JP2008140895A - Coating film forming device, and coating film forming method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating film forming device and a coating film forming method, which are capable of reducing bad affection on coating treatment and forming uniform processing liquid film by removing vibration generated from a processing liquid supplying system or the sway of low frequency. <P>SOLUTION: The coating film forming device is equipped with a nozzle 102 for applying the processing liquid R to the surface of the board, a pumping means 131 having a flexible part 132 for supplying processing liquid R to the nozzle 102 by the expanding and contracting operation of the flexible part 132, a ball screw nut 136 provided at one end in the expanding and contracting directions of the flexible part 132, a ball screw shaft 137, provided along the expanding and contracting directions of the flexible part 132 to move the ball screw nut 136 into the expanding and contracting directions of the flexible part 132 by screwing with the ball screw unit 136 and a motor 133 for turning the ball screw shaft 137 about the shaft while the ball screw shaft 137 is provided on the rotating shaft of the motor 133 and the inertia moment of the rotating shaft of the motor 133 is specified to be larger than 1×10<SP>-3</SP>(kg/m<SP>2</SP>). <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a coating film forming apparatus and a coating film forming method for forming a predetermined film on a substrate to be processed in a photolithography process.

  For example, in the manufacture of an FPD (flat panel display), a predetermined film is formed on an LCD substrate which is a substrate to be processed, and then a photoresist (hereinafter referred to as a resist) which is a processing liquid is applied to form a resist film. The circuit pattern is formed by a so-called photolithography process in which the resist film is exposed corresponding to the circuit pattern and developed.

Conventionally, in the resist coating process in this photolithography process, a resist solution sucked from a resist storage tank using a pump is filtered by a filter, and then discharged from a nozzle through a valve.
However, in such a resist supply system, a relatively large differential pressure is generated between the primary side and the secondary side of the filter depending on the discharge speed of the resist solution, and is captured by the filter due to the influence of this differential pressure. The particles, gelled resist, and the like that pass through the filter holes and adhere to the surface of the wafer cause defects in the resist film applied to the substrate, resulting in a decrease in yield.

In order to solve such a problem, Patent Document 1 discloses that the differential pressure between the primary side and the secondary side of the filter is greatly reduced, and the filter leakage and foaming phenomenon of the removal target in the processing liquid such as particles is detected. A coating film forming apparatus that can be suppressed to a minimum and can effectively prevent the occurrence of uneven coating of a processing liquid is disclosed.
A sectional view of a filter-integrated bellows pump included in the coating film forming apparatus disclosed in Patent Document 1 is shown in FIG.

  As shown in the figure, as the bellows pump 200, a tube diaphragm pump is used that changes the pressure in the pump chamber 201 by changing the volume of the chamber and sucks and discharges the coating liquid. The pump chamber 201 is provided in a substantially cylindrical shape, and the inner wall of the pump chamber 201 is formed by an elastic film 202a of a tube frame 202 that encloses a predetermined fluid (liquid). The inner wall surface of the pump chamber 201 is expanded and contracted by the expansion and contraction of the bellows portion 203 in the tube frame 202 so that the capacity and pressure of the pump chamber 201 can be varied.

A movable support portion 210 that functions as a nut portion of a ball screw structure is connected to the lower end of the bellows portion 203, and the movable support portion 210 is screwed into a shaft member 209 that functions as a screw shaft of the ball screw structure. . Further, the shaft member 209 is configured to rotate around the shaft via a reduction gear (gear) 211 by the power of the stepping motor 204.
Accordingly, the shaft member 209 is rotated by the driving of the stepping motor 204, whereby the movable support portion 210 is moved up and down, and the bellows portion 203 is driven to expand and contract with high accuracy.

The bellows section 203 is controlled by a controller (not shown) in accordance with the set conditions for the expansion / contraction operation timing and expansion / contraction speed, that is, the suction / discharge timing and suction / discharge speed of the coating liquid.
Further, a rotary encoder 205 is connected to the stepping motor 204, and the operation amount of the stepping motor 204 is fed back to the controller.

Here, the suction pipe 206 for introducing the coating liquid into the pump chamber 201 is connected to the pump chamber 201 in a state where a large number of holes drilled in the peripheral surface of the tip end portion are opened in the filter 207. The discharge pipe 208 is connected to the space inside the pump chamber 201 outside the filter.
That is, in this filter-integrated bellows pump 200, the coating liquid passes through the filter 207 in the suction process by the pressure reduction in the pump chamber 201 and is filtered, and has already been filtered when the pump chamber 201 is pressurized. The coating liquid is discharged.

According to this configuration, since the resist solution is filtered when the coating liquid is sucked into the pump chamber 201, the differential pressure between the primary side and the secondary side of the filter can be reduced by setting the suction speed low. As a result, it is possible to minimize the filter leakage and foaming phenomenon of the removal target in the processing liquid such as particles.
JP-A-10-305256

In the configuration shown in FIG. 6, in order to reduce the vibration component due to the magnetic pole pitch and disturbance of the stepping motor 204, the stepping motor 204 is rotated at a high speed to increase the frequency of the vibration component.
That is, by interposing the speed reducer 211 between the stepping motor 204 and the shaft member 209, the expansion / contraction operation of the bellows portion 203 becomes a practical low-speed operation even when the motor 204 is rotated at a high speed. .

