JP2007308690A - Epoxy resin composition, package for electronic component device, and electronic component device - Google Patents

Epoxy resin composition, package for electronic component device, and electronic component device Download PDF

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JP2007308690A
JP2007308690A JP2007104587A JP2007104587A JP2007308690A JP 2007308690 A JP2007308690 A JP 2007308690A JP 2007104587 A JP2007104587 A JP 2007104587A JP 2007104587 A JP2007104587 A JP 2007104587A JP 2007308690 A JP2007308690 A JP 2007308690A
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epoxy resin
resin composition
inorganic
electronic component
moisture absorbent
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Hisanori Watanabe
尚紀 渡辺
Naoki Nara
直紀 奈良
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Abstract

<P>PROBLEM TO BE SOLVED: To provide an epoxy resin composition excellent in moldability such as flowability, little occurrence of resin burr, etc., and in reliability on moisture resistance, etc., and to provide a package for an electronic component device, as well as an electronic component device. <P>SOLUTION: The epoxy resin composition contains (A) an epoxy resin, (B) a curing agent, and (C) an inorganic moisture absorbent which comprises an inorganic moisture absorbent (C1) whose average particle diameter is at least 15 μm and not more than 70 μm. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、流動性や樹脂バリ等の成形性、耐湿性等の信頼性に優れたエポキシ樹脂組成物及びそれを用いて成形された電子部品装置用パッケージ、並びに電子部品装置に関する。   The present invention relates to an epoxy resin composition excellent in reliability such as fluidity, moldability such as resin burrs, moisture resistance, and the like, a package for an electronic component device molded using the same, and an electronic component device.

トランジスタ、IC、LSI等の半導体素子は、大気中の水分や微細な埃等によりその特性を損なう可能性がある為、従来より、セラミックによる気密封止や樹脂封止を行った上で使用されていたが、近年は、生産性やコスト等の面から樹脂を用いた封止が主流となっており、特にエポキシ樹脂をベースとした封止用樹脂組成物が広く用いられるようになっている。エポキシ樹脂は、各種樹脂の中でも電気特性、耐湿性、耐熱性、機械特性、インサート品との接着性等の諸特性において優れたバランスを有する。   Semiconductor elements such as transistors, ICs, and LSIs may be damaged by moisture or fine dust in the atmosphere, so they are conventionally used after being hermetically sealed with ceramic or resin sealed. However, in recent years, sealing using a resin has become the mainstream in terms of productivity and cost, and in particular, a sealing resin composition based on an epoxy resin has been widely used. . Epoxy resins have an excellent balance in various properties such as electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesion to inserts among various resins.

厳しい光透過性レベルが要求されるCCD、MOS等の固体撮像素子においても樹脂封止化の流れが見られ、従来のセラミックによる気密封止から、エポキシ樹脂等により中空プラスチックパッケージを成形、半導体素子を収容後、これを気密封止する方式が普及しつつある。   Solid-state image sensors such as CCDs and MOSs that require strict light transmission levels are also seeing a trend toward resin sealing. From conventional hermetic sealing with ceramics, hollow plastic packages are molded with epoxy resin, etc. A method of hermetically sealing the container after it has been accommodated has been spreading.

CCD、MOS等の固体撮像素子搭載パッケージに求められる特性の中でも、中空パッケージ内への外部からの水分の浸入を防ぎ、パッケージ内部の結露を防止すること、すなわちパッケージの耐湿性は、パッケージの正常な動作を確保する上でも最も重要な特性の一つである。   Among the characteristics required for solid-state image sensor mounted packages such as CCD and MOS, preventing moisture from entering into the hollow package and preventing condensation inside the package, that is, the moisture resistance of the package is normal for the package. This is one of the most important characteristics for ensuring proper operation.

CCDやMOS等のパッケージ耐湿性を高める手法としては、シリカゲルやゼオライト等の無機系吸湿剤を樹脂組成物に特定量添加する手法(例えば、特許文献1)、特定の性状を有するゼオライトを樹脂組成物に添加する手法(例えば、特許文献2)、特定の性状を有するシリカをエポキシ樹脂組成物に添加する手法(例えば、特許文献3、4)、特定の構造を有するエポキシ樹脂と特定の構造を有するフェノール系硬化剤からなる樹脂組成物に無機系吸湿剤を添加する手法(例えば、特許文献5)等の報告がある。
特許第2750254号公報 特許第3410173号公報 特許第2846551号公報 特許第3119104号公報 特許第3022135号公報
As a technique for improving package moisture resistance such as CCD and MOS, a technique of adding a specific amount of an inorganic hygroscopic agent such as silica gel or zeolite to a resin composition (for example, Patent Document 1), a zeolite having a specific property as a resin composition A method of adding to a product (for example, Patent Document 2), a method of adding silica having a specific property to an epoxy resin composition (for example, Patent Documents 3 and 4), an epoxy resin having a specific structure and a specific structure There is a report of a technique (for example, Patent Document 5) of adding an inorganic moisture absorbent to a resin composition comprising a phenolic curing agent.
Japanese Patent No. 2750254 Japanese Patent No. 3410173 Japanese Patent No. 2846551 Japanese Patent No. 3119104 Japanese Patent No. 3022135

しかしながら、吸湿性能の高い無機系吸湿剤は、相対的に小さい平均粒径と大きな比表面積を有することが多く、充分な耐湿性を得る為にこれらを多量に添加すると、流動性や樹脂バリ性、硬化性等の成形性の劣化を招き易い。そこで、前記成形性の劣化を避ける為に無機系吸湿剤の添加を少量にすると、耐湿性の確保が困難となる。上記手法は、このジレンマを必ずしも解決できていない。   However, inorganic hygroscopic agents with high moisture absorption performance often have a relatively small average particle size and large specific surface area, and if they are added in a large amount to obtain sufficient moisture resistance, fluidity and resin burr properties It tends to cause deterioration of moldability such as curability. Therefore, if the addition of the inorganic moisture absorbent is made small in order to avoid the deterioration of the moldability, it becomes difficult to ensure the moisture resistance. The above method does not necessarily solve this dilemma.

本発明はかかる状況に鑑みなされたものであり、良好な流動性を確保しながら樹脂バリの低減を実現し、硬化性等の成形性、耐湿性等の信頼性にも優れたエポキシ樹脂組成物、及びそれにより成形された電子部品装置用パッケージ、並びに電子部品装置を提供することを課題とする。   The present invention has been made in view of such circumstances, and realizes reduction of resin burrs while ensuring good fluidity, and is excellent in moldability such as curability and reliability such as moisture resistance. And an electronic component device package molded thereby, and an electronic component device.

本発明者らは、上述の課題を解決するために鋭意検討を重ねた結果、エポキシ樹脂組成物に、特定の平均粒径を有する無機系吸湿剤を添加することによって所期の目的が達成可能となることを見出し、本発明を完成するに至った。   As a result of intensive studies to solve the above-mentioned problems, the present inventors can achieve the intended purpose by adding an inorganic moisture absorbent having a specific average particle diameter to the epoxy resin composition. As a result, the present invention has been completed.

本発明は、(1)(A)エポキシ樹脂、(B)硬化剤及び(C)無機系吸湿剤を含有するエポキシ樹脂組成物であって、(C)無機系吸湿剤が少なくとも平均粒径15μm以上70μm以下の無機系吸湿剤(C1)を含むことを特徴とするエポキシ樹脂組成物に関する。   The present invention is an epoxy resin composition containing (1) (A) an epoxy resin, (B) a curing agent and (C) an inorganic moisture absorbent, wherein (C) the inorganic moisture absorbent has an average particle size of at least 15 μm. The present invention relates to an epoxy resin composition comprising an inorganic moisture absorbent (C1) of 70 μm or less.

