JP2001225412A - Protective film coated member - Google Patents
Protective film coated memberInfo
- Publication number
- JP2001225412A JP2001225412A JP2000038455A JP2000038455A JP2001225412A JP 2001225412 A JP2001225412 A JP 2001225412A JP 2000038455 A JP2000038455 A JP 2000038455A JP 2000038455 A JP2000038455 A JP 2000038455A JP 2001225412 A JP2001225412 A JP 2001225412A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- protective film
- chromium
- member according
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/02—Parts of sliding-contact bearings
- F16C33/04—Brasses; Bushes; Linings
- F16C33/043—Sliding surface consisting mainly of ceramics, cermets or hard carbon, e.g. diamond like carbon [DLC]
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C2206/00—Materials with ceramics, cermets, hard carbon or similar non-metallic hard materials as main constituents
- F16C2206/02—Carbon based material
- F16C2206/04—Diamond like carbon [DLC]
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C2360/00—Engines or pumps
- F16C2360/42—Pumps with cylinders or pistons
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- Rotary Pumps (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Sliding-Contact Bearings (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Compressor (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ダイヤモンドライ
クカーボン(以下、DLCという)層を含む保護膜が形
成された保護膜被覆部材に関し、例えば、冷媒ガス等の
気体を圧縮するベーン型圧縮機用のベーンに適したもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a protective film covering member on which a protective film including a diamond-like carbon (hereinafter, referred to as DLC) layer is formed, for example, for a vane type compressor for compressing a gas such as a refrigerant gas. It is suitable for vanes.
【0002】[0002]
【従来の技術】従来より、基材の耐摩耗性、摺動性を向
上させるべく、高周波励起法、イオン化蒸着法、あるい
はAIP法により、基材の表面にDLCからなる保護膜
を形成する手法が用いられている。2. Description of the Related Art Conventionally, in order to improve abrasion resistance and slidability of a substrate, a method of forming a protective film made of DLC on the surface of the substrate by a high frequency excitation method, an ionization vapor deposition method, or an AIP method. Is used.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、金属基
材とDLC層との密着性の低さは、従来より指摘されて
いるところである。このため、基材の表面にスクラッチ
傷を入れ、アンカー効果を狙って密着性を改善する方法
も提案されたが、未だ充分な密着強度は達成されていな
い。However, the low adhesion between the metal substrate and the DLC layer has been pointed out in the past. For this reason, a method has been proposed in which a scratch is made on the surface of the base material to improve the adhesion with the aim of an anchor effect, but sufficient adhesion strength has not yet been achieved.
【0004】また、上記の方法は、何れも300℃以上
の温度で処理されるため、焼戻し処理(約150〜20
0℃の処理温度)を施した基材(例えば、合金鋼、機械
構造用炭素鋼)は、その基材の機械的性質が変化するお
それがある。このため、対象となる基材の材質は必然的
に限られてしまう(例えば、高速度工具鋼(焼戻し温度
約520〜570℃))。[0004] In each of the above-mentioned methods, since the treatment is performed at a temperature of 300 ° C or more, a tempering treatment (about 150 to 20) is performed.
Substrates (for example, alloy steels and carbon steels for mechanical structures) to which a processing temperature of 0 ° C. has been applied may change the mechanical properties of the substrates. Therefore, the material of the target base material is necessarily limited (for example, high-speed tool steel (tempering temperature of about 520 to 570 ° C.)).
【0005】そこで、本発明は上記問題に鑑みてなされ
たもので、DLC膜の密着性が良好な保護膜被覆部材を
提供することを第一の課題とし、併せて、基材の材質が
特定のものに限定されない保護膜被覆部材を提供するこ
とを第二の課題とする。Accordingly, the present invention has been made in view of the above problems, and has as its first object to provide a protective film covering member having good adhesion of a DLC film. A second object is to provide a protective film covering member which is not limited to the above.
