JP2000155311A - Liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To realize a liquid crystal display device having a light shielding film, being excellent in display quality and in an appearance of a product. SOLUTION: In providing a light shielding film 21 on a transparent substrate 12 except for parts corresponding to display patterns, a patterned photosensitive light shielding resin material, having >=1012 Ω/(square) electrically insulating property and >=2.0 optical density per 1 μm film thickness (OD value), is used as the light shielding film 21. In this case a transparent electrode 121 is directly formed on the light shielding film, with no flattening layer lying in between, in the transparent electrode 12.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a transmission type liquid crystal display device having a backlight on the back surface.

[0002]

2. Description of the Related Art In a transmissive liquid crystal display device having a backlight on the back surface, a light-shielding film is provided on the inner surface of a cell in order to improve visibility. A cross section of the example is shown schematically.

According to this, the liquid crystal display device 10 is provided with a pair of transparent substrates 11 and 12 made of glass or the like. In this example, a terminal portion 11a is provided on one of the transparent substrates 11 side. I have. Although not shown in detail, transparent electrodes 111 and 121 made of ITO (Indium Tin Oxide) are formed on each of the transparent substrates 11 and 12 along a predetermined display pattern.

In this case, a light-shielding film 112 is provided on one of the transparent substrates 11 except for the display pattern. Although not shown in detail, the terminal 1
1a, a first extraction electrode group 131 directly extracted from the transparent electrode 111 of one transparent substrate 11 and a second extraction electrode group 132 connected to the transparent electrode 121 of the other transparent substrate 12 are formed. Have been.

[0005] The transparent substrates 11 and 12 are connected to their transparent electrodes 111 and 12 via a peripheral sealing material 14 such as epoxy resin.
Then, the liquid crystal 15 is sealed in the cell gap. The peripheral sealing material 14 is provided with a transfer material made of, for example, conductive beads, and the transparent electrode 121 of the other transparent substrate 12 is electrically connected to the second lead electrode group 132 of the terminal portion 11a via the transfer material. Connected to.

[0006] Polarizing plates 161 and 162 are arranged on the outer surfaces of the transparent substrates 11 and 12, respectively. In the liquid crystal display device 10, one of the transparent substrates 11 having the light shielding film 112 is on the back side, and the backlight 17 is provided on the back side. Therefore, the other transparent substrate 12 is used as the front side.

[0007]

By the way, in forming the above-mentioned light-shielding film, a printing method has been mainly adopted in the past, but in the printing method, an optical density (OD value) of 2 is used.
In order to obtain the above sufficient degree of light shielding, the film thickness must be 3 to 4 μm
Therefore, there are drawbacks in that the surface smoothness is poor, and that the printing accuracy is limited and fine processing cannot be performed.

For this reason, even if the gap is reduced, the thickness of the printed film is limited, and the gap width is limited to at most 6 μm.
It could only be narrowed to a degree. Further, even with such a gap, defects such as a short circuit between the opposing transparent substrates and unevenness of the gap often occur due to the protrusion of the light-shielding film, which is a great limitation in terms of yield and quality. Was.

As a method of realizing a partially colored color display in a cell using such an inner light-shielding film, a method of performing color printing by screen printing outside the cell, and a method of installing a color filter outside the cell. And a method of printing a colored layer by screen printing and offset printing on the inner surface of the cell, respectively, have the following problems.

That is, in the case of printing outside a cell and pasting a color filter, since color shift due to parallax is inevitable, it is difficult to apply different colors in a close pattern, and a color difference of about 1 mm or more is required. Only coarse patterns with intervals could be accommodated. When a color filter is provided by printing inside the cell, since the color filter is provided by printing on ITO, the voltage applied to the liquid crystal layer is:
There is a problem that the threshold voltage is deteriorated because the voltage is applied across the color filter. In addition, there is a method in which a color polarizing plate is partially dyed and the display color is changed. However, it is not used because it is not cost effective.

On the other hand, a technique for producing a color filter using a black resist and a color resist is also well known, and a large STN (Super Twisted Ne) is used.
magnetic), TFT (Thin Film Tran)
This is practically used in full dot display such as a stor.

A light-shielding film used for a color filter for a TFT does not require electrical insulation, but rather has a certain degree of conductivity. This is because the ITO is formed on the color filter, and the conductivity of the light-shielding film assists the conductivity required for the ITO, and the ITO exhibits a good operating characteristic even when the ITO has a relatively high resistance.

On the other hand, in the case of a color filter for STN in which ITO patterned in a stripe shape is provided on a color filter, the color filter must have conductivity in terms of securing electric insulation between lines and reducing capacitance. Is not preferred.
However, the surface smoothness of the color filter used for the STN is important, and therefore, it is necessary to provide a resin smoothing layer on the color filter.

Since the resin of the smoothing layer is electrically insulating, the fact that the light-shielding film of the color filter has low electrical insulation did not cause a great obstacle. That is,
Although a material having a high insulating property and a high absorbance has been known, it can be said that there was no application in which this performance could be utilized.

Further, the light-shielding film provided by the printing method has insufficient adhesion to the transparent substrate, so that a peripheral sealing material cannot be printed on the light-shielding film. For this reason, when observing the display part of the liquid crystal panel from an oblique direction while it is actually attached to a car audio system, etc., if the viewing angle is so deep that it comes off the light-shielding film, the backlight Light could leak.

In order to prevent this, conventionally, screen printing is performed in a frame shape with black ink in a region including a portion corresponding to a peripheral sealing material on the surface of the cell to prevent light leakage. It was undeniable that the number of steps increased accordingly.

On the other hand, the conventional color display method of driving at a low duty and displaying a partially different color has the following problems. In other words, in the method of printing a color filter on the outside of the cell or attaching the color filter, it is necessary to increase the distance between the patterns in order to prevent the colors between the patterns from being mixed due to parallax. Cannot be colored.

On the other hand, according to the method of printing a color filter on the inner surface of the cell, there is no problem in accuracy, but the color purity is poor and the reliability is low. In the method of printing a color filter on the inner surface of the cell, a light-shielding film of a printing method is also provided on the inner surface. However, in order to obtain a sufficient absorbance, a film thickness of 2 to 4 μm is required. Outbreaks were inevitable.

As a result, the cell gap varies, and as a result, the characteristics of the device vary. In addition, there is a limit to the definition in the printing method, and it is extremely difficult to design a pattern by setting the width of the light-shielding film at the portion where the color is changed to about 200 μm or less, which is subject to design restrictions. Further, in the TN method, domains are generated when the pretilt angle is set to 2 ° or less due to irregularities on the inner surface of the cell, so that a decrease in the pretilt angle for improving characteristics cannot be realized. Further, because of the poor surface smoothness, the STN system or the ferroelectric or antiferroelectric liquid crystal system could not be adopted even if it was desired to realize a drive of about 1/30 duty.

When a thermosetting resin is used for the peripheral sealing material, the difference in the coefficient of thermal expansion between the sealing material and the glass substrate causes
After the thermosetting of the peripheral sealing material, the central portion of the cell tends to be swollen. Even when liquid crystal was sealed in this cell, the central portion remained in a swelled state, and the characteristics and background color sometimes differed between the central portion and the peripheral portion.

In order to prevent this, in particular, a large panel or a cell gap unevenness greatly affects the optical characteristics.
In the N method or the like, for example, after a liquid crystal is injected into a cell, a pressure sealing operation is performed in which the liquid crystal layer is depressurized and the gap between the central portion of the cell and the peripheral portion of the cell is uniformly sealed. And so on.

Further, since a liquid crystal display device using a smectic liquid crystal such as a ferroelectric liquid crystal or an antiferroelectric liquid crystal has no self-healing property of the alignment, it cannot be used due to stress, shock or vibration after sealing. In some cases, once the orientation is disturbed, it is necessary to perform a heat treatment again to re-orient, depending on the degree.

In order to solve the above problem, there is a method in which a thermo-softening resin is coated around the in-plane spacer, and the upper and lower substrates are fused when the peripheral sealing material is thermoset. However, in order to exhibit sufficient fixing performance, the amount of the in-plane spacer and the amount of the heat-softening resin to be coated must be increased,
Light leakage occurs due to scattering and aggregation of the in-plane spacer itself,
In some cases, poor appearance was caused. In addition, the heat-softening resin component may start to dissolve in the liquid crystal, thereby lowering the reliability.

[0024]

SUMMARY OF THE INVENTION In order to solve these problems, the present invention provides a pair of transparent substrates which are sandwiched by a peripheral sealing material with a liquid crystal layer interposed therebetween and a pair of transparent substrates which are respectively attached to the outer surfaces thereof. A polarizing plate, and illumination means provided behind the one polarizing plate, which is the back side as viewed from the display surface side, a non-display area on the inner surface side of the one transparent substrate, and a display area A light-shielding film is provided on each of the portions corresponding to the non-display portion except for the portion corresponding to the display pattern, and a voltage higher than that which excites the liquid crystal layer is applied to a desired transparent electrode in the display pattern. In the transmission type liquid crystal display device, the non-display part in the display area is 1 mm × 1
mm or more, and the light-shielding film has an electrical insulation property of not less than 10 ¹² Ω / □ (sheet resistance value) and an optical density (O) per 1 μm of the film thickness.
D value) is 2.0 or more, and is formed by patterning a photosensitive light-shielding resin material.

