JP2007220894A - Pattern correction equipment and correction liquid atomization unit - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pattern correction equipment which can efficiently generate minute fog particles and can correct a defective portion without protruding from the width of a micropattern. <P>SOLUTION: In this atomization portion of the pattern correction equipment, an ultrasonic vibrator 21 is provided in the bottom of a container 19 into which a correction liquid 20 is poured, the correction liquid 20 is atomized by a given ultrasonic energy. Consequently, minute fog particles can be efficiently generated compared with the case that the correction liquid 20 is atomized by the principle of spray. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a pattern correction device and a correction liquid atomizing unit, and more particularly to a pattern correction device for correcting a defective portion of a fine pattern formed on a substrate and a correction liquid atomization unit used therefor. More specifically, the present invention relates to a pattern correction apparatus for correcting an open defect of an electrode generated in a manufacturing process of a flat panel display, and a correction liquid atomizing unit used therefor.

  In recent years, with the increase in size and definition of flat panel displays such as plasma displays, liquid crystal displays, and EL displays, the probability of defects on electrodes on glass substrates has increased, and defects have been improved in order to improve yield. A method of correcting the problem has been proposed.

For example, electrodes are formed on the surface of a glass substrate of a liquid crystal display. When this electrode is disconnected, the conductive paste adhered to the tip of the application needle is applied to the disconnected portion, and applied multiple times while shifting the application position in the length direction of the electrode to correct the electrode (for example, Patent Documents) 1).
JP-A-8-292442

  However, in the conventional defect correction method, since the application needle is replenished between the electrode disconnection part and the paste tank and applied while replenishing the conductive needle with the conductive paste, the longer the disconnection part, the longer the time required for correction. become longer. In addition, since the paste is applied in a shape in which circular application portions are arranged in one row, it is necessary to perform laser cutting processing on the portion protruding from the width of the electrode after application. In particular, when a fine electrode having a width of 20 μm or less is corrected, it is difficult to correct the electrode without protruding from the width of the electrode.

  Therefore, the present inventor supplies atomized gas to the spray nozzle whose lower part is immersed in the correction liquid, makes the correction liquid mist using the spraying principle, converges the mist-like correction liquid and injects it to the defective part. Then, a pattern correction method for correcting the correction liquid by depositing it on the defective portion has been proposed (for example, see Japanese Patent Application No. 2005-50766). In this method, since the correction liquid can be ejected while being replenished, the defective portion can be corrected more quickly than in the prior art in which the application needle reciprocates between the defective portion and the paste tank many times. .

  However, in this pattern correction device, the correction liquid is atomized by using the principle of spraying. Therefore, it is difficult to make the correction liquid into minute mist particles of about several μm, and a fine electrode portion that cuts 10 μm. In some cases, it was not suitable to correct without overhanging.

  In addition, since it is necessary to exhaust the atomizing gas at the decompression section after the spray section, most of the fog particles are exhausted to the outside together with the atomizing gas, or the fog particles adhere to the inner wall of the decompression section and become droplets. The use efficiency of correction fluid was low.

  Therefore, a main object of the present invention is to provide a pattern correction apparatus and a correction liquid atomization unit that can efficiently generate minute fog particles and can correct a defective portion without protruding from the width of the fine pattern. It is to provide.

  The pattern correction device according to the present invention is a pattern correction device for correcting a defective portion of a fine pattern formed on a substrate, and sprays the correction liquid in the form of a mist and sprays the correction liquid on the defective portion. A deposition device that corrects the defective portion by applying ultrasonic vibrations to the correction liquid to make the correction liquid in a mist state, and the spray solution that converges the mist-like correction liquid from the coating nozzle. And a jetting head portion. Therefore, since the correction liquid is atomized by ultrasonic vibration, fine mist particles can be generated efficiently, and the defective portion can be corrected without protruding from the width of the fine pattern.

  Preferably, the spray unit includes a water tank, a container provided in the water tank, into which the correction liquid is injected, and an ultrasonic vibrator that applies ultrasonic vibration to the correction liquid in the container via the water in the water tank. Including. Therefore, since the ultrasonic vibration is applied through the water in the water tank, the ultrasonic vibrator is not damaged by the temperature rise even when the correction liquid is lost. Further, since the correction liquid is injected into the container, the amount of the correction liquid used can be reduced. Further, the correction fluid can be exchanged in units of containers, and operability is good.

