JP4484265B2

JP4484265B2 - Liquid crystal display

Info

Publication number: JP4484265B2
Application number: JP09186599A
Authority: JP
Inventors: 雅夫大河原; 真介井口; 基造服部; 正範河野; 武郎寺本; 直樹横山
Original assignee: Nippon Steel and Sumikin Chemical Co Ltd; Kyocera Display Corp
Current assignee: Nippon Steel and Sumikin Chemical Co Ltd; Kyocera Display Corp
Priority date: 1998-04-07
Filing date: 1999-03-31
Publication date: 2010-06-16
Anticipated expiration: 2019-03-31
Also published as: JP2000155311A

Description

【０００１】
【発明の属する技術分野】
本発明は液晶表示装置に関し、さらに詳しく言えば、裏面にバックライトを備えた透過型の液晶表示装置に関するものである。
【０００２】
【従来の技術】
裏面にバックライトを備えた透過型の液晶表示装置においては、視認性を向上させるためにセルの内面に遮光膜を設けるようにしており、図２にはその典型的な従来例の断面が模式的に示されている。
【０００３】
これによると、液晶表示装置１０は、ガラスなどからなる一対の透明基板１１，１２を備えており、この例では、その一方の透明基板１１側には端子部１１ａが連設されている。詳しくは図示されていないが、各透明基板１１，１２には、所定の表示パターンに沿ってＩＴＯ（ＩｎｄｉｕｍＴｉｎＯｘｉｄｅ）からなる透明電極１１１，１２１が形成されている。
【０００４】
この場合、一方の透明基板１１側には、その表示パターンの部分を除いて遮光膜１１２が設けられている。また、詳しくは図示されていないが、端子部１１ａには、一方の透明基板１１の透明電極１１１から直接的に引き出された第１引き出し電極群１３１と、他方の透明基板１２の透明電極１２１と接続される第２引き出し電極群１３２とが形成されている。
【０００５】
透明基板１１，１２は、エポキシ樹脂などの周辺シール材１４を介してそれらの透明電極１１１，１２１が対向するように貼り合わせられ、しかる後、そのセルギャップ内に液晶１５が封入される。なお、周辺シール材１４には例えば導電ビーズからなるトランスファ材が設けられており、他方の透明基板１２の透明電極１２１はそのトランスファ材を介して端子部１１ａの第２引き出し電極群１３２に電気的に接続される。
【０００６】
透明基板１１，１２の外面側には、偏光板１６１，１６２がそれぞれ配置される。この液晶表示装置１０においては、遮光膜１１２を有する一方の透明基板１１が背面側とされ、その裏面にバックライト１７が設けられる。したがって、他方の透明基板１２が表面側として用いられる。
【０００７】
【発明が解決しようとする課題】
ところで、上記の遮光膜を形成するにあたって、従来では主として印刷法を採用しているが、印刷法では、光学的密度（ＯＤ値）で２以上の十分な遮光度を得るには、その膜厚が３〜４μｍにも達するため、表面の平滑性が悪く、さらに印刷精度に制限されてファインな加工ができないなどの欠点がある。
【０００８】
このため、低ギャップ化を図るにしても印刷膜厚が制約となり、そのギャップ幅をせいぜい６μｍ程度までしか狭めることができなかった。また、この程度のギャップにおいても、遮光膜の突起が原因して、対向する透明基板間の短絡、ギャップのムラなどの不具合が発生することが多く、歩留まり、品質面での大きな制約となっていた。
【０００９】
また、このような内面遮光膜を用いたセルにて部分的に着色したカラー表示を実現する方法としては、セル外部にスクリーン印刷にてカラー印刷を行なう方法、外部にカラーフィルターを設置して部分着色をする方法、セル内面にスクリーン印刷、オフセット印刷にて着色層を印刷する方法などが用いられているが、それぞれ以下のような問題があった。
【００１０】
すなわち、セル外部への印刷、カラーフィルター貼り付けによる場合には、視差に起因する色ずれが不可避であるため、近接したパターンで色を塗り分けることが困難であり、１ｍｍ以上程度の間隔を持つ粗いパターンにしか対応できなかった。また、セル内部に印刷でカラーフィルターを設ける場合には、ＩＴＯの上に印刷で設けられるために、液晶層に印加される電圧は、そのカラーフィルターごしに印加されることになり、しきい値特性を悪化させてしまうという問題があった。なお、カラー偏光板を、部分的に染め分けし、表示色を変えるという方法もあるが、コスト的に引き合わず、使われなくなってきている。
【００１１】
一方、黒レジストおよびカラーレジストを用いてカラーフィルターを作製する技術もよく知られており、大型ＳＴＮ（ＳｕｐｅｒＴｗｉｓｔｅｄＮｅｍａｔｉｃ）、ＴＦＴ（ＴｈｉｎＦｉｌｍＴｒａｎｓｉｓｔｏｒ）などのフルドット表示において実用化されている。
【００１２】
ＴＦＴ向けのカラーフィルターに用いる遮光膜には、電気絶縁性は要求されず、むしろある程度の導電性を持つ方が好ましいものであった。これはカラーフィルターの上にＩＴＯの成膜を行なうが、遮光膜の導電性がＩＴＯに必要な導電性を補助し、ＩＴＯが比較的高抵抗でも良好な動作特性を示すためである。
【００１３】
一方、カラーフィルターの上にストライプ状にパターニングしたＩＴＯを設けるＳＴＮ用のカラーフィルターの場合には、線間の電気絶縁性の確保、静電容量の低減の点から導電性を持つことは好ましくない。しかしながら、ＳＴＮに使用するカラーフィルターは表面平滑性が重要であり、このためカラーフィルターの上に樹脂の平滑化層を設ける必要がある。
【００１４】
この平滑化層の樹脂が電気絶縁性であるため、結果としてカラーフィルターの遮光膜の電気絶縁性が低いことは大きな障害にはならなかった。すなわち、高絶縁性で、かつ、高い吸光度をもつ材料は公知であったものの、この性能が生かせる用途は存在しなかったといってよい。
【００１５】
また、印刷法で設けられた遮光膜は透明基板との密着力が不十分であり、遮光膜の上に周辺シール材を印刷することはできなかった。このため、実際にカーオーディオなどに取り付けられた状態で、液晶パネルの表示部を斜め方向から観察した場合、その視野角が遮光膜を外れる程度に深い角度になった場合には、バックライトの光が漏れる場合があった。
【００１６】
これを防止するため、従来では、セルの表面の周辺シール材に対応する部分を含む領域に黒色インクにて枠状にスクリーン印刷を行ない、光漏れを防止するようにしているが、その分工程数が増えることは否めなかった。
【００１７】
他方において、従来の低デューティにて駆動して部分的に異なる色を表示するカラー表示方式には次のような課題があった。すなわち、セル外部にカラーフィルターの印刷を行なうか、カラーフィルターを貼り付ける方式においては、視差によりパターン間の色が混ざり合うことを防止するため、パターン間の距離を広く取る必要があり、高精細の着色分けをすることができない。
【００１８】
これに対して、セル内面にカラーフィルターを印刷する方法によれば、精度の点では問題ないものの色純度が悪く、また信頼性も低いものであった。このセル内面にカラーフィルターを印刷する方法においても、内面に印刷方式の遮光膜を設けることになるが、十分な吸光度を得るためには２〜４μｍの膜厚が必要であり、膜厚ムラの発生も避けられなかった。
【００１９】
このために、セルギャップのばらつきが生じ、結果として素子の特性のばらつきを引き起こしていた。また、印刷方式での精細度には限界があり、色替えを行う部分の遮光膜の幅を２００μｍ程度以下にしてパターンを設計することはきわめて困難であり、デザイン上の制約を受けていた。さらには、セル内面の凹凸のため、ＴＮ方式においてはプレチルト角を２°以下とするとドメインが発生するため、特性を向上するためのプレチルト角の低下が実現できなかった。また、表面の平滑性が悪いため、１／３０デューティ程度の駆動を実現したくともＳＴＮ方式あるいは強誘電もしくは反強誘電液晶方式は採用できなかった。
【００２０】
また、周辺シール材に熱硬化性樹脂を用いた場合、シール材とガラス基板の熱膨張率の違いから、周辺シール材の熱硬化後にセル中央部が膨らんだ状態となりやすい。このセルに液晶を封入しても中央部が膨らんだ状態のままであり、特性や背景色が中央部と周辺部とで異なることがあった。
【００２１】
これを防止するために、特に大型のパネルやセルギャップのムラが光学特性に大きく影響するＳＴＮ方式等においては、例えば、セルに液晶を注入した後、液晶層を減圧状態にして、セル中央部およびセル周辺部のギャップを均一にした状態で封止するという加圧封止作業を行なうなどの必要があった。
【００２２】
さらに、強誘電性液晶あるいは反強誘電性液晶などスメクチック液晶を用いる液晶表示素子は、配向の自己回復性がないため、封止後のストレス、衝撃あるいは振動などにより使用できなくなることがあり、配向が一度乱れるとその程度によっては再度加熱処理をして再配向させる必要があった。
【００２３】
上記問題点を解決するために、面内スペーサの周りに熱軟化性の樹脂を被覆し、周辺シール材の熱硬化時に上下基板を融着させる方法がある。しかし、十分な固定化性能を発揮させるためには面内スペーサの量や被覆する熱軟化性樹脂の量を多くしなければならず、面内スペーサ自身の散乱や凝集により光抜けが発生し、外観不良を招くことがあった。また、熱軟化性の樹脂成分が液晶に溶けだし、信頼性を落とすこともあった。
【００２４】
【問題を解決するための手段】
これらの課題を解決するため、本発明は、液晶層を挟持して周辺シール材により対向的に貼り合わせられた一対の透明基板およびその外面側にそれぞれ添設された偏光板と、表示面側から見て裏面側とされる上記一方の偏光板の背後に設けられた照明手段とを含み、上記一方の透明基板の内面側の非表示領域と、表示領域内の表示パターンに対応する部分を除く非表示部とにそれぞれ対応する部分に遮光膜が設けられており、上記表示パターン内の所望の透明電極に上記液晶層が励起する以上の電圧を印加する透過型の液晶表示装置において、上記表示領域内の非表示部が１ｍｍ×１ｍｍ以上の区画を複数有すること、および、上記遮光膜が絶縁抵抗１０^１２Ω／□以上の電気絶縁性をもち、かつ、その膜厚１μｍあたりの光学的密度（ＯＤ値）が２．０以上であり、感光性の遮光性樹脂材料をパターニングしてなり、上記一方の透明基板において、上記透明電極は上記遮光膜上に絶縁のための平滑化層を介することなく直接的に形成されているとともに、上記周辺シール材の下部にも平滑化層を設けることなく上記遮光膜が配置されており、全周にわたって上記遮光膜の端部が上記周辺シール材の幅の中に止まっていることを特徴としている。
【００２６】
表示領域内に位置する上記遮光膜が１ｍｍ×１ｍｍ以上の区画を複数有することから、その少なくとも一部の上に、上記周辺シール材と同材質の支柱が設けられることも本発明の特徴の一つである。
【００２７】
表示領域内の非表示部が１ｍｍ×１ｍｍ以上の区画を複数有する表示パターンの典型的なものは、例えば、日の字パターンのようなセグメントタイプのパターンであるが、これとドットパターンが混在するもの、例えば、５×７ドットの区画が間隔を空けて繰り返し出現するパターン等も例示される。
【００２８】
上記表示パターンに対応する部分に、所定の透過色をもつ透光膜を設けるにあたって、その透光膜が絶縁抵抗１０^１２Ω／□以上の絶縁抵抗値を有し、感光性の樹脂材料をパターニングしてなることも本発明の特徴の一つである。この場合、上記透光膜および遮光膜上に平滑化層を介することなく上記透明電極を直接的に形成することができる。
【００２９】
上記液晶層がネマチック液晶層であり、上記透明基板間におけるねじれ角がほぼ９０゜ねじれとされ、上記一対の偏光板はその偏光軸が平行になるように配置されているとともに、上記液晶層と上記透明基板のなすプレチルト角が１．５度以下である態様も本発明に含まれる。
【００３０】
上記各態様において、上記液晶層がネマチック液晶層であり、同ネマチック液晶層を駆動するデューティ比を１／１〜１／３３とする態様も本発明に含まれる。
【００３１】
上記液晶層がネマチック液晶層であり、上記透明基板間におけるねじれ角がほぼ９０°ねじれとされ、上記一対の偏光板はその偏向軸が直交するように配置され、上記ネマチック液晶の屈折率異方性Δｎと上記表示パターンを形成する上記透明導電膜間の距離ｄとの積であるΔｎｄが０．４〜０．６μｍの間である様態も本発明に含まれる。
【００３２】
上記液晶層がネマチック液晶層であり、上記透明基板間におけるねじれ角が７０〜８０゜ねじれとされ、上記一対の偏光板はその偏光軸の交差角が７０〜８０゜となるように配置され、上記ネマチック液晶の屈折率異方性Δｎと上記表示パターンを形成する上記透明導電膜間の距離ｄとの積であるΔｎｄが０．４〜０．６μｍの間である態様も本発明に含まれる。
【００３３】
上記液晶層がネマチック液晶層であり、上記透明基板間におけるねじれ角がほぼ９０゜ねじれまたは７０〜８０゜ねじれとする態様において、同ネマチック液晶層を駆動するデューティ比を１／１〜１／４とする態様も本発明に含まれる。
【００３４】
上記液晶層がネマチック液晶層であり、上記透明基板間におけるねじれ角が１８０〜２７０゜ねじれとされているとともに、少なくとも上記一方の偏光板とこれと対向する上記透明基板との間に位相差板が配置され、上記一対の偏光板は電圧無印加で光が透過し、電圧印加で光が遮光されるように配置されている態様も本発明に含まれる。
【００３５】
上記液晶層が強誘電性液晶もしくは反強誘電性液晶であり、上記一対の偏光板はほぼその偏光軸が直交するように配置され、電圧印加で遮光と透過が切り替えられる態様も本発明に含まれる。
【００３６】
ＴＮ（ＴｗｉｓｔｅｄＮｅｍａｔｉｃ）方式のネガ表示の場合においては、二色性色素を添加したネマチック液晶を使用することにより、コントラスト比の向上を図ることができ、この点も本発明の特徴に含まれる。
【００３７】
上記照明手段としては、従来からよく用いられているタングステンランプ、キセノンランプ、ＥＬ等も使用可能であるが、ＲＧＢの３色のスペクトルを持つ白色ＬＥＤ（発光ダイオード）あるいは白色ＣＣＴのごとき白色光源が好ましく採用される。
【００３８】
