JP2007217768A - Manufacturing method of sliding component for compressor, and sliding component for compressor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a sliding component having seizure resistance and low friction coefficient and excellent in applications for a compressor. <P>SOLUTION: In the method for manufacturing a sliding component for a compressor, a sputtering apparatus is used, which comprises a film deposition furnace, a target fixing means 10 in which a carbon target 11 consisting of at least carbon, sulfide targets 12, 14 consisting of sulfide, and a metal target 13 containing metal atoms are arrayed in a ring in the film deposition furnace, a component holding means 20 which holds component bodies (A, B), and continuously changes the targets 11-14 facing the component bodies by moving the component bodies, and a power supply device which is connected to at least the target fixing means 10 to discharge the targets 11-14. The targets 11-14 are discharged by operating the power supply device, the component bodies are moved by the component holding means 10, and amorphous carbon, atoms constituting the sulfide and metal atoms are successively deposited on the surface of the component bodies microscopically and periodically. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a method for producing a sliding component for a compressor having a composite film exhibiting an effective low friction coefficient as a sliding layer formed on various sliding components, and a sliding for a compressor having the composite film as a sliding layer. Regarding parts.

In general, a sliding part for a compressor that performs a sliding motion in a compressor is composed of a metal part body and a sliding layer formed on the sliding surface side of the sliding part. The sliding property is improved. In many cases, as the sliding layer, a film made of a solid lubricant formed by vacuum vapor deposition or a resin layer that holds the solid lubricant is formed. However, since the resin layer has a limited solid lubricant content, in addition to a film made of a solid lubricant such as a molybdenum disulfide (MoS ₂ ) film, an amorphous carbon film called a diamond-like carbon (DLC) film is used. Is also used as a coating for improving the sliding performance of the sliding surface. In order to further improve the sliding characteristics of these films, various studies have been made on film compositions and film forming methods.

For example, Patent Document 1 discloses a low-friction carbon thin film in which first layers made of DLC and second layers mainly composed of iron are alternately laminated on the surface of a component body. Patent Document 2 discloses a wear-resistant mechanical component made of a multilayer film having a DLC film containing tungsten on the outermost surface. In Patent Document 3, a MoS ₂ / Ti composite film is manufactured on the surface of a component body by vapor deposition using a mixed powder composed of molybdenum disulfide powder and titanium-containing powder as a raw material. Further, Non-Patent Document 1 discloses a MoS ₂ / WS ₂ / C lubricating laminated film in which MoS ₂ , WS ₂ and carbon are alternately laminated.

However, while the MoS ₂ / Ti composite film, which is a coating made of a solid lubricant, exhibits a low coefficient of friction, transfer to the mating material occurs depending on the sliding conditions, and the low surface pressure and low sliding speed. However, seizure may occur after sliding for a long time. Moreover, although the DLC film shows excellent seizure resistance, depending on the composition and manufacturing method, the friction coefficient becomes larger than that of the MoS ₂ film.
JP 2000-320673 A JP 2003-171758 A JP 2003-129219 A "Tribologist", Vol. 49, No. 11 (2004) 894-900

In view of the above problems, the inventor of the present invention has developed a composite film that exhibits excellent characteristics of the DLC film and the MoS ₂ / Ti composite film by microscopically depositing DLC, MoS ₂ and Ti alternately. I came up with that.

  That is, an object of the present invention is to provide a method for manufacturing a sliding component for a compressor that exhibits a low coefficient of friction and is excellent in seizure resistance. Moreover, it aims at providing the sliding component for compressors obtained by the manufacturing method of the sliding component for compressors of this invention.

The method for manufacturing a sliding component for a compressor according to the present invention is a method for manufacturing a sliding component for a compressor that performs a sliding motion in a compressor,
A deposition furnace;
A target fixing means for arranging a carbon target made of at least carbon, a sulfide target made of sulfide, and a metal target containing metal atoms in a ring shape in the film-forming furnace;
A component holding means for holding the component main body and moving the component main body to continuously change the type of the target facing the component main body;
A power supply device connected to at least the target fixing means and discharging each target;
Using a sputtering apparatus comprising:
The power supply device is operated to discharge each target, and the component main body is moved by the component holding means so that the atoms constituting the amorphous carbon, the sulfide, and the metal atoms are slid on the component main body. A low friction composite film is formed by sequentially depositing microscopically and periodically on the moving surface side.

  The component holding means preferably moves the component main body so that the thickness from the position where amorphous carbon begins to deposit to the next when amorphous carbon begins to deposit is 0.5 to 20 nm. .