【0006】[0006]
【課題を解決するための手段】本発明に係る保護膜被覆
部材は、上述した課題を解決すべく、基材の表面に、ク
ロム(以下、Crという)層、クロム−炭化タングステ
ン(以下、Cr−WCという)傾斜層、ダイヤモンドラ
イクカーボン層の順からなる保護膜を形成するようにし
たものである。In order to solve the above-mentioned problems, a protective film-coated member according to the present invention has a chromium (hereinafter referred to as Cr) layer and a chromium-tungsten carbide (hereinafter referred to as Cr) on a surface of a substrate. (Referred to as -WC), and a protective film composed of a gradient layer and a diamond-like carbon layer in this order.
【0007】上記構成からなる保護膜被覆部材によれ
ば、基材の表面に形成されたCr層によって基材と保護
膜との密着性が得られ、Cr層の表面に形成されたCr
−WC傾斜層によって保護膜の皮膜弾性が得られ、Cr
−WC傾斜層の表面に形成されたDLC層によって保護
膜の耐摩耗性、摺動性が得られる。DLC層は、Cr−
WC傾斜層の表面に被覆させることで、金属基材の表面
に直接被覆させるよりも付着強度が飛躍的に向上するこ
ととなる。[0007] According to the protective film-coated member having the above-described structure, the Cr layer formed on the surface of the base material provides adhesion between the base material and the protective film, and the Cr layer formed on the surface of the Cr layer.
-The WC gradient layer provides the film elasticity of the protective film,
-Wear resistance and slidability of the protective film can be obtained by the DLC layer formed on the surface of the WC gradient layer. The DLC layer is composed of Cr-
By coating on the surface of the WC gradient layer, the adhesive strength is dramatically improved as compared with coating directly on the surface of the metal substrate.
【0008】一方、Cr層とCr−WC傾斜層との接合
面が無境界となるように両層を連続して形成すれば、C
r層とCr−WC傾斜層との剥離も起こり得ない。On the other hand, if both layers are formed continuously so that the joint surface between the Cr layer and the Cr-WC gradient layer has no boundary, C
Separation between the r layer and the Cr-WC gradient layer cannot occur.
【0009】そして、これは、Cr−WC傾斜層を、C
r層との接合面におけるCr含有量が100重量%で且
つDLC層との接合面におけるCr含有量が0重量%に
形成することによって得られる。This is because the Cr-WC gradient layer is
It can be obtained by forming the Cr content at the joint surface with the r layer to be 100% by weight and the Cr content at the joint surface with the DLC layer to be 0% by weight.
【0010】また、DLC層に、約10〜25重量%の
タングステン(以下、Wという)を含有させたならば、
非晶質からなるDLCの内部応力を引き下げて、保護膜
表面の摩擦抵抗を低減させることができる。If the DLC layer contains about 10 to 25% by weight of tungsten (hereinafter referred to as W),
The internal stress of the amorphous DLC can be reduced, and the frictional resistance on the surface of the protective film can be reduced.
【0011】以上の場合、保護膜の膜厚としては、Cr
層の膜厚が、約0.1〜0.4μmであり、Cr−WC
傾斜層の膜厚が、約0.2〜0.6μmであり、DLC
層の膜厚が、約1.5〜2.5μmであるのが好まし
い。この膜構成からすれば、膜厚が、約1.8〜3.5
μmとなり、従来の単層DLCのみによる保護膜よりも
厚膜にすることができる。In the above case, the thickness of the protective film is Cr
The thickness of the layer is about 0.1 to 0.4 μm,
The thickness of the gradient layer is about 0.2 to 0.6 μm, and DLC
Preferably, the layer has a thickness of about 1.5 to 2.5 μm. According to this film configuration, the film thickness is about 1.8 to 3.5.
μm, and can be made thicker than a conventional protective film formed only by a single-layer DLC.
【0012】そして、これらの保護膜をスパッタリング
法により形成したならば、その処理温度が約150〜2
00℃であるため、基材の機械的性質は損なわれない。
従って、種々の材質の基材を用いることができる。If these protective films are formed by the sputtering method, the processing temperature is about 150 to 2
Since it is 00 ° C., the mechanical properties of the substrate are not impaired.
Therefore, base materials of various materials can be used.
