JP2007234822A5 - - Google Patents
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- Publication number
- JP2007234822A5 JP2007234822A5 JP2006053804A JP2006053804A JP2007234822A5 JP 2007234822 A5 JP2007234822 A5 JP 2007234822A5 JP 2006053804 A JP2006053804 A JP 2006053804A JP 2006053804 A JP2006053804 A JP 2006053804A JP 2007234822 A5 JP2007234822 A5 JP 2007234822A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- capping layer
- optical element
- substrate
- repairing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 claims 13
- 239000000463 material Substances 0.000 claims 11
- 238000005259 measurement Methods 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 10
- 238000004519 manufacturing process Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 3
- 238000006552 photochemical reaction Methods 0.000 claims 3
- 239000000126 substance Substances 0.000 claims 2
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006053804A JP2007234822A (ja) | 2006-02-28 | 2006-02-28 | 露光装置及びその制御方法並びにデバイス製造方法 |
| US11/677,241 US8004657B2 (en) | 2006-02-28 | 2007-02-21 | Exposure apparatus, control method for the same, and device manufacturing method |
| TW096106877A TW200745725A (en) | 2006-02-28 | 2007-02-27 | Exposure apparatus, control method for the same, and device manufacturing method |
| KR1020070019990A KR100861388B1 (ko) | 2006-02-28 | 2007-02-28 | 노광 장치 및 그 제어 방법, 및 디바이스 제조 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006053804A JP2007234822A (ja) | 2006-02-28 | 2006-02-28 | 露光装置及びその制御方法並びにデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007234822A JP2007234822A (ja) | 2007-09-13 |
| JP2007234822A5 true JP2007234822A5 (https=) | 2009-03-26 |
Family
ID=38444405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006053804A Withdrawn JP2007234822A (ja) | 2006-02-28 | 2006-02-28 | 露光装置及びその制御方法並びにデバイス製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8004657B2 (https=) |
| JP (1) | JP2007234822A (https=) |
| KR (1) | KR100861388B1 (https=) |
| TW (1) | TW200745725A (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007234822A (ja) | 2006-02-28 | 2007-09-13 | Canon Inc | 露光装置及びその制御方法並びにデバイス製造方法 |
| US9645502B2 (en) | 2011-04-08 | 2017-05-09 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
| NL2017671A (en) * | 2015-11-11 | 2017-05-26 | Asml Netherlands Bv | A radiation system and optical device |
| DE102016224200A1 (de) | 2016-12-06 | 2018-06-07 | Carl Zeiss Smt Gmbh | Verfahren zum Reparieren von reflektiven optischen Elementen für die EUV-Lithographie |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5429730A (en) * | 1992-11-02 | 1995-07-04 | Kabushiki Kaisha Toshiba | Method of repairing defect of structure |
| US5835560A (en) | 1994-05-24 | 1998-11-10 | Canon Kabushiki Kaisha | Exposure apparatus |
| US6228512B1 (en) * | 1999-05-26 | 2001-05-08 | The Regents Of The University Of California | MoRu/Be multilayers for extreme ultraviolet applications |
| US6533952B2 (en) * | 1999-06-08 | 2003-03-18 | Euv Llc | Mitigation of radiation induced surface contamination |
| TWI267704B (en) * | 1999-07-02 | 2006-12-01 | Asml Netherlands Bv | Capping layer for EUV optical elements |
| JP4560182B2 (ja) | 2000-07-06 | 2010-10-13 | キヤノン株式会社 | 減圧処理装置、半導体製造装置およびデバイス製造方法 |
| TW548524B (en) * | 2000-09-04 | 2003-08-21 | Asm Lithography Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| US6954255B2 (en) | 2001-06-15 | 2005-10-11 | Canon Kabushiki Kaisha | Exposure apparatus |
| JP2003022950A (ja) | 2001-07-05 | 2003-01-24 | Canon Inc | Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置 |
| JP2003115451A (ja) | 2001-07-30 | 2003-04-18 | Canon Inc | 露光装置及びそれを用いたデバイスの製造方法 |
| US20050109278A1 (en) * | 2003-11-26 | 2005-05-26 | Ted Liang | Method to locally protect extreme ultraviolet multilayer blanks used for lithography |
| US7561247B2 (en) * | 2005-08-22 | 2009-07-14 | Asml Netherlands B.V. | Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
| JP2007067344A (ja) | 2005-09-02 | 2007-03-15 | Canon Inc | 露光装置および方法ならびにデバイス製造方法 |
| KR20070054019A (ko) * | 2005-11-22 | 2007-05-28 | 삼성전자주식회사 | 원자힘 현미경 리소그래피 기술을 이용한 극자외선 마스크수정 방법 |
| JP2007234822A (ja) | 2006-02-28 | 2007-09-13 | Canon Inc | 露光装置及びその制御方法並びにデバイス製造方法 |
-
2006
- 2006-02-28 JP JP2006053804A patent/JP2007234822A/ja not_active Withdrawn
-
2007
- 2007-02-21 US US11/677,241 patent/US8004657B2/en not_active Expired - Fee Related
- 2007-02-27 TW TW096106877A patent/TW200745725A/zh unknown
- 2007-02-28 KR KR1020070019990A patent/KR100861388B1/ko not_active Expired - Fee Related
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