JP2008010674A - Electronic component and manufacturing method thereof - Google Patents

Electronic component and manufacturing method thereof Download PDF

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JP2008010674A
JP2008010674A JP2006180310A JP2006180310A JP2008010674A JP 2008010674 A JP2008010674 A JP 2008010674A JP 2006180310 A JP2006180310 A JP 2006180310A JP 2006180310 A JP2006180310 A JP 2006180310A JP 2008010674 A JP2008010674 A JP 2008010674A
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electronic component
laminate
electrode
resin layer
unfired
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Kazuhiko Yamano
和彦 山野
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Murata Manufacturing Co Ltd
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Murata Manufacturing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an electronic component capable of improving the reliability of the connection between the internal electrode such as a leader electrode and the external electrode, thereby being capable of relaxing the barrel polishing condition. <P>SOLUTION: The manufacturing method of the electronic component comprises the steps of forming an unbaked leader electrode 112A on an unbaked insulating layer 111A formed on a carrier film 100; forming a curing resin layer 120A whose ends are arranged on the unbaked leader electrodes 112A and 112B, and on the sides of the parts connected to external electrodes 13A and 13B; forming an unbaked lamination 111 by alternately laminating the unbaked insulating layer 111A, an unbaked conductor pattern 112C, and a through-hole conductor 112D on the unbaked leader electrodes 112A, 112 and the curing resin layer 120A; and forming voids 15'A and 15'B by baking the lamination 111 to burn and eliminate the curing resin layer 120A. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、積層型の電子部品の製造方法に関し、特に、携帯電話や電子機器等に使用される積層インダクタ等の電子部品の製造方法及び電子部品に関するものである。   The present invention relates to a method for manufacturing a multilayer electronic component, and more particularly to a method for manufacturing an electronic component such as a multilayer inductor used in a mobile phone, an electronic device, and the like, and the electronic component.

この種の技術としては、例えば特許文献1に記載に記載されたインダクタ及びその製造方法がある。インダクタは、例えば図4に示すように、複数の絶縁層1Aが積層されてなる積層体1と、この積層体1内に形成されたコイル2と、このコイル2の上下の引き出し電極2A、2Bに接続され且つ積層体1の両端面を被覆する左右一対の外部電極3A、3Bと、外部電極3A、3Bに電気的に接続され且つ積層体1の下面に形成された端子電極(図示せず)を備え、積層インダクタとして構成されている。コイル2は、水平方向に上下複数段に渡って形成されたコイル導体2Cと、上下のコイル導体2Cを電気的に接続するスルーホール導体2Dとからなり、上下方向に延びる矩形の螺旋状として形成されている。   As this type of technology, for example, there is an inductor described in Patent Document 1 and a manufacturing method thereof. For example, as shown in FIG. 4, the inductor includes a laminated body 1 in which a plurality of insulating layers 1 </ b> A are laminated, a coil 2 formed in the laminated body 1, and upper and lower lead electrodes 2 </ b> A and 2 </ b> B of the coil 2. And a pair of left and right external electrodes 3A, 3B covering both end faces of the laminate 1 and terminal electrodes (not shown) electrically connected to the external electrodes 3A, 3B and formed on the lower surface of the laminate 1 ) And is configured as a multilayer inductor. The coil 2 includes a coil conductor 2C formed in a plurality of stages in the horizontal direction and a through-hole conductor 2D that electrically connects the upper and lower coil conductors 2C, and is formed as a rectangular spiral extending in the vertical direction. Has been.

図4に示すインダクタは、概ね図5の(a)〜(d)及び図6の(a)〜(c)に示すようにして製造される。まず、図5の(a)に示すように、例えばキャリアフィルム100上の左右両端部に感光性導体ペーストを印刷し、露光、現像を行った後、乾燥して端子電極部4’A、4'Bを形成する。これらの端子電極部4’A、4'B上に感光性絶縁ペーストを印刷、露光して硬化させて、同図の(a)に示す絶縁層1’Aを形成する。その上に感光性導体ペーストを塗布し、露光、現像を行い、同図の(b)に示すように引き出し電極部2’Aを形成する。引き続き、感光性絶縁ペーストを用いて印刷、露光、現像を行い、図5の(c)に示すようにスルーホールHをもつ絶縁層部1'Aを形成する。この上に感光性導体ペーストを塗布し、露光、現像を行い、図5の(d)に示すように引き出し電極部2’A、コイル導体部2'C及びスルーホール導体部2'Dを形成する。これらの工程を繰り返し、所望の特性に応じて絶縁層部とコイル導体部を交互に積層して図6の(a)に示す未焼成の積層体1’の集合基板を作製する。   The inductor shown in FIG. 4 is generally manufactured as shown in FIGS. 5A to 5D and FIGS. 6A to 6C. First, as shown in FIG. 5A, for example, a photosensitive conductive paste is printed on both left and right ends of the carrier film 100, exposed and developed, and then dried to be terminal electrode portions 4′A, 4 'B is formed. A photosensitive insulating paste is printed on these terminal electrode portions 4'A, 4'B, exposed and cured to form an insulating layer 1'A shown in FIG. A photosensitive conductor paste is applied thereon, exposed and developed to form a lead electrode portion 2'A as shown in FIG. Subsequently, printing, exposure, and development are performed using a photosensitive insulating paste to form an insulating layer portion 1′A having a through hole H as shown in FIG. A photosensitive conductor paste is applied thereon, exposed and developed to form a lead electrode portion 2′A, a coil conductor portion 2′C and a through-hole conductor portion 2′D as shown in FIG. To do. These steps are repeated, and the insulating layer portions and the coil conductor portions are alternately laminated according to the desired characteristics to produce a collective substrate of the unfired laminated body 1 ′ shown in FIG.

