JP2007311781A - 窒化物系半導体発光ダイオード - Google Patents
窒化物系半導体発光ダイオード Download PDFInfo
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- JP2007311781A JP2007311781A JP2007119135A JP2007119135A JP2007311781A JP 2007311781 A JP2007311781 A JP 2007311781A JP 2007119135 A JP2007119135 A JP 2007119135A JP 2007119135 A JP2007119135 A JP 2007119135A JP 2007311781 A JP2007311781 A JP 2007311781A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 98
- 150000004767 nitrides Chemical class 0.000 title claims abstract description 92
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000000463 material Substances 0.000 claims description 14
- 239000004020 conductor Substances 0.000 claims description 6
- 230000000694 effects Effects 0.000 abstract description 9
- 230000005611 electricity Effects 0.000 abstract description 6
- 230000003068 static effect Effects 0.000 abstract description 6
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 53
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 8
- 229910002601 GaN Inorganic materials 0.000 description 7
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 229910052594 sapphire Inorganic materials 0.000 description 5
- 239000010980 sapphire Substances 0.000 description 5
- 230000007480 spreading Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 229910002704 AlGaN Inorganic materials 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
Abstract
【解決手段】基板と、前記基板上に形成されたn型窒化物半導体層120と、前記n型窒化物半導体層120上の所定領域に形成された活性層と、前記活性層上に形成されたp型窒化物半導体層と、前記p型窒化物半導体層上にp型枝電極160aを有して形成されたp型電極160と、前記p型枝電極160aの先端部に前記p型枝電極160aの端部幅より大きな幅で形成されたp型ESDパッド160bと、前記活性層が形成されないn型窒化物半導体層120上にn型枝電極150aを有して形成されたn型電極150と、前記n型枝電極150aの先端部に前記n型枝電極150aの端部幅より大きな幅で形成されたn型ESDパッド150bと、を備える。
【選択図】 図4
Description
110 バッファ層
120 n型窒化物半導体層
130 活性層
140 p型窒化物半導体層
150 n型電極
150a n型枝電極
150b n型ESDパッド
160 p型電極
160a p型枝電極
160b n型ESDパッド
170 透明導電体層
Claims (8)
- 基板と、
前記基板上に形成されたn型窒化物半導体層と、
前記n型窒化物半導体層上の所定領域に形成された活性層と、
前記活性層上に形成されたp型窒化物半導体層と、
前記p型窒化物半導体層上にp型枝電極を有して形成されたp型電極と、
前記p型枝電極の先端部に前記p型枝電極の端部幅より大きな幅で形成されたp型ESDパッドと、
前記活性層が形成されていないn型窒化物半導体層上にn型枝電極を有して形成されたn型電極と、
前記n型枝電極の先端部に前記n型枝電極の端部幅より大きな幅で形成されたn型ESDパッドと、を備える窒化物系半導体発光ダイオード。 - 前記n型枝電極及び前記p型枝電極は、1つ以上のラインからなっており、前記ラインが、直線、曲線及び単一閉曲線からなるグループから選択された何れか1つのラインからなることを特徴とする請求項1に記載の窒化物系半導体発光ダイオード。
- 前記n型枝電極及び前記p型枝電極は、互いに対応する前記n型電極及び前記p型電極から一方向に伸びて形成されたことを特徴とする請求項2に記載の窒化物系半導体発光ダイオード。
- 前記n型電極及び前記p型電極は、円状、多角形及び隅が曲線からなる多角形からなるグループから選択された何れか1つからなることを特徴とする請求項1に記載の窒化物系半導体発光ダイオード。
- 前記n型ESDパッド及び前記p型ESDパッドは、円状、多角形及び隅が曲線からなる多角形からなるグループから選択された何れか1つからなることを特徴とする請求項1に記載の窒化物系半導体発光ダイオード。
- 前記n型ESDパッド及び前記p型ESDパッドは、前記n型電極及び前記p型電極と同じ物質からなることを特徴とする請求項1に記載の窒化物系半導体発光ダイオード。
- 前記n型ESDパッド及び前記p型ESDパッドは、前記n型電極及び前記p型電極と互いに異なる物質からなることを特徴とする請求項1に記載の窒化物系半導体発光ダイオード。
- 前記p型窒化物半導体層と前記p型電極との間に形成されている透明導電体層をさらに備えることを特徴とする請求項1に記載の窒化物系半導体発光ダイオード。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2006-0043986 | 2006-05-16 | ||
KR1020060043986A KR20070111091A (ko) | 2006-05-16 | 2006-05-16 | 질화물계 반도체 발광다이오드 |
