JP2007318110A5 - - Google Patents

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Publication number
JP2007318110A5
JP2007318110A5 JP2007115527A JP2007115527A JP2007318110A5 JP 2007318110 A5 JP2007318110 A5 JP 2007318110A5 JP 2007115527 A JP2007115527 A JP 2007115527A JP 2007115527 A JP2007115527 A JP 2007115527A JP 2007318110 A5 JP2007318110 A5 JP 2007318110A5
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JP
Japan
Prior art keywords
region
isolation region
element isolation
channel formation
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007115527A
Other languages
English (en)
Japanese (ja)
Other versions
JP5271505B2 (ja
JP2007318110A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007115527A priority Critical patent/JP5271505B2/ja
Priority claimed from JP2007115527A external-priority patent/JP5271505B2/ja
Publication of JP2007318110A publication Critical patent/JP2007318110A/ja
Publication of JP2007318110A5 publication Critical patent/JP2007318110A5/ja
Application granted granted Critical
Publication of JP5271505B2 publication Critical patent/JP5271505B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2007115527A 2006-04-28 2007-04-25 半導体装置 Expired - Fee Related JP5271505B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007115527A JP5271505B2 (ja) 2006-04-28 2007-04-25 半導体装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006127007 2006-04-28
JP2006127007 2006-04-28
JP2007115527A JP5271505B2 (ja) 2006-04-28 2007-04-25 半導体装置

Publications (3)

Publication Number Publication Date
JP2007318110A JP2007318110A (ja) 2007-12-06
JP2007318110A5 true JP2007318110A5 (https=) 2010-06-17
JP5271505B2 JP5271505B2 (ja) 2013-08-21

Family

ID=38851657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007115527A Expired - Fee Related JP5271505B2 (ja) 2006-04-28 2007-04-25 半導体装置

Country Status (1)

Country Link
JP (1) JP5271505B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6190228B2 (ja) * 2013-09-24 2017-08-30 株式会社東芝 半導体装置及び撮像装置
US9941489B2 (en) 2014-09-01 2018-04-10 Samsung Display Co., Ltd. Organic light emitting diode display device and manufacturing method thereof
KR101968666B1 (ko) * 2014-09-01 2019-04-15 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831570A (ja) * 1981-08-20 1983-02-24 Toshiba Corp 半導体装置
JPH02208943A (ja) * 1989-02-08 1990-08-20 Ricoh Co Ltd シリコン薄膜半導体装置の製造方法
JPH03171673A (ja) * 1989-11-29 1991-07-25 Fujitsu Ltd 半導体装置
US5278077A (en) * 1993-03-10 1994-01-11 Sharp Microelectronics Technology, Inc. Pin-hole patch method for implanted dielectric layer
JPH0832072A (ja) * 1994-07-13 1996-02-02 Fuji Xerox Co Ltd 半導体装置

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