その後、集合基板からキャリアフィルム100を除去し、集合基板を所定のチップサイズに分割した後、所定の温度で焼成し、図6の(b)に示すように内部にコイル2を備えた積層体1を得た後、例えば導体ペーストを用いてディップ方式で積層体1の両端面に外部電極3A、3Bを形成する。   Thereafter, the carrier film 100 is removed from the aggregate substrate, the aggregate substrate is divided into a predetermined chip size, and then fired at a predetermined temperature. As shown in FIG. 1 is obtained, external electrodes 3A and 3B are formed on both end faces of the laminate 1 by a dip method using, for example, a conductive paste.

特開2005−109097JP2005-109097

しかしながら、上述した従来の電子部品の製造方法では、絶縁層部1’Aと引き出し電極部2’A、2’Bを含むコイル2’との間の焼成時の収縮率の差により、焼成後には引き出し電極部2A、2Bが積層体1内に引きこもるため、積層体1をバレル研磨することより引き出し電極2A、2Bを積層体1の端面から露出させる必要がある。また、バレル研磨の条件は絶縁層1A及びコイル2の材料によって異なるため、バレル研磨の条件設定やバレル研磨量のバラツキにより、引き出し電極2A、2Bの積層体1の端面から十分露出せず、外部電極3A、3Bとの接続信頼性が低下し、オープン不良やQ特性不良をもたらすことがある。   However, in the above-described conventional method for manufacturing an electronic component, after firing, due to a difference in shrinkage rate during firing between the insulating layer portion 1′A and the coil 2 ′ including the extraction electrode portions 2′A and 2′B. Since the lead electrode portions 2A and 2B are pulled into the laminated body 1, it is necessary to expose the lead electrodes 2A and 2B from the end face of the laminated body 1 by barrel polishing the laminated body 1. In addition, since barrel polishing conditions vary depending on the material of the insulating layer 1A and the coil 2, due to the barrel polishing condition setting and the variation in barrel polishing amount, the end surfaces of the stacked body 1 of the extraction electrodes 2A and 2B are not sufficiently exposed, The connection reliability with the electrodes 3A and 3B may be reduced, resulting in an open defect and a Q characteristic defect.

本発明は、上記課題を解決するためになされたもので、引き出し電極等の内部電極と外部電極との接続信頼性を向上させることができ、延いてはバレル研磨の条件を緩和することができる電子部品の製造方法及び電子部品を提供することを目的としている。   The present invention has been made to solve the above-described problems, and can improve the connection reliability between an internal electrode such as a lead electrode and an external electrode, and thus can relax the conditions of barrel polishing. An object of the present invention is to provide an electronic component manufacturing method and an electronic component.

本発明の請求項1に記載の電子部品の製造方法は、複数の絶縁層が積層された積層体内に形成された内部電極と、上記積層体の端面から露出する上記内部電極の端部に接続され且つ上記積層体の上記端面に形成された外部電極と、を備えた電子部品を製造する方法において、基材上に形成された未焼成の絶縁層上に上記外部電極に接続する未焼成の内部電極を形成する工程と、上記未焼成の内部電極上で且つ上記外部電極との接続部側に端部が配置された樹脂層を形成する工程と、上記未焼成の内部電極及び上記樹脂層上に未焼成の絶縁層と未焼成の他の内部電極を交互に積層して未焼成の積層体を作製する工程と、上記未焼成の積層体を焼成して上記樹脂層を消失させて空隙を形成する工程と、を備えたことを特徴とするものである。   According to a first aspect of the present invention, there is provided a method of manufacturing an electronic component comprising: an internal electrode formed in a laminated body in which a plurality of insulating layers are laminated; and an end of the internal electrode exposed from the end surface of the laminated body. And an external electrode formed on the end face of the laminate, and an unfired electrode connected to the external electrode on an unfired insulating layer formed on a substrate. A step of forming an internal electrode, a step of forming a resin layer on the unfired internal electrode and on the connection portion side with the external electrode, the unfired internal electrode and the resin layer A step of alternately laminating unfired insulating layers and other unfired internal electrodes to produce an unfired laminate, and firing the unfired laminate to eliminate the resin layer and voids And a step of forming the structure.

