JP2007294755A - Vertical film deposition device - Google Patents

Vertical film deposition device Download PDF

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JP2007294755A
JP2007294755A JP2006122460A JP2006122460A JP2007294755A JP 2007294755 A JP2007294755 A JP 2007294755A JP 2006122460 A JP2006122460 A JP 2006122460A JP 2006122460 A JP2006122460 A JP 2006122460A JP 2007294755 A JP2007294755 A JP 2007294755A
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boat
magnetic force
film forming
forming apparatus
generating means
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Yasuhiro Tsujita
泰広 辻田
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NEC Electronics Corp
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NEC Electronics Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a vertical deposition device adapted to stably make a boat magnetically float during deposition processing so as to prevent external vibrations from being transmitted to the boat. <P>SOLUTION: The vertical film deposition apparatus 100 comprises a lower permanent magnet 101/an upper permanent magnet 103, mounted on the lower surface/upper surface of a boat 14; a built-in lower electromagnet 102, provided on a boat bench 13 and connected electrically to a lower electromagnet control part 105; an upper electromagnet 104 disposed externally and upward of a reaction tube 5 and electrically connected to an upper electromagnet control part 106; and boat floating means constructed with the upper/lower permanent magnets 103, 101 and the upper/lower electromagnets 104, 102, arranged on a vertical line that includes the center of gravity of the boat 14, for accommodating the wafer 2 for floating the boat 14 from the boat bench 13. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、縦型成膜装置に関し、特に、成膜処理中における外部振動に起因するパーティクルの発生を抑制する縦型成膜装置に関する。   The present invention relates to a vertical film forming apparatus, and more particularly to a vertical film forming apparatus that suppresses generation of particles due to external vibration during film forming processing.

従来の縦型成膜装置の一例の概略構成を図3に示す。尚、図3は縦断面図であり、ボート上昇状態を破線で示す。   FIG. 3 shows a schematic configuration of an example of a conventional vertical film forming apparatus. FIG. 3 is a vertical cross-sectional view, and the boat ascending state is indicated by a broken line.

図3において、1は従来の縦型成膜装置、2は半導体ウェーハ(以降、単にウェーハと呼ぶ)、3はカセット、4は真空チャンバ、5は反応管、6,11は真空ポンプ、7は配管(およびバルブ)、8は原料ガス供給部、9はガス供給管、10はガス排気管、12はヒータ、13はボート台、14はボート、15はボートエレベータ、16は吸着搬送機構である。   In FIG. 3, 1 is a conventional vertical film forming apparatus, 2 is a semiconductor wafer (hereinafter simply referred to as a wafer), 3 is a cassette, 4 is a vacuum chamber, 5 is a reaction tube, 6 and 11 are vacuum pumps, 7 is Piping (and valve), 8 is a raw material gas supply unit, 9 is a gas supply pipe, 10 is a gas exhaust pipe, 12 is a heater, 13 is a boat stand, 14 is a boat, 15 is a boat elevator, and 16 is an adsorption conveyance mechanism. .

縦型成膜装置1は、多数のウェーハ2を収納したカセット3を搬入して真空排気される真空チャンバ4と、この真空チャンバ4の上方に隣接して配置された反応管5とを備えている。   The vertical film forming apparatus 1 includes a vacuum chamber 4 into which a cassette 3 containing a large number of wafers 2 is loaded and evacuated, and a reaction tube 5 arranged adjacent to the upper side of the vacuum chamber 4. Yes.

また、真空チャンバ4は、その内部を真空排気する真空ポンプ6と配管(およびバルブ)7で接続されている。   The vacuum chamber 4 is connected to a vacuum pump 6 for evacuating the inside thereof by a pipe (and valve) 7.

また、ボート台13の上には、多数のウェーハ2を水平にして縦方向に並べて収納する縦長形状のボート14が載置され、吸着搬送機構16によってカセット3とボート14間でウェーハ2の移載が可能となっている。   Further, on the boat table 13, a vertically long boat 14 that stores a large number of wafers 2 in a horizontal and vertical direction is placed, and the wafer 2 is transferred between the cassette 3 and the boat 14 by the suction transfer mechanism 16. It is possible to post.