また、本発明は、(2)前記無機系吸湿剤(C1)のBET比表面積が、20m/g以上100m/g以下であることを特徴とする前記(1)に記載のエポキシ樹脂組成物に関する。 Further, the present invention is, (2) BET specific surface area of the inorganic hygroscopic agent (C1) is an epoxy resin composition according to (1), characterized in that 20 m 2 / g or more 100m 2 / g or less Related to things.

また、本発明は、(3)前記(C)無機系吸湿剤の配合量が、エポキシ樹脂組成物全体の50質量%を超えてなることを特徴とする前記(1)または(2)に記載のエポキシ樹脂組成物に関する。   Further, the present invention is as described in (1) or (2) above, wherein (3) the blending amount of the inorganic moisture absorbent (C) exceeds 50% by mass of the entire epoxy resin composition. It relates to an epoxy resin composition.

また、本発明は、(4)前記無機系吸湿剤(C1)成分の配合量が、エポキシ樹脂組成物全体の1質量以上50質量%以下であることを特徴とする前記(1)〜(3)のいずれか一項に記載のエポキシ樹脂組成物に関する。   Moreover, this invention is (1)-(3) characterized by the compounding quantity of the said inorganic type moisture absorbent (C1) component being 1 mass% or more and 50 mass% or less of the whole epoxy resin composition. ). The epoxy resin composition as described in any one of 1).

また、本発明は、(5)前記(1)〜(4)のいずれか一項に記載のエポキシ樹脂組成物により成形された電子部品装置用パッケージに関する。   Moreover, this invention relates to the package for electronic component apparatuses shape | molded by the epoxy resin composition as described in any one of (5) said (1)-(4).

また、本発明は、(6)前記(1)〜(4)のいずれか一項に記載のエポキシ樹脂組成物により成形された電子部品装置に関する。   Moreover, this invention relates to the electronic component apparatus shape | molded by the epoxy resin composition as described in any one of (6) said (1)-(4).

本発明によるエポキシ樹脂組成物は、良好な流動性を確保しながら樹脂バリの低減を実現し、硬化性等の成形性、耐湿性等の信頼性にも優れている。そのため、かかる樹脂組成物を用いてパッケージを作製することで、例えばCCDやMOS等の固体撮像素子を搭載した電子部品装置等に高い信頼性を与えることが可能であり、その工業的価値は高い。   The epoxy resin composition according to the present invention realizes reduction of resin burrs while ensuring good fluidity, and is excellent in moldability such as curability and reliability such as moisture resistance. Therefore, by producing a package using such a resin composition, it is possible to give high reliability to an electronic component device mounted with a solid-state imaging device such as a CCD or MOS, for example, and its industrial value is high. .

以下、本発明の詳細について説明する。   Details of the present invention will be described below.

本発明によるエポキシ樹脂組成物は、(A)エポキシ樹脂、(B)硬化剤及び(C)無機系吸湿剤を含有するエポキシ樹脂組成物であって、(C)無機系吸湿剤が少なくとも平均粒径15μm以上70μm以下の無機系吸湿剤(C1)を含むことを特徴とする。本発明によるエポキシ樹脂組成物は、上記(A)〜(C)成分以外に、必要に応じて無機充填剤、硬化促進剤、離型剤、及びカップリング剤、難燃剤等の各種添加剤を含んでもよい。以下、本発明によるエポキシ樹脂組成物を構成する各種成分について詳細に説明する。   The epoxy resin composition according to the present invention is an epoxy resin composition containing (A) an epoxy resin, (B) a curing agent and (C) an inorganic moisture absorbent, and (C) the inorganic moisture absorbent is at least an average particle. An inorganic moisture absorbent (C1) having a diameter of 15 μm to 70 μm is included. In addition to the components (A) to (C), the epoxy resin composition according to the present invention contains various additives such as inorganic fillers, curing accelerators, mold release agents, coupling agents, and flame retardants as necessary. May be included. Hereinafter, various components constituting the epoxy resin composition according to the present invention will be described in detail.

(A)エポキシ樹脂
本発明では、封止用エポキシ樹脂組成物に一般に用いられているエポキシ樹脂を単独または併用して用いることができる。かかるエポキシ樹脂としては、例えば、フェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂をはじめとするフェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF等のフェノール類及び/又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したもの、ビスフェノールA、ビスフェノールF、ビスフェノールS、ビスフェノールA/D等のジグリシジルエーテル、アルキル置換又は非置換のビフェノールのジグリシジルエーテルであるビフェニル型エポキシ樹脂、フェノール類及び/又はナフトール類とジメトキシパラキシレン又はビス(メトキシメチル)ビフェニルとから合成されるフェノール・アラルキル樹脂やナフトール・アラルキル樹脂、ビフェニル・アラルキル樹脂等のエポキシ化物、スチルベン型エポキシ樹脂、ハイドロキノン型エポキシ樹脂、フタル酸、ダイマー酸等の多塩基酸とエピクロルヒドリンとの反応により得られるグリシジルエステル型エポキシ樹脂、ジアミノジフェニルメタン、イソシアヌル酸等のポリアミンとエピクロルヒドリンとの反応により得られるグリシジルアミン型エポキシ樹脂、シクロペンタジエンとフェノール類との共縮合樹脂のエポキシ化物であるジシクロペンタジエン型エポキシ樹脂、ナフタレン環を有するエポキシ樹脂、トリフェニルメタン型エポキシ樹脂、トリメチロールプロパン型エポキシ樹脂、テルペン変性エポキシ樹脂、硫黄原子を含むエポキシ樹脂、オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂、脂環族エポキシ樹脂、及びこれらのエポキシ樹脂をシリコーン、アクリロニトリル、ブタジエン、イソプレン系ゴム、ポリアミド系樹脂等により変性したエポキシ樹脂などが挙げられる。
(A) Epoxy resin In this invention, the epoxy resin generally used for the epoxy resin composition for sealing can be used individually or in combination. Examples of such an epoxy resin include phenols such as phenol novolac type epoxy resins, orthocresol novolac type epoxy resins, cresols, xylenol, resorcin, catechol, bisphenol A, bisphenol F and other phenols and / or α-naphthol, Epoxidized novolak resin obtained by condensation or cocondensation of naphthols such as β-naphthol and dihydroxynaphthalene with compounds having aldehyde groups such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, salicylaldehyde in the presence of an acidic catalyst , Diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol S, bisphenol A / D, diglycidyl of alkyl-substituted or unsubstituted biphenol Epoxy compounds such as phenol / aralkyl resins, naphthol / aralkyl resins, biphenyl / aralkyl resins synthesized from biphenyl type epoxy resins, which are sidyl ethers, and phenols and / or naphthols and dimethoxyparaxylene or bis (methoxymethyl) biphenyl. , Stilbene type epoxy resin, hydroquinone type epoxy resin, glycidyl ester type epoxy resin obtained by reaction of polybasic acid such as phthalic acid and dimer acid and epichlorohydrin, and reaction by polyamine such as diaminodiphenylmethane, isocyanuric acid and epichlorohydrin Glycidylamine-type epoxy resin, dicyclopentadiene-type epoxy resin that is an epoxidized product of co-condensation resin of cyclopentadiene and phenols, and naphthalene ring Epoxy resin, triphenylmethane type epoxy resin, trimethylolpropane type epoxy resin, terpene modified epoxy resin, epoxy resin containing sulfur atom, linear aliphatic epoxy obtained by oxidizing olefin bond with peracid such as peracetic acid Examples thereof include resins, alicyclic epoxy resins, and epoxy resins obtained by modifying these epoxy resins with silicone, acrylonitrile, butadiene, isoprene rubber, polyamide resin, or the like.