また、本発明の請求項2に記載の電子部品の製造方法は、請求項1に記載の発明において、上記積層体の端面に導体ペーストを塗布して上記空隙を埋める外部電極を形成する工程を備えたことを特徴とするものである。   According to a second aspect of the present invention, there is provided a method for manufacturing an electronic component according to the first aspect of the present invention, comprising the step of forming an external electrode that fills the gap by applying a conductive paste to an end face of the laminate. It is characterized by having.

また、本発明の請求項3に記載の電子部品の製造方法は、請求項1または請求項2に記載の発明において、感光性樹脂ペーストを用いて上記樹脂層を形成することを特徴とするものである。   According to a third aspect of the present invention, there is provided a method for manufacturing an electronic component according to the first or second aspect, wherein the resin layer is formed using a photosensitive resin paste. It is.

また、本発明の請求項4に記載の電子部品の製造方法は、請求項1または請求項2に記載の発明において、非感光性樹脂ペーストを用いて上記樹脂層を形成することを特徴とするものである。   According to a fourth aspect of the present invention, in the method for manufacturing an electronic component according to the first or second aspect, the resin layer is formed using a non-photosensitive resin paste. Is.

また、本発明の請求項5に記載の電子部品は、複数の絶縁層が積層された積層体内に形成された内部電極と、上記積層体の端面から露出する上記内部電極の端部に接続され且つ上記積層体の上記端面に形成された外部電極と、を備えた電子部品において、上記外部電極は、その一部が上記積層体の端面から内方へ突出して上記内部電極に接合されていることを特徴とするものである。   The electronic component according to claim 5 of the present invention is connected to an internal electrode formed in a laminated body in which a plurality of insulating layers are laminated, and an end portion of the internal electrode exposed from an end surface of the laminated body. And an external electrode formed on the end face of the laminate, and a part of the external electrode protrudes inward from the end face of the laminate and is joined to the internal electrode. It is characterized by this.

本発明によれば、引き出し電極等の内部電極と外部電極との接続信頼性を向上させることができ、延いてはバレル研磨条件を緩和することができる電子部品の製造方法及び電子部品を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of an electronic component and electronic component which can improve the connection reliability of internal electrodes, such as an extraction electrode, and an external electrode and can ease a barrel grinding | polishing condition by extension are provided. be able to.

以下、図1〜図3に示す実施形態に基づいて本発明について説明する。尚、各図中、図1は本発明の電子部品の一実施形態を示す断面図、図2の(a)〜(f)はそれぞれ図1に示す電子部品の製造方法の要部を工程順に示す断面図、図3の(a)〜(c)はそれぞれ図2に示す工程の後工程を工程順に示す断面図である。   Hereinafter, the present invention will be described based on the embodiment shown in FIGS. In each figure, FIG. 1 is a cross-sectional view showing an embodiment of the electronic component of the present invention, and FIGS. 2 (a) to 2 (f) show the main part of the method of manufacturing the electronic component shown in FIG. FIGS. 3A to 3C are cross-sectional views showing the subsequent steps of the step shown in FIG.

本実施形態の電子部品10は、例えば図1に示すように、複数の絶縁層11Aが積層された積層体11と、積層体11の内部に上下方向に略矩形状の螺旋状に形成された導体パターン12と、導体パターン12の両端部と電気的に接続され且つ積層体11の左右両側面に形成された一対の外部電極13A、13Bと、を備えている。積層体11の下面は、同図に示すように電子部品10をマザーボード等の実装基板に実装する時の実装面として形成され、この実装面を形成する絶縁層11Aの左右両端部には一対の端子電極14A、14Bが設けられている。   The electronic component 10 of the present embodiment is formed in a multilayer body 11 in which a plurality of insulating layers 11A are stacked and a substantially rectangular spiral in the vertical direction inside the multilayer body 11 as shown in FIG. A conductor pattern 12 and a pair of external electrodes 13A and 13B that are electrically connected to both ends of the conductor pattern 12 and formed on both left and right side surfaces of the multilayer body 11 are provided. The lower surface of the laminate 11 is formed as a mounting surface when the electronic component 10 is mounted on a mounting board such as a mother board as shown in the figure, and a pair of left and right ends of the insulating layer 11A forming this mounting surface Terminal electrodes 14A and 14B are provided.

