 2007326934 A JP2007326934 A JP 2007326934A JP 2008158524 A JP2008158524 A JP 2008158524A
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liquid crystal
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isolation layer
crystal panel
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JP5158542B2 (en
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Ling-Yuan Tseng
令遠 曾
Jeng-Shing Liau
正興 廖
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<P>PROBLEM TO BE SOLVED: To provide a method of forming a cell gap for a liquid crystal panel. <P>SOLUTION: The method includes steps of: fixing a bottom substrate of the liquid crystal panel at a normal position; providing at least one UV adhesive layer on the top and reverse of at least one isolation layer; providing a few cavities (pixel display region) in the isolation layer; opposing the isolation layer to the bottom substrate and bonding it to the bottom substrate with the UV adhesive layer at the lower end; injecting liquid crystal into the respective cavities of the isolation layer; joining the isolation layer to a top substrate of the liquid crystal panel with the UV adhesive layer at the upper end; curing the upper and lower UV adhesive layers by irradiation with ultraviolet light and heating; and joining the bottom substrate and top substrate of the liquid crystal panel to the bottom and top of the isolation layer respectively to form a cell gap of the liquid crystal panel by the isolation layer. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は一種の液晶パネルのセルギャップ形成方法に係り、特に液晶パネルの製造に応用され、上下が接着可能な隔離層と液晶パネルの上面基板と底面基板を接着して液晶パネルのセルギャップを形成する方法に関する。   The present invention relates to a cell gap forming method for a liquid crystal panel, and is particularly applied to the manufacture of a liquid crystal panel. It relates to a method of forming.

液晶は広く使用されているディスプレイ製品の材料であり、液晶は電圧を両面電極に印加することにより光を通過−非通過の作用を形成する。通常、周知の液晶層は二つの電極の間の厚さが非常に薄く、例えば、TFT型液晶ディスプレイでは、厚さが6から8μmであり、TN或いはSTN型液晶パネルの液晶層とギャップは10μm以下である。LCOSマイクロディスプレイの液晶層の平均厚さは3から5μm程度である。   Liquid crystal is a widely used material for display products, and the liquid crystal forms a light passing through non-passing action by applying a voltage to the double-sided electrodes. In general, a known liquid crystal layer has a very thin thickness between two electrodes. For example, in a TFT type liquid crystal display, the thickness is 6 to 8 μm, and a gap between the TN or STN type liquid crystal panel and the liquid crystal layer is 10 μm. It is as follows. The average thickness of the liquid crystal layer of the LCOS micro display is about 3 to 5 μm.

周知の比較的厚さの薄い液晶パネルの特性は以下のようである。
1.液晶分子の極めて急速な上昇と下降の反応時間、厚さが比較的薄いセルギャップ及び低電圧駆動の液晶材料、低電圧駆動による更に低い電力消費の達成、及び容易に設計できる電子制御回路
2.比較的高い透過率、厚さが低いセルギャップは比較的高い透過率を形成できる
3.組立が容易である。比較的薄いセルギャップは通常スペーサ粒子を使用することで均一に維持される。セルギャップは広く液晶ディスプレイ産業に採用されている。比較的小さいギャップ粒子は製造工程中で獲得及び掌握しやすい。
The characteristics of the known relatively thin liquid crystal panel are as follows.
1. 1. Extremely rapid rise and fall reaction time of liquid crystal molecules, relatively thin cell gap and low voltage drive liquid crystal material, lower power consumption achieved by low voltage drive, and electronic control circuit that can be easily designed. 2. A cell gap having a relatively high transmittance and a low thickness can form a relatively high transmittance. Easy to assemble. The relatively thin cell gap is usually maintained uniform by using spacer particles. The cell gap is widely adopted in the liquid crystal display industry. The relatively small gap particles are easy to acquire and seize during the manufacturing process.

ただし、応用領域によっては、厚さが比較的厚い液晶層が必要であるが、駆動の問題に突き当たる。   However, depending on the application area, a liquid crystal layer having a relatively large thickness is required, but it poses a driving problem.

周知の液晶パネルの生産過程で、ガラス基板の内面に接着剤を滴下し並びに液晶収容部を形成し、更に上端ガラス基板で上端を封じて内部液晶収容構造を形成し、並びにエッジ部分の開口より、減圧器で真空にした後に液晶をこの内部液晶収容構造に注入するか、別に周知の滴下方式で液晶を液晶収容構造中に注入し、並びにスペーサ粒子を混合してセルギャップを形成及び維持する。   In the production process of a well-known liquid crystal panel, an adhesive is dropped on the inner surface of the glass substrate and a liquid crystal housing portion is formed, and the upper end glass substrate is sealed at the upper end to form an internal liquid crystal housing structure. The liquid crystal is injected into the internal liquid crystal housing structure after being evacuated by a decompressor, or the liquid crystal is injected into the liquid crystal housing structure by another well-known dropping method, and the spacer particles are mixed to form and maintain the cell gap. .

もしセルギャップが30μm、50μm、100μmにまで増加するか、或いは更に高い時、スペーサ粒子を取得しにくく、且つコストが大幅に増加する。すなわち比較的大きな粒径のスペーサ粒子は無理して解決できても、内部液晶収容構造が厚さが比較的薄い接着内壁を維持並びに形成できず、且つ幅が大幅に増加して小型化要求に符合しなくなり、このような製造工程の状況ではこのような構造を受け入れられない。   If the cell gap is increased to 30 μm, 50 μm, 100 μm or higher, it is difficult to obtain spacer particles and the cost is greatly increased. In other words, even if spacer particles with a relatively large particle size can be forcibly solved, the inner liquid crystal housing structure cannot maintain and form a relatively thin adhesive inner wall, and the width is greatly increased to meet the demand for miniaturization. Such a structure is unacceptable in such a manufacturing process situation.

先行技術文献としては、例えば特許文献1があり、周知の典型的な液晶パネルの製造方法が開示され、それはスペーサの分布を均一とすることができるだけで、厚いギャップの形成効果を達成できない。   As a prior art document, for example, there is Patent Document 1, which discloses a well-known typical method of manufacturing a liquid crystal panel, which can only make the spacer distribution uniform and cannot achieve the effect of forming a thick gap.

台湾特許公開公報第200610585号Taiwan Patent Publication No. 200610585

本発明の主要な目的は、一種の液晶パネルのセルギャップ形成方法、特に、隔離層に空洞を形成し、液晶をODF方法で注入し、並びに隔離層によりセルギャップを形成する方法を提供することにある。   The main object of the present invention is to provide a kind of liquid crystal panel cell gap forming method, in particular, a method of forming a cavity in an isolation layer, injecting liquid crystal by an ODF method, and forming a cell gap by the isolation layer. It is in.

本発明の更なる目的は、一種の液晶パネルのセルギャップ形成方法、特に、生産の周期を増し、スペーサ粒コストを節約し、並びにセル生産の品質を向上する方法を提供することにある。   A further object of the present invention is to provide a kind of liquid crystal panel cell gap forming method, in particular, a method for increasing the production cycle, saving the spacer grain cost, and improving the cell production quality.