上記エポキシ樹脂の中でも、良好な流動性の確保といった観点からは、180℃におけるICI粘度が0.2Pa・s以下であるエポキシ樹脂を単独、または併用して用いることが好ましく、0.1Pa・s以下であるエポキシ樹脂を単独、または併用して用いることがより好ましい。このようなエポキシ樹脂の例として、例えばビフェニル型エポキシ樹脂であるエピコートYX−4000H(ジャパンエポキシレジン株式会社商品名、180℃におけるICI粘度0.01Pa・s)、ビスフェノールF型エポキシ樹脂であるYSLV−80XY(東都化成株式会社商品名、180℃におけるICI粘度0.01Pa・s)、ジシクロペンタジエン型エポキシ樹脂であるEPICLON HP−7200(大日本インキ化学工業株式会社製商品名、180℃におけるICI粘度0.05Pa・s)、硫黄原子含有型エポキシ樹脂であるYSLV−120TE(東都化成株式会社商品名、180℃におけるICI粘度0.01Pa・s)、ビフェニル・アラルキル型エポキシとビフェノールのグリシジルエーテル化物の混合物であるCER−3000−L(日本化薬株式会社製商品名、180℃におけるICI粘度0.03Pa・s)等を、市場で入手可能なエポキシ樹脂の例として挙げることが可能である。なお、ここで「ICI粘度」とは、ICIコーンプレート回転粘度計で測定した値を意味するものとする。   Among the above epoxy resins, from the viewpoint of ensuring good fluidity, it is preferable to use an epoxy resin having an ICI viscosity at 180 ° C. of 0.2 Pa · s or less alone or in combination, and 0.1 Pa · s. The following epoxy resins are more preferably used alone or in combination. As an example of such an epoxy resin, for example, Epicoat YX-4000H (trade name of Japan Epoxy Resin Co., Ltd., ICI viscosity 0.01 Pa · s at 180 ° C.) which is a biphenyl type epoxy resin, YSLV- which is a bisphenol F type epoxy resin 80XY (trade name of Toto Kasei Co., Ltd., ICI viscosity at 180 ° C. 0.01 Pa · s), EPICLON HP-7200, a dicyclopentadiene type epoxy resin (trade name, manufactured by Dainippon Ink & Chemicals, Inc., ICI viscosity at 180 ° C. 0.05 Pa · s), YSLV-120TE (trade name of Toto Kasei Co., Ltd., ICI viscosity 0.01 Pa · s at 180 ° C.) which is a sulfur atom-containing epoxy resin, glycidyl etherified product of biphenyl aralkyl type epoxy and biphenol blend There CER-3000-L, etc. (manufactured by Nippon Kayaku Co., Ltd. trade name, ICI viscosity 0.03 Pa · s at 180 ° C.), can be cited as examples of available epoxy resins in the market. Here, “ICI viscosity” means a value measured with an ICI cone plate rotational viscometer.

(B)硬化剤
本発明では、封止用エポキシ樹脂組成物に一般に使用されている硬化剤を単独または併用して用いることができる。かかる(B)硬化剤としては、例えば、フェノール、クレゾール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、フェニルフェノール、アミノフェノール等のフェノール類及び/又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック型フェノール樹脂、フェノール類及び/又はナフトール類とジメトキシパラキシレン又はビス(メトキシメチル)ビフェニルとから合成されるフェノール・アラルキル樹脂、ナフトール・アラルキル樹脂、ビフェニル・アラルキル樹脂等のアラルキル型フェノール樹脂、ジシクロペンタジエン型フェノール樹脂、テルペン変性フェノール樹脂、トリフェニルメタン型フェノール樹脂などのフェノール系硬化剤が挙げられる。
(B) Hardener In this invention, the hardener generally used for the epoxy resin composition for sealing can be used individually or in combination. Examples of the curing agent (B) include phenols such as phenol, cresol, resorcin, catechol, bisphenol A, bisphenol F, phenylphenol, and aminophenol and / or naphthol such as α-naphthol, β-naphthol, and dihydroxynaphthalene. Novolak-type phenol resins, phenols and / or naphthols and dimethoxyparaxylene or bis (methoxymethyl) obtained by condensation or cocondensation of aldehydes with compounds having an aldehyde group such as formaldehyde, benzaldehyde, salicylaldehyde, etc. under an acidic catalyst ) Phenol-aralkyl resins synthesized from biphenyl, aralkyl-type phenol resins such as naphthol-aralkyl resins, biphenyl-aralkyl resins, dicyclopentadiene-type phenol trees Examples thereof include phenolic curing agents such as fat, terpene-modified phenolic resin, and triphenylmethane type phenolic resin.

本発明では、上記フェノール系硬化剤の他、無水酸系硬化剤、アミン系硬化剤等を使用しても良い。   In the present invention, an acid anhydride curing agent, an amine curing agent, or the like may be used in addition to the phenol curing agent.

(A)エポキシ樹脂と(B)硬化剤との当量比(すなわち、エポキシ樹脂中のエポキシ基数/硬化剤中のフェノール性水酸基や無水酸基、アミノ基等の数の比)は、特に制限されるものではない。しかし、それぞれの成分が過不足なく反応して組成物中に未反応のまま残らないようにするためには、上記当量比は好ましくは0.5/1〜2/1の範囲、より好ましくは0.6/1〜1.5/1の範囲とする。   The equivalent ratio of (A) epoxy resin to (B) curing agent (that is, the ratio of the number of epoxy groups in the epoxy resin / the number of phenolic hydroxyl groups, hydroxyl groups, amino groups, etc. in the curing agent) is particularly limited. It is not a thing. However, the equivalent ratio is preferably in the range of 0.5 / 1 to 2/1, more preferably in order to prevent the respective components from reacting excessively and insufficiently and remaining unreacted in the composition. The range is 0.6 / 1 to 1.5 / 1.

(C)無機系吸湿剤
本発明では、良好な耐湿信頼性を実現する為に(C)無機系吸湿剤を配合することが必要であり、良好な流動性と樹脂バリの低減化等の成形性の観点からは、(C)無機系吸湿剤が少なくとも平均粒径15μm以上70μm以下である無機系吸湿剤(C1)を含むことが重要である。前記無機系吸湿剤(C1)の平均粒径は、好ましくは20μm以上60μm以下、より好ましくは25μm以上50μm以下である。前記無機系吸湿剤(C1)の平均粒径が15μm未満である場合は成形性が不充分であり、70μmを超える場合は成形性及び耐湿が不充分であり、本発明の目的を達成することができない。
(C) Inorganic hygroscopic agent In the present invention, it is necessary to blend (C) an inorganic hygroscopic agent in order to achieve good moisture resistance reliability, and molding such as good fluidity and reduction of resin burrs. From the viewpoint of properties, it is important that (C) the inorganic moisture absorbent contains an inorganic moisture absorbent (C1) having an average particle size of 15 μm or more and 70 μm or less. The average particle diameter of the inorganic moisture absorbent (C1) is preferably 20 μm or more and 60 μm or less, and more preferably 25 μm or more and 50 μm or less. When the average particle size of the inorganic moisture absorbent (C1) is less than 15 μm, the moldability is insufficient, and when it exceeds 70 μm, the moldability and moisture resistance are insufficient, thereby achieving the object of the present invention. I can't.