導体パターン12は、外部電極13A、13Bにそれぞれ接続される引き出し電極12A、12Bと、これらの間で上下の絶縁層11Aの界面に形成されたコイル部12Cと、上下のコイル部12Cを電気的に接続するスルーホール導体12Dとから構成され、全体として複数のコイル部12Cとスルーホール導体12Dとで上下方向に延びる螺旋状のコイルとして形成されている。   The conductor pattern 12 electrically connects the lead electrodes 12A and 12B connected to the external electrodes 13A and 13B, the coil portion 12C formed at the interface between the upper and lower insulating layers 11A, and the upper and lower coil portions 12C, respectively. Is formed as a spiral coil extending in the vertical direction by a plurality of coil portions 12C and the through-hole conductor 12D as a whole.

また、外部電極13A、13Bには、それぞれの内面から対応する引き出し電極12A、12Bの上面に沿って延びる接続拡張部15A、15Bが一体的に形成され、これらの接続拡張部15A、15Bによって外部電極13A、13Bと引き出し電極12A、12Bとの電気的な接続面積を拡張し、外部電極13A、13Bと引き出し電極12A、12Bとをより確実に電気的に接続し、接続信頼性を高めている。これらの接続拡張部15A、15Bは、後述するように外部電極13A、13Bと同時に形成することができる。   The external electrodes 13A and 13B are integrally formed with connection expansion portions 15A and 15B extending from the inner surfaces along the upper surfaces of the corresponding extraction electrodes 12A and 12B. The electrical connection area between the electrodes 13A and 13B and the extraction electrodes 12A and 12B is expanded, and the external electrodes 13A and 13B and the extraction electrodes 12A and 12B are more reliably electrically connected to increase connection reliability. . These connection expansion portions 15A and 15B can be formed simultaneously with the external electrodes 13A and 13B, as will be described later.

而して、絶縁層11Aは、例えばセラミック粉末を含む感光性絶縁ペーストから形成することができる。セラミック粉末は、特に制限されないが、セラミック粉末として、例えば、主成分としてKO−B−SiO系ガラス粉末を含み、副成分としてBi−B−SiO系ガラス粉末を含むものを使用することができる。副成分であるBi−B−SiO系ガラス粉末は、軟化点が450〜550℃でKO−B−SiO系ガラス粉末と比較して融点が低いため、本発明では、セラミック粉末の主成分より融点の低いガラス粉末を低融点ガラス粉末として定義する。 Thus, the insulating layer 11A can be formed from, for example, a photosensitive insulating paste containing ceramic powder. The ceramic powder is not particularly limited, but the ceramic powder includes, for example, K 2 O—B 2 O 3 —SiO 2 glass powder as a main component and Bi 2 O 3 —B 2 O 3 —SiO 2 as a subcomponent. What contains a system glass powder can be used. Bi 2 O 3 —B 2 O 3 —SiO 2 glass powder, which is an accessory component, has a softening point of 450 to 550 ° C. and a lower melting point than K 2 O—B 2 O 3 —SiO 2 glass powder. Therefore, in the present invention, a glass powder having a melting point lower than that of the main component of the ceramic powder is defined as a low melting point glass powder.

また、導体パターン12、外部電極13A、13B、端子電極14A、14B及び接続拡張部15A、15Bは、いずれも金属粉末を含む感光性導体ペーストから形成することができる。金属粉末は、特に制限されないが、金属粉末として、例えば、銀粉末、銅粉末等を使用することができる。また、セラミック粉末としては、上述したKO−B−SiO系ガラス粉末の他、銀粉末、銅粉末等の金属粉末と同時焼成可能なセラミックガラス粉末を二種以上適宜組み合わせて使用しても良い。 The conductor pattern 12, the external electrodes 13A and 13B, the terminal electrodes 14A and 14B, and the connection extension portions 15A and 15B can all be formed from a photosensitive conductor paste containing metal powder. The metal powder is not particularly limited, and for example, silver powder, copper powder, or the like can be used as the metal powder. In addition to the above-mentioned K 2 O—B 2 O 3 —SiO 2 glass powder, the ceramic powder may be appropriately combined with two or more ceramic glass powders that can be fired simultaneously with metal powder such as silver powder and copper powder. May be used.

次に、図2の(a)〜(f)及び図3の(a)〜(c)を参照しながら本発明の電子部品の製造方法の一実施形態について説明する。本実施形態の電子部品10は、例えばフォトリソグラフィ法を用いて製造することができる。   Next, an embodiment of a method for manufacturing an electronic component of the present invention will be described with reference to FIGS. 2 (a) to 2 (f) and FIG. 3 (a) to (c). The electronic component 10 of this embodiment can be manufactured using, for example, a photolithography method.

