JP2007500760A5 - - Google Patents
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- Publication number
- JP2007500760A5 JP2007500760A5 JP2006521435A JP2006521435A JP2007500760A5 JP 2007500760 A5 JP2007500760 A5 JP 2007500760A5 JP 2006521435 A JP2006521435 A JP 2006521435A JP 2006521435 A JP2006521435 A JP 2006521435A JP 2007500760 A5 JP2007500760 A5 JP 2007500760A5
- Authority
- JP
- Japan
- Prior art keywords
- residue
- polyformal
- aromatic
- copolyformal
- residues
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical group C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 claims description 2
- 238000013500 data storage Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 238000001125 extrusion Methods 0.000 claims 1
- 238000001746 injection moulding Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- -1 aromatic bisphenols Chemical class 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10333928A DE10333928A1 (de) | 2003-07-25 | 2003-07-25 | Polyformale und Copolyformale mit reduzierter Wasseraufnahme, ihre Herstellung und Verwendung |
| PCT/EP2004/007711 WO2005012379A2 (de) | 2003-07-25 | 2004-07-13 | Polyformale und copolyformale mit reduzierter wasseraufnahme, ihre herstellung und verwendung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007500760A JP2007500760A (ja) | 2007-01-18 |
| JP2007500760A5 true JP2007500760A5 (https=) | 2007-09-06 |
| JP4637100B2 JP4637100B2 (ja) | 2011-02-23 |
Family
ID=34071903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006521435A Expired - Fee Related JP4637100B2 (ja) | 2003-07-25 | 2004-07-13 | 吸水性を低減したポリホルマールおよびコポリホルマール、その製造およびその使用 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7199208B2 (https=) |
| EP (1) | EP1651702B1 (https=) |
| JP (1) | JP4637100B2 (https=) |
| KR (1) | KR101106408B1 (https=) |
| CN (1) | CN100471894C (https=) |
| AT (1) | ATE422511T1 (https=) |
| DE (2) | DE10333928A1 (https=) |
| ES (1) | ES2320893T3 (https=) |
| WO (1) | WO2005012379A2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10333927A1 (de) * | 2003-07-25 | 2005-02-24 | Bayer Materialscience Ag | Polyformale als Coextrusionsschutzschicht auf Polycarbonat |
| DE102004054498A1 (de) * | 2004-11-11 | 2006-05-24 | Bayer Materialscience Ag | Polycarbonat/Polyformal-Blend als Material für optische Datenspeicher mit verminderter Wasseraufnahme |
| US7521119B2 (en) * | 2005-07-07 | 2009-04-21 | Sabic Innovative Plastics Ip B.V. | Windows and other articles made from DMBPC polycarbonate homopolymer and copolymer |
| DE102008036406A1 (de) * | 2008-08-05 | 2010-02-11 | Bayer Materialscience Ag | Modifizierte Polycarbonate mit verbesserten Oberflächeneigenschaften |
| US8436128B2 (en) * | 2008-12-25 | 2013-05-07 | Bayer Intellectual Property Gmbh | Substrate material for high speed optical discs |
| US20170247660A1 (en) * | 2014-09-18 | 2017-08-31 | National Health Research Institutes | Progenitor cells, method for preparation thereof and uses thereof |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2738962A1 (de) | 1976-11-08 | 1978-05-11 | Gen Electric | Filmbildende, ausformbare aromatische polyformalharze und verfahren zu ihrer herstellung |
| US4260733A (en) * | 1978-03-23 | 1981-04-07 | General Electric Company | Method for making aromatic polyformals |
| US4374974A (en) * | 1978-03-23 | 1983-02-22 | General Electric Company | Method for making polyformals and polyformal products made thereby |
| JPS60188426A (ja) * | 1984-03-09 | 1985-09-25 | Idemitsu Kosan Co Ltd | 光学機器用の素材 |
| JPH0781005B2 (ja) * | 1987-02-04 | 1995-08-30 | 出光興産株式会社 | ポリホルマ−ル系樹脂とその製造法 |
| EP0363760A1 (de) * | 1988-10-12 | 1990-04-18 | Bayer Ag | Aromatische Ether |
| JPH02304742A (ja) * | 1989-05-19 | 1990-12-18 | Hitachi Ltd | 光ディスクおよびその製造方法 |
| JP3036774B2 (ja) * | 1990-01-29 | 2000-04-24 | 出光興産株式会社 | ポリホルマール樹脂とその製造法及びそれよりなる光学材料 |
| JP2877415B2 (ja) * | 1990-02-15 | 1999-03-31 | 出光興産株式会社 | ポリエーテル樹脂とその製法及びそれよりなる光学材料 |
| DE19515689A1 (de) * | 1995-04-28 | 1996-10-31 | Bayer Ag | Polysulfon/Polyether-Blockcopolykondensate |
-
2003
- 2003-07-25 DE DE10333928A patent/DE10333928A1/de not_active Withdrawn
-
2004
- 2004-07-13 ES ES04763183T patent/ES2320893T3/es not_active Expired - Lifetime
- 2004-07-13 KR KR1020067001616A patent/KR101106408B1/ko not_active Expired - Fee Related
- 2004-07-13 DE DE502004008976T patent/DE502004008976D1/de not_active Expired - Lifetime
- 2004-07-13 EP EP04763183A patent/EP1651702B1/de not_active Expired - Lifetime
- 2004-07-13 AT AT04763183T patent/ATE422511T1/de not_active IP Right Cessation
- 2004-07-13 WO PCT/EP2004/007711 patent/WO2005012379A2/de not_active Ceased
- 2004-07-13 CN CNB2004800214842A patent/CN100471894C/zh not_active Expired - Fee Related
- 2004-07-13 JP JP2006521435A patent/JP4637100B2/ja not_active Expired - Fee Related
- 2004-07-20 US US10/894,973 patent/US7199208B2/en not_active Expired - Fee Related
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