However, in the configuration of FIG. 6, there is a problem that, instead of being able to reduce the vibration component due to the motor rotation, the vibration component due to the speed reducer 211 is generated, thereby adversely affecting the coating process.
Further, since the rotational force of the stepping motor 204 is transmitted to the shaft member 209 via the speed reducer 211, there is a problem that the response of the bellows pump 200 is reduced.
Furthermore, in the encoder 205, a fluctuation occurs in a predetermined cycle in a sine wave before electrolysis as an input signal, and the stepping motor 204 follows this fluctuation to generate a vibration, resulting in periodic coating unevenness. was there.

  The present invention has been made under the circumstances as described above. In the coating film forming apparatus and the coating film forming method for applying a processing liquid to a substrate to be processed and forming a film of the processing liquid, the processing liquid supply is provided. To provide a coating film forming apparatus and a coating film forming method capable of reducing adverse effects on coating processing by removing vibrations generated from the system and fluctuations of low frequency and forming a uniform processing liquid film. Objective.

In order to solve the above-described problems, a coating film forming apparatus according to the present invention is a coating film forming apparatus that forms a film of a processing solution on a substrate to be processed, and is arranged so as to pass through a slit-like discharge port while translating on the substrate to be processed. A nozzle that discharges the processing liquid and applies the processing liquid to the substrate surface; a pump unit that has an expansion / contraction part; and supplies the processing liquid to the nozzle by an expansion / contraction operation of the expansion / contraction part; And a ball screw shaft provided along the expansion / contraction direction of the expansion / contraction part and moving the ball screw nut in the expansion / contraction direction of the expansion / contraction part by screwing with the ball screw nut, A motor that rotates the ball screw shaft around the shaft, and the ball screw shaft is provided on the rotation shaft of the motor, and the moment of inertia of the rotation shaft of the motor is 1 × 10 ⁻³ kg · m ^2. Less than Characterized in that it is.

In this way, the ball screw shaft for operating the pump means is provided on the rotating shaft of the motor, and the moment of inertia of the rotating shaft of the motor is set to high inertia, so that even if the motor is rotated at low speed, the magnetic pole pitch and disturbance can be reduced. The vibration of the motor can be suppressed without being affected. Therefore, the adverse effect on the coating process due to the vibration of the motor can be reduced.
Further, since there is no need to use a conventionally used speed reducer (gear), vibrations caused by the speed reducer can be eliminated.
Further, since there is no speed reducer (gear), the rotational force of the motor can be transmitted directly to the ball screw shaft and the ball screw nut, and the response reduction of the pump means can be suppressed.

A controller that controls rotation of the motor and movement operation of the nozzle; an encoder that detects an operation amount of the rotation shaft of the motor; and outputs a detection result to the controller; and a processing liquid to the nozzle A pressure sensor that detects a supply pressure and outputs a detection result to the controller. The controller controls driving of the motor based on the detection result of the encoder, and the encoder based on the detection result of the pressure sensor. It is desirable to determine the frequency of occurrence of fluctuation generated from the above, and to control the movement of the nozzle so that the condition of (nozzle movement speed (mm / sec) / fluctuation generation frequency (Hz)) <1 mm is satisfied.
The resolution of the encoder is preferably 262144 pulse / rev or higher.

With this configuration, it is possible to generate a discharge ripple at every minute interval in the coating direction. As a result, the coating film thickness becomes uniform, and adverse effects on the coating film formation due to the occurrence of coating unevenness can be reduced. .
In particular, by setting the resolution of the encoder to a high resolution, the frequency of occurrence of fluctuations generated in a sine wave as an input signal from the motor can be set to a high frequency equal to or higher than a predetermined value, and control by the controller becomes easy.

In order to solve the above-described problems, the coating film forming method according to the present invention translates a nozzle having a slit-like discharge port on a substrate to be processed, and supplies a processing liquid from the discharge port to the substrate surface. A coating film forming method for discharging and forming a film of a processing liquid, wherein a motor that drives a pump that supplies the processing liquid to the nozzle is operated based on an output of an encoder that detects an operation amount of a rotating shaft of the motor A step of controlling, a step of determining a fluctuation generation frequency generated from the encoder based on an output of a pressure sensor that detects a supply pressure of the processing liquid to the nozzle, and (nozzle moving speed (mm / sec) / fluctuation generation frequency ( Hz)) <1 mm to control the moving operation of the nozzle and to apply the processing liquid to the substrate to be processed. .
The resolution of the encoder is preferably 262144 pulse / rev or higher.

By such a method, discharge ripple caused by the encoder can be generated at every minute interval in the coating direction, resulting in uniform coating film thickness and reducing adverse effects on coating film formation due to the occurrence of coating unevenness. Can do.
In addition, by making the resolution of the encoder high, the frequency of fluctuation generated in the sine wave as the input signal from the motor can be made a high frequency equal to or higher than a predetermined value, and the control by the controller can be facilitated. it can.

