JP2008122144A - Specimen drip substrate for total-reflection fluorescence x-ray analysis, total reflection fluorescent x-ray analyzer, and total reflection fluorescent x-ray analysis method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a specimen drip substrate for total reflection fluorescent X-ray analysis, a total reflection fluorescent X-ray analyzer, and a total reflection fluorescent X-ray analysis method, wherein a trace amount liquid sample is accurately made to dripped, in order to be dried onto a prescribed part of a sample drip substrate, and to improve the sensitivity and accuracy of total reflection fluorescent X-ray analysis on the liquid sample. <P>SOLUTION: This specimen drip substrate 15 for total reflection fluorescent X-ray analysis is a sample drip substrate for thereonto dripping and drying the liquid specimen, comprising a planar substrate 15K with its surface being hydrophobic and having planarity of mirror polishing level, and a synthetic resin drip dried trace 41, made by dripping a prescribed amount of synthetic resin solution 40 onto a prescribed part of a surface of the planar substrate 15K and drying it; the resin solution 40, obtained by dissolving a synthetic resin into a prescribed concentration by using a solvent. By using this total reflection fluorescent X-ray analyzer and its method, a sample solution 70 is dripped onto and dried on the dried trace 41 on the drip substrate 15, to perform total reflection fluorescent X-ray analysis. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a sample drip substrate for fluorescent X-ray analysis. More specifically, a liquid sample is drip-dried onto a sample substrate, and a primary X-ray is irradiated from an X-ray source onto a drip-drying mark formed on the sample substrate, and fluorescent X-rays generated from the drip-drying mark are emitted. The present invention relates to a sample drip substrate for measurement, a total reflection X-ray fluorescence analyzer having the substrate, and a total reflection X-ray fluorescence analysis method using the substrate.

  Conventionally, as a technique for concentrating a liquid sample on a substrate or a film, a substrate obtained by depositing 30 nm of gold using a photolithographic mask on a substrate on which a hydrophobic 30 to 40 μm Teflon (registered trademark) film is formed is used. A method of creating and dropping a liquid sample on a gold vapor deposition site of the substrate is known. In this method, due to the difference in hydrophobicity and hydrophilicity between Teflon (registered trademark) and gold deposited on the Teflon (registered trademark), the droplet of the dropped liquid sample is centered on the deposited gold. When the droplets are collected and dried, they are concentrated mainly on the deposited gold.

  Conventionally, also in fluorescent X-ray analysis, as a method similar to the above, a liquid sample is instilled onto a metal plate or metal foil, and a metal substrate or metal foil on which the instilled liquid droplet has been dried is measured with an X-ray fluorescence analyzer. There is technology. In this method, if the components of the liquid sample include the same components as those of the metal substrate or the metal foil that drip-drys the liquid sample, problems such as when analysis cannot be performed or when accurate analysis cannot be performed occur. Further, for example, a liquid sample is drip-dried on a thin film having a thickness of 0.5 μm, and the X-rays emitted from the drip-dried trace are measured by irradiating the drip-dried trace with primary X-rays. There is an analysis method. In this method, the problem of the measurement component and the metal substrate component does not occur, but it is difficult for the instilled droplet to spread on the thin film or to be instilled into a desired minimal region without staying at a desired site.

  Therefore, in order to solve these problems, a carbon vapor deposition film is formed in a region on a polymer film having a thickness of 0.5 to 0.6 μm, and the carbon vapor deposition film on the drip film in which the carbon vapor deposition film is formed. There is a fluorescent X-ray analysis method in which a liquid sample is instilled into a region and then dried and then subjected to fluorescent X-ray analysis (Patent Document 1). In order to be applied to actual fluorescent X-ray analysis, this drip film 91 is stretched over an annular support frame 94 as shown in FIG. 9 to complete a drip film body 91S. The liquid sample is drip-dried on the deposited film portion 93 and measured.