また、上記遮光性樹脂材料が、絶縁カーボンを含むアルカリ可溶のエポキシアクリレート酸付加体を含む樹脂組成物を重合硬化させた樹脂材料からなること、また、上記透光膜の樹脂材料が、アルカリ可溶のエポキシアクリレート酸付加体を含む樹脂組成物を重合硬化させた樹脂材料からなることを本発明の特徴の一つとして挙げることができる。
【００３９】
【発明の実施の形態】
次に、図１に示されている本発明の一実施例としての液晶表示装置１０Ａについて、その具体的な構成を説明する。なお、この実施例において、先に説明した従来例と同一もしくは同一と見なされる部分には、それと同じ参照符号が付されている。
【００４０】
この実施例においては、透明基板１１，１２として、ガラス基板にシリカのアルカリ防止膜を施した基板を用いた。まず、表面側とされる透明基板１２側に、スピンコート法にて新日鐵化学社製の感光性の遮光性樹脂材料、すなわち絶縁カーボンを含み、アルカリ可溶のエポキシアクリレート酸付加体を樹脂成分として含む樹脂組成物であるＶ−２５９ＢＫＩＳ−Ｈ（商品名）を約１μｍの厚さに塗布した。
【００４１】
そして、セグメント表示の表示部分および透明基板１１，１２の周辺に配置される周辺シール材１４の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なって、透明基板１２上に遮光膜２１を形成した。
【００４２】
前記新日鐵化学社製の遮光性樹脂材料は１μｍの厚みにてＯＤ値が約３．０となり、十分な吸光度を有している。コーティングにはロールコーター、バーコーター、スリットコーターなどを用いることが可能であるが、膜厚ばらつきはセルギャップばらつきの原因となり、さらに透光膜を形成する場合には膜厚のばらつきが容易に色ばらつきとなる。したがって、スピンコートが望ましいが、液の使用量を削減するために、バーコーターあるいはスリットコーターと併用してもよいし、膜厚の均一性に優れる方法なら、いずれの方法を採用しても良い。
【００４３】
遮光膜材料は、黒色顔料と重合性モノマー、オリゴマー等の樹脂成分および光重合開始剤、溶剤等からなるが、この樹脂成分としては、一般的な感光性樹脂成分、具体的には光重合性を示すエチレン性不飽和基を持つ化合物ならびにアルカリ現像性のα、β不飽和カルボン酸もしくはそのエステルまたはこれらをモノマーとした共重合体、好ましくは特開平８−２７８６２９号公報に見られるビスフェノールフルオレンのようなビスフェノール類のエポキシアクリレートの酸付加体が挙げられる。
【００４４】
遮光膜２１のみを形成し、着色はセル外部への印刷あるいはカラーフィルター貼付けで対応することも可能であるが、この実施例では、セル内面に所定の着色を行なうために、セグメントタイプの表示部に透光膜としてのカラーフィルターが形成されるようなフォトマスクを用意し、それぞれ赤、緑、黄色などのカラーレジスト（それぞれＶ−２５９Ｒ−Ｈ，Ｖ−２５９Ｇ−Ｈ，Ｖ−２５９Ｙ−Ｈ（いずれも新日鐵化学社製））を順次スピンコートにて塗布し、露光、現像、乾燥、ベーキングを行なって透光膜２２を形成した。
【００４５】
この材料を用いることにより、２５０℃程度の温度まで変色せず、透明導電膜の成膜工程およびセル化工程を通した後にもなんら色彩に変化が生じないセルを提供できるようになるため、彩度が高く、白色光源からなるバックライトと組み合わせることにより、特に良好な色を示すことができる。
【００４６】
また、無色（白色）を含む任意の色を表現するために、数種類の原色を用意しておき、要求に対応して調合し、調色をすることができる。基本色としては、少なくとも赤、青、緑、黄、紫、クリアーの６色を揃えることが望ましい。着色が不要な部分についても、セル内面の平滑化の観点からクリアー膜を形成しておくことが好ましい。この場合、着色部との透過率の差を緩和するために、クリアー膜にも少量の顔料を添加し、その透過率を７０％程度に下げておくことが実用的である。顔料は一般に入手できる彩度が高く、透過率が高い材料であればよく、特に限定されない。
【００４７】
遮光膜２１は、液晶セルとした場合の周辺シール材１４の下にかかるように設置してもよいし、周辺シール材１４の内側(液晶層側)までとしてもよい。周辺シール材の下まで設けた場合には、遮光膜形成側の透明基板１２から見た場合に、周辺シール材１４が遮光膜に隠されるため、セル表面の有効面積が広くとれることになる。
【００４８】
この場合、全周に亙って遮光膜の端部が周辺シール材の幅の中に止まるようにすることがシール強度の低下を防止する観点から好ましい。例えば、このような設計で、初期および高温耐湿試験（８０℃、９０％、５０時間）後のシール強度がそれぞれ５．６ｋｇｆ、４．７ｋｇｆであったものが、遮光膜の端部がシール材の外側（反液晶層側）にはみ出すようにすることにより、それぞれ３．５ｋｇｆ、２．３ｋｇｆに低下する場合がある。
【００４９】
従来では、表示面の開口部を広く取りたい場合には、周辺シール材１４の部分を隠すために、多くの場合、前面側偏光板表面にスクリーン印刷法で黒枠を印刷するようにしていたが、遮光膜２１を周辺シール材１４の下にまで設けることにより、その印刷工程を省略することができるようになり、低コスト化に寄与できる。なお、シール部からの光抜けの防止をより完全にするために、周辺シール材として遮光性のものを使用することもできる。
【００５０】
この実施例のように、遮光膜２１の上に透光膜２２を設ける場合には、透光膜２２は周辺シール材１４の内側でとどめることが好ましい。また、遮光膜２１の上に重なる部分の透光膜２２の設計は、遮光膜２１側から表示を見る場合には影響はないが、透光膜２２側から観察する場合には、透光膜２２の設置形状がわずかながら視認できることになる。
【００５１】
また、表示部に限定して透光膜２２を設けた場合には、その輪郭が視認されるため好ましくない。これを避けるため、透光膜２２のそれぞれの色は相互に重ならず、かつ、間隔が広くならないようにするうえで、設計上のすき間を０．５ｍｍ以下とすることが好ましい。
【００５２】
遮光膜２１側から表示を見る場合には、異なる色の境界部は遮光膜２１に隠されるので、視認性の面からは上記のすき間の広さは問題にならず、重なり合うように設計してもよい。例えば、このすき間が５μｍ程度のときに、その部分で透明電極パターニング用のフォトレジストの被覆が不完全になり、断線が生じる場合もあるので、セル内のギャップの均一性に余裕があれば、むしろ重なり合うようにする方が好ましい。
【００５３】
透明基板１２側において、周辺シール材１４の下に遮光膜２１を設ける場合には、透明電極１２１はこれら遮光膜２１、透光膜２２の上に成膜する。これらの膜は絶縁抵抗が１０^１２Ω／□以上の絶縁性を持つ絶縁膜であることにより、絶縁のための保護層を設ける必要がない。なお、配線間の抵抗は１０^１１Ω／□以上であれば、液晶セルとした場合のにじみ現象も生じず問題はない。
【００５４】
このようにして形成したカラー基板に２３０℃程度の基板温度にて、スパッタ法にて透明導電膜を形成した。その面抵抗値は素子のパターン設計により適宜の値とされるが、おおよそ１００Ω／□から３０Ω／□前後が好ましい。この基板にフォトレジストを塗布したのち、表示パターンの部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去し、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極１２１を作成した。
【００５５】
このように、遮光膜および透光膜材料は、カラー基板の製造過程でエッチング液およびレジスト剥離液にさらされるので、これら薬液に対する耐性も必要とされる。
【００５６】
遮光膜２１側から観察する液晶セルの場合には、遮光膜が無い部分しか光が透過せず、また反射で観察した場合にも遮光膜とガラス基板の間には透明電極が存在しないため、引き回しパターンが見えることもないが、遮光膜２１を設けた基板と対向する透明基板１１側からセルを観察し、正規反射となった場合には、遮光膜２１の表面に配線された透明電極パターンが視認できることになる。
【００５７】
透明電極の引き回しを目立たなくするためには、隣合う透明電極引き回し間の間隙を１００μｍ程度とすることが好ましく、細部のパターンにわたってこのような狭い線間を実現することが好ましいが、設計上の制約などで不可能な場合にはおおよその目安として、透明電極の被覆率を９０％以上とすればよい。この比率は高い方が好ましいことは言うまでもない。
【００５８】
なお、表示部の周辺に余裕があり、周辺シール材１４の下に遮光膜２１を設けない場合には、透明基板に透明電極パターンを形成した後に遮光膜を形成してもよい。この場合には、遮光膜２１を設けた基板１２とは反対側の透明基板１１側を表示面とすることが好ましい。すなわち、このようにすることによって非点灯時に透明電極パターンが目立つ現象が抑制され、良好な製品外観を得ることができる。
【００５９】
対向する透明基板１１については、アルカリ防止膜、透明電極を順次形成して透明電極基板とした。遮光膜２１、透光膜２２を形成した透明基板１２には、プレチルト角が１〜１．５°となる配向膜を用いることが好ましい。ＴＮ素子の場合には、プレチルト角を小さくすることにより視角を拡大することができることが知られているが、従来の印刷法で設けた遮光膜は厚く、さらに表面の凹凸も激しいために、１から１．５°程度の小さなプレチルト角ではリバースチルトドメインを引き起こすため、使用できなかった。本発明の方法で設けた遮光膜２１の場合には、１．５°以下のプレチルト角が適用できる。このようなプレチルト角を示す配向膜は、その種類を問わない。
【００６０】
配向膜の膜厚は６００Å程度が良好な配向性能を示し、かつ、電気光学的な特性への影響が少ないので好ましい。対向する透明基板１１には、チタニア、シリカを混合した無機系の絶縁膜をゾルゲル法にて形成させた後に配向膜を成膜しラビング処理をすることが好ましい。無機膜は面間の短絡を防止するために有効である。
【００６１】
この実施例では、透明基板１２側に面内スペーサを散布し、対向する透明基板１１には周辺シール材１４をセル周辺にスクリーン印刷法にて印刷した。周辺シール材１４には透明基板１１，１２間の導通をとるためにトランスファ材として導電ビーズを混合したものを用いることができる。導電ビーズは導通をとる箇所にだけ混合させてもよいし、枠状のシール材１４内の全体に混合してもよい。
【００６２】
また、セルの中央部が膨らみやすく、セルギャップのムラが発生しやすいもの（例えば、シール材と表示部分との距離が１０ｍｍ以上離れているようなもの、セル形状が略正方形のようなもの）、低ギャップセル（例えば、５μｍ以下のセルギャップのもの）、セルギャップのムラを解消するために加圧封止工程を実施しているもの、または外部ストレス、衝撃、振動により液晶層の配向が乱されやすいもの（例えば、強誘電性液晶、反強誘電性液晶）においては、遮光膜に対応する部分の少なくとも一部に支柱状のシール材を設置することが好ましい。このときのシール材としては、周辺シール材と同材質のシール材を用いる。周辺シール材に導電ビーズを混合した場合は、支柱状のシール材は上下電極の対向しない部分に設置する。
【００６３】
これらの透明基板１１，１２を対向させ、熱圧着工程を通して硬化させ、注入口、端子部などを切り出したのち、真空注入法にてセル内にネマチック液晶を注入し、その注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。そして、従来と同様に、透明基板１１，１２の外面側にそれぞれ偏光板１６１，１６２を配置し、また、背面側となる偏光板１６１の裏面にバックライト１７を配置した。
【００６４】
なお、この液晶表示装置の表示モードとしては、ＴＮ、ＳＴＮが適用できる。ＴＮの場合にも偏光板との組み合わせにより、ネガ表示、ポジ表示が実現できるが、どちらのモードとでも組み合わせが可能である。また、Δｎｄとしても、いわゆるファーストミニマムといわれる０．４８μｍ程度、セカンドミニマムといわれる１．１μｍ前後のいずれの設計でもよいし、さらにサードミニマム（１．７μｍ程度）以上の設計としても良い。
【００６５】
ネガモードのＴＮの場合、従来ではΔｎｄが０．４８μｍ前後の場合には色ムラが発生しやすく、良好な表示性能を得ることは困難であったが、本発明によれば、セルの均一性が良好であるため、特に制限がない。また、ポジモードを使用する場合は０．４８μｍ程度のΔｎｄで用いることが一般的であるが、遮光膜の吸光度を２．５以上とする必要があり、従来の印刷法では４μｍ程度の遮光膜厚みが必要となっていた。このため、セルギャップとしては６μｍを下回ることが事実上不可能であるため、Δｎｄを０．４８μｍ程度とするためには、Δｎが０．１以下の特殊な液晶を選ばざるを得なかった。
【００６６】
これに対して、本発明においては、遮光膜は１μｍ以下でも使用でき、セルギャップも５μｍ以下、場合によっては３μｍ以下を実現することも可能となる。これによりΔｎの値を大きく取れ、使用できる液晶材料の種類の拡大さらには特性の改善が図れることになる。
【００６７】
ポジモードの場合には、偏光板と透明基板との間に位相差板を設けることにより、視野角依存性を低減することができる。このような効果が認められる代表的な位相差板には、富士写真フィルム社製のディスコティック液晶を利用したワイドビューフィルムがある。
【００６８】
マザー基板から複数のセルを取り出す、いわゆるマルチパターン設計で製造することが一般的に行なわれているが、対向する１組の基板に、パターンは観察側が遮光膜側となるいわゆるＦ板と、反観察側が遮光膜側となるいわゆるＲ板の設計を交互に配置したものを用いてもよい。この場合には、遮光膜のＦ，Ｒパターンに対応した設計とした透明電極を形成する。これによれば、切り出される液晶セルの間の部分に廃棄すべきつなぎの部分が生ぜず、基板の使用効率が向上するとととも、切断のための切り回数が減らせるため、工程短縮、歩留まり向上の利点を有する。
【００６９】
本発明において、裏面側の偏光板の背後に設けられる照明手段の光源としては、通常のタングステンランプあるいはＥＬ等も使用できるが、着色層の彩度の高さを生かす観点から、ＲＧＢのスペクトルを有するＬＥＤもしくはＣＣＴのごとき白色光源が好ましく採用される。
【００７０】
【実施例】
《実施例１》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布した。そして、セグメント表示の表示部分および液晶セルの周辺に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【００７１】