  According to the present invention, in a coating film forming apparatus and a coating film forming method for applying a processing liquid to a substrate to be processed and forming a film of the processing liquid, vibration and low-frequency fluctuations generated from the processing liquid supply system are removed. By doing so, it is possible to obtain a coating film forming apparatus and a coating film forming method capable of reducing the adverse effect on the coating process and forming a uniform processing liquid film.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a plan view of a coating and developing treatment system including a coating film forming apparatus according to the present invention.
This coating / development processing system 10 is installed in a clean room. For example, a glass substrate for LCD is used as a substrate to be processed, and a series of cleaning, resist coating, pre-baking, developing, post-baking, and the like during a photolithography process in the LCD manufacturing process. The processing is performed. The exposure process is performed by an external exposure apparatus 12 installed adjacent to this system.

In the coating and developing system 10, a horizontally long process station (P / S) 16 is arranged at the center, and a cassette station (C / S) 14 and an interface station (I / F) are arranged at both ends in the longitudinal direction (X direction). 18 are arranged.
The cassette station (C / S) 14 is a port for loading and unloading a plurality of cassettes C in such a manner that the substrates G are stacked in multiple stages, and up to four can be placed side by side in a horizontal direction (Y direction). A cassette stage 20 and a transport mechanism 22 for taking the substrate G in and out of the cassette C on the stage 20 are provided. The transport mechanism 22 has a means for holding the substrate G, for example, a transport arm 22a, and can be operated with four axes of X, Y, Z, and θ. Delivery is now possible.

In the process station (P / S) 16, the processing units are arranged in the order of the process flow or the process on a pair of parallel and opposite lines A and B extending in the horizontal system longitudinal direction (X direction).
More specifically, in the upstream process line A from the cassette station (C / S) 14 side to the interface station (I / F) 18 side, the cleaning process unit 24, the first thermal processing unit 26, the coating The process unit 28 and the second thermal processing unit 30 are arranged in a line. Here, the cleaning process unit 24 includes an excimer UV irradiation unit (e-UV) 34 and a scrubber cleaning unit (SCR) 36 to which the present invention can be applied in order from the upstream side along the first flat flow path 32. ing. The first thermal processing unit 26 is provided with an adhesion unit (AD) 40 and a cooling unit (COL) 42 in order from the upstream side along the first flat flow path 32.

  The coating process unit 28 includes a resist coating unit (CT) 44 and a vacuum drying unit (VD) 46, and between the first flat flow path 32 and the resist coating unit (CT) 44, both units 44, 46 are connected. And a transfer mechanism (not shown) for transferring the substrate G in the direction of the process line A between the vacuum drying unit (VD) 46 and the second flat flow transfer path 48. The second thermal processing unit 30 is provided with a pre-bake unit (PREBAKE) 50 and a cooling unit (COL) 52 in order from the upstream side along the second flat flow path 48.

  On the other hand, in the downstream process line B from the interface station (I / F) 18 side to the cassette station (C / S) 14 side, a development unit (DEV) 54 and an i-ray UV irradiation unit (i-UV) 56 are provided. The post bake unit (POBAKE) 58, the cooling unit (COL) 60, and the inspection unit (AP) 62 are arranged in a line. These units 54, 56, 58, 60, 62 are provided in this order from the upstream side along the third flat flow path 64. The post bake unit (POBAKE) 58 and the cooling unit (COL) 60 constitute a third thermal processing unit 59.

  An auxiliary transfer space 66 is provided between the process lines A and B, and a shuttle 68 capable of placing the substrate G horizontally in units of one sheet is both in the process line direction (X direction) by a drive mechanism (not shown). You can move in the direction.

  The interface station (I / F) 18 exchanges the substrate G with the conveyance device 70 for exchanging the substrate G with the second and third flat flow conveyance paths 48 and 64. A buffer stage (BUF) 74, an extension cooling stage (EXT COL) 76, and a peripheral device 78 are arranged around them.

  A stationary buffer cassette (not shown) is placed on the buffer stage (BUF) 74. The extension / cooling stage (EXT / COL) 76 is a stage for transferring a substrate having a cooling function, and is used when the substrate G is exchanged between the transfer devices 70 and 72. The peripheral device 78 may have a configuration in which, for example, a titler (TITLER) and a peripheral exposure device (EE) are stacked vertically. Each of the transfer devices 70 and 72 has transfer arms 70 a and 72 a that can hold the substrate G, and can access adjacent units for transferring the substrate G.

  FIG. 2 shows a processing procedure for one substrate G in the coating and developing treatment system 10. First, in the cassette station (C / S) 14, the transport mechanism 22 takes out one substrate G from one of the cassettes C on the stage 20, and removes the taken substrate G in the process station (P / S) 16. The process line A is carried into the carry-in portion on the process line A side, that is, the starting point of the first flat flow conveyance path 32 in a posture in a supine position (with the substrate surface to be processed facing up) (step S1 in FIG. 2).

  In this way, the substrate G is transported toward the downstream side of the process line A in the posture of lying on the first flat flow transport path 32. In the first-stage cleaning process unit 24, the substrate G is sequentially subjected to an ultraviolet cleaning process and a scrubbing cleaning process by an excimer UV irradiation unit (e-UV) 34 and a scrubber cleaning unit (SCR) 36 (steps S2 and S3).

