JP2008029386A - Method for manufacturing plate for needle-like body and method for manufacturing needle-like body - Google Patents

Method for manufacturing plate for needle-like body and method for manufacturing needle-like body Download PDF

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JP2008029386A
JP2008029386A JP2006203188A JP2006203188A JP2008029386A JP 2008029386 A JP2008029386 A JP 2008029386A JP 2006203188 A JP2006203188 A JP 2006203188A JP 2006203188 A JP2006203188 A JP 2006203188A JP 2008029386 A JP2008029386 A JP 2008029386A
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JP4936214B2 (en
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Masahiro Ueno
雅弘 上野
Hiroshi Sugimura
浩 杉村
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a plate which is suitable for the large-scale production for manufacturing a fine array-like needle-like body which has a sharp distal end part and a thick base part and shows an excellent strength and a method for manufacturing the biocompatible needle-like body by using the plate. <P>SOLUTION: The method for manufacturing the plate for forming the needle-like bodies integrally molded in an array shape on a substrate 10 includes (1) the process of performing a first process of forming a mask 11 having opening parts at positions where hole shapes corresponding to a plurality of needle-like bodies are formed and of forming the hole shapes which correspond to main bodies of the needle-like bodies, are vertically cut deep, and have the shape of a rectangular solid by using a dry etching method and (2) the process of performing a second process of peeling the mask 11 and forming the distal end part of the needle-like body and a slanting shape at a site corresponding to the base part by crystal anisotropic etching. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、ドラッグデリバリーシステム(以下 DDSとする) 等の医療、創薬に用いる微細針を製造するための針状体の版型製造方法および針状体の製造方法に関する。   The present invention relates to a method for producing a needle-shaped plate and a method for producing a needle-like body for producing fine needles for use in medicine and drug discovery such as a drug delivery system (hereinafter referred to as DDS).

近年、医療・創薬における分野では、痛みを伴わない無痛針として微細な針状体の開発が進められている。   In recent years, in the field of medicine and drug discovery, the development of fine needles as painless needles without pain has been promoted.

微細な針状体の種類として、1本のみで使用されるものとアレイ状に配置され使用されるものがある。   There are two types of fine needles, one that is used alone and the other that is used in an array.

従来、微細な針状体は、シリコンをその材質とするものが多く見られる。その製造方法の一つとして、特許文献1に開示されているように、シリコン基板にマスクを設けた後、等方性エッチングまたは結晶異方性エッチングを施し、ある程度針の先端を形成し、さらに異方性エッチングを施し、針本体を形成した後、側面に堆積した堆積層を除去し、さらに勾配エッチングを施し先端を尖らせるというような方法がとられている。   Conventionally, many fine needles are made of silicon. As one of the manufacturing methods, as disclosed in Patent Document 1, after providing a mask on a silicon substrate, isotropic etching or crystal anisotropic etching is performed to form a needle tip to some extent, After anisotropic etching is performed to form the needle body, the deposited layer deposited on the side surface is removed, and further, gradient etching is performed to sharpen the tip.

しかし、該方法ではマスクを設けた状態で、その直下部分を細らせることによりマスクが倒壊し、歩留まりが悪くなるという問題点がある。また、該方法では勾配エッチングにより先端を尖らせる方法として、HNO3/HF/CH3COOH/H2O溶液を用いた勾配エッチングを行っているが、針の先端が形成された時点で、先の細い先端部が優先的にエッチングされるため、先端部の先鋭度が得られない。 However, in this method, there is a problem in that the mask is collapsed by thinning the portion immediately below the mask, and the yield is deteriorated. Further, in this method, gradient etching using an HNO 3 / HF / CH 3 COOH / H 2 O solution is performed as a method of sharpening the tip by gradient etching, but when the tip of the needle is formed, the tip is formed. Since the thin tip portion of the film is preferentially etched, the sharpness of the tip portion cannot be obtained.

また、DDSに用いられる無痛針の材料として、シリコンの針をそのまま用いた場合、万一体内で折れた時に、固体のシリコン針がそのまま体内に残ってしまうという不都合が生じるため、原版より転写を繰り返し、生態適合性のある材質の最終製品を作製することが必要になる。   In addition, as a painless needle material used in DDS, if a silicon needle is used as it is, there will be a disadvantage that the solid silicon needle will remain in the body when it is broken in the body, so transfer from the original plate. Repeatedly, it will be necessary to produce a final product of a biocompatible material.