In this case, the transparent electrode can be directly formed on the light-shielding film without a smoothing layer.

The light shielding film located in the display area is 1 mm
Since there are a plurality of sections of × 1 mm or more, one of the features of the present invention is that a support made of the same material as the peripheral sealing material is provided on at least a part of the sections.

A typical display pattern in which a non-display portion in the display area has a plurality of sections of 1 mm × 1 mm or more is as follows.
For example, a segment type pattern such as a Japanese character pattern, and a pattern in which the pattern is mixed with a dot pattern, for example, a pattern in which 5 × 7 dot sections repeatedly appear at intervals are also exemplified.

When a light-transmitting film having a predetermined transmission color is provided in a portion corresponding to the display pattern, the light-transmitting film has an insulation resistance of 10 ¹² Ω / □ or more, and is made of a photosensitive resin. Patterning a material is also a feature of the present invention. In this case, the transparent electrode can be directly formed on the light-transmitting film and the light-shielding film without interposing a smoothing layer.

The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is substantially 90 °, and the pair of polarizing plates are arranged so that their polarization axes are parallel. An embodiment in which the pretilt angle between the liquid crystal layer and the transparent substrate is 1.5 degrees or less is also included in the present invention.

In each of the above embodiments, the present invention includes an embodiment in which the liquid crystal layer is a nematic liquid crystal layer and the duty ratio for driving the nematic liquid crystal layer is 1/1 to 1/33.

The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is approximately 90 °, and the pair of polarizing plates are arranged so that their polarization axes are orthogonal to each other. An embodiment in which Δnd which is a product of the ratio anisotropy Δn and the distance d between the transparent conductive films forming the display pattern is between 0.4 and 0.6 μm is also included in the present invention.

The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is 70-80 °, and the pair of polarizing plates has a crossing angle of the polarizing axis of 70-80 °.
80 °, and Δnd which is a product of the refractive index anisotropy Δn of the nematic liquid crystal and the distance d between the transparent conductive films forming the display pattern is 0.4 to 0.6.
Embodiments that are between μm are also included in the present invention.

In a mode in which the liquid crystal layer is a nematic liquid crystal layer and the twist angle between the transparent substrates is approximately 90 ° or 70 to 80 °, the duty ratio for driving the nematic liquid crystal layer is 1/1 to 1 °. An embodiment of 1/4 is also included in the present invention.

The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is set to be 180 to 270 °, and at least one of the polarizing plates and the transparent substrate opposed to the polarizing plate are twisted. The present invention also includes a mode in which a phase difference plate is arranged, and the pair of polarizing plates are arranged so that light is transmitted without applying a voltage and light is blocked by applying a voltage.

The liquid crystal layer is a ferroelectric liquid crystal or an antiferroelectric liquid crystal, and the pair of polarizing plates are arranged so that their polarization axes are substantially orthogonal to each other. Included in the invention.

TN (Twisted Nematic)
In the case of a negative display of the system, the contrast ratio can be improved by using a nematic liquid crystal to which a dichroic dye is added, and this point is also included in the features of the present invention.

As the above-mentioned illuminating means, tungsten lamps, xenon lamps, EL
Although a white light source such as a white LED (light emitting diode) having a spectrum of three colors of RGB or a white CCT is preferably employed.

Further, the light-shielding resin material comprises a resin material obtained by polymerizing and curing a resin composition containing an alkali-soluble epoxy acrylate acid adduct containing insulating carbon, and a resin material for the light-transmitting layer. Is made of a resin material obtained by polymerizing and curing a resin composition containing an alkali-soluble epoxy acrylate acid adduct. Further, the light-shielding film is also provided below the peripheral seal material, and is provided over the entire periphery. Thus, one of the features of the present invention is that the end of the light-shielding film stops within the width of the peripheral sealing material.

[0039]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, a specific structure of a liquid crystal display device 10A shown in FIG. 1 as one embodiment of the present invention will be described. In this example,
Parts that are the same as or are deemed to be the same as those in the conventional example described above are given the same reference numerals.

In this embodiment, the transparent substrates 11, 1
As No. 2, a glass substrate on which a silica alkali prevention film was applied was used. First, a photosensitive light-shielding resin material manufactured by Nippon Steel Chemical Co., Ltd., that is, an alkali-soluble epoxy acrylate acid adduct containing insulated carbon, is applied to the transparent substrate 12 side, which is the front side, by spin coating. V-259BKIS-H (trade name) which is a resin composition containing as a component
Was applied to a thickness of about 1 μm.

A peripheral sealing material 1 arranged around the display portion of the segment display and the periphery of the transparent substrates 11 and 12 is provided.
Exposure of 300 mJ was performed using a photomask that shields a portion outside the portion 4 from light, developed, dried, and baked to form a light-shielding film 21 on the transparent substrate 12.

The light-shielding resin material manufactured by Nippon Steel Chemical Co., Ltd.
The OD value was about 3.0 at a thickness of μm, indicating a sufficient absorbance. A roll coater, bar coater, slit coater, etc. can be used for coating, but variations in film thickness cause variations in cell gaps. It results in variation. Therefore, spin coating is desirable, but in order to reduce the amount of liquid used, it may be used in combination with a bar coater or a slit coater, or any method may be adopted as long as the method is excellent in film thickness uniformity. .

The light-shielding film material is composed of a black pigment, a resin component such as a polymerizable monomer and an oligomer, a photopolymerization initiator, a solvent, and the like. Compounds having an ethylenically unsaturated group exhibiting photopolymerizability, and alkali-developable α, β unsaturated carboxylic acids or esters thereof or copolymers containing these as monomers, preferably JP-A-8-278629.
No. 4,078,049, and acid adducts of epoxy acrylates of bisphenols such as bisphenol fluorene found in Japanese Patent Application Laid-Open Publication No. H11-139,878.

Although it is possible to form only the light-shielding film 21 and color it by printing outside the cell or pasting a color filter, in this embodiment, a segment type is used in order to perform a predetermined coloring on the cell inner surface. A photomask is prepared such that a color filter as a light-transmitting film is formed on the display portion of each of the above, and color resists such as red, green, and yellow (V-259R-H and V-259G-respectively, respectively) are provided.
H, V-259Y-H (all manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, followed by exposure, development, drying and baking to form a light transmitting film 22.

By using this material, it is possible to provide a cell which does not change its color to a temperature of about 250 ° C. and does not change its color even after passing through a transparent conductive film forming step and a cell forming step. Therefore, when combined with a backlight having high saturation and a white light source, particularly favorable colors can be exhibited.

Further, in order to represent an arbitrary color including colorless (white), several types of primary colors are prepared, and can be blended and toned according to a request. As the basic colors, it is desirable to arrange at least six colors of red, blue, green, yellow, purple, and clear. For parts that do not need coloring,
It is preferable to form a clear film from the viewpoint of smoothing the inner surface of the cell. In this case, it is practical to add a small amount of pigment to the clear film and reduce the transmittance to about 70% in order to reduce the difference in transmittance from the colored portion. The pigment is not particularly limited as long as it is a generally available material having high chroma and high transmittance.

The light-shielding film 21 may be provided under the peripheral sealing material 14 in the case of a liquid crystal cell, or may be provided inside the peripheral sealing material 14 (to the liquid crystal layer side). When provided below the peripheral sealing material, the peripheral sealing material 14 is hidden by the light shielding film when viewed from the transparent substrate 12 on the light shielding film forming side, so that the effective area of the cell surface can be increased.

In this case, it is preferable that the end of the light-shielding film stays within the width of the peripheral sealing material over the entire circumference, from the viewpoint of preventing a decrease in sealing strength. For example, with such a design, the initial and high temperature humidity resistance tests (80 ° C., 90
%, 50 hours) after the seal strength is 5.6kg
f / 4.7 kgf may be reduced to 3.5 kgf and 2.3 kgf, respectively, by making the edge of the light shielding film protrude outside the sealing material (the side opposite to the liquid crystal layer).

Conventionally, when it is desired to widen the opening of the display surface, a black frame is often printed on the front polarizing plate surface by a screen printing method in order to hide the peripheral sealing material 14. However, by providing the light shielding film 21 under the peripheral sealing material 14, the printing step can be omitted, which can contribute to cost reduction. In order to more completely prevent light from leaking from the seal portion, a light-shielding material may be used as the peripheral seal material.

When the light-transmitting film 22 is provided on the light-shielding film 21 as in this embodiment, it is preferable that the light-transmitting film 22 be kept inside the peripheral sealing material 14. Also, the light shielding film 2
The design of the light-transmitting film 22 in a portion overlapping the light-shielding film 21
There is no effect when viewing the display from the side, but when observing from the side of the light transmitting film 22, the installation shape of the light transmitting film 22 can be visually recognized, albeit slightly.

Further, it is not preferable that the light transmitting film 22 is provided only in the display section, since the outline thereof is visible.
In order to avoid this, the design gap is preferably set to 0.5 mm or less so that the colors of the light transmitting films 22 do not overlap with each other and the interval is not widened.

When the display is viewed from the light-shielding film 21 side, since the borders of different colors are hidden by the light-shielding film 21, the width of the gap does not matter from the viewpoint of visibility, so that they overlap. May be designed. For example, this gap is 5 μm
In such a case, the coating of the photoresist for transparent electrode patterning may be incomplete at that part and disconnection may occur.Therefore, if there is enough uniformity in the gap in the cell, it is better to overlap Is preferred.