However, if the drip film 91 is stretched around the support frame 94 by a sample and is not in a uniform flat state, and unevenness and surface sag are generated, the fluorescent X-ray intensity varies between samples, and an accurate analysis can be performed. Can not. In particular, in total reflection X-ray fluorescence analysis, if the height of the sample fluctuates, the total reflection condition cannot be satisfied and measurement cannot be performed, or the background becomes abnormally high and measurement becomes difficult. For this reason, this drip film 91 cannot be used for total reflection fluorescent X-ray analysis.
JP 2003-90810 A

  The present invention has been made in view of the above-described conventional problems. A sample drip substrate for total reflection fluorescent X-ray analysis and a total reflection fluorescence in which a small amount of liquid sample is accurately drip-dried on a sample drip substrate at a predetermined site. An object of the present invention is to provide an X-ray analyzer and a total reflection X-ray fluorescence analysis method, and to improve the sensitivity and accuracy of total reflection X-ray fluorescence analysis of a liquid sample.

  In order to achieve the above object, a sample drip substrate for total reflection X-ray fluorescence analysis according to the first configuration of the present invention is a sample drip substrate for drip-drying a liquid sample, and has a hydrophobic surface and a mirror surface. A flat substrate having polishing flatness, and a synthetic resin drip-dried trace obtained by drip-drying a predetermined amount of a synthetic resin solution in which a synthetic resin is dissolved in a predetermined concentration with a solvent at a predetermined portion of the surface of the flat substrate And have.

  In the first configuration of the present invention, the planar substrate is, for example, a glass plate such as a rectangular shape having a width of 10 to 30 mm, a length of 40 to 80 mm, and a thickness of 0.5 to 5 mm, or a disk shape having a diameter of 20 to 50 mm, The surfaces of the silicon wafer and the quartz plate are mirror-polished, and a 5 nm thick silicon coat or Teflon (registered trademark) coat is applied thereon to make the surface of the glass plate or quartz plate hydrophobic.

  Synthetic resin drip marks are prepared by dissolving a synthetic resin in an organic solvent to prepare a synthetic resin solution having a predetermined concentration of 0.01 to 5% by weight, for example. It is formed by taking 1 to 3 μl and instilling it on a predetermined part of the flat substrate and drying it. The concentration of the synthetic resin solution is preferably 0.02 to 1.0% by weight. The amount of the synthetic resin solution to be instilled on the flat substrate is preferably 0.5 to 3 μl, and the size of the formed synthetic resin infusion mark is preferably 1φ or less. As the concentration of the synthetic resin solution increases, the background from the synthetic resin drip drying marks formed increases. In addition, when the amount of synthetic resin solution that is instilled onto a flat substrate increases, the thickness of the synthetic resin drip drying trace formed increases, and when total reflection X-ray fluorescence analysis is performed, the background increases and the analysis accuracy is increased. The sheath accuracy decreases. The predetermined position of the flat substrate on which the synthetic resin solution is dropped is preferably the center position of the surface of the substrate.

  For the formation of synthetic resin drip drying marks, synthetic resins and solvents that do not contain impurities affecting total reflection X-ray fluorescence analysis are used, and the synthetic resin drip drying marks formed are hydrophilic. And solvents are used. For example, an acrylic resin is preferable as the synthetic resin, and a mixed solvent of 1-methoxy-2-propanol (propylene glycol monomethyl ether or ether) and toluene is preferable as the organic solvent.

  According to the sample drip substrate for total reflection X-ray fluorescence analysis of the first configuration of the present invention, a synthetic resin or solvent that does not contain impurities that affect total reflection X-ray fluorescence analysis is used and formed. Since synthetic resins and solvents that have hydrophilic resin drip marks are used, if a small amount of liquid sample is instilled on a synthetic resin drip mark formed on a small amount of liquid sample, the hydrophilicity of the synthetic resin drip mark Therefore, the liquid sample can be concentrated at a position centered on the synthetic resin drip drying mark, and the variation in the fluorescent X-ray intensity to be detected is small with little variation in the sample position. In addition, it does not contain impurities, the thickness of the synthetic resin drip dry trace is as thin as 1 μm, for example, and there is almost no background of total reflection X-ray fluorescence analysis, and the fluctuation of the X-ray fluorescence intensity is reduced. In combination with this, accurate and accurate total reflection X-ray fluorescence analysis can be performed. Further, since the liquid sample is concentrated, the excitation efficiency can be increased by irradiating the narrowed primary X-ray, and the analysis sensitivity can be improved.

