JP2008033076A - Method for manufacturing liquid crystal display element and manufacturing apparatus therefor - Google Patents

Method for manufacturing liquid crystal display element and manufacturing apparatus therefor Download PDF

Info

Publication number
JP2008033076A
JP2008033076A JP2006207487A JP2006207487A JP2008033076A JP 2008033076 A JP2008033076 A JP 2008033076A JP 2006207487 A JP2006207487 A JP 2006207487A JP 2006207487 A JP2006207487 A JP 2006207487A JP 2008033076 A JP2008033076 A JP 2008033076A
Authority
JP
Japan
Prior art keywords
liquid crystal
electrode substrate
transparent electrode
pixel electrode
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006207487A
Other languages
Japanese (ja)
Inventor
Nozomi Okochi
望 大河内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP2006207487A priority Critical patent/JP2008033076A/en
Publication of JP2008033076A publication Critical patent/JP2008033076A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Liquid Crystal (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of a liquid crystal display element capable of suppressing deposition of impurities on an alignment layer or changes with time and further improving the display quality and the yield of product. <P>SOLUTION: The manufacturing apparatus of a liquid crystal display element having a liquid crystal LC sealed by forming an alignment layer 14 on the surface of a pixel electrode substrate 4 having a display area 12, forming an alignment layer 18 on the surface of a transparent electrode substrate 6 having a transparent electrode 16, and bonding both substrates with a sealing adhesive 20, is equipped with: a conveyance chamber 42 that can selectively give a vacuum environment or an atmospheric environment and has a conveying robot 54 inside; a film forming chamber 46 for forming the alignment layer on each surface of the pixel electrode substrate and the transparent electrode substrate in vacuum; a sealing adhesive/liquid crystal processing chamber 48 for applying the sealing adhesive on the pixel electrode substrate or the transparent electrode substrate with the alignment layer formed and dropping the liquid crystal onto an area surrounded by the sealing adhesive; and a laminating chamber 50 for laminating the substrates in vacuum. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、複数の画素電極を有する液晶表示素子の製造方法及びその製造装置に関する。   The present invention relates to a method for manufacturing a liquid crystal display element having a plurality of pixel electrodes and a manufacturing apparatus therefor.

近年、プロジェクタやプロジェクションＴＶ（テレビジョン）等のプロジェクションディスプレイの映像表示部として、高解像度と高輝度化を実現し得ることから、ＩＣシリコン基板とガラス基板を貼り合わせ、その間に液晶を配したＬＣＯＳ（Ｌｉｑｕｉｄ Ｃｒｙｓｔａｌ Ｏｎ Ｓｉｌｉｃｏｎ）と呼ばれる反射型の液晶表示素子が注目され、実際に実用化されている（特許文献１、２、３、４）。かかる反射型の液晶表示素子の構造と駆動原理について説明する。図５は一般的な反射型の液晶表示素子の一例を示す拡大断面図、図６は図５に示す液晶表示素子の分解斜視図、図７は液晶表示素子の製造方法の初期の段階を説明するための斜視図である。   In recent years, as a video display unit of a projection display such as a projector or a projection TV (television), it is possible to realize high resolution and high brightness. Therefore, an LCOS in which an IC silicon substrate and a glass substrate are bonded together and a liquid crystal is disposed therebetween. A reflective liquid crystal display element called “Liquid Crystal On Silicon” has attracted attention and has been put to practical use (Patent Documents 1, 2, 3, and 4). The structure and driving principle of such a reflective liquid crystal display element will be described. FIG. 5 is an enlarged cross-sectional view showing an example of a general reflective liquid crystal display element, FIG. 6 is an exploded perspective view of the liquid crystal display element shown in FIG. 5, and FIG. 7 illustrates an initial stage of the method for manufacturing the liquid crystal display element. It is a perspective view for doing.

図５に示すように、液晶表示素子２は、画素電極基板４と、透明電極基板６とを、その間に形成された隙間８に液晶ＬＣを封止して形成されている。上記画素電極基板４は、例えばシリコン基板等の半導体基板を切り出したものであり、その表面には、例えばアルミニウム合金よりなる反射型の画素電極１０が縦横にマトリクス状に多数配置されており、この画素電極１０の下部には、この画素電極１０を駆動するための例えばＣ−ＭＯＳ型のスイッチング素子や保持容量等よりなる図示しない駆動回路が設けられている。上記画素電極１０が配列されている領域が表示エリア１２となっている。   As shown in FIG. 5, the liquid crystal display element 2 is formed by sealing a liquid crystal LC in a gap 8 formed between a pixel electrode substrate 4 and a transparent electrode substrate 6. The pixel electrode substrate 4 is obtained by cutting a semiconductor substrate such as a silicon substrate. A large number of reflective pixel electrodes 10 made of, for example, an aluminum alloy are arranged in a matrix in the vertical and horizontal directions on the surface. Below the pixel electrode 10, a drive circuit (not shown) including, for example, a C-MOS type switching element and a storage capacitor for driving the pixel electrode 10 is provided. A region where the pixel electrodes 10 are arranged is a display area 12.

また上記表示エリア１２には、ここに設けた画素電極１０の上面全体を覆うように、液晶ＬＣを配向させるための例えばポリイミド膜や酸化シリコン膜よりなる配向膜１４が形成されている。また上記透明電極基板６は、例えば透明なガラス基板よりなり、その対向面側には例えばＩＴＯ（インジウムースズ酸化物）よりなる透明電極１６が全面に共通に形成されている。そして、この透明電極１６の表面には、液晶ＬＣを配向させるための例えばポリイミド膜や酸化シリコン膜よりなる配向膜１８が形成されている。   In the display area 12, an alignment film 14 made of, for example, a polyimide film or a silicon oxide film for aligning the liquid crystal LC is formed so as to cover the entire upper surface of the pixel electrode 10 provided here. The transparent electrode substrate 6 is made of, for example, a transparent glass substrate, and a transparent electrode 16 made of, for example, ITO (indium-tin oxide) is formed on the entire surface on the opposite surface side. An alignment film 18 made of, for example, a polyimide film or a silicon oxide film for aligning the liquid crystal LC is formed on the surface of the transparent electrode 16.

そして、上記画素電極基板４と透明電極基板６とは、上記画素電極１０と透明電極１６とを対向させ、表示エリア１２の周囲に接着剤とスペーサとを含むシール接着剤２０を介在させて固着されており、上記隙間８内に液晶ＬＣを封入している。   The pixel electrode substrate 4 and the transparent electrode substrate 6 are fixed to each other with the pixel electrode 10 and the transparent electrode 16 facing each other and a seal adhesive 20 including an adhesive and a spacer interposed around the display area 12. The liquid crystal LC is sealed in the gap 8.