本発明は一種の液晶パネルのセルギャップ形成方法を提供し、それは、
(A)底面基板及び上面基板を位置決めし、すなわち、底面基板と上面基板を固定位置に輸送し、上面基板を底面基板の上方に位置させるステップ、
(B)隔離層を定位に移動させ、すなわち、少なくとも一つの隔離層を(A)のステップの底面基板と上面基板の間の位置に移動させ、隔離層内に若干の隔離柱と空洞を設けるステップ、
(C)隔離層を底面基板に接合し、すなわち(B)のステップの隔離層の下方を底面基板の上端に接合するステップ、
(D)液晶を隔離層の空洞中に注入し、すなわち(C)のステップで底面基板に接合した隔離層の空洞に、液晶注入するステップ、
(E)隔離層と上面基板を接合し、すなわち(D)のステップで液晶注入完成した隔離層上端を(A)のステップの上面基板下方に接合し、該底面基板、隔離層と上面基板を結合して一体となすステップ、
(F)紫外光照射設備により照射加熱し、すなわち、(E)のステップで完成した底面基板、隔離層及び上面基板の一体の構造に対して、紫外光を照射加熱し、隔離層と該底面基板と上面基板を強固に結合するステップ、
(G)裁断成型し、すなわち(F)のステップで紫外光照射完成した底面基板、隔離層及び上面基板を裁断し、厚いセルギャップの液晶パネル製品を形成するステップ、
以上のステップを包含する。
The present invention provides a kind of liquid crystal panel cell gap forming method,
(A) positioning the bottom substrate and the top substrate, that is, transporting the bottom substrate and the top substrate to a fixed position and positioning the top substrate above the bottom substrate;
(B) Move the isolation layer to a stereo position, that is, move at least one isolation layer to a position between the bottom substrate and the top substrate in the step (A), and provide some isolation columns and cavities in the isolation layer. Step,
(C) bonding the isolation layer to the bottom substrate, that is, bonding the lower part of the isolation layer in the step (B) to the upper end of the bottom substrate;
(D) Injecting liquid crystal into the cavity of the isolation layer, that is, injecting liquid crystal into the cavity of the isolation layer bonded to the bottom substrate in the step (C),
(E) The isolation layer and the top substrate are joined, that is, the upper end of the isolation layer that has been liquid crystal injected in the step (D) is joined below the top substrate in the step (A), and the bottom substrate, the isolation layer, and the top substrate are joined. Combining and uniting,
(F) Irradiation and heating by ultraviolet light irradiation equipment, that is, the bottom structure, isolation layer, and top substrate completed in step (E) are irradiated and heated with ultraviolet light, and the isolation layer and the bottom surface Firmly bonding the substrate and the top substrate;
(G) Cut-molding, that is, cutting the bottom substrate, isolation layer and top substrate completed with ultraviolet light irradiation in the step (F) to form a liquid crystal panel product with a thick cell gap,
The above steps are included.

本発明はまた、もう一種の液晶パネルのセルギャップ形成方法を提供し、それは、
(a)底面基板及び上面基板を位置決めし、すなわち、底面基板と上面基板を固定位置に輸送し、上面基板を底面基板の上方に位置させるステップ、
(b)隔離層を定位に移動させ、すなわち、帯状の隔離層を(a)のステップの底面基板と上面基板の間の位置に移動させ、底面基板と上面基板の間の位置に位置づけ、該隔離層内に若干の隔離柱と空洞を設け、該空洞の一側に注入孔を形成するステップ、
(c)隔離層を底面基板に接合し、すなわち(b)のステップの隔離層の下方を底面基板の上端に接合するステップ、
(d)隔離層と上面基板を接合し、すなわち(c)のステップの隔離層上端を(a)のステップの上面基板下方に接合し、該底面基板、隔離層と上面基板を結合して一体となすステップ、
(e)紫外光照射設備により照射加熱し、すなわち、(d)のステップで完成した底面基板、隔離層及び上面基板の一体の構造に対して、紫外光を照射加熱し、隔離層下端の下UV接着剤層と上端の上UV接着剤層を加熱硬化させ、該隔離層と該底面基板と上面基板を強固に結合するステップ、
(f)裁断成型し、すなわち(e)のステップで紫外光照射完成した底面基板、隔離層及び上面基板を裁断し、液晶パネルユニットを形成するステップ、
(g)液晶を隔離層の空洞に真空注入し、すなわち(f)のステップで完成した液晶パネルユニットの隔離層の注入孔より空洞に液晶を充填するステップ、
(h)注入孔を密封し、すなわち(g)のステップで液晶の隔離層の空洞への注入を完成した後に、該隔離層の注入孔を密封し、液晶パネル製品を形成するステップ、
を包含する。
The present invention also provides another type of liquid crystal panel cell gap forming method,
(A) positioning the bottom substrate and the top substrate, that is, transporting the bottom substrate and the top substrate to a fixed position and positioning the top substrate above the bottom substrate;
(B) The isolation layer is moved to the orientation, that is, the band-shaped isolation layer is moved to a position between the bottom substrate and the top substrate in the step (a), and is positioned at a position between the bottom substrate and the top substrate, Providing a few isolation columns and a cavity in the isolation layer, and forming an injection hole on one side of the cavity;
(C) bonding the isolation layer to the bottom substrate, that is, bonding the lower part of the isolation layer of step (b) to the upper end of the bottom substrate;
(D) The isolation layer and the upper surface substrate are joined, that is, the upper end of the isolation layer in the step (c) is joined below the upper surface substrate in the step (a), and the bottom substrate, the isolation layer and the upper surface substrate are joined together. The step,
(E) Irradiation and heating with ultraviolet light irradiation equipment, that is, the bottom structure, the isolation layer and the upper surface substrate completed in step (d) are irradiated and heated with ultraviolet light, and below the lower end of the isolation layer. Heat-curing the UV adhesive layer and the upper UV adhesive layer on the upper end to firmly bond the isolation layer, the bottom substrate and the top substrate;
(F) Cutting and forming, that is, cutting the bottom substrate, the isolation layer, and the top substrate completed with ultraviolet light irradiation in the step (e) to form a liquid crystal panel unit;
(G) vacuum-injecting liquid crystal into the cavity of the isolation layer, that is, filling the cavity with liquid crystal from the injection hole of the isolation layer of the liquid crystal panel unit completed in the step (f);
(H) sealing the injection hole, that is, after completing the injection of liquid crystal into the cavity of the isolation layer in step (g), sealing the injection hole of the isolation layer to form a liquid crystal panel product;
Is included.