  Preferably, the spray unit further includes a position adjusting mechanism for adjusting the position of the container in the water tank. In this case, a container can be arrange | positioned in the optimal position for atomization of correction liquid.

  Preferably, the spraying unit further includes an angle adjusting mechanism that adjusts an inclination angle of the container with respect to the water surface in the water tank. In this case, it is possible to make the correction liquid atomized easily by reducing the thickness of the correction liquid at the position where the ultrasonic power is applied. Further, the inclination angle of the container can be set to an optimum value according to the amount, viscosity, and type of the correction fluid.

  Further preferably, the angle adjusting mechanism includes a spherical bush bearing having an inner ring to which the container is fixed and an outer ring for holding the inner ring at a desired inclination angle. In this case, the inclination angle of the container can be set freely.

  Further, the correction liquid atomization unit according to the present invention is a correction liquid atomization unit that generates a mist-like correction liquid to be injected and corrected on a defective portion of a fine pattern formed on a substrate. A container provided in the water tank, into which the correction liquid is injected, and an ultrasonic vibrator that applies ultrasonic vibration to the correction liquid in the container through the water in the water tank to make the correction liquid in a mist state. It is characterized by. Therefore, since the correction liquid is atomized by ultrasonic vibration, minute fine fog particles can be efficiently generated, and the defect portion can be corrected without protruding from the width of the fine pattern. Further, since the ultrasonic vibration is applied through the water in the water tank, the ultrasonic vibrator is not damaged by the temperature rise even when the correction liquid is lost. Further, since the correction liquid is injected into the container, the amount of the correction liquid used can be reduced. Further, the correction fluid can be exchanged in units of containers, and operability is good.

  Preferably, a position adjusting mechanism for adjusting the position of the container in the water tank is further provided. In this case, the container can be arranged at an optimal position for atomizing the correction fluid.

  Further preferably, an angle adjustment mechanism for adjusting the inclination angle of the container with respect to the water surface in the water tank is further provided. In this case, it is possible to make the correction liquid atomized easily by reducing the thickness of the correction liquid at the position where the ultrasonic power is applied. Further, the inclination angle of the container can be set to an optimum value according to the amount, viscosity, and type of the correction fluid.

  Preferably, the defective portion of the fine pattern is a broken portion of the electrode, and the correction liquid is a metal paste. In this case, the disconnection portion of the electrode can be corrected without protruding from the width of the fine electrode.

  As described above, in the pattern correction device and the correction liquid atomization unit according to the present invention, since the correction liquid is atomized by applying ultrasonic vibration to the correction liquid, it is possible to efficiently generate fine mist particles. The defect portion can be corrected without protruding from the width of the fine pattern. In the correction liquid atomizing unit, since the ultrasonic vibration is applied to the correction liquid in the container through the water in the water tank, the ultrasonic vibrator is not damaged by the temperature rise even when the correction liquid is exhausted. Further, since the correction liquid is injected into the container, the amount of the correction liquid used can be reduced. Further, the correction fluid can be exchanged in units of containers, and operability is good.

[Embodiment 1]
FIG. 1 is a diagram showing an overall configuration of a pattern correction apparatus according to Embodiment 1 of the present invention. In FIG. 1, a pattern correction apparatus 1 includes an observation optical system 2 that observes the surface of a substrate, a monitor 3 that displays an observed image, and a laser beam that is irradiated through the observation optical system 2 to cut unnecessary portions. A laser unit 4 for use, a fine particle deposition apparatus 5 for depositing fine particles on a defective part by spraying a correction liquid in the form of a nano-particle of a correction material for defect correction in a solvent and spraying it onto the defective part; The operation of the substrate heating unit 6 for heating the unit to vaporize the solvent in the mist-like correction liquid, the image processing unit 7 for recognizing the defective unit, the host computer 8 for controlling the entire device, and the operation of the device mechanism unit are controlled. And a control computer 9. In addition, an XY stage 10 that moves a substrate having a defective portion in the XY direction (horizontal direction), a chuck portion 11 that holds the substrate on the XY stage 10, and the observation optical system 2 and the particle deposition apparatus 5 are moved in the Z direction. A Z stage 12 that is moved in the (vertical direction) is provided.

