JP2007197316A - Method for preparing silica dispersion - Google Patents

Method for preparing silica dispersion Download PDF

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JP2007197316A
JP2007197316A JP2007034427A JP2007034427A JP2007197316A JP 2007197316 A JP2007197316 A JP 2007197316A JP 2007034427 A JP2007034427 A JP 2007034427A JP 2007034427 A JP2007034427 A JP 2007034427A JP 2007197316 A JP2007197316 A JP 2007197316A
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silica
dispersion
cationic polymer
fine particles
producing
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Yukio Tokunaga
幸雄 徳永
Tetsuya Ashida
哲也 芦田
Hajime Sugita
元 杉田
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Mitsubishi Paper Mills Ltd
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Mitsubishi Paper Mills Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for preparing a silica dispersion which contains silica of high concentration and in which silica hardly agglomerates or precipitates. <P>SOLUTION: The method for preparing the silica dispersion by dispersing a silica fine particle in a dispersion medium comprises the steps of: using gas-phase method silica (fumed silica) having 3-15 nm average primary particle size as the silica fine particle; adding the fumed silica to the dispersion medium, which is prepared by adding a cationic polymer having ≤50,000 average molecular weight to water, and mixing them to prepare silica slurry; and dispersing the prepared silica slurry by a dispersing machine. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明はシリカ分散液の製造方法に関する。詳しくは、高濃度で経時安定性の高いシリカ分散液の製造方法に関する。   The present invention relates to a method for producing a silica dispersion. Specifically, the present invention relates to a method for producing a silica dispersion having a high concentration and high stability over time.

シリカ分散液は、シリコンに代表される半導体ウェハーを研磨するときやIC製造工程中で絶縁層などを研磨するときの研磨剤、メガネレンズなどのプラスチック用ハードコート剤、インクジェット用記録材料やOHP用コート剤、さらには、各種フィルムのアンチブロッキング剤、ガラス繊維等の接着助剤、エマルジョンやワックス等の安定剤として使用されている。   Silica dispersions are used for polishing semiconductor wafers typified by silicon or for polishing insulating layers in IC manufacturing processes, hard coating agents for plastics such as eyeglass lenses, inkjet recording materials, and OHP. It is used as a coating agent, an antiblocking agent for various films, an adhesion aid such as glass fiber, and a stabilizer such as emulsion and wax.

このようなシリカ分散液としては、四塩化珪素を原料として酸水素炎中で燃焼させて作る気相法シリカ(ヒュームドシリカ)、ケイ酸ソーダを中和して作る沈澱法シリカやゲル法シリカといった、いわゆる湿式シリカ、あるいは、ケイ素のアルコキシドを原料としてアルカリ性もしくは酸性の含水有機溶媒中で加水分解して作るゾル−ゲル法シリカが優れており、かかるシリカを使用したシリカ分散液が注目されている。これらのシリカ分散液は、上記シリカ微粒子を高圧ホモジナイザー、ボールミル等の分散機で分散媒(水や有機溶剤又はそれらの混合物)中に分散されて作られる。   Examples of such silica dispersions include vapor phase silica (fumed silica) made by burning silicon tetrachloride as a raw material in an oxyhydrogen flame, precipitated silica and gel silica made by neutralizing sodium silicate. So-called wet silica, or sol-gel silica prepared by hydrolyzing silicon alkoxide in an alkaline or acidic water-containing organic solvent is excellent, and silica dispersions using such silica are attracting attention. Yes. These silica dispersions are prepared by dispersing the silica fine particles in a dispersion medium (water, an organic solvent or a mixture thereof) by a dispersing machine such as a high-pressure homogenizer or a ball mill.

しかしながら、これらの分散液は、保管中に凝集沈降が起こるという問題があった。特に、水を主体とする分散媒で15質量%以上のシリカ濃度の分散液で上記問題は顕著になった。更に超微粒子のシリカ、即ち平均1次粒子径が50nm以下の微粒子シリカの場合に上記問題は起こりやすかった。   However, these dispersions have a problem that aggregation and sedimentation occur during storage. In particular, the above problem became significant in a dispersion medium mainly composed of water and having a silica concentration of 15% by mass or more. Furthermore, the above problem was likely to occur in the case of ultrafine silica, that is, fine silica having an average primary particle size of 50 nm or less.