この時、シリコンの針を原版とすると最終製品までに少なくとも二回の転写工程が必要であり、大量生産をする場合の歩留まりが悪くなる。   At this time, if the silicon needle is used as the original plate, at least two transfer steps are required until the final product, which deteriorates the yield in mass production.

また、医療、創薬の分野においては、人体への影響を無視することは出来ない。このため人体へ用いる用途においては、人体への影響が低負荷である材料を用いた針状体が望まれる。このような人体の影響が低負荷である材料としてポリ乳酸などを用いた微細な針状体を形成した例が報告されている(特許文献2)。
特開2005-199392号公報(段落番号0004参照) 特開2005-21677号公報
In the fields of medicine and drug discovery, the influence on the human body cannot be ignored. For this reason, a needle-like body using a material that has a low impact on the human body is desired for use in the human body. There has been reported an example in which a fine needle-like body using polylactic acid or the like is formed as a material having such a low impact on the human body (Patent Document 2).
Japanese Patent Laying-Open No. 2005-199392 (see paragraph number 0004) JP 2005-21677 A

従って、本発明が解決しようとする技術的課題は、大量生産に適し、先端部が鋭利で根元部が太く、強度の高い微細なアレイ状の針状体を製造するための版型と、該版型を用いる、生体に適合する針状体の製造方法を提供することである。   Therefore, the technical problem to be solved by the present invention is a plate mold for manufacturing a fine array of needles suitable for mass production, sharp at the tip and thick at the root, and having high strength. It is to provide a method for producing a needle-shaped body that is compatible with a living body, using a plate mold.

本発明は、上記の技術的課題を鑑みてなされたものであって、以下の構成による針状体の版型製造方法および針状体の製造方法を提供する。   The present invention has been made in view of the above technical problem, and provides a method for producing a needle-shaped plate and a method for producing a needle-like body having the following configuration.

請求項1に記載の発明は、アレイ状に一体成型することの出来る、針状体を形成するための版型を製造する方法であって、
(1)複数の針状体に対応する穴型を形成すべき箇所を開口部とするようなマスクを形成し、ドライエッチング法を用いて針状体の本体に対応する垂直に深掘りされた直方体状の穴型を形成する第1のプロセスを施す工程と、
(2)前記マスクを剥離し、結晶異方性エッチングによって針状体の先端部および根元部に対応する部位に傾斜形状を形成する第2のプロセスを施す工程と、
を有してなることを特徴とする前記製造方法である。
請求項2に記載の発明は、前記版型の材質がシリコンであることを特徴とする請求項1に記載の製造方法である。
請求項3に記載の発明は、前記垂直に深掘りされた直方体状の穴型の側面がシリコン(110)面であることを特徴とする請求項2に記載の製造方法である。
請求項4に記載の発明は、前記針状体の先端部に対応する傾斜形状がシリコンの(111)面で構成される穴型を有してなることを特徴とする請求項2または3に記載の製造方法である。
請求項5に記載の発明は、前記針状体の根元部に対応する傾斜形状がシリコンの(311)面で構成される穴型を有してなることを特徴とする請求項2〜4のいずれかに記載の製造方法である。
請求項6に記載の発明は、請求項1〜5のいずれかの製造方法により製造された版型を用いて、生体適合性樹脂を用いた針状体を形成することを特徴とする針状体の製造方法である。
The invention according to claim 1 is a method of manufacturing a plate mold for forming a needle-like body, which can be integrally formed into an array.
(1) A mask having openings corresponding to a plurality of needles corresponding to a plurality of needle-like bodies was formed, and was deeply dug vertically corresponding to the main body of the needle-like body using a dry etching method. Applying a first process for forming a rectangular parallelepiped hole mold;
(2) peeling the mask and performing a second process of forming an inclined shape at a portion corresponding to the tip and root of the acicular body by crystal anisotropic etching;
It is the said manufacturing method characterized by having.
The invention according to claim 2 is the manufacturing method according to claim 1, wherein the material of the plate is silicon.
A third aspect of the present invention is the manufacturing method according to the second aspect, wherein a side surface of the rectangular parallelepiped hole mold that is deeply dug is a silicon (110) surface.
According to a fourth aspect of the present invention, in the second or third aspect, the inclined shape corresponding to the tip of the needle-like body has a hole shape constituted by a (111) surface of silicon. It is a manufacturing method of description.
The invention according to claim 5 has a hole shape in which an inclined shape corresponding to a root portion of the needle-like body is constituted by a (311) plane of silicon. It is the manufacturing method in any one.
According to a sixth aspect of the present invention, a needle-like body using a biocompatible resin is formed using the plate mold produced by the production method according to any one of the first to fifth aspects. It is a manufacturing method of a body.