The low-friction composite film contains 20 to 80 at% of carbon when the whole is 100 at%, and the balance mainly consists of the metal atom and the sulfide, and the metal atom is 5 to 20 at% with respect to the sulfide. % Content is preferable. The sulfide is preferably molybdenum disulfide (MoS ₂ ) and / or tungsten disulfide (WS ₂ ), and the metal atom is selected from elements belonging to groups IVa to VIa of the periodic table. Among these, at least one kind is preferable, and titanium (Ti) and / or chromium (Cr) is preferable.

  Further, the sliding component for a compressor according to the present invention is microscopically arranged at least on the sliding surface side of the component main body by using the above-described sputtering apparatus and making amorphous carbon, the atoms constituting the sulfide, and the metal atoms. And it is characterized by depositing periodically and sequentially.

  In the method for manufacturing a sliding part for a compressor according to the present invention, the type of target (specifically, carbon target, sulfide target) facing the part main body of the sliding part for the compressor in film formation using a sputtering apparatus. , Metal targets, etc.) are continuously changed, so that amorphous carbon and sulfide atoms (including sulfides in the molecular state) and metal atoms are microscopically and periodically formed on the surface of the component body. Sequentially deposited. The low-friction composite film thus obtained is a composite film in which carbon and sulfide-constituting atoms and metal atoms are uniformly dispersed macroscopically.

  This composite film is excellent in both the low friction coefficient of sulfide and the seizure resistance of amorphous carbon. Therefore, the sliding component for a compressor of the present invention having this composite film on the sliding surface side of the component main body is excellent in slidability.

  In addition, “depositing amorphous carbon, sulfide, and metal atoms sequentially microscopically and periodically” is divided into a plurality of distinct layers such as an intermediate layer and a surface layer. Instead, it is a state in which ultrathin layers are repeatedly stacked. Each layer is deposited with a thickness of nanometer scale. Specifically, the deposition from which the amorphous carbon starts to be deposited until the next amorphous carbon begins to be deposited (that is, the thickness for one cycle) is 0.5 to 20 nm. Film formation may be performed at a speed.

The composite film obtained by the method for manufacturing a sliding part for a compressor of the present invention contains 20 to 80 at% of carbon when the whole is 100 at%, the remainder mainly consists of metal atoms and sulfides, The content of 5 to 20 at% with respect to the sulfide is preferable because both the low friction coefficient of the sulfide and the seizure resistance of the amorphous carbon are well expressed. In particular, if the sulfide is MoS ₂ and / or WS ₂ having excellent lubricity, and further, if the metal atom is Ti and / or Cr, even if it is a compressor that is used under severe conditions, it will be slippery. The coefficient of friction of the moving parts is kept small.

  Below, the manufacturing method of the sliding component for compressors of this invention and the best form for implementing the sliding component for compressors are demonstrated using FIG.

  The present invention relates to a sliding component for a compressor that performs a sliding motion in a compressor. The “sliding component for a compressor” refers to a plurality of sliding components that perform a sliding motion in a compressor. There may be at least one. The compressor may be in any form such as a swash plate type, a wobble type, a double-headed type or a single-headed type, a variable capacity type or a fixed capacity type. Sliding parts are swash plates and shoes of swash plate compressors, drive shafts or bearings that support the drive shafts, piston surfaces of piston compressors, etc. A composite film is formed.

  The method for manufacturing a sliding component for a compressor according to the present invention includes a film forming furnace, a target fixing means for arranging a plurality of targets in a ring shape in the film forming furnace, a component main body and a movable component main body. The low-friction composite film is formed using a sputtering apparatus that includes a component holding means and a power supply device that discharges each target.

  The basic configuration of the sputtering apparatus is the same as that of a general sputtering apparatus which is arranged in a film forming furnace and is mainly composed of a cathode composed of a target to which a high voltage is applied and an anode holding a component body. However, in the present invention, at least a carbon target made of carbon, a sulfide target made of sulfide, and a metal target containing metal atoms are used as the target, and the component main body can be moved.

  The film forming furnace is not particularly limited in shape and material as long as it is a film forming furnace generally used in various film forming apparatuses. For example, in addition to a film forming furnace having a cylindrical portion, a film forming furnace having a rectangular cross section may be used. However, in the present invention, since a plurality of targets are arranged in a ring shape, the film forming furnace main body has a cylindrical upper portion. It is desirable to have The film forming furnace may be provided with a vacuum system capable of evacuating the film forming furnace and a gas supply means for supplying a processing gas. The vacuum system has a rotary pump and the like, and communicates with the film forming furnace through piping. Further, the gas supply means introduces a processing gas into the film forming furnace through a nozzle or the like.

  The target fixing means fixes at least a carbon target made of carbon, a sulfide target made of sulfide, and a metal target containing metal atoms in a film forming furnace. The target may be at least three targets including a carbon target, a sulfide target made of a desired sulfide, and a metal target containing a desired metal atom, but a plurality of each target may be used. For example, two or more carbon targets may be used, or a plurality of targets including different sulfides and different metal atoms may be prepared. In addition, the metal target is not particularly limited as long as it includes a desired metal, and may be an alloy target made of a desired metal.