また、ボート台13は、ボートエレベータ15によって昇降動作(図中、白抜き矢印)して、ボート14を反応管5内に挿脱するとともに、開口部に密接して反応管5と真空チャンバ4とを仕切る役目をする。   Further, the boat table 13 is moved up and down by the boat elevator 15 (indicated by white arrows in the figure), and the boat 14 is inserted into and removed from the reaction tube 5, and the reaction tube 5 and the vacuum chamber 4 are in close contact with the opening. It serves as a partition.

また、反応管5内には、原料ガス供給部8からの原料ガスを導入(図中、上向き破線矢印)するガス供給管9と、成膜処理で生じた反応生成ガスを排気(図中、下向き破線矢印)するためのガス排気管10とが配置されている。   Further, in the reaction tube 5, a gas supply pipe 9 for introducing the source gas from the source gas supply unit 8 (upward broken arrow in the figure) and the reaction product gas generated in the film forming process are exhausted (in the figure, A gas exhaust pipe 10 is arranged for a downward broken arrow).

ガス排気管10は真空ポンプ11と配管(およびバルブ)7で接続されている。   The gas exhaust pipe 10 is connected to the vacuum pump 11 by a pipe (and valve) 7.

また、反応管5の外部側方にはヒータ12が配置されている。   A heater 12 is disposed on the outside of the reaction tube 5.

次に、上記のような縦型成膜装置1の動作を説明する。   Next, the operation of the vertical film forming apparatus 1 will be described.

先ず、吸着搬送機構16を作動させ、成膜処理未了のウェーハ2をカセット3からボート14に移載した後、真空ポンプ6を作動させ、真空チャンバ4内を所定の真空度とする。   First, the suction transfer mechanism 16 is operated to transfer a wafer 2 that has not been subjected to film formation processing from the cassette 3 to the boat 14, and then the vacuum pump 6 is operated so that the vacuum chamber 4 has a predetermined degree of vacuum.

次に、ボートエレベータ15を作動させ、ボート14を上昇させ反応管5内に挿入する。   Next, the boat elevator 15 is operated to raise the boat 14 and insert it into the reaction tube 5.

その後、ガス供給管9から一定圧の原料ガスを供給しつつ、真空ポンプ11を作動させ、反応生成ガスを排気しながら所定の成膜処理を施す。   Thereafter, the vacuum pump 11 is operated while supplying the raw material gas at a constant pressure from the gas supply pipe 9, and a predetermined film forming process is performed while exhausting the reaction product gas.

そして、成膜処理が完了したら、再び、ボートエレベータ15を作動させ、ボート14を下降させる。   When the film forming process is completed, the boat elevator 15 is operated again and the boat 14 is lowered.

その後、吸着搬送機構16を作動させ、成膜処理完了のウェーハ2をボート14からカセット3に移載する。(例えば、特許文献1参照)。
特開2004−179447号公報 図4 特開平08−316157号公報 特開平10−303134号公報
Thereafter, the suction conveyance mechanism 16 is operated, and the wafer 2 after the film formation process is transferred from the boat 14 to the cassette 3. (For example, refer to Patent Document 1).
JP 2004-179447 A FIG. JP 08-316157 A JP-A-10-303134

しかしながら、上記のような特許文献1に記載の縦型成膜装置1では、成膜処理の間、反応生成ガスを排気するための真空ポンプ11を作動させておくため、真空ポンプ11が発生する振動などの外部振動が配管(およびバルブ)7や筺体などを介して、ボート台13およびボート14に伝達され、ウェーハ2とボート14間に生じる摩擦でパーティクルが発生する原因となった。そして、成膜処理中に、そのパーティクルがウェーハ2に付着した場合、パターン欠陥となるおそれがあった。   However, in the vertical film forming apparatus 1 described in Patent Document 1 described above, the vacuum pump 11 is generated because the vacuum pump 11 for exhausting the reaction product gas is operated during the film forming process. External vibrations such as vibrations are transmitted to the boat table 13 and the boat 14 through the pipe (and valve) 7 and the housing, and the friction generated between the wafer 2 and the boat 14 causes particles to be generated. When the particles adhere to the wafer 2 during the film forming process, there is a risk of pattern defects.