また、高濃度のシリカ分散液は、物流を考慮した場合コスト面で非常に有利である。従って、高濃度のシリカ分散液を安定して製造する方法が望まれている。   In addition, a high-concentration silica dispersion is very advantageous in terms of cost in consideration of physical distribution. Therefore, a method for stably producing a high concentration silica dispersion is desired.

従って、本発明の目的は、高濃度で凝集沈降の起こりにくいシリカ分散液を製造する方法を提供することである。   Accordingly, an object of the present invention is to provide a method for producing a silica dispersion having a high concentration and hardly causing aggregation and sedimentation.

本発明の上記目的は、以下の発明によって達成された。
シリカ微粒子を分散媒中に分散したシリカ分散液の製造方法において、該シリカ微粒子が平均1次粒径が3〜15nmの気相法シリカであり、水を主体とし平均分子量5万以下のカチオンポリマーを添加した分散媒にシリカ微粒子を添加、混合してシリカスラリーを作製した後、該シリカスラリーを分散機で分散することを特徴とするシリカ分散液の製造方法。
The above object of the present invention has been achieved by the following invention.
In the method for producing a silica dispersion in which silica fine particles are dispersed in a dispersion medium, the silica fine particles are gas phase method silica having an average primary particle size of 3 to 15 nm, and mainly composed of water and a cationic polymer having an average molecular weight of 50,000 or less. A method for producing a silica dispersion, comprising: adding and mixing silica fine particles to a dispersion medium to which silica is added to produce a silica slurry, and then dispersing the silica slurry with a disperser.

本発明によれば、保存経時の安定したシリカ分散液が得られる。特にシリカ濃度が15質量%の高濃度の分散液では、経時で凝集沈降が起こりやすく、このような高濃度の分散液に好適である。また、カチオンポリマーの中でも、特に平均分子量が2000〜5万の水溶性のポリジアリルアミン誘導体の構成単位を有するカチオンポリマーが、極めて安定なシリカ分散液の作製に有用である。更に、本発明は、平均一次粒径が3〜15nmでBET法による比表面積が200m2/g以上の気相法シリカの分散液に有効である。 According to the present invention, a silica dispersion that is stable over time can be obtained. In particular, a high-concentration dispersion with a silica concentration of 15% by mass tends to cause aggregation and sedimentation over time, and is suitable for such a high-concentration dispersion. Among the cationic polymers, a cationic polymer having a structural unit of a water-soluble polydiallylamine derivative having an average molecular weight of 2000 to 50,000 is particularly useful for preparing an extremely stable silica dispersion. Furthermore, the present invention is effective for a dispersion of vapor phase silica having an average primary particle size of 3 to 15 nm and a specific surface area by a BET method of 200 m 2 / g or more.

以下、本発明を詳細に説明する。
合成シリカには湿式法によるものと気相法によるものがある。通常シリカ微粒子といえば湿式法シリカを指す場合が多い。湿式法シリカとしては、(1)ケイ酸ナトリウムの酸などによる複分解やイオン交換樹脂層を通して得られるシリカゾル、または(2)このシリカゾルを加熱熟成して得られるコロイダルシリカ、(3)シリカゾルをゲル化させ、その生成条件を変えることによって数μmから10μm位の1次粒子がシロキサン結合をした三次元的な二次粒子となったシリカゲル、更には(4)シリカゾル、ケイ酸ナトリウム、アルミン酸ナトリウム等を加熱生成させて得られるもののようなケイ酸を主体とする合成ケイ酸化合物等がある。
Hereinafter, the present invention will be described in detail.
Synthetic silica is classified into a wet method and a gas phase method. In general, silica fine particles often refer to wet process silica. Wet silicas include (1) silica sol obtained through metathesis with sodium silicate acid and ion exchange resin layer, or (2) colloidal silica obtained by heating and aging this silica sol, and (3) gelation of silica sol. In addition, by changing the production conditions, silica gel in which primary particles of several μm to 10 μm become three-dimensional secondary particles having siloxane bonds, and (4) silica sol, sodium silicate, sodium aluminate, etc. There are synthetic silicic acid compounds mainly composed of silicic acid, such as those obtained by heating to form a silicic acid.