  The plurality of targets are arranged in a ring shape in the film forming furnace. The targets need only be arranged in a ring shape, but are preferably arranged so that adjacent targets are equally spaced. The ring shape to be arranged may be an annular shape or a rectangular shape. An example of the target array is shown in FIG. FIG. 1 is an example of a sputtering apparatus used in the method for manufacturing a sliding part for a compressor according to the present invention, and is an explanatory view showing a main part of the apparatus. FIG. 1 is a diagram of targets arranged in a ring shape when viewed from the axial direction. In FIG. 1, the plurality of (four) targets 11 to 14 are fixed so that all the discharge surfaces thereof face the center (inside the ring), but in the centrifugal direction (outside the ring). May be. Further, the targets may be fixed so that the discharge surfaces of all the targets are upward or downward.

  It is desirable to have a plurality of magnetrons on which each target is placed. By installing a magnetron on the back surface of the target, a magnetic field parallel to the surface (discharge surface) of the target is generated, so that ionization of plasma when the target is discharged is promoted (magnetron sputtering method). At this time, in particular, it is desirable that the magnetrons have inner and outer poles having different polarities, and the magnetrons 16 to 19 are arranged in a ring shape so that the outer poles have different polarities (FIG. 1). reference). With this configuration, the magnetic field lines of the magnetron form a continuous barrier (see the dotted line in FIG. 1), so that the diffusing plasma is captured. As a result, a dense and highly adhesive film can be formed (closed field unbalanced magnetron sputtering (CFUBMS) method). Moreover, you may have an electric field means to apply an electric field to a component main body.

  The component holding means moves the component main body while holding it. The component holding means is not particularly limited as long as it can hold the component main body and can move the component main body. What is necessary is just to select suitably according to the arrangement | sequence of a target, or the shape of a component main body. For example, as shown in FIG. 1, when the discharge surfaces of the respective targets 11 to 14 are arranged facing inward by the target fixing means 10, the component holding means 20 is arranged inside the target fixing means 10. It is desirable to hold. Further, when the discharge surfaces of the targets are arranged facing outward by the target fixing means, it is only necessary to hold the component main body outside the target fixing means, and the discharge surfaces of all targets are directed upward or downward. If it is fixed like this, the component main body may be held on the upper side or the lower side.

  The component holding means desirably holds the component main body as described above and rotates the component main body and / or revolves with respect to the central portion of the target fixing means. Whether the component main body is rotated or revolved may be appropriately determined according to the shape of the component main body and the film formation site so that the type of target facing the component main body can be continuously changed. For example, when the discharge surface of each target is arranged facing inward by the target fixing means, the component main body is held at the center part of the target fixing means (that is, the central part of the film forming furnace) and rotated. The type of target that faces a certain position on the side surface of the component main body is changed over time. When the film is mainly formed on only one surface of the component main body, the component main body may be revolved so that the film formation surface sequentially faces each discharge surface of the target. Furthermore, if the film is formed on the other surface, the component main body may be rotated while revolving. The same applies to the case where the discharge surfaces of the targets are arranged facing outward by the target fixing means. When revolving the component main body, a plurality of component main bodies are arranged on the trajectory of revolution (see arrangement A and arrangement B in FIG. 1), thereby processing the plurality of component main bodies in a single film formation. Is also possible.

  Further, if the component main body is flat and the deposition surface is one of the surfaces extending perpendicularly to the thickness direction, the deposition surface is held facing the discharge surface of the target. Good. The component main body is revolved with respect to the central portion of the target fixing means, so that the film formation surface sequentially faces the discharge surface of each target (see arrangement A and arrow a in FIG. 1). Further, if the component main body is a flat plate and the film formation surface is a front and back surface extending mainly perpendicular to the thickness direction, the film formation surface is held so as to be perpendicular to the discharge surface of the target. Good. Depending on the size of the component main body, the component main body rotates, or the component main body rotates while revolving with respect to the center of the target fixing means (see arrangement B and arrows a and b in FIG. 1). A film can be formed on the entire surface to be deposited. In addition, since it is possible to process the front and back surfaces of the flat component main body at once, if a component main body is arranged in a state where a plurality of flat plate main bodies are stacked at intervals in the thickness direction, an even larger amount The part body can be processed at once.

  The material and shape of the component body are not particularly limited, and the material and shape depend on the type of sliding component. If the component body is made of metal, it is preferable to include at least one of iron, aluminum, copper, and magnesium. For example, as an alloy, steel, an aluminum alloy containing Mg, Cu, Zn, Si, Mn, or the like, a copper alloy containing Zn, Al, Sn, Mn, or the like are preferable. Further, the surface of the component main body may be subjected to surface treatment such as plating treatment, thermal spray treatment, anodizing treatment or chemical conversion treatment, or rough surface forming treatment such as shot blasting or etching as an intermediate layer. When these surface treatments are performed, the adhesion between the component main body and the sliding layer can be improved.

