JP2007216342A - Polisher - Google Patents

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JP2007216342A
JP2007216342A JP2006040619A JP2006040619A JP2007216342A JP 2007216342 A JP2007216342 A JP 2007216342A JP 2006040619 A JP2006040619 A JP 2006040619A JP 2006040619 A JP2006040619 A JP 2006040619A JP 2007216342 A JP2007216342 A JP 2007216342A
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polishing
polishing tool
linear
hole
workpiece
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Takeji Ishikawa
武治 石川
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Natsume Optical Corp
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a polisher, polishing the inner wall surfaces of small-diameter to large-diameter work holes in simple constitution. <P>SOLUTION: While a liquid abrasive 6 is supplied to a gap between a linear material and the inner wall of a work hole, polishing material 1 is rotated in one direction, whereby while a liquid abrasive 6 is fed in the work hole 3, the inner wall surface of the work hole is polished. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、複数の線材を螺旋状により合わせて連なる線状研磨具をワーク孔へ挿通し、当該線状研磨具を一方向へ回転させてワーク孔内で砥粒液を送りながらワーク孔内壁面を研磨する研磨装置に関する。   The present invention inserts a continuous linear polishing tool into a work hole by combining a plurality of wire rods in a spiral shape, rotates the linear polishing tool in one direction, and feeds the abrasive liquid in the work hole. The present invention relates to a polishing apparatus for polishing a wall surface.

脆弱な加工物(ワーク)を切断するワイヤーとしてピアノ線などの金属線材をより合わせてなる芯線にダイヤモンド砥粒を電着させたものが用いられ、リール間に巻き付けられた状態で往復動させてワークを切断する装置が提案されている(特許文献1参照)。
また、微小なワーク孔の内面を研磨する砥石として可撓性を有する金属線材(ワイヤー)の表面に接着剤を介して多数の砥粒が接着された砥石が提案されている(特許文献2参照)。
或いは合成樹脂に研磨砥粒を混合して成形したシートを偶数本の芯材により合わせて挟み込んだ研磨具を用いて、該研磨具の一端側を固定子し他端側を回転駆動軸に接続して回転させることで、パイプ内面やワークの孔内面を研磨する技術が提案されている(特許文献3参照)。
特開平11−277398号公報 特開平8−39435号公報 特開平5−245765号公報
As a wire for cutting a fragile workpiece (workpiece), a core wire made of a metal wire such as a piano wire and electrodeposited with diamond abrasive grains is used and reciprocated while being wound between reels. An apparatus for cutting a workpiece has been proposed (see Patent Document 1).
Further, a grindstone has been proposed in which a large number of abrasive grains are bonded to the surface of a flexible metal wire (wire) via an adhesive as a grindstone for polishing the inner surface of a minute work hole (see Patent Document 2). ).
Alternatively, using a polishing tool in which a synthetic resin is mixed with abrasive grains and sandwiched by an even number of cores, one end of the polishing tool is fixed and the other end is connected to a rotary drive shaft Thus, a technique for polishing the inner surface of the pipe and the inner surface of the hole of the workpiece by rotating the shaft has been proposed (see Patent Document 3).
Japanese Patent Laid-Open No. 11-277398 Japanese Patent Laid-Open No. 8-39435 JP-A-5-245765

しかしながら、ワークを切断する場合には、切断刃となる砥粒を線材に固着する必要があるが、例えばワークに貫通孔が形成された精密光学部品を研磨する場合には、その必要がないうえに、孔径が細くなれば砥粒を金属線材に均一に固着するのが難しくなる。特に金属線材の表面に砥粒を電着したり接着したりする砥石を用いるとすれば、ワーク孔に挿通させたうえで往復動作により摺動するため、ワーク孔の内壁面への当て方によって研磨量がばらつくおそれがある。
また、研磨砥粒を混在したシートを芯材に挟み込んだ研磨具をワーク孔に挿入して回転させるとすれば、小径のワーク孔には研磨具が入らず、加工ができない。
However, when cutting a workpiece, it is necessary to affix abrasive grains serving as a cutting blade to the wire, but this is not necessary, for example, when polishing a precision optical component having a through hole formed in the workpiece. In addition, if the hole diameter is reduced, it becomes difficult to uniformly fix the abrasive grains to the metal wire. In particular, if a grindstone that electrodeposits or adheres abrasive grains to the surface of a metal wire is used, it slides in a reciprocating motion after being inserted into the work hole, so depending on how the work hole is applied to the inner wall surface The amount of polishing may vary.
Further, if a polishing tool in which a sheet containing abrasive grains is sandwiched between core materials is inserted into the work hole and rotated, the polishing tool does not enter the small-diameter work hole and cannot be processed.