本実施形態では、予め、積層体11を作製するためのベース基材としてキャリアフィルムを準備する。また、感光性導体ペーストとしては、例えば銀粉末を含むものを準備し、感光性絶縁ペーストとしては、例えばセラミック粉末を含むもの準備する。セラミック粉末は、例えば、KO−B−SiO系ガラス粉末を主成分として含み、Bi−B−SiO系ガラス粉末を副成分として含んでいる。 In this embodiment, a carrier film is prepared in advance as a base substrate for producing the laminate 11. Moreover, as the photosensitive conductor paste, for example, a paste containing silver powder is prepared, and as the photosensitive insulating paste, for example, a paste containing ceramic powder is prepared. The ceramic powder contains, for example, K 2 O—B 2 O 3 —SiO 2 glass powder as a main component and Bi 2 O 3 —B 2 O 3 —SiO 2 glass powder as a subcomponent.

電子部品10を製造する場合には、複数の電子部品10を同時に製造する。図2及び図3では電子部品一個分だけ図示してあるが、実際にはこれらが複数個集合した集合基板として製造し、焼成前に集合基板を個々のチップサイズに分割する。   When the electronic component 10 is manufactured, a plurality of electronic components 10 are manufactured simultaneously. Although only one electronic component is shown in FIGS. 2 and 3, actually, a plurality of these are manufactured as an aggregate substrate, and the aggregate substrate is divided into individual chip sizes before firing.

例えば図2の(a)に示すようにキャリアフィルム100を配置し、このキャリアフィルム100上に、スクリーン印刷で導体ペーストを所定のパターンで塗布して、端子電極部114A、114Bを形成する。引き続き、キャリアフィルム100の上面に感光性絶縁ペーストを塗布して端子電極部114A、114Bを覆った後、全面に紫外線等の光を照射して感光性絶縁ペーストを硬化させて絶縁層部111Aを形成する。この時、端子電極部114A、114Bの外側の端面は絶縁層部111Aの端面と実質的に一致して形成されている。   For example, as shown in FIG. 2A, a carrier film 100 is arranged, and a conductor paste is applied in a predetermined pattern by screen printing on the carrier film 100 to form terminal electrode portions 114A and 114B. Subsequently, a photosensitive insulating paste is applied to the upper surface of the carrier film 100 to cover the terminal electrode portions 114A and 114B, and then the entire surface is irradiated with light such as ultraviolet rays to cure the photosensitive insulating paste to form the insulating layer portion 111A. Form. At this time, the outer end surfaces of the terminal electrode portions 114A and 114B are formed to substantially coincide with the end surface of the insulating layer portion 111A.

その後、絶縁層部111A全面に感光性導体ペーストを塗布して感光性導体ペースト層を形成した後、引き出し電極12A及び渦巻状の導体パターン12Cに即した透孔を有するフォトマスク(図示せず)を絶縁層部111Aの上方に配置し、フォトマスクを介して感光性導体ペースト層に光を照射し、図2の(b)に示すように引き出し電極部112Aと導体パターン部112Cとを一体的に硬化させ、未硬化の部分を現像処理により除去して、引き出し電極部112Aと
導体パターン部121Cとを同時に形成すると共に絶縁層部111Aを露出させる。
Thereafter, a photosensitive conductive paste is applied to the entire surface of the insulating layer 111A to form a photosensitive conductive paste layer, and then a photomask (not shown) having through holes corresponding to the lead electrode 12A and the spiral conductive pattern 12C. Is disposed above the insulating layer portion 111A, the photosensitive conductor paste layer is irradiated with light through a photomask, and the lead electrode portion 112A and the conductor pattern portion 112C are integrated as shown in FIG. The uncured portion is removed by a development process, and the lead electrode portion 112A and the conductor pattern portion 121C are formed simultaneously and the insulating layer portion 111A is exposed.

図2の(c)に示すように絶縁層部111A、引き出し電極部112A及び導体パターン部112Cの上面全面に感光性樹脂ペーストを塗布して感光性樹脂層120を形成した後、フォトマスク200を配置する。フォトマスク200には同図に示すように引き出し電極112A上面の端部に開口部200Aを有している。このフォトマス200を配置した後、フォトマスク200の開口部200Aを介して感光性樹脂層120に光を照射して硬化させ、未硬化部分を現像処理により除去すると、同図の(d)に示すように硬化樹脂層120Aが引き出し電極112A上に残ると共に絶縁層部111Aが露出する。   As shown in FIG. 2C, a photosensitive resin layer 120 is formed by applying a photosensitive resin paste to the entire upper surface of the insulating layer portion 111A, the lead electrode portion 112A, and the conductive pattern portion 112C, and then the photomask 200 is formed. Deploy. As shown in the figure, the photomask 200 has an opening 200A at the end of the upper surface of the extraction electrode 112A. After the photomass 200 is disposed, the photosensitive resin layer 120 is irradiated with light through the opening 200A of the photomask 200 to be cured, and an uncured portion is removed by development processing. As shown, the cured resin layer 120A remains on the lead electrode 112A and the insulating layer portion 111A is exposed.

