JP2008101981A - Liquid stirrer, and substance detection system - Google Patents

Liquid stirrer, and substance detection system Download PDF

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JP2008101981A
JP2008101981A JP2006283869A JP2006283869A JP2008101981A JP 2008101981 A JP2008101981 A JP 2008101981A JP 2006283869 A JP2006283869 A JP 2006283869A JP 2006283869 A JP2006283869 A JP 2006283869A JP 2008101981 A JP2008101981 A JP 2008101981A
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substrate
liquid
wall
acoustic wave
surface acoustic
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Takashi Kogai
崇 小貝
Makoto Nara
誠 奈良
Hiromi Yatsuda
博美 谷津田
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Japan Radio Co Ltd
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Japan Radio Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a compact liquid stirrer of simple structure, and a substance detection system applied with the liquid stirrer. <P>SOLUTION: This liquid stirrer is provided with a substrate with a surface acoustic wave propagated therethrough, the first protrusion part having a wall face drawing a recessed line within a face in parallel to a surface of the substrate, and provided on the surface of the substrate, the second protrusion part having a wall face drawing the recessed line within the face in parallel to the surface of the substrate, and provided on the surface of the substrate to oppose a recessed side of its wall face to the recessed side of the wall face of the first protrusion part, and an excitation source provided in the substrate to excite the surface acoustic wave from the recessed side of the wall face of the first protrusion part, and the wall face of the first protrusion part and the wall face of the second protrusion part introduce the liquid moving on the surface of the substrate by the surface acoustic wave excited by the excitation source, and make the liquid flow annularly on the surface of the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、液体を環状に流動させる液体撹拌装置、および液体が含む物質の反応によって生成された物質を検出する物質検出システムに関する。   The present invention relates to a liquid agitation device that causes a liquid to flow in an annular shape, and a substance detection system that detects a substance generated by a reaction of a substance contained in the liquid.

生体物質に関する実験を行う分野では、ポンプを用いて生体物質を含む液体を管に流動させ搬送する液体搬送システムが広く用いられる。例えば、液体が循環するよう管を設けた場合には、複数の生体物質を含む液体を循環させ撹拌することで、複数の生体物質の相互の反応を促進させることができる。   2. Description of the Related Art In the field of conducting experiments on biological materials, liquid conveyance systems that use a pump to cause a liquid containing biological materials to flow through a tube and convey the liquid are widely used. For example, when a tube is provided so that the liquid circulates, the mutual reaction of the plurality of biological materials can be promoted by circulating and stirring the liquid containing the plurality of biological materials.

特表2004−534633号公報JP-T-2004-534633 特表2003−535349号公報Special table 2003-535349 gazette

このような液体搬送システムでは、液体を流動させるポンプの体積が大きいためシステムが大型化するという問題がある。また、液体を導く管に液体の流れを調整するためのバルブを設ける必要があるため、構造が複雑となるという問題がある。   In such a liquid transport system, there is a problem that the system becomes large because the volume of the pump for flowing the liquid is large. Further, since it is necessary to provide a valve for adjusting the flow of the liquid in the pipe for guiding the liquid, there is a problem that the structure becomes complicated.

本発明はこのような課題に対してなされたものであり、構造が簡単で小型な液体撹拌装置および当該液体撹拌装置を適用した物質検出システムを提供する。   The present invention has been made for such a problem, and provides a liquid agitator having a simple structure and a small size, and a substance detection system to which the liquid agitator is applied.

本発明に係る液体撹拌装置は、弾性表面波が伝播する基板と、前記基板の表面と平行な面内で凹形状の線を描く壁面を有し、前記基板の表面上に設けられる第1隆起部と、前記基板の表面と平行な面内で凹形状の線を描く壁面を有し、当該壁面の凹んだ側が前記第1隆起部が有する前記壁面の凹んだ側に対向するよう、前記基板の表面上に設けられる第2隆起部と、前記基板に設けられ、前記第1隆起部が有する前記壁面の凹んだ側から弾性表面波を励振する励振源と、を備え、前記第1隆起部が有する前記壁面および前記第2隆起部が有する前記壁面は、前記励振源が励振する弾性表面波によって前記基板の表面上を移動する液体を導き、前記基板の表面上に前記液体を環状に流動させることを特徴とする。   The liquid stirring apparatus according to the present invention includes a substrate on which a surface acoustic wave propagates and a wall surface that draws a concave line in a plane parallel to the surface of the substrate, and a first ridge provided on the surface of the substrate. And the substrate has a wall surface that draws a concave line in a plane parallel to the surface of the substrate, and the recessed side of the wall surface faces the recessed side of the wall surface of the first raised portion. A second raised portion provided on the surface of the substrate, and an excitation source provided on the substrate for exciting a surface acoustic wave from a recessed side of the wall surface of the first raised portion. The wall surface of the substrate and the wall surface of the second raised portion guide the liquid moving on the surface of the substrate by the surface acoustic wave excited by the excitation source, and flow the liquid annularly on the surface of the substrate. It is characterized by making it.

また、本発明に係る液体撹拌装置においては、前記基板に設けられ、前記第1隆起部が有する前記壁面と前記第2隆起部が有する前記壁面との間に挟まれる前記基板上の撹拌領域に、前記第1隆起部が有する前記壁面および前記第2隆起部が有する前記壁面によって塞がれていない方向から弾性表面波を励振する補助励振源を備え、前記撹拌領域の外側に前記液体が流出することを前記補助励振源が励振する弾性表面波によって阻止する構成とすることが好適である。   Moreover, in the liquid stirring apparatus according to the present invention, the stirring region on the substrate is provided on the substrate and is sandwiched between the wall surface of the first raised portion and the wall surface of the second raised portion. An auxiliary excitation source for exciting a surface acoustic wave from a direction not covered by the wall surface of the first bulge portion and the wall surface of the second bulge portion, and the liquid flows out of the stirring region It is preferable to adopt a configuration in which this is prevented by a surface acoustic wave excited by the auxiliary excitation source.

また、本発明に係る液体撹拌装置は、弾性表面波が伝播する基板と、前記基板の表面上に設けられる突起部と、前記基板に設けられ弾性表面波を励振する励振源と、を備え、前記励振源によって励振された弾性表面波によって、前記基板の表面上に前記突起部を中心として液体を環状に流動させることを特徴とする。   Further, the liquid stirring apparatus according to the present invention includes a substrate on which the surface acoustic wave propagates, a protrusion provided on the surface of the substrate, and an excitation source provided on the substrate for exciting the surface acoustic wave, The surface acoustic wave excited by the excitation source causes the liquid to flow in an annular shape on the surface of the substrate with the protrusion as a center.

また、本発明に係る物質検出システムは、前記液体撹拌装置と、前記基板に設けられ、前記液体が環状に流動する前記基板の表面上の位置に弾性表面波を励振する測定励振源と、前記基板に設けられ、前記測定励振源によって励振され前記液体が環状に流動する前記基板の表面上の位置を通過した弾性表面波に基づいて信号を発生する検出部と、を備え、前記検出部が発生する信号に基づいて、前記液体が含む物質の反応によって生成された生成物質の量を測定することを特徴とする。   The substance detection system according to the present invention includes the liquid agitator, a measurement excitation source that is provided on the substrate and excites a surface acoustic wave at a position on the surface of the substrate where the liquid flows in an annular shape, A detection unit that is provided on a substrate and generates a signal based on a surface acoustic wave that is excited by the measurement excitation source and passes through a position on the surface of the substrate where the liquid flows in an annular shape, and the detection unit includes Based on the generated signal, the amount of the produced substance produced by the reaction of the substance contained in the liquid is measured.

本発明によれば、構造が簡単で小型な液体撹拌装置および物質検出システムを実現することができる。   According to the present invention, it is possible to realize a liquid stirring device and a substance detection system that have a simple structure and are small.

図1に本発明の第1の実施形態に係る搬送撹拌装置100を示す。本願の図面では、構成部の境界線を破線で示し構成部の位置関係を説明するための線を一点鎖線で示す。搬送撹拌装置100は、基板10、案内壁12aおよび12b、搬送壁14a,14b,16aおよび16b、中間壁18、ならびに電極対20−1〜20−4を備えて構成される。   FIG. 1 shows a conveying and stirring apparatus 100 according to the first embodiment of the present invention. In the drawings of the present application, the boundary lines of the constituent parts are indicated by broken lines, and the lines for explaining the positional relationship of the constituent parts are indicated by alternate long and short dash lines. The transport agitator 100 includes a substrate 10, guide walls 12a and 12b, transport walls 14a, 14b, 16a and 16b, an intermediate wall 18, and electrode pairs 20-1 to 20-4.