そして、図６に示すように、上記シール接着剤２０は、両基板の接合前に液晶ＬＣを滴下することから上記表示エリア１２の周囲を完全に囲むようにして塗布されている。このような液晶表示素子２では、透明電極基板６の透明電極１６と各画素電極１０との間に電圧が印加され、液晶ＬＣが駆動される。ここに透明電極基板６側から読み出し光Ｌが入射して、液晶ＬＣによって変調を受ける。この変調の度合いは各画素でコントロールされて、コントラストを有する画像となって反射型の画素電極１０で反射され、再度、透明電極基板６側へ出射する。このようにして、出射された画像は、各種光学部品からなる光学エンジンによって、所望される特性を得て、フロントプロジェクタやリアプロジェクションＴＶの画像となる。   As shown in FIG. 6, the sealing adhesive 20 is applied so as to completely surround the display area 12 because the liquid crystal LC is dropped before the two substrates are joined. In such a liquid crystal display element 2, a voltage is applied between the transparent electrode 16 of the transparent electrode substrate 6 and each pixel electrode 10, and the liquid crystal LC is driven. Here, the reading light L enters from the transparent electrode substrate 6 side, and is modulated by the liquid crystal LC. The degree of this modulation is controlled by each pixel, becomes an image having a contrast, is reflected by the reflective pixel electrode 10, and is emitted again to the transparent electrode substrate 6 side. Thus, the emitted image is obtained by the optical engine composed of various optical components to obtain desired characteristics and becomes an image of a front projector or a rear projection TV.

上記したような液晶表示素子２は、その生産性向上、歩留まり向上、製造コスト低減のために、個々に作るのではなく、一般的には、図７に示すように、一度に多数の素子を一括して製造することが行われている。すなわち、例えば円板状の大口径のシリコン基板よりなる画素電極基板４の一面側に、前述したような表示エリア１２を複数個所定の間隔ずつ隔ててマトリクス状に形成し、この基板４の表面に円板状の大口径の例えばガラス基板よりなる透明電極基板６を接合して固着する。この場合、画素電極基板４側にはすでに配向膜１４が形成されており、また、透明電極基板６側には、透明電極１６及び配向膜１８が形成されているのは勿論である。   The liquid crystal display element 2 as described above is not manufactured individually for improving the productivity, the yield, and the manufacturing cost. Generally, as shown in FIG. Manufacturing is performed in a lump. That is, for example, a plurality of display areas 12 as described above are formed in a matrix at a predetermined interval on one surface side of a pixel electrode substrate 4 made of, for example, a disk-shaped large-diameter silicon substrate. A transparent electrode substrate 6 made of, for example, a glass substrate having a large disk shape is bonded and fixed to the substrate. In this case, the alignment film 14 is already formed on the pixel electrode substrate 4 side, and the transparent electrode 16 and the alignment film 18 are naturally formed on the transparent electrode substrate 6 side.

ここで、上記透明電極基板６としては、円板形状のものに限らず、四角形状のものも用いられる。そして、両基板４、６を貼り合わせて接合及び固着して貼り合わせ基板を形成し、この貼り合わせ基板を個々の素子単体に分断して切り出すことによって図５に示す単体の液晶表示素子２を複数得る。   Here, the transparent electrode substrate 6 is not limited to a disk shape, and a rectangular shape is also used. Then, the substrates 4 and 6 are bonded to each other, bonded and fixed to form a bonded substrate, and the bonded substrate is divided into individual elements to cut out the single liquid crystal display element 2 shown in FIG. Get multiple.

ここで上記した動作の一連の流れを、図８を参照して説明する。図８は従来の液晶表示素子の製造装置の一例を示す概略構成図である。図８に示すように、前工程で配向膜１４（図５参照）が予め形成された画素電極基板４をシール室２２に取り込み、この中にて真空中でシールディスペンサ２４を用いて上記画素電極基板４の表面に表示エリア１２（図５参照）を囲むようにしてシール接着剤２０を塗布する。
次に、この画素電極基板４を隣の液晶室２６へ搬送し、この中にて真空中で液晶ディスペンサ２８を用いて表示エリア内に所定量の液晶ＬＣを滴下させる。 Here, a series of operations described above will be described with reference to FIG. FIG. 8 is a schematic configuration diagram showing an example of a conventional apparatus for manufacturing a liquid crystal display element. As shown in FIG. 8, the pixel electrode substrate 4 on which the alignment film 14 (see FIG. 5) is previously formed in the previous process is taken into the seal chamber 22, and the above-mentioned pixel electrode is used in the vacuum using a seal dispenser 24. A seal adhesive 20 is applied to the surface of the substrate 4 so as to surround the display area 12 (see FIG. 5).
Next, the pixel electrode substrate 4 is transported to the adjacent liquid crystal chamber 26, and a predetermined amount of liquid crystal LC is dropped into the display area using a liquid crystal dispenser 28 in a vacuum.

次に、この画素電極基板４を隣りの貼り合わせ室３０へ搬送する。この中にて真空中で上記画素電極基板４と予め共通の透明電極１６や配向膜１８（図５参照）が形成されている透明電極基板６とを互いに接合する。そして、真空排気系３２を徐々に解除して貼り合わせ室３０内の真空度を少しずつ緩和してセルギャップ調整を行い、最終的に大気圧状態とする。   Next, the pixel electrode substrate 4 is transferred to the adjacent bonding chamber 30. In this, the pixel electrode substrate 4 and the transparent electrode substrate 6 on which the common transparent electrode 16 and the alignment film 18 (see FIG. 5) are previously formed are bonded together in a vacuum. Then, the vacuum evacuation system 32 is gradually released to gradually relax the degree of vacuum in the bonding chamber 30 to adjust the cell gap, and finally the atmospheric pressure state is obtained.

次に、この貼り合わせ基板を隣りのシール硬化室３４へ搬送し、この中で例えば紫外線照射ランプ３６を用いて紫外線を照射し、上記シール接着剤２０を硬化させて、これにより液晶表示素子２が完成される。尚、上記画素電極基板４として大口径のウエハを用いた場合には、その後、前述したように、個々の液晶表示素子２にダイサーにより分断されることになる。そして、製品の歩留まりの向上を図るために、上記液晶表示素子２の製造工程においては、液晶ＬＣを滴下する際に液晶滴下量を高精度にコントロールし、またセルギャップの均一性を向上させることがなされていた。   Next, this bonded substrate is transported to the adjacent seal curing chamber 34, in which, for example, an ultraviolet irradiation lamp 36 is used to irradiate ultraviolet rays to cure the sealing adhesive 20, thereby the liquid crystal display element 2. Is completed. In the case where a large-diameter wafer is used as the pixel electrode substrate 4, the individual liquid crystal display elements 2 are divided by a dicer as described above. In order to improve the yield of the product, in the manufacturing process of the liquid crystal display element 2, when the liquid crystal LC is dropped, the liquid crystal dropping amount is controlled with high accuracy and the uniformity of the cell gap is improved. Has been made.

