JP2007171789A - Liquid crystal display device - Google Patents

Liquid crystal display device Download PDF

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JP2007171789A
JP2007171789A JP2005372288A JP2005372288A JP2007171789A JP 2007171789 A JP2007171789 A JP 2007171789A JP 2005372288 A JP2005372288 A JP 2005372288A JP 2005372288 A JP2005372288 A JP 2005372288A JP 2007171789 A JP2007171789 A JP 2007171789A
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film
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shielding film
liquid crystal
light shielding
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JP4986014B2 (en
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Masami Okimoto
雅美 沖元
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Hiroshima Opt Corp
Kyocera Display Corp
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Kyocera Display Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To prevent the occurrence of leak by suppressing the decrease in the insulation resistance between adjoining transparent electrodes by keeping insulation properties of a light shielding film. <P>SOLUTION: A liquid crystal display device comprises a non-display part in which a light shielding film 4 containing carbon black is disposed, and a display part consisting of a plurality of segments where a translucent film using color resist is disposed, and is provided with transparent electrodes 5 for feeding power in a layer over the light shielding film 4 and the translucent film. An insulation film 6 consisting of color resist is interposed between the light shielding film 4 in the non-display part and the transparent electrode 5 formed over the film. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、カーボンブラックを用いて形成された遮光膜を配設したセグメント方式の液晶表示素子に関する。   The present invention relates to a segment type liquid crystal display element provided with a light shielding film formed using carbon black.

従来より、例えばディジタル時計の数字表示のように、所望のパターンに形成された複数のセグメントの中から必要なセグメントを選択して所望の表示を行なうセグメント方式の液晶表示素子においては、前記セグメントからなる表示部以外の領域、すなわち、非表示部には、コントラストの向上を目的として、ブラックマスクと称される遮光膜が配設されている(例えば、特許文献1参照)。   Conventionally, in a segment type liquid crystal display element that performs a desired display by selecting a required segment from a plurality of segments formed in a desired pattern, for example, as a numeric display of a digital watch, the segment In a region other than the display portion, that is, a non-display portion, a light shielding film called a black mask is disposed for the purpose of improving contrast (see, for example, Patent Document 1).

図2は、従来のセグメント方式の液晶表示素子における非表示部の要部構造を示す断面図である。   FIG. 2 is a cross-sectional view showing a main structure of a non-display portion in a conventional segment type liquid crystal display element.

前記液晶表示素子1の非表示部における透明基板2上には、SiOからなる接着補助膜3を介して約1μm厚の遮光膜4が形成され、その上層に、表示部に形成された各セグメントに対して通電可能に引き廻し配線されたITO(Indium Tin Oxide)からなる透明電極5が形成されている。 A light shielding film 4 having a thickness of about 1 μm is formed on the transparent substrate 2 in the non-display portion of the liquid crystal display element 1 via an adhesion auxiliary film 3 made of SiO 2 , and each layer formed on the display portion is formed thereon. A transparent electrode 5 made of ITO (Indium Tin Oxide) is formed so as to be energized and wired to the segment.

そして、前記遮光膜としては、近年、高遮光性、製造工程の短縮化などの観点から、クロム、ニッケル、アルミニウム等の金属に代えてカーボンブラック(黒色顔料)を分散させた感光性樹脂が用いられ、所望の膜厚に形成されている。   In recent years, as the light shielding film, a photosensitive resin in which carbon black (black pigment) is dispersed instead of a metal such as chromium, nickel, and aluminum is used from the viewpoint of high light shielding properties and shortening of the manufacturing process. And has a desired film thickness.

ここで、透明電極が直接的に上層に形成される遮光膜は絶縁抵抗が高いものであることが好ましい。前記透明電極間の絶縁抵抗が低下するとリークが発生する原因となるためである。   Here, it is preferable that the light shielding film in which the transparent electrode is directly formed in the upper layer has a high insulation resistance. This is because if the insulation resistance between the transparent electrodes is reduced, leakage occurs.

