JP2007537112A - Support guide - Google Patents

Abstract

  A support guide (11) for transporting a flexible elongated substrate (13) is described. The support guide (11) includes a support surface (17) and fluid supply means for supplying fluid between the support surface and the substrate (13). The fluid keeps the substrate away from the support surface (17) and the fluid flow between the substrate and the support surface results in a net longitudinal force on the substrate.

Description

  The present invention relates to a support guide for a flexible elongated substrate. Specifically, the present invention relates to a support guide for a flexible elongated substrate on which electronic devices are manufactured. Specifically, the present invention relates to a non-contact support guide for inter-roll manufacturing equipment, for example for use in continuous film processing.

  The present invention also provides a transport apparatus for transporting a flexible elongated substrate (membrane) including at least one support guide and a manufacturing apparatus for manufacturing an electronic device including at least one support guide.

  A number of electronic devices are manufactured by sequentially depositing multiple layers of microscopically aligned structures on a substrate. For example, active matrix display devices are manufactured by depositing a plurality of microscopically patterned and aligned layers of conductors, semiconductors, and insulators on a transparent substrate. Electronic devices manufactured in this way are susceptible to defects caused by external particles that become deposited on the substrate during the manufacturing process. External particles become trapped between the layers, causing the electronic device to malfunction. In order to minimize the number of defects caused by external particles, electronic devices are usually manufactured in a clean air environment known as a clean room.

  Currently, most electronic devices manufactured by the above methods are manufactured on rigid substrates such as glass panels or silicon wafers. However, there is an increasing interest in manufacturing electronic devices on flexible substrates such as plastic thin films.

  The flexible substrate allows the use of reel-to-reel transport. In reel-to-reel transport, the substrate is unwound from an unprocessed reel and passed through a number of processing stages in which the substrate is transported in different directions and taken up on a processing reel. Processing stages can include, for example, a painting stage, a printing stage, a developing stage, a curing stage, and an etching stage. Reel-to-reel transport is known as a low-cost mass production technique that can result in significant productivity and efficiency improvements in the manufacture of electronic devices. However, there are a number of problems associated with the application of conventional reel-to-reel transport technology to electronic device manufacturing.

  First, conventional reel-to-reel transport utilizes a plurality of rotatable rollers to transport the substrate. These rollers usually rotate on bearings, but the rotational motion of the rollers and bearings is a source of external particle contamination in a clean air environment and causes defects in the electronic devices being manufactured.

  Second, in conventional reel-to-reel transport, the surface of the substrate being transported frequently comes into contact with a rotatable roller. Layers of microscopically patterned and aligned structures that are sequentially deposited on a substrate during the manufacture of electronic devices are very sensitive to such contact, which can cause contamination or damage.

  Third, most rollers are not driven in conventional reel-to-reel transport. Instead, only the processed reel on which the processed substrate is wound is driven. Next, the tension in the substrate pulls the substrate onto a roller in the processing stage and unwinds the substrate from the unprocessed reel. Each of the processing stages and the unprocessed reel introduces a resistive load on the substrate due to friction. As a result, the tension in the substrate varies along its length and is maximum at the processing reel end and minimum at the unprocessed reel end. A specific amount of tension is also required to bend the substrate around each roller. Different tensions at each processing stage cause different amounts of strength and creep in the substrate, which limits the dimensional accuracy and resolution of structures deposited on the substrate. Correct alignment of structures deposited at different processing steps is also complicated by variable tension in the substrate. Although air rollers are known, they themselves use a very large amount of air in a clean room, cause turbulence and are energy inefficient.

  The object of the present invention is to solve the problems of the prior art.

  According to a first aspect of the present invention, there is provided a support guide for transporting a flexible elongated substrate, comprising: a support surface; and a fluid supply means for supplying fluid between the support surface and the substrate. Including, the fluid keeps the substrate spaced from the support surface, and the fluid flow between the substrate and the support surface provides a support guide that provides a net longitudinal force on the substrate.

  According to a second aspect of the present invention, there is provided a support guide for transporting a flexible elongated substrate, comprising: a support surface; and a fluid supply means for supplying a fluid between the support surface and the substrate. The support surface envelope is substantially cylindrical, the portion of the support surface through which the substrate passes is curved with a constant first radius of curvature, and the portion of the support surface that the substrate enters or exits is A support guide is provided having a radius of curvature that increases from a constant first radius of curvature to a second radius of curvature where the support surface is substantially straight.

  Therefore, the support guide supports the substrate without contacting the substrate, and the substrate is supported by the fluid cushion. The substrate can be supported by the kinetic energy of the fluid or by the static pressure of the fluid. By supporting the substrate in this manner, the risk of contamination or damage caused by direct contact between the support guide and the substrate may be eliminated.

