JP2007176037A - Transfer device and transfer method - Google Patents

Transfer device and transfer method Download PDF

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JP2007176037A
JP2007176037A JP2005377900A JP2005377900A JP2007176037A JP 2007176037 A JP2007176037 A JP 2007176037A JP 2005377900 A JP2005377900 A JP 2005377900A JP 2005377900 A JP2005377900 A JP 2005377900A JP 2007176037 A JP2007176037 A JP 2007176037A
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substrate
mold
transfer
substrates
pattern
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Mitsunori Kokubo
光典 小久保
Haruyuki Matsubayashi
治幸 松林
Toshinao Kamano
利尚 鎌野
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Shibaura Machine Co Ltd
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Toshiba Machine Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a transfer device which transfers the fine pattern provided to a mold to a substrate and performs accurate transfer in a shorter time than before. <P>SOLUTION: The transfer device 1 has a first member 3, a second member 5 relatively freely moved in the direction approaching and separating with respect to the first member 3, the substrate/mold installation part 6 provided between the first and second members 3 and 5 and capable of installing a plurality of substrates 7 and a plurality of molds 9 for transferring fine patterns to the respective substrates 7 and a drive means for relatively moving the second member 5 to the first member 3 to press the respective substrates W and respective molds M installed on the substrate/mold installation part 6. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、転写装置および転写方法に係り、特に、型の表面に形成された微細な転写パターンを基板の表面に転写するものに関する。   The present invention relates to a transfer apparatus and a transfer method, and more particularly to a transfer device that transfers a fine transfer pattern formed on the surface of a mold onto the surface of a substrate.

近年、電子線描画法などで石英基板等に超微細な転写パターンを形成して型(テンプレート、スタンパ)を作製し、被成形品(基板)として被転写基板表面に形成されたレジスト膜に前記型を所定の圧力で押圧して、当該型に形成されたパターンを転写するナノインプリント技術が研究開発されている(非特許文献1参照)。   In recent years, a mold (template, stamper) is formed by forming an ultrafine transfer pattern on a quartz substrate or the like by an electron beam drawing method, and the resist film formed on the surface of the transfer substrate as a molded product (substrate) Research and development has been conducted on nanoimprint technology for pressing a mold with a predetermined pressure to transfer a pattern formed on the mold (see Non-Patent Document 1).

また、前記ナノインプリントを実行するための装置としてたとえば特許文献1に記載の転写装置100が知られている(図7、図8参照)。この転写装置100は、L字型のフレーム102の下部水平部にXステージ106、Yステージ108を設けてその上に被成形品(基板W)の支持部である基板テーブル104を搭載し、フレーム102の垂直部の上部に上下方向の移動機構112を介して型支持部(型保持体)110を設けている。型保持体110は、転写用の微細なパターンを形成されている型Mを保持するものである。   Moreover, as an apparatus for performing the nanoimprint, for example, a transfer apparatus 100 described in Patent Document 1 is known (see FIGS. 7 and 8). This transfer apparatus 100 is provided with an X stage 106 and a Y stage 108 on a lower horizontal portion of an L-shaped frame 102, and a substrate table 104, which is a support for a product (substrate W), is mounted on the X stage 106 and the Y stage 108. A mold support part (mold holding body) 110 is provided on the upper part of the vertical part 102 via a vertical movement mechanism 112. The mold holder 110 holds the mold M on which a fine pattern for transfer is formed.

そして、図7に示す状態から基板テーブル104を、Xステージ106、Yステージ108を用いてX軸方向Y軸方向で適宜位置決めし、型保持体110を下降し型Mで基板Wを押圧することで、基板Wへの微細なパターンの転写を行うようになっている。
特開2004−34300号公報 Precision Engineering Journal of the International Societies for Precision Engineering and Nanotechnology
Then, the substrate table 104 is appropriately positioned in the X-axis direction and the Y-axis direction using the X stage 106 and the Y stage 108 from the state shown in FIG. 7, the mold holder 110 is lowered, and the substrate W is pressed by the mold M. Thus, a fine pattern is transferred to the substrate W.
JP 2004-34300 A Precision Engineering Journal of the International Societies for Precision Engineering and Nanotechnology

ところで、従来の転写装置100では、基板WをX軸方向Y軸方向で適宜位置決めし、1枚の基板Wの複数箇所に転写を行うようになっている。そして、これらの転写後に基板Wを100から取り外し、基板Wを適宜切り離して1枚の基板Wから複数枚の製品または半製品を得ることができるようになっている。   Incidentally, in the conventional transfer apparatus 100, the substrate W is appropriately positioned in the X-axis direction and the Y-axis direction, and transfer is performed to a plurality of locations on one substrate W. Then, after the transfer, the substrate W is removed from the substrate 100, and the substrate W is appropriately separated so that a plurality of products or semi-finished products can be obtained from one substrate W.