前述の構成の液晶表示素子においては、前記透明電極の線間絶縁抵抗は、遮光膜の絶縁抵抗と、隣り合う透明電極のパターンの間隙寸法、すなわち、透明電極としてのITOパターン間距離とに依存する。そのため、近年においては、カーボンブラックの表面に樹脂をコートして絶縁処理を施した顔料を用いて遮光膜を形成し、遮光膜の絶縁性を確保するようにしていた。   In the liquid crystal display device having the above-described configuration, the line-to-line insulation resistance of the transparent electrode depends on the insulation resistance of the light shielding film and the gap dimension between adjacent transparent electrode patterns, that is, the distance between ITO patterns as the transparent electrode. To do. Therefore, in recent years, a light-shielding film is formed using a pigment obtained by coating a resin on the surface of carbon black and applying an insulation treatment to ensure insulation of the light-shielding film.

特開2005−189561号公報JP 2005-189561 A

カーボンブラックからなる遮光膜が配設された非表示部と、カラーレジストを用いた透光膜が配設された複数のセグメントからなる表示部とを有するセグメント方式の液晶表示素子においては、その製造工程上、非表示部に配設される前記遮光膜は、表示部に配設される透光膜よりも先に形成されることになる。   In a segment type liquid crystal display element having a non-display portion provided with a light-shielding film made of carbon black and a display portion made up of a plurality of segments provided with a light-transmitting film using a color resist. In the process, the light shielding film disposed in the non-display portion is formed before the light-transmitting film disposed in the display portion.

透光膜よりも先に形成される前記遮光膜は、例えば、塗布したカラーレジストを露光、現像、乾燥、焼成して透光膜を形成する際の前記焼成工程や透明電極としてのITOのパターン形成時における蒸着工程、配向膜の焼成工程、2枚の透明基板の圧着工程等において、度々高熱が加えられるため、その熱履歴と共に前記カーボンブラックの絶縁抵抗が低下して絶縁性が損なわれてしまう。そのため、前記透明電極間のリーク不良(2.0×10Ω以下)が発生するという問題を有していた。この問題は、隣り合う透明電極の間隙寸法が50μm以下である非表示部において特に顕著であった。 The light-shielding film formed prior to the light-transmitting film is, for example, the baking process when the coated color resist is exposed, developed, dried and baked to form the light-transmitting film and the ITO pattern as a transparent electrode. In the vapor deposition process, the alignment film baking process, the bonding process of the two transparent substrates, etc., high heat is often applied, and the insulation resistance of the carbon black is lowered along with the heat history. End up. For this reason, there is a problem that a leak failure (2.0 × 10 8 Ω or less) occurs between the transparent electrodes. This problem is particularly remarkable in the non-display portion where the gap between adjacent transparent electrodes is 50 μm or less.

そこで、本発明は、カーボンブラックを用いて形成された遮光膜を配設したセグメント方式の液晶表示素子において、前記遮光膜の絶縁性を保持することにより、隣り合う透明電極間の絶縁抵抗の低下を抑止して、リーク不良の発生を防止することのできる構成を備えた液晶表示素子を提供することを目的とするものである。   Therefore, the present invention provides a segment-type liquid crystal display element in which a light shielding film formed using carbon black is disposed, thereby reducing the insulation resistance between adjacent transparent electrodes by maintaining the insulation properties of the light shielding film. It is an object of the present invention to provide a liquid crystal display element having a configuration that can prevent the occurrence of a leak failure by suppressing the above.