On the transparent substrate 12 side, the peripheral sealing material 1
In the case where the light shielding film 21 is provided below the transparent electrode 121,
Is formed on the light shielding film 21 and the light transmitting film 22. Since these films are insulating films having an insulation resistance of 10 ¹² Ω / □ or more, there is no need to provide a protective layer for insulation. If the resistance between the wirings is 10 ¹¹ Ω / □ or more, no bleeding phenomenon occurs when a liquid crystal cell is used, and there is no problem.

The color substrate thus formed has 23
At a substrate temperature of about 0 ° C., a transparent conductive film was formed by a sputtering method. The sheet resistance is set to an appropriate value depending on the pattern design of the element, but is approximately 100Ω / □ to 30Ω / □.
□ Preferably around. After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the display pattern portion, performing exposure and development, and then removing unnecessary portions of ITO with an etching solution Then, the resist was stripped off with an aqueous NaOH solution to form a transparent electrode 121.

As described above, the light-shielding film and the light-transmitting film material are:
Since the color substrate is exposed to an etching solution and a resist stripping solution during the manufacturing process, resistance to these chemical solutions is also required.

In the case of a liquid crystal cell observed from the light-shielding film 21 side, light is transmitted only in a portion without the light-shielding film, and a transparent electrode exists between the light-shielding film and the glass substrate even when observed by reflection. Therefore, although the routing pattern is not visible, the transparent substrate 11 facing the substrate on which the light shielding film 21 is provided is not provided.
When the cell is observed from the side and regular reflection occurs, the transparent electrode pattern wired on the surface of the light shielding film 21 becomes visible.

In order to make the routing of the transparent electrodes inconspicuous, it is preferable to set the gap between the neighboring transparent electrode routings to about 100 μm, and it is preferable to realize such a narrow line over a detailed pattern. If this is not possible due to design constraints, etc., as a rough guide,
The coverage of the transparent electrode may be 90% or more. It goes without saying that a higher ratio is preferable.

When there is room around the display section and the light-shielding film 21 is not provided under the peripheral sealing material 14, the light-shielding film may be formed after forming the transparent electrode pattern on the transparent substrate. In this case, the substrate 12 provided with the light shielding film 21
It is preferable that the transparent substrate 11 side on the opposite side be the display surface. That is, by doing so, the phenomenon in which the transparent electrode pattern is conspicuous at the time of non-lighting is suppressed, and a good product appearance can be obtained.

As for the opposing transparent substrate 11, an alkali preventing film and a transparent electrode were sequentially formed to form a transparent electrode substrate. It is preferable to use an alignment film having a pretilt angle of 1 to 1.5 ° for the transparent substrate 12 on which the light shielding film 21 and the light transmitting film 22 are formed. In the case of a TN element, it is known that the viewing angle can be increased by reducing the pretilt angle. However, since the light-shielding film provided by the conventional printing method is thick and the surface unevenness is severe, the From 1.5 °
A small pretilt angle could not be used because it would cause a reverse tilt domain. In the case of the light shielding film 21 provided by the method of the present invention, a pretilt angle of 1.5 ° or less can be applied. The kind of the alignment film having such a pretilt angle is not limited.

The thickness of the alignment film is preferably about 600 ° because it shows good alignment performance and has little effect on electro-optical characteristics. The opposing transparent substrate 11 has titania,
After forming an inorganic insulating film mixed with silica by a sol-gel method, it is preferable to form an alignment film and perform a rubbing treatment. The inorganic film is effective for preventing a short circuit between the surfaces.

In this embodiment, an in-plane spacer was sprayed on the transparent substrate 12 side, and a peripheral sealing material 14 was printed on the opposing transparent substrate 11 around the cells by screen printing. As the peripheral sealing material 14, a material mixed with conductive beads can be used as a transfer material in order to establish conduction between the transparent substrates 11 and 12. The conductive beads may be mixed only in a place where conduction is obtained, or may be mixed in the entire frame-shaped sealing material 14.

In addition, the center of the cell is likely to swell, and the cell gap is likely to be uneven (for example, when the distance between the sealing material and the display portion is 10 mm or more, or when the cell shape is substantially square. Cell, a low gap cell (for example, a cell gap of 5 μm or less), a cell in which a pressure sealing step is performed to eliminate unevenness in the cell gap, or a liquid crystal layer caused by external stress, shock, or vibration. (For example, ferroelectric liquid crystal and antiferroelectric liquid crystal), it is preferable to provide a pillar-shaped sealing material on at least a part of the portion corresponding to the light-shielding film. At this time, a sealing material of the same material as the peripheral sealing material is used. When conductive beads are mixed in the peripheral sealing material, the pillar-shaped sealing material is provided at a portion where the upper and lower electrodes do not face each other.

The transparent substrates 11 and 12 are opposed to each other,
After being cured through a thermocompression bonding process, the injection port, terminal portion, and the like were cut out, a nematic liquid crystal was injected into the cell by a vacuum injection method, and a UV-curable epoxy resin was applied to the injection port and sealed. Then, as in the conventional case, the transparent substrate 1
Polarizing plates 161 and 162 were disposed on the outer surfaces of the polarizing plates 1 and 12, respectively, and the backlight 17 was disposed on the rear surface of the polarizing plate 161 on the rear side.

As a display mode of the liquid crystal display device, TN and STN can be applied. In the case of TN, negative display and positive display can be realized by combination with a polarizing plate. However, combination with either mode is possible. Also, Δnd may be any design of about 0.48 μm, which is called a so-called first minimum, about 1.1 μm which is called a second minimum, or may be a design of a third minimum (about 1.7 μm) or more.

In the case of the TN in the negative mode, Δnd
Is about 0.48 μm, color unevenness tends to occur,
Although it was difficult to obtain good display performance, according to the present invention, since the uniformity of the cells is good, there is no particular limitation. In addition, when the positive mode is used, it is general to use Δnd of about 0.48 μm. However, the absorbance of the light shielding film needs to be 2.5 or more, and the thickness of the light shielding film is about 4 μm in the conventional printing method. Was needed. For this reason, since it is practically impossible for the cell gap to be less than 6 μm, in order to make Δnd about 0.48 μm, a special liquid crystal having Δn of 0.1 or less has to be selected.

On the other hand, in the present invention, the light-shielding film can be used even if it is 1 μm or less, and the cell gap can be 5 μm or less, and in some cases, 3 μm or less. As a result, the value of Δn can be increased, and the types of liquid crystal materials that can be used can be expanded, and the characteristics can be improved.

In the case of the positive mode, the viewing angle dependency can be reduced by providing a retardation plate between the polarizing plate and the transparent substrate. A typical retardation plate in which such an effect is recognized is a wide view film using discotic liquid crystal manufactured by Fuji Photo Film Co., Ltd.

It is common practice to produce a plurality of cells from a mother substrate by a so-called multi-pattern design. However, a pattern is formed on a pair of opposed substrates by a so-called F plate in which the observation side is a light-shielding film side. Alternatively, a so-called R plate design in which the non-observation side is the light-shielding film side may be alternately arranged. In this case, a transparent electrode designed to correspond to the F and R patterns of the light shielding film is formed. According to this, a bridging portion to be discarded does not occur in the portion between the liquid crystal cells to be cut out, the use efficiency of the substrate is improved, and the number of cuts for cutting can be reduced, so that the process is shortened,
It has the advantage of improving the yield.

In the present invention, as a light source of the illuminating means provided behind the polarizing plate on the back side, a normal tungsten lamp or EL can be used. However, from the viewpoint of taking advantage of the high saturation of the colored layer, RGB is used. A white light source such as an LED or CCT having the following spectrum is preferably employed.

[0070]

EXAMPLES Example 1 A light-shielding film material manufactured by Nippon Steel Chemical Co., Ltd. was spin-coated by using a substrate on which an alkali prevention film of silica was formed to a thickness of about 200 mm on a glass substrate by sputtering. V-259BKIS-H was applied to a thickness of about 1 μm. Then, exposure was performed at 300 mJ using a photomask that shielded a portion outside the display portion of the segment display and a portion of the peripheral sealing material provided around the liquid crystal cell, and development, drying, and baking were performed. The OD value of this film was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

Next, in order to perform a predetermined coloring, a photomask such that a light transmitting film is formed in the segment portion is formed.
Prepare red, green, and yellow color resists (V
-259R-H, V-259G-H, V-259Y-H
(All manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, followed by exposure, development, drying and baking. The insulation resistance value of each of the obtained light transmitting films was 3 × 10 ¹⁴ Ω / □. These light-transmitting films are formed in a portion slightly smaller than the outer shape of the cell so as not to cover the peripheral sealing material, and a gap of 0.3 m is set so that the colors do not overlap each other.
m.

The color substrate thus formed is
An ITO transparent conductive film of about 1000 ° was formed at a temperature of 30 ° C. by a sputtering method. The sheet resistance was about 30Ω / □. After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed.
Unnecessary portions of ITO are removed with an etchant, and Na
The resist was peeled off with an OH aqueous solution to form a transparent electrode. On the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed.

On the substrate on which the light shielding film and the light transmitting film are formed,
Using a predetermined alignment film having a pretilt angle of 1.3 °, a film was formed by transfer printing so as to have a thickness of about 600 °. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method. Thereafter, an alignment film was similarly formed and baked, and both substrates were rubbed so that the twist angle was 90 °.