このため、特に成膜処理中は、ボート14に外部振動が伝達されないように工夫することが重要であり、そのためには、ボート14をボート台13から磁気浮上させることが有効な手段となった。   For this reason, it is important to devise so that external vibration is not transmitted to the boat 14, especially during the film forming process, and for that purpose, magnetically levitating the boat 14 from the boat table 13 has become an effective means. .

ここで、従来の他の構成として、特許文献2には、図4に示すように、ボート14を複数本の支持棒41で支持し、その支持棒41の下端に支持マグネット42を取り付け、それと磁気結合したチャンバ外部の上下駆動マグネット43,回転駆動マグネット44および補正マグネット45を昇降回転機構46で上下動作させて、ボート14を上下搬送する構成が開示されている。尚、図4は縦断面図および横断面図であり、ボート上昇状態を破線で示す。図3と同一部分には同一符号を付す。   Here, as another conventional configuration, in Patent Document 2, as shown in FIG. 4, the boat 14 is supported by a plurality of support bars 41, and a support magnet 42 is attached to the lower end of the support bar 41. There is disclosed a configuration in which the up and down drive magnet 43, the rotation drive magnet 44, and the correction magnet 45 outside the magnetically coupled chamber are moved up and down by an up-and-down rotation mechanism 46 to convey the boat 14 up and down. FIG. 4 is a longitudinal sectional view and a transverse sectional view, and shows a state where the boat is lifted by a broken line. The same parts as those in FIG.

しかしながら、この構成では、ボート14を昇降動作の全ストロークに亘って磁気浮上させる構成であるため、ストローク長に対応する長さの支持棒41とそれを収容する二重構造部47のスペースが必要となり、装置高さが高くなった。   However, in this configuration, since the boat 14 is magnetically levitated over the entire stroke of the lifting and lowering operation, a space for the support rod 41 having a length corresponding to the stroke length and the double structure portion 47 for accommodating it is necessary. As a result, the height of the device increased.

また、縦長形状のボート14の姿勢を、同心状に配列した直径の異なるマグネット42,43,44を用いて、ボート14からほぼストローク長だけ離れた遠い位置で、ボート14の自重力(鉛直方向)に対して垂直方向(水平方向)の力で保持制御しなければならず安定したバランス制御ができないおそれがあった。   Further, the posture of the vertically long boat 14 is determined by using the magnets 42, 43, 44 having different diameters arranged concentrically at a position far away from the boat 14 by substantially the stroke length. ) Must be controlled with a force in the vertical direction (horizontal direction), and there is a risk that stable balance control cannot be performed.

また、中央の支持マグネット42を大きさの異なるマグネット43,44で両側から等しい力で引き合ってバランスするため、少しでもバランスが崩れた場合、このアンバランスはさらに増大方向に変化する磁気結合形態であった。   In addition, since the central support magnet 42 is attracted and balanced by the magnets 43 and 44 having different sizes from both sides with equal force, if the balance is lost even a little, this unbalance is a magnetic coupling form that further changes in the increasing direction. there were.

また、ウェーハ2の積載状況により、ボート14の重心位置が若干、ばらついて支持マグネット42の中心位置からズレた場合、安定したバランス制御ができないおそれがあった。   Further, when the position of the center of gravity of the boat 14 slightly varies depending on the loading state of the wafers 2 and deviates from the center position of the support magnet 42, there is a possibility that stable balance control cannot be performed.

また、特許文献3では、図5(a),図5(b)に示すように、ボート14の側部または下部に内部磁石51を、チャンバ外部に外部磁石52をそれぞれ配置して、外部磁石52の上下動作にともなってボート14を上下搬送する構成が開示されているが、成膜処理中においては、ボート台13は反応管5に当接するため外部振動はボートに伝達される構成であり、本発明の課題を解決するものではない。尚、図5は縦断面図であり、図3と同一部分には同一符号を付す。   In Patent Document 3, as shown in FIGS. 5 (a) and 5 (b), an internal magnet 51 is disposed on the side or lower portion of the boat 14, and an external magnet 52 is disposed outside the chamber. A configuration is disclosed in which the boat 14 is transported up and down in accordance with the up-and-down movement of the boat 52. However, during the film forming process, the boat base 13 is in contact with the reaction tube 5, and thus external vibration is transmitted to the boat. However, this does not solve the problem of the present invention. 5 is a longitudinal sectional view, and the same parts as those in FIG.