本発明の目的は、上記従来技術の課題を解決し、簡易な構成で小径から大径のワーク孔の内壁面を精度よく研磨できる研磨装置を提供することにある。   An object of the present invention is to solve the above-described problems of the prior art and provide a polishing apparatus capable of accurately polishing the inner wall surface of a work hole having a small diameter to a large diameter with a simple configuration.

本発明は上記目的を達成するため、次の構成を備える。
複数の線材を螺旋状に絡ませて連なる線状研磨具をワーク孔へ挿通して両端部を固定し、当該固定部を通じて線状研磨具にテンションを加えたまま駆動源によって一方向へ回転可能な研磨部と、線状研磨具とワーク孔との隙間に砥粒液を供給する砥粒液供給部を備え、
砥粒液供給部から砥粒液を線状研磨具とワーク孔との隙間へ供給しながら研磨部において線状研磨具を一方向へ回転させてワーク孔内で砥粒液を送りながらワーク孔内壁面を研磨することを特徴とする。
また、線状研磨具を回転させ砥粒液を送りながら当該線状研磨具又はワークをワーク孔の軸線方向へ移動させることによりワーク孔内壁面を研磨することを特徴とする。
また、研磨部には、ワークを保持するワーク保持部と、該ワーク保持部で保持されたワーク孔の両側で線状研磨具をガイドし、ワーク孔の軸心と同心状の中心孔を有するガイド部が設けられていることを特徴とする。
また、線状研磨具は、複数の線材を縒り合わせて螺旋状に巻き回されてなることを特徴とする。
また、線状研磨具は、芯線とその周囲に線材が螺旋状に巻き回されてなることを特徴とする。
また、研磨部は、線状研磨具の一端側固定部を駆動源に連繋して一方向へ回転させ、他端側固定部を従動回転させるようになっていることを特徴とする。
また、研磨部は、線材の両端側固定部に連繋する各駆動源の同期を取って一方向へ回転させることを特徴とする。
In order to achieve the above object, the present invention comprises the following arrangement.
A plurality of wire rods are spirally entangled and a continuous linear polishing tool is inserted into the work hole to fix both ends, and the linear polishing tool can be rotated in one direction by a drive source while tension is applied to the linear polishing tool through the fixing portion. A polishing part, and an abrasive liquid supply part for supplying an abrasive liquid to the gap between the linear polishing tool and the work hole,
While supplying the abrasive liquid from the abrasive liquid supply part to the gap between the linear polishing tool and the work hole, the work hole while rotating the linear polishing tool in one direction in the polishing part and feeding the abrasive liquid in the work hole The inner wall surface is polished.
In addition, the inner wall surface of the work hole is polished by rotating the linear polishing tool and moving the linear polishing tool or the work in the axial direction of the work hole while feeding the abrasive liquid.
The polishing section has a work holding section for holding a work, and a linear polishing tool is guided on both sides of the work hole held by the work holding section, and has a central hole concentric with the axis of the work hole. A guide portion is provided.
Further, the linear polishing tool is characterized in that a plurality of wire rods are wound together and spirally wound.
The linear polishing tool is characterized in that a wire is spirally wound around the core wire and the periphery thereof.
Further, the polishing unit is characterized in that the one end side fixing portion of the linear polishing tool is connected to a driving source and rotated in one direction, and the other end side fixing portion is driven to rotate.
Further, the polishing unit is characterized by rotating in one direction in synchronization with each drive source linked to the both end side fixing portions of the wire.