The scrubber cleaning unit (SCR) 36 removes particulate dirt (foreign matter) from the substrate surface by performing brushing cleaning and blow cleaning on the substrate G moving on the flat flow transport path 32, and then rinses. Processing is performed, and finally the substrate G is dried using an air knife or the like.
When a series of cleaning processes in the scrubber cleaning unit (SCR) 36 is finished, the substrate G passes through the first thermal processing section 26 as it is down the first flat flow path 32.

  In the first thermal processing unit 26, when the substrate G is carried into the adhesion unit (AD) 40, first, the substrate G is subjected to a heating dehydration baking process to remove moisture. Next, the substrate G is subjected to an adhesion process using vapor HMDS, and the surface to be processed is hydrophobized (step S4). After the completion of this adhesion process, the substrate G is cooled to a predetermined substrate temperature by the cooling unit (COL) 42 (step S5). Thereafter, the substrate G is transferred from the end point (unloading unit) of the first flat flow transfer path 32 to the transfer mechanism in the coating process unit 28.

In the coating process section 28, first, in the resist coating unit (CT) 44, a resist solution is applied to the upper surface (surface to be processed) of the substrate G by the slit-shaped nozzle, and a resist film is formed.
In this resist coating unit (CT) 44, since the coating film forming apparatus of the present invention can be used suitably, its configuration and operational effects will be described in detail later.
Further, the substrate G on which the resist film is formed in the resist coating unit (CT) 44 is immediately subjected to a drying process under reduced pressure by the reduced pressure drying unit (VD) 46 adjacent to the downstream side (step S6).

  Thereafter, the substrate G is transferred to the start point (carry-in portion) of the second flat-flow conveyance path 48 by the conveyance mechanism in the coating process unit 28. The substrate G is transported to the downstream side of the process line A in a posture on its back also on the second flat flow transport path 48 and passes through the second thermal processing unit 30.

  In the second thermal processing unit 30, the substrate G is first pre-baked by the pre-bake unit (PREBAKE) 50 as a heat treatment after resist coating or a heat treatment before exposure (step S7). By this pre-baking, the solvent remaining in the resist film on the substrate G is removed by evaporation, and the adhesion of the resist film to the substrate is enhanced. Next, the substrate G is cooled to a predetermined substrate temperature by the cooling unit (COL) 52 (step S8). Thereafter, the substrate G is taken up by the transfer device 70 of the interface station (I / F) 18 from the end point (unloading unit) of the second flat flow transfer path 48.

In the interface station (I / F) 18, the substrate G is carried from the extension / cooling stage (EXT / COL) 76 to the peripheral exposure device (EE) of the peripheral device 78, where the resist adhering to the peripheral portion of the substrate G is removed. After receiving exposure for removal at the time of development, it is sent to the adjacent exposure apparatus 12 (step S9).
In the exposure device 12, a predetermined circuit pattern is exposed to the resist on the substrate G. Then, when the substrate G that has undergone pattern exposure is returned from the exposure apparatus 12 to the interface station (I / F) 18, it is first carried into a titler (TITLER) of the peripheral device 78, where it is transferred to a predetermined portion on the substrate. Is recorded (step S10).

Thereafter, the substrate G is returned to the extension / cooling stage (EXT / COL) 76. Transfer of the substrate G at the interface station (I / F) 18 and exchange of the substrate G with the exposure apparatus 12 are performed by transfer devices 70 and 72. Finally, the substrate G is carried from the transfer device 72 to the starting point (loading unit) of the third flat flow transfer path 64 laid on the process line B side of the process station (P / S) 16.
In this way, the substrate G is transported toward the downstream side of the process line B in a posture of lying on the third flat transporting path 64 this time. In the first development unit (DEV) 54, the substrate G is subjected to a series of development processes of development, rinsing, and drying while being conveyed in a flat flow (step S11).

  The substrate G that has undergone a series of development processes in the development unit (DEV) 54 passes through the i-line irradiation unit (i-UV) 56 adjacent to the downstream side while being placed on the third flat flow conveyance path 64 as it is. A decoloring process by i-line irradiation is performed (step S12). After that, the substrate G passes through the third thermal processing unit 59 and the inspection unit (AP) 62 sequentially while being placed on the third flat flow transport path 64, and in the third thermal processing unit 59, the substrate G G is first subjected to post-baking as a heat treatment after the development processing in the post-baking unit (POBAKE) 58 (step S13). By this post-baking, the developer and the cleaning solution remaining on the resist film on the substrate G are removed by evaporation, and the adhesion of the resist pattern to the substrate is also enhanced.

Next, the substrate G is cooled to a predetermined substrate temperature by the cooling unit (COL) 60 (step S14). In the inspection unit (AP) 62, non-contact line width inspection, film quality / film thickness inspection, and the like are performed on the resist pattern on the substrate G (step S15).
On the cassette station (C / S) 14 side, the transport mechanism 22 receives the substrate G that has completed all the steps of the coating and developing process from the end point (forging portion) of the third flat flow transport path 64, and receives the received substrate. G is accommodated in any one (usually the original) cassette C (return to step S1).