特開平０５−８０３３６号公報Japanese Patent Laid-Open No. 05-80336 特許第３０７７１２６号公報Japanese Patent No. 3077126 特開２０００−４７２１１号公報JP 2000-47211 A 特開２００４−１７７５４２号公報JP 2004-177542 A

ところで、上述したような従来の製造方法にあっては、液晶滴下量やセルギャップの均一性をそれぞれ高精度でコントロールしているので、ある程度の高い製品歩留まりを実現することができている。しかしながら、これらの前工程で、画素電極基板４や透明電極基板６の表面にそれぞれ配向膜１４、１８を蒸着形成した後に、これらの両基板は常温常圧の大気中に取り出された状態となっているので、この配向膜１４、１８に水分等の不純物が付着してしまい、この結果、上記不純物が表示品質を劣化させたり、製品歩留まりを低下させる原因になる、といった問題があった。   By the way, in the conventional manufacturing method as described above, since the liquid crystal dropping amount and the uniformity of the cell gap are controlled with high accuracy, respectively, a high product yield can be realized. However, in these pre-processes, after the alignment films 14 and 18 are formed on the surfaces of the pixel electrode substrate 4 and the transparent electrode substrate 6 by vapor deposition, these substrates are taken out into the air at normal temperature and pressure. As a result, impurities such as moisture adhere to the alignment films 14 and 18. As a result, there is a problem in that the impurities cause a deterioration in display quality and a decrease in product yield.

本発明は、以上のような問題点に着目し、これを有効に解決すべく創案されたものである。本発明の目的は、配向膜への不純物の付着や経時変化を抑制して表示品質や製品歩留まりを更に向上させることが可能な液晶表示素子の製造方法及びその製造装置を提供することにある。   The present invention has been devised to pay attention to the above problems and to effectively solve them. An object of the present invention is to provide a method of manufacturing a liquid crystal display element and an apparatus for manufacturing the same capable of further improving display quality and product yield by suppressing adhesion of impurities to an alignment film and changes with time.

請求項１に係る発明は、複数の画素電極を配列してなる表示エリアを少なくとも１つ有する画素電極基板の表面に配向膜を形成し、共通な透明電極を有する透明電極基板の表面に配向膜を形成し、前記画素電極と前記透明電極とを対向させて間に液晶を介在させて前記両基板をシール接着剤により接合することにより前記液晶を封止してなる液晶表示素子の製造方法において、真空中にて前記画素電極基板及び透明電極基板の表面に前記配向膜をそれぞれ形成する配向膜形成工程と、前記配向膜形成工程後に、真空中にて前記画素電極基板の表示エリアを囲むようにして、或いは前記表示エリアに対応する前記透明電極基板の対応エリアを囲むようにして前記シール接着剤を塗布する接着剤塗布工程と、前記接着剤塗布工程後に、前記シール接着剤で囲まれたエリアに前記液晶を滴下する液晶滴下工程と、前記液晶滴下工程後に、真空中にて前記両基板を互いに貼り合わせる貼り合わせ工程と、を有すると共に、前記配向膜形成工程から前記貼り合わせ工程までを真空を保持した状態で行なうことを特徴とする液晶表示素子の製造方法である。   According to the first aspect of the present invention, an alignment film is formed on the surface of a pixel electrode substrate having at least one display area formed by arranging a plurality of pixel electrodes, and the alignment film is formed on the surface of the transparent electrode substrate having a common transparent electrode. In the method of manufacturing a liquid crystal display element, the liquid crystal is sealed by forming the substrate electrode, the liquid crystal is interposed between the pixel electrode and the transparent electrode, the liquid crystal is interposed therebetween, and the substrates are bonded with a seal adhesive An alignment film forming step for forming the alignment film on the surfaces of the pixel electrode substrate and the transparent electrode substrate in a vacuum, and a display area of the pixel electrode substrate in a vacuum after the alignment film formation step. Alternatively, an adhesive application step of applying the seal adhesive so as to surround a corresponding area of the transparent electrode substrate corresponding to the display area, and after the adhesive application step, the seal A liquid crystal dropping step of dropping the liquid crystal in an area surrounded by an adhesive; and a bonding step of bonding the substrates together in a vacuum after the liquid crystal dropping step; and from the alignment film forming step A method for manufacturing a liquid crystal display element, wherein the steps up to the bonding step are performed in a vacuum state.

請求項２に係る発明は、複数の画素電極を配列してなる表示エリアを少なくとも１つ有する画素電極基板の表面に配向膜を形成し、共通な透明電極を有する透明電極基板の表面に配向膜を形成し、前記画素電極と前記透明電極とを対向させて間に液晶を介在させて前記両基板をシール接着剤により接合することにより前記液晶を封止してなる液晶表示素子の製造装置において、必要に応じて真空雰囲気と大気圧雰囲気とを選択的に実現できて内部に基板搬送用の搬送ロボットを有する搬送室と、前記搬送室に連結されて真空中にて前記画素電極基板と前記透明電極基板の表面にそれぞれ配向膜を形成する成膜室と、前記搬送室に連結されて真空中にて前記配向膜が形成された前記画素電極基板、或いは前記透明電極基板にシール接着剤を塗布すると共に、前記シール接着剤で囲まれたエリアに液晶を滴下するシール接着剤・液晶処理室と、前記搬送室に連結されて真空中にて前記両基板を互いに貼り合わせる貼り合わせ室と、を備えたことを特徴とする液晶表示素子の製造装置である。   According to a second aspect of the present invention, an alignment film is formed on the surface of a pixel electrode substrate having at least one display area formed by arranging a plurality of pixel electrodes, and the alignment film is formed on the surface of the transparent electrode substrate having a common transparent electrode. In a liquid crystal display device manufacturing apparatus, the liquid crystal is sealed by forming the substrate electrode, the liquid crystal interposed between the pixel electrode and the transparent electrode, with the liquid crystal interposed therebetween, and a sealing adhesive. A vacuum chamber and an atmospheric pressure atmosphere can be selectively realized as necessary, and a transfer chamber having a transfer robot for transferring a substrate therein, and the pixel electrode substrate and the vacuum chamber connected to the transfer chamber in vacuum A film forming chamber for forming an alignment film on the surface of the transparent electrode substrate, and the pixel electrode substrate connected to the transfer chamber and formed with the alignment film in a vacuum, or a seal adhesive on the transparent electrode substrate Coating And a sealing adhesive / liquid crystal processing chamber for dropping liquid crystal in an area surrounded by the sealing adhesive, and a bonding chamber connected to the transfer chamber to bond the substrates together in a vacuum. An apparatus for manufacturing a liquid crystal display element, comprising:

本発明に係る液晶表示素子の製造方法及びその製造装置によれば、画素電極基板や透明電極基板にそれぞれ配向膜を形成した後に、両基板を大気圧雰囲気に晒すことなくシール接着剤の塗布、液晶滴下及び両基板の貼り合わせを行うようにしたので、配向膜への不純物の付着や経時変化を抑制することができ、この結果、表示品質や製品歩留まりを更に向上させることができる。   According to the method and apparatus for manufacturing a liquid crystal display element according to the present invention, after forming alignment films on the pixel electrode substrate and the transparent electrode substrate, respectively, application of a seal adhesive without exposing both substrates to an atmospheric pressure atmosphere, Since the liquid crystal is dropped and the two substrates are bonded together, the adhesion of impurities to the alignment film and the change with time can be suppressed, and as a result, the display quality and the product yield can be further improved.

