JP2007214287A5 - - Google Patents

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Publication number
JP2007214287A5
JP2007214287A5 JP2006031545A JP2006031545A JP2007214287A5 JP 2007214287 A5 JP2007214287 A5 JP 2007214287A5 JP 2006031545 A JP2006031545 A JP 2006031545A JP 2006031545 A JP2006031545 A JP 2006031545A JP 2007214287 A5 JP2007214287 A5 JP 2007214287A5
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JP
Japan
Prior art keywords
electrostatic chuck
dielectric
less
convex portions
chuck according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006031545A
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Japanese (ja)
Other versions
JP4244229B2 (en
JP2007214287A (en
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2006031545A external-priority patent/JP4244229B2/en
Priority to JP2006031545A priority Critical patent/JP4244229B2/en
Priority to PCT/JP2007/052175 priority patent/WO2007091619A1/en
Priority to KR1020087018298A priority patent/KR100989230B1/en
Priority to TW096104666A priority patent/TWI342059B/en
Priority to US12/086,967 priority patent/US7907383B2/en
Priority to CN2007800045852A priority patent/CN101379607B/en
Publication of JP2007214287A publication Critical patent/JP2007214287A/en
Publication of JP2007214287A5 publication Critical patent/JP2007214287A5/ja
Publication of JP4244229B2 publication Critical patent/JP4244229B2/en
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (4)

アルミナが99.4wt%以上、酸化チタンが0.2wt%より大きく0.6wt%以下、かさ密度が3.97g/cm以上、体積抵抗率が室温において10〜1011Ωcm、かつアルミナ粒子の粒界に酸化チタンが偏析した構造の静電チャック用誘電体を備えたことを特徴とする静電チャック。 Alumina is 99.4 wt% or more, titanium oxide is greater than 0.2 wt% and 0.6 wt% or less, bulk density is 3.97 g / cm 3 or more, volume resistivity is 10 8 to 10 11 Ωcm at room temperature, and alumina particles An electrostatic chuck comprising a dielectric for electrostatic chuck having a structure in which titanium oxide is segregated at grain boundaries. 前記アルミナ粒子の粒内および粒界にチタン酸アルミニウム(AlTiO)が存在しないことを特徴とする請求項1に記載の静電チャック。 2. The electrostatic chuck according to claim 1, wherein aluminum titanate (Al 2 TiO 5 ) does not exist in the grains and the grain boundaries of the alumina particles. 請求項1または2に記載の静電チャックであって、100℃以下の低温で使用されることを特徴とする静電チャック。 The electrostatic chuck according to claim 1 , wherein the electrostatic chuck is used at a low temperature of 100 ° C. or less. 複数の凸部が形成され被吸着体を該凸部上面に載置する平滑な表面を有する誘電体から構成され、前記複数の凸部上面の合計の面積と前記誘電体表面の面積との比率が0.001%以上0.5%未満でありかつ凸部の高さが5〜15μmであることを特徴とする請求項1乃至のいずれかに記載の静電チャック。 A ratio of the total area of the top surfaces of the plurality of convex portions to the area of the dielectric surface, which is composed of a dielectric having a smooth surface on which a plurality of convex portions are formed and the object to be adsorbed is placed on the top surface of the convex portions The electrostatic chuck according to any one of claims 1 to 3 , wherein the height is 0.001% or more and less than 0.5%, and the height of the convex portion is 5 to 15 µm.
JP2006031545A 2005-11-15 2006-02-08 Electrostatic chuck Active JP4244229B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006031545A JP4244229B2 (en) 2006-02-08 2006-02-08 Electrostatic chuck
US12/086,967 US7907383B2 (en) 2005-11-15 2007-02-08 Electrostatic chuck
KR1020087018298A KR100989230B1 (en) 2006-02-08 2007-02-08 Electrostatic chuck
TW096104666A TWI342059B (en) 2006-02-08 2007-02-08 Electrostatic chuck
PCT/JP2007/052175 WO2007091619A1 (en) 2006-02-08 2007-02-08 Electrostatic chuck
CN2007800045852A CN101379607B (en) 2006-02-08 2007-02-08 Electrostatic chuck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006031545A JP4244229B2 (en) 2006-02-08 2006-02-08 Electrostatic chuck

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008201771A Division JP4623159B2 (en) 2008-08-05 2008-08-05 Electrostatic chuck

Publications (3)

Publication Number Publication Date
JP2007214287A JP2007214287A (en) 2007-08-23
JP2007214287A5 true JP2007214287A5 (en) 2008-09-18
JP4244229B2 JP4244229B2 (en) 2009-03-25

Family

ID=38345213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006031545A Active JP4244229B2 (en) 2005-11-15 2006-02-08 Electrostatic chuck

Country Status (5)

Country Link
JP (1) JP4244229B2 (en)
KR (1) KR100989230B1 (en)
CN (1) CN101379607B (en)
TW (1) TWI342059B (en)
WO (1) WO2007091619A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009004752A (en) * 2007-05-18 2009-01-08 Toto Ltd Electrostatic chuck
JP4786693B2 (en) 2008-09-30 2011-10-05 三菱重工業株式会社 Wafer bonding apparatus and wafer bonding method
JP5872998B2 (en) 2012-04-26 2016-03-01 日本特殊陶業株式会社 Alumina sintered body, member comprising the same, and semiconductor manufacturing apparatus
KR102119867B1 (en) * 2013-10-21 2020-06-09 주식회사 미코세라믹스 Electrostatic chuck
CN107663080B (en) * 2016-07-27 2020-05-08 北京华卓精科科技股份有限公司 Alumina ceramic applied to J-R type electrostatic chuck and preparation method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03204924A (en) * 1989-10-30 1991-09-06 Sumitomo Metal Ind Ltd Specimen holder
JPH09330974A (en) * 1996-06-12 1997-12-22 Hitachi Ltd Electrostatic chuck electrode
JP4201502B2 (en) * 2000-10-11 2008-12-24 独立行政法人産業技術総合研究所 Electrostatic chuck and manufacturing method thereof
US6483690B1 (en) * 2001-06-28 2002-11-19 Lam Research Corporation Ceramic electrostatic chuck assembly and method of making
JP2004352572A (en) * 2003-05-29 2004-12-16 Kyocera Corp Alumina ceramics and method for producing the same
CN100481366C (en) * 2003-11-14 2009-04-22 爱德牌工程有限公司 Electrostatic chuck, substrate support, clamp and electrode structure and producing method thereof
JP4722463B2 (en) * 2004-12-03 2011-07-13 黒崎播磨株式会社 Dielectric ceramics for electrostatic chuck and manufacturing method thereof

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