本発明の液晶パネルのセルギャップ形成方法は、液晶パネルの底面基板を定位に固定し、少なくとも一つの隔離層の上下に少なくとも一つのUV接着剤層を設け、該隔離層内部に若干の空洞(画素表示領域)を設け、該隔離層を底面基板に対向させ並びに下端のUV接着剤層により底面基板に接着し、更に滴下式注入(One Drop Fill)方法或いは真空液晶注入方式により、液晶を隔離層の各空洞に注入し、さらに該隔離層を上端のUV接着剤層により液晶パネルの上面基板に接合し、並びに紫外光を照射加熱して、この上下のUV接着剤層を硬化させて、液晶パネルの底面基板と上面基板をそれぞれ隔離層の底面と上面に結合させ、隔離層により液晶パネルのセルギャップを形成する効果を達成する。   According to the cell gap forming method of the liquid crystal panel of the present invention, the bottom substrate of the liquid crystal panel is fixed in position, at least one UV adhesive layer is provided above and below at least one isolation layer, and a few cavities ( (Pixel display area) is provided, the isolation layer is opposed to the bottom substrate, and is adhered to the bottom substrate by the UV adhesive layer at the lower end. Further, the liquid crystal is isolated by the drop-drop injection method or the vacuum liquid crystal injection method. Injecting into each cavity of the layer, further joining the isolation layer to the upper substrate of the liquid crystal panel by the upper UV adhesive layer, and irradiating and heating ultraviolet light to cure the upper and lower UV adhesive layers, The bottom substrate and the top substrate of the liquid crystal panel are bonded to the bottom and top surfaces of the isolation layer, respectively, and the effect of forming the cell gap of the liquid crystal panel by the isolation layer is achieved.

図1を参照されたい。本発明の液晶パネルのセルギャップ形成方法は、液晶パネルの底面基板10を包含し、該底面基板10は、底層11、ITO導電層12及び少なくとも一つの配向層13を包含する。該底層11は底部に位置し、ガラス或いはその他の透明物質とされ得るほか、フレクシブル基板、例えばポリカーボネート、ポリエチレンテレフタレート、ポリエチレンスチレン等の材料とされ得る。   Please refer to FIG. The method for forming a cell gap of a liquid crystal panel of the present invention includes a bottom substrate 10 of the liquid crystal panel, and the bottom substrate 10 includes a bottom layer 11, an ITO conductive layer 12, and at least one alignment layer 13. The bottom layer 11 is located at the bottom and can be made of glass or other transparent material, or can be made of a flexible substrate such as polycarbonate, polyethylene terephthalate, polyethylene styrene or the like.

ITO導電層12は底層11上に結合され、該配向層13はITO導電層12上に結合される。   The ITO conductive layer 12 is bonded on the bottom layer 11, and the alignment layer 13 is bonded on the ITO conductive layer 12.

図2に示されるように、少なくとも一つの隔離層20は、若干の隔離柱21、若干の空洞22、少なくとも一つの下UV接着剤層23、下保護膜24、少なくとも一つの上UV接着剤層25、及び上保護膜26を包含する。該隔離柱21と空洞22は隔離層20内に分布し、且つ該隔離柱21と空洞22は交錯するように配置され、該隔離柱21の材料に制限はないが、本実施例ではポリテトラフロロエチレン或いは液晶と反応しない材料を例とし、且つ該隔離柱21の高さHには制限はなく、すなわち、該隔離層20全体の厚さもまた範囲の制限なく増厚可能であり、該下UV接着剤層23は該隔離柱21と空洞22の下方に結合され、該下UV接着剤層23の表面は該下保護膜24が接合されて保護され、一旦該下保護膜24が剥離されれば、該下UV接着剤層23が接着性を具備し、該上UV接着剤層25は該隔離柱21と空洞22の上方に結合され、且つ該上UV接着剤層25の表面が該上保護膜26により保護され、該上保護膜26は該空洞22の上面を封鎖するのに用いられ、該上保護膜26を剥離することにより上UV接着剤層25が接着性を有すると共に、空洞22を露出させる。   As shown in FIG. 2, at least one isolation layer 20 includes some isolation posts 21, some cavities 22, at least one lower UV adhesive layer 23, a lower protective film 24, and at least one upper UV adhesive layer. 25 and the upper protective film 26. The isolation columns 21 and the cavities 22 are distributed in the isolation layer 20 and the isolation columns 21 and the cavities 22 are arranged so as to cross each other, and the material of the isolation columns 21 is not limited. The material which does not react with fluoroethylene or liquid crystal is taken as an example, and the height H of the isolation column 21 is not limited, that is, the total thickness of the isolation layer 20 can be increased without limitation of the range. The UV adhesive layer 23 is bonded to the lower side of the isolation column 21 and the cavity 22, and the surface of the lower UV adhesive layer 23 is protected by bonding the lower protective film 24, and the lower protective film 24 is once peeled off. The lower UV adhesive layer 23 has adhesiveness, the upper UV adhesive layer 25 is bonded to the upper side of the isolation column 21 and the cavity 22, and the surface of the upper UV adhesive layer 25 is the surface of the upper UV adhesive layer 25. The upper protective film 26 is protected by the upper protective film 26, and the upper protective film 26 is the upper surface of the cavity 22. Used to sequester, upper UV adhesive layer 25 by removing the upper protective film 26 with an adhesive property to expose the cavity 22.

上述の下UV接着剤層23と上UV接着剤層25は下保護膜24と上保護膜26を具備するものに限定されるわけではなく、下UV接着剤層23が直接隔離柱21と空洞22の下方にコーティングされて、上UV接着剤層25が直接隔離柱21と空洞22の上方にコーティングされる方式も、本発明の範疇に属する。   The lower UV adhesive layer 23 and the upper UV adhesive layer 25 described above are not limited to those having the lower protective film 24 and the upper protective film 26, but the lower UV adhesive layer 23 is directly formed between the isolation column 21 and the cavity. A method in which the upper UV adhesive layer 25 is coated directly below the isolation pillar 21 and the cavity 22 is also included in the scope of the present invention.

該隔離層20の形態に制限はなく、本発明では若干の隔離層20が隣り合って接続され帯状とされているが(図5)、これが単一素子形態というわけではない。   The form of the isolation layer 20 is not limited, and in the present invention, a few isolation layers 20 are connected adjacently to form a strip (FIG. 5), but this is not a single element form.

さらに図3に示されるように、液晶パネルの上面基板30は、配向層31、ITO導電層32及びガラス基板33を包含し、該配向層31は上面基板30の底面に位置し、該ITO導電層32は該配向層31に結合され、該ガラス基板33は該ITO導電層32に結合される。   Further, as shown in FIG. 3, the upper surface substrate 30 of the liquid crystal panel includes an alignment layer 31, an ITO conductive layer 32, and a glass substrate 33, and the alignment layer 31 is located on the bottom surface of the upper surface substrate 30. The layer 32 is bonded to the alignment layer 31, and the glass substrate 33 is bonded to the ITO conductive layer 32.