基板10は、水晶、ニオブ酸リチウム、タンタル酸リチウム等、圧電現象によって弾性表面波を発生させることが可能であり、少なくとも二軸方向に弾性表面波を伝播させることが可能な圧電材料によって形成される。このような圧電材料としては、Yカットニオブ酸リチウムが好適である。   The substrate 10 is made of a piezoelectric material such as quartz, lithium niobate, lithium tantalate or the like that can generate surface acoustic waves by a piezoelectric phenomenon and can propagate surface acoustic waves in at least two directions. The As such a piezoelectric material, Y-cut lithium niobate is suitable.

案内壁12aおよび12b、搬送壁14a,14b,16aおよび16b、ならびに中間壁18は、線状の隆起部として基板10上に形成される。これらの壁はエポキシ樹脂等、粘性の液体の状態で成形加工することができる樹脂で形成することが好適である。また、これらの壁の延伸方向に垂直な断面の形状は任意であるが、ここでは長方形であるものとする。   The guide walls 12a and 12b, the transfer walls 14a, 14b, 16a and 16b, and the intermediate wall 18 are formed on the substrate 10 as linear raised portions. These walls are preferably formed of a resin that can be molded in a viscous liquid state, such as an epoxy resin. Moreover, although the shape of the cross section perpendicular | vertical to the extending | stretching direction of these walls is arbitrary, it shall be a rectangle here.

案内壁12aは、直線部12aSおよび円弧部12aCを含んで構成される。直線部12aSは直線状に形成される。円弧部12aCは、90°の円弧角を有する円弧の形状に形成される。直線部12aSと円弧部12aCとはそれぞれの端において接合され、J字型の案内壁12aを構成する。案内壁12bは、直線部12bSおよび円弧部12bCを含んで構成される。円弧部12bCは円弧部12aCと同一の形状を有する。直線部12bSと円弧部12bCはそれぞれの端において接合され、J字型の案内壁12bを構成する。案内壁12aおよび12bは、直線部12aSと直線部12bSとが平行となり、円弧部12aCの凹んだ壁面が円弧部12bCの凹んだ壁面に対向するよう配置される。   The guide wall 12a includes a straight portion 12aS and an arc portion 12aC. The straight portion 12aS is formed in a straight line shape. The arc portion 12aC is formed in an arc shape having an arc angle of 90 °. The straight line portion 12aS and the circular arc portion 12aC are joined at each end to constitute a J-shaped guide wall 12a. The guide wall 12b includes a straight portion 12bS and an arc portion 12bC. The arc portion 12bC has the same shape as the arc portion 12aC. The straight line portion 12bS and the circular arc portion 12bC are joined at each end to constitute a J-shaped guide wall 12b. The guide walls 12a and 12b are arranged such that the straight portion 12aS and the straight portion 12bS are parallel to each other, and the concave wall surface of the arc portion 12aC is opposed to the concave wall surface of the arc portion 12bC.

搬送壁14a,14b,16aおよび16bは直線状に形成される。搬送壁14aおよび14bは平行に配置され、搬送壁14aの端および搬送壁14bの端は、直線部12aSの円弧部12aCに接合されない側の端、および円弧部12bCの直線部12bSに接合されない側の端にそれぞれ接合される。搬送壁16aおよび16bは平行に配置され、搬送壁16aの端および搬送壁16bの端は、円弧部12aCの直線部12aSに接合されない側の端、および直線部12bSの円弧部12bCに接合されない側の端にそれぞれ接合される。   The transport walls 14a, 14b, 16a and 16b are formed in a straight line. The transfer walls 14a and 14b are arranged in parallel, and the end of the transfer wall 14a and the end of the transfer wall 14b are on the side not joined to the arc part 12aC of the linear part 12aS and the side not joined to the straight part 12bS of the arc part 12bC. Are joined to the ends of each. The transport walls 16a and 16b are arranged in parallel, and the end of the transport wall 16a and the end of the transport wall 16b are the end of the arc portion 12aC that is not joined to the straight portion 12aS and the side that is not joined to the arc portion 12bC of the straight portion 12bS. Are joined to the ends of each.

中間壁18は直線状に形成される。中間壁18は、直線部12aSおよび12bSに平行に配置される。中間壁18の長さは、円弧部12aCが描く円弧の中心と円弧部12bCが描く円弧の中心とを結ぶ線分とほぼ同一の長さとする。   The intermediate wall 18 is formed in a straight line shape. The intermediate wall 18 is disposed in parallel to the straight portions 12aS and 12bS. The length of the intermediate wall 18 is substantially the same as the line segment connecting the center of the arc drawn by the arc portion 12aC and the center of the arc drawn by the arc portion 12bC.

液体を撹拌するための撹拌領域Strは、案内壁12aおよび12bに囲まれる領域として定義される。ただし、案内壁12aおよび12bのいずれにも塞がれていない開口では、直線LAおよび直線LCを撹拌領域Strの境界とする。ここで、直線LAは、直線部12aSの中間壁18を臨む壁面に接する直線であり、直線LCは、搬送壁16aの案内壁12aに接合される側の端と搬送壁16bの案内壁12bに接合される側の端とを結ぶ直線である。   The stirring region Str for stirring the liquid is defined as a region surrounded by the guide walls 12a and 12b. However, the straight line LA and the straight line LC are used as the boundary of the stirring region Str in the opening that is not blocked by any of the guide walls 12a and 12b. Here, the straight line LA is a straight line in contact with the wall surface facing the intermediate wall 18 of the straight portion 12aS, and the straight line LC is connected to the end of the transfer wall 16a on the side joined to the guide wall 12a and the guide wall 12b of the transfer wall 16b. It is a straight line connecting the ends on the side to be joined.

電極対20−1〜20−4のそれぞれは、1本の線状の基幹導体rに複数の線状導体eをすだれ状に接続したすだれ状電極E1およびE2を備える。すだれ状電極E1およびE2は、すだれ状電極E1に属する線状導体eと、すだれ状電極E2に属する線状導体eとが交互に配列されるよう配置される。互いに隣接する2つの線状導体eの間の距離は、励振する弾性表面波の波長のおよそ半分の距離とすることが好適である。   Each of the electrode pairs 20-1 to 20-4 includes interdigital electrodes E1 and E2 in which a plurality of linear conductors e are connected to one linear main conductor r in an interdigital manner. The interdigital electrodes E1 and E2 are arranged such that the linear conductor e belonging to the interdigital electrode E1 and the linear conductor e belonging to the interdigital electrode E2 are alternately arranged. The distance between the two linear conductors e adjacent to each other is preferably about half the wavelength of the surface acoustic wave to be excited.

電極対20−1〜20−4の形状としては、図1に示したものの他、様々なものを適用することができる。例えば、基幹導体rと線状導体eとの間のなす角を90°とは異なる角度とした電極、一方の端から他方の端に至るまでの間で幅が変化する線状導体eを備える電極、互いに隣接する線状導体eの間隔が均一とならないよう線状導体eを配置した電極等を適用することが可能である。すなわち、電極は、励振する弾性表面波の周波数範囲、伝播させる方向等に基づいて任意の形状とすることができる。   As the shapes of the electrode pairs 20-1 to 20-4, various shapes can be applied in addition to those shown in FIG. For example, an electrode having an angle between the main conductor r and the linear conductor e different from 90 ° and a linear conductor e whose width changes from one end to the other end are provided. It is possible to apply an electrode or the like in which the linear conductors e are arranged so that the interval between the linear conductors e adjacent to each other is not uniform. That is, the electrode can have an arbitrary shape based on the frequency range of the surface acoustic wave to be excited, the direction of propagation, and the like.