(C)無機系吸湿剤の形状は特に限定されないが、流動性の観点からは球形、または球形に近い形状が好ましい。
なお、本発明の無機系吸湿剤とは、20℃、湿度50%での単体の吸水率が0.5%以上の化合物、又はそれらの混合物であり、(1)化学組成的に、ケイ素、アルミニウム、ナトリウム、カルシウム等の元素に代表される複数の金属元素の酸化物(酸化金属の混合物)、(2)比表面積が10m/g以上の少なくともいずれかに該当する化合物、又はそれらの混合物を用いることが好ましい。また、本発明の無機系吸湿剤は、例えば走査型電子顕微鏡で観察した場合、通常の無機充填剤と比較して、表面がひだ状の形状を有しており、明らかに比表面積が大きく見え、形状の観察からも無機充填剤と区別が可能である。
(C) Although the shape of an inorganic type hygroscopic agent is not specifically limited, From the viewpoint of fluidity, a spherical shape or a shape close to a spherical shape is preferable.
The inorganic hygroscopic agent of the present invention is a compound having a single water absorption of 0.5% or more at 20 ° C. and a humidity of 50%, or a mixture thereof. (1) Chemically, silicon, Oxides (mixtures of metal oxides) of a plurality of metal elements typified by elements such as aluminum, sodium and calcium, (2) compounds corresponding to at least one of specific surface areas of 10 m 2 / g or more, or a mixture thereof Is preferably used. In addition, the inorganic hygroscopic agent of the present invention has a pleated surface as compared with a normal inorganic filler when observed with, for example, a scanning electron microscope, and clearly has a large specific surface area. From the observation of the shape, it can be distinguished from the inorganic filler.

無機系吸湿剤(C1)の例としては、平均粒径15μm以上70μm以下のシリカゲルやゼオライト、非晶質アルミノ珪酸塩等を挙げることが可能であり、例えば石炭灰を原料とした平均粒径40μm程度のゼオライト(中部電力株式会社製商品名「シーキュラス」)等を市場で入手することが可能である。   Examples of the inorganic moisture absorbent (C1) include silica gel, zeolite, amorphous aluminosilicate having an average particle diameter of 15 μm or more and 70 μm or less. For example, an average particle diameter of 40 μm using coal ash as a raw material. A certain degree of zeolite (trade name “Cyculus” manufactured by Chubu Electric Power Co., Inc.) is available on the market.

また、本発明では、耐湿信頼性等の信頼性と成形性とのバランスの観点からは、前記無機系吸湿剤(C1)のBET比表面積が、20m/g以上100m/g以下であることが好ましく、25m/g以上80m/g以下であることがより好ましく、30m/g以上60m/g以下であることが特に好ましい。前記BET比表面積が20m/g未満である場合は耐湿信頼性が不充分となる可能性があり、100m/gを超える場合は成形性が不充分となる可能性がある。 In the present invention, the BET specific surface area of the inorganic moisture absorbent (C1) is 20 m 2 / g or more and 100 m 2 / g or less from the viewpoint of balance between reliability such as moisture resistance reliability and moldability. It is preferably 25 m 2 / g or more and 80 m 2 / g or less, and particularly preferably 30 m 2 / g or more and 60 m 2 / g or less. When the BET specific surface area is less than 20 m 2 / g, the moisture resistance reliability may be insufficient, and when it exceeds 100 m 2 / g, the moldability may be insufficient.

また、前記無機系吸湿剤(C1)として、ゼオライトや非晶質アルミノ珪酸塩等を用いる場合は、その抽出液電気伝導度が2×10−2S/m以下であることが好ましい。前記抽出液電気伝導度が2×10−2S/mを超える場合は、イオン性不純物が多くなり硬化性等の不具合を招く可能性がある。 Moreover, when using zeolite, an amorphous aluminosilicate, etc. as said inorganic type hygroscopic agent (C1), it is preferable that the extract liquid electrical conductivity is 2 * 10 <-2 > S / m or less. When the electrical conductivity of the extract exceeds 2 × 10 −2 S / m, there is a possibility that ionic impurities increase to cause problems such as curability.

本発明では、前記無機系吸湿剤(C1)は、単独で使用しても他の無機系吸湿剤と併用して使用しても良いが、無機系吸湿剤(C1)を単独で使用する場合には、その配合量をエポキシ樹脂組成物全体の1質量%以上50質量%以下とすることが好ましい。前記無機系吸湿剤(C1)の配合量が1質量%未満である場合は耐湿信頼性が不充分となる可能性があり、50質量%を超える場合は流動性や硬化性等の成形性が不充分となる可能性がある。これら特性のバランスの観点からは、無機系吸湿剤(C1)の配合量をエポキシ樹脂組成物全体の3質量%以上45質量%以下とすることがより好ましく、5質量%以上40質量%以下とすることが特に好ましい。   In the present invention, the inorganic hygroscopic agent (C1) may be used alone or in combination with other inorganic hygroscopic agents, but the inorganic hygroscopic agent (C1) is used alone. It is preferable that the compounding quantity shall be 1 to 50 mass% of the whole epoxy resin composition. When the blending amount of the inorganic moisture absorbent (C1) is less than 1% by mass, the moisture resistance reliability may be insufficient, and when it exceeds 50% by mass, moldability such as fluidity and curability is obtained. It may be insufficient. From the viewpoint of the balance of these characteristics, the blending amount of the inorganic moisture absorbent (C1) is more preferably 3% by mass or more and 45% by mass or less of the whole epoxy resin composition, and 5% by mass or more and 40% by mass or less. It is particularly preferable to do this.

特に樹脂バリの低減といった観点からは、前記無機系吸湿剤(C1)と他の無機系吸湿剤とを併用して使用することがより好ましい。この場合、無機系吸湿剤(C1)との併用する他の無機系吸湿剤は1種でも2種以上でも構わない。併用例として以下のような例示が可能であるが、この例示に限るものではない。例えば、無機系吸湿剤(C1)と、平均粒径が1〜5μmで比表面積が200〜1000m/gである他の無機系吸湿剤(C2)、平均粒径が5〜15μmで比表面積が10〜30m/gである他の無機系吸湿剤(C3)とを併用するケースである。この場合、各成分の配合量は適宜選択されるが、無機系吸湿剤(C)全体、すなわち(C1)、(C2)及び(C3)の合計質量に対し、他の無機系吸湿剤(C2)の配合量を3〜10質量%、他の無機系吸湿剤(C3)を10〜80質量%とし、残りを無機系吸湿剤(C1)とすることが好ましい。 In particular, from the viewpoint of reducing resin burrs, it is more preferable to use the inorganic moisture absorbent (C1) in combination with another inorganic moisture absorbent. In this case, the inorganic hygroscopic agent used in combination with the inorganic hygroscopic agent (C1) may be one type or two or more types. Although the following illustrations are possible as a combination example, it is not restricted to this illustration. For example, an inorganic moisture absorbent (C1) and other inorganic moisture absorbent (C2) having an average particle diameter of 1 to 5 μm and a specific surface area of 200 to 1000 m 2 / g, an average particle diameter of 5 to 15 μm and a specific surface area Is a case of using together with other inorganic moisture absorbent (C3) having a 10 to 30 m 2 / g. In this case, although the compounding quantity of each component is selected suitably, with respect to the whole inorganic moisture absorbent (C), ie, the total mass of (C1), (C2), and (C3), other inorganic moisture absorbent (C2 ) Is preferably 3 to 10% by mass, the other inorganic moisture absorbent (C3) is 10 to 80% by mass, and the remainder is inorganic moisture absorbent (C1).