請求項1に記載の発明によれば、大量生産に適し、先端部が鋭利で根元部が太く、強度の高い微細なアレイ状の針状体を製造するための版型と、該版型を用いて製造された、生体に適合する針状体を提供することができる。   According to the first aspect of the present invention, a plate mold for manufacturing a fine array-like needle-shaped body that is suitable for mass production, has a sharp tip, a thick root, and high strength, and the plate It is possible to provide a needle-like body that is manufactured by using and compatible with a living body.

請求項2に記載の発明によれば、版型の材質をシリコンとしているので、加工性・耐消耗性などに優れ、微細な加工に適し、またシリコン基板(シリコンウェハ)は半導体工程などに用いられており、入手が容易かつ安価である。また、シリコンは結晶異方性エッチング加工に対して、面方位によって大きくエッチング速度が違うため、針状体の先端部形状となる斜めのテーパ面を容易に形成することが出来る。   According to the invention described in claim 2, since the material of the plate is made of silicon, it is excellent in workability and wear resistance and is suitable for fine processing, and a silicon substrate (silicon wafer) is used for a semiconductor process or the like. It is easy to obtain and inexpensive. Further, since the etching rate of silicon differs greatly depending on the plane orientation with respect to the crystal anisotropic etching process, it is possible to easily form an inclined tapered surface that becomes the shape of the tip of the needle-like body.

また、請求項3に記載の発明のように、垂直に深掘りされた直方体状の穴型の側面をシリコン(110)面とし、結晶異方性エッチング加工を行えば、請求項4に記載の発明のように、針状体の先端部に対応する傾斜形状がシリコンの(111)面で構成されるようになる。この場合、エッチング速度の遅い(111)面が(110)面に対して35.3度の角度で形成される。この角度は、シリコンの持つ物性によって必然的に決定される角度である。これにより、針状体の先端部の角度θは70.6度となる。さらに、請求項5に記載の発明のように、針状体の根元部に対応する傾斜形状がシリコンの(311)面で構成されるようにすれば、版型から針状体を取り出す際に抜け易く有利となり、かつ、この面が針状体の土台となり、針状体の強度も増加し、好ましい。   Further, as in the invention described in claim 3, when the side surface of the rectangular parallelepiped-shaped hole shape is a silicon (110) surface and crystal anisotropic etching is performed, the crystal anisotropic etching process is performed. As in the invention, the inclined shape corresponding to the tip of the needle-like body is constituted by the (111) plane of silicon. In this case, the (111) plane having a low etching rate is formed at an angle of 35.3 degrees with respect to the (110) plane. This angle is an angle inevitably determined by the physical properties of silicon. Thereby, the angle θ of the tip of the needle-like body is 70.6 degrees. Further, when the inclined shape corresponding to the root portion of the needle-like body is constituted by the (311) plane of silicon as in the invention described in claim 5, the needle-like body is taken out from the plate mold. This surface is advantageous because it is easy to come off, and this surface is the base of the needle-like body, which increases the strength of the needle-like body.

また、請求項6に記載の発明によれば、請求項1〜5のいずれかの製造方法により製造された版型を用いていることから、生体適合性樹脂を用いた針状体を生産性よく製造することができ、DDSに用いられる無痛針の材料等に、とくに有利である。   Further, according to the invention described in claim 6, since the plate mold manufactured by the manufacturing method of any one of claims 1 to 5 is used, the needle-shaped body using the biocompatible resin is productive. It can be manufactured well and is particularly advantageous for materials for painless needles used in DDS.

以下、本発明のアレイ状に一体成型することの出来る、微細な針状体を形成するための版型の製造方法について、図1〜図3を参照しつつ、工程順に詳細に説明する。   Hereinafter, a plate manufacturing method for forming a fine needle-like body that can be integrally formed into an array according to the present invention will be described in detail in the order of steps with reference to FIGS.