電極対20−1は、搬送壁14aの撹拌領域Str側の端とは反対側の端および搬送壁14bの案内壁12bに接合される側とは反対側の端の近傍に設けられる。弾性表面波を所定の位置に伝播させるため、電極対20−1は、直線L1aと直線L1bとの間に挟まれる位置に設けることが好適である。ここで、直線L1aは、搬送壁14aの搬送壁14bを臨む壁面に接する直線であり、直線L1bは、搬送壁14bの搬送壁14aを臨む壁面に接する直線である。電極対20−1は、励振される弾性表面波が伝播する方向が、搬送壁14aの延伸方向および搬送壁14bの延伸方向とほぼ一致するよう配置される。ここでは、線状導体eの延伸方向が、搬送壁14aの延伸方向および搬送壁14bの延伸方向とほぼ垂直となるよう電極対20−1を配置するものとする。   The electrode pair 20-1 is provided in the vicinity of the end of the transport wall 14a opposite to the end on the stirring region Str side and the end of the transport wall 14b opposite to the side joined to the guide wall 12b. In order to propagate the surface acoustic wave to a predetermined position, the electrode pair 20-1 is preferably provided at a position sandwiched between the straight line L1a and the straight line L1b. Here, the straight line L1a is a straight line in contact with the wall surface facing the transport wall 14b of the transport wall 14a, and the straight line L1b is a straight line in contact with the wall surface of the transport wall 14b facing the transport wall 14a. The electrode pair 20-1 is arranged such that the direction in which the excited surface acoustic wave propagates substantially coincides with the extending direction of the transfer wall 14a and the extending direction of the transfer wall 14b. Here, the electrode pair 20-1 is arranged so that the extending direction of the linear conductor e is substantially perpendicular to the extending direction of the transport wall 14a and the extending direction of the transport wall 14b.

電極対20−2は、搬送壁14bの撹拌領域Str側とは反対側の壁面の近傍に設けられる。弾性表面波を所定の位置に伝播させるため、電極対20−2は、中間壁18の延伸方向の中心線として定義される直線LMと直線LAとの間に設けることが好適である。電極対20−2は、励振される弾性表面波が伝播する方向が、直線LAおよびLMとほぼ平行になるよう配置される。ここでは、線状導体eの延伸方向が、直線LAおよびLMとほぼ垂直となるよう電極対20−2を配置するものとする。   The electrode pair 20-2 is provided in the vicinity of the wall surface on the side opposite to the stirring region Str side of the transport wall 14b. In order to propagate the surface acoustic wave to a predetermined position, the electrode pair 20-2 is preferably provided between the straight line LM and the straight line LA defined as the center line in the extending direction of the intermediate wall 18. The electrode pair 20-2 is arranged such that the direction in which the excited surface acoustic wave propagates is substantially parallel to the straight lines LA and LM. Here, it is assumed that the electrode pair 20-2 is arranged so that the extending direction of the linear conductor e is substantially perpendicular to the straight lines LA and LM.

電極対20−3は、円弧部12bCの撹拌領域Str側とは反対側の壁面の近傍に設けられる。弾性表面波を所定の位置に伝播させるため、電極対20−3は、直線LMと直線L2bとの間に設けることが好適である。ここで、直線L2bは、搬送壁16bの搬送壁16aを臨む壁面に接する直線である。電極対20−3は、励振される弾性表面波が伝播する方向が、直線L2bおよびLMとほぼ平行になるよう配置される。ここでは、線状導体eの延伸方向が、直線L2bおよびLMとほぼ垂直となるよう電極対20−3を配置するものとする。   The electrode pair 20-3 is provided in the vicinity of the wall surface on the side opposite to the stirring region Str side of the arc portion 12bC. In order to propagate the surface acoustic wave to a predetermined position, the electrode pair 20-3 is preferably provided between the straight line LM and the straight line L2b. Here, the straight line L2b is a straight line in contact with the wall surface of the transfer wall 16b facing the transfer wall 16a. The electrode pair 20-3 is arranged such that the direction in which the excited surface acoustic wave propagates is substantially parallel to the straight lines L2b and LM. Here, it is assumed that the electrode pair 20-3 is arranged so that the extending direction of the linear conductor e is substantially perpendicular to the straight lines L2b and LM.

電極対20−4は、搬送壁16aの撹拌領域Str側の端とは反対側の端および搬送壁16bの案内壁12aに接合される側とは反対側の端の近傍に設けられる。弾性表面波を所定の位置に伝播させるため、電極対20−4は、直線L2aと直線L2bとの間に挟まれる位置に設けられることが好適である。ここで、直線L2aは、直線部12bSの撹拌領域Str側の壁面に接する直線である。電極対20−4は、励振される弾性表面波が伝播する方向が、直線L2aおよびL2bとほぼ平行になるよう配置される。ここでは、線状導体eの延伸方向が、直線L2aおよびL2bとほぼ垂直となるよう電極対20−4を配置するものとする。   The electrode pair 20-4 is provided in the vicinity of the end of the transport wall 16a opposite to the end on the stirring region Str side and the end of the transport wall 16b opposite to the side joined to the guide wall 12a. In order to propagate the surface acoustic wave to a predetermined position, the electrode pair 20-4 is preferably provided at a position sandwiched between the straight line L2a and the straight line L2b. Here, the straight line L2a is a straight line in contact with the wall surface of the straight portion 12bS on the stirring region Str side. The electrode pair 20-4 is arranged such that the direction in which the excited surface acoustic wave propagates is substantially parallel to the straight lines L2a and L2b. Here, the electrode pair 20-4 is arranged so that the extending direction of the linear conductor e is substantially perpendicular to the straight lines L2a and L2b.

電極対20−1〜20−4が備えるすだれ状電極E1およびE2との間に、それぞれ所定の周波数の交流電圧を印加すると、圧電効果によって弾性表面波SAW1〜SAW4がそれぞれ励振される。電極対20−1から撹拌領域Strに向かって励振される弾性表面波SAW1は、搬送壁14aと搬送壁14bとの間に挟まれる領域および撹拌領域Strを伝播し、円弧部12bCが設けられている位置を通過して伝播する。   When an AC voltage having a predetermined frequency is applied between the interdigital electrodes E1 and E2 included in the electrode pairs 20-1 to 20-4, the surface acoustic waves SAW1 to SAW4 are excited by the piezoelectric effect. The surface acoustic wave SAW1 excited from the electrode pair 20-1 toward the stirring region Str propagates through the region sandwiched between the transport wall 14a and the transport wall 14b and the stirring region Str, and is provided with an arc portion 12bC. Propagates through a certain position.

電極対20−2から搬送壁14bに向かって励振される弾性表面波SAW2は、搬送壁14bが設けられている位置を通過して撹拌領域Str内を伝播し、円弧部12aCが設けられている位置を通過して伝播する。   The surface acoustic wave SAW2 excited from the electrode pair 20-2 toward the transport wall 14b passes through the position where the transport wall 14b is provided and propagates in the stirring region Str, and is provided with the arc portion 12aC. Propagate through position.

電極対20−3から円弧部12bCに向かって励振される弾性表面波SAW3は、円弧部12bCが設けられている位置を通過して撹拌領域Str内を伝播し、搬送壁16aと搬送壁16bとの間に挟まれる領域を通過して伝播する。   The surface acoustic wave SAW3 excited from the electrode pair 20-3 toward the arc portion 12bC passes through the position where the arc portion 12bC is provided and propagates in the agitation region Str, and the transfer wall 16a and the transfer wall 16b. Propagates through the area between the two.

電極対20−4から撹拌領域Strに向かって励振される弾性表面波SAW4は、搬送壁16aと搬送壁16bとの間に挟まれる領域および撹拌領域Strを伝播し、円弧部12bCが設けられている位置を通過して伝播する。   The surface acoustic wave SAW4 excited from the electrode pair 20-4 toward the stirring region Str propagates through the region sandwiched between the transport wall 16a and the transport wall 16b and the stirring region Str, and is provided with an arc portion 12bC. Propagates through a certain position.

なお、電極対を配置する方向と励振される弾性表面波が伝播する方向との間の関係は、電極の形状、基板の物性等によって異なる。したがって、電極対20−1〜20−4が配置される方向は、それぞれ弾性表面波SAW1〜SAW4が上述した所定の方向に伝播するよう決定される。本実施形態は、そのように決定された電極対20−1〜20−4の配置方向の1つの例を示している。   The relationship between the direction in which the electrode pair is arranged and the direction in which the excited surface acoustic wave propagates varies depending on the shape of the electrode, the physical properties of the substrate, and the like. Therefore, the directions in which the electrode pairs 20-1 to 20-4 are arranged are determined so that the surface acoustic waves SAW1 to SAW4 propagate in the predetermined directions described above. The present embodiment shows one example of the arrangement direction of the electrode pairs 20-1 to 20-4 determined as described above.