The manufacturing method of the sliding component for a compressor of the present invention uses the sputtering apparatus detailed above. In film formation, first, the film formation furnace is evacuated to about 5 × 10 ^{−3 to} 5 × 10 ⁻⁴ Pa, and then a rare gas such as argon gas is introduced. For example, a negative voltage is applied to the target fixing means (target) by the power supply device to cause plasma discharge of the target. The rare gas ions generated by the plasma discharge are accelerated by the electric field, and atoms and molecules on the target surface are ejected by the collision of the rare gas ions (sputtering). A film is formed by depositing these atoms and molecules on the component main body (for example, ground). If the sputtering apparatus is used, the component main body moves by the component holding means, and the type of the opposing target is continuously changed. Therefore, atoms and metal atoms constituting carbon and sulfide are formed on the surface of the component main body. Are sequentially and sequentially deposited on the surface of the component body.

  For example, when the target fixing means arranges the carbon target, the first sulfide target, the metal target, and the second sulfide target in a ring shape in order, the component main body rotates and / or revolves, so that carbon ... → Periodically depositing on the surface of the component body in the order of → sulfide atoms → metal atoms → sulfide atoms → carbon → sulfide atoms → metal atoms → sulfide atoms. . At this time, the atoms (molecules) constituting the amorphous carbon and sulfide are moved by moving the component body by the component holding means so that the ultra-thin layer is repeatedly layered with a thickness of nanometer scale. (Including sulfide in a state) and metal atoms are sequentially deposited microscopically and periodically on the surface of the component body. The “first sulfide target” and the “second sulfide target” may have the same or different target composition.

  Furthermore, when the sulfide target and the metal target are fixed adjacent to each other, that is, when atoms and metal atoms constituting the sulfide are deposited adjacent to each other, energy during film formation (for example, the temperature of the component body) Metal atoms easily diffuse into sulfide. As a result, the sulfide and the metal atom are combined. In this way, sulfide and metal atoms are combined by diffusion, and each layer formed by deposition is an extremely thin layer. Therefore, macroscopically, atoms constituting carbon, sulfide, and A low friction composite film in which metal atoms are uniformly dispersed is obtained.

  In the low-friction composite film obtained as described above, the low friction coefficient of the composite film of sulfide and metal atoms and the seizure resistance of the amorphous carbon layer are well expressed. . This is because each layer composed of amorphous carbon, atoms constituting sulfide, and metal atoms is repeatedly stacked as an ultrathin layer formed with a thickness of nanometer scale, It is because it is compounded.

  The low-friction composite film has a deposition rate of 0.5 to 20 nm from the position where amorphous carbon starts to deposit until the next time amorphous carbon starts to deposit. It is desirable to perform film formation by adjusting the moving speed, applied voltage, and the like. The “thickness from the position where amorphous carbon begins to deposit until the next amorphous carbon begins to deposit” means the thickness of one cycle of the composite film deposited periodically. . For this reason, when amorphous carbon is deposited twice in one cycle by using two carbon targets in one film forming furnace, amorphous carbon begins to be deposited by discharge of the carbon target. This corresponds to the thickness from the position until the next deposition of amorphous carbon by the same carbon target. At this time, it is preferable that one period is composed of 3 to 6 layers. The thinner the period, the better the composite film is obtained, and the wear resistance is improved. Therefore, it is more desirable if the thickness for one cycle is 0.5 to 5 nm. And it is preferable that the thickness of the low friction composite film finally obtained is 1-3 micrometers.

  The low friction composite film preferably contains 20 to 80 at% of carbon when the whole is 100 at%, and the balance is mainly composed of metal atoms and sulfides. When the carbon content is 20 at% or more, low friction is exhibited along with excellent wear resistance. Furthermore, adhesion resistance is also improved. If the amount of carbon exceeds 80 at%, the effect of low friction of sulfide is reduced, which is not preferable. A more preferable carbon amount is 20 to 60 at%.

  Moreover, it is preferable that a metal atom is contained in the ratio of 5-20 at% with respect to sulfide. When the metal atomic weight is 5 to 20 at%, a layer in which metal atoms and sulfide are combined has a small friction coefficient and exhibits excellent sliding characteristics. As a result, the sliding characteristics of the low friction composite film are improved. Further, in the low friction composite film, the presence of metal atoms suppresses the movement of sulfide clusters in the film, so that the hardness of the film is improved. A more preferable metal atom content is 8 to 12 at% with respect to the sulfide.