前述した目的を達成するため、本発明の液晶表示素子の特徴は、カーボンブラックを含む遮光膜が配設された非表示部と、カラーレジストを用いた透光膜が配設された複数のセグメントからなる表示部とを有し、前記遮光膜および透光膜の上層に給電用の透明電極が形成された液晶表示素子であって、前記非表示部の遮光膜とその上層に形成された透明電極との間に絶縁膜が介装され、前記絶縁膜が前記透光膜を形成するカラーレジストである点にある。   In order to achieve the above-described object, the liquid crystal display element of the present invention is characterized by a non-display portion provided with a light-shielding film containing carbon black and a plurality of segments provided with a light-transmitting film using a color resist. A liquid crystal display element in which a transparent electrode for power feeding is formed on the light shielding film and the light-transmitting film, the light-shielding film on the non-display part and the transparent film formed thereon An insulating film is interposed between the electrodes, and the insulating film is a color resist that forms the light-transmitting film.

そして、前記絶縁膜は、隣り合う透明電極の間隙寸法が50μm以下である非表示部に配設されていることを別の特徴点とする。   Another feature is that the insulating film is disposed in a non-display portion in which the gap between adjacent transparent electrodes is 50 μm or less.

本発明の液晶表示素子によれば、カーボンブラックを含む遮光膜と透明電極との間にカラーレジストからなる絶縁膜を介装させる構成としたことにより、仮に、製造工程において遮光膜における絶縁抵抗が低下したとしても、絶縁膜によって隣り合う透明電極間の絶縁抵抗低下を抑制することができ、リーク不良の発生を防止することができる。   According to the liquid crystal display element of the present invention, since the insulating film made of a color resist is interposed between the light shielding film containing carbon black and the transparent electrode, the insulation resistance in the light shielding film is temporarily reduced in the manufacturing process. Even if it decreases, the insulation resistance between the transparent electrodes adjacent to each other can be suppressed by the insulating film, and the occurrence of leakage failure can be prevented.

また、前述のように、前記透明電極間のリーク不良(2.0×10Ω以下)は、隣り合う透明電極の間隙寸法が50μm以下である非表示部において特に顕著であったので、前記絶縁膜を隣り合う透明電極の間隙寸法が50μm以下である非表示部に配設することで、透明電極間の絶縁抵抗低下を抑止して、リーク発生を有効に防止することができる。 In addition, as described above, the leakage failure between the transparent electrodes (2.0 × 10 8 Ω or less) was particularly noticeable in the non-display portion where the gap between adjacent transparent electrodes was 50 μm or less. By disposing the insulating film in the non-display portion where the gap between adjacent transparent electrodes is 50 μm or less, it is possible to suppress a decrease in insulation resistance between the transparent electrodes and to effectively prevent the occurrence of leakage.

まず、本発明の液晶表示素子の要部構成について、図1を用いて説明する。   First, the structure of the main part of the liquid crystal display element of the present invention will be described with reference to FIG.

本発明の液晶表示素子1は、カーボンブラックからなる遮光膜4が配設された非表示部と、カラーレジストを用いた透光膜が配設された複数のセグメントからなる表示部(図示せず)とを有し、前記遮光膜4および透光膜の上層に給電用の透明電極5が形成された液晶表示素子である。   The liquid crystal display element 1 of the present invention includes a non-display portion provided with a light shielding film 4 made of carbon black and a display portion (not shown) made up of a plurality of segments provided with a light-transmitting film using a color resist. ), And a transparent electrode 5 for feeding is formed on the light shielding film 4 and the light transmitting film.

前記液晶表示素子1の非表示部においては、図1に示すように、透明基板2上にSiOからなる第1接着補助膜3を介して遮光膜4が形成されている。本実施形態において、前記遮光膜4はカーボンブラックを分散させた感光性樹脂を用いて約1μm厚に形成されている。 In the non-display portion of the liquid crystal display element 1, as shown in FIG. 1, a light shielding film 4 is formed on a transparent substrate 2 via a first adhesion auxiliary film 3 made of SiO 2 . In the present embodiment, the light shielding film 4 is formed to a thickness of about 1 μm using a photosensitive resin in which carbon black is dispersed.