次に、搬送撹拌装置100が液体を撹拌領域Strに搬入し、搬入された液体を撹拌し、搬出する処理について説明する。液体を撹拌領域Strに搬入し撹拌する場合には、電極対20−1,20−2,および20−4に交流電圧を印加し、電極対20−3には交流電圧を印加しない状態とする。これによって、基板10には弾性表面波SAW1、SAW2、およびSAW4が励振される。   Next, a process in which the transport agitator 100 carries the liquid into the stirring region Str, stirs the carried liquid, and carries it out will be described. When the liquid is carried into the stirring region Str and stirred, an AC voltage is applied to the electrode pairs 20-1, 20-2, and 20-4, and no AC voltage is applied to the electrode pair 20-3. . As a result, surface acoustic waves SAW1, SAW2, and SAW4 are excited on the substrate 10.

液体は、滴下装置(図示せず)によって搬送壁14aと搬送壁14bとの間に挟まれる領域に滴下される。滴下された液体は、弾性表面波SAW1の放射圧によって、弾性表面波SAW1が伝播する方向に進む力を受け移動する。そして、搬送壁14aおよび14bによって導かれつつ撹拌領域Str内の直線LAと直線LMとの間に挟まれる領域に搬送される。   The liquid is dropped into a region sandwiched between the transfer wall 14a and the transfer wall 14b by a dropping device (not shown). The dropped liquid moves by receiving a force traveling in the direction in which the surface acoustic wave SAW1 propagates due to the radiation pressure of the surface acoustic wave SAW1. And it is conveyed by the area | region pinched | interposed between the straight line LA in the stirring area Str and the straight line LM, being guide | induced by the conveyance walls 14a and 14b.

搬送された液体は、弾性表面波SAW2の放射圧によって、弾性表面波SAW2が伝播する方向に進む力を受け移動する。そして、直線部12aSおよび中間壁18に導かれつつ、円弧部12aCの撹拌領域Str側の壁面に到達する。円弧部12aCの壁面に接した液体は、弾性表面波SAW2から受ける力、および円弧部12aCの壁面から受ける力によって、当該壁面に沿って図1の時計回りの方向に進む力を受け移動する。そして、当該壁面に沿って案内壁12bと直線LMとの間に挟まれる領域へと搬送される。   The transported liquid is moved by receiving a force traveling in the direction in which the surface acoustic wave SAW2 propagates due to the radiation pressure of the surface acoustic wave SAW2. And it reaches | attains the wall surface by the side of the stirring area Str of circular arc part 12aC, being guide | induced to the linear part 12aS and the intermediate wall 18. As shown in FIG. The liquid in contact with the wall surface of the arc portion 12aC receives and moves along the wall surface in the clockwise direction by the force received from the surface acoustic wave SAW2 and the force received from the wall surface of the arc portion 12aC. And it is conveyed along the said wall surface to the area | region pinched | interposed between the guide wall 12b and the straight line LM.

搬送された液体は、弾性表面波SAW4の放射圧によって、弾性表面波SAW4が伝播する方向に進む力を受け移動する。液体は、直線部12bSおよび中間壁18に導かれつつ、円弧部12bCの撹拌領域Str側の壁面に到達する。円弧部12bCの壁面に接した液体は、弾性表面波SAW4から受ける力、および円弧部12bCの壁面から受ける力によって、当該壁面に沿って図1の時計回りに進む力を受け移動する。そして、当該壁面に沿って撹拌領域Str内の直線LAと直線LMとの間に挟まれる領域に搬送される。   The transported liquid is moved by receiving a force traveling in the direction in which the surface acoustic wave SAW4 propagates due to the radiation pressure of the surface acoustic wave SAW4. The liquid reaches the wall surface on the stirring region Str side of the arc portion 12bC while being guided to the straight portion 12bS and the intermediate wall 18. The liquid in contact with the wall surface of the arc portion 12bC receives and moves the clockwise force of FIG. 1 along the wall surface by the force received from the surface acoustic wave SAW4 and the force received from the wall surface of the arc portion 12bC. And it is conveyed along the said wall surface to the area | region pinched | interposed between the straight line LA in the stirring area Str and the straight line LM.

搬送された液体は、再び、弾性表面波SAW2の放射圧によって案内壁12aおよび中間壁18に導かれつつ案内壁12bと直線LMとの間に挟まれる領域へと搬送され、弾性表面波SAW4の放射圧によって案内壁12bおよび中間壁18に導かれつつ直線LAと直線LMとの間に挟まれる領域に搬送される。   The transported liquid is again guided to the guide wall 12a and the intermediate wall 18 by the radiation pressure of the surface acoustic wave SAW2, and is transported to a region sandwiched between the guide wall 12b and the straight line LM. While being guided to the guide wall 12b and the intermediate wall 18 by the radiation pressure, it is conveyed to a region sandwiched between the straight line LA and the straight line LM.

撹拌領域Str内に存在する液体に対しては、直線LAから撹拌領域Strに向かう方向に弾性表面波SAW1の放射圧が与えられるため、搬送壁14aと搬送壁14bとの間に挟まれた領域から電極対20−1に向かう方向への液体の流出を回避することができる。さらに、直線LCから撹拌領域Strに向かう方向に弾性表面波SAW4の放射圧が与えられるため、搬送壁16aと搬送壁16bとの間に挟まれた領域から電極対20−4に向かう方向への液体の流出を回避することができる。   Since the radiation pressure of the surface acoustic wave SAW1 is applied to the liquid existing in the stirring region Str in the direction from the straight line LA toward the stirring region Str, the region sandwiched between the transport wall 14a and the transport wall 14b. Can be avoided from flowing out in the direction from the electrode 20-1 toward the electrode pair 20-1. Furthermore, since the radiation pressure of the surface acoustic wave SAW4 is applied in the direction from the straight line LC to the stirring region Str, the region from the region sandwiched between the transport wall 16a and the transport wall 16b is directed to the electrode pair 20-4. Liquid outflow can be avoided.

このようにして、撹拌領域Strに搬入された液体は環状に流動する。流動する液体は基板10の表面に近い位置と遠い位置とで流動する速さが異なること、および流動する液体には弾性表面波によって機械的振動が加えられることによって液体は撹拌される。   In this way, the liquid carried into the stirring region Str flows in an annular shape. The flowing liquid is agitated by the speed at which the flowing liquid is different between a position close to the surface of the substrate 10 and a position far from the surface, and mechanical vibration is applied to the flowing liquid by a surface acoustic wave.

搬送撹拌装置100では、液体の撹拌領域Strへの搬入が完了し、搬送壁14aと搬送壁14bとの間に挟まれた領域に液体が存在しない状態となった後においても、電極対20−1、20−2および20−4には交流電圧を印加し続ける。これによって、撹拌領域Strの外側への液体の流出を回避し、液体の撹拌を引き続き行うことができる。   In the transport agitating apparatus 100, even after the liquid has been brought into the stirring region Str and no liquid is present in the region sandwiched between the transport wall 14a and the transport wall 14b, the electrode pair 20- An AC voltage is continuously applied to 1, 20-2 and 20-4. As a result, the outflow of the liquid to the outside of the stirring region Str can be avoided, and the liquid can be continuously stirred.

撹拌した液体を撹拌領域Strから搬出する場合には、電極対20−1、20−2および20−3に交流電圧を印加し、電極対20−4には交流電圧を印加しない状態とする。これによって、基板10には弾性表面波SAW1、SAW2およびSAW3が励振される。   When the stirred liquid is carried out of the stirring region Str, an AC voltage is applied to the electrode pairs 20-1, 20-2 and 20-3, and no AC voltage is applied to the electrode pair 20-4. As a result, surface acoustic waves SAW1, SAW2 and SAW3 are excited on the substrate 10.

撹拌領域Str内の直線LAと直線LMとの間に挟まれる領域に存在する液体は、弾性表面波SAW2の放射圧によって、弾性表面波SAW2が伝播する方向に進む力を受け移動する。そして、直線部12aSおよび中間壁18に導かれつつ、円弧部12aCの撹拌領域Str側の壁面に到達する。円弧部12aCの壁面に接した液体は、弾性表面波SAW2から受ける力、および円弧部12aCの壁面から受ける力によって、当該壁面に沿って図1の時計回りの方向に進む力を受け移動する。そして、当該壁面に沿って案内壁12bと直線LMとの間に挟まれる領域へと搬送される。   The liquid existing in the region sandwiched between the straight line LA and the straight line LM in the stirring region Str is moved by receiving a force that advances in the direction in which the surface acoustic wave SAW2 propagates due to the radiation pressure of the surface acoustic wave SAW2. And it reaches | attains the wall surface by the side of the stirring area Str of circular arc part 12aC, being guide | induced to the linear part 12aS and the intermediate wall 18. As shown in FIG. The liquid in contact with the wall surface of the arc portion 12aC receives and moves along the wall surface in the clockwise direction by the force received from the surface acoustic wave SAW2 and the force received from the wall surface of the arc portion 12aC. And it is conveyed along the said wall surface to the area | region pinched | interposed between the guide wall 12b and the straight line LM.