  The total reflection X-ray fluorescence analyzer according to the second configuration of the present invention is a synthetic resin drip drying of the total reflection X-ray fluorescence analysis sample drip substrate according to the first configuration and the total reflection X-ray fluorescence analysis sample drip substrate. Drying means for drying the liquid sample dripped on the trace, an X-ray source for irradiating the sample drying trace dried by the drying means with primary X-rays, and the sample drying for irradiating the primary X-ray And a detector for detecting fluorescent X-rays generated from the mark.

  In the second configuration of the present invention, the sample drip substrate for total reflection X-ray fluorescence analysis is the same as the sample drip substrate according to the first configuration. The drying means for drying the liquid sample drip on the synthetic resin drip drying trace on the sample drip substrate for total reflection fluorescent X-ray analysis has a predetermined amount on the synthetic resin drip drying trace on the sample drip substrate for total reflection fluorescent X-ray analysis. This is a mechanism to drip a liquid sample and dry the drip liquid sample mildly, a substrate mounting table for placing a sample drip substrate for total reflection X-ray fluorescence analysis at a predetermined position, and a drip for liquid sample A micropipette, a micropipette holder, a drying unit for drying a liquid sample dripped on a sample drip substrate for total reflection X-ray fluorescence analysis, a drying control unit for controlling the drying temperature of the drying unit, and a case for housing these It is configured. The micropipette may be another trace liquid sampling device such as a microsyringe. The drying unit may be combined with a heater such as a light bulb or nichrome wire, and an electric fan or an air suction pump, for example.

  An X-ray source for irradiating the sample drying traces dried by the drying means with primary X-rays is an X-ray tube of W, Cu, Cr or the like generally used in fluorescent X-ray analysis. The detector for detecting the fluorescent X-rays generated from the sample drying trace irradiated with the primary X-ray is a semiconductor detector such as SSD or SDD used in total reflection X-ray analysis.

  According to the second configuration of the present invention, the sample is drip on the synthetic resin drip drying traces of the total reflection X-ray fluorescence analysis sample drip substrate according to the first configuration and the total reflection X-ray fluorescence analysis sample drip substrate. A total reflection X-ray fluorescence analyzer having a drying means for drying the liquid sample, so when a small amount of liquid sample is instilled on the formed synthetic resin drip drying trace, due to the hydrophilicity of the synthetic resin drip drying trace, It can be concentrated at a position centering on the synthetic resin drip drying trace. By drying this drip liquid sample mildly by a drying means, it is possible to form a sample dry mark by focusing on the position of the synthetic resin drip dry mark, and to detect the measurement sample position with little fluctuation. Variation in intensity is reduced. In addition, the synthetic resin drip trace does not contain impurities, is very thin with a thickness of 1 μm, and there is almost no background of total reflection X-ray fluorescence analysis, coupled with the fact that fluctuation in fluorescence X-ray intensity is reduced, Accurate and accurate total reflection X-ray fluorescence analysis can be performed.

    The total reflection X-ray fluorescence analysis method according to the third configuration of the present invention is a method in which a predetermined amount of a liquid sample is instilled on a synthetic resin drip drying mark on a sample drip substrate for total reflection X-ray fluorescence analysis according to the first configuration. The dried liquid sample is dried to generate a sample drying mark, and the sample drip substrate for X-ray fluorescence analysis on which the sample drying mark is generated is set on the substrate mounting table of the total reflection X-ray fluorescence analyzer, and measurement is performed. The intensity | strength of the fluorescent X-ray | X_line generate | occur | produced from the sample dry trace is started, and the component contained in the said liquid sample is analyzed.

  According to the third configuration of the present invention, since it is a method for performing total reflection X-ray fluorescence analysis using the sample drip substrate for total reflection X-ray fluorescence analysis according to the first configuration, Similar actions and effects can be obtained.