図4、5、6、7及び図8に示されるように、本発明の液晶パネルのセルギャップ形成方法は以下の(40)から(49)のステップを包含する。
(40)底面基板及び上面基板を位置決めする。すなわち、図1に示される底面基板10と上面基板30を図5に示される固定位置に輸送し、すなわち上面基板30を底面基板10の上方に位置させる。
(41)隔離層を定位に移動させる。すなわち、図2に示される帯状の隔離層20を(40)のステップの底面基板10と上面基板30の間の位置に移動させ、図5に示されるように底面基板10の上面基板30の上方及び上面基板30の下方の位置に位置させる。
(42)隔離層を底面基板に接合する。すなわち(41)のステップの隔離層20の下保護膜24を除去し、下UV接着剤層23を底面基板10の上端の配向層13に接合し、これは図6に示されるとおりである。
(43)液晶を隔離層の空洞中に注入する。すなわち(42)のステップで底面基板10に接合した隔離層20の上保護膜26を除去して露出した空洞22に、滴下式液晶注入方法により液晶を充填する。これは図7のとおりである。
(44)隔離層と上面基板を接合する。すなわち(43)のステップで液晶の注入完成した隔離層20上端の上UV接着剤層25を上面基板30下方の配向層31に接合し、該底面基板10、隔離層20と上面基板30を結合して図8のような一体の構造となす。
(45)紫外光照射設備により照射加熱する。すなわち、(44)のステップで完成した底面基板10、隔離層20及び上面基板30の組合せ構造に対して、紫外光を照射加熱し、隔離層20下端の下UV接着剤層23と上端の上UV接着剤層25を加熱し硬化させ、図8のように、隔離層20と該底面基板10と上面基板30を強固に結合する。
(46)裁断成型。すなわち(45)のステップで紫外光照射完成して一体に組み合わせた底面基板10、隔離層20及び上面基板30を裁断し、図9に示す本発明の厚いセルギャップの液晶パネル100製品を形成する。
As shown in FIGS. 4, 5, 6, 7 and 8, the liquid crystal panel cell gap forming method of the present invention includes the following steps (40) to (49).
(40) Position the bottom substrate and the top substrate. That is, the bottom substrate 10 and the top substrate 30 shown in FIG. 1 are transported to the fixed positions shown in FIG. 5, that is, the top substrate 30 is positioned above the bottom substrate 10.
(41) Move the isolation layer to a stereotaxic position. That is, the strip-shaped isolation layer 20 shown in FIG. 2 is moved to a position between the bottom substrate 10 and the top substrate 30 in the step (40), and above the top substrate 30 of the bottom substrate 10 as shown in FIG. And positioned below the top substrate 30.
(42) Join the isolation layer to the bottom substrate. That is, the lower protective film 24 of the isolation layer 20 in the step (41) is removed, and the lower UV adhesive layer 23 is bonded to the alignment layer 13 at the upper end of the bottom substrate 10, as shown in FIG.
(43) Liquid crystal is injected into the cavity of the isolation layer. That is, in the step (42), the upper protective film 26 of the isolation layer 20 bonded to the bottom substrate 10 is removed, and the exposed cavity 22 is filled with liquid crystal by a dropping liquid crystal injection method. This is as shown in FIG.
(44) The isolation layer and the upper substrate are bonded. That is, the upper UV adhesive layer 25 at the upper end of the separation layer 20 where the liquid crystal has been injected in step (43) is bonded to the alignment layer 31 below the upper surface substrate 30, and the bottom substrate 10, the separation layer 20 and the upper surface substrate 30 are combined. Thus, an integrated structure as shown in FIG. 8 is obtained.
(45) Irradiation heating is performed by an ultraviolet light irradiation facility. That is, the combined structure of the bottom substrate 10, the isolation layer 20, and the top substrate 30 completed in the step (44) is heated by irradiating with ultraviolet light, and the upper UV adhesive layer 23 and the upper end of the isolation layer 20 at the lower end. The UV adhesive layer 25 is heated and cured to firmly bond the isolation layer 20, the bottom substrate 10 and the top substrate 30 as shown in FIG.
(46) Cutting molding. That is, the bottom substrate 10, the isolation layer 20, and the top substrate 30 that have been combined in an integrated manner after the ultraviolet light irradiation in the step (45) are cut to form the thick cell gap liquid crystal panel 100 product of the present invention shown in FIG. .

図10は本発明の液晶パネルのセルギャップ形成方法の第2実施例を示し、該上面基板30と底面基板10の間にあって、底面基板10に二つの隔離層20、20’が結合され、該隔離層20と上面基板30の間の結合方式及びもう一つの隔離層20’と上面基板30の間の結合方式は、図8及び図9の隔離層20と底面基板10及び上面基板30の結合方式と同じである。   FIG. 10 shows a second embodiment of the method for forming a cell gap of a liquid crystal panel according to the present invention, wherein two isolation layers 20 and 20 ′ are bonded to the bottom substrate 10 between the top substrate 30 and the bottom substrate 10, The coupling method between the isolation layer 20 and the top substrate 30 and the coupling scheme between the other isolation layer 20 ′ and the top substrate 30 are the coupling of the isolation layer 20, the bottom substrate 10 and the top substrate 30 of FIGS. It is the same as the method.

さらに図11に示されるように、上述の二つの隔離層20及び20’の間に両面配向薄膜60が結合され、該両面配向薄膜60は透明基板61、第1配向膜62及び第2配向膜63を包含し、該透明基板61は異方性ポリマーフィルムで構成され、該第1配向膜62は該透明基板61の上面にコーティングされ、該第2配向膜63は透明基板61の底面にコーティングされ、該第1配向膜62は該隔離層20の上UV接着剤層25に接合され、該第2配向膜63はもう一つの隔離層20’の下UV接着剤層23に接合され、該第1配向膜62と該第2配向膜63の配向角度に制限はなく、本発明では該第1配向膜62の配向角度は45度とされ、第2配向膜63の配向角度は145度とされ、このような直交配向角度設計により、二つの隔離層20、20’の間の液晶光学偏光依存性が最も適当な組合せとされ、並びに液晶パネル100の液晶セルギャップ厚さが増されるが、必要な駆動電圧と対応する反応時間は増加しない。   Further, as shown in FIG. 11, a double-sided oriented thin film 60 is bonded between the two isolation layers 20 and 20 ′ described above, and the double-sided oriented thin film 60 comprises a transparent substrate 61, a first oriented film 62, and a second oriented film. 63, the transparent substrate 61 is made of an anisotropic polymer film, the first alignment film 62 is coated on the top surface of the transparent substrate 61, and the second alignment film 63 is coated on the bottom surface of the transparent substrate 61. The first alignment layer 62 is bonded to the upper UV adhesive layer 25 of the isolation layer 20, and the second alignment layer 63 is bonded to the lower UV adhesive layer 23 of the other isolation layer 20 ′. The alignment angle between the first alignment film 62 and the second alignment film 63 is not limited. In the present invention, the alignment angle of the first alignment film 62 is 45 degrees, and the alignment angle of the second alignment film 63 is 145 degrees. With this orthogonal orientation angle design, the two are separated 20, 20 is a liquid crystal optical polarization dependence is the most suitable combination between ', as well as a liquid crystal cell gap thickness of the liquid crystal panel 100 is masa, the reaction time and the corresponding necessary driving voltage is not increased.