【0013】また、上述の保護膜被覆部材をベーン型圧
縮機を構成する摺動部材(例えば、ベーン、ローターの
ベーン溝、シリンダブロックのベーン溝)や、スクロー
ル型圧縮機を構成する摺動部材(例えば、公転スクロー
ル、静止スクロール)としたならば、部材の摺動面の摩
耗が低減するため、圧縮機の寿命を延ばすことができ、
しかも、部材の摺動性が向上するため、より高速な運転
を実施でき、圧縮機の圧縮効率を高めることができる。The above-mentioned protective film-coated member may be a sliding member (for example, a vane, a rotor vane groove, a cylinder block vane groove) constituting a vane type compressor, or a sliding member constituting a scroll type compressor. (For example, a revolving scroll or a stationary scroll), the wear of the sliding surface of the member is reduced, so that the life of the compressor can be extended,
In addition, since the slidability of the members is improved, higher-speed operation can be performed, and the compression efficiency of the compressor can be increased.
【0014】[0014]
【発明の実施の形態】本実施形態に係る保護膜被覆部材
の保護膜は、図1に模式的に示されたスパッタ装置によ
って形成される。図中、10は、Crからなるターゲッ
トであり、11は、背面にマグネット12が配置された
WCからなるターゲットであり、15は、基板ホルダー
14に支持された基材であり、16は、不活性ガスとし
てのアルゴン(Ar)ガス、及び反応性ガスとしてのア
セチレン(C2 H2 )ガスをターゲット間に向けて供給
する供給管であり、これらは、図示しない真空容器内に
収められている。DESCRIPTION OF THE PREFERRED EMBODIMENTS A protective film of a protective film covering member according to the present embodiment is formed by a sputtering apparatus schematically shown in FIG. In the drawing, 10 is a target made of Cr, 11 is a target made of WC having a magnet 12 disposed on the back surface, 15 is a base material supported by a substrate holder 14, and 16 is a non-metal substrate. A supply pipe for supplying an argon (Ar) gas as an active gas and an acetylene (C 2 H 2 ) gas as a reactive gas between the targets, and these are contained in a vacuum vessel (not shown). .
【0015】尚、このスパッタ装置は、Crターゲット
が取付けられたマグネトロンスパッタ装置と、WCター
ゲットが取付けられたアンバランスマグネトロンスパッ
タ装置とのハイブリッドスパッタ装置であり、印加電圧
の出力バランスによって、Crターゲットのみをスパッ
タすることも、WCターゲットのみをスパッタすること
も、両者をスパッタすることも可能である。This sputtering apparatus is a hybrid sputtering apparatus of a magnetron sputtering apparatus having a Cr target mounted thereon and an unbalanced magnetron sputtering apparatus having a WC target mounted thereon. Can be sputtered, only the WC target can be sputtered, or both can be sputtered.
【0016】このスパッタ装置による保護膜の形成方法
は、以下の通りである。まず、始めに、真空容器内を排
気して、約3.75×10-5[Torr]の真空雰囲気
を得、次に、真空容器内を約200℃に加熱し、しかる
後、ターゲット間にArガスを封入して、Arプラズマ
を得る。The method of forming a protective film by using this sputtering apparatus is as follows. First, the inside of the vacuum vessel is evacuated to obtain a vacuum atmosphere of about 3.75 × 10 −5 [Torr]. Then, the inside of the vacuum vessel is heated to about 200 ° C., and then, between the targets. Ar plasma is obtained by sealing Ar gas.
【0017】これらの準備段階を経て、スパッタ処理を
行なう。第一の工程では、Crターゲットのみをスパッ
タして、基材の表面にCr層を形成する。After these preparatory steps, a sputtering process is performed. In the first step, only a Cr target is sputtered to form a Cr layer on the surface of the substrate.
【0018】Cr層がある程度の膜厚で形成されたなら
ば、第二の工程では、Crターゲットの印加電圧の出力
を次第に弱めると共に、WCターゲットの印加電圧の出
力を次第に高めることにより、Cr層の表面にCr−W
C傾斜層を形成する。Once the Cr layer has been formed to a certain thickness, in the second step, the output of the applied voltage of the Cr target is gradually reduced while the output of the applied voltage of the WC target is gradually increased. Cr-W on the surface of
A C gradient layer is formed.
【0019】Cr−WC傾斜層がある程度の膜厚で形成
されたならば、第三の工程では、C 2 H2 ガスを封入す
ると共に、Crターゲットのスパッタを止め、WCター
ゲットのみをスパッタして、Cr−WC傾斜層の表面に
DLC層を形成する。A Cr-WC gradient layer is formed with a certain thickness.