In the coating and developing system 10, as described above, the coating film forming apparatus according to the present invention can be applied to the resist coating unit (CT) 44 provided in the coating process unit 28.
Hereinafter, based on FIG. 3 thru | or FIG. 5, the structure of the resist coating unit (CT) 44 in one Embodiment of this invention is demonstrated.

  First, the overall configuration and operation mode of the resist coating unit (CT) 44 will be described with reference to FIG. FIG. 3 is a perspective view showing a schematic configuration of the resist coating unit (CT) 44. In the resist coating unit (CT) 44, as shown in the drawing, a horizontally movable holding means for holding the LCD substrate G horizontally, such as a mounting table 101, and a vacuum device (not shown) are held by suction on the mounting table 101. And a resist supply nozzle 102 disposed above the substrate G. The resist supply nozzle 102 is horizontally moved by the nozzle moving means 103 so that the substrate G on the mounting table 101 and the resist supply nozzle 102 can be relatively horizontally moved.

  It should be noted that at one end or both ends in the moving direction of the resist supply nozzle 102 in the mounting table 101 (shown in the drawing is the case of one end), the discharge port 102a of the resist supply nozzle 102 is dried during non-operation (standby). In order to prevent this, there is provided a standby section 106 having a rotatable prime roller 104 close to the nozzle and a container 105 for immersing the prime roller 104 in thinner.

  The resist supply nozzle 102 has a slit-like discharge port 102a extending in the width direction of the substrate G, and a resist solution storage chamber (not shown) communicating with the discharge port 102a. A resist supply system 110 is connected through a resist solution supply tube 107 to be connected.

  Further, on both sides of the discharge port 102a in the longitudinal direction, film thickness control means 108 for reducing the discharge pressure of the resist solution discharged from the discharge port 102a is provided. The film thickness control means 108 includes a suction pipe 111 connected to the communication passage 109 communicating with both sides in the longitudinal direction of the discharge port 102a, and a suction pump 112 such as a diaphragm pump provided in the suction pipe 111. The discharge pressure on both sides of the discharge port 102a is reduced by driving the suction pump 112. An opening / closing valve 113 is interposed on the suction side of the suction pump 112 in the suction pipe 111, that is, on the resist supply nozzle 102 side.

  Next, the operation of the resist coating unit (CT) 44 configured as described above will be described. First, in a state where the resist supply nozzle 102 is brought close to the prime roller 104 of the standby unit 106, the substrate G transported by the nozzle moving means 103 is sucked and held on the mounting table 101.

Next, the resist solution R is supplied from the resist supply system 110 into the resist solution storage chamber of the nozzle, and the resist solution is discharged from the discharge port 102a. Simultaneously with the discharge operation of the resist solution R, the resist supply nozzle 102 is moved in the horizontal direction by the nozzle moving means 103 to move the resist supply nozzle 102 from the standby unit 106 onto the substrate G. At this time, by driving the suction pump 112 and sucking both sides in the longitudinal direction of the discharge port 102a, the discharge pressure of the resist solution on both sides of the discharge port 102a is reduced, and the discharge pressure on the central side of the discharge port 102a is reduced. The resist solution R is discharged (supplied) in a strip shape onto the substrate G in a state where the discharge pressures on both sides are substantially equal.
Therefore, when the substrate G and the resist supply nozzle 102 move relatively horizontally, the resist solution R is supplied in a strip shape to the surface of the substrate G, and a resist film having a uniform thickness is formed on the entire surface of the substrate G.

  In this way, after the resist film is formed on the surface of the substrate G, the supply of the resist solution is stopped, and the resist supply nozzle 102 moves in the reverse direction so that the discharge port 102a of the resist supply nozzle 102 is moved into the standby unit 106. Near the prime roller 104 to prepare for the next coating process. The substrate G on which the resist film is formed is unloaded from the mounting table 101 by a transfer means (not shown) and transferred to the next processing step.

Next, a resist supply system 110 that supplies a resist solution to the resist supply nozzle 102 will be described with reference to FIGS. 4 and 5.
4 is a block diagram showing a schematic configuration of the resist supply system 110 of the resist coating unit (CT) 44, and FIG. 5 is a sectional view of a filter-integrated bellows pump provided in the resist supply system 110. As shown in FIG.

As shown in FIG. 4, the resist supply system 110 sucks the coating liquid from the tank 120 storing the resist liquid R and the suction pipe 121 from the tank 120 and uses, for example, PTFE, high molecular polyethylene, or the like built in the pump chamber. A filter-integrated bellows pump 124 that is filtered through a filter 122 (having a hole diameter of, for example, 0.1 μm or less) and discharged to a discharge pipe 123, and a flow path between the discharge pipe 123 of the bellows pump 124 and the nozzle 102 is opened and closed. And a valve 125.
Further, a pressure sensor 126 for detecting the pressure of the resist solution flowing through the flow path is provided in the flow path between the discharge pipe 123 and the nozzle 102, and the output of the pressure sensor 126 is a resist coating unit (CT) 44. Is input to the controller 127 that performs the operation control.