An in-plane spacer made by Sekisui Fine Chemical Co., Ltd. having a diameter of 6 μm is sprayed on one substrate, and a Structural Bond made by Mitsui Chemicals, Inc. is screen-printed around the liquid crystal cell as a peripheral sealing material on the opposing substrate. Printed by law. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added in order to establish conduction between the top and bottom of the substrate.
Since this sealing material was formed on the light-shielding film, it was in a position almost invisible from the light-shielding film side.

After these substrates are opposed to each other and cured through a thermocompression bonding process to cut out an injection port and a terminal portion, a nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed.

When the variation in the gap of each segment was measured, the variation was within a maximum of about 0.3 μm, and a cell having good uniformity was formed. Then, a set of polarizing plates was adhered on both sides of the substrate at a predetermined angle so that the polarizing axes became parallel to complete a color liquid crystal display cell.

The cell thus prepared was driven at 1/8 duty, and a back light using a CCT having a spectrum of three colors of RGB as a light source was installed on the back surface. Observation was made from the side where the light shielding film was formed. The viewing angle was wide and good visibility was shown.

Comparative Example 1 ITO formed on glass
The transparent conductive film was patterned, and a black pigment-dispersed ink was offset-printed to form a light-shielding film with a thickness of 2 μm on one substrate so that the light-shielding film was formed inside the display portion of the segment and inside the seal. . The OD value of this film was 1.
7. The insulation resistance value was 3 × 10 ¹³ Ω / □. On the opposing substrate, a light transmitting film was formed at a predetermined position with color ink by a screen printing method. An alignment film having a pretilt angle of 1.3 ° was formed on these substrates, rubbing was performed so as to have a twist angle of 90 °, and cells were formed via 6 μm in-plane spacers. Thereafter, a nematic liquid crystal was injected and sealed.

After attaching the polarizing plate, it was driven at 1/8 duty, a backlight of a tungsten lamp was installed on the back surface, and the viewing angle was slightly narrow when observed from the printing side of the light shielding film. When the edge portion of the segment was observed finely, a domain was generated, and the original characteristics were not obtained. When the cell gap variation was measured,
It can be seen that there is a maximum variation of 2.2 μm in the plane,
This was also the cause of the narrow viewing angle. Further, when observed under direct sunlight, light scattering was thought to be caused by the printed pigment particles on the cell surface, and the contrast was also reduced.

Example 2 A light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd. was spin-coated on a glass substrate on which an alkali prevention film of silica was formed to a thickness of about 200 mm by sputtering. -259BKIS-H is applied to a thickness of about 1 [mu] m, and exposed to light of 300 mJ using a photomask that shields a portion outside a display portion of a segment display and a portion of a peripheral sealing material provided around a liquid crystal cell from light. And developed, dried and baked. OD of this membrane
The value was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

The substrate having a light-shielding film formed in this manner was sputtered at a temperature of 230.degree.
An O transparent conductive film was formed. The sheet resistance was about 10Ω / □. After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and then unnecessary portions of ITO are removed with an etching solution. Then, the resist was stripped with an aqueous NaOH solution to form a transparent electrode. The opposite substrate also has an alkali prevention film, ITO
Were sequentially formed, and a transparent electrode was similarly formed.

On the substrate on which the light-shielding film was formed, a predetermined alignment film having a pretilt angle of about 2 ° was formed by transfer printing to a thickness of about 600 °. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method. next,
Similarly, an alignment film is formed and baked, and the two substrates have a twist angle of 9
Rubbing was performed at 0 °.

An in-plane spacer of 5 μm diameter made by Sekisui Fine Chemical Co., Ltd. was sprayed on one side of the substrate, and a thermosetting epoxy resin, Structural Bond of Mitsui Chemicals, Inc. was used as a peripheral sealing material on the opposing substrate. Printing was performed around the cell by a screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for establishing conduction between the top and bottom of the substrate, and 5% of glass fiber for maintaining a sealing gap was added. Since this peripheral sealing material is formed on the light-shielding film, the position is almost invisible from the light-shielding film side.

After the substrates are opposed to each other and cured through a thermocompression bonding process to cut out an injection port and terminal portions, a nematic liquid crystal having a Δn of 0.077 is injected by a vacuum injection method, and a UV curable liquid crystal is injected into the injection port. And sealed. When the gap width of each segment was measured, it was about 6 μm, which was equal to the sum of the thicknesses of the in-plane spacer and the light-shielding film, and it was confirmed that the spacer did not sink into the light-shielding film. The measured Δnd of this cell was 0.46. The in-plane gap deviation was also within a deviation of about 0.3 μm at the maximum, and cells with good uniformity were formed.

After that, a pair of polarizing plates was combined on both sides of the substrate so that the polarizing axes became parallel, and they were attached at a predetermined angle to complete a liquid crystal display cell. The cell thus prepared was driven at a duty of 1/2, a backlight of a tungsten lamp was provided on the back surface, and the cell was observed from the side where the light shielding film was formed.
00: 1 was achieved, and it was confirmed that the film had good visibility.

Comparative Example 2 ITO formed on glass
The transparent conductive film was patterned, and a light-shielding film was formed to a thickness of 4 μm by offset printing so that a light-shielding film was formed on one of the substrates, inside the display portion of the segment and inside the seal. The OD value of this light-shielding film was 2.5. Along with the opposing substrate, these substrates have a pretilt angle of 2
Was formed, rubbed so as to have a twist angle of 90 °, and a cell was formed via a 6 μm in-plane spacer.

Thereafter, the same nematic liquid crystal as in Example 2 was injected and sealed. The injection required four times as long as in Example 2. Further, when the gap width and the uniformity were confirmed after the sealing, the gap width was 6.2 μm, and it was found that the in-plane spacer was largely submerged in the printed light shielding film. In addition, a maximum of 2.2 μm in the plane
It was found that there was variation in the gap.

After attaching the polarizing plate, it was driven at 1/2 duty, a backlight of a tungsten lamp was installed on the back surface, and the front contrast was 150: 1 on average when observed from the printing side of the light shielding film. However, due to the non-uniformity of the gap, a portion of 200: 1 or 100:
There was one part. In addition, when observed under direct sunlight, scattering occurred on the cell surface, and the contrast was slightly reduced.

Example 3 A mother substrate in which a plurality of cells of 80 mm × 80 mm were laid out using a substrate having an alkali prevention film of silica formed on a glass substrate to a thickness of about 200 ° by a sputtering method as follows. Manufactured by. That is, the light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd.
-259BKIS-H is applied to a thickness of about 1 [mu] m, and exposed to light of 300 mJ using a photomask that shields a portion outside a display portion of a segment display and a portion of a peripheral sealing material provided around a liquid crystal cell from light. And developed, dried and baked. The OD value of this film was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

The substrate having a light-shielding film formed in this manner was sputtered at a temperature of 230.degree.
An O transparent conductive film was formed. The sheet resistance was about 10Ω / □. After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and then unnecessary portions of ITO are removed with an etching solution. Then, the resist was stripped with an aqueous NaOH solution to form a transparent electrode. The opposite substrate also has an alkali prevention film, ITO
Were sequentially formed, and a transparent electrode was similarly formed.

On the substrate on which the light-shielding film was formed, a predetermined orientation film having a pretilt angle of about 2 ° was formed to a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method. next,
Similarly, an alignment film is formed and baked, and the two substrates have a twist angle of 9
Rubbing was performed at 0 °.

An in-plane spacer made of Sekisui Fine Chemical Co., Ltd. having a diameter of 4 μm was sprayed on one side of the substrate, and a structuring bond made of a thermosetting epoxy resin, Mitsui Chemicals, Inc. was used as a sealing material on the opposite substrate. And a predetermined portion covered with a light shielding film and not facing the upper and lower electrodes by a screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for establishing conduction between the top and bottom of the substrate, and 5% of glass fiber for maintaining a sealing gap was added. Since this sealing material was formed on the light shielding film, it was almost invisible from the light shielding film side.

After these substrates are opposed to each other and cured through a thermocompression bonding process to cut out an injection port, a terminal portion, etc., a nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the gap width of each segment was measured, it was about 5 μm, which was almost equal to the sum of the thickness of the in-plane spacer and the thickness of the light shielding film, and it was confirmed that the spacer did not sink into the light shielding film. . The in-plane gap deviation was also within a maximum deviation of about 0.2 μm, and a cell having excellent gap uniformity between the central portion and the peripheral portion was formed.

Next, a pair of polarizing plates are combined on both sides of the substrate so that the polarizing axes are parallel to each other, attached at a predetermined angle, and further provided on the back side of the backlight at predetermined positions according to display segments. Then, a color-printed plastic sheet was attached to the sheet, and a liquid-crystal display cell was completed.

The cell thus prepared was driven at a duty of 1/2, a backlight of a tungsten lamp was provided on the back surface, and observation was made from the side where the light-shielding film was formed. About 30
0: 1 was achieved, and it was confirmed that cells having uniform characteristics were obtained.

