JP2008033284A5 - - Google Patents

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JP2008033284A5
JP2008033284A5 JP2007168757A JP2007168757A JP2008033284A5 JP 2008033284 A5 JP2008033284 A5 JP 2008033284A5 JP 2007168757 A JP2007168757 A JP 2007168757A JP 2007168757 A JP2007168757 A JP 2007168757A JP 2008033284 A5 JP2008033284 A5 JP 2008033284A5
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conductive layer
conductive
layer
display device
conductive material
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JP2007168757A
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JP2008033284A (en
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Priority to JP2007168757A priority Critical patent/JP2008033284A/en
Priority claimed from JP2007168757A external-priority patent/JP2008033284A/en
Publication of JP2008033284A publication Critical patent/JP2008033284A/en
Publication of JP2008033284A5 publication Critical patent/JP2008033284A5/ja
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Claims (12)

絶縁表面を有する基板上に第1の導電性材料を含む組成物を吐出し枠状の第1の導電層を形成し、
記第1の導電層で囲まれた領域に、第2の導電性材料を含む組成物を吐出し前記第1の導電層の枠内に第2の導電層を形成することを特徴とする表示装置の作製方法。
A frame-shaped first conductive layer is formed by discharging a composition containing a first conductive material over a substrate having an insulating surface;
In a region surrounded by the front Symbol first conductive layer, and forming a second conductive layer on the second conductive material discharging a composition including a first conductive layer within the frame A method for manufacturing a display device.
絶縁表面を有する基板上に第1の導電性材料を含む組成物を吐出し枠状の第1の導電層を形成し、
記第1の導電層で囲まれた領域に、第2の導電性材料を含む組成物を吐出し前記第1の導電層の枠内に第2の導電層を形成し、
前記第1の導電性材料を含む組成物の粘度は前記第2の導電性材料を含む組成物の粘度より高いことを特徴とする表示装置の作製方法。
A frame-shaped first conductive layer is formed by discharging a composition containing a first conductive material over a substrate having an insulating surface;
In a region surrounded by the front Symbol first conductive layer, the second conductive layer is formed on the second conductive material discharging a composition including a first conductive layer within the frame,
A method for manufacturing a display device, characterized in that the viscosity of the composition containing the first conductive material is higher than the viscosity of the composition containing the second conductive material.
絶縁表面を有する基板上に第1の導電性材料を含む組成物を吐出し枠状の第1の導電層を形成し、
記第1の導電層で囲まれた領域に、第2の導電性材料を含む組成物を吐出し前記第1の導電層の枠内に第2の導電層を形成し、
前記第1の導電性材料を含む組成物が吐出される領域に対する前記第1の導電性材料を含む組成物のぬれ性は、前記第2の導電性材料を含む組成物が吐出される領域に対する前記第2の導電性材料を含む組成物のぬれ性より低いことを特徴とする表示装置の作製方法。
A frame-shaped first conductive layer is formed by discharging a composition containing a first conductive material over a substrate having an insulating surface;
In a region surrounded by the front Symbol first conductive layer, the second conductive layer is formed on the second conductive material discharging a composition including a first conductive layer within the frame,
The first unexpected Re sexual composition composition comprising said first conductive material to a region to be discharged containing an electrically conductive material, a region where the composition comprising the second conductive material is discharged the method for manufacturing a display device, characterized in that below the unexpected Re sexual composition comprising said second conductive material to.
請求項1乃至3のいずれか一項において、前記第1の導電性材料を含む組成物は連続的に吐出し、前記第2の導電性材料を含む組成物は間欠的に吐出することを特徴とする表示装置の作製方法。 4. The composition according to claim 1, wherein the composition containing the first conductive material is discharged continuously, and the composition containing the second conductive material is discharged intermittently. A method for manufacturing a display device. 請求項1乃至4のいずれか一項において、前記第1及び前記第2の導電層は画素電極層であることを特徴とする表示装置の作製方法。 5. The method for manufacturing a display device according to claim 1, wherein the first and second conductive layers are pixel electrode layers. 6. 絶縁表面を有する基板上に、枠状の第1の導電層と、前記第1の導電層で囲まれた領域に設けられた第2の導電層とを有し、On a substrate having an insulating surface, a frame-shaped first conductive layer and a second conductive layer provided in a region surrounded by the first conductive layer,
前記第1の導電層及び前記第2の導電層は、配線層、ゲート電極層、ソース電極層、ドレイン電極層、または画素電極層であることを特徴とする表示装置。The display device, wherein the first conductive layer and the second conductive layer are a wiring layer, a gate electrode layer, a source electrode layer, a drain electrode layer, or a pixel electrode layer.
絶縁表面を有する基板上に、枠状の第1の導電層と、前記第1の導電層で囲まれた領域に設けられた第2の導電層とを有し、On a substrate having an insulating surface, a frame-shaped first conductive layer and a second conductive layer provided in a region surrounded by the first conductive layer,
前記第1の導電層と前記第2の導電層とは接しており、The first conductive layer and the second conductive layer are in contact with each other;
前記第1の導電層及び前記第2の導電層は、配線層、ゲート電極層、ソース電極層、ドレイン電極層、または画素電極層であることを特徴とする表示装置。The display device, wherein the first conductive layer and the second conductive layer are a wiring layer, a gate electrode layer, a source electrode layer, a drain electrode layer, or a pixel electrode layer.
絶縁表面を有する基板上に、枠状の第1の導電層と、前記第1の導電層で囲まれた領域に設けられた第2の導電層とを有し、On a substrate having an insulating surface, a frame-shaped first conductive layer and a second conductive layer provided in a region surrounded by the first conductive layer,
前記第1の導電層は第1の導電性材料を含み、The first conductive layer includes a first conductive material;
前記第2の導電層は第2の導電性材料を含み、The second conductive layer includes a second conductive material;
前記第1の導電層及び前記第2の導電層は、配線層、ゲート電極層、ソース電極層、ドレイン電極層、または画素電極層であることを特徴とする表示装置。The display device, wherein the first conductive layer and the second conductive layer are a wiring layer, a gate electrode layer, a source electrode layer, a drain electrode layer, or a pixel electrode layer.
請求項6乃至8のいずれか一項において、前記第2の導電層は、前記第1の導電層の膜厚と比較して、膜厚が大きい部分を有することを特徴とする表示装置。9. The display device according to claim 6, wherein the second conductive layer has a portion having a thickness larger than that of the first conductive layer. 請求項6乃至8のいずれか一項において、前記第2の導電層は、前記第1の導電層の膜厚と比較して、膜厚が小さい部分を有することを特徴とする表示装置。9. The display device according to claim 6, wherein the second conductive layer includes a portion having a thickness smaller than that of the first conductive layer. 請求項6乃至10のいずれか一項において、前記第1の導電層の端部は曲率を有することを特徴とする表示装置。The display device according to claim 6, wherein an end portion of the first conductive layer has a curvature. 請求項6乃至11のいずれか一項に記載の表示装置は、電子ペーパー、テレビジョン装置、デジタルカメラ、デジタルビデオカメラ、携帯電話装置、携帯情報端末、ゲーム機、コンピュータ、音響再生装置、または画像再生装置であることを特徴とする表示装置。The display device according to claim 6 is an electronic paper, a television device, a digital camera, a digital video camera, a mobile phone device, a portable information terminal, a game machine, a computer, a sound reproduction device, or an image. A display device which is a playback device.
JP2007168757A 2006-07-04 2007-06-27 Manufacturing method of display device Withdrawn JP2008033284A (en)