また、転写装置100では、Xステージ106、Yステージ108で、基板テーブル104が支持されているのであるが、基板WをX軸方向やY軸方向に移動位置決めすることにより、基板テーブル104の前記支持部と、型Mから押圧力を受ける基板テーブル104の部位との位置関係が変化し、押圧動作毎に基板テーブル104に発生するモーメントが変化し基板テーブル104の変形量がごく僅かに異なり、基板Wへの転写が正確にできないおそれがあるという問題がある。   In the transfer apparatus 100, the substrate table 104 is supported by the X stage 106 and the Y stage 108. By moving and positioning the substrate W in the X-axis direction and the Y-axis direction, the substrate table 104 is moved. The positional relationship between the support portion and the portion of the substrate table 104 that receives the pressing force from the mold M changes, the moment generated in the substrate table 104 changes with each pressing operation, and the deformation amount of the substrate table 104 is slightly different, There is a problem that the transfer to the substrate W may not be performed accurately.

また、転写装置100では、押圧動作毎に基板Wに設けられている被成形層(型の転写パターンと接触している層)を硬化させる必要があると共に、各押圧動作の前後に、Xステージ106、Yステージ108で、基板テーブル104を移動位置決めする必要があるので、基板Wへの転写を迅速に行うことが困難であるという問題がある。   In addition, in the transfer device 100, it is necessary to cure the molding layer (layer in contact with the transfer pattern of the mold) provided on the substrate W for each pressing operation, and before and after each pressing operation, the X stage Since the substrate table 104 needs to be moved and positioned by the 106 and the Y stage 108, there is a problem that it is difficult to perform the transfer to the substrate W quickly.

本発明は、前記問題点に鑑みてなされたものであり、型に設けられている微細なパターンを基板に転写する転写装置および転写方法において、従来よりも短時間で正確な転写を行うことが可能な転写装置および転写方法を提供することを目的とする。   The present invention has been made in view of the above problems, and in a transfer apparatus and transfer method for transferring a fine pattern provided on a mold to a substrate, accurate transfer can be performed in a shorter time than before. It is an object of the present invention to provide a transfer device and a transfer method that can be used.

請求項1に記載の発明は、第1の部材と、前記第1の部材に対して接近・離反する方向に相対的に移動自在な第2の部材と、前記第1の部材と前記第2の部材との間に設けられ、複数枚の基板と、前記各基板に微細なパターンを転写するための複数の型とを重ねて設置することが可能な基板・型設置部と、前記第1の部材に対して前記第2の部材を相対的に移動し、前記基板・型設置部に設置された前記各基板と前記各型とを押圧する駆動手段とを有する転写装置である。   According to the first aspect of the present invention, the first member, the second member relatively movable in the direction approaching / separating from the first member, the first member, and the second member are provided. A substrate / mould placement unit that is provided between the first member and the first member, and is capable of placing a plurality of substrates and a plurality of dies for transferring a fine pattern on each substrate, And a drive unit that moves the second member relative to the member to press the substrates and the molds installed in the substrate / mold installation unit.

請求項2に記載の発明は、請求項1に記載の転写装置において、前記基板・型設置部に設置される前記基板の位置と前記型との位置が正しい位置になるようにガイドするガイド部材を有する転写装置である。   According to a second aspect of the present invention, in the transfer apparatus according to the first aspect, the guide member that guides the position of the substrate and the position of the mold that are installed in the substrate / mold installation unit to be a correct position. Is a transfer device.

請求項3に記載の発明は、微細な転写パターンが形成されている型で基板を押圧することにより、前記転写パターンを前記基板に転写する転写方法において、複数枚の基板と、前記各基板に微細なパターンを転写するための複数の型とを重ね、この重ねた方向から押圧して、前記各基板に転写を行う転写方法である。   According to a third aspect of the present invention, there is provided a transfer method in which the transfer pattern is transferred to the substrate by pressing the substrate with a mold in which a fine transfer pattern is formed. This is a transfer method in which a plurality of molds for transferring a fine pattern are stacked and pressed from the stacked direction to transfer to each of the substrates.

請求項4に記載の発明は、請求項3に記載の転写方法において、前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、前記押圧は、前記各型と前記各基板とがこれらの厚さ方向で交互に重ね合わされた状態でなされる転写方法である。   According to a fourth aspect of the present invention, in the transfer method according to the third aspect, the substrate is formed in a flat plate shape, the mold is formed in a flat plate shape, and a fine transfer pattern is formed on one surface. The pressing is a transfer method that is performed in a state in which the molds and the substrates are alternately stacked in the thickness direction.

請求項5に記載の発明は、請求項3に記載の転写方法において、前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、前記押圧は、前記型と前記基板と平面型とがこの順でしかもこれらの厚さ方向で複数回重ね合わされた状態でなされる転写方法である。   According to a fifth aspect of the present invention, in the transfer method according to the third aspect, the substrate is formed in a flat plate shape, the mold is formed in a flat plate shape, and a fine transfer pattern is formed on one surface. The pressing is a transfer method in which the mold, the substrate, and the planar mold are overlapped in this order and a plurality of times in the thickness direction.