(1) シリコンウェハ上にレジストマスクをパターニングする工程(図1(a)〜(c))
まず、図1(a)に示したように、シリコンウェハ10を準備し、図1(b)〜(c)に示したように、レジストマスク11をシリコンウェハ10の表側の面に塗布し、所定の形状にパターニングする。パターニングは、例えば図2に示すように、複数の針状体に対応する穴型を形成すべき箇所を開口部11aとするマスクとなるように行うのが好ましい。
開口部11aは、図2に示すように四角形の形状を成し、シリコンウェハ10の(100)面上に形成される。このとき、開口部11aは、開口部11aにおける四角形のいずれか一辺がシリコンウェハ10の(110)面と平行になるように配置される。
また、レジストには、例えばポジ型レジストを用いる。レジスト塗布には、例えばスピンコーターを用いる。露光には、アライナを用いる。
(1) Patterning a resist mask on a silicon wafer (Figures 1 (a) to (c))
First, as shown in FIG. 1A, a silicon wafer 10 is prepared, and as shown in FIGS. 1B to 1C, a resist mask 11 is applied to the front surface of the silicon wafer 10, Patterning into a predetermined shape. For example, as shown in FIG. 2, the patterning is preferably performed so as to be a mask having openings 11a at locations where hole shapes corresponding to a plurality of needle-like bodies are to be formed.
The opening 11a has a rectangular shape as shown in FIG. 2 and is formed on the (100) plane of the silicon wafer 10. At this time, the opening 11a is arranged such that any one side of the square in the opening 11a is parallel to the (110) plane of the silicon wafer 10.
For the resist, for example, a positive resist is used. For example, a spin coater is used for resist coating. An aligner is used for exposure.

(2) レジストマスクを用いて深掘り加工を施す工程(図1(d))
次に、シリコンウェハ10の表側の面からドライエッチング加工を施し、所定の深さまで垂直に深掘りを行い、図1(d)に示したように、複数の針状体に対応する穴型を形成する。ドライエッチング加工にはICP−RIE(誘導結合型プラズマによる反応性イオンエッチング) 装置を用いる。前述した開口部11aの配置により、深掘り加工を施した際に、穴型内部の側面10bが(110)面となる。
(2) Process of deep digging using a resist mask (Figure 1 (d))
Next, dry etching is performed from the surface on the front side of the silicon wafer 10 and deep digging is performed vertically to a predetermined depth. As shown in FIG. 1D, hole shapes corresponding to a plurality of needle-like bodies are formed. Form. An ICP-RIE (reactive ion etching using inductively coupled plasma) apparatus is used for dry etching. Due to the arrangement of the openings 11a described above, the side surface 10b inside the hole mold becomes the (110) plane when deep digging is performed.

(3) レジストマスクを除去する工程(図1(e))
次に、図1(e)に示したように、シリコンウェハ10上に形成されたレジストマスク11を除去する。レジストマスク11は、例えば酸素プラズマによるアッシングによって除去する。
(3) Process to remove resist mask (Figure 1 (e))
Next, as shown in FIG. 1E, the resist mask 11 formed on the silicon wafer 10 is removed. The resist mask 11 is removed by, for example, ashing using oxygen plasma.

(4) 結晶異方性エッチングを施し、針状体形状を形成する工程(図1(f))
次に、図1(f)に示したように、深掘り加工がなされたシリコンウェハ10に対して結晶異方性エッチングを施す。結晶異方性エッチングは、いわゆるウェットエッチングを行い、例えばテトラメチルアンモニウムヒドロキシド(TMAH)溶液を用い、深掘り加工がなされたシリコンウェハ10を所定の時間浸漬することによって、底面のエッチングが進行しなくなるまで加工する。前述のように、シリコンウェハ10には、表面が(100)面のものを用い、異方性エッチングにより底面の(111)面13が針状体の先端部斜面となるようにエッチングが進行する。深堀り加工で形成された穴型の四方の側面と底面の境界より、それぞれ(111)面が現れ、それらが交わりあったところでエッチングがストップする。
(4) Step of forming an acicular shape by performing crystal anisotropic etching (FIG. 1 (f))
Next, as shown in FIG. 1F, crystal anisotropic etching is performed on the silicon wafer 10 that has been deep-digged. Crystal anisotropic etching performs so-called wet etching, for example, by using a tetramethylammonium hydroxide (TMAH) solution and immersing the silicon wafer 10 that has been deep-digged for a predetermined time, so that etching of the bottom surface proceeds. Process until it runs out. As described above, a silicon wafer 10 having a (100) surface is used, and etching proceeds so that the (111) surface 13 on the bottom surface becomes the tip end slope of the needle-like body by anisotropic etching. . The (111) plane appears from the boundary between the four sides and bottom of the hole shape formed by deep drilling, and the etching stops when they intersect.