次に、所定の着色を行なうために、セグメント部分に透光膜が形成されるようなフォトマスクを３枚用意し、赤、緑、黄色のカラーレジスト（それぞれＶ−２５９Ｒ−Ｈ，Ｖ−２５９Ｇ−Ｈ，Ｖ−２５９Ｙ−Ｈ（いずれも新日鐵化学社製））を順次スピンコートにて塗布し、露光、現像、乾燥、ベーキングを行なった。得られた各透光膜の絶縁抵抗値は３×１０^１４Ω／□であった。これらの透光膜は、周辺シール材にかからないためにセルの外形よりはやや狭い部分に形成し、それぞれの色は相互に重ならないように、そのすき間を０．３ｍｍ設けた。
【００７２】
このようにして形成したカラー基板に、２３０℃の温度でスパッタ法にて約１０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約３０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。対向する基板にも、アルカリ防止膜、ＩＴＯ透明導電膜を順次形成し、同様に透明電極を形成させた。
【００７３】
遮光膜および透光膜を形成した基板には、プレチルト角が１．３°となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。しかる後、同様に配向膜を形成して焼成し、両基板をねじれ角が９０°となるようにラビングした。
【００７４】
片側の基板には６μｍの直径を持つ積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるために積水ファインケミカル社製の導電性ビーズを３％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からはほとんど見えない位置となっていた。
【００７５】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。
【００７６】
各セグメント部分のギャップのばらつきを測定したところ、最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。
そして、基板の両側に偏光軸が平行となるように一組の偏光板を所定の角度にて貼り付け、カラー液晶表示セルを完成させた。
【００７７】
このようにして作成したセルを１／８デューティにて駆動し、裏面にＲＧＢ３色のスペクトルを有するＣＣＴを光源とするバックライトを設置し、遮光膜を形成した側から観察したところ、視角も広く良好な視認性を示した。
【００７８】
〈比較例１〉
ガラス上に形成されたＩＴＯ透明導電膜をパターニングし、片方の基板にセグメントの表示部分とシールより内側に遮光膜が形成されるように、黒色顔料分散系のインクをオフセット印刷し、遮光膜を２μｍの厚さに形成した。この膜のＯＤ値は１．７、絶縁抵抗値は３×１０^１３Ω／□であった。対向する基板にはカラーインクにて所定の位置にスクリーン印刷法にて透光膜を形成した。これらの基板にプレチルト角が１．３°となるような配向膜を形成し、９０°のねじれ角となるようにラビングし、６μｍの面内スペーサを介してセルを形成した。しかる後、ネマチック液晶を注入し、封止した。
【００７９】
偏光板を貼り付けた後、１／８デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜の印刷側から観察したところ視角がやや狭かった。セグメントのエッジ部分を微細に観察すると、ドメインが発生しており、本来の特性が得られていなかった。セルギャップのばらつきを測定したところ、面内で最大２．２μｍのばらつきがあることが分かり、これも視角が狭い原因であった。また、直射日光下で観察すると、セルの表面での印刷顔料粒子に起因すると思われる光散乱が生じ、コントラストも低下していた。
【００８０】
《実施例２》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺部に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【００８１】
このようにして形成した遮光膜付きの基板に２３０℃の温度でスパッタ法にて約２０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約１０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。対向する基板にも、アルカリ防止膜、ＩＴＯを順次形成し、同様に透明電極を形成させた。
【００８２】
遮光膜を形成した基板には、プレチルト角が２°程度となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。次に、同様に配向膜を形成して焼成し、両基板をねじれ角が９０°となるようにラビングした。
【００８３】
片側の基板には５μｍ径の積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、熱硬化性のエポキシ樹脂である三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加し、さらにシールギャップを保つためのガラスファイバーを５％添加した。この周辺シール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【００８４】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてΔｎが０．０７７のネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅を測定したところ約６μｍとなっており、これは面内スペーサと遮光膜の厚さの合計に等しく、スペーサは遮光膜には沈み込んでいないことが確認できた。このセルのΔｎｄを測定したところ、０．４６であった。面内のギャップ偏差も最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。
【００８５】
しかる後、基板の両側に偏光軸が平行となるように一組の偏光板を組み合わせ、所定の角度にて貼り付け、液晶表示セルを完成させた。このようにして作成したセルを１／２デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜を形成した側から観察したところ、正面ではコントラスト比３００：１が達成され、良好な視認性を有していることが確認できた。
【００８６】
〈比較例２〉
ガラス上に形成されたＩＴＯ透明導電膜をパターニングし、片方の基板にセグメントの表示部分とシールより内側に遮光膜が形成されるように、オフセット印刷法にて遮光膜を４μｍの厚さに印刷で形成した。この遮光膜のＯＤ値は２．５であった。対向する基板とともに、これらの基板にプレチルト角が２°となるような配向膜を形成し、９０゜のねじれ角となるようにラビングし、６μｍの面内スペーサを介してセルを形成した。
【００８７】
しかる後、実施例２と同じネマチック液晶を注入し、封止した。注入には実施例２に比較して４倍の時間が必要であった。また、封止後にギャップ幅および均一性を確認したところ、ギャップ幅は６．２μｍとなっており、面内スペーサは印刷遮光膜に大きく沈み込んでいることが分かった。また、面内で最大２．２μｍのギャップのばらつきがあることが分かった。
【００８８】
偏光板を貼り付けた後、１／２デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜の印刷側から観察したところ正面コントラストは平均で１５０：１であったが、ギャップの不均一が原因して部分的に２００：１のところや１００：１の部分があった。また、直射日光下で観察すると、セルの表面での散乱が生じ、コントラストがやや低下して見られた。
【００８９】
《実施例３》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、８０ｍｍ×８０ｍｍのセルを複数個レイアウトしたマザー基板を以下の手順で製造した。すなわち、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺部に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【００９０】
このようにして形成した遮光膜付きの基板に２３０℃の温度でスパッタ法にて約２０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約１０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。対向する基板にも、アルカリ防止膜、ＩＴＯを順次形成し、同様に透明電極を形成させた。
【００９１】
遮光膜を形成した基板には、プレチルト角が２°程度となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。次に、同様に配向膜を形成して焼成し、両基板をねじれ角が９０°となるようにラビングした。
【００９２】
片側の基板には４μｍ径の積水ファインケミカル社製の面内スペーサを散布し、対向する基板にはシール材として、熱硬化性のエポキシ樹脂である三井化学社製のストラクトボンドを液晶セルの周辺と遮光膜に覆われてかつ上下電極が対向していない所定の部分とにスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加し、さらにシールギャップを保つためのガラスファイバーを５％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【００９３】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅を測定したところ、約５μｍとなっており、これは面内スペーサと遮光膜の厚さの合計にほぼ等しく、スペーサは遮光膜には沈み込んでいないことが確認できた。面内のギャップ偏差も最大で０．２μｍ程度の偏差に収まっており、中央部と周辺部とのギャップ均一性の優れたセルが形成されていた。
【００９４】
次に、基板の両側に偏光軸が平行となるように一組の偏光板を組み合わせ、所定の角度にて貼り付け、さらに裏面のバックライト側に、表示セグメントに応じて所定の箇所にカラー印刷を行い色分けしたプラスチックシートを貼り付け、液晶表示セルを完成させた。
【００９５】
このようにして作成したセルを１／２デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜を形成した側から観察したところセル中央部及び周辺部ともにコントラスト比約３００：１が達成されており、特性においても均一なセルが得られていることが確認できた。
【００９６】
《実施例４》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、８０ｍｍ×８０ｍｍのセルを複数個レイアウトしたマザー基板を以下の手順で製造した。すなわち、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺部に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【００９７】
このようにして形成した遮光膜付きの基板に２３０℃の温度でスパッタ法にて約２０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約１０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。対向する基板にも、アルカリ防止膜、ＩＴＯを順次形成し、同様に透明電極を形成させた。
【００９８】
遮光膜を形成した基板には、プレチルト角が２°程度となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。次に、同様に配向膜を形成して焼成し、両基板をねじれ角が９０°となるようにラビングした。
【００９９】
片側の基板には４μｍ径の積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、熱硬化性のエポキシ樹脂である三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加し、さらにシールギャップを保つためのガラスファイバーを５％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１００】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅を測定したところ、約５μｍとなっており、これは面内スペーサと遮光膜の厚さの合計にほぼ等しく、スペーサは遮光膜には沈み込んでいないことが確認できた。面内のギャップ偏差も最大で０．５μｍ程度の偏差に収まっており、中央部と周辺部とのギャップにやや偏差の大きなセルが形成されていた。
【０１０１】
次に、基板の両側に偏光軸が平行となるように一組の偏光板を組み合わせ、所定の角度にて貼り付け、液晶表示セルを完成させた。
このようにして作成したセルを１／２デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜を形成した側から観察したところ正面コントラスト比２５０：１が達成されており、実用上問題のない視認性が確認できた。
【０１０２】
〈比較例３〉
ガラス上に形成されたＩＴＯ透明導電膜をパターニングし、片方の基板にセグメントの表示部分とシールより内側に遮光膜が形成されるように、黒色顔料分散系のインクをオフセット印刷し、遮光膜を４μｍの厚さに形成した。この遮光膜のＯＤ値は３．４、絶縁抵抗値は１．５×１０^１３Ω／□であった。対向する基板とともに、これらの基板にプレチルト角が２°となるような配向膜を形成し、９０゜のねじれ角となるようにラビングし、４μｍの面内スペーサを介してセルを形成した。
【０１０３】
しかる後、実施例３と同じネマチック液晶を注入した。注入後にギャップ幅および均一性を確認したところ、ギャップ幅は６μｍとなっており、中央部と周辺部でギャップのムラによる色ムラが発生していることが分かった。このとき、面内で最大２．６μｍのギャップばらつきがあることが分かった。
【０１０４】
この注入後のセルを加重０．２ｋｇ／□にて加圧封止した後、再度ギャップ幅を確認した。ギャップ幅は５．５μｍまで狭まり、面内のギャップ偏差は１．０μｍとなっていた。
