JP2008010893A5 - - Google Patents
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- Publication number
- JP2008010893A5 JP2008010893A5 JP2007248076A JP2007248076A JP2008010893A5 JP 2008010893 A5 JP2008010893 A5 JP 2008010893A5 JP 2007248076 A JP2007248076 A JP 2007248076A JP 2007248076 A JP2007248076 A JP 2007248076A JP 2008010893 A5 JP2008010893 A5 JP 2008010893A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- exposure apparatus
- optical system
- projection optical
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 12
- 230000003287 optical Effects 0.000 claims 8
- 239000007788 liquid Substances 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N precursor Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007248076A JP4533416B2 (ja) | 2007-09-25 | 2007-09-25 | 露光装置およびデバイス製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007248076A JP4533416B2 (ja) | 2007-09-25 | 2007-09-25 | 露光装置およびデバイス製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005291809A Division JP4164508B2 (ja) | 2005-10-04 | 2005-10-04 | 露光装置及びデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008010893A JP2008010893A (ja) | 2008-01-17 |
JP2008010893A5 true JP2008010893A5 (de) | 2009-11-19 |
JP4533416B2 JP4533416B2 (ja) | 2010-09-01 |
Family
ID=39068748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007248076A Expired - Fee Related JP4533416B2 (ja) | 2007-09-25 | 2007-09-25 | 露光装置およびデバイス製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4533416B2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2005951A (en) | 2010-02-02 | 2011-08-03 | Asml Netherlands Bv | Lithographic apparatus and a device manufacturing method. |
WO2013100114A1 (ja) * | 2011-12-28 | 2013-07-04 | 株式会社ニコン | 露光装置、露光方法、デバイス製造方法、液体回収方法、プログラム、及び記録媒体 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI232357B (en) * | 2002-11-12 | 2005-05-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
KR20130010039A (ko) * | 2002-12-10 | 2013-01-24 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
JP4184346B2 (ja) * | 2002-12-13 | 2008-11-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 層上のスポットを照射するための方法及び装置における液体除去 |
JP4352930B2 (ja) * | 2003-02-26 | 2009-10-28 | 株式会社ニコン | 露光装置、露光方法及びデバイス製造方法 |
KR101177331B1 (ko) * | 2003-04-09 | 2012-08-30 | 가부시키가이샤 니콘 | 액침 리소그래피 유체 제어 시스템 |
SG10201604762UA (en) * | 2003-04-10 | 2016-08-30 | Nikon Corp | Environmental system including vacuum scavange for an immersion lithography apparatus |
KR101409565B1 (ko) * | 2003-04-10 | 2014-06-19 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템 |
JP2004320016A (ja) * | 2003-04-11 | 2004-11-11 | Nikon Corp | 液浸リソグラフィシステム |
US7213963B2 (en) * | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101520591B1 (ko) * | 2003-06-13 | 2015-05-14 | 가부시키가이샤 니콘 | 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법 |
CN101436003B (zh) * | 2003-06-19 | 2011-08-17 | 株式会社尼康 | 曝光装置及器件制造方法 |
US6867844B2 (en) * | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
-
2007
- 2007-09-25 JP JP2007248076A patent/JP4533416B2/ja not_active Expired - Fee Related
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