また、穴型の入口部では、(100)面側は(311)面12が現れるように、エッチングが進行する。このため、針状体の根元部から本体部となるべき箇所にかけて順テーパ形状が得られる。   Further, in the hole-shaped inlet portion, the etching proceeds so that the (311) plane 12 appears on the (100) plane side. For this reason, a forward taper shape is obtained from the base part of the acicular body to the part to be the main body part.

このような逆テーパ形状は、実際に版型から針状体を取り出す際にも抜けやすく有利であり、また製造された針状体自体の強度も増すという利点も備えている。   Such a reverse taper shape is advantageous in that it can be easily removed even when the needle-shaped body is actually taken out from the plate mold, and has an advantage that the strength of the manufactured needle-shaped body itself is increased.

(5) 生体適合性樹脂を用いた針状体を形成する工程
前記の版型を用い、生体適合性樹脂を用いた針状体を形成する場合は、インプリント法、ホットエンボス法、射出成形法、キャスティング法などによって、針状体の複製を行う。複製品の材質は特に制限されないが、生体適合性材料であるデキストラン、ポリ乳酸、シリコーン等を用いることで、生体に適用可能な針状体を形成できる。
(5) Step of forming a needle-like body using a biocompatible resin When forming the needle-like body using a biocompatible resin using the above-mentioned plate mold, an imprint method, a hot embossing method, an injection molding The needle-shaped body is duplicated by the method of casting or casting. The material of the replicated product is not particularly limited, but a needle-like body applicable to a living body can be formed by using a biocompatible material such as dextran, polylactic acid, or silicone.

以下、本発明を実施例によってさらに説明するが、本発明は下記例に制限されるものではない。   EXAMPLES Hereinafter, although an Example demonstrates this invention further, this invention is not restrict | limited to the following example.

実施例1
(100)面を表面にもつ、厚さ525μmの単結晶シリコンウェハ10を準備した。
Example 1
A single crystal silicon wafer 10 having a (100) plane and a thickness of 525 μm was prepared.

次いで、以下の要領でシリコンウェハ10に対して、深掘り加工を施すための、レジストマスクのパターニング処理を施した。すなわち、シリコンウェハ10の表側の(100)面に、レジストマスク11を公知のスピンコートおよび現像処理法により、複数の針状体に対応する穴型を形成すべき箇所が開口部11aとなるように、レジストマスクを形成した。レジストマスクの厚さは14μmであり、現像液は、ポジ型レジスト用現像液を用いた。   Next, a resist mask patterning process for deep digging was performed on the silicon wafer 10 in the following manner. That is, on the front side (100) of the silicon wafer 10, the resist mask 11 is formed by a well-known spin coating and developing method so that the holes 11a corresponding to a plurality of needle-like bodies are to be formed as the openings 11a. Then, a resist mask was formed. The resist mask had a thickness of 14 μm, and a positive resist developer was used as the developer.

このようにして作製した、レジスト付シリコンウェハ10に対して、ICP-RIEを用いて図1(d)に示すように垂直深掘り加工処理を施し、複数の針状体に対応する直方体状の穴型を形成した。   As shown in FIG. 1 (d), the silicon wafer with resist 10 manufactured in this way is subjected to a vertical deep digging process using ICP-RIE to form a rectangular parallelepiped shape corresponding to a plurality of needle-like bodies. A hole mold was formed.

穴型のシリコンウェハ10に対する垂直方向への深さを200μmとした。   The depth in the vertical direction with respect to the hole-shaped silicon wafer 10 was set to 200 μm.

次に、レジストマスク11を、酸素プラズマを用いたアッシングを30分間施すことによって除去した。   Next, the resist mask 11 was removed by performing ashing using oxygen plasma for 30 minutes.