本発明の主な課題は、成膜処理中、ボートを安定して磁気浮上させて、ボートに外部振動が伝達されないようにし、かつ、ボートのバランス制御が容易な縦型成膜装置を提供することである。   SUMMARY OF THE INVENTION A main object of the present invention is to provide a vertical film forming apparatus that stably floats a boat during film forming processing, prevents external vibrations from being transmitted to the boat, and allows easy balance control of the boat. That is.

本発明の縦型成膜装置は、被処理物を収納するためのボートの下方位置に配置され、互いに反発力を生じる一対の磁力発生手段と、ボートの上方位置に配置され、互いに吸引力を生じる一対の磁力発生手段とを有するボート浮上手段を備えたことを特徴とする縦型成膜装置である。   The vertical film forming apparatus of the present invention is disposed at a lower position of a boat for storing an object to be processed, and is disposed at a position above the boat and a pair of magnetic force generating means for generating a repulsive force. A vertical film forming apparatus comprising boat floating means having a pair of generated magnetic force generating means.

本発明の縦型成膜装置によれば、成膜処理中、ボートを安定して磁気浮上させて、ボートに外部振動が伝達されないようにし、かつ、ボートのバランス制御が容易な縦型成膜装置を提供することができる。   According to the vertical film forming apparatus of the present invention, during film forming processing, the boat is stably magnetically levitated so that external vibrations are not transmitted to the boat, and the boat is easily controlled in balance. An apparatus can be provided.

本発明の縦型成膜装置の一例の概略構成を図1に示す。尚、図1は縦断面図であり、ボートの磁気浮上状態を破線で示す。また、図3と同一部分には同一符号を付す。   A schematic configuration of an example of a vertical film forming apparatus of the present invention is shown in FIG. In addition, FIG. 1 is a longitudinal cross-sectional view, and the magnetic levitation state of the boat is indicated by a broken line. The same parts as those in FIG.

図1において、100は本発明の縦型成膜装置、2は半導体ウェーハ(以降、単にウェーハと呼ぶ)、3はカセット、4は真空チャンバ、5は反応管、6,11は真空ポンプ、7は配管(およびバルブ)、8は原料ガス供給部、9はガス供給管、10はガス排気管、12はヒータ、13はボート台、14はボート、15はボートエレベータ、16は吸着搬送機構、101は第1の磁力発生手段としての下部永久磁石、102は第2の磁力発生手段としての下部電磁石、103は第3の磁力発生手段としての上部永久磁石、104は第4の磁力発生手段としての上部電磁石、105は下部電磁石制御部、106は上部電磁石制御部、107はクッションバネでなる衝撃緩和手段である。   In FIG. 1, 100 is a vertical film forming apparatus of the present invention, 2 is a semiconductor wafer (hereinafter simply referred to as a wafer), 3 is a cassette, 4 is a vacuum chamber, 5 is a reaction tube, 6 and 11 are vacuum pumps, 7 Is a pipe (and valve), 8 is a source gas supply section, 9 is a gas supply pipe, 10 is a gas exhaust pipe, 12 is a heater, 13 is a boat stand, 14 is a boat, 15 is a boat elevator, 16 is an adsorption transport mechanism, 101 is a lower permanent magnet as a first magnetic force generating means, 102 is a lower electromagnet as a second magnetic force generating means, 103 is an upper permanent magnet as a third magnetic force generating means, and 104 is a fourth magnetic force generating means. The upper electromagnet, 105 is the lower electromagnet control unit, 106 is the upper electromagnet control unit, and 107 is an impact mitigating means comprising a cushion spring.

縦型成膜装置100は、多数のウェーハ2を収納したカセット3を搬入して真空排気される真空チャンバ4と、この真空チャンバ4の上方に隣接して配置された反応管5とを備えている。   The vertical film forming apparatus 100 includes a vacuum chamber 4 into which a cassette 3 containing a large number of wafers 2 is loaded and evacuated, and a reaction tube 5 arranged adjacent to the upper side of the vacuum chamber 4. Yes.

また、真空チャンバ4は、その内部を真空排気する真空ポンプ6と配管(およびバルブ)7で接続されている。   The vacuum chamber 4 is connected to a vacuum pump 6 for evacuating the inside thereof by a pipe (and valve) 7.