偏光板を貼り付けた後、１／２デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜の印刷側から観察したところ正面コントラストは２００：１であった。また、見栄えにおいて所々にギャップのムラによる色ムラが発生していた。
【０１０５】
《実施例５》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜し、引き続いて３００℃の温度でスパッタ法にて約２０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約１０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、電極基板を作成した。
【０１０６】
この基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設ける周辺シール材の内側の部分までを遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。対向する基板は、アルカリ防止膜、ＩＴＯ透明導電膜を順次形成し、同様に電極基板を作成した。
【０１０７】
遮光膜を形成した基板にはプレチルト角が２°程度となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。そして、同様に配向膜を形成して焼成し、両基板をねじれ角が９０°となるようにラビングした。
【０１０８】
片側の基板には５μｍの直径を持つ積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、熱硬化性のエポキシ樹脂である三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加し、さらにシールギャップを保つため、この場合は遮光膜の厚さだけ大きい直径約６μｍのスペーサを混入した。このシール材は遮光膜の外側に形成されているため、遮光膜側からは、見える位置となっていた。
【０１０９】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅を測定したところ、約６μｍとなっており、これは面内スペーサと遮光膜の厚さの合計にほぼ等しく、スペーサは遮光膜には沈み込んでいないことが確認できた。面内のギャップ偏差も最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。
【０１１０】
次に、基板の両側に偏光軸が平行となるように一組の偏光板を組み合わせ、所定の角度にて貼り付け、液晶表示セルを完成させた。
このようにして作成したセルを１／２デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜を形成した側の反対側の基板面から観察したところ、正面ではコントラスト比３００：１が達成され、セル周辺にはシールが見えるため、有効表示面積がやや狭いものの、良好な視認性を有していることが確認できた。
【０１１１】
《実施例６》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【０１１２】
次に、所定の着色を行うために、セグメント部分に透光膜が形成されるようなフォトマスクを３枚用意し、赤、緑、黄色のカラーレジスト（それぞれＶ−２５９Ｒ−Ｈ，Ｖ−２５９Ｇ−Ｈ，Ｖ−２５９Ｙ−Ｈ（いずれも新日鐵化学社製））を順次スピンコートにて塗布し、露光、現像、乾燥、ベーキングを行なった。得られた各透光膜の絶縁抵抗値は３×１０^１４Ω／□であった。これらの透光膜は、周辺シール材にかからないようにセルの外形よりはやや狭い部分に形成し、それぞれの色は相互に重ならないように、すき間を０．３ｍｍ設けた。
【０１１３】
このようにして形成したカラー基板に２３０℃の温度でスパッタ法にて約１０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約３０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、電極基板を作成した。対向する基板は、アルカリ防止膜、ＩＴＯ透明導電膜を順次形成し、同様に電極基板を作成した。
【０１１４】
遮光膜および透光膜を形成した基板にはプレチルト角が２°となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。そして、同様に配向膜を形成して焼成し、両基板をねじれ角が７０°となるようにラビングした。
【０１１５】
片側の基板には５μｍ径の積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、熱硬化性のエポキシ樹脂である三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加し、さらにシールギャップを保つためのガラスファイバーを５％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１１６】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅を測定したところ約６μｍとなっており、これは面内スペーサと遮光膜の厚さの合計にほぼ等しく、スペーサは遮光膜には沈み込んでいないことが確認できた。面内のギャップ偏差も最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。
【０１１７】
しかる後、基板の両側に偏光軸の交差角が７０°となるように一組の偏光板を組み合わせ、所定の角度にて貼り付け、液晶表示セルを完成させた。
このようにして作成したセルを１／２デューティにて駆動し、裏面にＲＧＢのスペクトルを持つ白色ＬＥＤを使用したバックライトを設置し、遮光膜を形成した側から観察したところ、正面から主視角方向に３０°傾斜した方向ではコントラスト比３００：１が達成され、良好な視認性を有していることが確認できた。また、内面に透光膜が設けられているため、斜めから見ても色ずれのない良好な表示性能を示していた。
【０１１８】
《実施例７》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【０１１９】
このようにして形成した遮光膜付きの基板に２３０℃の温度でスパッタ法にて約２０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約１０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。対向する基板にも、アルカリ防止膜、ＩＴＯ透明導電膜を順次形成し、同様に透明電極を形成させた。
【０１２０】
遮光膜を形成した基板にはプレチルト角が２°程度となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行った。そして、同様に配向膜を形成して焼成し、両基板をねじれ角が９０°となるようにラビングした。
【０１２１】
片側の基板には５μｍの直径を持つ積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、熱硬化性のエポキシ樹脂である三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加し、さらにシールギャップを保つためのガラスファイバーを５％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１２２】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅を測定したところ約６μｍとなっており、これは面内スペーサと遮光膜の厚さの合計にほぼ等しく、スペーサは遮光膜には沈み込んでいないことが確認できた。また、面内のギャップ偏差も最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。
【０１２３】
しかる後、富士写真フィルム社製の視角拡大フィルムであるワイドビューを両側に設置し、さらに一組の偏光板を偏光軸が平行となるように組み合わせ、所定の角度にて貼り付け、液晶表示セルを完成させた。
【０１２４】
このようにして作成したセルをスタティック駆動にて駆動し、遮光膜を形成した基板側から観察したところ、正面ではコントラスト比３００：１が達成され、さらに左右方向では正面から３０°傾斜したところまで２００：１以上のコントラストを示す良好な視認性を有していることが確認できた。
【０１２５】
《実施例８》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【０１２６】
次に、所定の着色を行なうために、セグメント部分に透光膜が形成されるようなフォトマスクを３枚用意し、赤、緑、黄色のカラーレジスト（それぞれＶ−２５９Ｒ−Ｈ，Ｖ−２５９Ｇ−Ｈ，Ｖ−２５９Ｙ−Ｈ（いずれも新日鐵化学社製））を順次スピンコートにて塗布し、露光、現像、乾燥、ベーキングを行なった。得られた各透光膜の絶縁抵抗値は３×１０^１４Ω／□であった。これらの透光膜は、シールにかからないようにするため、セルの外形よりはやや狭い部分に形成し、また、それぞれの色は相互に重ならないように、すき間を０．３ｍｍ設けた。
【０１２７】
このようにして形成したカラー基板に２３０℃の温度でスパッタ法にて約１０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約３０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。対向する基板にも、アルカリ防止膜、ＩＴＯ透明導電膜を順次形成し、同様に透明電極を形成させた。
【０１２８】
遮光膜および透光膜を形成した基板にはプレチルト角が５°となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。そして、同様に配向膜を形成して焼成し、両基板をねじれ角が２４０°となるようにラビングした。
【０１２９】
片側の基板には６μｍの直径を持つ積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１３０】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅のばらつきを測定したところ、最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。
【０１３１】
しかる後、基板の両側に２軸延伸された所定の位相差値をもつ位相差板を設置し、さらにその外側に一組の偏光板をその偏光軸が直交するように貼り付け、カラー液晶表示セルを完成させた。
このようにして作成したセルを１／３２デューティにて駆動し、裏面にタングステンランプのバックライトを設置し、遮光膜を形成した側から観察したところ、１／８デューティ駆動のＴＮ方式に比較してさらに視角も広く良好な視認性を示した。
【０１３２】
《実施例９》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【０１３３】
次に、所定の着色を行うために、セグメント部分に透光膜が形成されるようなフォトマスクを３枚用意し、赤、緑、黄色のカラーレジスト（それぞれＶ−２５９Ｒ−Ｈ，Ｖ−２５９Ｇ−Ｈ，Ｖ−２５９Ｙ−Ｈ（いずれも新日鐵化学社製））を順次スピンコートにて塗布し、露光、現像、乾燥、ベーキングを行なった。得られた各透光膜の絶縁抵抗値は３×１０^１４Ω／□であった。これらの透光膜は、シールにかからないようにセルの外形よりはやや狭い部分に形成し、また、それぞれの色は相互に重ならないように、すき間を０．３ｍｍ設けた。
【０１３４】
このようにして形成したカラー基板に２３０℃の温度でスパッタ法にて約１０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約３０Ω／□であった。この基板にフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮａＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。対向する基板にも、アルカリ防止膜、ＩＴＯ透明導電膜を順次形成し、同様に透明電極を形成させた。
【０１３５】
遮光膜および透光膜を形成した基板にはプレチルト角が５°となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。そして、同様に配向膜を形成して焼成し、両基板をねじれ角が２４０°となるようにラビングした。
【０１３６】
片側の基板には６μｍの直径を持つ積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として三井化学社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電性ビーズを３％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１３７】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅のばらつきを測定したところ、最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。
【０１３８】
しかる後、基板の両側に１軸性の位相差板を所定の角度に設置し、さらにその外側に一組の偏光板を所定の角度にて貼り付け、カラー液晶表示セルを完成させた。
このようにして作成したセルを１／３２デューティにて駆動し、裏面にＲＧＢのスペクトルを持つ白色のＣＣＴバックライトを設置し、遮光膜を形成した側から観察したところ、１／８デューティ駆動のＴＮ方式に比較してさらに視角も広く良好な視認性を示した。
【０１３９】
《実施例１０》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜した基板を用い、スピンコート法にて新日鐵化学社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約１μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設ける周辺シール材の部分より外側の部分を遮光するようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は３．０、絶縁抵抗値は１×１０^１４Ω／□であった。