次に、レジストマスク11が除去されたシリコンウェハ10に結晶異方性エッチング加工を施すことによって、図1(f)に示すように針状体の先端部および根元部に対応する傾斜形状を作成した。   Next, by performing anisotropic crystal etching on the silicon wafer 10 from which the resist mask 11 has been removed, an inclined shape corresponding to the tip and root portions of the needle-like body is created as shown in FIG. did.

エッチング液には12.5%に希釈したTMAH液を6L用意した。   As the etching solution, 6 L of TMAH solution diluted to 12.5% was prepared.

この12.5%に希釈したTMAH液を80℃に昇温し、そこに深掘り加工を施したシリコンウェハ10を40分間浸漬し、その後20分間、超純水に浸漬するリンス処理を施した。   The TMAH solution diluted to 12.5% was heated to 80 ° C., and the silicon wafer 10 subjected to deep digging was immersed therein for 40 minutes, and then rinse treatment was performed for immersion in ultrapure water for 20 minutes.

図3(a)に示すように、シリコンウェハ10の表面10aおよび底面は(100)面であり、穴型内部の側面10bが(110)面となる。TMAH液でエッチングをする場合には、図3(b)、(c)に示すように穴型の底面と側面の境界部よりエッチング速度の遅い(111)面13が表面に現れ、(111)面13同士が接触し合ったところでエッチング速度が急激に落ち、形状が維持される。このようにして出来た逆ピラミッド型の部位が針状体の先端部に対応する形となる。この場合、針状体の先端部の角度θは70.6度となる。また側面と表面の境界部では準安定面の(311)面12が表面に現れ、針状体の土台に対応する形状を形成する。   As shown in FIG. 3A, the front surface 10a and the bottom surface of the silicon wafer 10 are the (100) plane, and the side surface 10b inside the hole mold is the (110) plane. When etching with a TMAH solution, as shown in FIGS. 3B and 3C, a (111) surface 13 whose etching rate is slower than the boundary between the bottom surface and the side surface of the hole mold appears on the surface, and (111) When the surfaces 13 are in contact with each other, the etching rate is rapidly reduced and the shape is maintained. The inverted pyramid portion thus formed has a shape corresponding to the tip of the needle-like body. In this case, the angle θ of the tip of the needle-like body is 70.6 degrees. A metastable (311) surface 12 appears on the surface at the boundary between the side surface and the surface, and forms a shape corresponding to the base of the needle-like body.

このようにして製造された版型を用いて転写を行うと、図4に示すような針状体14がアレイ状に形成された。   When transfer was performed using the plate thus produced, needles 14 as shown in FIG. 4 were formed in an array.

実施例2
前記版型を用い、インプリント法によって、針状体の複製を行った。ここでは生体適合性材料であるポリ乳酸を用いた。これにより、ポリ乳酸から成る針状体を、図4に示す通りのアレイ状に一体成型された形で形成することができた。
Example 2
The needle-shaped body was duplicated by the imprint method using the plate mold. Here, polylactic acid, which is a biocompatible material, was used. Thereby, the acicular body which consists of polylactic acid was able to be formed in the form integrally molded by the array form as shown in FIG.

本発明により得られる版型を用いて製造された針状体は、例えば、医療、生物現象、創薬に用いる微細な針として使用することができる。   The needle-shaped body produced using the plate obtained by the present invention can be used as a fine needle used for medical treatment, biological phenomenon, drug discovery, for example.

版型の製造工程を経時的に説明するための概略断面図である。It is a schematic sectional drawing for demonstrating the manufacturing process of a plate mold over time. シリコンウェハ上に形成した深掘り加工用レジストのパターン配置を示す図である。It is a figure which shows the pattern arrangement | positioning of the resist for deep digging formed on the silicon wafer. 結晶異方性エッチングを経時的に説明するための概略断面図である。It is a schematic sectional drawing for demonstrating crystal anisotropic etching over time. 版型を用いて転写して得られた針状体を説明するための斜視図である。It is a perspective view for demonstrating the acicular body obtained by transcribe | transferring using a plate type | mold.

符号の説明Explanation of symbols

10……シリコン基板(シリコンウェハ)、10a……シリコンウェハの表面、10b……穴型内部の側面、11……レジストマスク、12……(311)面、13……(111)面、14……針状体、θ……先端角。
10 …… Silicon substrate (silicon wafer), 10a …… Silicon wafer surface, 10b …… Side side inside hole mold, 11 …… Resist mask, 12 …… (311) surface, 13 …… (111) surface, 14 …… Needle, θ …… Tip angle.