本発明に用いられるシリカ微粒子は気相法シリカである。気相法シリカ(ヒュームドシリカ)は、湿式法に対して乾式法とも呼ばれ、一般的には火炎加水分解法によって作られる。具体的には四塩化ケイ素を水素及び酸素と共に燃焼して作る方法が一般的に知られているが、四塩化ケイ素の代わりにメチルトリクロロシランやトリクロロシラン等のシラン類も、単独または四塩化ケイ素と混合した状態で使用することができる。気相法シリカは日本アエロジル株式会社からアエロジル、(株)トクヤマからQSタイプとして市販されており入手することができる。   The silica fine particles used in the present invention are vapor phase silica. Vapor phase silica (fumed silica) is also called a dry method as opposed to a wet method, and is generally made by a flame hydrolysis method. Specifically, a method of making silicon tetrachloride by burning with hydrogen and oxygen is generally known, but silanes such as methyltrichlorosilane and trichlorosilane can be used alone or silicon tetrachloride instead of silicon tetrachloride. Can be used in a mixed state. Vapor phase silica is commercially available as Aerosil from Nippon Aerosil Co., Ltd., and QS type from Tokuyama Co., Ltd., and can be obtained.

本発明のカチオンポリマーを用いた分散液は、特に気相法シリカを用いた場合に有効である。その中でも、特に平均1次粒径が3〜15nmで、かつBET法による比表面積が200m2/g以上、更には250〜500m2/gである気相法シリカの分散液に好適である。 The dispersion using the cationic polymer of the present invention is particularly effective when vapor phase silica is used. Among them, it is particularly suitable for a dispersion of vapor phase method silica having an average primary particle size of 3 to 15 nm and a specific surface area by the BET method of 200 m 2 / g or more, and further 250 to 500 m 2 / g.

本発明で云うBET法とは、気相吸着法による粉体の表面積測定法の一つであり、吸着等温線から1gの試料の持つ総表面積、即ち比表面積を求める方法である。通常吸着気体としては、窒素ガスが多く用いられ、吸着量を被吸着気体の圧、または容積の変化から測定する方法が最も多く用いられている。多分子吸着の等温線を表すのに最も著名なものは、Brunauer、Emmett、Tellerの式であってBET式と呼ばれ、表面積決定に広く用いられている。BET式に基づいて吸着量を求め、吸着分子1個が表面で占める面積を掛けて、表面積が得られる。   The BET method referred to in the present invention is one of powder surface area measurement methods by vapor phase adsorption, and is a method for determining the total surface area, that is, the specific surface area of a 1 g sample from the adsorption isotherm. Usually, nitrogen gas is often used as the adsorbed gas, and the most frequently used method is to measure the amount of adsorption from the change in pressure or volume of the gas to be adsorbed. The most prominent expression for expressing the isotherm of multimolecular adsorption is the Brunauer, Emmett, and Teller formula, called the BET formula, which is widely used for determining the surface area. The adsorption amount is obtained based on the BET equation, and the surface area is obtained by multiplying the area occupied by one adsorbed molecule on the surface.

本発明に用いられるカチオンポリマーとしては、1〜3級アミノ基、4級アンモニウム塩基あるいはホスホニウム塩基を有するポリマー等が用いられる。中でも水溶性ポリマーが好ましく、特に平均分子量が5万以下のポリマーが好ましい。   Examples of the cationic polymer used in the present invention include polymers having a primary to tertiary amino group, a quaternary ammonium base, or a phosphonium base. Among them, a water-soluble polymer is preferable, and a polymer having an average molecular weight of 50,000 or less is particularly preferable.

