JP2008122845A5 - - Google Patents

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Publication number
JP2008122845A5
JP2008122845A5 JP2006309101A JP2006309101A JP2008122845A5 JP 2008122845 A5 JP2008122845 A5 JP 2008122845A5 JP 2006309101 A JP2006309101 A JP 2006309101A JP 2006309101 A JP2006309101 A JP 2006309101A JP 2008122845 A5 JP2008122845 A5 JP 2008122845A5
Authority
JP
Japan
Prior art keywords
solder resist
resist pattern
forming
film
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006309101A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008122845A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006309101A priority Critical patent/JP2008122845A/ja
Priority claimed from JP2006309101A external-priority patent/JP2008122845A/ja
Priority to TW96142700A priority patent/TWI426351B/zh
Priority to CN 200710187256 priority patent/CN101183212B/zh
Publication of JP2008122845A publication Critical patent/JP2008122845A/ja
Publication of JP2008122845A5 publication Critical patent/JP2008122845A5/ja
Pending legal-status Critical Current

Links

JP2006309101A 2006-11-15 2006-11-15 ソルダーレジストパターンの形成方法 Pending JP2008122845A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006309101A JP2008122845A (ja) 2006-11-15 2006-11-15 ソルダーレジストパターンの形成方法
TW96142700A TWI426351B (zh) 2006-11-15 2007-11-12 Photolithography (Phototool) and the formation of resistance to resistance pattern
CN 200710187256 CN101183212B (zh) 2006-11-15 2007-11-15 光工具以及阻焊图案的形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006309101A JP2008122845A (ja) 2006-11-15 2006-11-15 ソルダーレジストパターンの形成方法

Publications (2)

Publication Number Publication Date
JP2008122845A JP2008122845A (ja) 2008-05-29
JP2008122845A5 true JP2008122845A5 (cg-RX-API-DMAC10.html) 2010-01-07

Family

ID=39507631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006309101A Pending JP2008122845A (ja) 2006-11-15 2006-11-15 ソルダーレジストパターンの形成方法

Country Status (1)

Country Link
JP (1) JP2008122845A (cg-RX-API-DMAC10.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5079310B2 (ja) * 2006-11-15 2012-11-21 太陽ホールディングス株式会社 ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
JP2001296666A (ja) * 2000-04-12 2001-10-26 Orc Mfg Co Ltd 基板露光方法および露光装置
JP3876991B2 (ja) * 2002-08-07 2007-02-07 三菱化学株式会社 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法
JP4852225B2 (ja) * 2003-10-20 2012-01-11 大日本印刷株式会社 露光装置および露光方法
TWI403761B (zh) * 2005-02-15 2013-08-01 Fujifilm Corp 透光性導電性膜之製法

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