上述した研磨装置を用いれば、砥粒液供給部から砥粒液を線状研磨具とワーク孔との隙間へ供給しながら当該線状研磨具を一方向へ回転させてワーク孔内で砥粒液を送りながらワーク孔内壁面を研磨するので、線状研磨具の回転によって砥粒液がスクリュー状の螺旋溝に沿って送液されるので、ワーク孔内壁面を均一に研磨できる。従って、簡易な構成で小径から大径のワーク孔の内壁面を精度よく研磨できる。
また、線状研磨具を回転させ砥粒液を送りながら線状研磨具又はワークをワーク孔の軸線方向へ移動させることによりワーク孔内壁面を研磨するようにすると、砥粒液のワーク内壁面への接触速度を変えることでワーク孔内壁面の研磨が均一に行える。
また、ワーク孔に挿通され、該ワーク孔の両側でテンションを付与される線状研磨具をワーク孔の軸心と同心状の中心孔を有するガイド部でガイドすると、線状研磨具がワーク孔の軸心より傾くことを防げるので、ワーク内壁面の均一な研磨が行なえる。
また、線状研磨具は、複数の線材を縒り合わせて螺旋状に巻き回されていても、芯線とその周囲に線材が螺旋状に巻き回されていてもいずれでもよく、回転により砥粒液を送り出す作用をすれば、金属線材に限らず繊維線材、樹脂線材など幅広い材質が選択できる。
また、研磨部は、線状研磨具の一端側固定部を駆動源に連繋して一方向へ回転させ、他端側固定部を従動回転するようになっていてもよいし、線状研磨具の両端側固定部が連繋する各駆動源の同期を取って一方向へ回転させるようにしてもよい。これによって、簡易な構成でワーク孔内において研磨液を螺旋溝に沿って回転させなら送液することができる。
If the above-described polishing apparatus is used, the linear polishing tool is rotated in one direction while the abrasive liquid is supplied from the abrasive liquid supply unit to the gap between the linear polishing tool and the work hole, and the abrasive grains are rotated in the work hole. Since the work hole inner wall surface is polished while feeding the liquid, the abrasive liquid is fed along the screw-like spiral groove by the rotation of the linear polishing tool, so that the work hole inner wall surface can be uniformly polished. Therefore, the inner wall surface of the work hole having a small diameter to a large diameter can be accurately polished with a simple configuration.
Further, when the linear polishing tool or the workpiece is moved in the axial direction of the workpiece hole while rotating the linear polishing tool to feed the abrasive liquid, the work hole inner wall surface is polished. The inner wall surface of the workpiece hole can be uniformly polished by changing the contact speed.
Further, when a linear polishing tool that is inserted into the work hole and is tensioned on both sides of the work hole is guided by a guide portion having a central hole concentric with the axis of the work hole, the linear polishing tool is moved to the work hole. Therefore, it is possible to uniformly polish the inner wall surface of the workpiece.
Further, the linear polishing tool may be either a spiral wound by winding a plurality of wires, or a wire wound spirally around the core wire and the abrasive liquid by rotation. Can be selected from a wide range of materials such as fiber wires and resin wires.
Further, the polishing unit may be configured such that one end side fixing portion of the linear polishing tool is connected to a driving source and rotated in one direction, and the other end side fixing portion is driven to rotate. The drive sources connected to the both end side fixed portions may be synchronized to rotate in one direction. As a result, it is possible to feed the polishing liquid by rotating it along the spiral groove in the work hole with a simple configuration.

以下、本発明に係る研磨装置の最良の実施形態について添付図面とともに詳細に説明する。本実施形態の研磨装置は、ワークとして金属材、ガラス材、セラミックス材などに利用可能であり、ワークに貫通孔が形成された該ワーク孔の内壁面を研磨する研磨装置について説明する。   Hereinafter, the best embodiment of the polishing apparatus according to the present invention will be described in detail with reference to the accompanying drawings. The polishing apparatus of this embodiment can be used for a metal material, a glass material, a ceramic material, or the like as a work, and a polishing apparatus for polishing an inner wall surface of the work hole in which a through hole is formed in the work will be described.