以下に、本発明に係る液晶表示素子の製造方法及びその製造装置の一実施例を添付図面に基づいて詳述する。
図１は本発明に係る液晶表示素子の製造装置を示す概略構成図、図２は成膜室内の構造を示す概略構成図である。尚、図５〜図８に示した構成部分と同一構成部分については、同一参照符号を付す。 Hereinafter, an embodiment of a method for manufacturing a liquid crystal display element and an apparatus for manufacturing the same according to the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic configuration diagram showing an apparatus for manufacturing a liquid crystal display element according to the present invention, and FIG. 2 is a schematic configuration diagram showing a structure in a film forming chamber. In addition, the same referential mark is attached | subjected about the same component as the component shown in FIGS.

図１に示すように、この液晶表示素子の製造装置４０は、中心に多角形、ここでは５角形になされた搬送室４２を有し、その搬送室４２の各周辺部に、基板ロード室４４、成膜室４６、シール接着剤・液晶処理室４８、貼り合わせ室５０及びシール硬化室５２をそれぞれ連結して取り付けている。   As shown in FIG. 1, the liquid crystal display element manufacturing apparatus 40 has a transfer chamber 42 having a polygonal shape, in this case, a pentagon, in the center, and a substrate load chamber 44 at each peripheral portion of the transfer chamber 42. The film forming chamber 46, the seal adhesive / liquid crystal processing chamber 48, the bonding chamber 50, and the seal curing chamber 52 are connected to each other.

上記各室４２、４４、４６、４８、５０、５２には、それぞれ真空ポンプを含む真空調整ユニット（図示せず）が取り付けられており、真空度を調整できると共に、必要に応じて大気圧復帰できるようになっている。上記搬送室４２と他の各室４４、４６、４８、５０、５２との連結部には、気密に開閉可能になされたゲートバルブＧがそれぞれ設けられると共に、上記基板ロード室４４の反対側には、基板を搬出入する時に気密に開閉可能になされるゲートドアＧ１が設けられている。   Each of the chambers 42, 44, 46, 48, 50, 52 is provided with a vacuum adjustment unit (not shown) including a vacuum pump, which can adjust the degree of vacuum and return to atmospheric pressure as necessary. It can be done. A gate valve G that can be opened and closed in an airtight manner is provided at a connecting portion between the transfer chamber 42 and the other chambers 44, 46, 48, 50, 52, and on the opposite side of the substrate load chamber 44. Is provided with a gate door G1 that can be opened and closed airtight when the substrate is carried in and out.

上記搬送室４２内には、基板を搬送するために、屈伸及び旋回可能になされた多関節アームよりなる基板搬送用の搬送ロボット５４が設けられており、各室間で基板の受け渡しを行うようになっている。上記基板ロード室４４は、外部からそれぞれ複数の画素電極基板４及び透明電極基板６を取り込んで収容できるようになっている。尚、ここでの画素電極基板４及び透明電極基板６の各表面には、配向膜はまだ形成されていない。   In the transfer chamber 42, a transfer robot 54 for transferring a substrate, which is an articulated arm that can be bent and stretched and turned, is provided to transfer the substrate, and the substrate is transferred between the chambers. It has become. The substrate load chamber 44 can receive and accommodate a plurality of pixel electrode substrates 4 and transparent electrode substrates 6 from outside. In addition, the alignment film is not yet formed on each surface of the pixel electrode substrate 4 and the transparent electrode substrate 6 here.

上記成膜室４６内には、図２にも示すように、画素電極基板４と透明電極基板６とを保持するホルダ５６を有しており、このホルダ５６の上方には、スパッタターゲットを含むイオンビームソース５８が設けられ、このイオンビームソース５８を矢印６０の方向に走査することにより材料分子を飛散させて両基板４、６の表面に配向膜をそれぞれ形成できるようになっている。尚、図２に示す構成に代えて、図３に示すように、両基板４、６を下向きにして保持するホルダ６２を設け、この下方に、電子ビーム蒸着源６４を配置し、上記ホルダ６２を矢印６６に示すように走査して両基板４、６の表面に配向膜をそれぞれ形成するようにした機構を設けるようにしてもよい。   As shown in FIG. 2, the film forming chamber 46 has a holder 56 that holds the pixel electrode substrate 4 and the transparent electrode substrate 6, and a sputtering target is included above the holder 56. An ion beam source 58 is provided. By scanning the ion beam source 58 in the direction of an arrow 60, material molecules are scattered to form alignment films on the surfaces of both substrates 4 and 6, respectively. In place of the configuration shown in FIG. 2, as shown in FIG. 3, a holder 62 that holds both the substrates 4 and 6 downward is provided, and an electron beam evaporation source 64 is disposed below the holder 62. May be provided so as to form alignment films on the surfaces of both substrates 4 and 6 by scanning as shown by arrow 66.

上記シール接着剤・液晶処理室４８は、その内部にシール接着剤を塗布するためのシールディスペンサ２４と液晶を滴下するための液晶ディスペンサ２８とが設けられており、基板の表面にシール接着剤を塗布し、且つ液晶を分量の制御性良く滴下できるようになっている。上記貼り合わせ室５０は、その内部に基板接合機構６８を有しており、上記両基板４、６を、その間に液晶を介在させた状態で先に塗布したシール接着剤により、貼り合わせて接合できるようになっている。   The seal adhesive / liquid crystal processing chamber 48 is provided with a seal dispenser 24 for applying the seal adhesive and a liquid crystal dispenser 28 for dropping the liquid crystal, and the seal adhesive is applied to the surface of the substrate. It can be applied and the liquid crystal can be dropped with good controllability. The bonding chamber 50 has a substrate bonding mechanism 68 inside, and the substrates 4 and 6 are bonded and bonded together with a seal adhesive previously applied with a liquid crystal interposed therebetween. It can be done.

上記シール硬化室５２は、その内部に紫外線照射ランプ３６を有しており、例えば紫外線硬化樹脂よりなる上記シール接着剤を硬化できるようになっている。尚、シール接着剤として熱硬化樹脂を用いることもでき、この場合には紫外線照射ランプ３６に代えて熱線を放射する例えば熱線ランプ等を設ける。   The seal curing chamber 52 has an ultraviolet irradiation lamp 36 inside thereof, and can cure the seal adhesive made of, for example, an ultraviolet curable resin. A thermosetting resin can also be used as the seal adhesive. In this case, for example, a heat ray lamp that emits heat rays is provided instead of the ultraviolet irradiation lamp 36.

次に、上記したように構成された製造装置４０を用いて行われる本発明に係る液晶表示素子の製造方法の一例を図４も参照して説明する。図４は本発明に係る液晶表示素子の製造方法の一例を示すフローチャートである。   Next, an example of a method for manufacturing a liquid crystal display element according to the present invention performed using the manufacturing apparatus 40 configured as described above will be described with reference to FIG. FIG. 4 is a flowchart showing an example of a method for manufacturing a liquid crystal display device according to the present invention.