Example 4 A mother substrate in which a plurality of cells of 80 mm × 80 mm were laid out using a substrate having a glass substrate on which an alkali preventing film of silica was formed to a thickness of about 200 ° by a sputtering method, in the following procedure: Manufactured by. That is, the light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd.
-259BKIS-H is applied to a thickness of about 1 [mu] m, and exposed to light of 300 mJ using a photomask that shields a portion outside a display portion of a segment display and a portion of a peripheral sealing material provided around a liquid crystal cell from light. And developed, dried and baked. The OD value of this film was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

The substrate having a light-shielding film formed in this manner was sputtered at a temperature of 230.degree.
An O transparent conductive film was formed. The sheet resistance was about 10Ω / □. After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and then unnecessary portions of ITO are removed with an etching solution. Then, the resist was stripped with an aqueous NaOH solution to form a transparent electrode. The opposite substrate also has an alkali prevention film, ITO
Were sequentially formed, and a transparent electrode was similarly formed.

On the substrate on which the light-shielding film was formed, a predetermined orientation film having a pretilt angle of about 2 ° was formed to a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method. next,
Similarly, an alignment film is formed and baked, and the two substrates have a twist angle of 9
Rubbing was performed at 0 °.

On one side of the substrate, a 4 μm diameter in-plane spacer made by Sekisui Fine Chemical Co., Ltd. was sprayed. On the opposing substrate, a thermosetting epoxy resin, Structural Bond made by Mitsui Chemicals, Inc. was used as a peripheral sealing material. Printing was performed around the cell by a screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for establishing conduction between the top and bottom of the substrate, and 5% of glass fiber for maintaining a sealing gap was added. Since this sealing material is formed on the light shielding film,
The position was almost invisible from the light shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding process, cut out of an injection port, a terminal portion, and the like. Nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the gap width of each segment was measured, it was about 5 μm, which was almost equal to the sum of the thickness of the in-plane spacer and the thickness of the light shielding film, and it was confirmed that the spacer did not sink into the light shielding film. . The in-plane gap deviation was also within a deviation of about 0.5 μm at the maximum, and a cell having a slightly large deviation was formed in the gap between the central part and the peripheral part.

Next, a pair of polarizing plates was combined on both sides of the substrate so that the polarization axes became parallel, and the plates were attached at a predetermined angle to complete a liquid crystal display cell. The cell thus produced was driven at a duty of 1/2, a backlight of a tungsten lamp was installed on the back surface, and a front contrast ratio of 250: 1 was achieved when observed from the side where the light shielding film was formed. Visibility without practical problems was confirmed.

Comparative Example 3 ITO formed on glass
The transparent conductive film was patterned, and a black pigment-dispersed ink was offset-printed to form a light-shielding film with a thickness of 4 μm so that the light-shielding film was formed on one of the substrates so that the light-shielding film was formed inside the display portion of the segment and the seal. . This light-shielding film had an OD value of 3.4 and an insulation resistance value of 1.5 × 10 ¹³ Ω / □. An alignment film having a pretilt angle of 2 ° was formed on these substrates together with the opposing substrates, rubbed to have a twist angle of 90 °, and cells were formed via 4 μm in-plane spacers.

Thereafter, the same nematic liquid crystal as in Example 3 was injected. When the gap width and the uniformity were confirmed after the injection, the gap width was 6 μm, and it was found that color unevenness due to unevenness of the gap occurred at the center and the periphery. At this time, it was found that there was a maximum gap variation of 2.6 μm in the plane.

After the cell after the injection was sealed under pressure with a load of 0.2 kg / □, the gap width was confirmed again. The gap width was reduced to 5.5 μm, and the in-plane gap deviation was 1.0 μm. After attaching the polarizing plate, 1 /
When driven at 2 duties, a backlight of a tungsten lamp was installed on the back surface, and observed from the printing side of the light-shielding film, the front contrast was 200: 1. In addition, color unevenness due to gap unevenness occurred in some places in appearance.

Example 5 An alkali prevention film of silica was formed on a glass substrate to a thickness of about 200 ° by a sputtering method.
Subsequently, at a temperature of 300 ° C., about 2000
An ITO transparent conductive film of Å was formed. The sheet resistance is about 10Ω
/ □. After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and then unnecessary portions of ITO are removed with an etching solution. ,
Further, the resist was peeled off with an aqueous NaOH solution to prepare an electrode substrate.

Using this substrate, a light-shielding film material V-259BKIS-H manufactured by Nippon Steel Chemical Co., Ltd.
Coating to a thickness of .mu.m, exposure to 300 mJ is performed using a photomask that shields the display area of the segment display and the area inside the peripheral sealing material provided around the liquid crystal cell, and develops, dries, and bake. Was performed. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10 ¹⁴ Ω /
It was □. The opposite substrate is an alkali prevention film, ITO
Transparent conductive films were sequentially formed, and an electrode substrate was similarly formed.

On the substrate on which the light-shielding film was formed, a predetermined alignment film having a pretilt angle of about 2 ° was formed by transfer printing so as to have a thickness of about 600 °. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method. And
Similarly, an alignment film is formed and baked, and the two substrates have a twist angle of 9
Rubbing was performed at 0 °.

An in-plane spacer having a diameter of 5 μm manufactured by Sekisui Fine Chemical Co., Ltd. was sprayed on one side of the substrate, and a thermosetting epoxy resin, Struct Bond manufactured by Mitsui Chemicals, Inc. was used as a peripheral sealing material on the opposing substrate. Was printed around the liquid crystal cell by a screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. is added as a transfer material for establishing conduction between the top and bottom of the substrate, and in order to maintain the sealing gap, in this case, the diameter is about 6 μm, which is larger by the thickness of the light shielding film. Was mixed. Since this sealing material was formed outside the light-shielding film, it was in a visible position from the light-shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding process, cut out of an injection port, a terminal portion, and the like. Nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the gap width of each segment was measured, it was about 6 μm, which was almost equal to the sum of the thickness of the in-plane spacer and the thickness of the light shielding film, and it was confirmed that the spacer did not sink into the light shielding film. . The in-plane gap deviation was also within a deviation of about 0.3 μm at the maximum, and cells with good uniformity were formed.

Next, a pair of polarizing plates was combined on both sides of the substrate so that the polarizing axes became parallel, and they were adhered at a predetermined angle to complete a liquid crystal display cell. The cell thus prepared was driven at 1/2 duty, a backlight of a tungsten lamp was installed on the back surface, and the cell was observed from the substrate surface opposite to the side on which the light shielding film was formed. : 1 was achieved, and a seal was visible around the cell. Thus, although the effective display area was slightly small, it was confirmed that the cell had good visibility.

Example 6 A light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd. was spin-coated on a glass substrate on which an alkali prevention film of silica was formed to a thickness of about 200 mm by sputtering. -259BKIS-H is applied to a thickness of about 1 μm, and a 300 mJ exposure is performed using a photomask that shields the display area of the segment display and the area outside the peripheral sealing material provided around the liquid crystal cell from light. Then, development, drying and baking were performed. OD of this membrane
The value was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

Next, in order to perform predetermined coloring, three photomasks for forming a light-transmitting film in the segment portion are prepared, and red, green, and yellow color resists (V-resist, respectively) are prepared.
259R-H, V-259G-H, V-259Y-H
(All manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, followed by exposure, development, drying and baking. The insulation resistance value of each of the obtained light transmitting films was 3 × 10 ¹⁴ Ω / □. These light-transmitting films were formed in portions slightly smaller than the outer shape of the cell so as not to cover the peripheral sealing material, and a gap of 0.3 mm was provided so that the colors did not overlap each other.

The color substrate formed in this manner has 23
An ITO transparent conductive film of about 1000 ° was formed at a temperature of 0 ° C. by a sputtering method. The sheet resistance was about 30Ω / □.
After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and then unnecessary portions of ITO are removed with an etching solution. And NaOH
The resist was stripped with an aqueous solution to prepare an electrode substrate.
On the opposite substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and an electrode substrate was similarly formed.

A predetermined alignment film having a pretilt angle of 2 ° was formed on the substrate on which the light-shielding film and the light-transmitting film were formed, and was formed to have a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method.
Then, similarly, an orientation film was formed and baked, and both substrates were rubbed so that the twist angle was 70 °.

An in-plane spacer having a diameter of 5 μm manufactured by Sekisui Fine Chemical Co., Ltd. was sprayed on one side of the substrate, and a thermosetting epoxy resin, Structural Bond manufactured by Mitsui Chemicals, Inc. was used as a peripheral sealing material on the opposing substrate. Printing was performed around the cell by a screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for establishing conduction between the top and bottom of the substrate, and 5% of glass fiber for maintaining a sealing gap was added. Since this sealing material is formed on the light shielding film,
The position was almost invisible from the light shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding process, cut out of an injection port, a terminal portion, and the like. Nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the gap width of each segment was measured, it was about 6 μm, which was almost equal to the sum of the thickness of the in-plane spacer and the thickness of the light shielding film, and it was confirmed that the spacer did not sink into the light shielding film. The in-plane gap deviation was also within a deviation of about 0.3 μm at the maximum, and cells with good uniformity were formed.

Thereafter, a pair of polarizing plates was combined on both sides of the substrate so that the crossing angle of the polarizing axes was 70 °, and the plates were adhered at a predetermined angle to complete a liquid crystal display cell. The cell thus created is driven at 1/2 duty,
When a backlight using a white LED having an RGB spectrum was installed on the back surface and observed from the side where the light-shielding film was formed, a contrast ratio of 300: 1 was achieved in a direction inclined by 30 ° from the front to the main viewing angle direction, It was confirmed that it had good visibility. In addition, since the light-transmitting film was provided on the inner surface, good display performance without color shift was observed even when viewed obliquely.