引き続き、硬化樹脂層120A、引き出し電極部112A及び絶縁層部111Aの露出部全面に感光性絶縁性ペーストを塗布し、絶縁性ペースト層部を形成した後、フォトマスクを介して光を所定のパターンで照射して、図2の(e)に示すようにスルーホールHを有する絶縁層部111Aを形成する。その後、感光性導体ペーストを塗布し、露光、現像して、同図の(f)に示すように導体パターン部112C及びスルーホール導体部112Dを形成する。更に、絶縁層部と導体パターン部をこの順序で交互に必要な層数だけ積層する。そして、最上層の導体パターン層部112C及び引き出し電極部112Bを一体に形成した後、上述した場合と同一の要領で引き出し電極部112Bの上面に端面が揃うように硬化樹脂層を形成し、その上に絶縁層部を最上層に形成して未焼成の積層体が複数集合した集合基板を得る。   Subsequently, a photosensitive insulating paste is applied to the entire exposed portions of the cured resin layer 120A, the extraction electrode portion 112A, and the insulating layer portion 111A to form an insulating paste layer portion, and then light is transmitted through a photomask to a predetermined pattern. As shown in FIG. 2E, an insulating layer portion 111A having a through hole H is formed. Thereafter, a photosensitive conductor paste is applied, exposed and developed to form a conductor pattern portion 112C and a through-hole conductor portion 112D as shown in FIG. Further, the required number of layers are alternately laminated in this order on the insulating layer portions and the conductor pattern portions. Then, after integrally forming the uppermost conductive pattern layer portion 112C and the lead electrode portion 112B, a cured resin layer is formed so that the end face is aligned with the upper surface of the lead electrode portion 112B in the same manner as described above. An insulating layer portion is formed on the uppermost layer to obtain an aggregate substrate in which a plurality of unfired laminates are aggregated.

集合基板からキャリアフィルム100を除去し、この集合基板を個々の積層インダクタになるように所定の大きさに切断した後、図3の(a)に示す未焼成の積層体111が複数得られる。個々の未焼成の積層体111を所定の温度で焼成すると、硬化樹脂層120Aが燃焼して消失し、その部分に空隙15’A、15’Bが形成された同図の(b)に示す積層体11が得られる。   After the carrier film 100 is removed from the aggregate substrate and the aggregate substrate is cut into a predetermined size so as to become individual multilayer inductors, a plurality of unfired multilayer bodies 111 shown in FIG. 3A are obtained. When each unfired laminated body 111 is fired at a predetermined temperature, the cured resin layer 120A burns and disappears, and voids 15′A and 15′B are formed in the portions, as shown in FIG. A laminate 11 is obtained.

次いで、積層体11の両側面に導体ペーストを塗布し、外部電極13A、13Bを形成すると共に空隙15’A、15’B内に導体ペーストを充填した後、所定の温度で焼き付けることにより、外部電極13A、13Bが形成されると共に積層体11の空隙15’A、15’B内の導体ペーストによって接続拡張部15A、15Bが形成される。接続拡張部15A、15Bは外部電極13A、13Bと一体化すると共にそれぞれの引き出し電極12A、12Bに接合される。これにより、外部電極13A、13Bと引き出し電極12A、12Bとの接続面積が拡張されて両者間の接続信頼性が向上する。その後、必要に応じて外部電極13A、13Bにメッキ処理を施すことができる。   Next, a conductive paste is applied to both side surfaces of the multilayer body 11 to form external electrodes 13A and 13B, and the conductive paste is filled in the gaps 15′A and 15′B, followed by baking at a predetermined temperature, thereby The electrodes 13A and 13B are formed, and the connection extending portions 15A and 15B are formed by the conductor paste in the gaps 15′A and 15′B of the multilayer body 11. The connection expansion portions 15A and 15B are integrated with the external electrodes 13A and 13B and joined to the respective extraction electrodes 12A and 12B. As a result, the connection area between the external electrodes 13A and 13B and the lead electrodes 12A and 12B is expanded, and the connection reliability between the two is improved. Thereafter, the external electrodes 13A and 13B can be plated as necessary.

本実施例では、上記要領で0.6mm×0.3mm×0.3mmサイズのインダクタを実施例品1として作製した。また、接続拡張部のないインダクタを比較例品1として作製した。尚、コイル段数は6段であった。   In this example, an inductor having a size of 0.6 mm × 0.3 mm × 0.3 mm was produced as Example Product 1 in the manner described above. In addition, an inductor without a connection extension was produced as Comparative Example Product 1. The number of coil stages was six.

そして、これらのインダクタについて接続率及びバレル時間を測定し、その結果を表1に示した。表1に示す結果によれば、実施例品1は、接続率が向上し、バレル時間が短縮された。   The connection rate and barrel time of these inductors were measured, and the results are shown in Table 1. According to the results shown in Table 1, in Example Product 1, the connection rate was improved and the barrel time was shortened.