まず、外部より画素電極基板４と透明電極基板６の両基板が基板ロード室４４内へ搬入されて、ここに例えば複数枚ずつ予め収容されている。この画素電極基板４の表面には前工程で画素電極１０（図５参照）がすでにマトリクス状に形成されており、また透明電極基板６の表面には前工程で透明電極１６（図５参照）がすでに形成されている。上記搬送室４２内は通常時には真空状態に維持されており、必要時には例えばＮ２ ガス等を導入することにより大気圧復帰される。また、各室４４、４６、４８、５０、５２間の基板の移動、或いは搬送は、搬送ロボット５４が屈伸及び旋回することにより行われる。尚、必要な場合には、この搬送ロボット５４をＺ軸（垂直）方向へ移動できるようにしてもよい。 First, both the pixel electrode substrate 4 and the transparent electrode substrate 6 are carried into the substrate load chamber 44 from the outside, and, for example, a plurality of substrates are accommodated therein in advance. The pixel electrodes 10 (see FIG. 5) are already formed in a matrix on the surface of the pixel electrode substrate 4 in the previous step, and the transparent electrodes 16 (see FIG. 5) are formed on the surface of the transparent electrode substrate 6 in the previous step. Has already formed. The inside of the transfer chamber 42 is normally maintained in a vacuum state, and is returned to atmospheric pressure by introducing, for example, N 2 gas or the like when necessary. Further, the movement or transfer of the substrate between the chambers 44, 46, 48, 50 and 52 is performed by the transfer robot 54 bending and stretching. If necessary, the transfer robot 54 may be moved in the Z-axis (vertical) direction.

そして、上記基板ロード室４４内は真空引きされて所定の真空度になると、上記基板ロード室４４から上記画素電極基板４と透明電極基板６の両基板を、真空状態になされた搬送室４２を介して、予め真空状態に維持されている上記成膜室４６内へ搬送する（Ｓ１）。そして、この成膜室４６内では、図２に示すような機構を用いてイオンビームスパッタ法により、或いは図３に示したような機構を用いて電子ビーム蒸着法により、上記両基板４、６の表面にそれぞれ配向膜１４、１８（図５参照）を形成することにより配向膜形成工程を行なう（Ｓ２）。この配向膜１４、１８としては、例えばＳｉＯ２ 膜等の無機配向膜を用いることができる。またこの成膜時の圧力は、例えば１０−２Ｐａ以下である。 When the inside of the substrate load chamber 44 is evacuated to a predetermined degree of vacuum, both the pixel electrode substrate 4 and the transparent electrode substrate 6 are transferred from the substrate load chamber 44 to the transfer chamber 42 in a vacuum state. Then, the film is transferred into the film forming chamber 46 which has been previously maintained in a vacuum state (S1). In the film forming chamber 46, both the substrates 4 and 6 are formed by ion beam sputtering using a mechanism as shown in FIG. 2 or by electron beam evaporation using a mechanism as shown in FIG. An alignment film forming step is performed by forming alignment films 14 and 18 (see FIG. 5) on the surfaces of the films (S2). As the alignment films 14 and 18, for example, an inorganic alignment film such as a SiO 2 film can be used. Moreover, the pressure at the time of this film-forming is 10 <-2 > Pa or less, for example.

次に、上記配向膜を形成したならば、上記両基板の内のいずれか一方の基板、例えば画素電極基板４を、真空状態の搬送室４２を介して予め真空状態になされているシール接着剤・液晶処理室４８へ搬送する（Ｓ３）。   Next, when the alignment film is formed, a sealing adhesive in which any one of the two substrates, for example, the pixel electrode substrate 4 is previously evacuated through the vacuum transfer chamber 42. Transfer to the liquid crystal processing chamber 48 (S3).

そして、この処理室４８内では、真空状態を維持したまま上記画素電極基板４の表示エリアの周囲に、シールディスペンサ２４を用いて紫外線硬化型のシール接着剤２０（図５参照）を塗布して接着剤塗布工程を行ない、更に、液晶ディスペンサ２８を用いて上記シール接着剤２０により囲まれた表示エリアに液晶ＬＣを所定量滴下することにより液晶滴下工程を行なう（Ｓ４）。この時の液晶ＬＣの分量は、後の基板貼り合わせ完成後に均一なセルギャップとなるように高精度にコントロールされる。また、この時の処理室４８内の圧力は、例えば１０−１Ｐａ以下に設定する。尚、ここで上記画素電極基板４に代えて、透明電極基板６にシール接着剤２０を塗布するようにしてもよく、この場合には、接合時に上記表示エリアに対応する対応エリアを囲むようにしてシール接着剤２０を塗布する。 In the processing chamber 48, an ultraviolet curable seal adhesive 20 (see FIG. 5) is applied around the display area of the pixel electrode substrate 4 using the seal dispenser 24 while maintaining a vacuum state. An adhesive application step is performed, and a liquid crystal dropping step is performed by dropping a predetermined amount of liquid crystal LC on the display area surrounded by the seal adhesive 20 using the liquid crystal dispenser 28 (S4). The amount of the liquid crystal LC at this time is controlled with high accuracy so as to obtain a uniform cell gap after completion of the subsequent bonding of the substrates. Further, the pressure in the processing chamber 48 at this time is set to 10 −1 Pa or less, for example. Here, instead of the pixel electrode substrate 4, a sealing adhesive 20 may be applied to the transparent electrode substrate 6. In this case, the sealing is performed so as to surround a corresponding area corresponding to the display area at the time of bonding. Adhesive 20 is applied.

次に、液晶ＬＣの滴下された上記画素電極基板４及び透明電極基板６を、真空状態の搬送室４２を介して予め真空状態になされている貼り合わせ室５０内へ搬送する（Ｓ５）。この場合、他方の透明電極基板６は、上記成膜室４６から直接搬送するようにしてもよいし、搬送室４２内の図示しない保管場所に一時的に保管し、その後、貼り合わせ室５０内へ搬送するようにしてもよい。   Next, the pixel electrode substrate 4 and the transparent electrode substrate 6 onto which the liquid crystal LC has been dropped are transported into the bonding chamber 50 that has been in a vacuum state in advance through the vacuum transport chamber 42 (S5). In this case, the other transparent electrode substrate 6 may be directly transferred from the film forming chamber 46 or may be temporarily stored in a storage location (not shown) in the transfer chamber 42 and then in the bonding chamber 50. You may make it convey to.