In the low friction composite film, the amorphous carbon layer may be an amorphous carbon layer to which other elements such as silicon (Si) and tungsten (W) are added in addition to a layer made of only carbon atoms. . The sulfide is preferably molybdenum disulfide (MoS ₂ ) and / or tungsten disulfide (MoW ₂ ). The metal atom is preferably composed of at least one of elements belonging to groups IVa to VIa of the periodic table, and particularly preferably titanium (Ti) and / or chromium (Cr). A layer in which MoS ₂ or MoW ₂ is combined with Ti or Cr has a small friction coefficient and exhibits excellent sliding characteristics.

The composition of the low friction composite film is determined by the type of target and applied voltage. For example, a plurality of MoS ₂ targets may be used as sulfide targets to increase the amount of MoS ₂ in the film, or one of them may be changed to a WS ₂ target.

  As described in detail above, the low friction composite film obtained as a deposit by the method for manufacturing a sliding component for a compressor of the present invention exhibits excellent sliding characteristics. That is, the method for manufacturing a sliding component for a compressor according to the present invention can be regarded as a sliding component for a compressor having a low friction composite film at least on the sliding surface side of the component body. The component main body on which the low-friction composite film is formed is particularly preferably a swash plate of a swash plate compressor. If the component main body is a swash plate, favorable film formation can be performed by arranging and moving the swash plate in the furnace chamber in the same manner as in the case of arranging a flat component main body (described above).

  As mentioned above, although the manufacturing method of the sliding component for compressors of this invention and embodiment of the sliding component for compressors were demonstrated, this invention is not limited to the said embodiment. The present invention can be implemented in various forms without departing from the gist of the present invention, with modifications and improvements that can be made by those skilled in the art.

  Below, the Example of the sliding component of this invention is described using Table 1, Table 2, and FIGS. 1-9 with a comparative example.

[Example 1]
Swash plate of swash plate type compressor (cast iron (FCD600: φ97mm × 6mm), surface roughness: 0.1-0.2μmRa (JIS)) and rectangular flat plate (carbon steel (S45C: 30mm × 30mm × 5mm)) , Surface roughness: 0.1-0.2 μm Ra (JIS)). A low friction composite film was formed by the CFUBMS method on the sliding surface side of the swash plate and the rectangular flat plate by the following procedure.

Note that UDP550 / 4 manufactured by Teer Coatings Limited was used for the CFUBMS apparatus. The outline of the apparatus will be described with reference to FIG. This apparatus includes a graphite target 11, a titanium (Ti) target 13 facing the graphite target 11, and two molybdenum disulfide (MoS ₂ ) targets 12 facing each other in a chamber (not shown). , 14. The four targets are arranged in a ring shape by the target fixing means 10 so that their discharge surfaces are all directed inward. The four targets are fixed to the target fixing means 10 while being placed on the magnetrons 16 to 19 in the order of the graphite target 11, the MoS ₂ target 12, the Ti target 13, and the MoS ₂ target 14. The magnetrons 16 to 19 form a closed magnetic field (see the dotted line in FIG. 1) because adjacent magnetrons have different polarities. The targets 11 to 14 can be operated and discharged independently by a power supply device (not shown). Of course, it is also possible to discharge simultaneously. The component main body is held at the center of the apparatus by the component holding means 20. The component holding means 20 has a rotating means for revolving the held component main body A and component main body B (arrangement A and arrangement B) by rotating in the direction of arrow a. Moreover, it has a rotation means which rotates each component main body B hold | maintained at the component holding means 20 in the arrow b direction (the swash plate is the circumferential direction).

The component main body was placed in the chamber of the film forming apparatus. The component body fixed so that the deposition surface of the component body faces the discharge surfaces of the targets 11 to 14 is fixed to the component body A, and the deposition surface is fixed perpendicular to the discharge surfaces of the targets 11 to 14. The component body thus obtained was designated as a component body B. The inside of the film forming furnace was evacuated to a vacuum degree of 1 × 10 ⁻³ Pa. Next, argon gas was supplied into the chamber, ion bombardment was performed as a pretreatment before film formation, and the surface of the component body was etched. After the ion bombardment, the degree of vacuum in the chamber was adjusted to 0.5 Pa. Then, only the Ti target 13 was glow-discharged to form a 0.1 μm Ti film (intermediate layer).

Thereafter, the targets 11 to 14 were glow-discharged, and the component main body was moved by rotating the component holding means 20 in the direction of arrow a at 4 rpm. Further, the component main body B was rotated in the arrow b direction at 12 rpm. By setting the rotation speed of the component holding means 20 to 4 rpm, the thickness from the position at which the amorphous carbon begins to be deposited on the surface of the substrate A by the target 11 to the deposition of the next amorphous carbon is set to 2. 5 nm (hereinafter abbreviated as “2.5 nm pitch”). Further, by adjusting the power supplied to the target, film composition, C: 50at%, Ti: 5at%, MoS 2: was adjusted to 45at%.