【０１４０】
パターンは観察側が遮光膜側となるいわゆるＦ板と、反観察側が遮光膜側となるいわゆるＲ板の設計を交互に配置したものを用いた。そして、所定の着色を行なうために、セグメント部分に透光膜が形成されるようなフォトマスクを３枚用意し、赤、緑、黄色のカラーレジスト（それぞれＶ−２５９Ｒ−Ｈ，Ｖ−２５９Ｇ−Ｈ，Ｖ−２５９Ｙ−Ｈ（いずれも新日鐵化学社製））を順次スピンコートにて塗布し、露光、現像、乾燥、ベーキングを行なった。得られた各透光膜の絶縁抵抗値は３×１０^１４Ω／□であった。これらの透光膜は、シールにかからないように、セルの外形よりはやや狭い部分に形成し、また、それぞれの色は相互に重ならないように、すき間を０．３ｍｍ設けた。
【０１４１】
このようにして形成したカラー基板に２３０℃の温度でスパッタ法にて約１０００ÅのＩＴＯ透明導電膜を形成した。面抵抗値は約３０Ω／□であった。この基板にフォトレジストを塗布したのち、遮光膜のＦ，Ｒパターンに対応した設計としたセグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮaＯＨ水溶液にてレジストを剥離して、透明電極を形成させた。ＩＴＯの配線の間隙は最小７０μｍ程度の設計とし、面全体のＩＴＯの被覆率は９０％以上となるようにした。
【０１４２】
対向する基板についても、アルカリ防止膜、ＩＴＯ透明導電膜を順次形成し、Ｆ，Ｒパターンが交互に配置されたフォトマスクを用いて、同様に透明電極を形成させた。こちらの配線の太さは、必要な引き回し抵抗が確保できるだけの幅となるように、特に線間を狭くすることはしていない。
【０１４３】
遮光膜および透光膜を形成した基板にはプレチルト角が１．３°となる所定の配向膜を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。そして、同様に配向膜を形成して焼成し、両基板をねじれ角が９０°となるようにラビングした。
【０１４４】
片側の基板には６μｍの直径を持つ積水ファインケミカル社製の面内スペーサを散布し、対向する基板には周辺シール材として、三井化学株式会社製のストラクトボンドを液晶セルの周辺にスクリーン印刷法にて印刷した。シール材には基板の上下の導通をとるためのトランスファ材として、積水ファインケミカル社製の導電ビーズを３％添加した。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１４５】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部などを切り出したのち、真空注入法にてネマチック液晶を注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップ幅のばらつきを測定したところ、最大で０．３μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。しかる後、基板の両側に偏光軸が平行となるように一組の偏光板を所定の角度にて貼り付け、カラー液晶表示セルを完成させた。
【０１４６】
このようにして作成したセルを裏面にバックライトを設置し、１／８デューティにて駆動した。遮光膜を形成した基板側から観察したところ、実施例１とほぼ同じく視角も広く良好な視認性を示した。また、遮光膜の反対側から観察しても、通常の室内環境下では遮光膜側と全く遜色のない視認性が得られた。なお、直射日光下では表面の反射がやや強いものの、引き回しパターンも見えず、実用上十分な性能が得られた。
【０１４７】
《実施例１１》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜したマザー基板を用い、８０ｍｍ×８０ｍｍの液晶パネルを複数個レイアウトした機種を以下の手順で製造した。すなわち、スピンコート法にて新日鐵化学株式会社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約０．５μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設けたシール部分より外側の部分が遮光させるようなフォトマスクを用いて、３００ｍＪの露光を行い、現像、乾燥、ベーキングを行った。この膜のＯＤ値は１．５、絶縁抵抗値は２×１０^１４Ω／□であった。
【０１４８】
この基板に２３０℃の温度でスパッタ法にて約１０００Åの透明導電膜を形成した。面抵抗値は約３０Ω／□であった。さらにフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行った後、エッチング液にて不要部分のＩＴＯを除去、さらにＮaＯＨ水溶液にてレジストを剥離して、電極基板を作成した。
【０１４９】
対向する基板は、アルカリ防止膜、ＩＴＯを順次形成し、同様に電極基板を作成した。遮光膜を形成した基板にはポリイミド系の配向膜材料を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行った。そののち、同様に配向膜を形成して焼成し、両基板を同じ方向に平行にラビングした。
【０１５０】
片側の基板には１．５μｍの直径を持つ触媒化成工業株式会社製の真し球を散布し、対向する基板には三井化学株式会社製のストラクトボンドを液晶セルの周辺および表示部で遮光膜に覆われている部分に支柱状に配置するようにスクリーン印刷法にて印刷した。対向する基板の導通を取るための電極を設けた部分には、導電ビーズを混合したシール材を印刷し、導通させた。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１５１】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部等を切り出したのち、液晶セルおよび液晶注入ボートを加熱し、反強誘電性液晶を等方性状態として真空注入法にて注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップのばらつきを測定したところ、最大で０．１μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。なお、使用した反強誘電性液晶は、「等方性−ＳｍＡ−ＳｍＣＡ＊−結晶」の相系列を有し、約−１０゜Ｃ〜約＋６０゜Ｃの温度範囲で反強誘電性（ＳｍＣＡ＊）を示すブレンド品である。
【０１５２】
そののち、両側に偏光軸が直交となり、かつ電圧無印加状態で遮光状態となるように一組の偏光板を所定の角度にて貼り付け、反強誘電性液晶表示パネルを完成させた。
このようにして作成したセルの裏面にＣＣＴバックライトを設置し、メモリー性を生かした線順次書き込み駆動で１６本駆動したところ、視角も広く良好な視認性を示した。
【０１５３】
《実施例１２》
ガラス基板にシリカのアルカリ防止膜をスパッタ法にて約２００Åの厚さに成膜したマザー基板を用い、８０ｍｍ×８０ｍｍの液晶パネルを複数個レイアウトした機種を以下の手順で製造した。すなわち、スピンコート法にて新日鐵化学株式会社製の遮光膜材料Ｖ−２５９ＢＫＩＳ−Ｈを約０．５μｍの厚さに塗布し、セグメント表示の表示部分および液晶セルの周辺に設けたシール部分より外側の部分が遮光させるようなフォトマスクを用いて、３００ｍＪの露光を行ない、現像、乾燥、ベーキングを行なった。この膜のＯＤ値は１．５、絶縁抵抗値は２×１０^１４Ω／□であった。
【０１５４】
この基板に２３０℃の温度でスパッタ法にて約１０００Åの透明導電膜を形成した。面抵抗値は約３０Ω／□であった。さらにフォトレジストを塗布したのち、セグメント表示の部分に電圧が印加されるように配線部分を遮光したフォトマスクを用い、露光、現像を行なった後、エッチング液にて不要部分のＩＴＯを除去、さらにＮaＯＨ水溶液にてレジストを剥離して、電極基板を作成した。
【０１５５】
対向する基板は、アルカリ防止膜、ＩＴＯを順次形成し、同様に電極基板を作成した。遮光膜を形成した基板にはポリイミド系の配向膜材料を用い、転写印刷法にて厚さ約６００Åとなるように成膜した。対向する基板にはチタニア、シリカを混合した無機系の絶縁膜を形成するために、ゾルゲル法にて印刷成膜を行なった。そののち、同様に配向膜を形成して焼成し、両基板を同じ方向に平行にラビングした。
【０１５６】
片側の基板には１．５μｍの直径を持つ触媒化成工業株式会社製の真し球を散布し、対向する基板には三井化学株式会社製のストラクトボンドを液晶セルの周辺および表示部で遮光膜に覆われている部分に支柱状に配置するようにスクリーン印刷法にて印刷した。対向する基板の導通を取るための電極を設けた部分には、導電ビーズを混合したシール材を印刷し、導通させた。このシール材は遮光膜の上に形成されているため、遮光膜側からは、ほとんど見えない位置となっていた。
【０１５７】
これらの基板を対向させ、熱圧着工程を通して硬化させ注入口、端子部等を切り出したのち、液晶セルおよび液晶注入ボートを加熱し、強誘電性液晶をネマチックあるいは等方性状態として真空注入法にて注入し、注入口にＵＶ硬化性のエポキシ樹脂を塗布して封止した。各セグメント部分のギャップのばらつきを測定したところ、最大で０．１μｍ程度の偏差に収まっており、均一性の良好なセルが形成されていた。なお、使用した強誘電性液晶は、「等方性−Ｎ−ＳｍＡ−ＳｍＣ＊−結晶」の相系列を有し、約−１０゜Ｃ〜約＋６０゜Ｃの温度範囲で強誘電性（ＳｍＣ＊）を示すブレンド品である。
【０１５８】
そののち、両側に偏光軸が直交となり、かつ電圧の印加により遮光と透光が切り替わるように一組の偏光板を液晶の配向方向に対して所定の角度に設定して貼り付け、強誘電性液晶表示パネルを完成させた。
このようにして作成したセルの裏面にＣＣＴバックライトを設置し、メモリー性を生かした線順次書き込み駆動で１６本駆動したところ、視角も広く良好な視認性を示した。
【０１５９】
【発明の効果】
以上説明したように、本発明の液晶表示装置は、セル内のギャップ幅を均一にすることができるばかりでなく、そのギャップ幅自体をもより狭くすることが可能になる。
【０１６０】
したがって、表示面内の色ムラが生ずることがないとともに、表示モード、セルの光学設計、液晶材料等の選択肢が増し、よりコントラストの高い表示、視角の広い表示、さらには応答速度の速い表示、優れた製品外観を実現できる。
また、遮光膜の電気絶縁性が高いので、その上に直接透明電極を形成することができ、工程が簡略化されるばかりでなく、端子部の透明電極の信頼性が向上する。
さらに、遮光膜を周辺シール材の内側もしくは内部まで延設すれば、余分な外部遮光膜を設けることなく、効果的に光抜けが防止でき、有効表示面積を拡大できる。
【０１６１】
また、表示領域内に位置する遮光膜の少なくとも一部の上に、周辺シール材と同材質の支柱を設けることにより、従来ギャップの均一性をとることが困難であった液晶セルにおいても、加圧封止を行わなくともセル中央部が膨らむことがなく、特性の均一性の良いセルが作成できる。特に、ＳＴＮ機種では加圧封止工程が必須であったが、この構成によれば加圧封止を行うことなく均一なセルを作成することが可能となる。この場合、支柱に用いるシール材と周辺シール材とが同材質であるので、支柱用のシール材を新たに用意する必要がない。
【０１６２】
さらに、配向が乱れると自己回復性がない強誘電性液晶や反強誘電性液晶を用いた液晶表示素子の場合、支柱を設けることによってギャップ均一性が向上するばかりでなく、外部ストレス、衝撃、振動などによる配向乱れを防止することができ、特に、車載や可搬性の液晶表示装置に用いられる場合に有効な手段となる。
【０１６３】
遮光膜付きのパネルは、ヘッドアップディスプレイなどの投写型表示としても用いられているが、従来の印刷法では、その遮光膜を微細なパターンに形成できないため、投射の拡大率も２倍までが限界であったが、本発明によれば、フォトリソグラフィ法で形成することができるために微細加工が可能となり、３倍以上の投射拡大に耐える品位が達成できる。
【０１６４】
また、バックライトとしては、従来タングステンランプ、キセノンランプ、ＥＬが用いられることが多く、色の鮮やかさはあまり要求されていなかったが、本発明によれば、白色ＬＥＤなどの新規バックライトとの組み合わせにより、彩度の高いカラーの利点が生かされる、などの効果が奏される。
【図面の簡単な説明】
【図１】本発明による一実施例としての液晶表示装置を示した模式的断面図。
【図２】従来の印刷法による遮光膜を用いた液晶表示装置の模式的断面図。
【符号の説明】
１０，１０Ａ液晶表示装置
１１，１２透明基板
１１ａ端子部
１１１，１２１透明電極
１３１，１３２引き出し電極
１４周辺シール材
１５液晶
１６１，１６２偏光板
１７バックライト
２１遮光膜
２２透光膜（カラーフィルター）[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a liquid crystal display device, and more particularly to a transmissive liquid crystal display device having a backlight on the back surface.
[0002]
[Prior art]
In a transmissive liquid crystal display device having a backlight on the back surface, a light-shielding film is provided on the inner surface of the cell in order to improve visibility, and FIG. 2 schematically shows a cross section of a typical conventional example. Has been shown.
[0003]