Example 7 A light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd. was spin-coated on a glass substrate on which an alkali prevention film of silica was formed to a thickness of about 200 mm by sputtering. -259BKIS-H is applied to a thickness of about 1 μm, and a 300 mJ exposure is performed using a photomask that shields the display area of the segment display and the area outside the peripheral sealing material provided around the liquid crystal cell from light. Then, development, drying and baking were performed. OD of this membrane
The value was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

The substrate having a light-shielding film formed in this manner was sputtered at a temperature of 230.degree.
An O transparent conductive film was formed. The sheet resistance was about 10Ω / □. After applying a photoresist to this substrate, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and then unnecessary portions of ITO are removed with an etching solution. Then, the resist was stripped with an aqueous NaOH solution to form a transparent electrode. The opposite substrate also has an alkali prevention film, ITO
A transparent conductive film was sequentially formed, and a transparent electrode was formed in the same manner.

On the substrate on which the light-shielding film was formed, a predetermined alignment film having a pretilt angle of about 2 ° was formed by transfer printing so as to have a thickness of about 600 °. In order to form an inorganic insulating film in which titania and silica were mixed, a printed film was formed by a sol-gel method on the opposing substrate. Then, similarly, an alignment film is formed and baked, and the two substrates have a twist angle of 90 °.
° was rubbed.

An in-plane spacer made of Sekisui Fine Chemical Co., Ltd. having a diameter of 5 μm was sprayed on one side of the substrate, and Structural Bond made of Mitsui Chemicals, a thermosetting epoxy resin, was used as a peripheral sealing material on the opposing substrate. Was printed around the liquid crystal cell by a screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. are added as a transfer material for establishing conduction between the top and bottom of the substrate, and 5% of glass fiber for maintaining a sealing gap.
Was added. Since this sealing material was formed on the light shielding film, it was almost invisible from the light shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding process, cut out of an injection port, a terminal portion, and the like. Nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the gap width of each segment was measured, it was about 6 μm, which was almost equal to the sum of the thickness of the in-plane spacer and the thickness of the light shielding film, and it was confirmed that the spacer did not sink into the light shielding film. The gap deviation in the plane is 0.3μ at the maximum.
The deviation was within about m, and cells having good uniformity were formed.

Thereafter, a wide-angle view film, which is a viewing angle widening film manufactured by Fuji Photo Film Co., Ltd., was installed on both sides, and a set of polarizing plates was combined so that the polarizing axes became parallel.
It was attached at a predetermined angle to complete a liquid crystal display cell.

When the cell thus produced was driven by static driving and observed from the substrate side on which the light-shielding film was formed, a contrast ratio of 300: 1 was achieved in the front, and furthermore, a 30 ° inclination from the front in the left-right direction. As a result, it was confirmed that the device had good visibility showing a contrast of 200: 1 or more.

Example 8 A light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd. was spin-coated on a glass substrate on which an alkali prevention film of silica was formed to a thickness of about 200 mm by sputtering. -259BKIS-H is applied to a thickness of about 1 μm, and a 300 mJ exposure is performed using a photomask that shields the display portion of the segment display and the portion outside the peripheral seal material provided around the liquid crystal cell from light. Then, development, drying and baking were performed. OD of this membrane
The value was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

Next, in order to perform a predetermined coloring, a photomask such that a light-transmitting film is formed in the segment portion is formed.
Prepare red, green, and yellow color resists (V
-259R-H, V-259G-H, V-259Y-H
(All manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, followed by exposure, development, drying and baking. The insulation resistance value of each of the obtained light transmitting films was 3 × 10 ¹⁴ Ω / □. These translucent films were formed in a portion slightly smaller than the outer shape of the cell so as not to cover the seal, and a gap of 0.3 mm was provided so that the colors did not overlap each other.

The color substrate thus formed has 23
An ITO transparent conductive film of about 1000 ° was formed at a temperature of 0 ° C. by a sputtering method. The sheet resistance was about 30Ω / □.
After applying a photoresist to this substrate, exposure and development are performed using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, and then unnecessary portions of ITO are removed with an etchant. And NaOH
The resist was peeled off with an aqueous solution to form a transparent electrode. On the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed.

A predetermined orientation film having a pretilt angle of 5 ° was formed on the substrate on which the light-shielding film and the light-transmitting film were formed, and was formed to have a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method.
Then, similarly, an alignment film was formed and baked, and both substrates were rubbed so that the twist angle was 240 °.

An in-plane spacer made of Sekisui Fine Chemical Co., Ltd. having a diameter of 6 μm was sprayed on one substrate, and a Structural Bond made by Mitsui Chemicals, Inc. was screen-printed on the periphery of the liquid crystal cell as a peripheral sealing material on the opposing substrate. Printed by law. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for establishing conduction between the upper and lower sides of the substrate. Since this sealing material was formed on the light shielding film, it was almost invisible from the light shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding process, cut out of an injection port, a terminal portion, and the like. Nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the variation in the gap width of each segment was measured, the variation was within a maximum of about 0.3 μm, and a cell having good uniformity was formed.

Thereafter, a biaxially-stretched retardation plate having a predetermined retardation value is installed on both sides of the substrate, and a pair of polarizing plates is attached to the outside thereof so that the polarization axes are orthogonal to each other. A color liquid crystal display cell was completed. The cell thus produced was driven at 1/32 duty, a backlight of a tungsten lamp was installed on the back surface, and observed from the side where the light shielding film was formed. Furthermore, the visual angle was wider and good visibility was exhibited.

Example 9 A light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd. was spin-coated on a glass substrate on which an alkali prevention film of silica was formed to a thickness of about 200 mm by sputtering. -259BKIS-H is applied to a thickness of about 1 μm, and a 300 mJ exposure is performed using a photomask that shields the display area of the segment display and the area outside the peripheral sealing material provided around the liquid crystal cell from light. Then, development, drying and baking were performed. OD of this membrane
The value was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

Next, in order to perform predetermined coloring, three photomasks for forming a light-transmitting film in the segment portion are prepared, and red, green, and yellow color resists (V-resist respectively) are prepared.
259R-H, V-259G-H, V-259Y-H
(All manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, followed by exposure, development, drying and baking. The insulation resistance value of each of the obtained light transmitting films was 3 × 10 ¹⁴ Ω / □. These light-transmitting films were formed in portions slightly smaller than the outer shape of the cell so as not to cover the seal, and a gap of 0.3 mm was provided so that the colors did not overlap each other.

The color substrate formed in this manner has 23
An ITO transparent conductive film of about 1000 ° was formed at a temperature of 0 ° C. by a sputtering method. The sheet resistance was about 30Ω / □.
After applying a photoresist to this substrate, exposure and development are performed using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, and then unnecessary portions of ITO are removed with an etchant. And NaOH
The resist was peeled off with an aqueous solution to form a transparent electrode. On the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed.

A predetermined orientation film having a pretilt angle of 5 ° was formed on the substrate on which the light-shielding film and the light-transmitting film were formed, and was formed to have a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method.
Then, similarly, an alignment film was formed and baked, and both substrates were rubbed so that the twist angle was 240 °.

An in-plane spacer made of Sekisui Fine Chemical Co., Ltd. having a diameter of 6 μm was sprayed on one substrate, and a Structural Bond manufactured by Mitsui Chemicals, Inc. was screen-printed around the liquid crystal cell as a peripheral sealing material on the opposing substrate. Printed in. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for establishing conduction between the upper and lower sides of the substrate. Since this sealing material was formed on the light shielding film, it was almost invisible from the light shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding step, cut out of an injection port, a terminal portion, and the like. Nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the variation in the gap width of each segment was measured, the variation was within a maximum of about 0.3 μm, and a cell having good uniformity was formed.

Thereafter, a uniaxial retardation plate is set on both sides of the substrate at a predetermined angle, and a pair of polarizing plates is pasted on the outside thereof at a predetermined angle to complete a color liquid crystal display cell. Was. The cell thus prepared was driven at 1/32 duty, a white CCT backlight having an RGB spectrum was installed on the back surface, and observed from the side where the light shielding film was formed. Compared to the TN method, the viewing angle was wider and good visibility was exhibited.

Example 10 A light-shielding film material V manufactured by Nippon Steel Chemical Co., Ltd. was spin-coated on a glass substrate on which an alkali prevention film of silica was formed to a thickness of about 200 mm by sputtering. -259BKIS-H is applied to a thickness of about 1 μm, and a 300 mJ exposure is performed using a photomask that shields the display area of the segment display and the area outside the peripheral sealing material provided around the liquid crystal cell from light. Then, development, drying and baking were performed. OD of this membrane
The value was 3.0 and the insulation resistance value was 1 × 10 ¹⁴ Ω / □.