さらに、本実施形態においては、間隙寸法が50μm以下のパターンでITOからなる透明電極5のパターンが引き廻し配線された非表示部に対応する前記遮光膜4の上面には、表示部のセグメントを構成する透光膜の形成に用いられるカラーレジストが絶縁膜6として約1μm厚に形成されている。   Further, in the present embodiment, the segment of the display unit is formed on the upper surface of the light shielding film 4 corresponding to the non-display unit in which the pattern of the transparent electrode 5 made of ITO is routed with a pattern having a gap size of 50 μm or less. A color resist used for forming the light transmitting film is formed as an insulating film 6 with a thickness of about 1 μm.

前記カラーレジストは、カーボン顔料が含まれていない、非導電性樹脂材料であって、赤、青、緑、黄、紫などの有色に限ることなく、透明(無色)であってもよい。また、複数のセグメントのそれぞれは、異なる色に着色され、表示される構成であってもよい。   The color resist is a non-conductive resin material that does not contain a carbon pigment, and is not limited to colors such as red, blue, green, yellow, and purple, and may be transparent (colorless). Each of the plurality of segments may be configured to be colored and displayed in a different color.

また、前記絶縁膜6が形成されない遮光膜4上、すなわち、隣り合う透明電極5の間隙寸法が50μmより多く確保されたパターンで前記透明電極5のパターンが引き廻し配線された非表示部に対応する前記遮光膜4上、および、前記絶縁膜6上には、SiOからなる第2接着補助膜7が約10nm厚に形成されている。 Further, it corresponds to a non-display portion where the pattern of the transparent electrode 5 is routed and wired on the light shielding film 4 where the insulating film 6 is not formed, that is, the gap dimension between adjacent transparent electrodes 5 is more than 50 μm. On the light shielding film 4 and the insulating film 6, a second adhesion auxiliary film 7 made of SiO 2 is formed with a thickness of about 10 nm.

そして、前記第2接着補助膜7上には、前述の間隙寸法とされたパターンの透明電極5が、表示部に形成された各セグメントに対して通電可能に引き廻し配線されている。   On the second adhesion assisting film 7, the transparent electrode 5 having the above-described gap dimension is routed and wired so that each segment formed in the display unit can be energized.

このように形成された液晶表示素子1の非表示部においては、遮光膜4とその上層に形成された透明電極5との間に絶縁膜6が介装された構成を有することとなる。   The non-display portion of the liquid crystal display element 1 formed in this way has a configuration in which the insulating film 6 is interposed between the light shielding film 4 and the transparent electrode 5 formed thereon.

前記セグメントの透光膜を形成するカラーレジストは、カーボン顔料を含有せず、焼成による絶縁抵抗低下が少ない。よって、本実施形態の液晶表示素子1が、カーボンブラックからなる遮光膜4と透明電極5との間にカラーレジストからなる絶縁膜6を介装させる構成を有することにより、仮に、遮光膜4における絶縁抵抗が低下したとしても、絶縁膜6によって、隣り合う透明電極5間の絶縁抵抗低下を抑制することができ、リーク不良の発生を防止することができる。   The color resist that forms the light-transmitting film of the segment does not contain a carbon pigment and has little reduction in insulation resistance due to baking. Therefore, the liquid crystal display element 1 of the present embodiment has a configuration in which the insulating film 6 made of a color resist is interposed between the light shielding film 4 made of carbon black and the transparent electrode 5. Even if the insulation resistance is reduced, the insulation film 6 can suppress a reduction in insulation resistance between the adjacent transparent electrodes 5, and can prevent the occurrence of a leak failure.

なお、遮光膜4は非表示部に形成されているので、前記カラーレジストが透明(無色)でなく、赤、緑、青、黄色などの有色であったとしても、非表示部の表示には、絶縁膜6としてのカラーレジストの影響を考慮するに及ばない。また、前記第2接着補助膜7は、材料としてのSiO自体は絶縁性の特質を有するものであるが、膜厚が薄い(10nm)ため、その絶縁性を期待できるものではなく、必要に応じて省略も可能である。 Since the light shielding film 4 is formed on the non-display portion, even if the color resist is not transparent (colorless) and is colored such as red, green, blue, yellow, etc. The influence of the color resist as the insulating film 6 is not considered. Further, the second adhesion assisting film 7 is made of SiO 2 itself having an insulating property, but since the film thickness is thin (10 nm), the insulating property cannot be expected and is necessary. Corresponding omission is also possible.