無機系吸湿剤(C1)と併用する他の無機系吸湿剤とは、同様の化学成分であっても良いし、異なっていても良い。かかる他の無機系吸湿剤として、ゼオライトや非晶質アルミノ珪酸塩等を用いる場合、硬化性等の成形性の観点から、その抽出液電気伝導度が2×10−2S/m以下であることが好ましい。 The same chemical component may be sufficient as the other inorganic type hygroscopic agent used together with an inorganic type hygroscopic agent (C1), and may differ. In the case of using zeolite, amorphous aluminosilicate, or the like as such other inorganic moisture absorbent, the electrical conductivity of the extract is 2 × 10 −2 S / m or less from the viewpoint of moldability such as curability. It is preferable.

無機系吸湿剤(C1)と他の無機系吸湿剤を併用する場合は、その合計量を無機系吸湿剤(C)の配合量とする。かかる無機系吸湿剤(C)の配合量は、エポキシ樹脂組成物全体の50質量%を超えてなることが好ましく、52〜70質量%とすることがより好ましい。前記無機系吸湿剤(C)の配合量が50質量%未満である場合は耐湿信頼性が不充分となる可能性がある。   When using an inorganic type hygroscopic agent (C1) and another inorganic type hygroscopic agent together, let the total amount be the compounding quantity of an inorganic type hygroscopic agent (C). It is preferable that the compounding quantity of this inorganic type hygroscopic agent (C) exceeds 50 mass% of the whole epoxy resin composition, and it is more preferable to set it as 52-70 mass%. When the blending amount of the inorganic moisture absorbent (C) is less than 50% by mass, the moisture resistance reliability may be insufficient.

なお、本発明における「平均粒径」や「BET比表面積」は、それぞれ下記による測定で得られた値を指す。また、「抽出液電気伝導度」は、5gの試料を50ccの純水と混合し、100℃/5分間煮沸後、常温で東洋濾紙株式会社製定量濾紙No.5Cを用いて濾過し、京都電子株式会社製「GM‐115」を用いて、ろ液の電気伝導度を20℃環境下で測定した値である。   In the present invention, “average particle diameter” and “BET specific surface area” refer to values obtained by the following measurements. “Extract liquid conductivity” was determined by mixing 5 g of sample with 50 cc of pure water, boiled at 100 ° C. for 5 minutes, and then quantified filter paper No. 1 manufactured by Toyo Filter Paper Co., Ltd. at room temperature. It is the value which filtered using 5C and measured the electrical conductivity of the filtrate in a 20 degreeC environment using "GM-115" by Kyoto Electronics Co., Ltd.

平均粒径」の測定は、測定装置として(株)堀場製作所製レーザ回折/散乱式粒度分布測定装置LA−920を用い、分散媒としてヘキサメタリン酸ナトリウム0.2wt/vol%水溶液を用い、相対屈折率1.10、透過率70〜90%、循環速度7、超音波時間3分、超音波強度7の条件で行なった。 For the measurement of the “average particle size”, a laser diffraction / scattering type particle size distribution measuring device LA-920 manufactured by Horiba, Ltd. is used as a measuring device, a sodium hexametaphosphate 0.2 wt / vol% aqueous solution is used as a dispersion medium, and relative refraction is measured. The measurement was performed under the conditions of a rate of 1.10, a transmittance of 70 to 90%, a circulation speed of 7, an ultrasonic time of 3 minutes, and an ultrasonic intensity of 7.

「BET比表面積」の測定は、測定装置としてユアサアイオニクス株式会社製流動法BET一点法比表面積測定装置モノソーブを用い、キャリアガスとして窒素/ヘリウム混合ガス1.5kg/cmを用い、窒素ガス0.7kg/cm、試料脱気条件200℃/30分の条件で行なった。 “BET specific surface area” is measured by using a flow method BET single point method specific surface area measuring device Monosorb manufactured by Yuasa Ionics Co., Ltd. as a measuring device, and using nitrogen / helium mixed gas 1.5 kg / cm 2 as a carrier gas, nitrogen gas The test was performed under the conditions of 0.7 kg / cm 2 and sample degassing conditions of 200 ° C./30 minutes.

本発明によるエポキシ樹脂組成物は、上記(A)〜(C)以外に必要に応じて無機充填剤、硬化促進剤、離型剤、及びカップリング剤、難燃剤等の各種添加剤を含有することができる。   The epoxy resin composition by this invention contains various additives, such as an inorganic filler, a hardening accelerator, a mold release agent, a coupling agent, a flame retardant, as needed other than said (A)-(C). be able to.

本発明によるエポキシ樹脂組成物は、線膨張係数低減や強度向上等の為に、無機系充填剤を含有することができる。かかる無機系充填剤としては、例えば溶融シリカ、結晶シリカ、合成シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、チタン酸カリウム、炭化珪素、窒化珪素、窒化アルミ、窒化ホウ素、ベリリア、ジルコニア、ジルコン、フォステライト、ステアタイト、スピネル、ムライト、チタニア等の粉体、又はこれらを球形化したビーズ、ガラス繊維などが挙げられ、難燃効果のある水酸化アルミニウム、水酸化マグネシウム等の金属水酸化物を配合しても良い。   The epoxy resin composition according to the present invention can contain an inorganic filler for the purpose of reducing the linear expansion coefficient and improving the strength. Examples of such inorganic fillers include fused silica, crystalline silica, synthetic silica, alumina, zircon, calcium silicate, calcium carbonate, potassium titanate, silicon carbide, silicon nitride, aluminum nitride, boron nitride, beryllia, zirconia, zircon, Examples include powders such as fosterite, steatite, spinel, mullite, and titania, or beads made of these spheroids, glass fibers, etc., and metal hydroxides such as aluminum hydroxide and magnesium hydroxide that have a flame-retardant effect. You may mix.

流動性や硬化性等の成形性の観点からは、溶融シリカ、結晶シリカ、合成シリカ等を配合することが好ましく、溶融シリカ、合成シリカを配合することがより好ましく、球状の溶融シリカ、球状の合成シリカを配合することが特に好ましい。   From the viewpoint of moldability such as fluidity and curability, it is preferable to blend fused silica, crystalline silica, synthetic silica, etc., more preferably fused silica, synthetic silica, spherical fused silica, spherical It is particularly preferable to blend synthetic silica.

無機充填剤の形状は特に限定されないが、流動性の観点からは球形、または球形に近い形状が好ましい。また、無機充填剤の平均粒径は特に限定されないが、前記(C)無機系吸湿剤と無機系充填剤を全てあわせて平均粒径が3〜30μmとなることが好ましい。
無機系充填剤の配合量は、流動性や硬化性等の成形性や機械強度等の観点から、前記(C)無機系吸湿剤の5〜50質量%とすることが好ましい。
The shape of the inorganic filler is not particularly limited, but a spherical shape or a shape close to a spherical shape is preferable from the viewpoint of fluidity. Moreover, although the average particle diameter of an inorganic filler is not specifically limited, It is preferable that all the said (C) inorganic type hygroscopic agents and inorganic type fillers are combined, and an average particle diameter will be 3-30 micrometers.
The blending amount of the inorganic filler is preferably 5 to 50% by mass of the (C) inorganic hygroscopic agent from the viewpoint of moldability such as fluidity and curability and mechanical strength.