As shown in FIG. 5, the bellows pump 124 employs a tube diaphragm pump that varies the pressure in the pump chamber 130 by changing the chamber capacity and sucks and discharges the coating liquid. The pump chamber 130 is provided in a substantially cylindrical shape, and its inner wall is formed by an elastic film 131a of a tube frame 131 (pump means) made of, for example, PFA. Note that a fluid (liquid) is sealed in the tube frame 131.
The inner wall surface of the pump chamber 130 is expanded and contracted by the expansion and contraction of the bellows portion 132 (extension / contraction portion) of the tube frame 131, so that the capacity and pressure of the pump chamber 130 can be varied.

The bellows part 132 is extended and contracted with high accuracy by the power of a motor, for example, a stepping motor 133.
Specifically, a movable support portion 136 that functions as a ball screw nut in the ball screw structure is connected to the lower end of the bellows portion 132, and a shaft member 137 that functions as a ball screw shaft is screwed to the movable support portion 136. And provided on the rotating shaft of the stepping motor 133. That is, the movable support portion 136 moves up and down in accordance with the rotation direction of the stepping motor 133, whereby the bellows portion 132 expands and contracts.

The stepping motor 133 used here requires a high inertia with a moment of inertia of 1 × 10 ⁻³ kg · m ² or more.
That is, by setting the stepping motor 133 to high inertia, even if the motor is rotated at a low speed, it is not affected by disturbances, and vibration of the motor can be suppressed. Therefore, it is not necessary to use a conventionally used speed reducer (gear), and vibration caused by the speed reducer can be eliminated. Moreover, since the rotational force of the stepping motor 133 is directly transmitted to the movable support part 136 without using a speed reducer, it is possible to suppress a decrease in response of the bellows pump 124.

In addition, an encoder 134 is connected to the stepping motor 133, and the operation amount of the stepping motor 133 is fed back to the controller 127.
The controller 127 controls the expansion / contraction operation timing and expansion / contraction speed of the bellows part 132, that is, the resist solution suction / discharge timing and the suction / discharge speed based on the operation amount of the stepping motor 133 obtained by the encoder 134 and various setting conditions. To do.

Further, the sine wave as an input signal to the encoder 134 periodically fluctuates, and application unevenness (discharge ripple of the resist solution R) is generated in synchronization with the generated frequency, so that the application unevenness is made inconspicuous. Thus, the controller 127 performs control.
Specifically, for example, if the discharge ripple is generated every 1 mm or less in the application direction, the application unevenness is inconspicuous. Therefore, the controller 127 controls the moving speed of the nozzle 102 so as to satisfy the condition of Expression (1). The fluctuation occurrence frequency can be obtained by frequency analysis of the detection result of the pressure sensor 126.

Further, if the control satisfying the expression (1) is performed, the adverse effect due to the coating unevenness can be reduced. However, since the control of the nozzle operation speed is actually limited, for example, the moving speed of the nozzle 102 is set to 50 mm / In order to satisfy the condition of the expression (1) when sec is satisfied, the performance of the encoder 134 is required such that the fluctuation generation frequency is 50 Hz or more. For this reason, it is desirable that the resolution of the encoder 134 is 18 bits (262144 pulse / rev) or more.
In this way, the frequency of the fluctuation generated in the sine wave as the input signal from the stepping motor 133 becomes a high frequency (for example, 96 Hz) equal to or higher than a predetermined value, and a discharge ripple is generated every 1 mm in the coating direction. As a result, the film thickness becomes uniform.

  Reference numeral 135 denotes a light transmission type sensor. The sensor 135 interferes with a shutter member 136a attached to the movable support portion 136 of the bellows portion 132, and, for example, an initial position or an end position of expansion / contraction of the bellows portion 132 is detected. Perform detection. The detection signal is output to the controller 127 to be used for controlling the stepping motor 133.

  Here, the suction pipe 121 for introducing the resist solution R into the pump chamber 130 is connected to the pump chamber 130 in a state where a large number of holes formed in the peripheral surface of the tip end portion are opened in the filter 122. On the other hand, the discharge pipe 123 is connected in a state of being opened to a space outside the filter 122 in the pump chamber 130. That is, in this filter-integrated bellows pump 124, the resist solution R passes through the filter 122 in the suction process by the pressure reduction in the pump chamber 130 and is filtered. The resist solution R is discharged. Note that ball check valves (not shown) for preventing backflow are provided in the vicinity of the openings of the suction pipe 121 and the discharge pipe 123, respectively.

  The filter-integrated tube diaphragm pump is provided with a bubble vent 138 that opens to a space inside the pump chamber 130 outside the filter. A height difference h is provided between the opening of the vent 138 and the opening of the discharge pipe 138, and bubbles generated in the pump chamber 130 stay at a position higher than the opening of the discharge pipe 123, and bubbles are generated therefrom. It is discharged by a vent 138 for extraction. Thereby, it becomes difficult for bubbles to enter the discharge pipe 123, and the amount of bubbles in the resist solution supplied to the substrate G can be reduced. A valve (not shown) is connected to the vent 138 for removing bubbles, and every time the tank 120 is periodically replaced, for example, the valve is opened so that bubbles accumulated in the upper part of the pump chamber 130 can be discharged.