また、本実施形態のように、前記絶縁膜6として前記透光膜を構成するカラーレジストを用いることで、簡便に前記構成の液晶表示素子1を得ることができる。例えば、表示部に形成されたセグメントに配設される透光膜のカラーレジストの露光マスクを改版し、遮光膜4上に、前記カラーレジストからなる絶縁膜6を形成するようにすればよい。   Moreover, the liquid crystal display element 1 of the said structure can be obtained simply by using the color resist which comprises the said translucent film as the said insulating film 6 like this embodiment. For example, the exposure mask of the color resist of the translucent film disposed in the segment formed in the display portion may be revised to form the insulating film 6 made of the color resist on the light shielding film 4.

さらに、前記透明電極5間のリーク不良(2.0×10Ω以下)は、隣り合う透明電極5の間隙寸法が50μm以下である非表示部において特に顕著にみられる現象であったので、前記絶縁膜6を隣り合う透明電極5の間隙寸法が50μm以下である非表示部に配設することで、透明電極5間の絶縁抵抗低下を抑止して、リーク発生を有効に防止することができる。 Further, the leakage failure between the transparent electrodes 5 (2.0 × 10 8 Ω or less) was a phenomenon that is particularly noticeable in the non-display portion where the gap size between adjacent transparent electrodes 5 is 50 μm or less. By disposing the insulating film 6 in a non-display portion where the gap between adjacent transparent electrodes 5 is 50 μm or less, it is possible to suppress a decrease in insulation resistance between the transparent electrodes 5 and effectively prevent leakage. it can.

具体的には、図2の従来例で示す、非表示部の隣り合う透明電極5の間隙寸法を50μm以下とする領域においては、その絶縁抵抗の平均値が1.6×10Ωであり、リーク不良の境界値である2.0×10Ωよりも小さい数値を示していたが、図1に示す本実施形態においては、同領域の絶縁抵抗の平均値は2.1×10Ωとなり、リーク不良対策として効果があることが確認された。 Specifically, in the region where the gap dimension between adjacent transparent electrodes 5 in the non-display portion shown in the conventional example of FIG. 2 is 50 μm or less, the average value of the insulation resistance is 1.6 × 10 8 Ω. Although showed a lower number than the leakage defect is a boundary value 2.0 × 10 8 Ω, in the present embodiment shown in FIG. 1, the average value of the insulation resistance of the same region is 2.1 × 10 9 It was confirmed that it was effective as a countermeasure against leakage defects.

なお、本発明は、前述した実施の形態に限定されるものではなく、必要に応じて種々の変更が可能である。   In addition, this invention is not limited to embodiment mentioned above, A various change is possible as needed.

例えば、前記各膜の膜厚は一つの例示であり、この膜厚に限るものではない。また、本実施形態においては、隣り合う透明電極の間隙寸法を50μm以下の領域のみに、カラーレジストからなる絶縁膜を配設したが、透明電極間の間隙寸法に拘わらず、非表示部全域に絶縁膜を配設してもよい。さらに、前記絶縁膜としても、本実施形態においては、表示部に配設されるセグメントの透光部を形成するカラーレジストを利用したが、非表示部に配設される絶縁膜用として、前記透光部を形成するカラーレジストとは別のカラーレジストを用い、個別のレジストパターンを用いて非表示部の遮光膜上に配設してもよい。   For example, the film thickness of each film is only an example, and is not limited to this film thickness. In this embodiment, an insulating film made of a color resist is disposed only in a region where the gap between adjacent transparent electrodes is 50 μm or less. However, regardless of the gap between the transparent electrodes, the entire non-display area is provided. An insulating film may be provided. Furthermore, as the insulating film, in the present embodiment, a color resist that forms a light-transmitting portion of the segment disposed in the display portion is used. However, for the insulating film disposed in the non-display portion, A color resist different from the color resist forming the light transmitting part may be used, and an individual resist pattern may be used to dispose on the light shielding film of the non-display part.