Claims (6)

アレイ状に一体成型することの出来る、針状体を形成するための版型を製造する方法であって、
(1)基板上に、複数の針状体に対応する穴型を形成すべき箇所を開口部とするようなマスクを形成し、ドライエッチング法を用いて針状体の本体に対応する垂直に深掘りされた直方体状の穴型を形成する第1のプロセスを施す工程と、
(2)前記マスクを剥離し、結晶異方性エッチングによって針状体の先端部および根元部に対応する部位に傾斜形状を形成する第2のプロセスを施す工程と、
を有してなることを特徴とする前記製造方法。
A method of manufacturing a plate for forming a needle-like body, which can be integrally molded into an array,
(1) On the substrate, a mask is formed so as to have openings corresponding to a plurality of needles corresponding to a plurality of needle-like bodies, and a vertical direction corresponding to the main body of the needle-like bodies is formed using a dry etching method. Applying a first process for forming a deeply digged rectangular parallelepiped hole mold;
(2) peeling the mask and performing a second process of forming an inclined shape at a portion corresponding to the tip and root of the acicular body by crystal anisotropic etching;
The manufacturing method characterized by comprising.
前記版型の材質がシリコンであることを特徴とする請求項1に記載の製造方法。   The manufacturing method according to claim 1, wherein a material of the plate mold is silicon. 前記垂直に深掘りされた直方体状の穴型の側面がシリコン(110)面であることを特徴とする請求項2に記載の製造方法。   The manufacturing method according to claim 2, wherein a side surface of the rectangular parallelepiped hole shape deeply dug is a silicon (110) surface. 前記針状体の先端部に対応する傾斜形状がシリコンの(111)面で構成される穴型を有してなることを特徴とする請求項2または3に記載の製造方法。   The manufacturing method according to claim 2 or 3, wherein an inclined shape corresponding to a tip portion of the needle-like body has a hole shape constituted by a (111) surface of silicon. 前記針状体の根元部に対応する傾斜形状がシリコンの(311)面で構成される穴型を有してなることを特徴とする請求項2〜4のいずれかに記載の製造方法。   The manufacturing method according to any one of claims 2 to 4, wherein an inclined shape corresponding to a root portion of the needle-like body has a hole shape constituted by a (311) plane of silicon. 請求項1〜5のいずれかの製造方法により製造された版型を用いて、生体適合性樹脂を用いた針状体を形成することを特徴とする針状体の製造方法。
A needle-shaped body using a biocompatible resin is formed using the plate mold manufactured by the manufacturing method according to claim 1.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009069393A1 (en) * 2007-11-27 2009-06-04 Kureha Corporation Method for manufacturing porous polymer molded article
JP2011013065A (en) * 2009-07-01 2011-01-20 Toppan Printing Co Ltd Apparatus and method for needle-shaped body inspection
KR101622388B1 (en) 2015-10-21 2016-05-19 한국과학기술원 Silicon micro needle stamp and method of fabricating the same
KR101638865B1 (en) * 2015-10-21 2016-07-12 한국과학기술원 Method of fabricating intaglio needle-shaped mold

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US20020082543A1 (en) * 2000-12-14 2002-06-27 Jung-Hwan Park Microneedle devices and production thereof
JP2005021678A (en) * 2003-06-10 2005-01-27 Medorekkusu:Kk Pad base for percutaneous admistration and its manufacturing method

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US20020082543A1 (en) * 2000-12-14 2002-06-27 Jung-Hwan Park Microneedle devices and production thereof
JP2005021678A (en) * 2003-06-10 2005-01-27 Medorekkusu:Kk Pad base for percutaneous admistration and its manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009069393A1 (en) * 2007-11-27 2009-06-04 Kureha Corporation Method for manufacturing porous polymer molded article
JP2009127008A (en) * 2007-11-27 2009-06-11 Kureha Corp Method for producing porous polymer molded article
JP2011013065A (en) * 2009-07-01 2011-01-20 Toppan Printing Co Ltd Apparatus and method for needle-shaped body inspection
KR101622388B1 (en) 2015-10-21 2016-05-19 한국과학기술원 Silicon micro needle stamp and method of fabricating the same
KR101638865B1 (en) * 2015-10-21 2016-07-12 한국과학기술원 Method of fabricating intaglio needle-shaped mold

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