FIG. 2 is a cross-sectional view showing a main part of the pattern correction apparatus shown in FIG. A pattern having a defective portion 13 a, for example, the substrate 14 on which the electrode 13 is formed, is fixed to the chuck portion 11, and the chuck portion 11 is moved in the XY direction by the XY stage 10. It is also possible to incorporate a heater for heating the entire substrate 14 in the chuck unit 11 and use it together with the substrate heating unit 6 that can partially heat the range including the defective portion 13a from the upper side of the substrate 14. When the substrate 14 is large, it is necessary to heat the entire substrate 14 by incorporating a heater in the chuck unit 11. In such a case, it is preferable to use only the substrate heating unit 6. preferable. As the substrate heating unit 6, an LD light source, a CO ₂ laser, or the like can be used. Further, when heating is not necessary, the heating unit is omitted.

  The fine particle deposition apparatus 5 converts the correction material used for correction into nanoparticles, uniformly sprays the correction material in a solvent and liquefies the correction liquid into a mist, and heats the mist-like correction liquid for heating. Part 17 and head part 18 which converges the heated mist-like correction liquid, ejects it to defective part 13a, and deposits fine particles on defective part 13a.

  A correction liquid 20 is injected into the container 19 of the spray unit 15. In the case of correcting the defective portion 13a of the electrode 13, as the correction solution 20, a solution obtained by diluting a silver paste, a gold paste, a copper paste, or a palladium paste using metal nanoparticles is used. Alternatively, a metal complex solution or a metal colloid may be used as the correction liquid 20. The correction liquid 20 preferably has a low viscosity of 10 mPa · s or less and a water-soluble or alcohol solvent.

  An ultrasonic vibrator 21 is provided at the center of the bottom of the container 19, and the whole or a part of the ultrasonic vibrator 21 is immersed in the correction liquid 20. When the ultrasonic vibrator 21 is driven, the ultrasonic energy is transmitted through the correction liquid 20, and the surface of the correction liquid 20 is lifted by this power to form a mountain. The mist particles of the correction liquid 20 are generated so that the surface tension is reduced and the correction liquid 20 is torn from the crest. The fog particles are fine particles having a diameter of about several μm. The size of the mist particles differs depending on the material of the correction liquid 20 and the frequency at which the ultrasonic vibrator 21 is driven. The higher the frequency, the smaller the mist particle diameter. The drive frequency of the ultrasonic transducer 21 is set to, for example, about 1.6 MHz to 2.4 MHz.

  A gas supply pipe 22 is provided at the upper part of the container 19. A carrier gas, for example, nitrogen gas, for conveying the mist particles of the correction liquid 20 to the subsequent stage is injected into the container 19 from a gas supply source (not shown) through the gas supply pipe 22. As long as the correction liquid 20 is not oxidized, the carrier gas may be air.

  An output tube 23 is provided on the side of the container 19. The mist particles of the correction liquid 20 generated in the container 19 are sent to the heating unit 17 via the output pipe 23. A hose or the like is used as the gas supply pipe 22 or the output pipe 23. A pipe 27 is disposed in the center of the heating unit 17, and a heater 28 and a temperature sensor 29 are attached to the outer periphery of the pipe 27. By controlling the current of the heater 28 based on the detection result of the temperature sensor 29, the pipe 27 is adjusted to a predetermined temperature, and the mist particles in the pipe 27 are heated. By heating the mist particles, the flow and scattering of the mist particles adhering to the defect portion 13a are suppressed. The heater 28 is covered with a heat insulating member (not shown). Further, depending on the correction liquid 20, the heating unit 17 can be omitted as shown in FIG.

  Returning to FIG. 2, the head unit 18 covers the periphery of the mist particles with a sheath gas (for example, nitrogen gas), converges the flow of the mist particles, and mists from the coating nozzle 30 at the lower end of the head unit 18 toward the defect portion 13 a. Eject particles. The inner diameter of the spray nozzle of the coating nozzle 30 is about 100 to 200 μm, and the flow of mist particles can be converged to about 1/10 of the inner diameter of the spray nozzle by the sheath gas, and a fine pattern of about 10 μm is drawn. Is also possible.