  Hereinafter, a sample drip substrate for total reflection X-ray fluorescence analysis which is a first embodiment of the present invention will be described. A flat substrate 15K shown in FIG. 1 is a transparent glass plate having a rectangular surface with a thickness of 1.3 mm and a size of 26 × 76 mm, and a silicon coat with a thickness of 5 nm is applied to the surface. By this silicon coating, the planar substrate 15K has hydrophobicity. Using a micropipette 61 of the synthetic resin drip drying trace forming tool 50 shown in FIG. 3, a synthetic resin solution 40 is dropped on a predetermined portion of the surface of the flat substrate 15K as shown in FIG. The synthetic resin drip drying trace 41 is formed by drying as described above.

  As shown in FIG. 3, the synthetic resin drip drying trace forming tool 50 includes a flat substrate base 51, a micropipette holder 60, and a micropipette 61. The flat substrate base 51 is a flat substrate set groove 52 which is a set groove for instilling the synthetic resin solution 40 onto a predetermined portion of the flat substrate 15K, and a position for positioning the flat substrate 15K in the flat substrate set groove 52. A mating edge 55, an infusion position mark 53 for instilling the synthetic resin solution 40 onto a predetermined portion of the flat substrate 15K, a fitting hole 57 for fitting with the legs of the support columns 66, 67, 68 of the micropipette holder 60, There are 4 sets of 58 and 59. The drip position mark 53 is marked with, for example, a 0.5 mm drill blade.

  The micropipette holder 60 includes an upper holding plate 62, a lower holding plate 64, and support pillars 66, 67, 68. The upper holding plate 62 and the lower holding plate 64 are each an upper holding for holding the micropipette 61. A hole 63 and a lower holding hole 65 are provided. The micropipette 61 is a commercially available pipette whose volume can be changed to 0.5 to 10 μl. A pipette with a fixed collection volume of 1, 2, 3 μl may be used. The material of the synthetic resin drip drying mark forming tool 50 is stainless steel except for the micropipette 61.

  The process of forming the sample drip substrate 15 for total reflection X-ray fluorescence analysis using the flat substrate 15K and the synthetic resin drip drying trace forming tool 50 will be described. 100 mg (milligram) of acrylic resin powder is collected with a spatula, weighed with an electronic balance, then collected in a glass beaker, 5 ml of solvent toluene is weighed with a whole pipette, added to this glass beaker, and acrylic Dissolve the resin powder. To this solution in which the acrylic resin is dissolved, 20 ml (milliliter) of 1-methoxy-2-propanol (propylene glycol monomethyl ether, PGMME) is added to make a total solution of 25 ml. 1 ml of this solution is weighed in a beaker, 9 ml of 1-methoxy-2-propanol is added and diluted 10 times to prepare an acrylic resin solution 40 which is a 0.04% weight synthetic resin solution. Four planar substrates 15K are set in the four planar substrate setting grooves 52 of the synthetic resin drip drying mark forming tool 50, and placed on a hot plate (not shown) heated to 80 ° C. The alignment edge 55 of the flat substrate setting groove 52 on which the micropipette holder 60 is set above and one corner of the adjacent flat substrate 15K are connected to the bottom of the flat substrate setting groove 52 with the flat substrate 15K. Slide along to match.

  For example, 2 μl of the 0.04% weight acrylic resin solution 40 prepared in the previous step is collected with a micropipette 61, and the lower part of the micropipette 61 is aligned with the lower holding hole 65 as shown in FIG. The upper part of 61 is aligned with the upper holding hole 63, the contact part 611 of the micropipette 61 and the upper surface of the upper holding plate 62 are brought into contact with each other, and the tip of the tip of the micropipette 61 and the drip position mark 53 match on the XY plane. The push button 612 of the micropipette 61 is pushed in accordance with the position to be moved, and the acrylic resin solution 40 is instilled onto the flat substrate 15K. Since the flat substrate stand 51 is heated to 80 ° C. by the hot plate, the drip acrylic resin solution is immediately dried to form a synthetic resin drip dry trace, and the sample drip substrate 15 for total reflection X-ray fluorescence analysis is formed. .