As the pattern, a so-called F plate in which the observation side is on the light shielding film side and a so-called R plate in which the non-observation side is on the light shielding film side were alternately arranged. Then, in order to perform predetermined coloring, three photomasks for forming a light-transmitting film in the segment portion are prepared, and red, green, and yellow color resists (V-259R-H, V-259G, respectively) are prepared.
-H, V-259Y-H (all manufactured by Nippon Steel Chemical Co., Ltd.))
Was sequentially applied by spin coating, and exposure, development, drying, and baking were performed. The insulation resistance value of each of the obtained light transmitting films was 3 × 10 ¹⁴ Ω / □. These translucent films were formed in portions slightly narrower than the outer shape of the cell so as not to cover the seal, and a gap of 0.3 mm was provided so that the colors did not overlap each other.

The color substrate formed in this manner has 23
An ITO transparent conductive film of about 1000 ° was formed at a temperature of 0 ° C. by a sputtering method. The sheet resistance was about 30Ω / □.
After a photoresist is applied to the substrate, exposure and development are performed using a photomask in which wiring portions are shielded so that a voltage is applied to a segment display portion designed to correspond to the F and R patterns of the light-shielding film. After that, unnecessary portions of ITO were removed with an etchant, and the resist was peeled off with a NaOH aqueous solution to form a transparent electrode. IT
The gap between the O wires was designed to be at least about 70 μm, and the ITO coverage on the entire surface was set to be 90% or more.

On the opposing substrate, an alkali preventing film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed using a photomask in which F and R patterns were alternately arranged. The thickness of the wiring is not particularly narrowed so that the necessary wiring resistance is as wide as possible.

A predetermined alignment film having a pretilt angle of 1.3 ° was formed on the substrate on which the light-shielding film and the light-transmitting film were formed, and was formed to have a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method. Then, similarly, an alignment film was formed and baked, and both substrates were rubbed so that the twist angle was 90 °.

An in-plane spacer having a diameter of 6 μm made by Sekisui Fine Chemical Co., Ltd. was sprayed on one side of the substrate, and a Structural Bond made by Mitsui Chemicals, Inc. was screened around the liquid crystal cell as a peripheral sealing material on the opposing substrate. Printed by the printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for establishing conduction between the upper and lower sides of the substrate. Since this sealing material was formed on the light shielding film, it was almost invisible from the light shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding step, cut out of an injection port, a terminal portion, and the like. Nematic liquid crystal is injected by a vacuum injection method, and a UV-curable epoxy resin is applied to the injection port. And sealed. When the variation in the gap width of each segment was measured, the variation was within a maximum of about 0.3 μm, and a cell having good uniformity was formed. Thereafter, a set of polarizing plates was attached to both sides of the substrate at a predetermined angle so that the polarizing axes became parallel, thereby completing a color liquid crystal display cell.

A back light was installed on the back surface of the cell thus prepared, and the cell was driven at 1/8 duty. Observation from the side of the substrate on which the light-shielding film was formed revealed that the viewing angle was almost as wide as in Example 1 and good visibility was exhibited. In addition, even when observed from the opposite side of the light-shielding film, the visibility comparable to that of the light-shielding film was obtained under a normal indoor environment. Under direct sunlight, although the surface reflection was slightly strong, no routing pattern was seen, and sufficient performance for practical use was obtained.

Example 11 A silica substrate was coated on a glass substrate.
An anti-corrosion film is formed to a thickness of about 200 mm by sputtering.
80mm × 80mm liquid crystal panel using motherboard
Were manufactured by the following procedure.
That is, Nippon Steel Chemical Co., Ltd.
Light-shielding film material V-259BKIS-H is about 0.5 μm thick
And the display part of the segment display and the liquid crystal cell
Part outside the seal part provided around
Exposure of 300mJ using a photomask
Then, development, drying and baking were performed. OD value of this film
Is 1.5, insulation resistance value is 2 × 10 ¹⁴Ω / □.

On this substrate, a transparent conductive film of about 1000 ° was formed at a temperature of 230 ° C. by a sputtering method. The sheet resistance was about 30Ω / □. Furthermore, after applying a photoresist, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and unnecessary portions of ITO are removed with an etchant.
Further, the resist was peeled off with an aqueous NaOH solution to prepare an electrode substrate.

The opposite substrate is made of an alkali preventing film, ITO
Were sequentially formed, and an electrode substrate was similarly formed. A polyimide-based alignment film material was used for the substrate on which the light-shielding film was formed, and a film was formed to a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed, a printed film was formed by a sol-gel method on the opposing substrate. After that, an alignment film was similarly formed and baked, and both substrates were rubbed in parallel in the same direction.

A sphere having a diameter of 1.5 μm manufactured by Catalyst Chemical Industry Co., Ltd. was sprayed on one side of the substrate, and a structuring bond manufactured by Mitsui Chemicals, Inc. was applied to the opposing substrate around the liquid crystal cell and the display section. Was printed by a screen printing method so as to be arranged in a pillar shape on a portion covered with a light shielding film. In the part where the electrode for taking the conduction of the opposing substrate is provided,
A seal material mixed with conductive beads was printed to make it conductive.
Since this sealing material was formed on the light shielding film, it was almost invisible from the light shielding film side.

These substrates are opposed to each other, cured through a thermocompression bonding process, and cut out from the injection port, the terminal portion, and the like. Then, the liquid crystal cell and the liquid crystal injection boat are heated so that the antiferroelectric liquid crystal is isotropically injected into a vacuum. Inject by the method, UV into the inlet
A curable epoxy resin was applied and sealed. When the variation in the gap of each segment was measured, it was within a deviation of about 0.1 μm at the maximum, and a cell having good uniformity was formed. Note that the used antiferroelectric liquid crystal has a phase series of “isotropic-SmA-SmCA * -crystal”, and has an antiferroelectric (SmCA) in a temperature range of about −10 ° C. to about + 60 ° C. This is a blended product showing *).

After that, a set of polarizing plates is attached at a predetermined angle so that the polarization axes are orthogonal to both sides and the light is blocked when no voltage is applied, thereby completing the antiferroelectric liquid crystal display panel. Was. On the back of the cell thus created, C
When a CT backlight was installed and 16 lines were driven by line-sequential writing drive utilizing the memory property, the viewing angle was wide and good visibility was exhibited.

Example 12 A model in which a plurality of 80 mm × 80 mm liquid crystal panels were laid out on a glass substrate using a mother substrate in which an alkali prevention film of silica was formed to a thickness of about 200 mm by a sputtering method was prepared as follows. Manufactured by the procedure.
That is, a light-shielding film material V-259BKIS-H manufactured by Nippon Steel Chemical Co., Ltd. is applied to a thickness of about 0.5 μm by a spin coating method, and a display part for segment display and a seal part provided around the liquid crystal cell are applied. Exposure was performed at 300 mJ using a photomask that shields light from the outer portion, and development, drying, and baking were performed. OD of this membrane
The value was 1.5, and the insulation resistance value was 2 × 10 ¹⁴ Ω / □.

On this substrate, a transparent conductive film of about 1000 ° was formed at a temperature of 230 ° C. by a sputtering method. The sheet resistance was about 30Ω / □. Furthermore, after applying a photoresist, using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion, exposure and development are performed, and unnecessary portions of ITO are removed with an etchant. The resist was peeled off with an aqueous NaOH solution to form an electrode substrate.

The opposite substrate is made of an alkali preventing film, ITO
Were sequentially formed, and an electrode substrate was similarly formed. A polyimide-based alignment film material was used for the substrate on which the light-shielding film was formed, and a film was formed to a thickness of about 600 ° by transfer printing. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, printing was performed by a sol-gel method. After that, an alignment film was similarly formed and baked, and both substrates were rubbed in parallel in the same direction.

A sphere having a diameter of 1.5 μm manufactured by Catalyst Kasei Kogyo Co., Ltd. was sprayed on one of the substrates, and a structuring bond manufactured by Mitsui Chemicals, Inc. was applied to the opposing substrate around the liquid crystal cell and the display section. Was printed by a screen printing method so as to be arranged in a pillar shape on a portion covered with a light shielding film. In the part where the electrode for taking the conduction of the opposing substrate is provided,
A seal material mixed with conductive beads was printed to make it conductive.
Since this sealing material was formed on the light shielding film, it was almost invisible from the light shielding film side.

After these substrates are opposed to each other and cured through a thermocompression bonding process to cut out an injection port, a terminal portion, and the like, the liquid crystal cell and the liquid crystal injection boat are heated, and the ferroelectric liquid crystal is converted into a nematic or isotropic state to form a vacuum. It was injected by an injection method, and a UV-curable epoxy resin was applied to the injection port and sealed. When the variation in the gap of each segment was measured, it was within a deviation of about 0.1 μm at the maximum, and a cell having good uniformity was formed. The ferroelectric liquid crystal used was "isotropic-N-SmA-SmC *".
It is a blended product having a “crystal” phase series and exhibiting ferroelectricity (SmC *) in a temperature range of about −10 ° C. to about + 60 ° C.

Thereafter, a set of polarizing plates is set at a predetermined angle with respect to the alignment direction of the liquid crystal and attached so that the polarization axes are orthogonal to both sides and switching between light shielding and light transmission is performed by applying a voltage. The ferroelectric liquid crystal display panel was completed. A CCT backlight was set on the back surface of the cell thus prepared, and 16 lines were driven by line-sequential writing drive utilizing memory properties. As a result, a wide viewing angle and good visibility were exhibited.

[0159]

As described above, the liquid crystal display device of the present invention can not only make the gap width in the cell uniform, but also make the gap width itself narrower.