また、ボート台13の上には、多数のウェーハ2を水平にして縦方向に並べて収納する縦長形状のボート14が載置され、吸着搬送機構16によってカセット3とボート14間でウェーハ2の移載が可能となっている。   Further, on the boat table 13, a vertically long boat 14 that stores a large number of wafers 2 in a horizontal and vertical direction is placed, and the wafer 2 is transferred between the cassette 3 and the boat 14 by the suction transfer mechanism 16. It is possible to post.

ここで、ボート14の下面および上面には、それぞれ、下部永久磁石101および上部永久磁石103が取り付けられている。   Here, a lower permanent magnet 101 and an upper permanent magnet 103 are attached to the lower surface and the upper surface of the boat 14, respectively.

また、ボート台13は、ボートエレベータ15によって昇降動作(図中、白抜き矢印)して、ボート14を反応管5内に挿脱するとともに、開口部に密接して反応管5と真空チャンバ4とを仕切る役目をする。   Further, the boat table 13 is moved up and down by the boat elevator 15 (indicated by white arrows in the figure), and the boat 14 is inserted into and removed from the reaction tube 5, and the reaction tube 5 and the vacuum chamber 4 are in close contact with the opening. It serves as a partition.

ここで、ボート台13には、下部永久磁石101と相対向する位置に下部電磁石102が内蔵されている。   Here, the boat base 13 incorporates a lower electromagnet 102 at a position facing the lower permanent magnet 101.

この下部電磁石102は、ボート台13下面より真空チャンバ4を経由して、気密性よく引き出された配線で、チャンバ外部に配置された、下部電磁石102に流す電流の強さを制御する下部電磁石制御部105に電気接続されている。   The lower electromagnet 102 is a wiring drawn out from the lower surface of the boat table 13 through the vacuum chamber 4 with good airtightness. The lower electromagnet control for controlling the strength of the current flowing through the lower electromagnet 102 disposed outside the chamber. The unit 105 is electrically connected.

また、反応管5内には、原料ガス供給部8からの原料ガスを導入(図中、上向き破線矢印)するガス供給管9と、成膜処理で生じた反応生成ガスを排気(図中、下向き破線矢印)するためのガス排気管10とが配置されている。   Further, in the reaction tube 5, a gas supply pipe 9 for introducing the source gas from the source gas supply unit 8 (upward broken arrow in the figure) and the reaction product gas generated in the film forming process are exhausted (in the figure, A gas exhaust pipe 10 is arranged for a downward broken arrow).

ガス排気管10は真空ポンプ11と配管(およびバルブ)7で接続されている。   The gas exhaust pipe 10 is connected to the vacuum pump 11 by a pipe (and valve) 7.

また、反応管5の外部側方にはヒータ12が配置されている。   A heater 12 is disposed on the outside of the reaction tube 5.

また、反応管5の外部上方には、上部永久磁石103と相対向する位置に上部電磁石104が配置されている。   In addition, an upper electromagnet 104 is disposed at a position opposite to the upper permanent magnet 103 on the outer upper side of the reaction tube 5.

この上部電磁石104は、上部電磁石104に流す電流の強さを制御する上部電磁石制御部106に電気接続されている。   The upper electromagnet 104 is electrically connected to an upper electromagnet control unit 106 that controls the intensity of current flowing through the upper electromagnet 104.

そして、これら上部/下部永久磁石103,101および上部/下部電磁石104,102は、ウェーハ2を収納するボート14の重心(図中、黒点)を通る鉛直線上に配列され、ボート14をボート台13から浮上させるボート浮上手段を構成している。   The upper / lower permanent magnets 103 and 101 and the upper / lower electromagnets 104 and 102 are arranged on a vertical line passing through the center of gravity (black dot in the figure) of the boat 14 housing the wafer 2. It constitutes the boat ascent means to ascend from the boat.

そして、上部/下部電磁石制御部106,105は、下部永久磁石101/下部電磁石102間に生じる反発力(図中、上向き太矢印)と、上部永久磁石103/上部電磁石104間に生じる吸引力(図中、上向き太矢印)の合力と、ボート14の自重力(図中、下向き太矢印)とを釣り合わせて、ボート14をボート台13から安定して浮上させるように電流制御する。   The upper / lower electromagnet control units 106 and 105 then generate a repulsive force (upward thick arrow in the figure) generated between the lower permanent magnet 101 / lower electromagnet 102 and an attractive force generated between the upper permanent magnet 103 / upper electromagnet 104 ( In the drawing, the resultant force of the upward thick arrow) is balanced with the gravity of the boat 14 (downward thick arrow in the drawing), and current control is performed so that the boat 14 is stably levitated from the boat table 13.