案内壁12bと直線LMとの間に挟まれる領域に存在する液体は、弾性表面波SAW3の放射圧によって、弾性表面波SAW3が伝播する方向に進む力を受け移動する。そして、直線部12aSおよび中間壁18に導かれつつ、搬送壁16aと搬送壁16bとの間に挟まれる領域に搬送される。   The liquid existing in the region sandwiched between the guide wall 12b and the straight line LM is moved by receiving a force traveling in the direction in which the surface acoustic wave SAW3 propagates due to the radiation pressure of the surface acoustic wave SAW3. And it is conveyed by the area | region pinched | interposed between the conveyance wall 16a and the conveyance wall 16b, being guide | induced to the linear part 12aS and the intermediate wall 18. FIG.

また、搬送壁14aと搬送壁14bとの間に挟まれた領域から電極対20−1に向かう方向への液体の流出は、弾性表面波SAW1によって阻止される。   Further, the outflow of the liquid in the direction from the region sandwiched between the transport wall 14a and the transport wall 14b toward the electrode pair 20-1 is blocked by the surface acoustic wave SAW1.

このようにして、撹拌領域Str内の液体を撹拌領域Strの外側へ搬出することができる。   In this way, the liquid in the stirring region Str can be carried out to the outside of the stirring region Str.

図2に本発明の第2の実施形態に係る搬送撹拌装置102を示す。搬送撹拌装置102は、基板10、案内壁12aおよび12b、搬送壁16aおよび16b、中間壁18、電極対20−2〜20−4、直線部22、ならびに円弧部24を備えて構成される。図1の搬送撹拌装置100と同一の構成部については同一の符号を付してその説明を省略する。   FIG. 2 shows a transport stirring apparatus 102 according to the second embodiment of the present invention. The transport agitator 102 includes a substrate 10, guide walls 12 a and 12 b, transport walls 16 a and 16 b, an intermediate wall 18, electrode pairs 20-2 to 20-4, a straight portion 22, and an arc portion 24. The same components as those of the transport agitator 100 in FIG.

基板10には、一軸方向にのみ弾性表面波を伝播させることが可能な圧電材料を適用してもよい。   A piezoelectric material that can propagate a surface acoustic wave only in a uniaxial direction may be applied to the substrate 10.

直線部22は搬送壁16aの幅と同一の長さを有する。直線部22の一方の端は円弧部12bCの直線部12bSに接合されない側の端に接合される。円弧部24は、円弧部12aCおよび12bCと同一の形状を有する。円弧部24は、その凹んだ側の壁面が中間壁18が設けられている側を臨むよう、直線部12aSの円弧部12aCに接合されない側の端と直線部22の円弧部12bCに接合されない側の端との間に接合される。   The straight portion 22 has the same length as the width of the transport wall 16a. One end of the straight portion 22 is joined to the end of the arc portion 12bC that is not joined to the straight portion 12bS. The arc portion 24 has the same shape as the arc portions 12aC and 12bC. The arc portion 24 has an end on the side that is not joined to the arc portion 12aC of the straight portion 12aS and a side that is not joined to the arc portion 12bC of the straight portion 22 so that the concave wall surface faces the side on which the intermediate wall 18 is provided. It is joined between the ends of the.

液体を撹拌するための撹拌領域Strは、案内壁12aおよび12b、直線部22および円弧部24に囲まれる領域として定義される。ただし、これらの壁のいずれにも塞がれていない開口では直線LCを撹拌領域Strの境界とする。   The stirring region Str for stirring the liquid is defined as a region surrounded by the guide walls 12a and 12b, the straight portion 22 and the arc portion 24. However, the straight line LC is set as the boundary of the stirring region Str in the opening not covered by any of these walls.

搬送撹拌装置102が液体を撹拌領域Strに搬入し、搬入された液体を撹拌し、搬出する処理について説明する。液体を撹拌領域Strに搬入し撹拌する場合には、電極対20−2および20−4に交流電圧を印加し、電極対20−3には交流電圧を印加しない状態とする。これによって、基板10には弾性表面波SAW2およびSAW4が励振される。   A process in which the transport agitator 102 carries the liquid into the stirring region Str, stirs the carried liquid, and carries it out will be described. When the liquid is carried into the stirring region Str and stirred, an AC voltage is applied to the electrode pairs 20-2 and 20-4, and no AC voltage is applied to the electrode pair 20-3. As a result, surface acoustic waves SAW2 and SAW4 are excited on the substrate 10.

搬送壁16aと搬送壁16bとの間に挟まれた領域には、滴下装置によって液体が滴下される。滴下された液体は、弾性表面波SAW4の放射圧によって、弾性表面波SAW4が伝播する方向に進む力を受け移動する。液体は、直線部12bSおよび中間壁18に導かれつつ、円弧部12bCの撹拌領域Str側の壁面に到達する。円弧部12bCの壁面に接した液体は、弾性表面波SAW4から受ける力、および円弧部12bCの壁面から受ける力によって、当該壁面に沿って図2の時計回りに進む力を受け移動する。そして、当該壁面および直線部22の撹拌領域Str側の壁面に沿って、円弧部24と直線LMとの間に挟まれる領域へと搬送される。   A liquid is dropped by a dropping device in a region sandwiched between the transfer wall 16a and the transfer wall 16b. The dropped liquid moves by receiving a force traveling in the direction in which the surface acoustic wave SAW4 propagates due to the radiation pressure of the surface acoustic wave SAW4. The liquid reaches the wall surface on the stirring region Str side of the arc portion 12bC while being guided to the straight portion 12bS and the intermediate wall 18. The liquid in contact with the wall surface of the circular arc part 12bC is moved by receiving the force traveling clockwise in FIG. 2 along the wall surface by the force received from the surface acoustic wave SAW4 and the force received from the wall surface of the circular arc part 12bC. And it is conveyed along the said wall surface and the wall surface by the side of the stirring area Str of the linear part 22 to the area | region pinched | interposed between the circular arc part 24 and the straight line LM.

搬送された液体は、弾性表面波SAW2の放射圧によって、弾性表面波SAW2が伝播する方向に進む力を受け移動する。液体は、直線部12aSおよび中間壁18に導かれつつ、円弧部12aCの撹拌領域Str側の壁面に到達する。円弧部12aCの壁面に接した液体は、弾性表面波SAW2から受ける力、および円弧部12aCの壁面から受ける力によって、当該壁面に沿って図2の時計回りの方向に進む力を受け移動する。そして、当該壁面に沿って案内壁12bと直線LMとの間に挟まれる領域へと搬送される。   The transported liquid is moved by receiving a force traveling in the direction in which the surface acoustic wave SAW2 propagates due to the radiation pressure of the surface acoustic wave SAW2. The liquid reaches the wall surface on the stirring region Str side of the arc portion 12aC while being guided to the straight portion 12aS and the intermediate wall 18. The liquid in contact with the wall surface of the circular arc part 12aC receives and moves a force traveling in the clockwise direction of FIG. 2 along the wall surface by the force received from the surface acoustic wave SAW2 and the force received from the wall surface of the circular arc part 12aC. And it is conveyed along the said wall surface to the area | region pinched | interposed between the guide wall 12b and the straight line LM.

搬送された液体は、再び、弾性表面波SAW4の放射圧によって案内壁12bおよび中間壁18に導かれつつ案内壁12aと直線LMとの間に挟まれる領域へと搬送され、弾性表面波SAW2の放射圧によって案内壁12aおよび中間壁18に導かれつつ案内壁12bと直線LMとの間に挟まれる領域へと搬送される。   The transported liquid is again guided to the guide wall 12b and the intermediate wall 18 by the radiation pressure of the surface acoustic wave SAW4 and transported to a region sandwiched between the guide wall 12a and the straight line LM, and the surface acoustic wave SAW2 While being guided to the guide wall 12a and the intermediate wall 18 by the radiation pressure, it is conveyed to a region sandwiched between the guide wall 12b and the straight line LM.