図10及び図11は本発明の液晶パネル100の液晶セルギャップ形成方法の第2実施例を示す。その形成ステップは図4の(40)〜(46)のステップにより達成され、また、フレクシブルな底面基板10の底層11が加えられ、液晶パネル100の外形が改変され、異なる応用場面に符合するものとされ、例えば、球面レンズの液晶レンズヘッド、或いは液晶パネル100の液晶セルギャップの光学特性、例えば光学焦点距離特性を増すのに符合するものとされる。   10 and 11 show a second embodiment of the liquid crystal cell gap forming method for the liquid crystal panel 100 of the present invention. The forming step is achieved by the steps (40) to (46) in FIG. 4, and the bottom layer 11 of the flexible bottom substrate 10 is added, the external shape of the liquid crystal panel 100 is modified, and it is suitable for different application situations. For example, the optical characteristic of the liquid crystal lens head of the spherical lens or the liquid crystal cell gap of the liquid crystal panel 100, for example, the optical focal length characteristic is increased.

図12及び図13は本発明の液晶パネルのセルギャップ形成方法の第3実施例を示し、そのうち、隔離層70が底面基板10と上面基板30の間に位置し、該隔離層70は若干の隔離柱71、若干の空洞72、少なくとも一つの下UV接着剤層73、下保護膜74、少なくとも一つの上UV接着剤層75、及び上保護膜76を包含する。該隔離柱71の形状に制限はないが、図12及び図13中では不規則な形状とされ、且つ上述の隔離層20及びもう一つの隔離層20’のように円柱形状ではなく、空洞72は隔離層70内に分布し、各空洞72の一側に少なくとも一つの注入孔721が形成され、該下UV接着剤層23は該隔離柱71と空洞72の下方に結合され、該下UV接着剤層73の表面は該下保護膜74が接合されて保護され、一旦該下保護膜74が剥離されれば、該下UV接着剤層73が接着性を具備し、該上UV接着剤層75は該隔離柱71と空洞72の上方に結合され、且つ該上UV接着剤層75の表面が該上保護膜76により保護され、該上保護膜76は該空洞72の上面を封鎖するのに用いられ、該上保護膜76を剥離することにより上UV接着剤層75が接着性を有する。   12 and 13 show a third embodiment of the cell gap forming method of the liquid crystal panel according to the present invention, in which the isolation layer 70 is located between the bottom substrate 10 and the top substrate 30, and the isolation layer 70 has a slight amount. It includes an isolation post 71, some cavities 72, at least one lower UV adhesive layer 73, a lower protective film 74, at least one upper UV adhesive layer 75, and an upper protective film 76. The shape of the isolation column 71 is not limited, but is irregular in FIGS. 12 and 13 and is not a cylindrical shape as in the isolation layer 20 and the other isolation layer 20 ′ described above, but the cavity 72. Is distributed in the isolation layer 70, at least one injection hole 721 is formed on one side of each cavity 72, and the lower UV adhesive layer 23 is bonded to the isolation column 71 and below the cavity 72. The surface of the adhesive layer 73 is protected by bonding the lower protective film 74. Once the lower protective film 74 is peeled off, the lower UV adhesive layer 73 has adhesiveness, and the upper UV adhesive The layer 75 is bonded above the isolation pillar 71 and the cavity 72, and the surface of the upper UV adhesive layer 75 is protected by the upper protective film 76, and the upper protective film 76 seals the upper surface of the cavity 72. The upper UV adhesive layer 7 is removed by peeling off the upper protective film 76. There have adhesive properties.

さらに図14、15、及び図16を参照されたい。図14は上述の図12と図13の本発明の液晶パネルのセルギャップ形成方法の第3実施例のフローチャートであり、(80)から(86)のステップを包含する。
(80)底面基板及び上面基板を位置決めする。すなわち、図13に示される底面基板10と上面基板30を図13に示される固定位置に輸送し、すなわち上面基板30を底面基板10の上方に位置させる。
(81)隔離層を定位に移動させる。すなわち、図13に示される帯状の隔離層70を(80)のステップの底面基板10と上面基板30の間の位置に移動させ、図13に示されるように底面基板10の上面基板30の上方及び上面基板30の下方の位置に位置させる。
(82)隔離層を底面基板に接合する。すなわち(81)のステップの隔離層70の下保護膜78を除去し、下UV接着剤層73を底面基板10の上端の配向層13に接合し、その方法は上述の(42)のステップと同様である。
(83)液晶を隔離層の空洞中に注入する。すなわち(82)のステップで底面基板10に接合した隔離層70の上端の上UV接着剤層75を上面基板30の下方の配向層31に接合し、底面基板10、隔離層70及び上面基板30を図12のように一体に結合する。
(84)紫外光照射設備により照射加熱する。すなわち、(83)のステップで完成した底面基板10、隔離層70及び上面基板30の組合せ構造に対して、紫外光を照射加熱し、隔離層70下端の下UV接着剤層73と上端の上UV接着剤層75を加熱し硬化させ、隔離層70と該底面基板10と上面基板30を強固に結合する。
(85)裁断成型。すなわち(84)のステップで紫外光照射完成して一体に組み合わせた底面基板10、隔離層70及び上面基板30を裁断し、図15に示す本発明の厚いセルギャップの液晶パネル100’製品を形成する。
(86)液晶を隔離層の空洞に真空注入する。すなわち、周知の真空注入方式により、液晶を(85)のステップで形成した液晶パネル100’のユニットの隔離層70の注入孔721に注入し、全体の空洞72に充填する。
(87)注入孔を密封する。すなわち、(86)のステップで隔離層70の空洞72に液晶を注入した後、該隔離層70の注入孔721を密封し、図16のような液晶パネル100’製品を形成する。
See also FIGS. 14, 15 and 16. FIG. 14 is a flowchart of the third embodiment of the liquid crystal panel cell gap forming method of the present invention shown in FIGS. 12 and 13, and includes steps (80) to (86).
(80) Position the bottom substrate and the top substrate. That is, the bottom substrate 10 and the top substrate 30 shown in FIG. 13 are transported to the fixed positions shown in FIG. 13, that is, the top substrate 30 is positioned above the bottom substrate 10.
(81) Move the isolation layer to a stereotaxic position. That is, the strip-shaped isolation layer 70 shown in FIG. 13 is moved to a position between the bottom substrate 10 and the top substrate 30 in the step (80), and the top substrate 30 above the bottom substrate 10 as shown in FIG. And positioned below the top substrate 30.
(82) Join the isolation layer to the bottom substrate. That is, the lower protective film 78 of the isolation layer 70 in the step (81) is removed, and the lower UV adhesive layer 73 is bonded to the alignment layer 13 at the upper end of the bottom substrate 10, and the method is the same as the step (42) described above. It is the same.
(83) Liquid crystal is injected into the cavity of the isolation layer. That is, the upper UV adhesive layer 75 at the upper end of the isolation layer 70 bonded to the bottom substrate 10 in the step (82) is bonded to the alignment layer 31 below the top substrate 30, and the bottom substrate 10, the isolation layer 70, and the top substrate 30 are joined. Are coupled together as shown in FIG.
(84) Irradiation heating is performed by an ultraviolet light irradiation facility. That is, the combined structure of the bottom substrate 10, the isolation layer 70, and the top substrate 30 completed in step (83) is heated by irradiating with ultraviolet light, and the UV adhesive layer 73 below the bottom end of the isolation layer 70 and above the top end. The UV adhesive layer 75 is heated and cured to firmly bond the isolation layer 70, the bottom substrate 10, and the top substrate 30.
(85) Cutting molding. That is, the bottom substrate 10, the isolation layer 70, and the top substrate 30 which have been combined in an integrated manner after the ultraviolet light irradiation in the step (84) are cut to form the thick cell gap liquid crystal panel 100 ′ product of the present invention shown in FIG. To do.
(86) Vacuum injection of liquid crystal into the cavity of the isolation layer. That is, the liquid crystal is injected into the injection hole 721 of the isolation layer 70 of the unit of the liquid crystal panel 100 ′ formed in the step (85) by the well-known vacuum injection method to fill the entire cavity 72.
(87) Seal the injection hole. That is, after the liquid crystal is injected into the cavity 72 of the isolation layer 70 in the step (86), the injection hole 721 of the isolation layer 70 is sealed to form the liquid crystal panel 100 ′ product as shown in FIG.