請求項6に記載の発明は、請求項3に記載の転写方法において、前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、前記押圧は、前記基板の両面に転写をすべく、1枚の第1の前記型と1枚の前記基板と1枚の第2の前記型とが、この順でしかもこれらの厚さ方向で、複数回重ね合わされた状態でなされる転写方法である。   The invention according to claim 6 is the transfer method according to claim 3, wherein the substrate is formed in a flat plate shape, the mold is formed in a flat plate shape, and a fine transfer pattern is formed on one surface. In order to transfer the pressure onto both sides of the substrate, the first mold, the substrate, and the second mold are arranged in this order. The transfer method is performed in a state of being overlaid a plurality of times in the thickness direction.

請求項7に記載の発明は、請求項3に記載の転写方法において、前記基板、前記型は平板状に形成されており、前記押圧は、前記各型と前記各基板とがこれらの厚さ方向で交互に重ね合わされた状態でなされると共に、前記基板の間に位置している前記型は、両方の面に微細な転写パターンが形成されている転写方法である。   A seventh aspect of the present invention is the transfer method according to the third aspect, wherein the substrate and the mold are formed in a flat plate shape, and the pressure is applied to the respective molds and the respective substrates. The mold is formed in a state where the patterns are alternately overlapped with each other, and the mold located between the substrates is a transfer method in which fine transfer patterns are formed on both surfaces.

請求項8に記載の発明は、請求項3に記載の転写方法において、前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、前記押圧は、基板の両面に転写をすべく、1枚の第1の前記型と1枚の前記基板と1枚の第2の前記型とが、この順でしかもこれらの厚さ方向で複数回重ねられると共に、前記基板が存在していない前記型の間には、平面型が設けられている状態でなされる転写方法である。   The invention according to claim 8 is the transfer method according to claim 3, wherein the substrate is formed in a flat plate shape, the mold is formed in a flat plate shape, and a fine transfer pattern is formed on one surface. In order to transfer the pressure onto both sides of the substrate, the first mold, the substrate, and the second mold are arranged in this order, The transfer method is performed in a state where a planar mold is provided between the molds which are stacked a plurality of times in the thickness direction and where the substrate does not exist.

この発明によれば、型に設けられている微細なパターンを基板に転写する転写装置および転写方法において、従来よりも短時間で正確な転写を行うことができるという効果を奏する。   According to the present invention, in the transfer apparatus and transfer method for transferring a fine pattern provided on a mold to a substrate, there is an effect that accurate transfer can be performed in a shorter time than before.

[第1の実施形態]
図1は、本発明の第1の実施形態に係る転写装置1に基板7と型9とを設置した状態を示す図である。
[First Embodiment]
FIG. 1 is a diagram showing a state in which a substrate 7 and a mold 9 are installed in a transfer apparatus 1 according to the first embodiment of the present invention.

なお、本件明細書においては、説明の便宜のために、水平方向の一方向をX軸方向とし、水平方向の他の一方向であって前記X軸方向に垂直な方向をY軸方向とし、鉛直方向をZ軸方向とする。   In the present specification, for convenience of explanation, one horizontal direction is defined as the X-axis direction, the other horizontal direction and the direction perpendicular to the X-axis direction is defined as the Y-axis direction, The vertical direction is the Z-axis direction.

図1(a)は、理解を容易にするために基板7と型9とを離して描いた図であり、図1(b)は、転写装置1が実際に使用される状態を描いた図である。   FIG. 1A is a diagram depicting the substrate 7 and the mold 9 separated for easy understanding, and FIG. 1B is a diagram depicting a state in which the transfer apparatus 1 is actually used. It is.

転写装置1は、従来の転写装置100と同様に、型Mの表面に形成された微細なパターン(たとえば凹凸パターン)を基板Wの表面に転写する装置であり、基板テーブル104に相当する下側部材(第1の部材)3と、上側部材(第2の部材)5とを備えている。   The transfer device 1 is a device for transferring a fine pattern (for example, a concavo-convex pattern) formed on the surface of the mold M onto the surface of the substrate W, like the conventional transfer device 100, and is a lower side corresponding to the substrate table 104. A member (first member) 3 and an upper member (second member) 5 are provided.

下側部材3の上面には、X軸方向およびY軸方向(水平方向)に展伸した平面状の部位が形成されている。また、下側部材3の上方には、上側部材5が設けられており、この上側部材5の下面には、X軸方向およびY軸方向に展伸した平面状の部位が形成されている。下側部材3の平面状部位と上側部材5の平面状部位とは互いに対向し互いが平行になっている。   On the upper surface of the lower member 3, a planar portion extending in the X-axis direction and the Y-axis direction (horizontal direction) is formed. An upper member 5 is provided above the lower member 3, and a planar portion extending in the X-axis direction and the Y-axis direction is formed on the lower surface of the upper member 5. The planar portion of the lower member 3 and the planar portion of the upper member 5 face each other and are parallel to each other.

また、上側部材5は、下側部材3に対して接近・離反する方向(基板テーブル104の上面に直交する方向;Z軸方向)に相対的に移動自在になっている。   The upper member 5 is relatively movable in a direction approaching / separating from the lower member 3 (a direction perpendicular to the upper surface of the substrate table 104; the Z-axis direction).