上記カチオンポリマーの中でも、特にポリジアリルアミン誘導体の構成単位を有するカチオンポリマーが好ましく、下記一般式(1)、(2)、(3)又は(4)で表される構造を構成単位とするカチオンポリマーである。これらの誘導体はジアリルアミン化合物のラジカル環化重合によって得られ、シャロールDC902P(第一工業製薬)、ジェットフィックス110(里田化工)、ユニセンスCP−101〜103(センカ)、PAS−H(日東紡績社)として市販されている。   Among the above cationic polymers, cationic polymers having a structural unit of a polydiallylamine derivative are particularly preferable, and a cationic polymer having a structure represented by the following general formula (1), (2), (3) or (4) as a structural unit. It is. These derivatives are obtained by radical cyclopolymerization of diallylamine compounds. Charol DC902P (Daiichi Kogyo Seiyaku Co., Ltd.), Jetfix 110 (Satoda Chemical Industries), Unisense CP-101 to 103 (Senka), PAS-H (Nittobo) Is commercially available.

Figure 2007197316
Figure 2007197316

Figure 2007197316
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Figure 2007197316
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一般式(1)、(2)、(3)及び(4)において、R1及びR2は各々、水素原子、メチル基、エチル基等のアルキル基、またはヒドロキシエチル基等の置換アルキル基を表し、Yはラジカル重合可能なモノマー(例えば、スルホニル、アクリルアミド及びその誘導体、アクリル酸エステル、メタクリル酸エステル等)を表す。また、一般式(3)及び(4)において、n/m=9/1〜2/8(質量比)、l=5〜10000である。Xはアニオンを表す。 In the general formulas (1), (2), (3) and (4), R 1 and R 2 each represents a hydrogen atom, an alkyl group such as a methyl group or an ethyl group, or a substituted alkyl group such as a hydroxyethyl group. Y represents a radical polymerizable monomer (for example, sulfonyl, acrylamide and derivatives thereof, acrylic ester, methacrylic ester, etc.). In the general formulas (3) and (4), n / m = 9/1 to 2/8 (mass ratio), and l = 5 to 10,000. X represents an anion.

一般式(3)又は(4)で示されるポリジアリルアミンの誘導体の具体的な例としては、特開昭60−83882号公報記載のSO2基を繰り返し単位に含む もの、特開平1−9776号公報に記載されているアクリルアミドとの共重合体等が挙げられる。本発明に用いられるポリジアリルアミン誘導体のカチオンポリマーの平均分子量は、2,000〜5万程度がより好ましい。 Specific examples of the polydiallylamine derivative represented by the general formula (3) or (4) include those having a SO 2 group as a repeating unit described in JP-A-60-83882, JP-A-1-9776. Examples thereof include copolymers with acrylamide described in the publication. The average molecular weight of the cationic polymer of the polydiallylamine derivative used in the present invention is more preferably about 2,000 to 50,000.

上記カチオンポリマーの使用量はシリカ微粒子に対して1〜10質量%が好ましい。   The amount of the cationic polymer used is preferably 1 to 10% by mass with respect to the silica fine particles.

本発明のシリカ分散液は、高濃度、即ちシリカ濃度が15質量%以上、更には18質量%以上であっても、長期間に渡って分散安定性が保たれる。   Even if the silica dispersion of the present invention has a high concentration, that is, a silica concentration of 15% by mass or more, and further 18% by mass or more, the dispersion stability is maintained over a long period of time.

本発明のシリカ分散液に用いられる分散媒は、水を主体とするものであるが、少量の有機溶剤(低級アルコールや酢酸エチル等の低沸点溶剤)を含んでもよい。その場合、有機溶剤は全分散媒に対して20質量%以下、更には10質量%以下であることが好ましい。   The dispersion medium used in the silica dispersion of the present invention is mainly composed of water, but may contain a small amount of an organic solvent (a low-boiling solvent such as lower alcohol or ethyl acetate). In that case, the organic solvent is preferably 20% by mass or less, more preferably 10% by mass or less, based on the total dispersion medium.

次に、本発明のシリカ分散液の製造方法を説明する。通常、シリカ分散液は、水等の分散媒にシリカ微粒子を添加し混合(予備混合)してシリカスラリーを作製し、このシリカスラリーを分散機、例えば高圧ホモジナイザーやボールミルで分散する。高圧ホモジナイザーを用いた分散は、例えば特開平10−310416号公報に記載の方法を用いることができる。また、上記シリカスラリーを高圧ホモジナイザーで処理する回数は、1〜数十回の範囲から選ばれる。   Next, the manufacturing method of the silica dispersion liquid of this invention is demonstrated. Usually, the silica dispersion is prepared by adding silica fine particles to a dispersion medium such as water and mixing (preliminary mixing) to prepare a silica slurry, and the silica slurry is dispersed by a disperser such as a high-pressure homogenizer or a ball mill. For the dispersion using a high-pressure homogenizer, for example, the method described in JP-A-10-310416 can be used. Moreover, the frequency | count of processing the said silica slurry with a high pressure homogenizer is chosen from the range of 1 to several dozen times.