Publications (2)
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JP2007311781A true JP2007311781A (ja) | 2007-11-29 |
JP4777293B2 JP4777293B2 (ja) | 2011-09-21 |
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JP2007119135A Expired - Fee Related JP4777293B2 (ja) | 2006-05-16 | 2007-04-27 | 窒化物系半導体発光ダイオード |
Country Status (4)
Country | Link |
---|---|
US (1) | US20070284593A1 (ja) |
JP (1) | JP4777293B2 (ja) |
KR (1) | KR20070111091A (ja) |
CN (1) | CN101075656A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011066053A (ja) * | 2009-09-15 | 2011-03-31 | Toyoda Gosei Co Ltd | 発光素子の製造方法及び発光素子 |
JP2012049545A (ja) * | 2010-08-30 | 2012-03-08 | Shogen Koden Kofun Yugenkoshi | 発光装置 |
KR101148189B1 (ko) | 2011-01-04 | 2012-05-23 | 갤럭시아포토닉스 주식회사 | 핑거를 갖는 발광 다이오드 및 발광 다이오드 패키지 |
CN102047453B (zh) * | 2008-04-30 | 2014-04-30 | Lg伊诺特有限公司 | 半导体发光器件 |
US8801256B2 (en) | 2011-02-10 | 2014-08-12 | Samsung Display Co., Ltd. | Light emitting diode package and backlight unit having the same |
JP2017520925A (ja) * | 2014-07-01 | 2017-07-27 | ソウル バイオシス カンパニー リミテッドSeoul Viosys Co.,Ltd. | 発光素子 |
Families Citing this family (17)
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---|---|---|---|---|
CN101271916B (zh) * | 2008-05-09 | 2010-12-29 | 晶能光电(江西)有限公司 | 抗静电氮化镓发光器件及其制造方法 |
KR100941616B1 (ko) * | 2008-05-15 | 2010-02-11 | 주식회사 에피밸리 | 반도체 발광소자 |
DE102008028886B4 (de) * | 2008-06-18 | 2024-02-29 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlungsemittierendes Bauelement und Verfahren zur Herstellung eines strahlungsemittierenden Bauelements |
KR101000276B1 (ko) * | 2008-12-04 | 2010-12-10 | 주식회사 에피밸리 | 반도체 발광소자 |
KR101020910B1 (ko) * | 2008-12-24 | 2011-03-09 | 엘지이노텍 주식회사 | 반도체 발광소자 및 그 제조방법 |
JP5087097B2 (ja) | 2010-03-08 | 2012-11-28 | 株式会社東芝 | 半導体発光素子 |
JP5356312B2 (ja) * | 2010-05-24 | 2013-12-04 | 株式会社東芝 | 半導体発光装置 |
CN101867002A (zh) * | 2010-05-27 | 2010-10-20 | 常州美镓伟业光电科技有限公司 | 一种新型半导体发光二极管 |
KR101021988B1 (ko) * | 2010-06-24 | 2011-03-16 | (주)더리즈 | 반도체 발광 소자 |
EP2448015B1 (en) * | 2010-11-01 | 2018-04-11 | Samsung Electronics Co., Ltd. | Semiconductor light emitting device |
KR102056617B1 (ko) * | 2010-11-01 | 2019-12-17 | 삼성전자주식회사 | 반도체 발광소자 |
TWI418065B (zh) * | 2011-02-22 | 2013-12-01 | Lextar Electronics Corp | 發光二極體 |
KR101179606B1 (ko) * | 2011-03-03 | 2012-09-05 | 주식회사 세미콘라이트 | 반도체 발광소자 |
TW201238081A (en) * | 2011-03-08 | 2012-09-16 | Lextar Electronics Corp | Light emitting diode |
TWI504021B (zh) * | 2011-08-11 | 2015-10-11 | Lextar Electronics Corp | 半導體發光裝置 |
CN206388729U (zh) * | 2014-07-23 | 2017-08-08 | 深圳市国源铭光电科技有限公司 | 一种led光源及led灯 |
KR20200111323A (ko) | 2019-03-18 | 2020-09-29 | 삼성전자주식회사 | 반도체 발광소자 및 그 제조 방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040041160A1 (en) * | 2002-05-24 | 2004-03-04 | Yongsheng Zhao | High power, high luminous flux light emitting diode and method of making same |