本発明によるエポキシ樹脂組成物は、成形時に良好な硬化性を得る為に、硬化促進剤を含有する添加することが好ましい。硬化促進剤としては、例えば、トリフェニルホスフィンやテトラフェニルホスホニウムテトラフェニルボレート等の有機リン化合物系硬化促進剤、1,8−ジアザビシクロ[5.4.0]ウンデセン−7等のアミン化合物系硬化促進剤、及びイミダゾール化合物系硬化促進剤等、封止用エポキシ樹脂組成物に一般に使用される硬化促進剤を単独または2種以上併用して用いることができるが、前記イミダゾール化合物系硬化促進剤、または下記一般式(I)で表されるホスフィン化合物と下記一般式(II)で示されるキノン化合物との付加反応物の少なくともいずれかを用いると、特に良好な硬化性を得ることが可能となる。

Figure 2007308690
The epoxy resin composition according to the present invention preferably contains a curing accelerator in order to obtain good curability at the time of molding. Examples of the curing accelerator include organic phosphorus compound-based curing accelerators such as triphenylphosphine and tetraphenylphosphonium tetraphenylborate, and amine compound-based curing accelerations such as 1,8-diazabicyclo [5.4.0] undecene-7. The curing agent generally used in the epoxy resin composition for sealing, such as an agent and an imidazole compound-based curing accelerator, can be used alone or in combination of two or more, but the imidazole compound-based curing accelerator, or When at least one of addition products of the phosphine compound represented by the following general formula (I) and the quinone compound represented by the following general formula (II) is used, particularly good curability can be obtained.
Figure 2007308690

一般式(I)中のRは炭素数1〜12のアルキル基を示し、R及びRは、水素原子又は炭素数1〜12の炭化水素基を示し、それぞれ全てが同一でも異なっていてもよい。また、一般式(II)中のR〜Rは、水素原子又は炭素数1〜18の炭化水素基を示し、それぞれ全てが同一でも異なっていてもよい。RとRが結合して環状構造となっていてもよい。)
本発明ではまた、樹脂成分と無機充填剤との接着性を高める目的で、封止用エポキシ樹脂組成物に一般に使用される公知のカップリング剤を添加してもよい。カップリング剤としては、特に限定するものではないが、例えば、エポキシシラン、メルカプトシラン、アミノシラン、アルキルシラン、ウレイドシラン、ビニルシラン等の各種シラン系化合物、チタン系化合物、アルミニウムキレート類、アルミニウム/ジルコニウム系化合物などが挙げられ、それらを単独で使用しても又は2種以上を組み合わせて使用してもよい。
R 1 in the general formula (I) represents an alkyl group having 1 to 12 carbon atoms, R 2 and R 3 represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, and they are all the same or different. May be. Moreover, R < 4 > -R < 6 > in general formula (II) shows a hydrogen atom or a C1-C18 hydrocarbon group, and all may be same or different, respectively. R 4 and R 5 may be bonded to form a cyclic structure. )
In the present invention, for the purpose of enhancing the adhesion between the resin component and the inorganic filler, a known coupling agent generally used in an epoxy resin composition for sealing may be added. The coupling agent is not particularly limited. For example, various silane compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, and vinyl silane, titanium compounds, aluminum chelates, and aluminum / zirconium compounds. A compound etc. are mentioned, They may be used individually or may be used in combination of 2 or more type.

本発明では、成形金型からの円滑な脱型を目的として、封止用エポキシ樹脂組成物に一般に使用される公知の離型剤を添加してもよい。離型剤としては、特に限定されるものではないが、例えば、ステアリン酸やモンタン酸等の高級脂肪酸系ワックス、高級脂肪酸エステル系ワックス、高級脂肪酸アミド系ワックス、ポリエチレンワックスなどが挙げられ、それらを単独で使用しても、又は2種以上を組み合わせて使用してもよい。   In this invention, you may add the well-known mold release agent generally used for the epoxy resin composition for sealing for the purpose of smooth mold release from a shaping | molding die. The release agent is not particularly limited, and examples thereof include higher fatty acid waxes such as stearic acid and montanic acid, higher fatty acid ester waxes, higher fatty acid amide waxes, polyethylene waxes, and the like. You may use individually or in combination of 2 or more types.

また、本発明では、上述の各種添加剤以外にも、カーボンブラック、有機染料、有機顔料、及び酸化チタン等の各種着色剤、イミダゾール、トリアゾール、テトラゾール、及びトリアジン等の各種接着付与剤、NBRゴム及びシリコーンゴム等の各種低応力剤等の添加剤、ブロム化エポキシ樹脂や三酸化アンチモン、有機リン系難燃剤、窒素系難燃剤等の各種難燃剤等の添加剤を、必要に応じてエポキシ樹脂組成物に添加することが可能である。なお、添加可能な添加剤は上述の例示に限定されるものではなく、当技術分野において公知の各種添加物であっても良い。   In the present invention, in addition to the above-mentioned various additives, carbon black, organic dyes, organic pigments, various colorants such as titanium oxide, various adhesion imparting agents such as imidazole, triazole, tetrazole, and triazine, NBR rubber And additives such as various low-stress agents such as silicone rubber, additives such as brominated epoxy resins, antimony trioxide, organophosphorous flame retardants, nitrogen-based flame retardants, etc., if necessary It can be added to the composition. In addition, the additive which can be added is not limited to the above-mentioned illustration, Various additives well-known in this technical field may be used.

本発明によるエポキシ樹脂組成物は、各種原材料を均一に分散混合できるのであれば、いかなる手法を用いても調製することが可能である。一般的な手法として、所定の配合量の原材料をミキサー等によって充分に混合した後、ミキシングロール、ニーダ、押出機等によって溶融混練を行い、次いで冷却し、粉砕する方法を挙げることができる。溶融混練は、複数の装置を用いて複数回行っても良いし、原材料の一部をミキシングロール等で混練後、ニーダや押出機等で原材料全体を再度混練する等の手法を採っても良い。なお、エポキシ樹脂組成物は取り扱いを容易にするために、成形条件に合うような寸法及び重量でタブレット化してもよい。   The epoxy resin composition according to the present invention can be prepared by any method as long as various raw materials can be uniformly dispersed and mixed. As a general method, there can be mentioned a method in which raw materials having a predetermined blending amount are sufficiently mixed with a mixer or the like, then melt kneaded with a mixing roll, a kneader, an extruder or the like, then cooled and pulverized. The melt-kneading may be performed a plurality of times using a plurality of apparatuses, or after kneading a part of the raw material with a mixing roll or the like, the whole raw material may be kneaded again with a kneader or an extruder. . In addition, in order to handle easily, an epoxy resin composition may be tableted with the dimension and weight which meet molding conditions.