図1乃至図5を参照して、研磨装置の概略構成について説明する。
先ず、研磨部の構成について説明する。図1において、線状研磨具1は複数の線材を用いて螺旋状に絡ませたものが用いられる。具体的には線状研磨具1は、図1のように複数の線材1a、1bを縒り合わせて螺旋状に巻き回されてなるものであってもよいし、或いは図2のように芯線1cとその周囲に線材1dが螺旋状に巻き回されてなるものいずれであってもよい。
The schematic configuration of the polishing apparatus will be described with reference to FIGS.
First, the configuration of the polishing unit will be described. In FIG. 1, a linear polishing tool 1 that is spirally entangled using a plurality of wires is used. Specifically, the linear polishing tool 1 may be formed by winding a plurality of wire rods 1a and 1b as shown in FIG. 1 and spirally wound, or the core wire 1c as shown in FIG. Further, the wire 1d may be spirally wound around the wire 1d.

線材1a〜1dとしては、金属線(例えばピアノ線)合成樹脂線(例えば釣り糸や)、植物又は動物繊維線(綿糸、麻糸、毛糸、腸線など)、など金属線材のほかに樹脂線材、各種繊維線材、など硬質、軟質のいずれも利用することができる。   As the wire rods 1a to 1d, in addition to metal wires such as metal wires (for example, piano wires), synthetic resin wires (for example, fishing lines), plant or animal fiber wires (for example, cotton yarn, hemp yarn, wool yarn, intestinal wires), resin wires and various fibers Any of hard and soft materials such as wire can be used.

この線状研磨具1はワーク2の貫通孔(ワーク孔)3へ挿通される。線状研磨具1の径方向サイズはワーク2の材質にもよるが、ワーク孔3と略同径(孔内壁面に当接する)の大きさかあるいは孔内壁面との間に若干隙間がある程度の大きさでもよい。ワーク2は、本実施例ではガラスレンズやプラスチックレンズを想定している。この場合には、線状研磨具1はワーク孔内壁面に当接しなくてもよい。図3において線状研磨具1は両端部が固定部4、5により固定されている。この固定部4、5を通じて線状研磨具1がたるむことなく適度なテンションが加えられる。固定部4、5のうち少なくとも一方側は後述するように駆動源に連繋して一方向へ回転するようになっている。   The linear polishing tool 1 is inserted into a through hole (work hole) 3 of the work 2. Although the radial size of the linear polishing tool 1 depends on the material of the workpiece 2, the size of the workpiece hole 3 is approximately the same diameter (abuts against the inner wall surface of the hole) or a slight gap is present between the hole inner wall surface and the workpiece hole 3. It may be a size. In the present embodiment, the work 2 is assumed to be a glass lens or a plastic lens. In this case, the linear polishing tool 1 does not have to abut on the work hole inner wall surface. In FIG. 3, both ends of the linear polishing tool 1 are fixed by fixing portions 4 and 5. Appropriate tension is applied to the linear polishing tool 1 without sagging through the fixing portions 4 and 5. At least one side of the fixed portions 4 and 5 is connected to a drive source and rotates in one direction as will be described later.

また、ワーク孔3には、砥粒液供給部より線状研磨具1とワーク内壁面との隙間に砥粒液6が供給される。砥粒液6は流体(例えば純水など)に砥粒を混入したものが用いられ、場合によっては、アルカリや酸などの化学液も添加される。砥粒としては、酸化セリウム、酸化珪素、酸化アルミニウム、二酸化マンガン、酸化鉄、酸化亜鉛、炭化珪素、ダイヤモンドである。特に酸化セリウムにおいては、Ce(セリウム)原子自体がガラス中のSi(シリコン)原子と入れ替わる水和反応を利用して研磨が行なわれるため、研磨液中に化学液を添加する必要はない。   In addition, the abrasive liquid 6 is supplied to the work hole 3 from the abrasive liquid supply unit into the gap between the linear polishing tool 1 and the inner wall surface of the work. The abrasive liquid 6 is a fluid (for example, pure water) mixed with abrasive grains. In some cases, chemical liquid such as alkali or acid is also added. The abrasive grains are cerium oxide, silicon oxide, aluminum oxide, manganese dioxide, iron oxide, zinc oxide, silicon carbide, and diamond. In particular, in cerium oxide, polishing is performed using a hydration reaction in which Ce (cerium) atoms themselves are replaced with Si (silicon) atoms in the glass, so that it is not necessary to add a chemical solution to the polishing solution.