たとえば、下側部材3は、転写装置1のフレーム(図示せず;「L」字状以外の形態であってもよい)に一体的に設けられているが(少なくともZ軸方向においては移動できないようになっているが)、上側部材5は、図示しないリニアガイドベアリング等を介して転写装置1のフレームに対して、Z軸方向に移動自在になっている。しかしながら、転写装置1のフレームに上側部材5が固定されておりフレームに対して下側部材3がZ軸方向に移動するように構成されていてもよいし、さらには、転写装置1のフレームに対して、上側部材5と下側部材3との両方が移動するように構成されていてもよい。すなわち、転写装置1のフレームに対して、上側部材5、下側部材の少なくともいずれか一方がZ軸方向で移動するように構成されていればよい。   For example, the lower member 3 is integrally provided on a frame (not shown; may be in a form other than an “L” shape) of the transfer device 1 (at least in the Z-axis direction cannot be moved). However, the upper member 5 is movable in the Z-axis direction with respect to the frame of the transfer apparatus 1 via a linear guide bearing or the like (not shown). However, the upper member 5 may be fixed to the frame of the transfer device 1, and the lower member 3 may be configured to move in the Z-axis direction with respect to the frame. On the other hand, you may be comprised so that both the upper side member 5 and the lower side member 3 may move. That is, it is only necessary that at least one of the upper member 5 and the lower member moves in the Z-axis direction with respect to the frame of the transfer device 1.

図1に示す転写装置1では、下側部材3が下方に位置し上側部材5が上方に位置しているが、上側部材5や下側部材3の移動方向が水平方向や斜め方向になるように、上側部材5や下側部材3を配置してもよい。   In the transfer device 1 shown in FIG. 1, the lower member 3 is positioned downward and the upper member 5 is positioned upward. However, the moving direction of the upper member 5 and the lower member 3 is horizontal or oblique. Alternatively, the upper member 5 and the lower member 3 may be disposed.

また、転写装置1には、下側部材3に対して上側部材5を相対的に移動するための駆動手段(図示せず)と硬化手段(図示せず)とが設けられている。前記駆動手段は、サーボモータ等のアクチュエータを用いて、たとえば、上側部材5をZ軸方向に移動するものである。前記硬化手段は、型の転写パターンを基板に転写すべく前記駆動手段によって型9が基板7に押し付けられたとき(押圧されたとき)に、基板7の面に設けられている被成形層を硬化させるためのものであり、被成形層が熱硬化性樹脂で構成されている場合には、前記被成形層を加熱し、被成形層がUV硬化樹脂で構成されている場合には、前記被成形層に紫外線を照射するものである。   Further, the transfer device 1 is provided with a driving means (not shown) and a curing means (not shown) for moving the upper member 5 relative to the lower member 3. For example, the driving means moves the upper member 5 in the Z-axis direction using an actuator such as a servomotor. The curing means removes the molding layer provided on the surface of the substrate 7 when the mold 9 is pressed against the substrate 7 by the driving means so as to transfer the transfer pattern of the mold to the substrate. When the layer to be molded is made of a thermosetting resin, the layer to be molded is heated, and when the layer to be molded is made of a UV curable resin, The layer to be molded is irradiated with ultraviolet rays.

下側部材3と上側部材5との間には、基板・型設置部6が形成されている。この基板・型設置部6には、被成形材料である平板状の複数枚の基板(平板状の基材の表面に被成形層が設けられている複数枚の基板)7と、各基板7に微細なパターンを転写するための複数の型9とを(たとえば交互に)重ねて設置することができるようになっている。   Between the lower member 3 and the upper member 5, a substrate / die installation portion 6 is formed. The substrate / die setting unit 6 includes a plurality of flat-plate substrates (a plurality of substrates in which a molding layer is provided on the surface of a flat-plate base material) 7, and each substrate 7. A plurality of molds 9 for transferring a fine pattern can be placed in an overlapping manner (for example, alternately).

基板7や型9は、矩形な薄い板状に形成されており、基板7の一方の表面には、前記型9の一方の面に形成されている微細な転写パターンが転写される部位である被成形層(たとえばUV硬化樹脂または熱硬化樹脂で構成された被成形層)が設けられている。   The substrate 7 and the mold 9 are formed in a rectangular thin plate shape, and one surface of the substrate 7 is a portion to which a fine transfer pattern formed on one surface of the mold 9 is transferred. A molding layer (for example, a molding layer made of a UV curable resin or a thermosetting resin) is provided.

基板・型設置部6に基板7型9が設置された状態では、図1(b)に示すように、最も下に位置している型9の下面(転写パターンが形成されていない面)の全面が下側部材3の上面に接触し、最も下に位置している型9の上面(転写パターンが形成されている面)の面が、最も下に位置している基板7の下面(被成形層が形成されている面)の面に接触し、同様にして、型9と基板7とがこの厚さ方向で交互に積み重ねられている。また、最も上に位置している基板7は、上側部材5から離れている。   In the state where the substrate 7 mold 9 is installed on the substrate / mold installation unit 6, as shown in FIG. 1B, the lower surface of the mold 9 located on the bottom (the surface on which the transfer pattern is not formed). The entire surface is in contact with the upper surface of the lower member 3, and the uppermost surface of the mold 9 (the surface on which the transfer pattern is formed) is located on the lower surface of the lower substrate 7 (covered surface). Similarly, the mold 9 and the substrate 7 are alternately stacked in this thickness direction. Further, the uppermost substrate 7 is separated from the upper member 5.