  At the position of the component body A, the sliding component 1 having a low friction composite film F-1 of 1.7 μm was obtained by discharging for 120 minutes. Even at the position of the component main body B, a low friction composite film was formed on the surface of the component main body.

[Example 2]
A sliding component 2 having a low-friction composite film F-2 on the surface of the component body was produced in the same manner as in Example 1 except that a bias voltage of −40 V was applied to the component body.

[Example 3]
A sliding component 3 having a low-friction composite film F-3 on the surface of the component main body was produced in the same manner as in Example 1 except that the Ti target 13 was changed to a chromium (Cr) target.

[Example 4]
Except for changing the rotation of the component holding means 20 to 8 rpm (1.25 nm pitch), the sliding component 4 having the low friction composite film F-4 on the surface of the component main body was produced in the same manner as in Example 3.

[Example 5]
A sliding component 5 having a low friction composite film F-5 on the surface of the component main body was produced in the same manner as in Example 1 except that the rotation of the component holding means 20 was changed to 8 rpm.

[Evaluation]
[1] Evaluation using a single sliding evaluation device A sliding test was performed on the sliding parts 1 and 4 using a single sliding evaluation device manufactured by Shinko Engineering Co., Ltd. In the test, swash plates having low friction composite films F-1 and F-4 on sliding surfaces as sliding parts 1 and 4 (referred to as “swash plate 1” and “swash plate 4”, respectively), and aluminum as a counterpart material A shoe (φ15.4 mm × 6.5 mm) made of an alloy and having a sliding contact surface plated with Ni—P—B was slid without lubrication. The sliding test was performed for 50 seconds at a rotation speed of 1960 rpm and a load of 20 MPa. As a comparative example, the swash plate C was deposited an amorphous carbon film (film formation using the graphite target and a Cr target), formed by using the _MoS 2 / Ti composite film (Ti target and MoS ₂ target A swash plate M on which a film was formed was prepared, and the same test was performed. The change of the friction torque with respect to the test time is shown in FIG. In addition, FIGS. 3 to 6 show drawing-substituting photographs in which the sliding surfaces of the swash plate and the shoe after the test are taken.

In the test using the swash plate 1, the swash plate 4 and the swash plate M, the friction torque did not change greatly, and the friction coefficient was small. On the other hand, in the swash plate C having an amorphous carbon film, since the friction coefficient was large, the friction torque increased and the sliding stopped during the test (FIG. 2). Further, in the swash plate M, it was visually confirmed that the MoS ₂ / Ti composite film was transferred to the sliding contact surface of the shoe after the test was completed (FIG. 6). On the other hand, in the swash plate 1 and the swash plate 4, there was no significant change in the sliding surface of the shoe (FIGS. 3 and 4), but slight wear occurred on the sliding surface of the swash plate 4 and the shoe ( (See enlarged photo in FIG. 4). Therefore, a qualitative analysis of the sliding surface of the shoe with an electronic probe microanalyzer (EPMA) revealed that traces of Mo, S, and Cr were found on the shoe sliding with the swash plate 4. It was not detected in the shoe that moved. That is, the swash plate 1 and the swash plate 4 are sliding parts that are difficult to transfer and have excellent seizure resistance.

  In the swash plate C, it was confirmed that abrasion powder of the amorphous carbon film was generated and transferred to the shoe (FIG. 5). However, most of the wear powder could be removed by ultrasonic cleaning.

[2] Evaluation by ball-on-disk test I
The friction coefficient and the wear rate of the low friction composite film were measured by a ball-on-disk test. In the ball-on-disk test, flat plate test pieces which are rectangular flat plates having the low friction composite films F-1 to F-5 on the sliding contact surface as the sliding parts 1 to 5 ("flat plate 1" to "flat plate 5", respectively). And a pin-type test piece having a cylindrical shape with a diameter of 5 mm and having a hemispherical surface coated with WC-Co 6 at% as a sliding contact surface at one end. The test was performed by reciprocating the pin-type test piece at a linear speed of 200 mm / sec in a state where the pin-type test piece was pressed against the sliding contact surface of the flat plate test piece with a load of 1 kgf or 3.8 kgf. Similarly to [1], as a comparative example, a flat plate C on which an amorphous carbon film was formed and a flat plate M on which a MoS ₂ / Ti composite film was formed were prepared and subjected to the same test. Table 1 shows the friction coefficient at a load of 1 kgf and the wear rate of the flat plate test piece at each load.