また、研磨部には、ワーク2を保持するワーク保持部7が設けられる。このワーク保持部7の両端側開口部には線状研磨具1をガイドするガイド部(例えば座金などのガイドリング)8が設けられている。ガイド部8にはワーク孔3の軸心と同心状の中心孔9が形成されている。このガイド部8によって、線状研磨具1がワーク孔3の軸心より傾くことを防げるので、ワーク内壁面の均一な研磨が行なえる。   The polishing unit is provided with a workpiece holding unit 7 that holds the workpiece 2. A guide portion (for example, a guide ring such as a washer) 8 that guides the linear polishing tool 1 is provided at both ends of the work holding portion 7. A central hole 9 concentric with the axis of the work hole 3 is formed in the guide portion 8. The guide portion 8 can prevent the linear polishing tool 1 from being inclined with respect to the axis of the workpiece hole 3, so that uniform polishing of the inner wall surface of the workpiece can be performed.

また、線状研磨具1の一端側固定部4を駆動源に連繋して一方向へ回転させ、他端側固定部5を従動回転するようになっている。或いは、線状研磨具1の両端側固定部4、5が連繋する各駆動源の同期を取って一方向へ回転させるようになっていてもよい。線状研磨具1の両端部を異なる向きへ回転すると、線材のからみあいが崩れて砥粒液6の送りが妨げられることから一方向へ回転させる必要がある。この場合、図4において、固定部4、5が同期をとって往復動させてもよい。これにより、砥粒液6の送り方向が変わりより均一な研磨が行なえる。   Further, the one end side fixing portion 4 of the linear polishing tool 1 is connected to a driving source and rotated in one direction, and the other end side fixing portion 5 is driven to rotate. Or you may make it rotate in one direction in synchronization with each drive source which the both ends side fixing | fixed part 4 and 5 of the linear grinding | polishing tool 1 connects. When the both ends of the linear polishing tool 1 are rotated in different directions, the entanglement of the wire rod is broken and the feed of the abrasive liquid 6 is hindered, so it is necessary to rotate in one direction. In this case, in FIG. 4, the fixing parts 4 and 5 may be reciprocated in synchronization. Thereby, the feed direction of the abrasive liquid 6 is changed, and more uniform polishing can be performed.

図1及び図2において、砥粒液供給部から砥粒液6を線状研磨具1とワーク孔内壁との隙間へ供給しながら当該線状研磨具1を一方向へ回転させてワーク孔3内で砥粒液6を送りながらワーク孔内壁面を研磨する。砥粒液供給部は砥粒液6をワーク孔3に連続して供給できるものであればよく、砥粒液6が貯留槽にワーク2を浸漬させる場合も含まれる。線状研磨具1の回転によって砥粒液6がスクリューポンプのように螺旋溝に沿って送液されるので、ワーク孔内壁面を均一に研磨できる。従って、簡易な構成で小径から大径のワーク孔の内壁面を精度よく研磨できる。   1 and 2, while supplying the abrasive liquid 6 from the abrasive liquid supply unit to the gap between the linear polishing tool 1 and the inner wall of the work hole, the linear polishing tool 1 is rotated in one direction to work holes 3. The inner wall surface of the workpiece hole is polished while feeding the abrasive liquid 6 inside. The abrasive liquid supply unit may be any one that can continuously supply the abrasive liquid 6 to the workpiece hole 3, and includes the case where the abrasive liquid 6 immerses the work 2 in the storage tank. Since the abrasive liquid 6 is fed along the spiral groove like a screw pump by the rotation of the linear polishing tool 1, the inner wall surface of the work hole can be uniformly polished. Therefore, the inner wall surface of the work hole having a small diameter to a large diameter can be accurately polished with a simple configuration.