ここで、上部/下部永久磁石103,101および上部/下部電磁石104,102の大きさ(平面積)は、ボート14の底面積とほぼ同じ程度の大きさとし、磁力がボート14の全底面に作用するようにしておく。   Here, the size (planar area) of the upper / lower permanent magnets 103 and 101 and the upper / lower electromagnets 104 and 102 is approximately the same as the bottom area of the boat 14, and the magnetic force acts on the entire bottom surface of the boat 14. Make sure you do.

このような磁気結合形態にすると、下部永久磁石101と下部電磁石102とが近接して対面するため安定した強力な磁力が得られる。   With such a magnetic coupling configuration, the lower permanent magnet 101 and the lower electromagnet 102 face each other close to each other, so that a stable and strong magnetic force can be obtained.

また、前述したように、磁力がボート14の全底面に作用するようにしてあるため、ウェーハ2の積載状況によってボート14の重心位置が若干ばらついても、大きな回転モーメントを生ぜしめることがない。   Further, as described above, since the magnetic force acts on the entire bottom surface of the boat 14, even if the position of the center of gravity of the boat 14 varies slightly depending on the loading state of the wafers 2, a large rotational moment is not generated.

また、縦長形状のボート14の上部を真上方向から調整可能な大きさの磁力(吸引力)で引っ張るためボート14の姿勢を直立姿勢に維持しやすい。   Further, since the upper part of the vertically long boat 14 is pulled by a magnetic force (attraction force) having a magnitude that can be adjusted from directly above, the posture of the boat 14 can be easily maintained in an upright posture.

尚、上記では、第1,3磁力発生手段として永久磁石101,103を採用し、第2,4磁力発生手段として電磁石102,104を採用する構成で説明したが、特にこれに限定するものでない。   In the above description, the permanent magnets 101 and 103 are used as the first and third magnetic force generating means, and the electromagnets 102 and 104 are used as the second and fourth magnetic force generating means. However, the present invention is not limited to this. .

また、第4磁力発生手段をチャンバ外部に配置する構成で説明したが、原料ガスに対する配線の耐久性確保の被覆をするならばチャンバ内部に配置してもよい。   Although the fourth magnetic force generating means is described as being arranged outside the chamber, it may be arranged inside the chamber as long as the coating for ensuring the durability of the wiring against the source gas is provided.

次に、上記のような縦型成膜装置100の動作を説明する。   Next, the operation of the vertical film forming apparatus 100 as described above will be described.

先ず、吸着搬送機構16を作動させ、成膜処理未了のウェーハ2をカセット3からボート14に移載した後、真空ポンプ6を作動させ、真空チャンバ4内を所定の真空度とする。   First, the suction transfer mechanism 16 is operated to transfer a wafer 2 that has not been subjected to film formation processing from the cassette 3 to the boat 14, and then the vacuum pump 6 is operated so that the vacuum chamber 4 has a predetermined degree of vacuum.

次に、ボートエレベータ15を作動させ、ボート14を上昇させ反応管5内に挿入する。   Next, the boat elevator 15 is operated to raise the boat 14 and insert it into the reaction tube 5.

ボート14の上昇動作が完了したら、上部/下部電磁石制御部106,105を作動させ、下部永久磁石101と下部電磁石102との間に反発力、上部永久磁石103と上部電磁石104との間に吸引力を、それぞれ生じせしめて、ボート14をボート台13から数mm程度、磁気浮上させて維持する。   When the ascending operation of the boat 14 is completed, the upper / lower electromagnet control units 106 and 105 are operated, the repulsive force is generated between the lower permanent magnet 101 and the lower electromagnet 102, and the attraction is generated between the upper permanent magnet 103 and the upper electromagnet 104. Each force is generated to keep the boat 14 magnetically levitated from the boat table 13 by several mm.

