JP2008010893A5 - - Google Patents

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Publication number
JP2008010893A5
JP2008010893A5 JP2007248076A JP2007248076A JP2008010893A5 JP 2008010893 A5 JP2008010893 A5 JP 2008010893A5 JP 2007248076 A JP2007248076 A JP 2007248076A JP 2007248076 A JP2007248076 A JP 2007248076A JP 2008010893 A5 JP2008010893 A5 JP 2008010893A5
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JP
Japan
Prior art keywords
substrate
exposure apparatus
optical system
projection optical
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007248076A
Other languages
English (en)
Japanese (ja)
Other versions
JP4533416B2 (ja
JP2008010893A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007248076A priority Critical patent/JP4533416B2/ja
Priority claimed from JP2007248076A external-priority patent/JP4533416B2/ja
Publication of JP2008010893A publication Critical patent/JP2008010893A/ja
Publication of JP2008010893A5 publication Critical patent/JP2008010893A5/ja
Application granted granted Critical
Publication of JP4533416B2 publication Critical patent/JP4533416B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2007248076A 2007-09-25 2007-09-25 露光装置およびデバイス製造方法 Expired - Fee Related JP4533416B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007248076A JP4533416B2 (ja) 2007-09-25 2007-09-25 露光装置およびデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007248076A JP4533416B2 (ja) 2007-09-25 2007-09-25 露光装置およびデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005291809A Division JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008010893A JP2008010893A (ja) 2008-01-17
JP2008010893A5 true JP2008010893A5 (de) 2009-11-19
JP4533416B2 JP4533416B2 (ja) 2010-09-01

Family

ID=39068748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007248076A Expired - Fee Related JP4533416B2 (ja) 2007-09-25 2007-09-25 露光装置およびデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4533416B2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005951A (en) 2010-02-02 2011-08-03 Asml Netherlands Bv Lithographic apparatus and a device manufacturing method.
WO2013100114A1 (ja) * 2011-12-28 2013-07-04 株式会社ニコン 露光装置、露光方法、デバイス製造方法、液体回収方法、プログラム、及び記録媒体

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI232357B (en) * 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR20130010039A (ko) * 2002-12-10 2013-01-24 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4184346B2 (ja) * 2002-12-13 2008-11-19 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 層上のスポットを照射するための方法及び装置における液体除去
JP4352930B2 (ja) * 2003-02-26 2009-10-28 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR101177331B1 (ko) * 2003-04-09 2012-08-30 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
SG10201604762UA (en) * 2003-04-10 2016-08-30 Nikon Corp Environmental system including vacuum scavange for an immersion lithography apparatus
KR101409565B1 (ko) * 2003-04-10 2014-06-19 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
JP2004320016A (ja) * 2003-04-11 2004-11-11 Nikon Corp 液浸リソグラフィシステム
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101520591B1 (ko) * 2003-06-13 2015-05-14 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
CN101436003B (zh) * 2003-06-19 2011-08-17 株式会社尼康 曝光装置及器件制造方法
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles

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