Next, the operation of the filter-integrated bellows pump 124 described above will be described.
In the present embodiment, the resist solution is filtered by the filter 122 in the process of sucking the resist solution into the pump chamber 130. That is, the stepping motor 133 is driven to extend the bellows portion 132 of the tube frame 131, the inner wall surface of the pump chamber 130 is contracted (dented), and the inside of the pump chamber 130 is depressurized with respect to atmospheric pressure. The resist solution in the tank 120 is sucked into the pump chamber 130 through the suction pipe 121.
At this time, since the suction pipe 121 has a large number of holes formed in the peripheral surface of the distal end thereof opened inside the filter 122, the resist solution passes through the filter 122 and is sucked into the pump chamber 130. Thus, the resist solution is filtered.

  Thereafter, the stepping motor 133 is driven to compress the bellows part 132 of the tube frame 131, and the inner wall surface of the pump chamber 130 is in an inflated protruding state to reduce the capacity in the pump chamber 130, thereby reducing the pressure in the pump chamber 130. Then, the resist solution R that has been filtered in the pump chamber 130 is discharged from the discharge pipe 123 and supplied to the substrate G through the valve 125 and the nozzle 102.

Here, as described above, since the moment of inertia of the drive shaft of the stepping motor 133 is high inertia of 1 × 10 ⁻³ kg · m ² or more, even if the motor is rotated at low speed, the magnetic pole pitch and disturbance Therefore, the vibration of the motor is suppressed.
In addition, since the resolution of the encoder 134 is set to a high resolution of 18 bits (262144 pulse / rev) or higher, the frequency of occurrence of fluctuations generated in the sine wave as the input signal from the stepping motor 133 is a high frequency (for example, 96 Hz) higher than a predetermined value. ). Accordingly, a discharge ripple is generated at every minute interval in the coating direction, resulting in a uniform coating film thickness.

As described above, according to the embodiment of the present invention, in the filter-integrated bellows pump 124, the shaft member 137 (ball screw shaft) screwed to the movable support portion 136 (ball screw nut) that moves the bellows portion 132 up and down. ) Is provided on the rotating shaft of the motor 133, and the inertia moment of the rotating shaft of the motor 133 is high inertia of 1 × 10 ⁻³ kg · m ² or more.

Thereby, even if the motor 133 is rotated at a low speed, it is not affected by the magnetic pole pitch or disturbance, and the vibration of the motor 133 is suppressed. Therefore, the adverse effect on the coating process due to the vibration of the motor 133 can be reduced.
Further, since there is no need to use a conventionally used speed reducer (gear), vibrations caused by the speed reducer can be eliminated.
Further, since there is no reduction gear (gear), the rotational force of the stepping motor 133 can be directly transmitted to the movable support portion 136, and the response reduction of the bellows pump 124 can be suppressed.

Further, by setting the resolution of the encoder 134 to a high resolution, the frequency of occurrence of fluctuations generated in the sine wave as an input signal from the stepping motor 133 can be set to a high frequency equal to or higher than a predetermined value.
In other words, this makes it possible to generate a discharge ripple at every minute interval in the coating direction. As a result, the coating film thickness becomes uniform, and adverse effects on the coating film formation due to the occurrence of coating unevenness can be reduced.

  The substrate to be processed in the present invention is not limited to an LCD substrate, and various substrates for flat panel displays, semiconductor wafers, CD substrates, glass substrates, photomasks, printed substrates and the like are also possible.

Subsequently, the coating film forming apparatus and the coating film forming method according to the present invention will be further described based on examples.
[Example 1]
In Example 1, the effect of the motor performance (moment of inertia) on the coating film was observed. That is, the application | coating process to a board | substrate was performed changing the performance conditions of a motor, and the application | coating state was observed. Table 1 shows the conditions and results of the motor performance. In all the conditions of Example 1, the same rotary encoder for detecting the operation amount of the motor was used.
As a result, under conditions 1 and 2, no effect on the coating film due to motor vibration was confirmed. However, under condition 3 (Comparative Example 1), uneven coating due to motor vibration was confirmed in the coating film. It was.

Thus, as a result of Example 1, it was confirmed that if the moment of inertia of the motor is 1.0 × 10 ⁻³ kg · m ² or more, the occurrence of uneven coating due to the vibration of the motor can be suppressed.
[Example 2]
In Example 2, the effect of the encoder performance (resolution) on the coating film was observed. Specifically, frequency analysis by FFT (Fast Fourier Transform) is performed on the output of the pressure sensor that detects the pressure of the resist solution supplied to the nozzle for each condition of the encoder performance, and the fluctuation generation frequency caused by the encoder is calculated. Asked. In addition, the occurrence of coating unevenness in the substrate after coating was observed. Table 2 shows the performance conditions of the encoder, the nozzle moving speed, and the experimental results. Note that the same motor was used as the motor connected to the encoder under all conditions in Example 2. Moreover, the graph which frequency-analyzed the output of the pressure sensor is shown in FIG.