  The flat plate C was excellent in wear resistance but had a high coefficient of friction. On the other hand, the flat plates 1 to 5 and the flat plate M had a small friction coefficient of 0.04 or less and exhibited excellent slidability. In particular, in the flat plate 3 (composite film F-3) and flat plate 4 (composite film F-4) in which the metal atom in the low friction composite film is Cr, the friction coefficient is significantly reduced (0.016). Further, the flat plates 4 and 5 (composite films F-4 and F-5, 1.25 nm pitch) produced by increasing the rotational speed of the component main body showed excellent wear resistance. On the other hand, in the flat plate 2 (composite film F-2) in which a bias voltage was applied to the component main body, although the friction coefficient was smaller than that of the flat plate 1, the wear resistance was lowered. It is presumed that the composite film has become brittle due to the application of voltage.

[3] Evaluation by ball-on-disk test II
The wear rate of the low-friction composite film formed on the rectangular flat plate by the method of Example 6 below was measured by the above ball-on-disk test. Further, as a comparative example, the above-described flat plate M on which a MoS ₂ / Ti composite film is formed and a flat plate M ′ on which a MoS ₂ film (deposition using only a MoS ₂ target) is prepared are prepared in the same manner. The test was conducted. The results are shown in Table 2.

[Example 6]
Flat plate test pieces (flat plates 6-1 to 6-7) having the compositions shown in Table 2 were prepared in the same manner as in Example 1 except that the amount of carbon was adjusted by changing the power applied to the graphite target.

From the results of the flat plate M ′ and the flat plate M, it is understood that the wear resistance is greatly improved by adding Ti to the film made of MoS ₂ , but the wear resistance can be further improved by combining with carbon. I understood. In particular, when the amount of carbon contained in the low friction composite film is 80 at% or less, in addition to the properties of the low friction composite film of the present invention having a low friction coefficient and excellent seizure resistance, high wear resistance was exhibited. When the amount of carbon contained in the low friction composite film was 60 at% or less, high wear resistance was exhibited even under sliding conditions under high load.

[4] Observation of low-friction composite film The cross-section of the low-friction composite film F-1 was observed. Transmission electron microscope (TEM) photographs are shown in FIGS. In FIG. 7, the composite film F-1 was formed on the surface of the component body, and it was confirmed that the composite film F-1 was a uniform film composed of one layer. Further, FIG. 8 is an enlarged photograph of the central portion of the composite film F-1 in FIG. 7, but there is no layered stripe pattern and the like, an amorphous carbon layer on which carbon is deposited, and MoS on which sulfide is deposited. The boundary between the _two layers, the Ti layer on which Ti was deposited, could not be confirmed. That is, it was found that the composite film F-1 was a MoS ₂ / Ti / DLC composite film in which C, Ti, and MoS ₂ were uniformly dispersed.

Further, FIG. 9 shows the results of line analysis in the thickness direction of the film by electron energy loss spectroscopy (EELS). The right figure of FIG. 9 shows the composition ratio of each component calculated | required from the spectral intensity of the left figure. According to FIG. 9, no significant variation was observed depending on the analysis position for any of C, Mo, and S components. Therefore, it was found that the composite film F-1 was a MoS ₂ / Ti / DLC composite film in which C, Ti, and MoS ₂ were uniformly dispersed.

It is an example of the sputtering apparatus used for the manufacturing method of the sliding component for compressors of this invention, Comprising: It is explanatory drawing which shows the principal part of an apparatus. It is a graph which shows the change of the friction torque with respect to the test time in the sliding test using a single-piece | unit sliding evaluation apparatus. It is the drawing substitute photograph which image | photographed the sliding surface of the swash plate 1 after the sliding test using the single-piece | unit sliding evaluation apparatus, and the shoes which are the other party. It is the drawing substitute photograph which image | photographed the sliding surface of the swash plate 4 after the sliding test using the single-piece | unit sliding evaluation apparatus, and the other party's material. It is the drawing substitute photograph which image | photographed the sliding surface of the swash plate C after the sliding test using the single-piece | unit sliding evaluation apparatus, and the other party's material. It is the drawing substitute photograph which image | photographed the sliding surface of the swash plate M after the completion | finish of the sliding test using a single-piece | unit sliding evaluation apparatus, and the other party's material. It is the TEM photograph which observed the cross section of the sliding component 1 (Example 1). It is the TEM photograph which observed the cross section of the sliding component 1, Comprising: It is an enlarged photograph in the center part of the low friction composite film F-1 of FIG. It is a graph which shows the analysis result of EELS which performed the line analysis in the thickness direction in the cross section of the low friction composite film F-1.