Figure 2008010674
Figure 2008010674

以上説明したように本実施形態によれば、キャリアフィルム100上に形成された未焼成の絶縁層部111A上に未焼成の引き出し電極部112Aを形成する工程と、未焼成の引き出し電極部112A、112B上で且つ外部電極13A、13Bとの接続部側に端部が配置された硬化樹脂層120Aを形成する工程と、未焼成の引き出し電極部112A、112C及び硬化樹脂層120A上に未焼成の絶縁層部111Aと未焼成の導体パターン部112C、スルーホール導体部112Dを交互に積層して未焼成の積層体111を作製する工程と、未焼成の積層体111を焼成して硬化樹脂層120A、120Aを燃焼により消失させて空隙15’A、15’Bを形成する工程と、を備えているため、外部電極13A、13Bと一緒に空隙15’A、15’B内に接続拡張部15A、15Bを一体に形成することができ、外部電極13A、13Bと引き出し電極12A、12Bとをより確実に接続することができ、接続信頼性を向上させることができる。   As described above, according to the present embodiment, the step of forming the unfired lead electrode portion 112A on the unfired insulating layer portion 111A formed on the carrier film 100, the unfired lead electrode portion 112A, A step of forming a cured resin layer 120A having an end disposed on the connection portion side with the external electrodes 13A and 13B, and an unfired extraction electrode portions 112A and 112C and an unfired layer on the cured resin layer 120A. Insulating layer portion 111A, unfired conductor pattern portion 112C, and through-hole conductor portion 112D are alternately laminated to produce unfired laminate 111, and unfired laminate 111 is fired to form cured resin layer 120A. , 120A is eliminated by combustion to form voids 15′A and 15′B. Therefore, the voids 15 are formed together with the external electrodes 13A and 13B. A and 15'B can be integrally formed with the connection expansion portions 15A and 15B, and the external electrodes 13A and 13B and the lead electrodes 12A and 12B can be more reliably connected to improve connection reliability. be able to.

また、本実施形態によれば、外部電極13A、13Bを形成する時に空隙15’A、15’B内に引き出し電極12A、12Bとの接続を拡張する接続拡張部15A、15Bを外部電極13A、13Bと一体に形成することができるため、バレル研磨の条件を緩和しても外部電極13A、13Bは引き出し電極12A、12Bの端面以外に接続拡張部15A、15Bを介して引き出し電極12A、12Bの平面部と接合することができ、バレル研磨によって電子部品10の形態を損なうことがない。   Further, according to the present embodiment, when the external electrodes 13A and 13B are formed, the connection expansion portions 15A and 15B that expand the connection with the extraction electrodes 12A and 12B in the gaps 15′A and 15′B are provided as the external electrodes 13A and 15B. Since the outer electrodes 13A and 13B can be formed integrally with the lead electrodes 12A and 12B through the connection expansion portions 15A and 15B in addition to the end surfaces of the lead electrodes 12A and 12B even if the conditions for barrel polishing are relaxed. It can be joined to the flat portion, and the form of the electronic component 10 is not impaired by barrel polishing.

尚、上記実施形態では感光性樹脂ペーストを用いて硬化樹脂層120Aを形成したが、樹脂ペーストは感光性樹脂ペースト以外の熱硬化性樹脂ペーストを用いることができる。熱硬化性樹脂ペーストを用いる場合にはスクリーン印刷などによって所定のパターンで樹脂層を形成すれば良い。また、上記実施形態では電子部品として積層インダクタを製造する場合について説明したが、その他の表面実装用の電子部品であっても良い。   In the above embodiment, the cured resin layer 120A is formed using a photosensitive resin paste. However, a thermosetting resin paste other than the photosensitive resin paste can be used as the resin paste. When a thermosetting resin paste is used, the resin layer may be formed in a predetermined pattern by screen printing or the like. In the above embodiment, the case where the multilayer inductor is manufactured as the electronic component has been described. However, other surface mounting electronic components may be used.

本発明は、携帯電話や電子機器等に使用される積層インダクタ等の電子部品に好適に利用することができる。   INDUSTRIAL APPLICABILITY The present invention can be suitably used for electronic components such as multilayer inductors used for mobile phones and electronic devices.

本発明の電子部品の一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of the electronic component of this invention. (a)〜(f)はそれぞれ図1に示す電子部品の製造方法の要部を工程順に示す断面図である。(A)-(f) is sectional drawing which shows the principal part of the manufacturing method of the electronic component shown in FIG. (a)〜(c)はそれぞれ図2に示す工程の後工程を工程順に示す断面図である。(A)-(c) is sectional drawing which shows the post process of the process shown in FIG. 2 in order of a process, respectively. 従来の電子部品の一例を示す透視斜視図である。It is a perspective view which shows an example of the conventional electronic component. (a)〜(d)はそれぞれ図4に示す電子部品の製造方法の要部を工程順に示す断面図である。(A)-(d) is sectional drawing which shows the principal part of the manufacturing method of the electronic component shown in FIG. 4, respectively in order of a process. (a)〜(c)はそれぞれ図5に示す工程の後工程を工程順に示す断面図である。(A)-(c) is sectional drawing which shows the post process of the process shown in FIG.