  The three planar substrates 15K set in the remaining three planar substrate setting grooves 52 are also formed on the total reflection fluorescent X-ray analysis sample drip substrate 15 by the same process as described above. Thus, since the acrylic resin solution 40 is instilled in accordance with the drip position mark 53, the synthetic resin drip drying trace 41 is formed at the center position which is a predetermined position of the flat substrate 15K. In this embodiment, the synthetic resin drip drying trace 41 is formed at the center position of the flat substrate 15K. However, the synthetic resin drip drying trace forming tool 50 can be deformed and formed at other predetermined sites. In the present embodiment, the number of planar substrate set grooves 52 is four, but may be one, ten, thirty, or the like.

  In this embodiment, an acrylic resin is used as the synthetic resin, and toluene and 1-methoxy-2-propanol are used as the solvent. However, the synthetic resin drip dried trace generated on the sample drip substrate for total reflection X-ray fluorescence analysis is hydrophilic. As long as the liquid sample is a combination of a synthetic resin and a solvent that can be collected at a position centered on a synthetic resin drip drying mark, the resin may not be acrylic resin, toluene, and 1-methoxy-2-propanol.

  The total reflection X-ray fluorescence spectrometer according to the second embodiment of the present invention will be described below with reference to FIG. This total reflection X-ray fluorescence analyzer is the same as the total reflection X-ray fluorescence analyzer described in Japanese Patent Application No. 2006-207420, but the sample reflection substrate 15 for total reflection X-ray fluorescence analysis according to the first embodiment of the present invention, And a drying means 8 for drying the liquid sample dripped onto the synthetic resin drip drying trace 41 of the sample drip substrate for total reflection X-ray fluorescence analysis. In this specification, the total reflection fluorescent X-ray analyzer part described in Japanese Patent Application No. 2006-207420 is referred to as an analysis unit 1. In addition, all matters described in the specification of Japanese Patent Application No. 2006-207420 are treated as cited in this specification.

  The drying means 8 includes a substrate drying stage 84 on which the total reflection fluorescent X-ray analysis sample drip substrate 15 is placed, a micropipette 81 for dipping a liquid sample, and a micropipette holder for holding the micropipette 81 in a predetermined position. The upper part 86, the micropipette holding lower part 87, the drying part 82 for drying the liquid sample dripped onto the sample drip substrate 15 for total reflection X-ray fluorescence analysis, the drying control part 83 for controlling the drying temperature of the drying part 82, The cover 80 is configured to prevent the radiation of the radiant heat from the case 80 to be stored and the drying unit 82. The volume of the micropipette 81 can be varied from 10 to 100 μl. The drying unit 82 is, for example, a 100 W (watt) bulb 82. The drying control unit 83 controls the power to be supplied to the light bulb 82 and the energization time in order to control the drying temperature of the liquid sample.

  The analysis unit 1 includes an X-ray tube 11 that is an X-ray source 2, a spectroscopic element 13 formed of, for example, a cumulative multilayer film, and a measurement unit 3, and the X-ray 12 from the X-ray tube 11 is obtained. The liquid sample was instilled onto the synthetic resin drip drying mark 41 of the sample drip substrate 15 for total reflection fluorescent X-ray analysis as the primary X-ray 14 by the monochromator 13, and dried as the primary X-ray 14. 72, and the fluorescent X-rays 16 generated from the sample dry trace 72 are detected by the detector 17 which is a semiconductor detector (SSD or SDD), for example, and are contained in the sample dry trace 72 which is a liquid sample Quantitative and qualitative analysis. At this time, the back surface 15b of the analysis surface 15a of the total reflection X-ray fluorescence analysis sample drip substrate 15 placed on the substrate mounting table 30 is pressed by the pressing means 20, and the analysis surface 15a is held by the holding portion 26 of the contact means 25. The sample reflection substrate 15 for total reflection X-ray fluorescence analysis is set at a predetermined position by contacting with the ceramic ball 27 made of alumina which is a contact portion held by the substrate.