本発明の第1実施例の底面基板の断面拡大図である。It is a cross-sectional enlarged view of the bottom substrate of the first embodiment of the present invention. 本発明の第1実施例の隔離層の断面拡大図である。It is a cross-sectional enlarged view of the isolation layer of 1st Example of this invention. 本発明の第1実施例の上面基板の断面拡大図である。It is a cross-sectional enlarged view of the upper surface board | substrate of 1st Example of this invention. 本発明の第1実施例のフローチャートである。It is a flowchart of 1st Example of this invention. 本発明の第1実施例の底面基板、隔離層、上面基板の位置決めの立体図である。It is a three-dimensional view of positioning of the bottom substrate, isolation layer, and top substrate of the first embodiment of the present invention. 本発明の第1実施例の隔離層を底面基板に接合した状態を示す断面拡大図である。It is a cross-sectional enlarged view which shows the state which joined the isolation layer of 1st Example of this invention to the bottom substrate. 本発明の第1実施例の液晶を隔離層の空洞に注入する状態を示す断面拡大図である。It is a cross-sectional enlarged view which shows the state which inject | pours the liquid crystal of 1st Example of this invention into the cavity of an isolation layer. 本発明の第1実施例の底面基板、隔離層、上面基板に紫外光を照射加熱する状態を示す断面拡大図である。It is a cross-sectional enlarged view which shows the state which irradiates and heats an ultraviolet light to the bottom substrate, isolation layer, and top substrate of 1st Example of this invention. 本発明の第1実施例で形成した液晶パネルの断面拡大図である。It is a cross-sectional enlarged view of the liquid crystal panel formed in 1st Example of this invention. 本発明の方法で形成した液晶パネルの第2実施例図である。It is 2nd Example figure of the liquid crystal panel formed with the method of this invention. 図10中の両面配向薄膜の立体構造分解図である。It is a three-dimensional structure exploded view of the double-sided oriented thin film in FIG. 本発明の第3実施例の底面基板、隔離層及び上面基板の構造表示図である。It is a structure display figure of the bottom board of the 3rd example of the present invention, an isolation layer, and a top board. 本発明の第3実施例の底面基板、隔離層及び上面基板の位置決めを示す立体図である。It is a three-dimensional view showing the positioning of the bottom substrate, isolation layer, and top substrate of the third embodiment of the present invention. 本発明の方法の第3実施例のフローチャートである。6 is a flowchart of a third embodiment of the method of the present invention. 本発明の方法の第3実施例の液晶パネルユニットの構造表示図である。It is a structure display figure of the liquid crystal panel unit of 3rd Example of the method of this invention. 本発明の方法の液晶パネル構造表示図である。It is a liquid crystal panel structure display figure of the method of this invention.

符号の説明Explanation of symbols

10 底面基板 11 底層
12 ITO導電層 13 配向層
20 隔離層 21 隔離柱
22 空洞 23 下UV接着剤層
24 下保護膜 25 上UV接着剤層
26 上保護膜 30 上面基板
31 配向層 32 ITO導電層
33 ガラス基板 40 底面基板と上面基板の位置決め
41 隔離層を定位に移動 42 隔離層を底面基板に接合
43 液晶を隔離層の空洞に注入 44 隔離層と上面基板を接合
45 紫外光設備で照射加熱 46 裁断成型
50 紫外光設備 60 両面配向薄膜
61 透明基板 62 第1配向膜
63 第2配向膜 70 隔離層
71 隔離柱 72 空洞
721 注入孔 73 下UV接着剤層
74 下保護膜 75 上UV接着剤層
80 底面基板と上面基板の位置決め 81 隔離層を定位に移動
82 隔離層を底面基板に接合 83 隔離層と上面基板を接合
84 紫外光設備で照射加熱 85 裁断成型
86 液晶を隔離層の空洞に注入 87 注入孔密封
100’ 液晶パネル H 高さ
DESCRIPTION OF SYMBOLS 10 Bottom substrate 11 Bottom layer 12 ITO conductive layer 13 Orientation layer 20 Separation layer 21 Separation pillar 22 Cavity 23 Lower UV adhesive layer 24 Lower protection film 25 Upper UV adhesive layer 26 Upper protection film 30 Upper surface substrate 31 Orientation layer 32 ITO conductive layer 33 Glass substrate 40 Positioning of bottom substrate and top substrate 41 Moving isolation layer to orientation 42 Separating isolation layer to bottom substrate 43 Injection of liquid crystal into isolation layer cavity 44 Bonding isolation layer and top substrate 45 Irradiation heating with ultraviolet light equipment 46 Cut-molding 50 Ultraviolet light equipment 60 Double-sided alignment thin film 61 Transparent substrate 62 First alignment film 63 Second alignment film 70 Isolation layer 71 Separation pillar 72 Cavity 721 Injection hole 73 Lower UV adhesive layer 74 Lower protective film 75 Upper UV adhesive Layer 80 Positioning of bottom substrate and top substrate 81 Moving isolation layer to orientation 82 Bonding isolation layer to bottom substrate 83 Bonding isolation layer and top substrate 84 Ultraviolet Irradiation heating with optical equipment 85 Cutting molding 86 Liquid crystal is injected into the cavity of the isolation layer 87 Injection hole sealing 100 'Liquid crystal panel H Height

Claims (17)