また、線状研磨具1はワーク孔3の軸線方向へ移動させてワーク孔内壁面を研磨するようにしてもよい。図4において、研磨部を構成する線状研磨具1及びワーク2を砥粒液6中に浸漬させてある。図4(a)は、ワーク2はそのままの位置で、線状研磨具1を固定部4、5間でテンションを維持したまま進行方向(矢印左方向)に対して反時計回り方向に回転させながら移動させる場合を示す。また、図4(b)は、線状研磨具1を固定部4、5間でテンションを維持したまま進行方向(矢印右方向)に対して反時計回り方向に回転させながら移動させる場合を示す。この移動を交互に繰り返すことにより、ワーク孔3内を通過する砥粒液6の方向が入れ替わることで、ワーク孔内壁面の研磨が均一に行なわれる。
尚、上記線状研磨具1の動作とは別に或いは線状研磨具1の動作と合わせてワーク2を線状研磨具1の移動方向と同方向又は反対方向に移動させると、ワーク孔3内を移動する砥粒液6の流速が変化するので、研磨速度や研磨量の微調整をすることができる。
Further, the linear polishing tool 1 may be moved in the axial direction of the work hole 3 to polish the inner wall surface of the work hole. In FIG. 4, the linear polishing tool 1 and the work 2 constituting the polishing unit are immersed in the abrasive liquid 6. FIG. 4A shows that the workpiece 2 is left as it is, and the linear polishing tool 1 is rotated counterclockwise with respect to the traveling direction (the arrow left direction) while maintaining the tension between the fixing portions 4 and 5. The case where it moves is shown. FIG. 4B shows a case in which the linear polishing tool 1 is moved while being rotated counterclockwise with respect to the traveling direction (arrow right direction) while maintaining the tension between the fixing portions 4 and 5. . By repeating this movement alternately, the direction of the abrasive liquid 6 passing through the workpiece hole 3 is switched, so that the inner wall surface of the workpiece hole is uniformly polished.
If the workpiece 2 is moved in the same direction as or opposite to the movement direction of the linear polishing tool 1 separately from the operation of the linear polishing tool 1 or in conjunction with the operation of the linear polishing tool 1, Since the flow rate of the abrasive liquid 6 that moves is changed, the polishing rate and the polishing amount can be finely adjusted.

上述した実施例ではワーク2の軸線方向を横向きに保持した装置構成について説明した。図5ではワーク2を軸線方向が縦向きとなるように保持して研磨する装置構成について説明する。図5において、ワーク2は、図示しないワーク保持部によって軸線方向が縦向きとなるように保持されている。このワーク2の上端側に近接して砥粒液供給部10が設けられている。砥粒液供給部10は、砥粒液6を供給する供給パイプ11と、砥粒液6を一時的に貯留しておく貯留部12を備えている。   In the above-described embodiment, the apparatus configuration in which the axial direction of the workpiece 2 is held sideways has been described. FIG. 5 illustrates an apparatus configuration for holding and polishing the workpiece 2 such that the axial direction is vertical. In FIG. 5, the work 2 is held by a work holding unit (not shown) so that the axial direction is vertical. An abrasive liquid supply unit 10 is provided close to the upper end side of the work 2. The abrasive liquid supply unit 10 includes a supply pipe 11 that supplies the abrasive liquid 6 and a storage unit 12 that temporarily stores the abrasive liquid 6.

また、線状研磨具1はワーク孔3を挿通して固定部4、5が上下に設けられている。上側固定部4は、駆動源であるモータなどに連繋しており、例えば時計回り方向へ回転駆動される。一方、下側固定部5は、時計回り方向へ従動回転するようになっている。線状研磨具1は、自重のほかに固定部4、5間で適度なテンションが付与されている。   Further, the linear polishing tool 1 is inserted through the work hole 3 and has fixing portions 4 and 5 provided vertically. The upper fixing portion 4 is connected to a motor as a driving source and is rotated, for example, in the clockwise direction. On the other hand, the lower fixing portion 5 is driven to rotate clockwise. The linear polishing tool 1 is given an appropriate tension between the fixing portions 4 and 5 in addition to its own weight.

