JP2007201440A5 - - Google Patents

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Publication number
JP2007201440A5
JP2007201440A5 JP2006345202A JP2006345202A JP2007201440A5 JP 2007201440 A5 JP2007201440 A5 JP 2007201440A5 JP 2006345202 A JP2006345202 A JP 2006345202A JP 2006345202 A JP2006345202 A JP 2006345202A JP 2007201440 A5 JP2007201440 A5 JP 2007201440A5
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JP
Japan
Prior art keywords
silicide layer
metal silicide
image data
layer
hue
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006345202A
Other languages
English (en)
Japanese (ja)
Other versions
JP4912138B2 (ja
JP2007201440A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006345202A priority Critical patent/JP4912138B2/ja
Priority claimed from JP2006345202A external-priority patent/JP4912138B2/ja
Publication of JP2007201440A publication Critical patent/JP2007201440A/ja
Publication of JP2007201440A5 publication Critical patent/JP2007201440A5/ja
Application granted granted Critical
Publication of JP4912138B2 publication Critical patent/JP4912138B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006345202A 2005-12-28 2006-12-22 半導体装置の製造方法、半導体検査装置、及びプログラム Expired - Fee Related JP4912138B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006345202A JP4912138B2 (ja) 2005-12-28 2006-12-22 半導体装置の製造方法、半導体検査装置、及びプログラム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005378220 2005-12-28
JP2005378220 2005-12-28
JP2006345202A JP4912138B2 (ja) 2005-12-28 2006-12-22 半導体装置の製造方法、半導体検査装置、及びプログラム

Publications (3)

Publication Number Publication Date
JP2007201440A JP2007201440A (ja) 2007-08-09
JP2007201440A5 true JP2007201440A5 (enExample) 2010-01-28
JP4912138B2 JP4912138B2 (ja) 2012-04-11

Family

ID=38455654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006345202A Expired - Fee Related JP4912138B2 (ja) 2005-12-28 2006-12-22 半導体装置の製造方法、半導体検査装置、及びプログラム

Country Status (1)

Country Link
JP (1) JP4912138B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5424163B2 (ja) * 2009-05-26 2014-02-26 独立行政法人海上技術安全研究所 膜厚計測方法、膜厚計測装置およびプログラム
JP7040869B2 (ja) * 2017-07-28 2022-03-23 株式会社Screenホールディングス 基板処理装置、及び基板処理装置の部品検査方法
JP2021536594A (ja) * 2018-08-27 2021-12-27 ケーエルエー コーポレイション 光学システム内の保護剤としての蒸気及び寿命延長装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3037922B2 (ja) * 1997-11-07 2000-05-08 松下電子工業株式会社 シリコン含有層の評価方法及びシリサイド層の形成工程の管理方法
KR100366613B1 (ko) * 1999-10-06 2003-01-06 삼성전자 주식회사 박막두께 측정방법 및 이를 적용한 장치
JP4463600B2 (ja) * 2003-03-26 2010-05-19 株式会社半導体エネルギー研究所 評価方法

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