液晶パネルのセルギャップ形成方法において、
(A)底面基板及び上面基板を位置決めし、すなわち、底面基板と上面基板を固定位置に輸送し、上面基板を底面基板の上方に位置させるステップ、
(B)隔離層を定位に移動させ、すなわち、少なくとも一つの隔離層を(A)のステップの底面基板と上面基板の間の位置に移動させ、隔離層内に若干の隔離柱と空洞を設けるステップ、
(C)隔離層を底面基板に接合し、すなわち(B)のステップの隔離層の下方を底面基板の上端に接合するステップ、
(D)液晶を隔離層の空洞中に注入し、すなわち(C)のステップで底面基板に接合した隔離層の空洞に、液晶注入するステップ、
(E)隔離層と上面基板を接合し、すなわち(D)のステップで液晶注入完成した隔離層上端を(A)のステップの上面基板下方に接合し、該底面基板、隔離層と上面基板を結合して一体となすステップ、
(F)紫外光照射設備により照射加熱し、すなわち、(E)のステップで完成した底面基板、隔離層及び上面基板の一体の構造に対して、紫外光を照射加熱し、隔離層と該底面基板と上面基板を強固に結合するステップ、
(G)裁断成型し、すなわち(F)のステップで紫外光照射完成した底面基板、隔離層及び上面基板を裁断し、厚いセルギャップの液晶パネル製品を形成するステップ、
以上のステップを包含することを特徴とする、液晶パネルのセルギャップ形成方法。
In the cell gap forming method of a liquid crystal panel,
(A) positioning the bottom substrate and the top substrate, that is, transporting the bottom substrate and the top substrate to a fixed position and positioning the top substrate above the bottom substrate;
(B) Move the isolation layer to a stereo position, that is, move at least one isolation layer to a position between the bottom substrate and the top substrate in the step (A), and provide some isolation columns and cavities in the isolation layer. Step,
(C) bonding the isolation layer to the bottom substrate, that is, bonding the lower part of the isolation layer in the step (B) to the upper end of the bottom substrate;
(D) Injecting liquid crystal into the cavity of the isolation layer, that is, injecting liquid crystal into the cavity of the isolation layer bonded to the bottom substrate in the step (C),
(E) The isolation layer and the top substrate are joined, that is, the upper end of the isolation layer that has been liquid crystal injected in the step (D) is joined below the top substrate in the step (A), and the bottom substrate, the isolation layer, and the top substrate are joined. Combining and uniting,
(F) Irradiation and heating by ultraviolet light irradiation equipment, that is, the bottom structure, isolation layer, and top substrate completed in step (E) are irradiated and heated with ultraviolet light, and the isolation layer and the bottom surface Firmly bonding the substrate and the top substrate;
(G) Cut-molding, that is, cutting the bottom substrate, isolation layer and top substrate completed with ultraviolet light irradiation in the step (F) to form a liquid crystal panel product with a thick cell gap,
A method for forming a cell gap of a liquid crystal panel, comprising the above steps.
請求項1記載の液晶パネルのセルギャップ形成方法において、(A)のステップ中の底面基板は、
底部に位置する底層と、
該底層上に結合されたITO導電層と、
該ITO導電層上に結合された配向層と、
を包含することを特徴とする、液晶パネルのセルギャップ形成方法。
The cell gap forming method for a liquid crystal panel according to claim 1, wherein the bottom substrate during the step (A) is:
A bottom layer located at the bottom,
An ITO conductive layer bonded on the bottom layer;
An alignment layer bonded on the ITO conductive layer;
A method of forming a cell gap in a liquid crystal panel, comprising:
請求項2記載の液晶パネルのセルギャップ形成方法において、該底層がガラスとされたことを特徴とする、液晶パネルのセルギャップ形成方法。   3. The cell gap forming method for a liquid crystal panel according to claim 2, wherein the bottom layer is made of glass. 請求項2記載の液晶パネルのセルギャップ形成方法において、該底層がフレキシブル基板とされたことを特徴とする、液晶パネルのセルギャップ形成方法。   3. The cell gap forming method for a liquid crystal panel according to claim 2, wherein the bottom layer is a flexible substrate. 請求項1記載の液晶パネルのセルギャップ形成方法において、(B)のステップ中の隔離層は、
該隔離層内に分布し且つ交錯方式で配置された複数の隔離柱と空洞、
該隔離柱と空洞の下方に結合された下UV接着剤層、
該下UV接着剤層に結合されて該下UV接着剤層を保護する下保護膜、
該隔離柱と空洞の上方に結合された上UV接着剤層、
該上UV接着剤層に結合されて該上UV接着剤層の上面を保護する上保護膜、
を包含することを特徴とする、液晶パネルのセルギャップ形成方法。
The cell gap forming method for a liquid crystal panel according to claim 1, wherein the isolation layer in the step (B) is:
A plurality of isolation columns and cavities distributed in the isolation layer and arranged in a crossing manner;
A lower UV adhesive layer bonded below the isolation post and cavity;
A lower protective film bonded to the lower UV adhesive layer to protect the lower UV adhesive layer;
An upper UV adhesive layer bonded above the isolation post and cavity;
An upper protective film bonded to the upper UV adhesive layer to protect the upper surface of the upper UV adhesive layer;
A method of forming a cell gap in a liquid crystal panel, comprising:
請求項5記載の液晶パネルのセルギャップ形成方法において、該隔離柱がポリテトラフロロエチレンで形成されたことを特徴とする、液晶パネルのセルギャップ形成方法。   6. The method for forming a cell gap of a liquid crystal panel according to claim 5, wherein the separating pillar is made of polytetrafluoroethylene. 請求項1記載の液晶パネルのセルギャップ形成方法において、(A)のステップの隔離層が帯状とされたことを特徴とする、液晶パネルのセルギャップ形成方法。   2. The method for forming a cell gap of a liquid crystal panel according to claim 1, wherein the isolation layer of step (A) has a strip shape. 請求項1記載の液晶パネルのセルギャップ形成方法において、(A)のステップの上面基板が、
該上面基板の底面に位置する配向層と、
この配向層上に結合されたITO導電層と、
このITO導電層上に結合されたガラス基板と、
を包含することを特徴とする、液晶パネルのセルギャップ形成方法。
The cell gap forming method for a liquid crystal panel according to claim 1, wherein the upper surface substrate in the step (A) is:
An alignment layer located on the bottom surface of the top substrate;
An ITO conductive layer bonded on the alignment layer;
A glass substrate bonded on the ITO conductive layer;
A method of forming a cell gap in a liquid crystal panel, comprising:
請求項1記載の液晶パネルのセルギャップ形成方法において、(D)のステップの隔離層の空洞への液晶の注入方式は滴下式液晶注入方法であることを特徴とする、液晶パネルのセルギャップ形成方法。   The cell gap forming method for a liquid crystal panel according to claim 1, wherein the liquid crystal is injected into the cavity of the isolation layer in step (D) by a dropping type liquid crystal injecting method. Method. 請求項1記載の液晶パネルのセルギャップ形成方法において、(B)のステップの隔離層の数量が二個であることを特徴とする、液晶パネルのセルギャップ形成方法。   2. The cell gap forming method for a liquid crystal panel according to claim 1, wherein the number of isolation layers in step (B) is two. 請求項10記載の液晶パネルのセルギャップ形成方法において、二つの隔離層の間に両面配向薄膜が結合されたことを特徴とする、液晶パネルのセルギャップ形成方法。   11. The method of forming a cell gap in a liquid crystal panel according to claim 10, wherein a double-sided alignment thin film is bonded between the two isolation layers. 請求項11記載の液晶パネルのセルギャップ形成方法において、該両面配向薄膜が、