その後、ガス供給管9から一定圧の原料ガスを供給しつつ、真空ポンプ11を作動させ、反応生成ガスを排気しながら所定の成膜処理を施す。   Thereafter, the vacuum pump 11 is operated while supplying the raw material gas at a constant pressure from the gas supply pipe 9, and a predetermined film forming process is performed while exhausting the reaction product gas.

そして、成膜処理が完了したら、上部/下部電磁石制御部106,105を徐々に停止させ、浮上していたボート14をボート台13上にゆっくり着地させる。   When the film forming process is completed, the upper / lower electromagnet controllers 106 and 105 are gradually stopped, and the boat 14 that has been levitated is slowly landed on the boat table 13.

そして、再び、ボートエレベータ15を作動させ、ボート14を下降させる。   Then, the boat elevator 15 is operated again and the boat 14 is lowered.

その後、吸着搬送機構16を作動させ、成膜処理完了のウェーハ2をボート14からカセット3に移載する。   Thereafter, the suction conveyance mechanism 16 is operated, and the wafer 2 after the film formation process is transferred from the boat 14 to the cassette 3.

尚、上記の例では、浮上していたボート14をボート台13上にソフトランディングさせるため、上部/下部電磁石制御部106,105を徐々に停止させることで説明したが、本発明の変形例として、図2に示すように、ボート14とボート台13との間に、さらに、クッションバネ107でなる衝撃緩和手段を設けると好適である。   In the above example, the upper / lower electromagnet control units 106 and 105 are gradually stopped to softly land the boat 14 that has been levitated on the boat table 13. However, as a modification of the present invention, As shown in FIG. 2, it is preferable to further provide an impact mitigating means including a cushion spring 107 between the boat 14 and the boat table 13.

このような衝撃緩和手段は、ボート14側に配設されてもよく、また、コイルバネであっても板バネであってもよいことは言うまでもない。   Needless to say, such impact mitigation means may be disposed on the boat 14 side, and may be a coil spring or a leaf spring.

本発明はCVD装置やスパッタ装置などの成膜装置に用いることができる。とくに成膜中に減圧(大気圧未満)にする減圧成膜装置では真空ポンプの振動の影響をボート内のウェーハが受けやすいので効果が大きい。   The present invention can be used in a film forming apparatus such as a CVD apparatus or a sputtering apparatus. In particular, a reduced-pressure film forming apparatus that reduces the pressure during film formation (less than atmospheric pressure) is highly effective because the wafer in the boat is easily affected by the vibration of the vacuum pump.

本発明は、成膜処理中、ボートを磁気浮上させ、ボートに外部振動が伝達されないようにした縦型成膜装置に適用できる。   The present invention can be applied to a vertical film forming apparatus in which a boat is magnetically levitated during film forming processing so that external vibration is not transmitted to the boat.

本発明の縦型成膜装置の一例の概略構成を示す縦断面図The longitudinal cross-sectional view which shows schematic structure of an example of the vertical-type film-forming apparatus of this invention 本発明の変形例の概略構成を示す縦断面図The longitudinal cross-sectional view which shows schematic structure of the modification of this invention 従来の縦型成膜装置の一例の概略構成を示す縦断面図A longitudinal sectional view showing a schematic configuration of an example of a conventional vertical film forming apparatus 従来の縦型成膜装置の他の例の概略構成を示す縦断面図および横断面図A longitudinal sectional view and a transverse sectional view showing a schematic configuration of another example of a conventional vertical film forming apparatus 従来の縦型成膜装置の他の例の概略構成を示す縦断面図および横断面図A longitudinal sectional view and a transverse sectional view showing a schematic configuration of another example of a conventional vertical film forming apparatus