本発明の液晶表示素子における要部構成を示す断面図Sectional drawing which shows the principal part structure in the liquid crystal display element of this invention 従来の液晶表示素子における要部構成を示す断面図Sectional drawing which shows the principal part structure in the conventional liquid crystal display element

符号の説明Explanation of symbols

1 液晶表示パネル
2 透明基板
3 (第1)接着補助膜
4 遮光膜
5 透明電極
6 絶縁膜
7 (第2)接着補助膜
DESCRIPTION OF SYMBOLS 1 Liquid crystal display panel 2 Transparent substrate 3 (1st) Adhesion auxiliary film 4 Light-shielding film 5 Transparent electrode 6 Insulating film 7 (2nd) Adhesion auxiliary film

Claims (2)

カーボンブラックを含む遮光膜が配設された非表示部と、カラーレジストを用いた透光膜が配設された複数のセグメントからなる表示部とを有し、前記遮光膜および透光膜の上層に複数の透明電極が形成されたセグメント方式の液晶表示素子であって、
前記非表示部の遮光膜とその上層に形成された透明電極との間に絶縁膜が介装され、前記絶縁膜が前記透光膜を形成するカラーレジストであることを特徴とする液晶表示素子。
A non-display portion provided with a light-shielding film containing carbon black and a display portion comprising a plurality of segments provided with a light-transmitting film using a color resist, the light-shielding film and an upper layer of the light-transmitting film A segment type liquid crystal display element having a plurality of transparent electrodes formed thereon,
A liquid crystal display element, wherein an insulating film is interposed between the light shielding film of the non-display portion and a transparent electrode formed thereon, and the insulating film is a color resist that forms the light transmitting film. .
前記絶縁膜は隣り合う透明電極の間隙寸法が50μm以下である非表示部に配設された請求項1に記載の液晶表示素子。
The liquid crystal display element according to claim 1, wherein the insulating film is disposed in a non-display portion in which a gap between adjacent transparent electrodes is 50 μm or less.
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Publication number Priority date Publication date Assignee Title
JP2012073480A (en) * 2010-09-29 2012-04-12 Toppan Forms Co Ltd Information display medium
CN106775041A (en) * 2015-11-20 2017-05-31 深圳莱宝高科技股份有限公司 A kind of information input panel and preparation method thereof

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JPH1123833A (en) * 1997-07-01 1999-01-29 Asahi Glass Co Ltd Color filter substrate, manufacture thereof and color liquid crystal display element
JPH1152351A (en) * 1997-08-01 1999-02-26 Hitachi Ltd Liquid crystal display device
JP2000155311A (en) * 1998-04-07 2000-06-06 Hiroshima Opt Kk Liquid crystal display device
JP2006267909A (en) * 2005-03-25 2006-10-05 Dainippon Printing Co Ltd Color filter

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JPH1123833A (en) * 1997-07-01 1999-01-29 Asahi Glass Co Ltd Color filter substrate, manufacture thereof and color liquid crystal display element
JPH1152351A (en) * 1997-08-01 1999-02-26 Hitachi Ltd Liquid crystal display device
JP2000155311A (en) * 1998-04-07 2000-06-06 Hiroshima Opt Kk Liquid crystal display device
JP2006267909A (en) * 2005-03-25 2006-10-05 Dainippon Printing Co Ltd Color filter

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012073480A (en) * 2010-09-29 2012-04-12 Toppan Forms Co Ltd Information display medium
CN106775041A (en) * 2015-11-20 2017-05-31 深圳莱宝高科技股份有限公司 A kind of information input panel and preparation method thereof

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