  The shutter 31 receives the mist particles ejected from the coating nozzle 30 so that the mist particles are not ejected onto the substrate 14 before the defect correction is performed. At the start of correction, the shutter 31 is opened to correct the defect. Simultaneously with the completion of the correction, the shutter 31 is moved between the tip of the coating nozzle 30 and the substrate 14 to receive fog particles. The shutter 31 may have a function of sucking the fog particles ejected from the application nozzle 30.

  Next, a method for using this pattern correction apparatus will be described. FIG. 4A is a diagram illustrating an open defect portion 13a of the electrode 13 formed on the surface of the substrate 14, and FIG. 4B is a diagram illustrating a process in the middle of correcting the open defect portion 13a. The XY stage 10 is driven to move the coating nozzle 30 and the substrate 14 relatively to deposit nanoparticles of the correction material from one end of the defect portion 13a toward the other end. At this time, the distance between the tip of the application nozzle 30 and the surface of the substrate 14 can be maintained at a constant distance (for example, around 5 mm) and corrected without contact.

  In order to keep the line width of the deposition layer of the nanoparticles constant, a part of the substrate 14 or the entire substrate 14 is maintained at an optimum temperature within a range including the defect portion 13a, and the flow rate of the carrier gas supplied to the spraying portion 15; It is necessary to manage the temperature of the heating unit, the flow rate of the sheath gas of the head unit 18 and the like to optimum values. Note that the distance between the tip of the coating nozzle 30 and the substrate 14 has a relatively small influence on the line width of the deposited layer of nanoparticles.

  FIG. 4C is a diagram illustrating a state where the repair of the defective portion 13a is completed. The correction unit 32 made of a nanoparticle deposition layer may be further baked by the substrate heating unit 6, or the entire substrate 14 may be baked again in a separate furnace. In addition, when the film thickness of the correction | amendment part 32 is insufficient, what is necessary is just to laminate | stack a nanoparticle deposition layer by repeating repeatedly. Further, when the line width of the correction portion 32 is thicker than the line width of the electrode 13 or nanoparticles adhere to portions other than the correction portion 32, the unnecessary portion may be laser-cut using the laser portion 4. .

  In addition, depending on the conditions, it is possible to perform convergent jetting at room temperature without heating the substrate 14. In this case, although the drawing line tends to be thick, the evaporation of the correction liquid 20 becomes gentle and the fog particles do not bounce, so that the amount of scattered matter is reduced as compared with the case where the substrate 14 is heated. Furthermore, if the amount of mist particles supplied to the head portion 18 is reduced and convergent jetting is performed, scattering is reduced by the viscosity of the metal paste without heating the substrate 14, and fine lines of about 10 μm can be drawn even at room temperature. It becomes possible. Then, conduction is obtained by local heating by the substrate heating unit 6 or baking by a furnace.

  In this pattern correction apparatus, the substrate 14 is moved by the XY stage 10 and the deposited layer is drawn. However, the deposited layer may be drawn by moving the fine particle deposition apparatus 5 without moving the substrate 14.

  The XY stage 10 may be of various types such as a uniaxial stage stacked in the XY direction, or a gantry system in which the substrate 14 is fixed and the X axis and Y axis are separated and driven. The stage is not limited.

  In the first embodiment, since the ultrasonic vibrator 21 is provided in the correction liquid 20 in the container 19 and the correction liquid 20 is subjected to ultrasonic vibration to be atomized, the correction liquid 20 is applied using the principle of spraying. Compared to the case of atomization, fine mist particles can be generated. Specifically, the correction liquid 20 can be made into minute mist particles of about several μm, and the disconnected portion can be corrected without protruding from a fine electrode portion that cuts 10 μm.

  In addition, there is no need to exhaust the atomizing gas by providing a decompression part after the spraying part as in the case of using the mist spray principle, and many of the fog particles are exhausted to the outside together with the atomizing gas, or on the inner wall of the decompression part. Mist particles do not adhere and become droplets. Therefore, the usage efficiency of the correction fluid 20 is increased.

[Embodiment 2]
In the first embodiment, the ultrasonic vibrator 21 is provided on the bottom of the container 19 of the spray unit 15. However, when the ultrasonic vibrator 21 is driven in a state where the correction liquid 20 is not used, the ultrasonic vibrator 21 is cooled. It is not heated and damaged. Therefore, in the first embodiment, a large amount of the correction liquid 20 is put in the container 19 to prevent the ultrasonic vibrator 21 from being damaged and promote the cooling of the ultrasonic vibrator 21.