このように、基板・型設置部6に基板7と型9とが設置された状態で上側部材5を下降し、上側部材3のして面を最も上の基板7に接触させ、基板7と型9とを押圧すると共に、基板7の被形成層を硬化することにより、基板7の一方の面に転写が行われるようになっている。   In this way, the upper member 5 is lowered while the substrate 7 and the mold 9 are installed on the substrate / die installation portion 6, and the upper member 3 is brought into contact with the uppermost substrate 7. While pressing the mold 9 and curing the formation layer of the substrate 7, transfer is performed on one surface of the substrate 7.

なお、図2に示すように、型11の上面の転写パターンが、中央部で下側に凹んでいる形状である場合もある。   In addition, as shown in FIG. 2, the transfer pattern on the upper surface of the mold 11 may have a shape that is recessed downward at the center.

また、図3に示すように、厚さ方向の両面が平面である矩形な板状の平面型13を用いて転写を行ってもよい。   Further, as shown in FIG. 3, the transfer may be performed using a rectangular plate-shaped flat mold 13 whose both surfaces in the thickness direction are flat.

すなわち、基板・型設置部6に、1枚の型9と1枚の基板7と1枚の平面型13とを、この順でしかもこれらの厚さ方向で複数回重ねて転写を行うようにしてもよい。なお、図3の最も下に存在している平面型13や最も上に存在している平面型13は、削除されていてもよい。   That is, one mold 9, one substrate 7, and one planar mold 13 are transferred onto the substrate / mold setting unit 6 in this order and multiple times in the thickness direction. May be. It should be noted that the lowermost planar mold 13 and the uppermost planar mold 13 in FIG. 3 may be deleted.

このように、平面型13を使用することで、型9の裏側の面(転写パターンが形成されている面とは反対側の面)の面粗度が粗くても、転写への影響がなく、型9の製造が容易になる。   In this way, by using the flat mold 13, even if the surface roughness of the back side of the mold 9 (the surface opposite to the surface on which the transfer pattern is formed) is rough, there is no influence on the transfer. The manufacture of the mold 9 becomes easy.

また、図4(a)に示すように、基板7の両面に型9を配置し、基板7の両面に同時に転写を行うようにしてもよい。   Further, as shown in FIG. 4A, the mold 9 may be disposed on both surfaces of the substrate 7 so that the transfer is performed on both surfaces of the substrate 7 simultaneously.

すなわち、基板・型設置部6に、1枚の型9と1枚の基板(両面に被形成層が形成されている基板)7と1枚の型9とを、この順でしかもこれらの厚さ方向で複数回重ねて、転写を行うようにしてもよい。   That is, one mold 9, one substrate (a substrate on which both layers are formed) 7, and one mold 9 are arranged in this order on the substrate / mold setting unit 6, and in this order. The transfer may be performed by overlapping a plurality of times in the vertical direction.

また、図4(b)に示すように、両面に転写パターンが形成されている型15と、基板7とを交互に配置し、基板7の両面に同時に転写を行うようにしてもよい。なお、図4(b)で最も上側に位置している型9や最も下側に位置している型9は、基板7に接する面にのみ転写パターンが形成されているものとする。   Further, as shown in FIG. 4B, the molds 15 on which the transfer patterns are formed on both surfaces and the substrate 7 may be alternately arranged so that the transfer is performed on both surfaces of the substrate 7 simultaneously. In FIG. 4B, the uppermost mold 9 and the lowermost mold 9 have a transfer pattern formed only on the surface in contact with the substrate 7.

さらに、図5に示すように、基板7の両面に型9を配置すると共に各型9の間に平面型13を配置して、基板7の両面に同時に転写を行うようにしてもよい。なお、図3の最も下に存在している平面型13や図3の最も上に存在している平面型13は、削除されてもよい。   Further, as shown in FIG. 5, the mold 9 may be disposed on both surfaces of the substrate 7, and the planar mold 13 may be disposed between the respective molds 9, and the transfer may be simultaneously performed on both surfaces of the substrate 7. Note that the planar mold 13 present at the bottom of FIG. 3 and the planar mold 13 present at the top of FIG. 3 may be deleted.

次に、転写装置1の動作について説明する。   Next, the operation of the transfer device 1 will be described.

まず、図1(b)に示すように、下側部材3と上側部材5とが互いに離反している状態で、基板・型設置部6に、型9や基板7を重ねて設置する(下側部材3に型9や基板7を重ねて載置する)。この設置はオペレータが手作業で行ってもよいし、ロボット等を用いて自動的に行ってもよい。   First, as shown in FIG. 1B, in a state where the lower member 3 and the upper member 5 are separated from each other, the die 9 and the substrate 7 are placed on the substrate / die placement portion 6 in a stacked manner (lower) The mold 9 and the substrate 7 are stacked on the side member 3). This installation may be performed manually by an operator or automatically using a robot or the like.