符号の説明Explanation of symbols

1 従来の縦型成膜装置
2 半導体ウェーハ
3 カセット
4 真空チャンバ
5 反応管
6,11 真空ポンプ
7 配管(およびバルブ)
8 原料ガス供給部
9 ガス供給管
10 ガス排気管
12 ヒータ
13 ボート台
14 ボート
15 ボートエレベータ
16 吸着搬送機構
41 支持棒
42 支持マグネット
43 上下駆動マグネット
44 回転駆動マグネット
45 補正マグネット
46 昇降回転機構
47 二重構造部
51 内部磁石
52 外部磁石
100 本発明の縦型成膜装置
101 下部永久磁石
102 下部電磁石
103 上部永久磁石
104 上部電磁石
105 下部電磁石制御部
106 上部電磁石制御部
107 クッションバネ
DESCRIPTION OF SYMBOLS 1 Conventional vertical film-forming apparatus 2 Semiconductor wafer 3 Cassette 4 Vacuum chamber 5 Reaction tube 6,11 Vacuum pump 7 Piping (and valve)
DESCRIPTION OF SYMBOLS 8 Source gas supply part 9 Gas supply pipe 10 Gas exhaust pipe 12 Heater 13 Boat stand 14 Boat 15 Boat elevator 16 Adsorption conveyance mechanism 41 Support rod 42 Support magnet 43 Vertical drive magnet 44 Rotation drive magnet 45 Correction magnet 46 Elevation rotation mechanism 47 Two Heavy structure portion 51 Internal magnet 52 External magnet 100 Vertical film forming apparatus 101 of the present invention 101 Lower permanent magnet 102 Lower electromagnet 103 Upper permanent magnet 104 Upper electromagnet 105 Lower electromagnet controller 106 Upper electromagnet controller 107 Cushion spring

Claims (6)

被処理物を収納するためのボートの下方位置に配置され、互いに反発力を生じる一対の磁力発生手段と、前記ボートの上方位置に配置され、互いに吸引力を生じる一対の磁力発生手段とを有するボート浮上手段を備えたことを特徴とする縦型成膜装置。   A pair of magnetic force generating means disposed at a lower position of the boat for storing the object to be processed and generating a repulsive force, and a pair of magnetic force generating means disposed at an upper position of the boat and generating an attractive force to each other. A vertical film forming apparatus provided with a boat floating means. 前記ボートの下方位置は、前記ボートの重心を通る鉛直線上の前記重心より下方位置であり、前記ボートの上方位置は、前記ボートの重心を通る鉛直線上の前記重心より上方位置であることを特徴とする請求項1に記載の縦型成膜装置。   The lower position of the boat is a position below the center of gravity on a vertical line passing through the center of gravity of the boat, and the upper position of the boat is a position above the center of gravity on a vertical line passing through the center of gravity of the boat. The vertical film-forming apparatus according to claim 1. 前記下方位置の一対の磁力発生手段は、前記ボートの下面に配設された第1磁力発生手段と前記ボートを載置するボート台に内蔵された第2磁力発生手段とでなり、前記上方位置の一対の磁力発生手段は、前記ボートの上面に配設された第3磁力発生手段と、前記第3の磁力発生手段の鉛直上方に設けられた第4磁力発生手段とでなることを特徴とする請求項1または2に記載の縦型成膜装置。   The pair of magnetic force generating means at the lower position includes a first magnetic force generating means disposed on the lower surface of the boat and a second magnetic force generating means built in a boat table on which the boat is placed. The pair of magnetic force generating means comprises a third magnetic force generating means disposed on the upper surface of the boat and a fourth magnetic force generating means provided vertically above the third magnetic force generating means. The vertical film forming apparatus according to claim 1 or 2. 前記第1,第3の磁力発生手段は永久磁石でなり、前記第2,第4の磁力発生手段は電磁石でなることを特徴とする請求項3に記載の縦型成膜装置。   4. The vertical film forming apparatus according to claim 3, wherein the first and third magnetic force generation means are permanent magnets, and the second and fourth magnetic force generation means are electromagnets. 前記ボートと前記ボートを載置するボート台との間に、さらに、衝撃緩和手段を設けたことを特徴とする請求項1から4のいずれかに記載の縦型成膜装置。   The vertical film-forming apparatus according to any one of claims 1 to 4, further comprising an impact relaxation means provided between the boat and a boat table on which the boat is placed. 前記衝撃緩和手段は、クッションバネでなることを特徴とする請求項5に記載の縦型成膜装置。
The vertical film forming apparatus according to claim 5, wherein the impact relaxation means is a cushion spring.
JP2006122460A 2006-04-26 2006-04-26 Vertical film deposition device Pending JP2007294755A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11996311B2 (en) 2022-03-18 2024-05-28 Kokusai Electric Corporation Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11996311B2 (en) 2022-03-18 2024-05-28 Kokusai Electric Corporation Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium

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