  However, the correction liquid 20 such as a metal nanopaste has a long shelf life when used at room temperature and needs to be replaced periodically in a short period of time. Is preferably less. Further, when the material of the correction fluid 20 is periodically changed, it is necessary to clean the container 19 including the ultrasonic vibrator 21 or replace the spray unit 15 together, which is not convenient. The second embodiment solves this problem.

  FIG. 5 is a cross-sectional view showing the configuration of the spray section 15 of the pattern correction apparatus according to Embodiment 2 of the present invention. In FIG. 5, in this pattern correction device, the container 19 of the spray unit 15 includes a small bottle 40 and a lid 41. As the small bottle 40, for example, a screw mouth glass bottle having an outer diameter of about 30 mm is used. A small amount of correction fluid 20 is put into the bottom of the small bottle 40 and then the lid 41 is closed. The gas supply pipe 22 and the output pipe 23 are connected to the lid 41. A sealing member (not shown) is provided on the contact surface between the small bottle 40 and the lid 41, and the hermeticity of the container 19 is ensured.

  The bottom of the small bottle 40 is provided close to the water surface of a water tank 42 in which the ultrasonic transducer 21 is disposed on the bottom surface, or is immersed in water. The ultrasonic energy of the ultrasonic transducer 21 is transmitted through the water, and the water surface is lifted by this power to form a mountain of water. This power is transmitted to the correction liquid 20 via the bottom of the container 19, and the surface tension in the correction liquid 20 is reduced to generate mist particles from the correction liquid 20. Since other configurations are the same as those of the first embodiment, description thereof will not be repeated.

  In the second embodiment, the ultrasonic vibrator 21 is provided at the bottom of the water tank 42, the small bottle 40 into which the correction liquid 20 is injected is provided in the water tank 42, and ultrasonic energy is supplied to the water in the water tank 42 and the bottom of the small bottle 40. To the correction fluid 20 via Therefore, since the ultrasonic vibrator 21 is cooled by the water in the water tank 42, the ultrasonic vibrator 21 is not damaged by the temperature rise even if the correction liquid 20 in the small bottle 40 is used up. Moreover, since the correction liquid 20 in the small bottle 40 does not have the cooling function of the ultrasonic vibrator 21, the injection amount of the correction liquid 20 in the spray portion can be reduced. In addition, the ultrasonic vibrator 21 is not contaminated by the correction liquid 20, and when the correction liquid 20 is replaced, only the container 19 needs to be replaced, so that it is easy to use and is excellent in economic efficiency and maintainability.

  In addition, in order to prevent the water in the water tank 42 from decreasing and the temperature of the ultrasonic vibrator 21 and the water tank 42 from rising, and to improve safety, a water level sensor that detects the water level in the water tank 42, You may provide the temperature sensor which detects the temperature of the sound wave vibrator 21, the water tank 42, or the water in the water tank 42. FIG.

[Embodiment 3]
FIG. 6 is a cross-sectional view showing the structure of the spray section of the pattern correction apparatus according to Embodiment 3 of the present invention. In FIG. 6, this spraying unit is different from the spraying unit in FIG. 5 in that the container 19 is disposed in an inclined manner in the water tank 42. The reason for inclining the container 19 is to promote atomization of the correction liquid 20 by generating a thin part of the correction liquid 20 and applying ultrasonic power to the part.

  FIG. 7 is a diagram illustrating a detailed configuration of the spray unit illustrated in FIG. 6. In this spraying part, a mechanism for adjusting the position and inclination angle of the container 19 in the water tank 42 is provided. The water tank 42 includes a bottom plate 43, a hollow cylindrical member 44, and a water tank lid 45. The surface where the bottom plate 43 and the hollow cylindrical member 44 are in contact is sealed with an O-ring 46.