本発明によるエポキシ樹脂組成物を用いて半導体素子を封止する方法としては、低圧トランスファー成形法が最も一般的であるが、インジェクション成形法、圧縮成形法等の他の成形法を用いてもよい。エポキシ樹脂組成物が、常温において液状又はペースト状である場合、ディスペンス方式、注型方式、印刷方式等を適用することも可能である。   As a method for sealing a semiconductor element using the epoxy resin composition according to the present invention, a low-pressure transfer molding method is the most common, but other molding methods such as an injection molding method and a compression molding method may be used. . When the epoxy resin composition is liquid or paste at normal temperature, a dispensing method, a casting method, a printing method, or the like can also be applied.

本発明による電子部品装置用パッケージは、上記エポキシ樹脂組成物により封止・成形されたものである。電子部品装置用パッケージとしては、例えば半導体装置用中空パッケージが例示され、本発明のエポキシ樹脂組成物は、電子部品装置用パッケージの中でも、半導体装置用中空パッケージを成形するのに特に適している。半導体装置用中空パッケージは、通常、図1に示すように上方が開口した箱型の形状からなり、その上面はガラスや透明なプラスチックなどの蓋体5によってシール剤6を介して密封される。パッケージの中央凹部には半導体素子3が載置されボンディングワイヤー4を介してリードフレーム2と連結される。
また、本発明による電子部品装置は、上記エポキシ樹脂組成物により成形されたものである。電子部品装置としては、例えば、上記半導体中空パッケージ内に半導体素子が気密封止されたものである。
The package for an electronic component device according to the present invention is sealed and molded with the above epoxy resin composition. Examples of the electronic component device package include a semiconductor device hollow package, and the epoxy resin composition of the present invention is particularly suitable for molding a semiconductor device hollow package among electronic component device packages. As shown in FIG. 1, the hollow package for a semiconductor device usually has a box-like shape with an upper opening, and the upper surface thereof is sealed by a lid 5 such as glass or transparent plastic via a sealing agent 6. The semiconductor element 3 is placed in the central recess of the package and is connected to the lead frame 2 via the bonding wire 4.
In addition, an electronic component device according to the present invention is formed by the above epoxy resin composition. As an electronic component device, for example, a semiconductor element is hermetically sealed in the semiconductor hollow package.

以下、実施例によって本発明をより具体的に説明するが、本発明の範囲は以下の実施例によって限定されるものではない。   EXAMPLES Hereinafter, although an Example demonstrates this invention more concretely, the scope of the present invention is not limited by a following example.

(実施例1〜5、比較例1〜5)
以下、各実施例及び各比較例で使用した各種原材料を示す。
(Examples 1-5, Comparative Examples 1-5)
Hereinafter, various raw materials used in each example and each comparative example are shown.

(A)エポキシ樹脂
エポキシ樹脂1:エポキシ当量192、融点105℃のビフェニル型エポキシ樹脂(ジャパンエポキシレジン株式会社製、商品名「エピコート YX4000H」)。
(A) Epoxy resin Epoxy resin 1: Biphenyl type epoxy resin having an epoxy equivalent of 192 and a melting point of 105 ° C. (trade name “Epicoat YX4000H” manufactured by Japan Epoxy Resin Co., Ltd.).

(B)硬化剤
硬化剤1:軟化点70℃、水酸基当量175のフェノール・アラルキル樹脂(三井化学株会社製、商品名「ミレックスXL−225」)。
(B) Curing agent Curing agent 1: Phenol aralkyl resin having a softening point of 70 ° C. and a hydroxyl group equivalent of 175 (trade name “Mirex XL-225” manufactured by Mitsui Chemicals, Inc.).

(C)無機系吸湿剤
(C1)成分:平均粒径40μm、比表面積40m/gのゼオライト(中部電力株式会社製、商品名「シーキュラス」、抽出液電気伝導度は約1×10−2S/mである)。
(C) Inorganic hygroscopic agent (C1) component: zeolite having an average particle size of 40 μm and a specific surface area of 40 m 2 / g (manufactured by Chubu Electric Power Co., Ltd., trade name “Cyculus”, the electrical conductivity of the extract is about 1 × 10 −2 S / m).

(C2)成分:平均粒径3.5μm、比表面積600m/gのシリカゲル(水澤化学工業株式会社製、商品名「S−200」)。 Component (C2): silica gel having an average particle size of 3.5 μm and a specific surface area of 600 m 2 / g (manufactured by Mizusawa Chemical Co., Ltd., trade name “S-200”).

(C3)成分:平均粒径10μm、比表面積5m/gの非晶質アルミノ珪酸塩(水澤化学工業株式会社製、商品名「AMT−100R」)。 Component (C3): amorphous aluminosilicate having an average particle size of 10 μm and a specific surface area of 5 m 2 / g (manufactured by Mizusawa Chemical Industry Co., Ltd., trade name “AMT-100R”).

(その他の添加剤等)
無機充填剤
無機充填剤1:平均粒径12μm、比表面積5.0m/gの溶融球状シリカ(電気化学工業株式会社製、商品名「FB−105」)。
(Other additives)
Inorganic filler Inorganic filler 1: fused spherical silica (trade name “FB-105”, manufactured by Denki Kagaku Kogyo Co., Ltd.) having an average particle size of 12 μm and a specific surface area of 5.0 m 2 / g.

無機充填剤2:平均粒径0.5μm、比表面積6.5m/gの合成球状シリカ(株式会社アドマテックス社製、商品名「SO−25R」)。 Inorganic filler 2: Synthetic spherical silica having an average particle size of 0.5 μm and a specific surface area of 6.5 m 2 / g (manufactured by Admatechs Co., Ltd., trade name “SO-25R”).

無機充填剤3:平均粒径12nm(一次粒子)、比表面積200m/gの合成シリカ(日本アエロジル株式会社製、商品名「AEROSIL200V」)。 Inorganic filler 3: Synthetic silica having an average particle size of 12 nm (primary particles) and a specific surface area of 200 m 2 / g (trade name “AEROSIL200V” manufactured by Nippon Aerosil Co., Ltd.).

硬化促進剤:2−フェニル−4−メチルイミダゾール
離型剤:酸化型ポリエチレンワックス
カップリング剤:γ−グリシドキシプロピルトリメトキシシラン(エポキシシラン)
着色剤:カーボンブラック(三菱化学株式会社製商品名MA−100)
難燃剤:ブロム化エポキシ樹脂、三酸化アンチモン
なお、(C)無機系吸湿剤の「平均粒径」、「比表面積」は前述した測定方法により求めた値である。
Curing accelerator: 2-phenyl-4-methylimidazole Mold release agent: Oxidized polyethylene wax Coupling agent: γ-glycidoxypropyltrimethoxysilane (epoxysilane)
Colorant: Carbon black (trade name MA-100 manufactured by Mitsubishi Chemical Corporation)
Flame retardant: Brominated epoxy resin, antimony trioxide (C) The “average particle diameter” and “specific surface area” of the inorganic moisture absorbent are values obtained by the measurement method described above.

上述の各種原材料をそれぞれ下記表1に示す重量部で配合し、混練温度80℃、混練時間20分の条件下でロール混練を行い、実施例1〜5及び比較例1〜5に該当するエポキシ樹脂組成物をそれぞれ調製した。   The above-mentioned various raw materials are blended in parts by weight shown in Table 1 below, and roll kneading is performed under conditions of a kneading temperature of 80 ° C. and a kneading time of 20 minutes. Each resin composition was prepared.