この状態で、図示しない制御装置の制御の下、上側部材5を下降して、型9と基板7とを押圧しつつ、基板7の被成形層を硬化させる。硬化が終わったら、上側部材5を上昇し基板7への転写を終了する。続いて、基板7等を転写装置1から取り外し、次の基板7への転写を行う。   In this state, under the control of a control device (not shown), the upper member 5 is lowered, and the mold layer of the substrate 7 is cured while pressing the mold 9 and the substrate 7. When the curing is finished, the upper member 5 is raised and the transfer to the substrate 7 is finished. Subsequently, the substrate 7 and the like are removed from the transfer device 1 and transferred to the next substrate 7.

なお、前記転写をする際、基板・型設置部6に、図1〜図5を用いて説明したように、基板や型や必要に応じて平面型を設置し、転写を行えばよい。   In addition, when performing the transfer, as described with reference to FIGS. 1 to 5, a substrate, a mold, and a flat mold as necessary may be installed on the substrate / mold setting unit 6.

転写装置1によれば、図1等に示すように、複数枚の基板7とこの各基板7に微細なパターンを転写するための複数の型9とを重ねて設置して転写を行うので、各基板7にかかる押圧力が均一になり、正確な転写を行うことができる。   According to the transfer device 1, as shown in FIG. 1 and the like, a plurality of substrates 7 and a plurality of molds 9 for transferring a fine pattern are placed on each of the substrates 7 so as to perform transfer. The pressing force applied to each substrate 7 becomes uniform, and accurate transfer can be performed.

また、複数枚の基板7と複数の型9とを、転写装置1の外部で重ねておいてこの重ねたものを転写装置1に設置し、型9で押圧し基板7の被成形層を硬化すれば、各基板7の位置決め、押圧、被成形層の硬化を1回(1サイクル)の動作で行うことができ、従来よりも短時間で転写を行うことができる。   In addition, a plurality of substrates 7 and a plurality of molds 9 are stacked outside the transfer device 1, and the stacked products are placed in the transfer device 1 and pressed by the mold 9 to cure the molding layer of the substrate 7. In this case, positioning, pressing, and curing of the substrate 7 can be performed once (one cycle), and transfer can be performed in a shorter time than conventional.

[第2の実施形態]
図5は、本発明の第2の実施形態に係る転写装置1aの概略構成を示す図である。
[Second Embodiment]
FIG. 5 is a diagram showing a schematic configuration of a transfer apparatus 1a according to the second embodiment of the present invention.

第2の実施形態に係る転写装置1aは、ガイド部材17を設けてある点が、第1の実施形態に係る転写装置1とは異なり、その他の点は、第1の実施形態に係る転写装置1と同様に構成されほぼ同様の効果を奏する。   The transfer device 1a according to the second embodiment is different from the transfer device 1 according to the first embodiment in that a guide member 17 is provided. Other points are the transfer device according to the first embodiment. It is comprised like 1 and there exists an almost the same effect.

すなわち、転写装置1aは、基板・型設置部6に設置される基板7aと型9aとの位置が正しい位置になるようにガイドするガイド部材17を備えている。   That is, the transfer device 1 a includes a guide member 17 that guides the substrate 7 a and the mold 9 a installed in the substrate / mold installation unit 6 so that the positions thereof are in the correct positions.

基板7aは、たとえばCD−ROMやDVD−ROMとして使用されるものであり、基板7aや型9aは、中心部に円形の貫通孔を備えた円板状に形成されている。   The substrate 7a is used as, for example, a CD-ROM or a DVD-ROM, and the substrate 7a and the mold 9a are formed in a disc shape having a circular through hole at the center.

下側部材3aの円形の上面の中央部には、円柱状のガイド部材17が、この軸が上下方向に延伸して立設されている。ガイド部材17の外径は、基板7aや型9aの貫通孔の内径と等しいかごく僅かに小さくなっている。   A columnar guide member 17 is erected at the center of the circular upper surface of the lower member 3a with its axis extending in the vertical direction. The outer diameter of the guide member 17 is slightly smaller than the inner diameter of the through holes of the substrate 7a and the mold 9a.

そして、基板・型設置部6に基板7aと型9aとを設置する際、基板7aや型9aの貫通孔にガイド部材17が挿入されるようにすれば、基板7aと型9aとが正しい位置に設置されるようになっている。   Then, when the substrate 7a and the mold 9a are installed on the substrate / mold installation unit 6, if the guide member 17 is inserted into the through hole of the substrate 7a or the mold 9a, the substrate 7a and the mold 9a are correctly positioned. It is supposed to be installed in.

なお、基板7aと型9aとを複数枚重ねて設置したときの高さよりも、ガイド部材17の高さのほうが高いので、上側部材5aを下降して積層された基板7aや型9aを押圧すると、ガイド部材17の上端が上側部材5aの下面と干渉する。この干渉を回避するために、上側部材5aの円形状の下面の中央部に凹部19を設けてある。   In addition, since the height of the guide member 17 is higher than the height when a plurality of the substrates 7a and the molds 9a are stacked, when the upper substrate 5a is lowered and the stacked substrates 7a and the molds 9a are pressed. The upper end of the guide member 17 interferes with the lower surface of the upper member 5a. In order to avoid this interference, a recess 19 is provided in the center of the circular lower surface of the upper member 5a.