カチオンポリマーは、シリカ微粒子を添加する前の分散媒中に添加することが好ましい。これによって、より安定した分散液が得られる。   The cationic polymer is preferably added to the dispersion medium before adding the silica fine particles. As a result, a more stable dispersion can be obtained.

本発明において、予備混合するときの液温は、20℃以下が好ましい。特に15℃以下が好ましい。これによって、高濃度のシリカスラリーが安定して作製できる。この場合、シリカ微粒子を添加する前の分散媒を20℃以下の温度にしておいてもよいし、予備混合中に冷却して20℃以下に下げてもよい。また、シリカスラリーの温度が20℃以下、さらには15℃以下の状態で分散機に注入するのが好ましい。これによって更に安定した分散液が得られる。   In the present invention, the liquid temperature when premixing is preferably 20 ° C. or less. In particular, 15 ° C. or less is preferable. Thereby, a high concentration silica slurry can be stably produced. In this case, the dispersion medium before adding the silica fine particles may be kept at a temperature of 20 ° C. or lower, or may be cooled to 20 ° C. or lower during the premixing. Moreover, it is preferable to inject | pour into a disperser in the state whose temperature of a silica slurry is 20 degrees C or less, Furthermore, 15 degrees C or less. This provides a more stable dispersion.

予備混合は、通常のプロペラ撹拌、タービン型撹拌、ホモミキサー型撹拌、超音波撹拌等で行うことができる。   The preliminary mixing can be performed by ordinary propeller stirring, turbine stirring, homomixer stirring, ultrasonic stirring, or the like.

本発明の分散液の製造方法によって、シリカ濃度が15質量%の高濃度の分散液が安定して製造できる。特に18質量%以上の高濃度に好適である。   By the method for producing a dispersion liquid of the present invention, a high-concentration dispersion liquid having a silica concentration of 15% by mass can be produced stably. It is particularly suitable for a high concentration of 18% by mass or more.

また、分散液中のシリカ濃度をより高濃度にするために、段階的にシリカ微粒子を添加する方法を採用することができる。   Further, in order to make the silica concentration in the dispersion higher, a method of adding silica fine particles stepwise can be employed.

本発明のシリカ分散液は、前述したように各種用途に適用できるが、特にインクジェット記録用シートのインク受容層を構成するシリカ微粒子として用いるのに適している。   The silica dispersion of the present invention can be applied to various uses as described above, and is particularly suitable for use as silica fine particles constituting the ink receiving layer of an ink jet recording sheet.

次のようにして、シリカ分散液を作製した。尚、部とは質量部を表す。   A silica dispersion was prepared as follows. In addition, a part represents a mass part.

実施例1
<分散液処方>
水 430部
変性エタノール 22部
ポリジアリルアミン誘導体のカチオンポリマー 3部
(ジメチルジアリルアンモニウムクロライドホモポリマー
第一工業製薬(株)製、シャロールDC902P、平均分子量9000)
気相法シリカ 100部
(平均1次粒径7nm、BET法による比表面積300m2/g)
Example 1
<Dispersion formulation>
Water 430 parts Modified ethanol 22 parts Polydiallylamine derivative cationic polymer 3 parts (Dimethyldiallylammonium chloride homopolymer, manufactured by Daiichi Kogyo Seiyaku Co., Ltd., Charol DC902P, average molecular weight 9000)
100 parts of fumed silica (average primary particle diameter 7 nm, specific surface area by the BET method: 300m 2 / g)

分散媒の水と変性エタノールの中にカチオンポリマーを添加し、次いで気相法シリカを添加し予備混合してシリカスラリーを作製した。次にこのシリカスラリーを高圧ホモジナイザーで1回処理して、シリカ濃度が約18質量%のシリカ分散液を作製した。   A cationic polymer was added to water and denatured ethanol as a dispersion medium, and then vapor phase silica was added and premixed to prepare a silica slurry. Next, this silica slurry was treated once with a high-pressure homogenizer to prepare a silica dispersion having a silica concentration of about 18% by mass.