Next, the operation of the apparatus of this embodiment will be described. As shown in FIG. 5, the sample drip substrate 15 for total reflection X-ray fluorescence analysis is placed on the substrate drying stage 84 of the drying means 8. For example, a micropipette 81 in which 20 μl of a liquid sample is collected is set in accordance with predetermined positions of the micropipette holding lower portion 87 and the micropipette holding upper portion 86, and the synthetic resin dry trace 41 of the sample drip substrate 15 for total reflection X-ray fluorescence analysis 15 is set. The liquid sample 70 is instilled on the top. Next, the electric power to be applied to the light bulb 82 accommodated in the case and the energization time are set to 60 W · 4 minutes by the drying control unit 83, and the liquid sample is heated by the radiant heat of the light bulb 82. When the liquid sample 70 is heated and dried, the droplet 70 gradually becomes smaller as shown in FIG. 6 showing the first process of forming the sample drying trace, FIG. 7 showing the second process, and FIG. 8 showing the third process. As a result, it is condensed into droplets 71. When drying is completed, a sample drying trace 72 of about 2φ is formed. In some cases, the electric power to be applied to the light bulb 82 and the energization time are set to 30 W · 4 minutes or more and heat drying.

  What is necessary is just to set suitably the heating temperature and heating time which dry the sample drip board | substrate 15 for the total reflection fluorescent X-ray analysis in which the liquid sample 70 was instilled according to conditions, such as the amount of liquid samples extract | collected, and a liquid property. The sizes of the synthetic resin dry marks, the liquid sample droplets and the sample dry marks shown in FIGS. 2, 6, 7 and 8 are shown larger than the actual sizes in order to clearly show them on the drawings.

  As shown in FIG. 4, the sample drip substrate 15 for total reflection X-ray fluorescence analysis on which the sample drying trace 72 is formed is set in the substrate placement groove 31 of the substrate placement table 30, and then the measurement is started. The pressing unit 20 driven by the drive control unit passes through the pressing unit passage hole 32 of the substrate mounting table 30 and presses the back surface 15b of the sample drip substrate 15 for total reflection X-ray fluorescence analysis set in the substrate mounting groove 31. However, when the analysis surface 15a of the glass substrate is brought into contact with the ceramic ball 27, the stepping motor driving the pressing means 20 is stopped, and the total reflection fluorescent X-ray analysis sample drip substrate 15 is set at a predetermined position. Held in that position.

  When the total reflection fluorescent X-ray analysis sample drip substrate 15 is held at a predetermined position, X-rays 12 from the X-ray tube 11 are monochromatized by the spectroscopic element 13 on the total reflection fluorescent X-ray analysis sample drip substrate 15. The primary X-ray 14 is irradiated, and the fluorescent X-ray generated from the sample drip drying trace 72 of the sample drip substrate 15 for total reflection X-ray fluorescence analysis is detected by the detector 17, and the components contained in the sample are analyzed. When the measurement is completed, the stepping motor that drives the pressing unit 20 starts rotating, the pressing unit 20 descends, and the total reflection fluorescent X-ray analysis sample drip substrate 15 is accommodated in the substrate mounting groove 31. Sequentially, the same number of samples are analyzed by the same operation.

  When analyzed with the total reflection X-ray fluorescence spectrometer of the present embodiment, the liquid sample is concentrated as a sample dry mark 72 at a position centered on the synthetic resin drip dry mark due to the hydrophilicity of the synthetic resin drip dry mark. There is little variation in the position of the measurement sample, and the variation in the detected fluorescent X-ray intensity is small. Further, the synthetic resin drip drying trace does not contain impurities, and the thickness is as extremely thin as 1 μm, and almost no background of total reflection X-ray fluorescence analysis occurs. Using a conventional total reflection X-ray fluorescence analyzer, the coefficient of variation of 10 repetitions when a liquid sample was measured by dipping on a silicon-coated glass substrate on which no synthetic resin drip drying marks were formed was 15%. However, using the total reflection X-ray fluorescence analyzer of the present embodiment, the variation coefficient of 10 repetitions when the liquid sample is measured on the total reflection X-ray fluorescence analysis sample drip substrate is 8%, Analysis accuracy has been greatly improved.

