JP2008004932A5 - - Google Patents

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Publication number
JP2008004932A5
JP2008004932A5 JP2007151589A JP2007151589A JP2008004932A5 JP 2008004932 A5 JP2008004932 A5 JP 2008004932A5 JP 2007151589 A JP2007151589 A JP 2007151589A JP 2007151589 A JP2007151589 A JP 2007151589A JP 2008004932 A5 JP2008004932 A5 JP 2008004932A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2007151589A
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JP2008004932A (ja
JP4288290B2 (ja
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Priority claimed from DE102006027856A external-priority patent/DE102006027856B3/de
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Publication of JP2008004932A publication Critical patent/JP2008004932A/ja
Publication of JP2008004932A5 publication Critical patent/JP2008004932A5/ja
Application granted granted Critical
Publication of JP4288290B2 publication Critical patent/JP4288290B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007151589A 2006-06-13 2007-06-07 再生できる電極における放電によって極紫外線を発生するための装置 Expired - Fee Related JP4288290B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006027856A DE102006027856B3 (de) 2006-06-13 2006-06-13 Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden

Publications (3)

Publication Number Publication Date
JP2008004932A JP2008004932A (ja) 2008-01-10
JP2008004932A5 true JP2008004932A5 (ja) 2009-02-26
JP4288290B2 JP4288290B2 (ja) 2009-07-01

Family

ID=38608351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007151589A Expired - Fee Related JP4288290B2 (ja) 2006-06-13 2007-06-07 再生できる電極における放電によって極紫外線を発生するための装置

Country Status (4)

Country Link
US (1) US7649187B2 (ja)
JP (1) JP4288290B2 (ja)
DE (1) DE102006027856B3 (ja)
NL (1) NL1033983C2 (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006027856B3 (de) * 2006-06-13 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden
US7897948B2 (en) 2006-09-06 2011-03-01 Koninklijke Philips Electronics N.V. EUV plasma discharge lamp with conveyor belt electrodes
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
JP4952513B2 (ja) * 2007-10-31 2012-06-13 ウシオ電機株式会社 極端紫外光光源装置
WO2009077943A1 (en) * 2007-12-14 2009-06-25 Philips Intellectual Property & Standards Gmbh Method for laser-based plasma production and radiation source, in particular for euv radiation
EP2083328B1 (en) * 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
US8891058B2 (en) * 2008-07-18 2014-11-18 Koninklijke Philips N.V. Extreme UV radiation generating device comprising a contamination captor
WO2010013167A1 (en) * 2008-07-28 2010-02-04 Philips Intellectual Property & Standards Gmbh Method and device for generating euv radiation or soft x-rays
JP4623192B2 (ja) * 2008-09-29 2011-02-02 ウシオ電機株式会社 極端紫外光光源装置および極端紫外光発生方法
NL2004706A (nl) * 2009-07-22 2011-01-25 Asml Netherlands Bv Radiation source.
CZ305364B6 (cs) * 2009-12-02 2015-08-19 Ústav Fyziky Plazmatu Akademie Věd České Republiky, V. V. I. Zařízení pro vyvedení XUV a/nebo měkkého rentgenového záření z komory do vakua a způsob provedení tohoto procesu
US9745589B2 (en) 2010-01-14 2017-08-29 Cornell University Methods for modulating skeletal remodeling and patterning by modulating SHN2 activity, SHN3 activity, or SHN2 and SHN3 activity in combination
US20120050707A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
DE102010047419B4 (de) * 2010-10-01 2013-09-05 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur Erzeugung von EUV-Strahlung aus einem Gasentladungsplasma
DE102013109048A1 (de) 2013-08-21 2015-02-26 Ushio Denki Kabushiki Kaisha Verfahren und Vorrichtung zur Kühlung von Strahlungsquellen auf Basis eines Plasmas
DE102013110760B4 (de) 2013-09-27 2017-01-12 Ushio Denki Kabushiki Kaisha Strahlungsquelle zur Erzeugung von kurzwelliger Strahlung aus einem Plasma
US10021773B2 (en) 2015-11-16 2018-07-10 Kla-Tencor Corporation Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
CN111999989B (zh) * 2020-09-01 2023-07-14 广东省智能机器人研究院 激光等离子体极紫外光源和极紫外光产生方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1621339A1 (de) * 1967-04-29 1971-06-03 Siemens Ag Verfahren zum Herstellen von mit Zinn oder einer ueberwiegend zinnhaltigen Legierung ueberzogenem Kupferdraht,insbesondere Kupferschaltdraht,durch Feuermetallisieren
US4866517A (en) * 1986-09-11 1989-09-12 Hoya Corp. Laser plasma X-ray generator capable of continuously generating X-rays
US6831963B2 (en) * 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
US6320937B1 (en) * 2000-04-24 2001-11-20 Takayasu Mochizuki Method and apparatus for continuously generating laser plasma X-rays by the use of a cryogenic target
DE10342239B4 (de) * 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
RU2278483C2 (ru) * 2004-04-14 2006-06-20 Владимир Михайлович Борисов Эуф источник с вращающимися электродами и способ получения эуф излучения из газоразрядной плазмы
DE102005030304B4 (de) * 2005-06-27 2008-06-26 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung
US7501642B2 (en) * 2005-12-29 2009-03-10 Asml Netherlands B.V. Radiation source
DE102006027856B3 (de) * 2006-06-13 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden
US7897948B2 (en) * 2006-09-06 2011-03-01 Koninklijke Philips Electronics N.V. EUV plasma discharge lamp with conveyor belt electrodes
US7518134B2 (en) * 2006-12-06 2009-04-14 Asml Netherlands B.V. Plasma radiation source for a lithographic apparatus
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby

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