撹拌領域Str内の液体に対しては、直線LCから撹拌領域Strに向かう方向に弾性表面波SAW4の放射圧が与えられるため、搬送壁16aと搬送壁16bとの間に挟まれた領域から電極対20−4に向かう方向への液体の流出が回避される。このようにして、撹拌領域Strに搬入された液体は環状に流動し撹拌される。   Since the radiation pressure of the surface acoustic wave SAW4 is applied to the liquid in the stirring region Str in the direction from the straight line LC toward the stirring region Str, the electrode is moved from the region sandwiched between the transport wall 16a and the transport wall 16b. Liquid outflow in the direction toward the pair 20-4 is avoided. In this way, the liquid carried into the stirring region Str flows in an annular shape and is stirred.

搬送撹拌装置102では、液体の撹拌領域Strへの搬入が完了し、搬送壁16aと搬送壁16bとの間に挟まれた領域に液体が存在しない状態となった後においても、電極対20−2および20−4に交流電圧を印加し続ける。これによって、撹拌領域Strの外側への液体の流出を回避し、液体の撹拌を引き続き行うことができる。   In the transport agitating apparatus 102, even after the liquid has been brought into the stirring region Str and no liquid is present in the region sandwiched between the transport wall 16a and the transport wall 16b, the electrode pair 20- Continue applying AC voltage to 2 and 20-4. As a result, the outflow of the liquid to the outside of the stirring region Str can be avoided, and the liquid can be continuously stirred.

なお、撹拌すべき液体の量が十分多い場合には、電極対20−4のみに交流電圧を印加し、電極対20−2および20−3には交流電圧を印加しない状態としても液体の撹拌を行うことができる。この場合、弾性表面波SAW4によって案内壁12aと直線LMとの間および円弧部24と直線LMとの間に挟まれる領域に搬送された液体は、円弧部24、案内壁12aおよび中間壁18に沿って搬送される力を後続の液体から受ける。これによって、撹拌領域Strに搬入された液体は環状に流動し撹拌される。   Note that when the amount of liquid to be stirred is sufficiently large, an AC voltage is applied only to the electrode pair 20-4, and the liquid is stirred even if no AC voltage is applied to the electrode pairs 20-2 and 20-3. It can be performed. In this case, the liquid conveyed to the region sandwiched between the guide wall 12a and the straight line LM and between the arc portion 24 and the straight line LM by the surface acoustic wave SAW4 is transferred to the arc portion 24, the guide wall 12a, and the intermediate wall 18. The force carried along is received from the following liquid. As a result, the liquid carried into the stirring region Str flows in an annular shape and is stirred.

撹拌した液体を撹拌領域Strから搬出する場合には、電極対20−2および20−3に交流電圧を印加し、電極対20−4には交流電圧を印加しない状態とする。これによって、基板10には弾性表面波SAW2およびSAW3が励振される。   When the stirred liquid is carried out of the stirring region Str, an AC voltage is applied to the electrode pairs 20-2 and 20-3, and no AC voltage is applied to the electrode pair 20-4. As a result, surface acoustic waves SAW2 and SAW3 are excited on the substrate 10.

直線部22、円弧部24、直線部12aSおよび直線LMに囲まれる領域に存在する液体は、弾性表面波SAW2の放射圧によって、弾性表面波SAW2が伝播する方向に進む力を受け移動する。そして、直線部12aSおよび中間壁18に導かれつつ、円弧部12aCの撹拌領域Str側の壁面に到達する。円弧部12aCの壁面に接した液体は、弾性表面波SAW2から受ける力、および円弧部12aCの壁面から受ける力によって、当該壁面に沿って図2の時計回りの方向に進む力を受け移動する。そして、当該壁面に沿って案内壁12bと直線LMとの間に挟まれる領域へと搬送される。   The liquid existing in the region surrounded by the straight portion 22, the arc portion 24, the straight portion 12aS, and the straight line LM is moved by receiving a force that advances in the direction in which the surface acoustic wave SAW2 propagates due to the radiation pressure of the surface acoustic wave SAW2. And it reaches | attains the wall surface by the side of the stirring area Str of circular arc part 12aC, being guide | induced to the linear part 12aS and the intermediate wall 18. As shown in FIG. The liquid in contact with the wall surface of the circular arc part 12aC receives and moves a force traveling in the clockwise direction of FIG. 2 along the wall surface by the force received from the surface acoustic wave SAW2 and the force received from the wall surface of the circular arc part 12aC. And it is conveyed along the said wall surface to the area | region pinched | interposed between the guide wall 12b and the straight line LM.

案内壁12bと直線LMとの間に挟まれる領域に存在する液体は、弾性表面波SAW3の放射圧によって、弾性表面波SAW3が伝播する方向に進む力を受け移動する。そして、直線部12aSおよび中間壁18に導かれつつ、搬送壁16aと搬送壁16bとの間に挟まれる領域に搬送される。   The liquid existing in the region sandwiched between the guide wall 12b and the straight line LM is moved by receiving a force traveling in the direction in which the surface acoustic wave SAW3 propagates due to the radiation pressure of the surface acoustic wave SAW3. And it is conveyed by the area | region pinched | interposed between the conveyance wall 16a and the conveyance wall 16b, being guide | induced to the linear part 12aS and the intermediate wall 18. FIG.

搬送撹拌装置102は、液体の搬入および搬出において搬送壁16aおよび16bを兼用するため、搬送撹拌装置100に比して構成が簡単となる。また、基板10には、一軸方向にのみ弾性表面波が伝播させることが可能な圧電材料であればよいため、基板10の材料の選択の幅が広がるという利点がある。   Since the transport agitating device 102 also serves as the transport walls 16a and 16b in carrying in and out the liquid, the configuration is simpler than that of the transport agitating device 100. Further, since the substrate 10 may be a piezoelectric material that can propagate a surface acoustic wave only in a uniaxial direction, there is an advantage that the range of selection of the material of the substrate 10 is widened.

次に、搬送撹拌装置100の変形例について説明する。図3に搬送撹拌装置100Aを示す。搬送撹拌装置100Aは、基板10、案内壁12aおよび12b、搬送壁14a,14b,16aおよび16b、突起部26、ならびに電極対20−1〜20−4を備えて構成される。搬送撹拌装置100Aは、搬送撹拌装置100が備える中間壁18を突起部26に置き換えたものである。図1の搬送撹拌装置100と同一の構成部については同一の符号を付してその説明を省略する。   Next, a modified example of the conveyance agitator 100 will be described. FIG. 3 shows a transport stirring apparatus 100A. The transport agitating device 100A includes a substrate 10, guide walls 12a and 12b, transport walls 14a, 14b, 16a and 16b, a protrusion 26, and electrode pairs 20-1 to 20-4. The transport agitator 100A is obtained by replacing the intermediate wall 18 provided in the transport agitator 100 with a protruding portion 26. The same components as those of the transport agitator 100 in FIG.

突起部26は、円柱、円錐等の形状に形成され、長手方向が基板10の表面と垂直となるよう配置される。ここでは突起部26を円柱形状に形成するものとする。突起部26は、エポキシ樹脂等、粘性の液体の状態で成形加工することができる樹脂で形成することが好適である。突起部26は、直線LAと直線L2bとの間の中央の位置に引かれた、直線LAおよびL2bと平行な直線LM1と、直線L1aと直線LCとの間の中央の位置に引かれた、直線L1aおよびLCと平行な直線LM2とが交わる位置に設けられる。   The protruding portion 26 is formed in a shape such as a cylinder or a cone, and is disposed so that the longitudinal direction is perpendicular to the surface of the substrate 10. Here, the protrusion 26 is formed in a cylindrical shape. The protrusion 26 is preferably formed of a resin that can be molded in a viscous liquid state, such as an epoxy resin. The protrusion 26 is drawn at a central position between the straight line LA and the straight line L2b, and is drawn at a central position between the straight line L1a and the straight line LC, and a straight line LM1 parallel to the straight lines LA and L2b. It is provided at a position where the straight lines L1a and LC intersect with the parallel straight line LM2.

このような構成によれば、撹拌領域Str内の液体には突起部26に引きつけられる力が働く。これによって、SAW2およびSAW4が励振されることで、液体は突起部26を中心に滴を形成し突起部26を中心に環状に流動する。したがって、液体が案内壁12aおよび12bに接していなくとも液体を環状に流動させることができるため、撹拌領域Strに搬送された液体が少量であっても、その液体を撹拌することができる。   According to such a configuration, a force attracted to the protrusion 26 acts on the liquid in the stirring region Str. As a result, the SAW 2 and the SAW 4 are excited, so that the liquid forms a droplet around the protrusion 26 and flows in an annular shape around the protrusion 26. Therefore, even if the liquid is not in contact with the guide walls 12a and 12b, the liquid can be made to flow in an annular shape, so that the liquid can be stirred even if the amount of liquid transported to the stirring region Str is small.