  Next, a total reflection X-ray fluorescence analysis method according to the third embodiment of the present invention will be described. For example, 20 μl of a liquid sample is collected with a micropipette and dropped on the synthetic resin drip drying trace 41 of the sample drip substrate 15 for total reflection X-ray fluorescence analysis of the first embodiment of the present invention. As shown in FIG. 6, the drip liquid sample 70 has a shape raised on the synthetic resin drip drying trace 41. Next, the sample drip substrate 15 for total reflection fluorescent X-ray analysis is dried. When drying is performed by heating with a heater or the like surrounding the sample drip substrate 15 for total reflection X-ray fluorescence analysis, as shown in FIGS. When the drying is completed, a sample drying mark 72 of about 2φ is generated.

  The sample drip substrate 15 for total reflection X-ray fluorescence analysis on which the sample drying trace 72 is generated is set on the substrate mounting table of the total reflection X-ray fluorescence analyzer, and the measurement is started and the fluorescent X-ray generated from the sample drying trace 72 The component contained in the sample drying mark 72 is analyzed.

It is explanatory drawing which forms the sample drip board | substrate for total reflection X-ray fluorescence analysis which is 1st Embodiment of this invention. It is a perspective view of the sample drip board for total reflection fluorescence X-ray analysis formed similarly. It is a schematic perspective view of the synthetic resin drip drying trace formation tool for forming the sample drip board for the total reflection X-ray fluorescence analysis. It is the schematic of the total reflection X-ray fluorescence spectrometer which is 2nd Embodiment of this invention. It is a schematic perspective view of the drying means of the same total reflection fluorescent X-ray analyzer. It is a figure which shows the 1st process of formation of the sample dry trace in the same total reflection fluorescent-X-ray-analysis apparatus. It is a figure which shows the 2nd process. It is a figure which shows the 3rd process. It is sectional drawing of the drip film body of a prior art.

Explanation of symbols

2 X-ray source 8 Drying means 14 Primary X-ray 15 Sample reflection substrate 15K for total reflection X-ray fluorescence analysis Flat substrate 16 Fluorescence X-ray 17 Detector 30 Substrate mounting table 41 Synthetic resin drip drying mark 70 Liquid sample 72 Sample drying mark

Claims (4)

A sample drip substrate for drip-drying a liquid sample,
A planar substrate having a hydrophobic surface and having a mirror polished flatness;
Synthetic resin drip-dried traces obtained by drip-drying a predetermined amount of a synthetic resin solution in which a synthetic resin is dissolved in a predetermined concentration with a solvent at a predetermined site on the surface of the flat substrate,
A sample drip substrate for total reflection X-ray fluorescence analysis. In claim 1,
A sample drip substrate for total reflection X-ray fluorescence analysis, wherein the synthetic resin is an acrylic resin. A sample drip substrate for total reflection X-ray fluorescence analysis according to claim 1 or 2,
A drying means for drying the liquid sample drip on the synthetic resin drip drying trace of the sample drip substrate for total reflection X-ray fluorescence analysis;
An X-ray source that emits primary X-rays to a sample drying mark dried by the drying means;
A detector for detecting fluorescent X-rays generated from the sample drying trace irradiated with the primary X-ray;
A total reflection fluorescent X-ray analyzer. Injecting a predetermined amount of a liquid sample onto the synthetic resin drip drying trace of the sample drip substrate for total reflection fluorescent X-ray analysis according to claim 1 or 2,
Drying the drip liquid sample to produce a sample dry mark,
Set the sample drip substrate for X-ray fluorescence analysis in which the sample dry trace is generated on a substrate mounting table of a total reflection X-ray fluorescence analyzer,
Start measurement and measure the intensity of fluorescent X-rays generated from the sample dry trace,
A total reflection X-ray fluorescence analysis method for analyzing a component contained in the liquid sample.

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