このように、両基板４、６が、貼り合わせ室５０内へ搬入されたならば、真空状態を維持しつつ上記基板接合機構６８を用いて、上記両配向膜が対向するようにして上記両基板４、６をシール接着剤２０により貼り合わせて接合することにより貼り合わせ工程を行なう（Ｓ６）。
このように、両基板４、６の貼り合わせ接合が完了したならば、この貼り合わせ室５０内にＮ２ 等の不活性ガスを導入して真空度を徐々に緩和する方向へコントロールし、最終的に大気圧状態とする。これにより、貼り合わされた基板における各表示エリアのセルギャップは調整されて所望する値となる（Ｓ７）。このように、両基板４、６に配向膜１４、１８を形成した後から両基板４、６を貼り合わせするまでは、上記両基板４、６を大気圧雰囲気中に晒すことなく、常に真空雰囲気状態中に存在するようにし、配向膜１４、１８の表面に水分や不純物等が付着しないようにする。 As described above, when both the substrates 4 and 6 are carried into the bonding chamber 50, both the alignment films are opposed to each other using the substrate bonding mechanism 68 while maintaining a vacuum state. A bonding process is performed by bonding the substrates 4 and 6 together with the sealing adhesive 20 and bonding them (S6).
As described above, when the bonding of the substrates 4 and 6 is completed, an inert gas such as N 2 is introduced into the bonding chamber 50 to control the degree of vacuum gradually. To atmospheric pressure. Thereby, the cell gap of each display area in the bonded substrate is adjusted to a desired value (S7). In this way, after the alignment films 14 and 18 are formed on both the substrates 4 and 6 and until the substrates 4 and 6 are bonded together, the substrates 4 and 6 are always exposed to vacuum without being exposed to an atmospheric pressure atmosphere. It is made to exist in an atmospheric condition so that moisture, impurities, etc. do not adhere to the surfaces of the alignment films 14 and 18.

上記貼り合わせ工程を行っている間に、上記搬送室４２内に例えばＮ２ 等の不活性ガスを供給して、この中を大気圧復帰させておく（Ｓ８）。
そして、大気圧状態になされた上記貼り合わせ室５０から貼り合わせられた基板４、６を、大気圧復帰された搬送室４２を介してシール硬化室５２内へ搬送する（Ｓ９）。そして、このシール硬化室５２内で紫外線照射ランプ３６を用いて紫外線を照射することにより上記シール接着剤２０を硬化させる（Ｓ１０）。これにより、両基板４、６は、表示エリア内に液晶ＬＣを封止した状態で強固に一体的に結合されることになる。 During the bonding process, an inert gas such as N 2 is supplied into the transfer chamber 42, and the inside is returned to atmospheric pressure (S8).
And the board | substrates 4 and 6 bonded from the said bonding chamber 50 made into atmospheric pressure state are conveyed in the seal hardening chamber 52 through the conveyance chamber 42 by which atmospheric pressure was returned (S9). Then, the seal adhesive 20 is cured by irradiating ultraviolet rays using the ultraviolet irradiation lamp 36 in the seal curing chamber 52 (S10). Thereby, both the substrates 4 and 6 are firmly and integrally coupled in a state where the liquid crystal LC is sealed in the display area.

この場合、すでに基板４、６が接合されて配向膜１４、１８が大気に晒されることがないので、シール硬化室５２内の雰囲気を、大気圧とすることができる。
このようにして、シール接着剤２０を硬化したならば、この貼り合わせ基板４、６を、真空状態、或いは大気圧状態の搬送室４２を介して先の基板ロード室４４内へ搬送して戻すことにより（Ｓ１１）、処理が終了する。 In this case, since the substrates 4 and 6 are already bonded and the alignment films 14 and 18 are not exposed to the atmosphere, the atmosphere in the seal curing chamber 52 can be set to atmospheric pressure.
When the seal adhesive 20 is cured in this way, the bonded substrates 4 and 6 are transferred back into the previous substrate load chamber 44 via the transfer chamber 42 in a vacuum state or atmospheric pressure state. (S11), the process ends.

以後は、搬送室４２内を真空引きして、上記操作を繰り返し行うことになる。また、搬送室４２内を所定の圧力にするために要する真空引き時間や、この中を大気圧復帰させるために要する時間によっては、直前の基板の処理が完了する前に、待機中の次の基板の処理を開始するようにしてもよい。いずれにしても、両基板４、６に形成された配向膜１４、１８が大気圧雰囲気になされた状態の搬送室４２内に晒されないような状態で両基板４、６を搬送するように処理のスケジューリングが行われる。   Thereafter, the inside of the transfer chamber 42 is evacuated and the above operation is repeated. In addition, depending on the evacuation time required to bring the inside of the transfer chamber 42 to a predetermined pressure and the time required to return the inside of the transfer chamber 42 to atmospheric pressure, the next waiting state may be completed before the processing of the immediately preceding substrate is completed. You may make it start the process of a board | substrate. In any case, the alignment films 14 and 18 formed on both the substrates 4 and 6 are processed so as to transport both the substrates 4 and 6 without being exposed to the transfer chamber 42 in an atmospheric pressure atmosphere. Scheduling is performed.

このように、画素電極基板４や透明電極基板６にそれぞれ配向膜１４、１８を形成した後に、両基板を大気圧雰囲気に晒すことなくシール接着剤２０の塗布、液晶滴下及び両基板の貼り合わせを行うようにしたので、配向膜への不純物の付着や経時変化を抑制することができ、この結果、表示品質や製品歩留まりを更に向上させることができる。
また、上記の製造方法で作製された液晶表示素子は、液晶ＬＣの配向特性が均一で画像として評価した場合、駆動時の明暗ムラや明るさの経時変化がほとんど無く、リアプロジェクションディスプレイに搭載した場合は、各素子において明るさの経時変化がないため、画像調整としてのγ（ガンマ）調整工程が簡便になり、また色度の経時変化がなく寿命の長い映像デバイスを供することができる。 As described above, after the alignment films 14 and 18 are formed on the pixel electrode substrate 4 and the transparent electrode substrate 6, respectively, the sealing adhesive 20 is applied, the liquid crystal is dropped, and the two substrates are bonded to each other without exposing both substrates to an atmospheric pressure atmosphere. Therefore, it is possible to suppress the adhesion of impurities to the alignment film and the change with time, and as a result, the display quality and the product yield can be further improved.
In addition, the liquid crystal display device manufactured by the above-described manufacturing method is mounted on a rear projection display with almost no unevenness in brightness or change in brightness over time when the alignment characteristics of the liquid crystal LC are uniform and evaluated as an image. In this case, since the brightness does not change with time in each element, the γ (gamma) adjustment process as image adjustment becomes simple, and a video device with no long-term change in chromaticity and a long lifetime can be provided.

尚、上記実施例では、シール接着剤・液晶処理室４８よりなる１つの室内でシール接着剤２０の塗布工程と、液晶ＬＣの滴下工程とを行うようにしたが、この処理室４８を２つに分離して２つの処理室にし、一方の室でシール接着剤２０の塗布工程を行い、他方の室で液晶滴下工程を行うようにしてもよい。この場合、例えば搬送室４２を６角形に形成して全ての室を搬送室４２の周辺に接合するようにすればよい。   In the above-described embodiment, the coating process of the sealing adhesive 20 and the dropping process of the liquid crystal LC are performed in one chamber composed of the sealing adhesive / liquid crystal processing chamber 48. However, two processing chambers 48 are provided. It is possible to divide into two processing chambers, perform the coating process of the sealing adhesive 20 in one chamber, and perform the liquid crystal dropping process in the other chamber. In this case, for example, the transfer chamber 42 may be formed in a hexagon and all the chambers may be joined to the periphery of the transfer chamber 42.