なお、ここでは、搬送撹拌装置100の中間壁18を突起部26に置き換えた変形例について説明したが、搬送撹拌装置102についても同様の変形が可能である。   In addition, although the modified example which replaced the intermediate wall 18 of the conveyance stirring apparatus 100 with the projection part 26 was demonstrated here, the same deformation | transformation is possible also about the conveyance stirring apparatus 102. FIG.

次に、搬送撹拌装置100の第2の変形例について説明する。搬送撹拌装置100では、液体を搬出するときに液体が電極対20−4の上を通過する。そのため、液体を搬出した直後においては、残存した液体によってすだれ状電極E1とすだれ状電極E2との間が電気的に接続され、弾性表面波SAW4を励振することが不可能となるおそれがある。図4に示す搬送撹拌装置100Bは、搬送撹拌装置100を変形し、そのような問題を解消したものである。   Next, the 2nd modification of the conveyance stirring apparatus 100 is demonstrated. In the transport agitator 100, the liquid passes over the electrode pair 20-4 when the liquid is unloaded. For this reason, immediately after the liquid is carried out, the interdigital electrode E1 and the interdigital electrode E2 are electrically connected by the remaining liquid, and there is a possibility that the surface acoustic wave SAW4 cannot be excited. The conveyance agitating apparatus 100B shown in FIG. 4 is a modification of the conveyance agitating apparatus 100 to solve such a problem.

搬送撹拌装置100Bは、基板10、案内壁12aおよび12b、搬送壁14aおよび14b,中間壁18、電極対20−1〜20−4、ならびに円弧壁28を備えて構成される。搬送撹拌装置100Bは、搬送撹拌装置100の搬送壁16aおよび16bを取り除き、搬送壁16aの代わりに円弧壁28を設けたものである。図1の搬送撹拌装置100と同一の構成部については同一の符号を付してその説明を省略する。   The transport agitator 100B includes a substrate 10, guide walls 12a and 12b, transport walls 14a and 14b, an intermediate wall 18, electrode pairs 20-1 to 20-4, and an arc wall 28. The transport agitating device 100B is obtained by removing the transport walls 16a and 16b of the transport agitating device 100 and providing an arc wall 28 instead of the transport wall 16a. The same components as those of the transport agitator 100 in FIG.

円弧壁28は、円弧部12aCおよび12bCと同一の形状に形成することが好適である。円弧壁28は、その凸形状の壁面が電極対20−4の側を臨むよう配置される。円弧壁28の一方の端は、円弧部12aCの直線部12aSに接合されない側の端に接合される。   The arc wall 28 is preferably formed in the same shape as the arc portions 12aC and 12bC. The arc wall 28 is arranged such that its convex wall faces the electrode pair 20-4 side. One end of the arc wall 28 is joined to the end of the arc portion 12aC that is not joined to the straight portion 12aS.

電極対20−4によって励振された弾性表面波SAW4は、円弧壁28が設けられている位置を通過して撹拌領域Str内を伝播し、円弧部12bCが設けられている位置を通過して伝播する。   The surface acoustic wave SAW4 excited by the electrode pair 20-4 propagates through the stirring region Str through the position where the arc wall 28 is provided, and propagates through the position where the arc portion 12bC is provided. To do.

搬送撹拌装置100Bは、搬送撹拌装置100が実行する処理と同様の処理によって、液体を撹拌領域Strに搬入し、搬入された液体を撹拌し搬出する。撹拌領域Strから搬出された液体は、円弧壁28の凹んだ側の壁面に到達する。円弧壁28の壁面に接した液体は、弾性表面波SAW3から受ける力、および円弧壁28の壁面から受ける力によって、当該壁面に沿って図4の時計回りの方向に進む力を受け移動する。そして、当該壁面に沿って搬送され、円弧壁28と案内壁12bとの間から直線L2bを横切って搬出される。   The transport agitator 100B carries in the liquid to the agitation region Str by the same process as the process performed by the transport agitator 100, and stirs and carries out the carried liquid. The liquid carried out from the stirring region Str reaches the concave wall surface of the arc wall 28. The liquid in contact with the wall surface of the arc wall 28 receives and moves along the wall surface in the clockwise direction of FIG. 4 due to the force received from the surface acoustic wave SAW3 and the force received from the wall surface of the arc wall 28. And it is conveyed along the said wall surface and is carried out across the straight line L2b from between the circular arc wall 28 and the guide wall 12b.

このような構成によれば、電極対20−4の上を液体が通過することを回避することができる。これによって、液体を搬出した直後においても確実に弾性表面波SAW4を励振することができるため、液体の搬入および撹拌を引き続き行うことができる。なお、円弧壁28は、搬送撹拌装置100Aについても同様に適用することができる。   According to such a configuration, the liquid can be prevented from passing over the electrode pair 20-4. Accordingly, the surface acoustic wave SAW4 can be reliably excited immediately after the liquid is carried out, so that the liquid can be carried in and stirred continuously. In addition, the circular arc wall 28 can be similarly applied to the transport stirring device 100A.

次に、搬送撹拌装置の応用例について説明する。図5は、物質検出システム104を示す。物質検出システム104は、搬送撹拌装置100、電極対20−5および20−6を備えて構成される。図1の搬送撹拌装置100と同一の構成部については同一の符号を付してその説明を省略する。搬送撹拌装置100の代わりに搬送撹拌装置100Aまたは102を適用してもよい。   Next, an application example of the transport stirring device will be described. FIG. 5 shows the substance detection system 104. The substance detection system 104 is configured to include the transport agitator 100 and electrode pairs 20-5 and 20-6. The same components as those of the transport agitator 100 in FIG. Instead of the transport stirring device 100, the transport stirring device 100A or 102 may be applied.

物質検出システム104は、相互の反応によって所定の物質を生成する複数の生体物質を含む液体(以下、反応生体溶液とする。)を撹拌し、撹拌によって生成が促進され基板10の表面に吸着した物質の量の測定、反応生体溶液の性質の解析等を行うシステムである。   The substance detection system 104 agitates a liquid (hereinafter referred to as a reaction biological solution) containing a plurality of biological substances that generate a predetermined substance by mutual reaction, and the generation is promoted by the agitation and adsorbed on the surface of the substrate 10. It is a system that measures the amount of a substance, analyzes the properties of a reaction biological solution, and the like.

電極対20−5および20−6は、電極対20−1〜20−4と同一の構成および機能を有する。電極対20−5は、直線LCと直線L1aとの間に挟まれる領域のうち、撹拌領域Strと共に案内壁12aを挟む領域に配置される。電極対20−6は、直線LCと直線L1aとの間に挟まれる領域のうち、撹拌領域Strと共に案内壁12bを挟む領域に配置される。電極対20−5および20−6は、電極対20−5が備える線状導体eの方向と、電極対20−6が備える線状導体eの方向とが一致するよう配置される。   The electrode pairs 20-5 and 20-6 have the same configuration and function as the electrode pairs 20-1 to 20-4. The electrode pair 20-5 is arranged in a region sandwiching the guide wall 12a together with the stirring region Str among regions sandwiched between the straight line LC and the straight line L1a. The electrode pair 20-6 is arranged in a region sandwiching the guide wall 12b together with the stirring region Str among regions sandwiched between the straight line LC and the straight line L1a. The electrode pairs 20-5 and 20-6 are arranged such that the direction of the linear conductor e included in the electrode pair 20-5 coincides with the direction of the linear conductor e included in the electrode pair 20-6.

電極対20−5に交流電圧を印加すると、電極対20−5から撹拌領域Strを貫いて電極対20−6が設けられている位置まで伝播する弾性表面波SAW5が励振される。弾性表面波SAW5は電極対20−6のすだれ状電極E1およびE2との間に圧電現象によって交流電圧を発生する。   When an AC voltage is applied to the electrode pair 20-5, the surface acoustic wave SAW5 propagating from the electrode pair 20-5 through the stirring region Str to the position where the electrode pair 20-6 is provided is excited. The surface acoustic wave SAW5 generates an alternating voltage by a piezoelectric phenomenon between the interdigital electrodes E1 and E2 of the electrode pair 20-6.