Then, in the third step, C TwoHTwoFill gas
As well as stopping the sputtering of the Cr target
Sputter only the get on the surface of the Cr-WC gradient layer
Form a DLC layer.
【0020】以上の方法により、図2に示す如く、金属
基材1の表面に形成(被覆)されたCr層3と、該Cr
層3の表面に形成されたCr−WC傾斜層4と、該Cr
−WC傾斜層4の表面に形成されたDLC層5とからな
る保護膜2を得る。By the above method, as shown in FIG. 2, the Cr layer 3 formed (coated) on the surface of the metal
A Cr-WC gradient layer 4 formed on the surface of the layer 3;
The protective film 2 including the DLC layer 5 formed on the surface of the WC gradient layer 4 is obtained.
【0021】かかる方法によれば、スパッタ処理の第一
の工程から第二の工程にかけて連続に処理することで、
Cr層3とCr−WC傾斜層4との接合面には境界がで
きない。そして、Cr−WC傾斜層4は、Cr層3との
接合面からDLC層5との接合面に近づくにつれてCr
の全体に占める割合が減少する傾斜層となっており、C
r層3との接合面におけるCr含有量が100重量%
で、DLC層5との接合面におけるCr含有量が0重量
%となっている。かかる両接合面間におけるCr含有量
の変化は、一次的であっても、二次的であっても、その
他の態様であってもよいものとする。According to such a method, the sputtering process is performed continuously from the first step to the second step,
There is no boundary at the joint surface between the Cr layer 3 and the Cr-WC gradient layer 4. As the Cr-WC gradient layer 4 approaches the joint surface with the DLC layer 5 from the joint surface with the Cr layer 3,
Is a graded layer whose proportion in the total is reduced.
100% by weight of Cr content at the joint surface with the r layer 3
Thus, the Cr content at the joint surface with the DLC layer 5 is 0% by weight. Such a change in the Cr content between the two joining surfaces may be primary, secondary, or in any other manner.
【0022】また、第三の工程においては、WCターゲ
ットをスパッタするものであるため、DLC層5には、
WもしくはWCが含有されている。本例によれば、Wの
含有量は、約10〜25重量%であるが、この不純物の
混入によって、純粋なDLCよりも硬度が低くなり、且
つ、摩擦抵抗が低減することとなる。In the third step, a WC target is sputtered.
W or WC is contained. According to the present example, the content of W is about 10 to 25% by weight. However, the incorporation of this impurity results in a lower hardness and lower frictional resistance than pure DLC.
【0023】そして、第一〜第三の工程における処理時
間を適宜設定することで、Cr層3の膜厚を約0.1〜
0.4μm、Cr−WC傾斜層4の膜厚を約0.2〜
0.6μm、DLC層5の膜厚を約1.5〜2.5μm
とする。By appropriately setting the processing time in the first to third steps, the thickness of the Cr layer 3 is set to about 0.1 to
0.4 μm, the thickness of the Cr—WC gradient layer 4 is set to about 0.2 to
0.6 μm, the thickness of the DLC layer 5 is about 1.5 to 2.5 μm
And
【0024】基材1の材質としては、例えば下記の表1
に示すものが採用できる。As the material of the substrate 1, for example, the following Table 1
The following can be adopted.
【0025】[0025]
【表1】 [Table 1]
【0026】浸炭用鋼には、機械構造用炭素鋼や合金鋼
があるが、機械構造用炭素鋼としては、S15Cが例示
され、合金鋼としては、SCM415が例示される。全
体焼入用鋼には、機械構造用炭素鋼、合金鋼、炭素工具
鋼、合金工具鋼、高速度工具鋼があるが、機械構造用炭
素鋼としては、S50Cが例示され、合金鋼としては、
SCM435が例示され、炭素工具鋼としては、SK3
が例示され、合金工具鋼としては、SKS3が例示さ
れ、高速度工具鋼としては、SKH51が例示される。Examples of the carburizing steel include carbon steel for machine structure and alloy steel. S15C is exemplified as carbon steel for machine structure, and SCM415 is exemplified as alloy steel. The steel for full quenching includes carbon steel for machine structure, alloy steel, carbon tool steel, alloy tool steel, and high-speed tool steel. As carbon steel for machine structure, S50C is exemplified, and as alloy steel, ,
SCM435 is exemplified, and the carbon tool steel is SK3
Is exemplified, and SKS3 is exemplified as the alloy tool steel, and SKH51 is exemplified as the high-speed tool steel.