また、ここでは大口径の半導体ウエハ上に複数の表示エリアが形成されている画素電極基板４を例にとって説明したが、これに限定されず、半導体ウエハ上に単一の表示エリアを有する基板を成膜処理等するようにしてもよいし、或いは、予め個々の表示エリア毎に切断分離した複数の画素電極基板４を整列配置した状態で成膜処理等を行ってもよい。
更には、ここでは反射型の液晶表示素子を例にとって説明したが、これに限定されず、透過型の液晶表示素子にも本発明を適用することができる。 Further, here, the pixel electrode substrate 4 in which a plurality of display areas are formed on a large-diameter semiconductor wafer has been described as an example, but the present invention is not limited to this, and a substrate having a single display area on a semiconductor wafer is described. A film forming process or the like may be performed, or a film forming process or the like may be performed in a state in which a plurality of pixel electrode substrates 4 cut and separated in advance for each individual display area are arranged and arranged.
Furthermore, although a reflective liquid crystal display element has been described as an example here, the present invention is not limited to this, and the present invention can also be applied to a transmissive liquid crystal display element.

本発明に係る液晶表示素子の製造装置を示す概略構成図である。It is a schematic block diagram which shows the manufacturing apparatus of the liquid crystal display element which concerns on this invention. 成膜室内の構造を示す概略構成図である。It is a schematic block diagram which shows the structure in the film-forming chamber. 成膜室の変形例の構造を示す概略構成図である。It is a schematic block diagram which shows the structure of the modification of a film-forming chamber. 本発明に係る液晶表示素子の製造方法の一例を示すフローチャートである。It is a flowchart which shows an example of the manufacturing method of the liquid crystal display element which concerns on this invention. 一般的な反射型の液晶表示素子の一例を示す拡大断面図である。It is an expanded sectional view showing an example of a general reflection type liquid crystal display element. 図５に示す液晶表示素子を示す分解斜視図である。FIG. 6 is an exploded perspective view showing the liquid crystal display element shown in FIG. 5. 液晶表示素子の製造方法の初期の段階を説明するための斜視図である。It is a perspective view for demonstrating the initial stage of the manufacturing method of a liquid crystal display element. 従来の液晶表示素子の製造装置の一例を示す概略構成図である。It is a schematic block diagram which shows an example of the manufacturing apparatus of the conventional liquid crystal display element.

符号の説明Explanation of symbols

２…液晶表示素子、４…画素電極基板、６…透明電極基板、１０…画素電極、１２…表示エリア、１４，１８…配向膜、１６…透明電極、２０…シール接着剤、２４…シールディスペンサ、２８…液晶ディスペンサ、３６…紫外線照射ランプ、４０…液晶表示素子の製造装置、４２…搬送室、４４…基板ロード室、４６…成膜室、４８…シール接着剤・液晶処理室、５０…貼り合わせ室、５２…シール硬化室、５４…搬送ロボット、Ｌ…読み出し光、ＬＣ…液晶。

2 ... Liquid crystal display element, 4 ... Pixel electrode substrate, 6 ... Transparent electrode substrate, 10 ... Pixel electrode, 12 ... Display area, 14, 18 ... Alignment film, 16 ... Transparent electrode, 20 ... Seal adhesive, 24 ... Seal dispenser 28 ... Liquid crystal dispenser, 36 ... Ultraviolet irradiation lamp, 40 ... Manufacturing apparatus for liquid crystal display element, 42 ... Transfer chamber, 44 ... Substrate loading chamber, 46 ... Deposition chamber, 48 ... Seal adhesive / liquid crystal processing chamber, 50 ... Bonding chamber, 52 ... seal curing chamber, 54 ... transport robot, L ... readout light, LC ... liquid crystal.

Claims (2)

複数の画素電極を配列してなる表示エリアを少なくとも１つ有する画素電極基板の表面に配向膜を形成し、共通な透明電極を有する透明電極基板の表面に配向膜を形成し、
前記画素電極と前記透明電極とを対向させて間に液晶を介在させて前記両基板をシール接着剤により接合することにより前記液晶を封止してなる液晶表示素子の製造方法において、
真空中にて前記画素電極基板及び透明電極基板の表面に前記配向膜をそれぞれ形成する配向膜形成工程と、
前記配向膜形成工程後に、真空中にて前記画素電極基板の表示エリアを囲むようにして、或いは前記表示エリアに対応する前記透明電極基板の対応エリアを囲むようにして前記シール接着剤を塗布する接着剤塗布工程と、
前記接着剤塗布工程後に、前記シール接着剤で囲まれたエリアに前記液晶を滴下する液晶滴下工程と、
前記液晶滴下工程後に、真空中にて前記両基板を互いに貼り合わせる貼り合わせ工程と、
を有すると共に、前記配向膜形成工程から前記貼り合わせ工程までを真空を保持した状態で行なうことを特徴とする液晶表示素子の製造方法。 Forming an alignment film on the surface of a pixel electrode substrate having at least one display area formed by arranging a plurality of pixel electrodes, forming an alignment film on the surface of a transparent electrode substrate having a common transparent electrode,
In the method of manufacturing a liquid crystal display element, wherein the liquid crystal is sealed by bonding the two substrates with a seal adhesive with a liquid crystal interposed between the pixel electrode and the transparent electrode.
An alignment film forming step of forming the alignment film on the surface of the pixel electrode substrate and the transparent electrode substrate in vacuum,
After the alignment film forming step, an adhesive application step of applying the seal adhesive so as to surround the display area of the pixel electrode substrate in vacuum or to surround the corresponding area of the transparent electrode substrate corresponding to the display area. When,
After the adhesive application step, a liquid crystal dropping step of dropping the liquid crystal in an area surrounded by the seal adhesive,
After the liquid crystal dropping step, a bonding step of bonding the two substrates together in a vacuum,
And a method of manufacturing a liquid crystal display element, wherein the steps from the alignment film forming step to the bonding step are performed in a vacuum state. 複数の画素電極を配列してなる表示エリアを少なくとも１つ有する画素電極基板の表面に配向膜を形成し、共通な透明電極を有する透明電極基板の表面に配向膜を形成し、
前記画素電極と前記透明電極とを対向させて間に液晶を介在させて前記両基板をシール接着剤により接合することにより前記液晶を封止してなる液晶表示素子の製造装置において、
必要に応じて真空雰囲気と大気圧雰囲気とを選択的に実現できて内部に基板搬送用の搬送ロボットを有する搬送室と、
前記搬送室に連結されて真空中にて前記画素電極基板と前記透明電極基板の表面にそれぞれ配向膜を形成する成膜室と、
前記搬送室に連結されて真空中にて前記配向膜が形成された前記画素電極基板、或いは前記透明電極基板にシール接着剤を塗布すると共に、前記シール接着剤で囲まれたエリアに液晶を滴下するシール接着剤・液晶処理室と、
前記搬送室に連結されて真空中にて前記両基板を互いに貼り合わせる貼り合わせ室と、
を備えたことを特徴とする液晶表示素子の製造装置。
Forming an alignment film on the surface of a pixel electrode substrate having at least one display area formed by arranging a plurality of pixel electrodes, forming an alignment film on the surface of a transparent electrode substrate having a common transparent electrode,
In an apparatus for manufacturing a liquid crystal display element, wherein the liquid crystal is sealed by bonding the both substrates with a seal adhesive with a liquid crystal interposed between the pixel electrode and the transparent electrode,
A transfer chamber that can selectively realize a vacuum atmosphere and an atmospheric pressure atmosphere as necessary, and has a transfer robot for substrate transfer inside,
A film formation chamber connected to the transfer chamber to form alignment films on the surfaces of the pixel electrode substrate and the transparent electrode substrate in vacuum; and
A seal adhesive is applied to the pixel electrode substrate or the transparent electrode substrate, which is connected to the transfer chamber and formed with the alignment film in a vacuum, and a liquid crystal is dropped on an area surrounded by the seal adhesive. Sealing adhesive / liquid crystal processing chamber,
A bonding chamber connected to the transfer chamber and bonding the substrates together in a vacuum;
An apparatus for manufacturing a liquid crystal display element, comprising:
JP2006207487A 2006-07-31 2006-07-31 Method for manufacturing liquid crystal display element and manufacturing apparatus therefor Pending JP2008033076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006207487A JP2008033076A (en) 2006-07-31 2006-07-31 Method for manufacturing liquid crystal display element and manufacturing apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006207487A JP2008033076A (en) 2006-07-31 2006-07-31 Method for manufacturing liquid crystal display element and manufacturing apparatus therefor