物質検出システム104では、搬送撹拌装置100の処理によって撹拌領域Strに反応生体溶液を搬入し撹拌することができる。基板10の表面に吸着した物質の量を測定する場合や、反応生体溶液の性質の解析を行う場合には、反応生体溶液を撹拌すると共に弾性表面波SAW5を励振する。そして、電極対20−5に印加した交流電圧の振幅に対する電極対20−6に発生する交流電圧の振幅の比率、および電極対20−5に印加した交流電圧の位相と電極対20−6に発生する交流電圧の位相との差を測定する。当該振幅レベルの比率および当該位相差は、基板10の表面に吸着した物質の量の変化、反応生体溶液の性質の変化等に従って変化する。したがって、測定された振幅レベルの比率および位相差に基づいて基板10の表面に吸着した物質の量の測定、反応生体溶液の性質の解析等を行うことができる。   In the substance detection system 104, the reaction biological solution can be carried into the stirring region Str and stirred by the processing of the transport stirring device 100. When measuring the amount of the substance adsorbed on the surface of the substrate 10 or analyzing the properties of the reaction biological solution, the reaction biological solution is stirred and the surface acoustic wave SAW5 is excited. The ratio of the amplitude of the alternating voltage generated in the electrode pair 20-6 to the amplitude of the alternating voltage applied to the electrode pair 20-5, and the phase of the alternating voltage applied to the electrode pair 20-5 and the electrode pair 20-6 Measure the difference from the phase of the generated AC voltage. The ratio of the amplitude level and the phase difference change according to a change in the amount of the substance adsorbed on the surface of the substrate 10, a change in the properties of the reaction biological solution, and the like. Therefore, it is possible to measure the amount of the substance adsorbed on the surface of the substrate 10 based on the measured amplitude level ratio and phase difference, analyze the properties of the reaction biological solution, and the like.

このような構成によれば、生成された物質を検出するセンサとして基板10を適用することができるため、生成物質の量の測定、反応生体溶液の性質の解析等を行うシステムの構成を簡略化することができる。   According to such a configuration, since the substrate 10 can be applied as a sensor for detecting the generated substance, the configuration of the system for measuring the amount of the generated substance, analyzing the properties of the reaction biological solution, and the like is simplified. can do.

第1の実施形態に係る搬送撹拌装置を示す図である。It is a figure which shows the conveyance stirring apparatus which concerns on 1st Embodiment. 第2の実施形態に係る搬送撹拌装置を示す図である。It is a figure which shows the conveyance stirring apparatus which concerns on 2nd Embodiment. 第1の実施形態に係る搬送撹拌装置の変形例を示す図である。It is a figure which shows the modification of the conveyance stirring apparatus which concerns on 1st Embodiment. 第1の実施形態に係る搬送撹拌装置の第2の変形例を示す図である。It is a figure which shows the 2nd modification of the conveyance stirring apparatus which concerns on 1st Embodiment. 物質検出システムを示す図である。It is a figure which shows a substance detection system.

符号の説明Explanation of symbols

10 基板、12a,12b 案内壁、12aS,12bS 直線部、12aC,12bC,22 円弧部、14a,14b、16a,16b,24 搬送壁、18 中間壁、20−1〜20−6 電極対、26 突起部、28 円弧壁、100,100A,100B、102 搬送撹拌装置、104 物質検出システム、E1,E2 すだれ状電極、r 基幹導体、e 線状導体。   10 substrate, 12a, 12b guide wall, 12aS, 12bS straight part, 12aC, 12bC, 22 arc part, 14a, 14b, 16a, 16b, 24 transport wall, 18 intermediate wall, 20-1 to 20-6 electrode pair, 26 Projection, 28 Arc wall, 100, 100A, 100B, 102 Conveying stirrer, 104 Substance detection system, E1, E2 Interdigital electrode, r Core conductor, e Linear conductor.

Claims (4)

弾性表面波が伝播する基板と、
前記基板の表面と平行な面内で凹形状の線を描く壁面を有し、前記基板の表面上に設けられる第1隆起部と、
前記基板の表面と平行な面内で凹形状の線を描く壁面を有し、当該壁面の凹んだ側が前記第1隆起部が有する前記壁面の凹んだ側に対向するよう、前記基板の表面上に設けられる第2隆起部と、
前記基板に設けられ、前記第1隆起部が有する前記壁面の凹んだ側から弾性表面波を励振する励振源と、
を備え、
前記第1隆起部が有する前記壁面および前記第2隆起部が有する前記壁面は、
前記励振源が励振する弾性表面波によって前記基板の表面上を移動する液体を導き、前記基板の表面上に前記液体を環状に流動させることを特徴とする液体撹拌装置。
A substrate on which surface acoustic waves propagate;
A wall having a concave line in a plane parallel to the surface of the substrate, and a first raised portion provided on the surface of the substrate;
On the surface of the substrate, having a wall surface that draws a concave line in a plane parallel to the surface of the substrate, the recessed side of the wall surface facing the recessed side of the wall surface of the first raised portion A second raised portion provided in the
An excitation source that is provided on the substrate and excites a surface acoustic wave from a recessed side of the wall surface of the first raised portion;
With
The wall surface of the first raised portion and the wall surface of the second raised portion are:
A liquid stirring apparatus, wherein a liquid moving on a surface of the substrate is guided by a surface acoustic wave excited by the excitation source, and the liquid is caused to flow annularly on the surface of the substrate.
請求項1に記載の液体撹拌装置であって、
前記基板に設けられ、前記第1隆起部が有する前記壁面と前記第2隆起部が有する前記壁面との間に挟まれる前記基板上の撹拌領域に、前記第1隆起部が有する前記壁面および前記第2隆起部が有する前記壁面によって塞がれていない方向から弾性表面波を励振する補助励振源を備え、
前記撹拌領域の外側に前記液体が流出することを前記補助励振源が励振する弾性表面波によって阻止することを特徴とする液体撹拌装置。
The liquid stirring apparatus according to claim 1,
The wall surface of the first raised portion is provided in the stirring region on the substrate that is provided on the substrate and sandwiched between the wall surface of the first raised portion and the wall surface of the second raised portion, and the An auxiliary excitation source for exciting a surface acoustic wave from a direction not covered by the wall surface of the second raised portion,
The liquid agitating apparatus is characterized in that the liquid is prevented from flowing out of the agitating region by a surface acoustic wave excited by the auxiliary excitation source.
弾性表面波が伝播する基板と、
前記基板の表面上に設けられる突起部と、
前記基板に設けられ弾性表面波を励振する励振源と、
を備え、
前記励振源によって励振された弾性表面波によって、前記基板の表面上に前記突起部を中心として液体を環状に流動させることを特徴とする液体撹拌装置。
A substrate on which surface acoustic waves propagate;
A protrusion provided on the surface of the substrate;
An excitation source provided on the substrate for exciting a surface acoustic wave;
With
A liquid agitating device characterized in that a liquid is caused to flow in an annular shape on the surface of the substrate around the protrusion by a surface acoustic wave excited by the excitation source.
請求項1から請求項3のいずれか1項に記載の液体撹拌装置と、
前記基板に設けられ、前記液体が環状に流動する前記基板の表面上の位置に弾性表面波を励振する測定励振源と、
前記基板に設けられ、前記測定励振源によって励振され前記液体が環状に流動する前記基板の表面上の位置を通過した弾性表面波に基づいて信号を発生する検出部と、
を備え、
前記検出部が発生する信号に基づいて、前記液体が含む物質の反応によって生成された生成物質の量を測定することを特徴とする物質検出システム。
A liquid agitator according to any one of claims 1 to 3,
A measurement excitation source provided on the substrate and exciting a surface acoustic wave at a position on the surface of the substrate where the liquid flows in an annular shape;
A detection unit that is provided on the substrate and generates a signal based on a surface acoustic wave that has been excited by the measurement excitation source and passed through a position on the surface of the substrate where the liquid flows annularly;
With
A substance detection system that measures the amount of a substance produced by a reaction of a substance contained in the liquid based on a signal generated by the detection unit.
JP2006283869A 2006-10-18 2006-10-18 Liquid stirrer, and substance detection system Pending JP2008101981A (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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Publications (1)

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Family Applications (1)

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Country Status (1)

Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010082266A1 (en) * 2009-01-13 2010-07-22 株式会社 村田製作所 Acoustic wave sensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010082266A1 (en) * 2009-01-13 2010-07-22 株式会社 村田製作所 Acoustic wave sensor
JP5195926B2 (en) * 2009-01-13 2013-05-15 株式会社村田製作所 Elastic wave sensor

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