転写装置1aによれば、ガイド部材17を有しているので、各基板7aや各型9aを転写装置1aの正確な位置に設置することが容易になり、一層正確な転写を容易に行うことができる。   According to the transfer device 1a, since the guide member 17 is provided, it is easy to install the substrates 7a and the molds 9a at the correct positions of the transfer device 1a, and to perform more accurate transfer easily. Can do.

ところで、下側部材3aを図6に破線で示す箇所で分割し、部材23とガイド部材17とを一体的に形成すると共に、この一体的に形成された部材23とガイド部材17(冶具)を、部材21に対して着脱自在に構成してもよい。なお、前記冶具を部材21に設置する場合、図示しない位置決めピン等の位置決め手段によって、部材21の正確な位置に前記冶具を設置することができるようになっているものとする。   By the way, the lower member 3a is divided at a position indicated by a broken line in FIG. 6, and the member 23 and the guide member 17 are integrally formed, and the integrally formed member 23 and the guide member 17 (tool) are formed. The member 21 may be detachable. In addition, when installing the said jig in the member 21, it shall be able to install the said jig in the exact position of the member 21 by positioning means, such as a positioning pin which is not shown in figure.

前記冶具を複数個用意すれば、1つの冶具を転写装置1aに設置し積層された各基板7aや各型9aを押圧し転写を行っているときに、転写装置1aに設置されていない別の冶具に、各基板7aや各型9aを設置することができるので、転写装置1aの稼働率を向上させることができる。   If a plurality of jigs are prepared, one jig is placed on the transfer device 1a, and when the substrates 7a and the molds 9a stacked are pressed to perform transfer, another jig not installed on the transfer device 1a is used. Since each board | substrate 7a and each type | mold 9a can be installed in a jig, the operation rate of the transfer apparatus 1a can be improved.

なお、転写装置1aでは、基板7aや型9aの中央部で、基板7aや型9aをガイドし位置決めしているが、基板7aや型9aの周辺で基板7aや型9aをガイドし位置決めするようにしてもよい。   In the transfer device 1a, the substrate 7a and the mold 9a are guided and positioned at the center of the substrate 7a and the mold 9a. However, the substrate 7a and the mold 9a are guided and positioned around the substrate 7a and the mold 9a. It may be.

本発明の第1の実施形態に係る転写装置に基板と型とを設置した状態を示す図である。It is a figure which shows the state which installed the board | substrate and the type | mold in the transfer apparatus which concerns on the 1st Embodiment of this invention. 中央部が凹状になった転写パターンを有する型を、転写装置に設置した状態を示す図である。It is a figure which shows the state which installed the type | mold which has the transfer pattern in which the center part became concave shape in the transfer apparatus. 転写装置に基板と型と平面型とを設置した状態を示す図である。It is a figure which shows the state which installed the board | substrate, the type | mold, and the plane type | mold in the transfer apparatus. 転写装置に基板とこの基板の両面に転写行うような型とを設置した状態を示す図である。It is a figure which shows the state which installed the board | substrate and the type | mold which transfers to both surfaces of this board | substrate in the transfer apparatus. 転写装置に基板と平面型と前記基板の両面に転写行うような型とを設置した状態を示す図である。It is a figure which shows the state which installed the board | substrate, a plane type | mold, and the type | mold which transfers to both surfaces of the said board | substrate in the transfer apparatus. 本発明の第2の実施形態に係る転写装置に基板と型とを設置した状態を示す図である。It is a figure which shows the state which installed the board | substrate and the type | mold in the transfer apparatus which concerns on the 2nd Embodiment of this invention. 従来の転写装置の概略構成を示す図である。It is a figure which shows schematic structure of the conventional transfer apparatus. 図7におけるVIII矢視を示す図である。It is a figure which shows the VIII arrow in FIG.

符号の説明Explanation of symbols

1、1a 転写装置
3、3a 下側部材
5、5a 上側部材
7 基板
9、9a、11、15 型
13 平面型
17 ガイド部材
1, 1a Transfer device 3, 3a Lower member 5, 5a Upper member 7 Substrate 9, 9a, 11, 15 Mold 13 Plane 17 Guide member

Claims (8)