Publications (1)

Publication Number Publication Date
JP2008033076A true JP2008033076A (en) 2008-02-14

Family

ID=39122563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006207487A Pending JP2008033076A (en) 2006-07-31 2006-07-31 Method for manufacturing liquid crystal display element and manufacturing apparatus therefor

Country Status (1)

Country Link
JP (1) JP2008033076A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7172708B2 (en) 2019-02-20 2022-11-16 株式会社Ｊｖｃケンウッド Liquid crystal device manufacturing equipment

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318325A (en) * 1986-07-10 1988-01-26 Canon Inc Manufacture of liquid crystal element
JPH04372933A (en) * 1991-06-24 1992-12-25 Toshiba Corp Manufacture of liquid crystal display element
JP2000223548A (en) * 1999-01-28 2000-08-11 Toshiba Corp Manufacture apparatus for display
JP2003107481A (en) * 2001-10-01 2003-04-09 Fujitsu Display Technologies Corp Method of manufacturing liquid crystal display panel
JP2004157452A (en) * 2002-11-08 2004-06-03 Seiko Epson Corp Electrooptical device and manufacturing apparatus therefor
JP2004177542A (en) * 2002-11-26 2004-06-24 Victor Co Of Japan Ltd Method and device for manufacturing liquid crystal display element
JP2005099269A (en) * 2003-09-24 2005-04-14 Sharp Corp Method for manufacturing liquid crystal display panel
JP2005099270A (en) * 2003-09-24 2005-04-14 Sharp Corp Method and apparatus for manufacturing liquid crystal display panel
JP2005107468A (en) * 2003-09-30 2005-04-21 Mikuni Denshi Kk Alignment method for liquid crystal display and its assembling method

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318325A (en) * 1986-07-10 1988-01-26 Canon Inc Manufacture of liquid crystal element
JPH04372933A (en) * 1991-06-24 1992-12-25 Toshiba Corp Manufacture of liquid crystal display element
JP2000223548A (en) * 1999-01-28 2000-08-11 Toshiba Corp Manufacture apparatus for display
JP2003107481A (en) * 2001-10-01 2003-04-09 Fujitsu Display Technologies Corp Method of manufacturing liquid crystal display panel
JP2004157452A (en) * 2002-11-08 2004-06-03 Seiko Epson Corp Electrooptical device and manufacturing apparatus therefor
JP2004177542A (en) * 2002-11-26 2004-06-24 Victor Co Of Japan Ltd Method and device for manufacturing liquid crystal display element
JP2005099269A (en) * 2003-09-24 2005-04-14 Sharp Corp Method for manufacturing liquid crystal display panel
JP2005099270A (en) * 2003-09-24 2005-04-14 Sharp Corp Method and apparatus for manufacturing liquid crystal display panel
JP2005107468A (en) * 2003-09-30 2005-04-21 Mikuni Denshi Kk Alignment method for liquid crystal display and its assembling method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7172708B2 (en) 2019-02-20 2022-11-16 株式会社Ｊｖｃケンウッド Liquid crystal device manufacturing equipment

Similar Documents

Publication Publication Date Title
JP4207599B2 (en) Manufacturing method of liquid crystal panel
US7999467B2 (en) Display device and manufacturing method thereof for minimizing inflow of oxygen and moisture from the outside
US20090058292A1 (en) Flat panel display and fabricating method thereof
US20070057295A1 (en) Substrate bonding method and apparatus
US20130016308A1 (en) Liquid crystal display element, method for manufacturing same, and liquid crystal display device comprising the liquid crystal display element
JP2006049308A (en) Display device, manufacturing method of the same, and manufacturing device for the same
CN104793399B (en) Display device and preparation method thereof
JPH08160407A (en) Production of liquid crystal display element
US20050122464A1 (en) One-drop fill spacerless process for liquid crystal cell on a silicon backplane or microdisplays
JP2008033076A (en) Method for manufacturing liquid crystal display element and manufacturing apparatus therefor
JP2011064866A (en) Method for manufacturing liquid crystal display element and image display apparatus using the element produced thereby
US20170186994A1 (en) Organic light-emitting display panel, display apparatus containing the same, and related packaging method
US7485203B2 (en) Assembly method for display panel
JP2005234309A (en) Method for manufacturing optical component and optical component
JP2004095245A (en) Sealing apparatus
JP5136865B2 (en) Organic EL panel sealing method and sealing device
JP2009186538A (en) Method of manufacturing substrate
JP7172708B2 (en) Liquid crystal device manufacturing equipment
JP2008083327A (en) Method of manufacturing liquid crystal device
US20070170835A1 (en) Flat fluorescent lamp, method of manufacturing the same, and display apparatus having the same 111
JP2007004002A (en) Liquid crystal dropping device
JP2006004708A (en) Sealing device, sealing method, organic el device and electronic apparatus
JP2009014843A (en) Optical path deflecting element, its manufacturing method, and image-display device
KR101184066B1 (en) Fabricating apparatus for flat display device
JP2005165136A (en) Manufacturing apparatus of liquid crystal display element

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20081226

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110603

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110809

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20111012

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20111213