  The ultrasonic vibrator 21 includes a case 47, a ceramic vibrator 48 provided at the center of the upper surface of the case 47, and a seal member 49 for preventing water leakage. The upper surface of the case 47 is fixed to the lower surface 43 b of the bottom plate 43 through a seal member 49 so as to close a through hole 43 a opened in the center of the bottom plate 43. A box-shaped support base 50 is provided under the water tank 42. The support base 50 incorporates a drive circuit 51 for the ultrasonic transducer 21, and a fan 52 for air-cooling the drive circuit 51 is provided on a side surface of the support base 50.

  A female screw portion 41 a formed at the lower end portion of the inner sliding surface of the lid 41 is screwed into the screw mouth portion 40 a at the upper end portion of the outer peripheral surface of the small bottle 40 constituting the container 19. In order to improve the sealing performance between the small bottle 40 and the lid 41, an O-ring 60 is provided on the contact surface between the small bottle 40 and the lid 41. A through hole 41b is formed in the upper side surface of the lid 41, and a joint 61 is fixed to the through hole 41b. A gas supply pipe 22 for supplying carrier gas is connected to the joint 61. A protrusion 41c is provided at the center of the upper end surface of the lid 41, a through hole 41d is formed at the center of the protrusion 41c, and a tube 62 is inserted into the through hole 41d. A joint 63 is fixed to the upper end portion of the tube 62, and the joint 63 is connected to an output pipe 23 for outputting mist particles to the next stage.

  The tube 62 is provided so as to be able to advance and retreat with respect to the container 19 through the through hole 41d. That is, the nut 64 is screwed onto the male screw formed on the outer peripheral surface of the protrusion 41c of the lid 41, and the taper member 65 is pressed downward on the inner end surface of the nut 64, whereby the O-ring 66 is connected to the inner peripheral surface of the protrusion 41c. And between the outer peripheral surface of the tube 62. As a result, the seal between the projection 41c and the tube 62 is performed, and the tube 62 is fixed at an arbitrary position in the through hole 41d.

  Further, on the water tank lid 45, the container 19 is tilted and held with respect to the water surface in the water tank 42, and a movable base 70 for adjusting the position of the container 19 in the water tank 42 is movable in the horizontal direction. Is provided. The movable table 70 is fixed on the water tank lid 45 by closing the screw 71. A through hole 45a is opened at the center of the water tank lid 45, and the bottom of the small bottle 40 is inserted obliquely into the water surface in the water tank 42 through the through hole 45a. The through hole 45a is sealed by the movable table 70 or the like, and the evaporation of water in the water tank 42 is kept to a minimum.

  The movable table 70 includes a holding hole 70 a provided obliquely with respect to the water surface in the water tank 42. A spherical bush bearing 72 for adjusting the inclination angle of the container 19 with respect to the water surface in the water tank 42 is fixed to the holding hole 70 a with a set screw 73. The spherical bush bearing 72 includes an inner ring 72a and an outer ring 72b. The inner ring 72a has a through-hole formed in a sphere, and the outer ring 72b includes an inner spherical surface that grips the outer spherical surface of the inner ring 72a. The angle between the central axis of the inner ring 72a and the central axis of the outer ring 72b can be adjusted to an arbitrary angle between 0 ° ± 10 °, for example. The spherical bush bearing 72 is preferably made of resin or stainless steel.

  A cylindrical spacer 74 is inserted into the through hole of the inner ring 72a of the spherical bush bearing 72 from obliquely above. A protrusion provided along the upper end portion of the outer peripheral surface of the spacer 74 is brought into contact with the upper end of the inner ring 72a, and a nut 75 is screwed into a male screw portion formed at the lower end portion of the outer peripheral surface of the spacer 74. 72a is fixed. The container 19 is inserted into the through-hole 74a of the spacer 74 from above, and the container 19 is held in the through-hole 74a of the spacer 74 so as to be able to advance and retract. When the lid 41 of the container 19 is locked by the screw 76 screwed into the screw hole formed in the protrusion at the upper end of the spacer 74, the container 19 is fixed to the spacer 74.