第1の部材と;
前記第1の部材に対して接近・離反する方向に相対的に移動自在な第2の部材と;
前記第1の部材と前記第2の部材との間に設けられ、複数枚の基板と、前記各基板に微細なパターンを転写するための複数の型とを重ねて設置することが可能な基板・型設置部と;
前記第1の部材に対して前記第2の部材を相対的に移動し、前記基板・型設置部に設置された前記各基板と前記各型とを押圧する駆動手段と;
を有することを特徴とする転写装置。
A first member;
A second member relatively movable in a direction approaching or moving away from the first member;
A substrate that is provided between the first member and the second member, and on which a plurality of substrates and a plurality of molds for transferring a fine pattern can be placed on each substrate.・ With mold setting part;
Drive means for moving the second member relative to the first member and pressing the substrates and the molds installed in the substrate / mold installation unit;
A transfer device comprising:
請求項1に記載の転写装置において、
前記基板・型設置部に設置される前記基板の位置と前記型との位置が正しい位置になるようにガイドするガイド部材を有することを特徴とする転写装置。
The transfer device according to claim 1,
A transfer apparatus comprising a guide member for guiding the position of the substrate installed in the substrate / mold installation unit and the position of the mold to be correct.
微細な転写パターンが形成されている型で基板を押圧することにより、前記転写パターンを前記基板に転写する転写方法において、
複数枚の基板と、前記各基板に微細なパターンを転写するための複数の型とを重ね、この重ねた方向から押圧して、前記各基板に転写を行うことを特徴とする転写方法。
In a transfer method of transferring the transfer pattern to the substrate by pressing the substrate with a mold in which a fine transfer pattern is formed,
A transfer method comprising: superposing a plurality of substrates and a plurality of molds for transferring a fine pattern on each of the substrates;
請求項3に記載の転写方法において、
前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、
前記押圧は、前記各型と前記各基板とがこれらの厚さ方向で交互に重ね合わされた状態でなされることを特徴とする転写方法。
The transfer method according to claim 3, wherein
The substrate is formed in a flat plate shape, the mold is formed in a flat plate shape and a fine transfer pattern is formed on one surface,
The method of transferring, wherein the pressing is performed in a state where the molds and the substrates are alternately stacked in the thickness direction.
請求項3に記載の転写方法において、
前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、
前記押圧は、前記型と前記基板と平面型とがこの順でしかもこれらの厚さ方向で複数回重ね合わされた状態でなされることを特徴とする転写方法。
The transfer method according to claim 3, wherein
The substrate is formed in a flat plate shape, the mold is formed in a flat plate shape and a fine transfer pattern is formed on one surface,
The transfer method according to claim 1, wherein the pressing is performed in a state where the mold, the substrate, and the planar mold are overlapped in this order and a plurality of times in the thickness direction.
請求項3に記載の転写方法において、
前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、
前記押圧は、前記基板の両面に転写をすべく、1枚の第1の前記型と1枚の前記基板と1枚の第2の前記型とが、この順でしかもこれらの厚さ方向で、複数回重ね合わされた状態でなされることを特徴とする転写方法。
The transfer method according to claim 3, wherein
The substrate is formed in a flat plate shape, the mold is formed in a flat plate shape and a fine transfer pattern is formed on one surface,
In order to transfer the pressure onto both surfaces of the substrate, one first mold, one substrate and one second mold are arranged in this order and in the thickness direction. A transfer method characterized in that the transfer is performed in a state of being overlaid a plurality of times.
請求項3に記載の転写方法において、
前記基板、前記型は平板状に形成されており、
前記押圧は、前記各型と前記各基板とがこれらの厚さ方向で交互に重ね合わされた状態でなされると共に、前記基板の間に位置している前記型は、両方の面に微細な転写パターンが形成されていることを特徴とする転写方法。
The transfer method according to claim 3, wherein
The substrate and the mold are formed in a flat plate shape,
The pressing is performed in a state where the molds and the substrates are alternately stacked in the thickness direction, and the mold located between the substrates is finely transferred to both surfaces. A transfer method, wherein a pattern is formed.
請求項3に記載の転写方法において、
前記基板は平板状に形成されており、前記型は平板状に形成されていると共に一方の面に微細な転写パターンが形成されており、
前記押圧は、基板の両面に転写をすべく、1枚の第1の前記型と1枚の前記基板と1枚の第2の前記型とが、この順でしかもこれらの厚さ方向で複数回重ねられると共に、前記基板が存在していない前記型の間には、平面型が設けられている状態でなされることを特徴とする転写方法。
The transfer method according to claim 3, wherein
The substrate is formed in a flat plate shape, the mold is formed in a flat plate shape and a fine transfer pattern is formed on one surface,
In order to perform the transfer on both surfaces of the substrate, a plurality of one first mold, one substrate and one second mold are arranged in this order and in the thickness direction. A transfer method characterized in that the transfer is performed in a state where a planar mold is provided between the molds that are stacked and the substrate does not exist.
JP2005377900A 2005-12-28 2005-12-28 Transfer device and transfer method Pending JP2007176037A (en)

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JP2009214502A (en) * 2008-03-12 2009-09-24 Ricoh Co Ltd Imprint method and mold
JP2009241582A (en) * 2008-03-12 2009-10-22 Ricoh Co Ltd Imprinting method
JP2011526553A (en) * 2008-07-17 2011-10-13 エージェンシー・フォー・サイエンス・テクノロジー・アンド・リサーチ Method for making an imprint on a polymer structure

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009214502A (en) * 2008-03-12 2009-09-24 Ricoh Co Ltd Imprint method and mold
JP2009241582A (en) * 2008-03-12 2009-10-22 Ricoh Co Ltd Imprinting method
JP2011526553A (en) * 2008-07-17 2011-10-13 エージェンシー・フォー・サイエンス・テクノロジー・アンド・リサーチ Method for making an imprint on a polymer structure
KR101502933B1 (en) * 2008-07-17 2015-03-16 에이전시 포 사이언스, 테크놀로지 앤드 리서치 A method of making an imprint on a polymer structure

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