Therefore, color unevenness does not occur on the display surface, and the choice of display mode, cell optical design, liquid crystal material, etc. is increased, and display with higher contrast,
A display with a wide viewing angle, a display with a fast response speed, and an excellent product appearance can be realized. In addition, since the light-shielding film has high electrical insulation, a transparent electrode can be directly formed thereon,
Not only the process is simplified, but also the reliability of the transparent electrode at the terminal is improved. Furthermore, if the light-shielding film is extended inside or inside the peripheral sealing material, light leakage can be effectively prevented without providing an extra external light-shielding film, and the effective display area can be enlarged.

In addition, by providing a column made of the same material as the peripheral sealing material on at least a part of the light shielding film located in the display area, it is difficult to obtain uniformity of the gap in the conventional liquid crystal cell. In addition, even if pressure sealing is not performed, the cell central portion does not swell, and a cell having uniform characteristics can be formed. In particular, the pressurizing and sealing step was indispensable in the STN model, but according to this configuration, it is possible to create a uniform cell without performing the pressurizing and sealing. In this case, since the seal material used for the support and the peripheral seal material are made of the same material, it is not necessary to newly provide a seal material for the support.

Further, in the case of a liquid crystal display device using a ferroelectric liquid crystal or an antiferroelectric liquid crystal having no self-healing property when the orientation is disturbed, the provision of the columns not only improves the gap uniformity but also reduces the external stress. In addition, it is possible to prevent alignment disorder due to shock, vibration, and the like, and this is an effective means particularly when used in a vehicle-mounted or portable liquid crystal display device.

A panel with a light-shielding film is also used as a projection display such as a head-up display.
In the conventional printing method, the light-shielding film cannot be formed in a fine pattern, so that the enlargement ratio of the projection was limited to twice, but according to the present invention, it can be formed by the photolithography method. Fine processing becomes possible, and a quality that can withstand three times or more the projection enlargement can be achieved.

As a backlight, a tungsten lamp, a xenon lamp, and an EL are conventionally used in many cases, and the vividness of the color is not so required. However, according to the present invention, a new backlight such as a white LED is used. In combination with the light, effects such as taking advantage of the high color saturation can be obtained.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing a liquid crystal display device as one embodiment according to the present invention.

FIG. 2 is a schematic cross-sectional view of a liquid crystal display device using a light-shielding film formed by a conventional printing method.

[Explanation of symbols]

 10, 10A Liquid crystal display device 11, 12 Transparent substrate 11a Terminal portion 111, 121 Transparent electrode 131, 132 Extraction electrode 14 Peripheral sealing material 15 Liquid crystal 161, 162 Polarizing plate 17 Backlight 21 Light shielding film 22 Light transmitting film (color filter)

 ──────────────────────────────────────────────────続 き Continued on front page (31) Priority claim number Japanese Patent Application No. 10-262611 (32) Priority date September 17, 1998 (September 17, 1998) (33) Priority claim country Japan (JP) (72) Inventor Masao Ogawara 91, Yotanuki-cho, Miyoshi City, Hiroshima Prefecture, Hiroshima Opto Co., Ltd. (72) Inventor Shinsuke Iguchi 1-2-1, Kamisakabe, Amagasaki City, Hyogo Prefecture Optrex, Inc. ) Inventor Motozo Hattori 5-7-18 Higashi-Nippori, Arakawa-ku, Tokyo Within Optorex Co., Ltd. (72) Inventor Masanori Kono 1 Tsukiji, Kisarazu-shi, Chiba Japan Nippon Steel Chemical Corporation (72) Inventor Takeo Teramoto 2-31-1, Shinkawa, Chuo-ku, Tokyo Nippon Steel Chemical Co., Ltd. (72) Inventor Naoki Yokoyama 1 Tsukiji, Kisarazu-shi, Chiba Nippon Steel Chemical Co., Ltd. F-term in the Electronic Materials Development Center (reference) 2H025 AA00 AB13 AB17 AC01 AD01 BC74 CA00 CC03 CC12 FA04 FA16 FA40 FA48 2H048 AA09 BA45 BA48 BB42 2H091 FA02Y FA08X FA11X FA35Y FA42Z FA43Z FA44Z FB02 FB12 HA12 GA07 GA07 GA07 GA08 KA02 KA03 KA05 LA12 LA15 LA17

Claims (17)

[Claims] 1. A pair of transparent substrates which are opposed to each other by a peripheral sealing material with a liquid crystal layer interposed therebetween, a polarizing plate attached to an outer surface side thereof, and a rear surface side as viewed from a display surface side. Illumination means provided behind the one polarizing plate, and a non-display area on the inner surface side of the one transparent substrate and a non-display part except for a portion corresponding to a display pattern in the display area. In a transmissive liquid crystal display device in which a light-shielding film is provided in a corresponding portion and a voltage higher than the excitation of the liquid crystal layer is applied to a desired transparent electrode in the display pattern, a non-display portion in the display area is provided. Is 1mm x 1mm
A plurality of the above-mentioned sections, and the light-shielding film has an electrical insulation property of 10 ¹² Ω / □ or more, and
The optical density (OD value) per 1 μm of the film thickness is 2.0
The liquid crystal display device described above, wherein a photosensitive light-shielding resin material is patterned. 2. The liquid crystal display device according to claim 1, wherein, in the one transparent substrate, the transparent electrode is formed directly on the light shielding film without a smoothing layer. 3. The liquid crystal according to claim 1, wherein a support made of the same material as the peripheral sealing material is provided on at least a part of the light shielding film located in a display area. Display device. 4. A light-transmitting film having a predetermined transmission color is provided so as to cover a portion corresponding to the display pattern, and the light-transmitting film has an insulation resistance value of 10 ¹² Ω / □ or more. 4. A liquid crystal display device according to claim 1, wherein a photosensitive resin material is patterned. 5. The one transparent substrate according to claim 4, wherein the transparent electrode is formed directly on the light shielding film and the light transmitting film without a smoothing layer interposed therebetween. Liquid crystal display device. 6. The liquid crystal layer is a nematic liquid crystal layer,
The twist angle between the transparent substrates is approximately 90 °, the pair of polarizing plates are arranged so that their polarization axes are parallel, and the pretilt angle between the liquid crystal layer and the transparent substrate is 1. The liquid crystal display device according to any one of claims 1 to 5, wherein the angle is 5 degrees or less. 7. The liquid crystal layer is a nematic liquid crystal layer,
The twist angle between the transparent substrates is approximately 90 °, and the pair of polarizing plates are arranged so that their polarization axes are orthogonal to each other, and form the display pattern with the refractive index anisotropy Δn of the nematic liquid crystal. The liquid crystal display device according to any one of claims 1 to 5, wherein Δnd, which is a product of the distance d between the transparent conductive films, is between 0.4 and 0.6 µm. 8. The liquid crystal layer is a nematic liquid crystal layer,
The torsion angle between the transparent substrates is 70 to 80 °, and the pair of polarizing plates has a crossing angle of the polarizing axis of 70 °.
Ｎ80 °, and Δnd, which is the product of the refractive index anisotropy Δn of the nematic liquid crystal and the distance d between the transparent conductive films forming the display pattern, is 0.4 to 0.
The liquid crystal display device according to claim 1, wherein the distance is between 6 μm. 9. The liquid crystal layer is a nematic liquid crystal layer,
The twist angle between the transparent substrates is 180 to 270 °, and a retardation plate is disposed between at least one of the polarizing plates and the transparent substrate facing the polarizing plate. The liquid crystal display device according to any one of claims 1 to 5, wherein the liquid crystal display device is arranged so that light shielding and transmission can be switched by applying a voltage. 10. The liquid crystal layer is a ferroelectric liquid crystal or an antiferroelectric liquid crystal, and the pair of polarizers are arranged so that their polarization axes are substantially orthogonal to each other, and light-shielding and transmission can be switched by applying a voltage. The liquid crystal display device according to claim 1, wherein: 11. The liquid crystal layer is a nematic liquid crystal layer, and a duty ratio for driving the nematic liquid crystal layer is 1 /.
7. The method according to claim 1, wherein the ratio is from 1 to 1/33.
The liquid crystal display device according to any one of the above. 12. The liquid crystal layer is a nematic liquid crystal layer, and a duty ratio for driving the nematic liquid crystal layer is 1 /.
The liquid crystal display device according to claim 7, wherein the ratio is 1/4. 13. The liquid crystal layer according to claim 1, wherein the liquid crystal layer is a nematic liquid crystal layer, and a dichroic dye is added to the nematic liquid crystal layer. Liquid crystal display device. 14. The illumination device according to claim 1, wherein said illumination means comprises a white light source having a spectrum of three colors of RGB.
14. The liquid crystal display device according to any one of items 13 to 13. 15. The light-shielding resin material is made of a resin material obtained by polymerizing and curing a resin composition containing an alkali-soluble epoxy acrylate acid adduct containing insulating carbon. The liquid crystal display device according to claim 1. 16. The resin material according to claim 4, wherein the resin material of the light transmitting layer is a resin material obtained by polymerizing and curing a resin composition containing an alkali-soluble epoxy acrylate acid adduct. Item 2. The liquid crystal display device according to item 1. 17. The light-shielding film is also provided below the peripheral sealing material, and an end of the light-shielding film stops within the width of the peripheral sealing material over the entire circumference. Item 1
17. The liquid crystal display device according to any one of items 16 to 16.