JP2004087930A (ja) * | 2002-08-28 | 2004-03-18 | Nichia Chem Ind Ltd | 窒化物半導体発光素子 |
JP2005183910A (ja) * | 2003-12-18 | 2005-07-07 | Samsung Electro Mech Co Ltd | 窒化物半導体発光素子 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100571819B1 (ko) * | 2003-10-16 | 2006-04-17 | 삼성전자주식회사 | 질화물계 발광소자 및 그 제조방법 |
-
2006
- 2006-05-16 KR KR1020060043986A patent/KR20070111091A/ko not_active Application Discontinuation
-
2007
- 2007-04-27 JP JP2007119135A patent/JP4777293B2/ja not_active Expired - Fee Related
- 2007-04-29 CN CNA2007100974526A patent/CN101075656A/zh active Pending
- 2007-05-16 US US11/798,677 patent/US20070284593A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040041160A1 (en) * | 2002-05-24 | 2004-03-04 | Yongsheng Zhao | High power, high luminous flux light emitting diode and method of making same |
JP2004087930A (ja) * | 2002-08-28 | 2004-03-18 | Nichia Chem Ind Ltd | 窒化物半導体発光素子 |
JP2005183910A (ja) * | 2003-12-18 | 2005-07-07 | Samsung Electro Mech Co Ltd | 窒化物半導体発光素子 |
Cited By (19)
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CN102047453B (zh) * | 2008-04-30 | 2014-04-30 | Lg伊诺特有限公司 | 半导体发光器件 |
JP2011066053A (ja) * | 2009-09-15 | 2011-03-31 | Toyoda Gosei Co Ltd | 発光素子の製造方法及び発光素子 |
JP2016122849A (ja) * | 2010-08-30 | 2016-07-07 | 晶元光電股▲ふん▼有限公司 | 発光装置 |
JP2017199927A (ja) * | 2010-08-30 | 2017-11-02 | 晶元光電股▲ふん▼有限公司Epistar Corporation | 発光装置 |
KR20120021221A (ko) * | 2010-08-30 | 2012-03-08 | 에피스타 코포레이션 | 발광 장치 |
KR102312627B1 (ko) | 2010-08-30 | 2021-10-14 | 에피스타 코포레이션 | Led 소자 |
US9171883B2 (en) | 2010-08-30 | 2015-10-27 | Epistar Corporation | Light emitting device |
KR101616094B1 (ko) * | 2010-08-30 | 2016-04-27 | 에피스타 코포레이션 | 발광 장치 |
JP2012049545A (ja) * | 2010-08-30 | 2012-03-08 | Shogen Koden Kofun Yugenkoshi | 発光装置 |
KR101741130B1 (ko) * | 2010-08-30 | 2017-05-29 | 에피스타 코포레이션 | 발광 장치 |
KR20200128499A (ko) * | 2010-08-30 | 2020-11-13 | 에피스타 코포레이션 | Led 소자 |
KR102176761B1 (ko) * | 2010-08-30 | 2020-11-10 | 에피스타 코포레이션 | Led 소자 |
US9893024B2 (en) | 2010-08-30 | 2018-02-13 | Epistar Corporation | Light emitting device |
KR20190102168A (ko) * | 2010-08-30 | 2019-09-03 | 에피스타 코포레이션 | Led 소자 |
US10546824B2 (en) | 2010-08-30 | 2020-01-28 | Epistar Corporation | Light-emitting device |
KR101148189B1 (ko) | 2011-01-04 | 2012-05-23 | 갤럭시아포토닉스 주식회사 | 핑거를 갖는 발광 다이오드 및 발광 다이오드 패키지 |
US8801256B2 (en) | 2011-02-10 | 2014-08-12 | Samsung Display Co., Ltd. | Light emitting diode package and backlight unit having the same |
US10672951B2 (en) | 2014-07-01 | 2020-06-02 | Seoul Viosys Co., Ltd. | Light emitting element |
JP2017520925A (ja) * | 2014-07-01 | 2017-07-27 | ソウル バイオシス カンパニー リミテッドSeoul Viosys Co.,Ltd. | 発光素子 |
Also Published As
Publication number | Publication date |
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CN101075656A (zh) | 2007-11-21 |
JP4777293B2 (ja) | 2011-09-21 |
KR20070111091A (ko) | 2007-11-21 |
US20070284593A1 (en) | 2007-12-13 |
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