貯留部12に蓄えられた砥粒液6は自重によりワーク孔3へ導かれ、線状研磨具1を一方向(時計回り方向)へ回転させてワーク孔内で砥粒液6を送りながらワーク孔内壁面を研磨する。このとき、線状研磨具1を軸線方向に上下に移動させると、ワーク孔3内を移動する砥粒液6の流速が変化するので、研磨速度や研磨量の微調整をすることができる。例えば、線状研磨具1を上方向へ移動させると、砥粒液6の流速が速くなることから、研磨速度や研磨量が増え、下方向へ移動させると砥粒液6の流速が遅くなることから、研磨速度や研磨量が遅くなる。また、貯留部12とワーク2との間のシール性が維持されるならば、ワーク2を上方向又は下方向へ移動させてもよい。   The abrasive liquid 6 stored in the storage unit 12 is guided to the work hole 3 by its own weight, and the work is performed while rotating the linear polishing tool 1 in one direction (clockwise direction) and feeding the abrasive liquid 6 in the work hole. Polish the inner wall surface of the hole. At this time, when the linear polishing tool 1 is moved up and down in the axial direction, the flow rate of the abrasive liquid 6 moving in the workpiece hole 3 changes, so that the polishing speed and the polishing amount can be finely adjusted. For example, when the linear polishing tool 1 is moved upward, the flow rate of the abrasive liquid 6 is increased. Therefore, the polishing rate and the amount of polishing are increased, and when moved downward, the flow rate of the abrasive liquid 6 is decreased. For this reason, the polishing rate and the polishing amount become slow. Moreover, if the sealing performance between the storage unit 12 and the workpiece 2 is maintained, the workpiece 2 may be moved upward or downward.

尚、前述した研磨装置は、ワークの種類に応じて、砥粒液の種類、砥粒の種類、砥粒液の温度などを調整することで、最適な研磨条件に設定できるので、より複雑な形状のワークを高精度に研磨仕上げすることができる。また、研磨装置は線状研磨具又はワークを上下方向の移動に加えて水平方向の移動を併用すると真円孔のみでなく楕円孔の研磨も行なえる。   The above-described polishing apparatus can be set to optimum polishing conditions by adjusting the type of abrasive liquid, the type of abrasive grain, the temperature of the abrasive liquid, etc. according to the type of workpiece, so that it is more complicated. Shaped workpieces can be polished with high accuracy. Further, the polishing apparatus can polish not only a perfect circular hole but also an elliptical hole by using a linear polishing tool or a workpiece in a horizontal direction in addition to a vertical movement.

研磨装置の要部の模式図である。It is a schematic diagram of the principal part of a grinding | polishing apparatus. 他例に係る線状研磨具を用いた研磨装置の要部の模式図である。It is a schematic diagram of the principal part of the grinding | polishing apparatus using the linear polishing tool which concerns on another example. 研磨装置の断面図である。It is sectional drawing of a grinding | polishing apparatus. 研磨動作の模試説明図である。It is a trial explanatory drawing of grinding | polishing operation | movement. 他例に係る研磨装置の説明図である。It is explanatory drawing of the grinding | polishing apparatus which concerns on another example.

符号の説明Explanation of symbols

1 線状研磨具
1a、1b、1c、1d 線材
2 ワーク
3 ワーク孔
4、5 固定部
6 砥粒液
7 ワーク保持部
8 ガイド部
9 中心孔
10 砥粒液供給部
11 供給パイプ
12 貯留部
DESCRIPTION OF SYMBOLS 1 Linear polishing tool 1a, 1b, 1c, 1d Wire 2 Workpiece 3 Workpiece hole 4, 5 Fixed part 6 Abrasive liquid 7 Workpiece holding part 8 Guide part 9 Center hole 10 Abrasive liquid supply part 11 Supply pipe 12 Storage part

Claims (7)