透明基板と、
該透明基板の上面にコーティングされ、隔離層に結合される第1配向膜と、
該透明基板の底面にコーティングされ、もう一つの隔離層に結合される第2配向膜と、 を包含したことを特徴とする、液晶パネルのセルギャップ形成方法。
The cell gap forming method for a liquid crystal panel according to claim 11, wherein the double-sided oriented thin film comprises:
A transparent substrate;
A first alignment layer coated on the top surface of the transparent substrate and bonded to the isolation layer;
A method for forming a cell gap in a liquid crystal panel, comprising: a second alignment film coated on the bottom surface of the transparent substrate and bonded to another isolation layer.
請求項12記載の液晶パネルのセルギャップ形成方法において、該透明基板が異方性ポリマーフィルムとされたことを特徴とする、液晶パネルのセルギャップ形成方法。   13. The cell gap forming method for a liquid crystal panel according to claim 12, wherein the transparent substrate is an anisotropic polymer film. 請求項12記載の液晶パネルのセルギャップ形成方法において、該第1配向膜の配向角度と第2配向膜の配向角度が90度異なることを特徴とする、液晶パネルのセルギャップ形成方法。   13. The cell gap forming method for a liquid crystal panel according to claim 12, wherein the alignment angle of the first alignment film and the alignment angle of the second alignment film are different by 90 degrees. 液晶パネルのセルギャップ形成方法において、
(a)底面基板及び上面基板を位置決めし、すなわち、底面基板と上面基板を固定位置に輸送し、上面基板を底面基板の上方に位置させるステップ、
(b)隔離層を定位に移動させ、すなわち、帯状の隔離層を(a)のステップの底面基板と上面基板の間の位置に移動させ、底面基板と上面基板の間の位置に位置づけ、該隔離層内に若干の隔離柱と空洞を設け、該空洞の一側に注入孔を形成するステップ、
(c)隔離層を底面基板に接合し、すなわち(b)のステップの隔離層の下方を底面基板の上端に接合するステップ、
(d)隔離層と上面基板を接合し、すなわち(c)のステップの隔離層上端を(a)のステップの上面基板下方に接合し、該底面基板、隔離層と上面基板を結合して一体となすステップ、
(e)紫外光照射設備により照射加熱し、すなわち、(d)のステップで完成した底面基板、隔離層及び上面基板の一体の構造に対して、紫外光を照射加熱し、隔離層下端の下UV接着剤層と上端の上UV接着剤層を加熱硬化させ、該隔離層と該底面基板と上面基板を強固に結合するステップ、
(f)裁断成型し、すなわち(e)のステップで紫外光照射完成した底面基板、隔離層及び上面基板を裁断し、液晶パネルユニットを形成するステップ、
(g)液晶を隔離層の空洞に真空注入し、すなわち(f)のステップで完成した液晶パネルユニットの隔離層の注入孔より空洞に液晶を充填するステップ、
(h)注入孔を密封し、すなわち(g)のステップで液晶の隔離層の空洞への注入を完成した後に、該隔離層の注入孔を密封し、液晶パネル製品を形成するステップ、
を包含することを特徴とする、液晶パネルのセルギャップ形成方法。
In the cell gap forming method of a liquid crystal panel,
(A) positioning the bottom substrate and the top substrate, that is, transporting the bottom substrate and the top substrate to a fixed position and positioning the top substrate above the bottom substrate;
(B) The isolation layer is moved to the orientation, that is, the band-shaped isolation layer is moved to a position between the bottom substrate and the top substrate in the step (a), and is positioned at a position between the bottom substrate and the top substrate, Providing a few isolation columns and a cavity in the isolation layer, and forming an injection hole on one side of the cavity;
(C) bonding the isolation layer to the bottom substrate, that is, bonding the lower part of the isolation layer of step (b) to the upper end of the bottom substrate;
(D) The isolation layer and the upper surface substrate are joined, that is, the upper end of the isolation layer in the step (c) is joined below the upper surface substrate in the step (a), and the bottom substrate, the isolation layer and the upper surface substrate are joined together. The step,
(E) Irradiation and heating with ultraviolet light irradiation equipment, that is, the bottom structure, the isolation layer and the upper surface substrate completed in step (d) are irradiated and heated with ultraviolet light, and below the lower end of the isolation layer. Heat-curing the UV adhesive layer and the upper UV adhesive layer on the upper end to firmly bond the isolation layer, the bottom substrate and the top substrate;
(F) Cutting and forming, that is, cutting the bottom substrate, the isolation layer, and the top substrate completed with ultraviolet light irradiation in the step (e) to form a liquid crystal panel unit;
(G) vacuum-injecting liquid crystal into the cavity of the isolation layer, that is, filling the cavity with liquid crystal from the injection hole of the isolation layer of the liquid crystal panel unit completed in the step (f);
(H) sealing the injection hole, that is, after completing the injection of liquid crystal into the cavity of the isolation layer in step (g), sealing the injection hole of the isolation layer to form a liquid crystal panel product;
A method of forming a cell gap in a liquid crystal panel, comprising:
請求項15記載の液晶パネルのセルギャップ形成方法において、(d)のステップ中の隔離層が、
該隔離層内に分布する若干の隔離柱と空洞、
該隔離柱と空洞の下方に結合された下UV接着剤層、
該下UV接着剤層に結合されて下UV接着剤層を保護する下保護膜、
該隔離柱と空洞の上方に結合された上UV接着剤層、
該上UV接着剤層に結合されて上UV接着剤層を保護すると共に空洞上端を封鎖する上保護膜、
以上を包含したことを特徴とする、液晶パネルのセルギャップ形成方法。
The cell gap forming method for a liquid crystal panel according to claim 15, wherein the isolation layer in the step (d) is:
Some isolation columns and cavities distributed within the isolation layer;
A lower UV adhesive layer bonded below the isolation post and cavity;
A lower protective film bonded to the lower UV adhesive layer to protect the lower UV adhesive layer;
An upper UV adhesive layer bonded above the isolation post and cavity;
An upper protective film bonded to the upper UV adhesive layer to protect the upper UV adhesive layer and seal the upper end of the cavity;
A method for forming a cell gap of a liquid crystal panel, comprising the above.
請求項16記載の液晶パネルのセルギャップ形成方法において、該隔離柱が不規則形状とされたことを特徴とする、液晶パネルのセルギャップ形成方法。   17. The method for forming a cell gap for a liquid crystal panel according to claim 16, wherein the separating pillar has an irregular shape.
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