【0027】表1からわかるように、窒化処理の有無を
問わず、何れの材質の焼戻しの熱処理条件は、150〜
200℃近傍であるか、それ以上であるため、上述のス
パッタ処理(処理温度約200℃)によって基材の機械
的性質が損なわれることはない。As can be seen from Table 1, regardless of the presence or absence of the nitriding treatment, the heat treatment conditions for tempering any material are 150 to 150%.
Since the temperature is around 200 ° C. or higher, the mechanical properties of the substrate are not impaired by the above-described sputtering process (processing temperature of about 200 ° C.).
【0028】以上の如く、本実施形態に係る保護膜は、
耐摩耗性、化学的安定性、基材との密着性に優れ、弾性
に富み、摩擦係数が低い性質を備えるものであるため、
部材の表面処理として極めて有用である。As described above, the protective film according to the present embodiment is
It has excellent wear resistance, chemical stability, excellent adhesion to the substrate, rich elasticity, and low friction coefficient.
It is extremely useful as a surface treatment for members.
【0029】本実施形態に係る保護膜は、あらゆる部材
を対象とするものであるが、例示として、ベーン型圧縮
機における摺動部材(ベーン、ローターのベーン溝、シ
リンダブロックのベーン溝等)、スクロール型圧縮機に
おける摺動部材(公転スクロール、静止スクロール
等)、ボールベアリング、トランスミッションギア、燃
料噴射ポンプ部品、ピストンリング、シム、シャフト、
高精度樹脂金型、切削工具、鍛造工具が挙げられる。The protective film according to the present embodiment is intended for all kinds of members. For example, sliding members (vanes, vane grooves of a rotor, vane grooves of a cylinder block, etc.) in a vane type compressor, Sliding members (revolving scrolls, stationary scrolls, etc.), ball bearings, transmission gears, fuel injection pump parts, piston rings, shims, shafts, etc. in scroll type compressors
High-precision resin molds, cutting tools, and forging tools.
【0030】尚、ベーン型圧縮機を簡単に説明すると、
以下の通りである。即ち、ベーン型圧縮機は、たとえ
ば、通常円筒型又は楕円型の内筒形状を有するシリンダ
ブロックの両側にサイドプレートが固定されて圧縮機本
体が構成されており、この圧縮機本体内にローターを配
置し、このローター又はシリンダブロックには放射方面
に向けて複数個のベーン溝を設け、ベーンを出没自在に
挿入し、このベーンをシリンダブロックの内周面又はロ
ーターの外周面に押しつけながらローターを回転させる
ことによりベーンで仕切られた圧縮室内の気体を圧縮す
るような構成である。Incidentally, the vane type compressor will be briefly described as follows.
It is as follows. That is, the vane-type compressor has, for example, a compressor body in which side plates are fixed to both sides of a cylinder block having a generally cylindrical or elliptical inner cylinder shape, and a rotor body is formed. The rotor or the cylinder block is provided with a plurality of vane grooves in the radial direction, and the vanes are inserted so as to be freely protruded and retracted. The configuration is such that the gas in the compression chamber partitioned by the vanes is compressed by being rotated.
【0031】また、スクロール型圧縮機を簡単に説明す
ると、以下の通りである。即ち、スクロール型圧縮機
は、公転スクロールおよび静止スクロールに螺旋状隔壁
を各々設け、公転スクロールを公転させることにより両
各壁間に形成される圧縮室を容積変化させて圧縮室内の
気体を圧縮するような構成である。The scroll type compressor will be briefly described as follows. That is, the scroll type compressor is provided with spiral partitions in the revolving scroll and the stationary scroll, respectively, and revolves the revolving scroll to change the volume of the compression chamber formed between the two walls to compress the gas in the compression chamber. It is such a configuration.