According to this, the liquid crystal display device 10 includes a pair of transparent substrates 11 and 12 made of glass or the like, and in this example, a terminal portion 11a is continuously provided on one transparent substrate 11 side. Although not shown in detail, transparent electrodes 111 and 121 made of ITO (Indium Tin Oxide) are formed on the transparent substrates 11 and 12 along a predetermined display pattern.
[0004]
In this case, a light shielding film 112 is provided on one transparent substrate 11 side except for the display pattern portion. Although not shown in detail, the terminal portion 11 a includes a first extraction electrode group 131 that is directly extracted from the transparent electrode 111 of one transparent substrate 11, and a transparent electrode 121 of the other transparent substrate 12. A second lead electrode group 132 to be connected is formed.
[0005]
The transparent substrates 11 and 12 are bonded so that the transparent electrodes 111 and 121 face each other via a peripheral sealing material 14 such as an epoxy resin, and then the liquid crystal 15 is sealed in the cell gap. The peripheral sealing material 14 is provided with a transfer material made of, for example, conductive beads, and the transparent electrode 121 of the other transparent substrate 12 is electrically connected to the second lead electrode group 132 of the terminal portion 11a through the transfer material. Connected to.
[0006]
Polarizing plates 161 and 162 are disposed on the outer surfaces of the transparent substrates 11 and 12, respectively. In the liquid crystal display device 10, one transparent substrate 11 having a light shielding film 112 is a back side, and a backlight 17 is provided on the back side. Therefore, the other transparent substrate 12 is used as the surface side.
[0007]
[Problems to be solved by the invention]
By the way, in forming the light-shielding film, conventionally, a printing method has been mainly employed. However, in order to obtain a sufficient light-shielding degree of 2 or more in terms of optical density (OD value), the thickness of the printing method is not limited. However, since the surface smoothness is poor, the printing accuracy is limited and fine processing cannot be performed.
[0008]
For this reason, even if the gap is reduced, the printed film thickness is limited, and the gap width can only be reduced to about 6 μm at most. Even in such a gap, defects such as a short circuit between the transparent substrates facing each other and gap unevenness often occur due to the projection of the light shielding film, which is a major limitation in terms of yield and quality. It was.
[0009]
In addition, as a method of realizing a color display partially colored in a cell using such an inner surface light-shielding film, a method of performing color printing by screen printing outside the cell, or a part where a color filter is installed outside A coloring method, a method of printing a colored layer by screen printing or offset printing on the inner surface of the cell, and the like have been used, but each has the following problems.
[0010]
That is, in the case of printing outside the cell or pasting a color filter, color shift due to parallax is unavoidable, so it is difficult to paint colors in close patterns and has an interval of about 1 mm or more. Only rough patterns could be handled. In addition, when a color filter is provided inside the cell by printing, the voltage applied to the liquid crystal layer is applied to the color filter because it is provided on the ITO by printing. There was a problem of deteriorating value characteristics. In addition, there is a method in which the color polarizing plate is partially dyed and the display color is changed, but it is not used because it is not cost effective.
[0011]
On the other hand, a technique for producing a color filter using a black resist and a color resist is also well known, and has been put into practical use in full dot display such as a large STN (Super Twisted Nematic) and a TFT (Thin Film Transistor).
[0012]
The light shielding film used in the color filter for TFTs is not required to have electrical insulation, but rather has a certain degree of conductivity. This is because ITO is deposited on the color filter, but the conductivity of the light-shielding film assists the conductivity necessary for ITO, and the ITO exhibits good operating characteristics even when the resistance is relatively high.
[0013]
On the other hand, in the case of an STN color filter in which stripe-patterned ITO is provided on the color filter, it is not preferable to have conductivity from the viewpoint of securing electrical insulation between lines and reducing capacitance. . However, surface smoothness is important for color filters used in STN, and therefore it is necessary to provide a resin smoothing layer on the color filters.
[0014]
Since the resin of the smoothing layer is electrically insulating, the low electrical insulating property of the light shielding film of the color filter as a result has not been a major obstacle. That is, although a material having a high insulating property and a high absorbance has been known, it can be said that there is no application that can make use of this performance.
[0015]
Further, the light shielding film provided by the printing method has insufficient adhesion to the transparent substrate, and the peripheral sealing material cannot be printed on the light shielding film. For this reason, when the display part of the liquid crystal panel is observed from an oblique direction in a state where it is actually attached to a car audio or the like, if the viewing angle is deep enough to deviate from the light shielding film, the backlight There was a case where light leaked.
[0016]
In order to prevent this, conventionally, screen printing is performed in a frame shape with black ink on an area including a portion corresponding to the peripheral sealing material on the surface of the cell to prevent light leakage. I could not deny that the number would increase.
[0017]
On the other hand, the conventional color display method for displaying partially different colors by driving at a low duty has the following problems. That is, in the method of printing the color filter outside the cell or attaching the color filter, it is necessary to increase the distance between the patterns in order to prevent the colors between the patterns from being mixed due to parallax. Can not be colored.
