JP2008133545A5 - - Google Patents
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- Publication number
- JP2008133545A5 JP2008133545A5 JP2008030334A JP2008030334A JP2008133545A5 JP 2008133545 A5 JP2008133545 A5 JP 2008133545A5 JP 2008030334 A JP2008030334 A JP 2008030334A JP 2008030334 A JP2008030334 A JP 2008030334A JP 2008133545 A5 JP2008133545 A5 JP 2008133545A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- dpm
- thf
- mol
- sccm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 28
- 239000007789 gas Substances 0.000 description 14
- 239000002994 raw material Substances 0.000 description 8
- 239000012159 carrier gas Substances 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008030334A JP4773469B2 (ja) | 2001-12-03 | 2008-02-12 | 薄膜形成装置及び薄膜形成方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001369279 | 2001-12-03 | ||
| JP2001369279 | 2001-12-03 | ||
| JP2002012566 | 2002-01-22 | ||
| JP2002012566 | 2002-01-22 | ||
| JP2008030334A JP4773469B2 (ja) | 2001-12-03 | 2008-02-12 | 薄膜形成装置及び薄膜形成方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003549588A Division JP4157040B2 (ja) | 2001-12-03 | 2002-12-03 | 混合器、薄膜製造装置及び薄膜製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008133545A JP2008133545A (ja) | 2008-06-12 |
| JP2008133545A5 true JP2008133545A5 (enrdf_load_stackoverflow) | 2010-12-24 |
| JP4773469B2 JP4773469B2 (ja) | 2011-09-14 |
Family
ID=39558584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008030334A Expired - Fee Related JP4773469B2 (ja) | 2001-12-03 | 2008-02-12 | 薄膜形成装置及び薄膜形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4773469B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101034747B1 (ko) * | 2009-05-29 | 2011-05-17 | 삼성에스디아이 주식회사 | 믹싱 장치 |
| US11788190B2 (en) * | 2019-07-05 | 2023-10-17 | Asm Ip Holding B.V. | Liquid vaporizer |
| CN115323484A (zh) * | 2021-09-01 | 2022-11-11 | 江苏汉印机电科技股份有限公司 | 一种用于SiC外延薄膜制备的CVD设备气路系统 |
-
2008
- 2008-02-12 JP JP2008030334A patent/JP4773469B2/ja not_active Expired - Fee Related
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