【0032】[0032]
【実施例】上記の方法によって、Cr層の膜厚を約0.
2μm、Cr−WC傾斜層の膜厚を約0.4μm、DL
C層の膜厚を約2.0μmに形成した。その結果を表2
に示す。DESCRIPTION OF THE PREFERRED EMBODIMENTS By the above-mentioned method, the thickness of the Cr layer was set to about 0.5.
2 μm, the thickness of the Cr-WC gradient layer was about 0.4 μm,
The layer C was formed to have a thickness of about 2.0 μm. Table 2 shows the results.
Shown in
【0033】[0033]
【表2】 [Table 2]
【0034】表2からわかるように、中硬度(1000
〜2000[HV])、低摩擦係数(μ<0.1)、高
弾性(0.1〜1.5[Gpa/μm])を実現してお
り、耐摩耗性、摺動性に優れていることがわかる。As can be seen from Table 2, the medium hardness (1000
20002000 [HV]), low coefficient of friction (μ <0.1), high elasticity (0.1-1.5 [Gpa / μm]), and excellent wear resistance and slidability. You can see that there is.
【0035】また、上記の方法によって保護膜をベーン
表面に被覆し、これを使用した結果、シリンダブロック
とベーンの間で焼付が生じることなく、高い摺動性を実
現し、しかも、ベーンの表面の摩耗も抑えることができ
た。また、最外層のDLC層の剥離も見られなかった。The protective film is coated on the surface of the vane by the above-described method, and as a result of using the protective film, high slidability is realized without seizure between the cylinder block and the vane. Wear was also suppressed. Also, no peeling of the outermost DLC layer was observed.
【0036】[0036]
【発明の効果】本発明に係る保護膜被覆部材は、基材の
表面に、Cr層、Cr−WC傾斜層、DLC層の順から
なる保護膜を形成したものであるため、DLC膜の密着
性を好適に維持することができる。しかも、最外層がD
LC層であるため、耐摩耗性、摺動性の向上を図ること
ができる。According to the protective film-coated member of the present invention, a protective film consisting of a Cr layer, a Cr-WC gradient layer, and a DLC layer is formed on the surface of a base material. Properties can be suitably maintained. Moreover, the outermost layer is D
Since it is an LC layer, it is possible to improve wear resistance and slidability.
【図1】本発明の一実施形態に係る保護膜を形成するス
パッタ装置の概略構成図。FIG. 1 is a schematic configuration diagram of a sputtering apparatus for forming a protective film according to an embodiment of the present invention.
【図2】同実施形態の保護膜が形成された基材の断面
図。FIG. 2 is a cross-sectional view of the base material on which the protective film of the embodiment is formed.
1…基材、2…保護膜、3…Cr層、4…Cr−WC
層、5…DLC層DESCRIPTION OF SYMBOLS 1 ... Base material, 2 ... Protective film, 3 ... Cr layer, 4 ... Cr-WC
Layer, 5 ... DLC layer
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) F16C 33/24 F16C 33/24 A 4K029 Fターム(参考) 3H003 AA05 AC03 AD01 AD03 BD00 CA01 CA02 CB00 CD03 3H029 AA02 AA05 AB03 BB44 CC03 CC05 CC16 CC17 CC38 CC39 3H039 AA12 BB04 CC02 CC03 CC12 CC19 CC36 3J011 QA03 SB12 SB14 SE02 4F100 AA37D AB13B AB13C AB40D AD07C AT00A BA04 BA07 BA10A BA10D BA44C EH66 GB51 JK06 JK09 JK16 YY00B YY00C YY00D 4K029 BA07 BA34 BA57 BB02 BC02 BD04 EA01 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) F16C 33/24 F16C 33/24 A 4K029 F Term (Reference) 3H003 AA05 AC03 AD01 AD03 BD00 CA01 CA02 CB00 CD03 3H029 AA02 AA05 AB03 BB44 CC03 CC05 CC16 CC17 CC38 CC39 3H039 AA12 BB04 CC02 CC03 CC12 CC19 CC36 3J011 QA03 SB12 SB14 SE02 4F100 AA37D AB13B AB13C AB40D AD07C AT00A BA04 BA07 BA10A BA10D BA44C EH66 BA07 JK00B01 J01
Claims (8)
タングステン傾斜層、ダイヤモンドライクカーボン層の
順からなる保護膜が形成されてなることを特徴とする保
護膜被覆部材。1. A protective film covering member comprising: a protective film comprising a chromium layer, a chromium-tungsten carbide gradient layer, and a diamond-like carbon layer formed on a surface of a base material in this order.