符号の説明Explanation of symbols

10 電子部品
11 積層体
11A 絶縁層
12A、12B 引き出し電極部(内部電極)
13A、13B 外部電極
15A、15B 接続拡張部(外部電極の一部)
100 キャリアフィルム
111 未焼成の積層体
111A 絶縁層部
112A、112B 引き出し電極部(未焼成内部電極)
115A、115B 空隙
120A 硬化樹脂層
DESCRIPTION OF SYMBOLS 10 Electronic component 11 Laminated body 11A Insulating layer 12A, 12B Lead electrode part (internal electrode)
13A, 13B External electrode 15A, 15B Connection expansion part (part of external electrode)
100 Carrier film 111 Unsintered laminated body 111A Insulating layer part 112A, 112B Lead electrode part (unsintered internal electrode)
115A, 115B gap 120A cured resin layer

Claims (5)

複数の絶縁層が積層された積層体内に形成された内部電極と、上記積層体の端面から露出する上記内部電極の端部に接続され且つ上記積層体の上記端面に形成された外部電極と、を備えた電子部品を製造する方法において、
基材上に形成された未焼成の絶縁層上に上記外部電極に接続する未焼成の内部電極を形成する工程と、
上記未焼成の内部電極上で且つ上記外部電極との接続部側に端部が配置された樹脂層を形成する工程と、
上記未焼成の内部電極及び上記樹脂層上に未焼成の絶縁層と未焼成の他の内部電極を交互に積層して未焼成の積層体を作製する工程と、
上記未焼成の積層体を焼成して上記樹脂層を消失させて空隙を形成する工程と、を備えた
ことを特徴とする電子部品の製造方法。
An internal electrode formed in a laminate in which a plurality of insulating layers are laminated, an external electrode connected to an end of the internal electrode exposed from the end face of the laminate, and formed on the end face of the laminate, In a method of manufacturing an electronic component comprising:
Forming a green internal electrode connected to the external electrode on the green insulating layer formed on the substrate;
Forming a resin layer having an end disposed on the unfired internal electrode and on the connection portion side with the external electrode;
A step of alternately stacking unfired insulating layers and unfired other internal electrodes on the unfired internal electrodes and the resin layer to produce unfired laminates;
And firing the unfired laminate to eliminate the resin layer to form voids. A method for producing an electronic component, comprising:
上記積層体の端面に導体ペーストを塗布して上記空隙を埋める外部電極を形成する工程を備えたことを特徴とする請求項1に記載の電子部品の製造方法。   The method for manufacturing an electronic component according to claim 1, further comprising a step of forming an external electrode that fills the gap by applying a conductive paste to an end face of the laminate. 感光性樹脂ペーストを用いて上記樹脂層を形成することを特徴とする請求項1または請求項2に記載の電子部品の製造方法。   The method of manufacturing an electronic component according to claim 1, wherein the resin layer is formed using a photosensitive resin paste. 非感光性樹脂ペーストを用いて上記樹脂層を形成することを特徴とする請求項1または請求項2に記載の電子部品の製造方法。   The method for manufacturing an electronic component according to claim 1, wherein the resin layer is formed using a non-photosensitive resin paste. 複数の絶縁層が積層された積層体内に形成された内部電極と、上記積層体の端面から露出する上記内部電極の端部に接続され且つ上記積層体の上記端面に形成された外部電極と、を備えた電子部品において、上記外部電極は、その一部が上記積層体の端面から内方へ突出して上記内部電極に接合されていることを特徴とする電子部品。   An internal electrode formed in a laminate in which a plurality of insulating layers are laminated, an external electrode connected to an end of the internal electrode exposed from the end face of the laminate, and formed on the end face of the laminate, An electronic component comprising: the external electrode, wherein a part of the external electrode protrudes inward from the end face of the laminate and is joined to the internal electrode.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014216370A (en) * 2013-04-23 2014-11-17 株式会社村田製作所 Laminated inductor element and manufacturing method thereof
CN113053620A (en) * 2019-12-27 2021-06-29 株式会社村田制作所 Laminated coil component

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014216370A (en) * 2013-04-23 2014-11-17 株式会社村田製作所 Laminated inductor element and manufacturing method thereof
CN113053620A (en) * 2019-12-27 2021-06-29 株式会社村田制作所 Laminated coil component
CN113053620B (en) * 2019-12-27 2023-12-29 株式会社村田制作所 Laminated coil component

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