[0018]
On the other hand, according to the method of printing the color filter on the inner surface of the cell, although there is no problem in accuracy, the color purity is poor and the reliability is low. Even in this method of printing a color filter on the inner surface of the cell, a printing type light-shielding film is provided on the inner surface. However, in order to obtain sufficient absorbance, a film thickness of 2 to 4 μm is necessary. Occurrence was inevitable.
[0019]
For this reason, the cell gap varies, and as a result, the device characteristics vary. In addition, there is a limit to the definition in the printing method, and it is extremely difficult to design a pattern with the width of the light-shielding film in the portion where color change is performed being about 200 μm or less, which is subject to design restrictions. Furthermore, because of the irregularities on the inner surface of the cell, in the TN system, when the pretilt angle is set to 2 ° or less, a domain is generated, so that a decrease in pretilt angle for improving characteristics cannot be realized. Further, since the smoothness of the surface is poor, the STN method or the ferroelectric or antiferroelectric liquid crystal method cannot be adopted even if it is desired to realize the driving of about 1/30 duty.
[0020]
In addition, when a thermosetting resin is used for the peripheral sealing material, the center of the cell tends to swell after the peripheral sealing material is thermally cured due to the difference in thermal expansion coefficient between the sealing material and the glass substrate. Even when liquid crystal is sealed in the cell, the central portion remains inflated, and the characteristics and background color may be different between the central portion and the peripheral portion.
[0021]
In order to prevent this, particularly in a large panel or an STN method in which the unevenness of the cell gap greatly affects the optical characteristics, for example, after injecting liquid crystal into the cell, the liquid crystal layer is brought into a reduced pressure state, In addition, it is necessary to perform a pressure sealing operation such as sealing in a state where the gap around the cell is uniform.
[0022]
Furthermore, liquid crystal display elements using smectic liquid crystals such as ferroelectric liquid crystals or anti-ferroelectric liquid crystals do not have self-healing orientation, and may become unusable due to stress, impact or vibration after sealing. Once the turbulence was disturbed, it was necessary to re-orientate by heat treatment again depending on the degree.
[0023]
In order to solve the above problems, there is a method in which a heat-softening resin is coated around the in-plane spacer and the upper and lower substrates are fused when the peripheral sealing material is thermally cured. However, in order to demonstrate sufficient immobilization performance, the amount of in-plane spacer and the amount of heat-softening resin to be coated must be increased, and light leakage occurs due to scattering and aggregation of the in-plane spacer itself, Appearance may be deteriorated. In addition, the heat-softening resin component starts to dissolve in the liquid crystal, which may reduce the reliability.
[0024]
[Means for solving problems]
In order to solve these problems, the present invention provides a pair of transparent substrates that are sandwiched by a peripheral sealing material with a liquid crystal layer sandwiched between them, polarizing plates attached to the outer surfaces thereof, and a display surface side. Illumination means provided behind the one polarizing plate on the back side when viewed from the side, and a non-display area on the inner surface side of the one transparent substrate and a portion corresponding to the display pattern in the display area In a transmissive liquid crystal display device in which a light shielding film is provided in a portion corresponding to each of the non-display portions except for, and a voltage higher than the excitation of the liquid crystal layer is applied to a desired transparent electrode in the display pattern. The non-display portion in the display area has a plurality of sections of 1 mm × 1 mm or more, and the light shielding film has an insulation resistance of 10 ¹² It has an electrical insulation property of Ω / □ or more, and an optical density (OD value) per 1 μm of film thickness is 2.0 or more, and a photosensitive light-shielding resin material is patterned. In the one transparent substrate, the transparent electrode is directly formed on the light-shielding film without an insulating smoothing layer, and a smoothing layer is also formed below the peripheral sealing material. The light-shielding film is disposed without being provided, and the end of the light-shielding film stops within the width of the peripheral sealing material over the entire circumference. It is characterized by that.
[0026]
Since the light-shielding film located in the display area has a plurality of sections of 1 mm × 1 mm or more, it is also one of the features of the present invention that a column made of the same material as the peripheral sealing material is provided on at least a part thereof. One.
[0027]
A typical display pattern in which the non-display portion in the display area includes a plurality of sections of 1 mm × 1 mm or more is, for example, a segment type pattern such as a Japanese character pattern, but this and a dot pattern are mixed. For example, a pattern in which 5 × 7 dot sections repeatedly appear at intervals is also exemplified.
[0028]
When a light-transmitting film having a predetermined transmission color is provided in a portion corresponding to the display pattern, the light-transmitting film has an insulation resistance 10. ¹² One of the features of the present invention is that a photosensitive resin material having an insulation resistance value of Ω / □ or more is patterned. In this case, the transparent electrode can be directly formed on the light transmitting film and the light shielding film without using a smoothing layer.
[0029]
The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is approximately 90 °, and the pair of polarizing plates are arranged so that their polarization axes are parallel to each other. An embodiment in which the pretilt angle formed by the transparent substrate is 1.5 degrees or less is also included in the present invention.
[0030]
In each of the above embodiments, the liquid crystal layer is a nematic liquid crystal layer, and an embodiment in which the duty ratio for driving the nematic liquid crystal layer is 1/1 to 1/33 is also included in the present invention.
[0031]
The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is approximately 90 ° twist, and the pair of polarizing plates are arranged so that their deflection axes are orthogonal to each other, and the refractive index anisotropic of the nematic liquid crystal A mode in which Δnd, which is a product of the property Δn and the distance d between the transparent conductive films forming the display pattern, is between 0.4 and 0.6 μm is also included in the present invention.
[0032]
The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is 70 to 80 °, and the pair of polarizing plates is disposed so that the crossing angle of the polarization axes is 70 to 80 °. An embodiment in which Δnd, which is the product of the refractive index anisotropy Δn of the nematic liquid crystal and the distance d between the transparent conductive films forming the display pattern, is between 0.4 and 0.6 μm is also included in the present invention. .
[0033]
In an embodiment in which the liquid crystal layer is a nematic liquid crystal layer and the twist angle between the transparent substrates is approximately 90 ° twist or 70 to 80 ° twist, the duty ratio for driving the nematic liquid crystal layer is set to 1/1 to 1/4. The embodiment is also included in the present invention.
[0034]
The liquid crystal layer is a nematic liquid crystal layer, and a twist angle between the transparent substrates is 180 to 270 °, and at least between the one polarizing plate and the transparent substrate facing the retardation plate A mode in which the pair of polarizing plates is arranged such that light is transmitted when no voltage is applied and light is shielded when a voltage is applied is also included in the present invention.
[0035]
The present invention also includes an aspect in which the liquid crystal layer is a ferroelectric liquid crystal or an anti-ferroelectric liquid crystal, and the pair of polarizing plates are arranged so that their polarization axes are substantially orthogonal to each other, and light shielding and transmission can be switched by applying a voltage. It is.
[0036]
In the case of a TN (twisted nematic) type negative display, the use of a nematic liquid crystal to which a dichroic dye is added can improve the contrast ratio, which is also included in the features of the present invention.
[0037]
Conventionally used tungsten lamp, xenon lamp, EL, etc. can be used as the illumination means, but a white light source such as a white LED (light emitting diode) having three colors of RGB or white CCT is used. Preferably employed.
[0038]
Further, the light-shielding resin material is made of a resin material obtained by polymerizing and curing a resin composition containing an alkali-soluble epoxy acrylate acid adduct containing insulating carbon. film This resin material is made of a resin material obtained by polymerizing and curing a resin composition containing an alkali-soluble epoxy acrylate acid adduct. And It can be mentioned as one of the features of the present invention.
[0039]
DETAILED DESCRIPTION OF THE INVENTION
Next, a specific configuration of the liquid crystal display device 10A as an embodiment of the present invention shown in FIG. 1 will be described. In this embodiment, parts that are the same as or the same as those of the conventional example described above are denoted by the same reference numerals.
[0040]
In this example, as the transparent substrates 11 and 12, substrates obtained by applying a glass alkali prevention film to silica were used. First, a transparent light-shielding resin material manufactured by Nippon Steel Chemical Co., Ltd., that is, insulating carbon, and an alkali-soluble epoxy acrylate acid adduct is resin-coated on the transparent substrate 12 side, which is the surface side, by spin coating. V-259BKIS-H (trade name), which is a resin composition contained as a component, was applied to a thickness of about 1 μm.
[0041]
Then, using a photomask that shields the display part of the segment display and the part outside the part of the peripheral sealing material 14 arranged around the transparent substrates 11 and 12, exposure is performed at 300 mJ, development, drying, Baking was performed to form the light shielding film 21 on the transparent substrate 12.
[0042]
The light-shielding resin material manufactured by Nippon Steel Chemical Co., Ltd. has an OD value of about 3.0 at a thickness of 1 μm, and has sufficient absorbance. Roll coater, bar coater, slit coater, etc. can be used for coating, but the film thickness variation causes cell gap variation, and when forming a translucent film, the film thickness variation is easily colored. It becomes dispersion. Therefore, spin coating is desirable, but in order to reduce the amount of liquid used, it may be used in combination with a bar coater or a slit coater, and any method may be adopted as long as it is excellent in film thickness uniformity. .
[0043]
The light shielding film material is composed of a black pigment, a resin component such as a polymerizable monomer and an oligomer, a photopolymerization initiator, a solvent, and the like. As this resin component, a general photosensitive resin component, specifically, photopolymerizable A compound having an ethylenically unsaturated group and an alkali-developable α, β-unsaturated carboxylic acid or ester thereof, or a copolymer using these as monomers, preferably bisphenolfluorene as disclosed in JP-A-8-278629. Examples of such acid addition products of epoxy acrylates of bisphenols.
[0044]
Only the light-shielding film 21 is formed, and coloring can be handled by printing outside the cell or attaching a color filter. In this embodiment, in order to perform predetermined coloring on the cell inner surface, a segment type display unit is used. A photomask on which a color filter as a translucent film is formed is prepared, and color resists such as red, green, and yellow (V-259R-H, V-259G-H, and V-259Y-H, respectively) are prepared. All of them were manufactured by Nippon Steel Chemical Co., Ltd.) by spin coating and exposed, developed, dried and baked to form a light-transmitting film 22.
[0045]
By using this material, it becomes possible to provide a cell that does not change color to a temperature of about 250 ° C. and does not change in color even after passing through the transparent conductive film forming step and the cell forming step. When combined with a backlight composed of a white light source, a particularly good color can be exhibited.
[0046]
Moreover, in order to express any color including colorless (white), several kinds of primary colors can be prepared, blended according to requirements, and toned. As basic colors, it is desirable to arrange at least six colors of red, blue, green, yellow, purple, and clear. It is preferable to form a clear film from the viewpoint of smoothing the inner surface of the cell even in a portion that does not require coloring. In this case, it is practical to add a small amount of pigment to the clear film and reduce the transmittance to about 70% in order to alleviate the difference in transmittance with the colored portion. The pigment is not particularly limited as long as it is a generally available material having high chroma and high transmittance.