  With this configuration, the inclination angle of the container 19 with respect to the water surface in the water tank 42 can be set to an arbitrary value within the movable range of the spherical bush bearing 72. The setting range of the tilt angle is, for example, about 60 ± 10 degrees. Further, the position of the container 19 relative to the water surface of the water tank 42 can be adjusted by moving the container 19 in parallel. Furthermore, it becomes possible to adjust the insertion depth of the bottom of the small bottle 40 with respect to the water surface of the water tank 42 by moving the container 19 diagonally up and down. By adjusting the inclination angle and position of the container 19 in this way, it is possible to set the conditions for atomizing the correction liquid 20 by the ultrasonic vibrator 21 to the optimum conditions.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

It is a perspective view which shows the whole structure of the pattern correction apparatus by Embodiment 1 of this invention. It is sectional drawing which shows the principal part of the pattern correction apparatus shown in FIG. It is sectional drawing which shows the other structure of the fine particle deposition apparatus shown in FIG. It is a figure which shows the usage method of the pattern correction apparatus shown in FIGS. It is sectional drawing which shows the structure of the spray part of the pattern correction apparatus by Embodiment 2 of this invention. It is sectional drawing which shows the structure of the spray part of the pattern correction apparatus by Embodiment 3 of this invention. It is sectional drawing which shows the detailed structure of the spraying part shown in FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Pattern correction apparatus 2 Observation optical system 3 Monitor 4 Cut laser part 5 Fine particle deposition apparatus 6 Substrate heating part 7 Image processing part 8 Host computer 9 Control computer 10 XY stage 11 Chuck part , 12 Z stage, 13 electrode, 13a defective part, 14 substrate, 15 spraying part, 17 heating part, 18 head part, 19 container, 20 correction fluid, 21 ultrasonic transducer, 22 gas supply pipe, 23 output pipe, 27 Pipe, 28 Heater, 29 Temperature sensor, 30 Coating nozzle, 31 Shutter, 32 Correction part, 40 Small bottle, 40a Screw port part, 41 Lid, 41a Female thread part, 41b, 41d Through hole, 41c Projection part, 42 Water tank, 43 Bottom plate 43a through hole, 43b bottom surface, 44 hollow cylindrical member, 45 water tank lid, 45a through hole, 46, 6 6 O-ring, 47 case, 48 ceramic vibrator, 49 seal member, 50 support base, 51 drive circuit, 52 fan, 60 O-ring, 61, 63 joint, 62 tube, 64, 75 nut, 65 taper member, 70 movable Base, 70a Holding hole, 71, 73 Screw, 72 Spherical bush bearing, 72a Inner ring, 72b Outer ring, 74 Spacer, 74a Through hole.

Claims (9)

A pattern correction apparatus for correcting a defective portion of a fine pattern formed on a substrate,
A depositing device that corrects the defective part by spraying the correcting liquid in the form of a mist and spraying the correcting liquid on the defective part;
The deposition apparatus includes: a spray unit that applies ultrasonic vibration to the correction liquid to make the correction liquid in a mist state; and a head unit that converges the mist of the correction liquid and ejects it from an application nozzle. Characteristic pattern correction device.   The spray unit is provided in a water tank, a container in which the correction liquid is injected, and an ultrasonic vibrator that applies ultrasonic vibration to the correction liquid in the container via the water in the water tank. The pattern correction apparatus according to claim 1, further comprising:   The pattern correction apparatus according to claim 2, wherein the spray unit further includes a position adjustment mechanism that adjusts a position of the container in the water tank.   The pattern correction apparatus according to claim 2, wherein the spray unit further includes an angle adjustment mechanism that adjusts an inclination angle of the container with respect to a water surface in the water tank.   The pattern correction device according to claim 4, wherein the angle adjusting mechanism includes a spherical bush bearing having an inner ring to which the container is fixed and an outer ring that holds the inner ring at a desired inclination angle. In a correction liquid atomization unit that generates a mist-like correction liquid for spraying and correcting a defective portion of a fine pattern formed on a substrate,
An ultrasonic vibration is applied to the correction liquid in the container via the water tank, the container in which the correction liquid is injected, and the water in the water tank, and the correction liquid is atomized. A correction liquid atomizing unit comprising an ultrasonic transducer.   Furthermore, the correction liquid atomization unit of Claim 6 provided with the position adjustment mechanism which adjusts the position of the said container in the said water tank.   Furthermore, the correction liquid atomization unit of Claim 6 or 7 provided with the angle adjustment mechanism which adjusts the inclination-angle of the said container with respect to the water surface in the said water tank. The defect part of the fine pattern is a broken part of the electrode,
The correction liquid atomizing unit according to claim 6, wherein the correction liquid is a metal paste.

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