実施例2
実施例1の分散液処方のポリジアリルアミン誘導体のカチオンポリマーに代えて、下記化5(平均分子量1万)のカチオンポリマーを用いる以外は同様にしてシリカ分散液を作製した。
Example 2
A silica dispersion was prepared in the same manner except that a cationic polymer of the following chemical formula 5 (average molecular weight 10,000) was used instead of the cationic polymer of the polydiallylamine derivative in the dispersion formulation of Example 1.

Figure 2007197316
Figure 2007197316

比較例1
上記実施例1の分散液処方からカチオンポリマーを除いた以外は同様にしてシリカ分散液を作製した。
Comparative Example 1
A silica dispersion was prepared in the same manner except that the cationic polymer was removed from the dispersion formulation of Example 1 above.

上記実施例1、2及び比較例1の分散液を保存経時し、凝集状態及び沈降状態を観察した。その結果、実施例1は2ヶ月でも凝集沈降は起こらず、実施例2は1ヶ月で僅かに凝集沈降があり、比較例1は6日間で凝集沈降を起こしていた。   The dispersions of Examples 1 and 2 and Comparative Example 1 were stored over time, and the aggregation state and the sedimentation state were observed. As a result, Example 1 did not cause aggregation / sedimentation even in 2 months, Example 2 showed slight aggregation / sedation in 1 month, and Comparative Example 1 caused aggregation / sedimentation in 6 days.

Claims (3)

シリカ微粒子を分散媒中に分散したシリカ分散液の製造方法において、該シリカ微粒子が平均1次粒径が3〜15nmの気相法シリカであり、水を主体とし平均分子量5万以下のカチオンポリマーを添加した分散媒にシリカ微粒子を添加、混合してシリカスラリーを作製した後、該シリカスラリーを分散機で分散することを特徴とするシリカ分散液の製造方法。   In the method for producing a silica dispersion in which silica fine particles are dispersed in a dispersion medium, the silica fine particles are gas phase method silica having an average primary particle size of 3 to 15 nm, and mainly composed of water and a cationic polymer having an average molecular weight of 50,000 or less. A method for producing a silica dispersion, comprising: adding and mixing silica fine particles to a dispersion medium to which silica is added to produce a silica slurry, and then dispersing the silica slurry with a disperser. 前記シリカ分散液のシリカ濃度が18質量%以上である請求項1に記載のシリカ分散液の製造方法。   The method for producing a silica dispersion according to claim 1, wherein the silica concentration of the silica dispersion is 18% by mass or more. 前記カチオンポリマーがポリジアリルアミン誘導体の構成単位を有するカチオンポリマーである請求項1または2に記載のシリカ分散液の製造方法。   The method for producing a silica dispersion according to claim 1 or 2, wherein the cationic polymer is a cationic polymer having a structural unit of a polydiallylamine derivative.
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JPH02188287A (en) * 1989-01-18 1990-07-24 Jujo Paper Co Ltd Sheet for ink jet recording
JPH10217601A (en) * 1997-02-06 1998-08-18 Konica Corp Ink jet recording paper, and ink jet recording method
JPH1120306A (en) * 1997-07-01 1999-01-26 Konica Corp Ink jet recording paper, and ink jet recording method
JPH11321079A (en) * 1998-05-19 1999-11-24 Konica Corp Cationic composite fine particle dispersion solution, manufacture of the same, and ink jet recording paper

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02188287A (en) * 1989-01-18 1990-07-24 Jujo Paper Co Ltd Sheet for ink jet recording
JPH10217601A (en) * 1997-02-06 1998-08-18 Konica Corp Ink jet recording paper, and ink jet recording method
JPH1120306A (en) * 1997-07-01 1999-01-26 Konica Corp Ink jet recording paper, and ink jet recording method
JPH11321079A (en) * 1998-05-19 1999-11-24 Konica Corp Cationic composite fine particle dispersion solution, manufacture of the same, and ink jet recording paper

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