次に、調製した実施例1〜5及び比較例1〜5のエポキシ樹脂組成物を、以下の各試験により評価した。評価結果を下記表1に示した。なお、エポキシ樹脂組成物の成形は、トランスファー成形機を用いて、金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で行った。また、後硬化は175℃で6時間行った。   Next, the prepared epoxy resin compositions of Examples 1 to 5 and Comparative Examples 1 to 5 were evaluated by the following tests. The evaluation results are shown in Table 1 below. The epoxy resin composition was molded using a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds. Further, post-curing was performed at 175 ° C. for 6 hours.

(1)スパイラルフロー(流動性・充填性の指標)
EMMI−1−66に順じてスパイラルフロー測定用金型を用いて、エポキシ樹脂組成物を上記条件で成形し、流動距離(cm)を求めた。
(1) Spiral flow (indicator of fluidity / fillability)
The epoxy resin composition was molded under the above conditions using a spiral flow measurement mold in accordance with EMMI-1-66, and the flow distance (cm) was determined.

(2)熱時硬度
中央部に直径30mm、深さ4mmのカル部分、及び、カル部分周縁より金型周縁部に向かって放射状に伸びる2μm、3μm、5μm、10μm、20μm、30μm、50μmの各厚みを有するスリット(スリット幅5mm)を持った三富金属株式会社製バリ金型を用いて、エポキシ樹脂成形材料を上記条件で直径30mm×厚さ4mmの円板に成形し、成形後直ちに(トランスファプレスの下型が開き始めてから5秒後に金型を取リ出し、その直後に)成形品(金型中央部のカル部分)のショアD硬度を測定した。
(2) Hardness during heating A cull portion having a diameter of 30 mm and a depth of 4 mm in the center portion, and 2 μm, 3 μm, 5 μm, 10 μm, 20 μm, 30 μm, and 50 μm extending radially from the cull portion periphery toward the mold periphery. An epoxy resin molding material was molded into a 30 mm diameter × 4 mm thick disc under the above conditions using a Mitani Metal Co., Ltd. varis mold having a slit having a thickness (slit width 5 mm). The mold was taken out 5 seconds after the lower mold of the transfer press started to open, and immediately after that, the Shore D hardness of the molded product (the cull portion at the center of the mold) was measured.

(3)バリ長さ
上記(2)と同じ金型を用いて成形を行い、2〜50μmスリット上の樹脂長さ(バリ長さ)を測定した。50μmを除く6種のスリット上の樹脂長さのうち、最大のものをバリ長さとした。
(3) Burr length Molding was performed using the same mold as (2) above, and the resin length (burr length) on the 2-50 μm slit was measured. Of the resin lengths on the six types of slits excluding 50 μm, the largest was the burr length.

(4)耐湿性
エポキシ樹脂組成物を上記条件で成形しφ50×3.0mmtの試験片を作製、後硬化の後、85℃/85%RH環境下に放置、放置500時間後、1000時間後の試験片の重量変化を測定し、下記式より放置500時間後の吸水率X500と放置1000時間後の吸水率X1000を求めた。
(4) Moisture resistance The epoxy resin composition is molded under the above conditions to prepare a test piece of φ50 × 3.0 mmt, after post-curing, left in an 85 ° C./85% RH environment, left for 500 hours, and after 1000 hours The weight change of the test piece was measured, and the water absorption X 500 after 500 hours of standing and the water absorption X 1000 after 1000 hours of standing were determined from the following formula.

(吸水率(%))=(W−W)×100/W
(ここで、W:試験片の初期重量、W:試験片の放置後の重量)
放置500時間後の吸水率X500が大きく、放置500時間後の吸水率X500と放置1000時間後の吸水率X1000の差X1000−X500も大きい樹脂組成物を、耐湿性に優れる樹脂組成物と判断した。

Figure 2007308690
(Water absorption rate (%)) = (W 1 −W 0 ) × 100 / W 0
(Wherein, W 0: initial weight of the test piece, W 1: Weight after standing of the test piece)
500 hours after water absorption X 500 is large, the difference X 1000 -X 500 is large resin composition 500 hours after the water absorption X 500 and allowed to stand after 1000 hours water absorption X 1000, excellent moisture resistant resin It was judged as a composition.
Figure 2007308690

表1から明らかなように、本発明の(C1)成分を含む実施例1〜5は、流動性や、特にバリ長さ等の成形性に優れ、耐湿性にも優れることがわかった。これに対し、(C1)成分を含まない比較例1〜5は、流動性やバリ長さ、耐湿性等に劣る。   As apparent from Table 1, Examples 1 to 5 containing the component (C1) of the present invention were found to be excellent in fluidity, in particular, moldability such as burr length, and excellent in moisture resistance. On the other hand, Comparative Examples 1 to 5 not including the component (C1) are inferior in fluidity, burr length, moisture resistance, and the like.

エポキシ樹脂組成物により成形された半導体装置用中空パッケージの断面図である。It is sectional drawing of the hollow package for semiconductor devices shape | molded by the epoxy resin composition.

符号の説明Explanation of symbols

1 エポキシ樹脂組成物の成型物
2 リードフレーム
3 半導体素子
4 ボンディングワイヤー
5 蓋体
6 シール剤
1 Molded product of epoxy resin composition 2 Lead frame 3 Semiconductor element 4 Bonding wire 5 Lid 6 Sealant

Claims (6)

(A)エポキシ樹脂、(B)硬化剤及び(C)無機系吸湿剤を含有するエポキシ樹脂組成物であって、(C)無機系吸湿剤が少なくとも平均粒径15μm以上70μm以下の無機系吸湿剤(C1)を含むことを特徴とするエポキシ樹脂組成物。   (A) An epoxy resin composition containing an epoxy resin, (B) a curing agent, and (C) an inorganic moisture absorbent, wherein (C) the inorganic moisture absorbent has an average particle size of at least 15 μm to 70 μm. An epoxy resin composition comprising an agent (C1). 前記無機系吸湿剤(C1)のBET比表面積が、20m/g以上100m/g以下であることを特徴とする請求項1に記載のエポキシ樹脂組成物。 The epoxy resin composition according to claim 1, wherein the inorganic moisture absorbent (C1) has a BET specific surface area of 20 m 2 / g or more and 100 m 2 / g or less. 前記(C)無機系吸湿剤の配合量が、エポキシ樹脂組成物全体の50質量%を超えてなることを特徴とする請求項1または2に記載のエポキシ樹脂組成物。   3. The epoxy resin composition according to claim 1, wherein a blending amount of the inorganic moisture absorbent (C) exceeds 50% by mass of the entire epoxy resin composition. 前記無機系吸湿剤(C1)成分の配合量が、エポキシ樹脂組成物全体の1質量以上50質量%以下であることを特徴とする請求項1〜3のいずれか一項に記載のエポキシ樹脂組成物。   The compounding quantity of the said inorganic type moisture absorbent (C1) component is 1 to 50 mass% of the whole epoxy resin composition, The epoxy resin composition as described in any one of Claims 1-3 characterized by the above-mentioned. object. 請求項1〜4のいずれか一項に記載のエポキシ樹脂組成物により成形された電子部品装置用パッケージ。   The package for electronic component apparatuses shape | molded with the epoxy resin composition as described in any one of Claims 1-4. 請求項1〜4のいずれか一項に記載のエポキシ樹脂組成物により成形された電子部品装置。   The electronic component apparatus shape | molded with the epoxy resin composition as described in any one of Claims 1-4.
JP2007104587A 2006-04-19 2007-04-12 Epoxy resin composition, package for electronic component device, and electronic component device Pending JP2007308690A (en)

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