  The support guide of the present invention does not rotate and has no moving part. As a result, when used in a reel-to-reel process applied to the manufacture of electronic devices, it does not cause any specific contamination in the clean air environment, and the defect rate can be minimized.

  By providing a net longitudinal force on the substrate according to the first aspect of the invention at each support guide in the reel-to-reel transport system, the system can be configured so that the tension in the substrate is substantially constant throughout the system. . This allows for improved resolution and dimensional accuracy of structures deposited on the substrate, as well as improved alignment of structures deposited at different processing stages. The net longitudinal force on the membrane is caused by shear stress from the fluid flow.

  Improved inlet and outlet areas according to the second aspect of the invention can provide increased resistance to fluid flow, thereby reducing flow losses and reducing contamination. In addition, by providing a support region that extends until the substrate is straight, laminar flow can be obtained at the inlet and outlet regions, which can also reduce turbulence.

  In a preferred embodiment, the support guide is further for changing the direction of travel of the substrate, and the support surface defines a substantially cylindrical surface about which the substrate travels. The substrate is held in mechanical equilibrium by the tension in the substrate, which provides a net force toward the support surface, which is opposite to the force of the fluid from the fluid supply means.

  The fluid supply means may include at least one fluid supply passage or jet formed in the support surface to be covered by the substrate. In this case, the axis of the at least one fluid supply passage may be at an angle with respect to the normal of the support surface. The fluid is then directed toward the substrate at an angle relative to the normal of the support surface, thereby providing a net longitudinal force on the substrate.

  The fluid supply means may alternatively or additionally include at least one opening formed in the support surface to be covered by the substrate. In this case, the support surface may define the wall of the chamber to which fluid is supplied. The fluid passes through at least one opening. In an embodiment, the area of the at least one opening formed in the support surface is at least 67%, preferably at least 75%, most preferably at least 80% of the area of the support surface to be covered by the substrate. At least one opening formed in the support surface is preferably configured to be overlapped by the substrate at its edge.

  In a preferred embodiment, the support surface has a variable radius in the substrate entrance region and the substrate exit region. Specifically, the radius may increase gradually away from the central region of the support surface. In this way, fluid flow at the substrate inlet region and substrate outlet region, and thus fluid loss, can be minimized. The reduction in fluid loss improves system efficiency and helps maintain a clean air environment, especially if the fluid is gaseous.

  The substrate inlet region and the substrate outlet region of the support surface are preferably configured to provide a differential fluid flow (fluid loss) between the support surface and the substrate, thereby providing a net longitudinal force on the substrate. This can be achieved by providing a differential spacing between the support surface and the substrate in the substrate entrance region and the substrate exit region.

  For example, there may be a greater spacing between the support surface and the substrate in the substrate exit region than in the substrate entrance region, thereby providing a net longitudinal force in the forward direction on the substrate. Alternatively, there may be a greater spacing between the support surface and the substrate at the substrate exit region than at the substrate exit region, thereby providing a net longitudinal force in the rearward direction on the substrate.

  The fluid supply means may be a pressurized gas supply means, such as a pressurized ionized air supply means, or alternatively a pressurized liquid supply means.

  The present invention also provides a transport apparatus for transporting a flexible elongated substrate and a manufacturing apparatus for manufacturing an electronic device, each including at least one support guide of the present invention.

  The present invention also provides a method for transporting a flexible elongated substrate, the method comprising passing the substrate over a support surface, supplying fluid between the support surface and the substrate, Keeps the substrate away from the support surface, and the fluid flow between the substrate and the support surface provides a net longitudinal force on the substrate.

  Throughout this description, the terms “length” and “length” are used to refer to the direction of travel of an elongated substrate. For example, as the substrate travels around the support guide, the direction of travel of the substrate can change. As a result, the length direction can also change.

  Preferred embodiments of the invention will now be described by way of example only with reference to the accompanying drawings, in which:

  The present invention relates to a support guide for use in reel-to-reel transport. An apparatus for manufacturing an electronic device may utilize reel-to-reel transport. Such a device 1 is shown schematically in FIG. The apparatus includes an unprocessed reel 3 from which an unprocessed flexible elongated substrate is drawn and a processed reel 5 on which the processed substrate is wound. There are a number of processing stages 7 between the reels 3 and 5. The processing stage includes a number of support guides over which the substrate passes and processing equipment (not shown) for processing the substrate. Processing equipment includes, for example, equipment for printing, developing, curing, or etching a substrate.