ステン傾斜層との接合面が無境界である請求項1記載の
保護膜被覆部材。2. The protective film covering member according to claim 1, wherein a joining surface between the chromium layer and the chromium-tungsten carbide gradient layer has no boundary.
が、前記クロム層との接合面におけるクロム含有量が1
00重量%で、且つ、前記ダイヤモンドライクカーボン
層との接合面におけるクロム含有量が0重量%の傾斜層
からなる請求項1又は2記載の保護膜被覆部材。3. The chromium-tungsten carbide gradient layer has a chromium content of 1 at a joint surface with the chromium layer.
The protective film-coated member according to claim 1 or 2, comprising a gradient layer having a chromium content of 0% by weight at a bonding surface with the diamond-like carbon layer at 00% by weight.
約10〜25重量%のタングステンを含有してなる請求
項1乃至3の何れかに記載の保護膜被覆部材。4. The diamond-like carbon layer,
4. The protective film-coated member according to claim 1, comprising about 10 to 25% by weight of tungsten.
4μmであり、前記クロム−炭化タングステン傾斜層の
膜厚が、約0.2〜0.6μmであり、前記ダイヤモン
ドライクカーボン層の膜厚が、約1.5〜2.5μmで
ある請求項1乃至4の何れかに記載の保護膜被覆部材。5. The chromium layer has a thickness of about 0.1 to 0.1.
2. The thickness of the chromium-tungsten carbide gradient layer is about 0.2 to 0.6 μm, and the thickness of the diamond-like carbon layer is about 1.5 to 2.5 μm. 5. The protective film-coated member according to any one of items 1 to 4.
ステン傾斜層、前記ダイヤモンドライクカーボン層が、
スパッタリング法により形成されてなる請求項1乃至5
の何れかに記載の保護膜被覆部材。6. The chromium layer, the chromium-tungsten carbide gradient layer, and the diamond-like carbon layer,
6. The method according to claim 1, which is formed by a sputtering method.
The protective film-coated member according to any one of the above.
材である請求項1乃至6の何れかに記載の保護膜被覆部
材。7. The protective film covering member according to claim 1, wherein the substrate is a sliding member in a vane type compressor.
動部材である請求項1乃至6の何れかに記載の保護膜被
覆部材。8. The protective film covering member according to claim 1, wherein the substrate is a sliding member in a scroll compressor.
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Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000038455A JP2001225412A (en) | 2000-02-16 | 2000-02-16 | Protective film coated member |
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Publication Number | Publication Date |
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Family
ID=18562187
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JP2000038455A Pending JP2001225412A (en) | 2000-02-16 | 2000-02-16 | Protective film coated member |
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CN105051249A (en) * | 2013-03-22 | 2015-11-11 | 日锻汽门株式会社 | DLC coating film and coated valve lifter |
JPWO2014147805A1 (en) * | 2013-03-22 | 2017-02-16 | 日鍛バルブ株式会社 | DLC coating film |
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JP2018080633A (en) * | 2016-11-16 | 2018-05-24 | 株式会社富士通ゼネラル | Rotary Compressor |
JP2018080632A (en) * | 2016-11-16 | 2018-05-24 | 株式会社富士通ゼネラル | Rotary Compressor |
JP2019137885A (en) * | 2018-02-08 | 2019-08-22 | トヨタ自動車株式会社 | Method for manufacturing wear resistant material and wear resistant material |
JP7011255B2 (en) | 2018-02-08 | 2022-01-26 | トヨタ自動車株式会社 | Manufacturing method of wear-resistant material and manufacturing method of wear-resistant material with lubricant |
CN113584480A (en) * | 2020-04-30 | 2021-11-02 | 株式会社爱信 | Low friction wear film and method of making same |
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US11905586B2 (en) | 2020-04-30 | 2024-02-20 | Aisin Corporation | Low friction wear film and method for producing the same |
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