As shown in the graph of FIG. 7A, under condition 4 using a high-resolution encoder, the fluctuation generation frequency was as high as 96 Hz, and coating unevenness did not occur. The reason why the coating unevenness did not occur is that the nozzle moving speed is 90 mm / sec. Therefore, the occurrence frequency of the coating ripple due to the fluctuation is within 1 mm (90/96 = 0.9375 mm) in the coating direction on the substrate, that is, This is because the intervals are narrower.
Thus, under condition 4 using a high-resolution encoder, coating unevenness did not occur, and a practically satisfactory level of result was obtained.

  On the other hand, as shown in the graph of FIG. 7B, in Condition 5 (Comparative Example 2) using the low-resolution encoder, the fluctuation generation frequencies were 24 Hz and 96 Hz, and coating unevenness occurred. The coating unevenness occurred because the nozzle moving speed was 90 mm / sec. Therefore, the frequency of occurrence of coating ripple due to 24 Hz fluctuation was about 3.75 mm (= 90/24) in the coating direction on the substrate, that is, a wide range. This is because it was every interval.

  As described above, as a result of Example 2, it was confirmed that there was no practical problem if the frequency of occurrence of the application ripple due to fluctuation was within 1 mm in the application direction on the substrate. For this reason, the resolution of the encoder was 262144 pulses / rev or more. Was confirmed to be preferable.

  The present invention can be applied to a coating film forming apparatus and a coating film forming method for forming a predetermined film on an LCD substrate or the like, and can be suitably used in the semiconductor manufacturing industry, the electronic device manufacturing industry, and the like.

FIG. 1 is a plan view of a coating and developing treatment system including a coating film forming apparatus according to the present invention. FIG. 2 is a flowchart showing a substrate processing flow of the coating and developing processing system of FIG. FIG. 3 is a perspective view showing a schematic configuration of a resist coating unit included in the coating and developing treatment system of FIG. FIG. 4 is a block diagram showing a schematic configuration of a resist supply system of the resist coating unit. FIG. 5 is a cross-sectional view of a filter-integrated bellows pump provided in the resist supply system. FIG. 6 is a cross-sectional view of a conventional filter-integrated bellows pump. FIG. 7 is a graph showing the results of the example.

Explanation of symbols

44 resist coating unit (coating film forming device)
102 Nozzle 102a Discharge port 124 Filter-integrated bellows pump 126 Pressure sensor 127 Controller 130 Pump chamber 131 Tube diaphragm (pump means)
132 Bellows part (expandable part)
133 Stepping motor (motor)
134 Encoder 136 Movable support (ball screw nut)
137 Shaft member (ball screw shaft)
G LCD substrate (substrate to be processed)
R resist solution

Claims (5)

In a coating film forming apparatus that forms a film of a processing liquid on a substrate to be processed, a nozzle that discharges the processing liquid from a slit-like discharge port while translating on the substrate to be processed, and applies the processing liquid to the substrate surface; And a pump means for supplying the processing liquid to the nozzle by the expansion / contraction operation of the expansion / contraction section, a ball screw nut provided at one end of the expansion / contraction direction of the expansion / contraction section, and provided along the expansion / contraction direction of the expansion / contraction section A ball screw shaft that moves the ball screw nut in the expansion / contraction direction of the expansion / contraction part by being screwed to the ball screw nut, and a motor that rotates the ball screw shaft about the axis,
The ball screw shaft is provided on a rotating shaft of the motor;
The coating film forming apparatus according to claim 1, wherein an inertia moment of the rotation shaft of the motor is 1 × 10 ⁻³ kg · m ² or more. A controller for controlling the rotational drive of the motor and the movement operation of the nozzle; an encoder for detecting the operation amount of the rotation shaft of the motor; and outputting a detection result to the controller; and a supply pressure of the processing liquid to the nozzle And a pressure sensor that outputs a detection result to the controller,
The controller controls the driving of the motor based on the detection result of the encoder, obtains the frequency of occurrence of fluctuations generated from the encoder based on the detection result of the pressure sensor,
(Nozzle moving speed (mm / sec) / fluctuation generation frequency (Hz)) <1 mm
The coating film forming apparatus according to claim 1, wherein the movement operation of the nozzle is controlled so as to satisfy the following condition.   The coating film forming apparatus according to claim 2, wherein the encoder has a resolution of 262144 pulse / rev or more. A coating film forming method for forming a film of a processing liquid by moving a nozzle having a slit-shaped discharge port in parallel on a substrate to be processed and discharging a processing liquid from the discharge port onto the surface of the substrate,
Controlling the operation of a motor that drives a pump that supplies a processing liquid to the nozzle based on an output of an encoder that detects an operation amount of a rotating shaft of the motor;
Determining the frequency of occurrence of fluctuations generated from the encoder based on the output of a pressure sensor that detects the supply pressure of the processing liquid to the nozzle;
(Nozzle moving speed (mm / sec) / fluctuation generation frequency (Hz)) <1 mm
And a step of applying the processing liquid onto the substrate to be processed by controlling the movement operation of the nozzle so as to satisfy the above condition.   The method of forming a coating film according to claim 4, wherein the resolution of the encoder is 262144pulse / rev or more.

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