Explanation of symbols

10: Target fixing means 11: Carbon target 12: Sulfide target (MoS ₂ target)
13: Metal target (Ti target or Cr target)
14: Sulfide target (MoS ₂ target)
16-19: Magnetron 20: Parts holding means

Claims (19)

A method of manufacturing a sliding component for a compressor that performs a sliding motion in a compressor,
A deposition furnace;
A target fixing means for arranging a carbon target made of at least carbon, a sulfide target made of sulfide, and a metal target containing metal atoms in a ring shape in the film-forming furnace;
A component holding means for holding the component main body and moving the component main body to continuously change the type of the target facing the component main body;
A power supply device connected to at least the target fixing means and discharging each target;
Using a sputtering apparatus comprising:
The power supply device is operated to discharge each target, and the component main body is moved by the component holding means so that the atoms constituting the amorphous carbon, the sulfide, and the metal atoms are slid on the component main body. A method of manufacturing a sliding part for a compressor, comprising depositing a low friction composite film by sequentially depositing microscopically and periodically on a moving surface side.   2. The component holding means moves the component main body so that a thickness from a position where amorphous carbon starts to be deposited to a thickness where amorphous carbon starts to be deposited next is 0.5 to 20 nm. The manufacturing method of the sliding component for compressors of description. In the target fixing means, the targets are arranged so that the discharge surfaces of all the targets face inward,
2. The compressor slide according to claim 1, wherein the component holding means holds the component main body inside the target fixing means and rotates and / or revolves the central part of the target fixing means. A manufacturing method for parts.   The said target fixing means is a manufacturing method of the sliding component for compressors of Claim 1 which arranges a carbon target, a 1st sulfide target, a metal target, and a 2nd sulfide target in order.   The low-friction composite film contains 20 to 80 at% of carbon when the whole is 100 at%, and the balance mainly consists of the metal atom and the sulfide, and the metal atom is 5 to 20 at% with respect to the sulfide. The manufacturing method of the sliding component for compressors of Claim 1 containing%.   The method for manufacturing a sliding part for a compressor according to claim 1, wherein the sulfide is molybdenum disulfide and / or tungsten disulfide.   2. The method for manufacturing a sliding part for a compressor according to claim 1, wherein the metal atom comprises at least one element selected from Group IVa to Group VIa of the periodic table.   The method for manufacturing a sliding component for a compressor according to claim 1, wherein the metal atom is titanium (Ti) and / or chromium (Cr).   The method of manufacturing a sliding part for a compressor according to claim 1, wherein the component body is a swash plate of a swash plate type compressor. In the target fixing means, the targets are arranged so that the discharge surfaces of all the targets face inward,
The compressor according to claim 9, wherein the swash plate revolves with respect to a central portion of the target fixing means by the component holding means so that sliding surfaces of the swash plate sequentially face respective discharge surfaces of the target. Manufacturing method for sliding parts. In the target fixing means, the targets are arranged so that the discharge surfaces of all the targets face inward,
The swash plate is held by the component holding means so that the sliding surface of the swash plate is perpendicular to the discharge surface of the target and revolves with respect to the center of the target fixing means. The manufacturing method of the sliding component for compressors of Claim 9 which autorotates to the circumferential direction of a board.   The method of manufacturing a sliding part for a compressor according to claim 1, wherein the sputtering apparatus is a magnetron sputtering apparatus having a plurality of magnetrons on which the targets are respectively mounted.   The magnetron sputtering apparatus includes a closed field imbalance in which the magnetron has an inner pole and an outer pole having different polarities, and a plurality of the magnetrons are arranged in a ring shape so that the outer poles have different polarities. The method for manufacturing a sliding part for a compressor according to claim 12, which is a tomtrontron sputtering apparatus. A sliding component for a compressor that performs a sliding motion in the compressor,
A deposition furnace;
A target fixing means for arranging a carbon target made of at least carbon, a sulfide target made of sulfide, and a metal target containing metal atoms in a ring shape in the film-forming furnace;
A component holding means for holding the component main body and moving the component main body to continuously change the type of the target facing the component main body;
A power supply device connected to at least the target fixing means and discharging each target;
Using a sputtering apparatus comprising:
The power supply device is operated to discharge each target, and the component main body is moved by the component holding means, so that amorphous carbon, the atoms constituting the sulfide, and the metal atoms are at least in the component main body. A sliding part for a compressor, wherein the sliding part is sequentially deposited microscopically and periodically on the sliding surface side.   The compressor slide according to claim 14, wherein the deposit of the component main body has a thickness of 0.5 to 20 nm from the position at which amorphous carbon begins to be deposited until the next time amorphous carbon begins to be deposited. Moving parts.   The deposit of the component main body contains 20 to 80 at% of carbon when the whole is 100 at%, the remainder mainly consists of the metal atom and the sulfide, and the metal atom is 5 to 5% of the sulfide. 15. The sliding part for a compressor according to claim 14, which is a low friction composite film containing 20 at%.   The sliding part for a compressor according to claim 14, wherein the sulfide is molybdenum disulfide and / or tungsten disulfide.   The sliding component for a compressor according to claim 14, wherein the metal atom is composed of at least one element selected from Group IVa to Group VIa of the periodic table.   The sliding component for a compressor according to claim 14, wherein the metal atom is titanium (Ti) and / or chromium (Cr).

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