  FIG. 2 shows a support guide 11 according to the invention. The processing stage 7 shown in FIG. 1 may include some of the support guides shown in FIG. FIG. 2 also shows a flexible elongated substrate 13 to be supported by the support guide 11. The substrate can be a PET film having a width of approximately 1 meter, a thickness of approximately 200 microns, and a Young's modulus of approximately 5 GPa.

  Referring to FIG. 2, the support guide 11 includes a thin-walled cylindrical container 15. The cylindrical container 15 has a length of approximately 1 meter and a radius of approximately 5 centimeters. The outer surface of the cylindrical container 15 forms a support surface 17. In use, the substrate 13 travels around the support surface through an angle of approximately 180 °.

  FIG. 2 schematically shows the fluid supply means 18, which includes a pumped fluid source.

  The tension required in the substrate to bend the substrate around the support guide can be calculated according to the following equation:

ここで、ｗは、基板の幅であり、Ｅは、膜のヤング率であり、ｄは、膜の厚さであり、Ｒは、基板／支持ガイドの曲率半径である。

Where w is the width of the substrate, E is the Young's modulus of the film, d is the thickness of the film, and R is the radius of curvature of the substrate / support guide.

  With respect to the substrate and support guide described above, 1.3N tension is required to bend the substrate around the support guide. For processing steps involving multiple support guides, the total tension can be substantial.

  The cylindrical container 15 of the support guide is supported at both ends by brackets (not shown). The support bracket prevents any rotational movement of the cylindrical container.

  The cylindrical container 15 has an opening 19 formed in the support surface 17. The opening 19 is substantially rectangular (which can of course have a different shape) and is completely covered by the substrate 13 traveling around the support surface 17. Since the width of the opening 19 is smaller than the width of the substrate 11, the substrate 13 overlaps the edge of the opening 19. Similarly, since the length of the opening 19 is smaller than the length of the portion of the substrate 13 around the support surface 17 (ie, the opening extends around less than 180 degrees in this embodiment), the opening 19 The inlet and outlet regions are defined at both longitudinal ends.

  The cylindrical container 15 has a pressurized air inlet manifold (not shown) at one end. Pressurized air is supplied to the cylindrical chamber through a pressurized air inlet manifold. In use, pressurized air flows through openings 19 in support surface 17 and provides a cushion of air between support surface 17 and substrate 13, thereby supporting substrate 13.

  The support surface 17 includes a substrate entrance region 21 and a substrate exit region 23. The substrate entrance region 21 is a region of the support surface 17 where the substrate 13 begins to travel around the support guide 11. The substrate exit region 23 is a region of the support surface 17 where the substrate 13 begins to move away from the support guide 11.

  The outer cover of the support surface 17 is substantially circular in cross section. However, according to the present invention, the substrate inlet region 21 and the substrate outlet region 23 of the support surface 17 conform to the geometry as shown in FIG.

  Specifically, in order to minimize the flow (loss) of pressurized air from the cylindrical container 15 between the support surface 17 and the substrate 13, the substrate inlet region 21 and the substrate outlet region 23 of the support surface 17. Has been extended. This is accomplished by providing the substrate entry region 21 and the substrate exit region 23 with a support surface 17 that closely follows the shape of the bent substrate.

  FIG. 3 shows in detail the cross section of the substrate exit region 23 of the support surface 17. An arrow 29 indicates the traveling direction of the substrate 13. Solid line 25 represents the adapted geometry of the substrate exit area 23. The geometry of the support surface in this area deviates from the circular geometry 27 on which the central area of the support surface is based. In essence, the radius R of the support surface is increased in the exit region 23.

  The adapted geometry 25 provides a narrow gap between the support surface and the substrate. Compared to a configuration in which the support surface has a completely circular geometry, the length of the gap (in the direction of the substrate movement), ie the length from the edge 30 of the opening 19 of the support surface to the point where the support surface and the substrate diverge. The directional distance L is elongated, thereby minimizing air flow (air loss). The gap is preferably of a substantially constant height.

  The inlet and outlet portions of the support surface start with the same curvature R as the main envelope of the support surface, but the curvature is then such that the support surface is locally straight at the inlet and outlet regions: It is increasing to infinity. The elongated inlet and outlet regions provide increased resistance to fluid flow and also provide laminar flow.

  In addition to minimizing air flow, the geometry of the support surface 17 at the substrate inlet region and the substrate outlet region is preferably configured to provide a net longitudinal force on the substrate 13 traveling around the support guide, Thereby, the substrate is advanced around the support guide. This is accomplished by adapting the geometry of the support surface 17 to provide different airflow (air loss) at the substrate inlet region 21 and the substrate outlet region 23, so that a differential force is applied to the substrate. Specifically, the geometry at the substrate entrance region 21 and the substrate exit region 23 is configured such that, in use, the spacing between the support surface 17 and the substrate 13 is greater at the substrate exit region than at the substrate entrance region. Yes.