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JP2006184719 2006-07-04
JP2007168757A JP2008033284A (en) 2006-07-04 2007-06-27 Manufacturing method of display device

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JP2008033284A JP2008033284A (en) 2008-02-14
JP2008033284A5 true JP2008033284A5 (en) 2010-07-29

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JP5676863B2 (en) * 2009-09-15 2015-02-25 株式会社Screenホールディングス Pattern forming method and pattern forming apparatus
JP5835217B2 (en) * 2010-07-02 2015-12-24 コニカミノルタ株式会社 Organic electroluminescence device
JP5600662B2 (en) * 2010-12-15 2014-10-01 日本特殊陶業株式会社 Method for forming conductor pattern
KR20140024931A (en) * 2011-07-15 2014-03-03 스미도모쥬기가이고교 가부시키가이샤 Thin film forming method and thin film forming apparatus
US9363899B2 (en) * 2012-01-02 2016-06-07 Mutracx International B.V. Inkjet system for printing a printed circuit board
JP5726829B2 (en) * 2012-09-21 2015-06-03 株式会社東芝 Film forming method and liquid crystal display device
JP2014178456A (en) * 2013-03-14 2014-09-25 Pixtronix Inc Display device and method of manufacturing the same
KR102131118B1 (en) * 2013-07-04 2020-07-08 삼성디스플레이 주식회사 Mask for forming semiconductor pattern and apparatus for forming semiconductor pattern having the same and method for manufacturing semiconductor device using the same
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TWI554338B (en) * 2014-06-25 2016-10-21 柯尼卡美能達股份有限公司 Pattern forming method, substrate having transparent conductive film, image display device and electronic equipment for image displaying
CN108141954A (en) * 2015-12-24 2018-06-08 株式会社藤仓 The manufacturing method and wiring substrate of wiring substrate
KR102601451B1 (en) * 2016-09-30 2023-11-13 엘지디스플레이 주식회사 Electrode, And Organic Light Emitting Diode, Liquid Crystal Display Device, And Organic Light Emitting Display Device Of The Same
WO2018179264A1 (en) * 2017-03-30 2018-10-04 シャープ株式会社 Film forming instrument, film forming method, electronic device, and production instrument for electronic device
CN113659076A (en) * 2021-07-27 2021-11-16 光华临港工程应用技术研发(上海)有限公司 Method for producing domain wall memory and domain wall memory

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