複数の線材を螺旋状に絡ませて連なる線状研磨具をワーク孔へ挿通して両端部を固定し、当該固定部を通じて線状研磨具にテンションを加えたまま駆動源によって一方向へ回転可能な研磨部と、線状研磨具とワーク孔との隙間に砥粒液を供給する砥粒液供給部を備え、
砥粒液供給部から砥粒液を線状研磨具とワーク孔との隙間へ供給しながら研磨部において線状研磨具を一方向へ回転させてワーク孔内で砥粒液を送りながらワーク孔内壁面を研磨することを特徴とする研磨装置。
A plurality of wire rods are spirally entangled and a continuous linear polishing tool is inserted into the work hole to fix both ends, and the linear polishing tool can be rotated in one direction by a drive source while tension is applied to the linear polishing tool through the fixing portion. A polishing part, and an abrasive liquid supply part for supplying an abrasive liquid to the gap between the linear polishing tool and the work hole,
While supplying the abrasive liquid from the abrasive liquid supply part to the gap between the linear polishing tool and the work hole, the work hole while rotating the linear polishing tool in one direction in the polishing part and feeding the abrasive liquid in the work hole A polishing apparatus for polishing an inner wall surface.
線状研磨具を回転させ砥粒液を送りながら当該線状研磨具又はワークをワーク孔の軸線方向へ移動させることによりワーク孔内壁面を研磨することを特徴とする請求項1記載の研磨装置。   2. The polishing apparatus according to claim 1, wherein the inner wall surface of the workpiece hole is polished by rotating the linear polishing tool and moving the linear polishing tool or the workpiece in the axial direction of the workpiece hole while feeding the abrasive liquid. . 研磨部には、ワークを保持するワーク保持部と、該ワーク保持部で保持されたワーク孔の両側で線状研磨具をガイドし、ワーク孔の軸心と同心状の中心孔を有するガイド部が設けられていることを特徴とする請求項1記載の研磨装置。   The polishing unit includes a workpiece holding unit that holds a workpiece, and a guide unit that guides the linear polishing tool on both sides of the workpiece hole held by the workpiece holding unit and has a central hole that is concentric with the axis of the workpiece hole. The polishing apparatus according to claim 1, wherein the polishing apparatus is provided. 線状研磨具は、複数の線材を縒り合わせて螺旋状に巻き回されてなることを特徴とする請求項1記載の研磨装置。   The polishing apparatus according to claim 1, wherein the linear polishing tool is formed by winding a plurality of wire rods in a spiral shape. 線状研磨具は、芯線とその周囲に線材が螺旋状に巻き回されてなることを特徴とする請求項1記載の研磨装置。   The polishing apparatus according to claim 1, wherein the linear polishing tool includes a core wire and a wire wound around the core wire in a spiral shape. 研磨部は、線状研磨具の一端側固定部を駆動源に連繋して一方向へ回転させ、他端側固定部を従動回転させるようになっていることを特徴とする請求項1記載の研磨装置。   2. The polishing unit according to claim 1, wherein the one end side fixing portion of the linear polishing tool is connected to a drive source to rotate in one direction, and the other end side fixing portion is driven to rotate. Polishing equipment. 研磨部は、線材の両端側固定部に連繋する各駆動源の同期を取って一方向へ回転させることを特徴とする請求項1記載の研磨装置。   The polishing apparatus according to claim 1, wherein the polishing unit rotates in one direction in synchronization with each drive source connected to the fixing portions on both ends of the wire.
JP2006040619A 2006-02-17 2006-02-17 Polisher Pending JP2007216342A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102009381A (en) * 2009-09-04 2011-04-13 余定泉 Heald eye polishing technology of flat metal heald for shuttleless loom
JP2011206392A (en) * 2010-03-30 2011-10-20 Terumo Corp Method of manufacturing medical pipe

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102009381A (en) * 2009-09-04 2011-04-13 余定泉 Heald eye polishing technology of flat metal heald for shuttleless loom
CN102009381B (en) * 2009-09-04 2014-01-08 余定泉 Heald eye polishing technology of flat metal heald for shuttleless loom
JP2011206392A (en) * 2010-03-30 2011-10-20 Terumo Corp Method of manufacturing medical pipe

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