  By taking advantage of the fact that the substrate seeks mechanical equilibrium, it is possible to provide different spacings for the inlet and outlet regions. Mechanical equilibrium corresponds to air pressure that decreases linearly over the length of the gap in the inlet and outlet regions. This defines the shape and local curvature of the substrate.

  FIG. 4 shows an example of the cross-sectional shape of one embodiment of support. As shown, the inlet region 21 is relatively thin and short and the outlet region 23 is relatively wide and long. Both the inlet and outlet areas are long enough to provide laminar flow.

  FIG. 5 shows a view of the space or gap defined by the support surface 17 and the substrate 13 at the substrate entrance region 21 or the substrate exit region 23. Air flows from the high pressure area 33 near the opening 19 to the ambient pressure area 35 where the substrate branches off from the support surface. The shear force applied to the support surface or substrate is provided by the following equation:

ここで、Ｆ_Ｗは、剪断力であり、ｐは、圧力差であり、ｈは、間隙の高さである。

Here, _FW is the shear force, p is the pressure difference, and h is the height of the gap.

  From Equation 2, it can be seen that the shear force is proportional to the gap height. As a result, a net vertical force can be provided on the substrate 13 by providing gaps of different heights in the substrate entrance region 21 and the substrate exit region 23. This force may be in the direction of travel, thereby reducing the tension in the substrate, or alternatively, may be opposite to the direction of travel, thereby increasing the tension. The latter configuration may be advantageous for processing steps where high substrate tension is required.

  The shear force applied to the support surface or substrate does not depend on the length of the gap between the support surface and the substrate. Thus, the geometry of the support surface is further adapted so that the gap with a greater height is longer. A larger length reduces airflow (air loss) and helps some to compensate for the increased air loss caused by gaps with higher heights.

  FIG. 6 (a) shows an alternative support guide according to the present invention. This support guide is similar to the support guide shown in FIG. However, instead of a fluid supply means that includes an opening formed in the support surface, the fluid supply means includes a plurality of pressurized air passages or jets 31 formed in the support surface 17. The injection port 31 supplies pressurized air between the support surface 17 and the substrate 13. This pressurized air maintains the substrate 13 away from the support surface 17 through either kinetic energy of air or static pressure. The jets are positioned within the support surface such that their axes are at an angle to the normal of the support surface. Pressurized air from the jet travels in the direction of the substrate 13 and strikes the substrate at an angle relative to its normal, thereby providing a net longitudinal force on the substrate. This longitudinal force can be either the direction of travel of the substrate or the opposite of the direction of travel of the substrate. The geometry of the support surface 17 at the substrate entrance region and the substrate exit region can be configured as described above with reference to the support guide shown in FIG.

  Other support guides according to the present invention may provide a planar support surface, where the substrate travels linearly across the support surface. In this case, it is not possible to use the tension in the substrate to keep the substrate in mechanical equilibrium. Therefore, as shown in FIG. 6 (b), the support surface 17 can be provided on either side of the substrate 13. In this case, additional means may be required to ensure the stability of the substrate, but the fluid from the fluid supply means on each support surface 17 is equal and perpendicular to the substrate surface. The opposite force is exerted on the substrate 17. Various modifications may be made to the support guide according to the present invention. For example, the support guide may be configured for use with a pressurized liquid, such as a solvent, instead of pressurized air. Such a support guide can be used, for example, for etching equipment. The fluid supply means may also include a combination of openings and passages or jets.

  Although a few specific examples have been given above, it will be apparent to those skilled in the art that the present invention may be configured in various ways. For example, the roller of the present invention can be designed to redirect the web through any desired angle, such as schematically illustrated in FIG. 1, as well as 180 degrees as in the above embodiment. The various features described above can be used in different combinations than those shown.

It is the schematic which shows the manufacturing apparatus which utilizes the inter-reel technology for transporting a board | substrate. FIG. 3 is a schematic view showing a support guide according to the present invention. FIG. 5 is a detailed view showing the geometry of the support guide at the substrate inlet and outlet regions. It is the schematic which shows an example of the support guide of this invention. It is the schematic which shows the longitudinal force on a board | substrate. FIG. 6 is a schematic diagram illustrating an alternative support guide according to the present invention. FIG. 6 is a schematic diagram illustrating an alternative support guide according to the present invention.

Claims (28)

A support guide for transporting a flexible elongated substrate,
And a fluid supply means for supplying a fluid between the support surface and the substrate, the fluid keeping the substrate spaced from the support surface, the substrate and the support surface, The fluid flow between the support guides provides a net longitudinal force on the substrate. A support guide for transporting a flexible elongated substrate,
A support surface and fluid supply means for supplying fluid between the support surface and the substrate, wherein the support surface is substantially cylindrical and the support surface passes by the substrate A portion of the support surface that is curved with a constant first radius of curvature, and a portion of the support surface into or out of which the substrate enters or exits is that the support surface is substantially straight from the constant first radius of curvature. A support guide having a radius of curvature that increases to a radius of curvature of two.   The support guide according to claim 2, wherein the portions of the support surface into and out of which the substrate enters and exits each have the radius of curvature that increases from the constant first radius of curvature to the second radius of curvature.   4. A support guide according to claim 3, wherein the lengths of the portions of the support surface with different curvatures into and out of the substrate are different.   5. The fluid according to claim 2, wherein the fluid keeps the substrate spaced apart from the support surface, and the fluid flow between the substrate and the support surface provides a net longitudinal force on the substrate. The support guide according to claim 1.   6. To change the direction of travel of the substrate, a portion of the support surface defines a substantially cylindrical surface about which the substrate travels. The support guide described.   The support guide according to claim 6, wherein the fluid supply means includes at least one fluid supply passage formed in the support surface so as to be covered by the substrate.   The support guide according to claim 7, wherein at least one axis of the fluid supply passage is at an angle with respect to a normal of the support surface to provide the net longitudinal force on the substrate.   The support of claim 6, wherein the fluid supply means includes at least one opening formed in the support surface to be covered by the substrate, the support surface defining a wall of a chamber to which the fluid is supplied. guide.   10. A support guide according to claim 9, wherein the area of the at least one opening formed in the support surface is at least 75% of the area of the support surface to be covered by the substrate.   The support guide according to claim 9 or 10, wherein the at least one opening formed in the support surface is arranged at its edge to be overlapped by the substrate.   The support surface is configured to provide a differential fluid flow between the support surface and the substrate at the substrate inlet region and the substrate outlet region, thereby providing a net longitudinal force on the substrate. 12. A support guide according to any one of claims 6 to 11, which provides.   The support surface is configured to provide differential fluid flow at the substrate inlet region and the substrate outlet region by providing a differential spacing between the support surface and the substrate. Support guide.   The support surface is configured to provide a greater spacing between the support surface and the substrate in the substrate exit region than in the substrate entrance region, thereby providing a net longitudinal force on the substrate in a forward direction. The support guide according to claim 13.   The support surface is configured to provide a greater spacing between the support surface and the substrate in the substrate entrance region than in the substrate exit region, thereby providing a net longitudinal force on the substrate in the rearward direction. The support guide according to claim 13.   16. A support guide according to any one of claims 12 to 15, wherein the substrate entry region or the substrate exit region configured to provide a greater spacing is longer.   The support guide according to claim 1, wherein the fluid supply unit is a pressurized gas supply unit.   The support guide according to claim 1, wherein the fluid supply unit is a pressurized liquid supply unit.   A support guide according to any one of the preceding claims, for transporting a flexible elongated substrate on which electronic devices are manufactured.   A transport apparatus for transporting a flexible elongated substrate, comprising a support guide according to any one of the preceding claims.   21. A manufacturing apparatus for manufacturing an electronic device, the manufacturing apparatus including the transport apparatus according to claim 20. A method for transporting a flexible elongated substrate, comprising:
Passing the substrate over a support surface;
Supplying a fluid between the support surface and the substrate;
The fluid keeps the substrate spaced from the support surface, and the fluid flow between the substrate and the support surface provides a net longitudinal force on the substrate.   23. The method of claim 22, wherein the support surface defines a substantially cylindrical surface on which the substrate travels to change the direction of travel of the substrate.   24. The method of claim 23, wherein the fluid is supplied through at least one fluid supply passage formed in the support surface and covered by the substrate.   25. The method of claim 24, wherein at least one axis of the fluid supply passageway is at an angle relative to a normal of the support surface, thereby providing the net longitudinal force on the substrate.   24. The method of claim 23, wherein the fluid is supplied through at least one opening formed in the support surface and covered by the substrate, the support surface defining a wall of a chamber to which fluid is supplied.   27. The net longitudinal force is provided on the substrate by further comprising providing a differential fluid flow between the support surface and the substrate at the substrate inlet region and the substrate outlet region. The method of any one of these.   28. A method according to any one of claims 22 to 27, for transporting a flexible elongated substrate on which electronic devices are manufactured.

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