[0047]
The light-shielding film 21 may be installed so as to be under the peripheral sealing material 14 in the case of a liquid crystal cell, or may extend to the inner side (liquid crystal layer side) of the peripheral sealing material 14. In the case where it is provided under the peripheral sealing material, since the peripheral sealing material 14 is hidden by the light shielding film when viewed from the transparent substrate 12 on the light shielding film forming side, the effective area of the cell surface can be widened.
[0048]
In this case, it is preferable to prevent the end of the light shielding film from staying in the width of the peripheral sealing material over the entire circumference from the viewpoint of preventing the seal strength from being lowered. For example, in such a design, the seal strength after the initial and high-temperature moisture resistance tests (80 ° C., 90%, 50 hours) was 5.6 kgf and 4.7 kgf, respectively, but the end of the light shielding film is the sealing material. By projecting to the outer side (on the side opposite to the liquid crystal layer), there are cases where the pressure drops to 3.5 kgf and 2.3 kgf, respectively.
[0049]
Conventionally, when a wide opening on the display surface is desired, a black frame is often printed on the front-side polarizing plate surface by a screen printing method in order to hide the peripheral sealing material 14. By providing the light shielding film 21 under the peripheral sealing material 14, the printing process can be omitted, which can contribute to cost reduction. In order to prevent light leakage from the seal portion more completely, a light shielding material can be used as the peripheral sealing material.
[0050]
When the transparent film 22 is provided on the light shielding film 21 as in this embodiment, it is preferable that the transparent film 22 is kept inside the peripheral sealing material 14. In addition, the design of the portion of the light transmitting film 22 that overlaps the light shielding film 21 has no effect when viewing the display from the light shielding film 21 side, but when viewing from the light transmitting film 22 side, the light transmitting film 22 is not affected. The installation shape of 22 can be visually recognized slightly.
[0051]
In addition, when the light-transmitting film 22 is provided only in the display portion, the outline is visually recognized, which is not preferable. In order to avoid this, it is preferable to set the design clearance to 0.5 mm or less in order to prevent the colors of the light-transmitting films 22 from overlapping each other and from increasing the spacing.
[0052]
When viewing the display from the light-shielding film 21 side, the boundary between different colors is hidden by the light-shielding film 21, so the above-mentioned gap width is not a problem from the viewpoint of visibility, and is designed to overlap. Also good. For example, when this gap is about 5 μm, the coating of the transparent electrode patterning photoresist becomes incomplete at that portion, and disconnection may occur, so if there is a margin in the uniformity of the gap in the cell, Rather, it is preferable to make them overlap.
[0053]
When the light shielding film 21 is provided below the peripheral sealing material 14 on the transparent substrate 12 side, the transparent electrode 121 is formed on the light shielding film 21 and the light transmitting film 22. These films have an insulation resistance of 10 ¹² Since the insulating film has an insulating property of Ω / □ or more, it is not necessary to provide a protective layer for insulation. The resistance between the wires is 10 ¹¹ If it is Ω / □ or more, there is no problem because the bleeding phenomenon does not occur when a liquid crystal cell is used.
[0054]
A transparent conductive film was formed on the color substrate thus formed by sputtering at a substrate temperature of about 230 ° C. The sheet resistance value is set to an appropriate value depending on the pattern design of the element, but is preferably about 100Ω / □ to about 30Ω / □. After applying a photoresist on this substrate, use a photomask that shields the wiring so that a voltage is applied to the display pattern, and after exposure and development, remove unnecessary ITO with an etchant. Then, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode 121.
[0055]
Thus, since the light shielding film and the light transmissive film material are exposed to the etching solution and the resist stripping solution in the process of manufacturing the color substrate, resistance to these chemical solutions is also required.
[0056]
In the case of the liquid crystal cell observed from the light shielding film 21 side, only the portion without the light shielding film transmits light, and even when observed by reflection, there is no transparent electrode between the light shielding film and the glass substrate. Although the drawing pattern is not visible, when the cell is observed from the transparent substrate 11 side facing the substrate provided with the light shielding film 21 and becomes regular reflection, the transparent electrode pattern wired on the surface of the light shielding film 21 Will be visible.
[0057]
In order to make the routing of the transparent electrode inconspicuous, it is preferable to set the gap between adjacent transparent electrode routings to about 100 μm, and it is preferable to realize such a narrow space between the detailed patterns. If this is not possible due to restrictions, as a rough guide, the coverage of the transparent electrode may be 90% or more. It goes without saying that a higher ratio is preferable.
[0058]
When there is a margin around the display portion and the light shielding film 21 is not provided under the peripheral sealing material 14, the light shielding film may be formed after the transparent electrode pattern is formed on the transparent substrate. In this case, it is preferable that the transparent substrate 11 side opposite to the substrate 12 provided with the light shielding film 21 is the display surface. That is, by doing so, a phenomenon in which the transparent electrode pattern is conspicuous at the time of non-lighting is suppressed, and a good product appearance can be obtained.
[0059]
About the transparent substrate 11 which opposes, the alkali prevention film | membrane and the transparent electrode were formed in order, and it was set as the transparent electrode substrate. An alignment film having a pretilt angle of 1 to 1.5 ° is preferably used for the transparent substrate 12 on which the light shielding film 21 and the light transmitting film 22 are formed. In the case of a TN device, it is known that the viewing angle can be increased by reducing the pretilt angle. However, since the light shielding film provided by the conventional printing method is thick and the surface unevenness is severe, 1 Since a reverse tilt domain is caused at a pretilt angle as small as 1.5 ° from the angle, it could not be used. In the case of the light shielding film 21 provided by the method of the present invention, a pretilt angle of 1.5 ° or less can be applied. The alignment film showing such a pretilt angle does not matter.
[0060]
The thickness of the alignment film is preferably about 600 mm because it shows good alignment performance and has little influence on electro-optical characteristics. On the opposing transparent substrate 11, it is preferable to form an inorganic insulating film mixed with titania and silica by a sol-gel method, and then form an alignment film and perform a rubbing treatment. The inorganic film is effective for preventing a short circuit between the surfaces.
[0061]
In this example, in-plane spacers were scattered on the transparent substrate 12 side, and the peripheral sealing material 14 was printed around the cells by screen printing on the opposing transparent substrate 11. As the peripheral sealing material 14, a material in which conductive beads are mixed as a transfer material in order to establish conduction between the transparent substrates 11 and 12 can be used. The conductive beads may be mixed only at a place where conduction is obtained, or may be mixed throughout the frame-shaped sealing material 14.
[0062]
In addition, the center of the cell is likely to swell and the cell gap is likely to be uneven (for example, the distance between the sealing material and the display portion is 10 mm or more, or the cell shape is substantially square) , Low gap cells (for example, those having a cell gap of 5 μm or less), those that have been subjected to a pressure sealing process to eliminate cell gap unevenness, or alignment of the liquid crystal layer due to external stress, impact, vibration For those which are easily disturbed (for example, ferroelectric liquid crystal and antiferroelectric liquid crystal), it is preferable to provide a columnar seal material at least at a part corresponding to the light shielding film. As the sealing material at this time, a sealing material of the same material as the peripheral sealing material is used. When conductive beads are mixed in the peripheral sealing material, the columnar sealing material is installed in a portion where the upper and lower electrodes do not face each other.
[0063]
These transparent substrates 11 and 12 are opposed to each other, cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected into the cell by a vacuum injection method, and UV curable is injected into the injection port. An epoxy resin was applied and sealed. Then, as in the conventional case, polarizing plates 161 and 162 are disposed on the outer surface sides of the transparent substrates 11 and 12, respectively, and a backlight 17 is disposed on the back surface of the polarizing plate 161 on the back side.
[0064]
Note that TN and STN can be applied as the display mode of the liquid crystal display device. Even in the case of TN, negative display and positive display can be realized by combination with a polarizing plate, but combination with either mode is possible. Also, Δnd may be any design of about 0.48 μm, so-called first minimum, or about 1.1 μm, called second minimum, and may be a design of third minimum (about 1.7 μm) or more.
[0065]
In the case of TN in the negative mode, conventionally, when Δnd is around 0.48 μm, color unevenness is liable to occur, and it has been difficult to obtain good display performance. Since it is good, there is no particular limitation. When the positive mode is used, it is generally used at Δnd of about 0.48 μm. However, the light-shielding film needs to have an absorbance of 2.5 or more, and the conventional printing method has a thickness of about 4 μm. Was needed. For this reason, since it is practically impossible for the cell gap to be less than 6 μm, a special liquid crystal having Δn of 0.1 or less had to be selected in order to make Δnd about 0.48 μm.
[0066]
On the other hand, in the present invention, the light shielding film can be used even if it is 1 μm or less, and the cell gap can be 5 μm or less, and in some cases, 3 μm or less. As a result, the value of Δn can be increased, and the types of liquid crystal materials that can be used can be expanded and the characteristics can be improved.
[0067]
In the positive mode, the viewing angle dependency can be reduced by providing a retardation plate between the polarizing plate and the transparent substrate. As a typical retardation plate in which such an effect is recognized, there is a wide view film using a discotic liquid crystal manufactured by Fuji Photo Film Co., Ltd.
[0068]
In general, manufacturing is performed by a so-called multi-pattern design in which a plurality of cells are taken out from a mother substrate. However, on a pair of opposing substrates, a pattern is opposite to a so-called F plate whose observation side is a light shielding film side. A so-called R-plate design in which the observation side is the light-shielding film side may be used alternately. In this case, a transparent electrode designed to correspond to the F and R patterns of the light shielding film is formed. According to this, since there is no connection portion to be discarded in the portion between the liquid crystal cells to be cut out, the use efficiency of the substrate is improved and the number of cuts for cutting can be reduced, so that the process is shortened and the yield is improved. Has the advantage of
[0069]
In the present invention, an ordinary tungsten lamp or EL can be used as the light source of the illumination means provided behind the polarizing plate on the back surface side. However, from the viewpoint of taking advantage of the high saturation of the colored layer, the RGB spectrum is used. A white light source such as an LED or CCT is preferably used.
[0070]
【Example】
Example 1
Using a substrate in which a silica alkali prevention film is formed on a glass substrate to a thickness of about 200 mm by a sputtering method, a light shielding film material V-259BKIS-H made by Nippon Steel Chemical Co., Ltd. is about 1 μm by a spin coating method. Applied to thickness. Then, exposure was performed at 300 mJ using a photomask that shields the display portion of the segment display and the portion outside the peripheral sealing material portion provided around the liquid crystal cell, and development, drying, and baking were performed. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0071]
Next, in order to carry out predetermined coloring, three photomasks with a transparent film formed on the segment portions are prepared, and red, green and yellow color resists (V-259R-H and V-259G, respectively) are prepared. -H, V-259Y-H (both manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, and exposure, development, drying, and baking were performed. The insulation resistance value of each obtained translucent film is 3 × 10. ¹⁴ It was Ω / □. These translucent films were formed in a portion slightly narrower than the outer shape of the cell so as not to cover the peripheral sealing material, and a gap of 0.3 mm was provided so that the respective colors did not overlap each other.
[0072]
On the color substrate thus formed, an ITO transparent conductive film having a thickness of about 1000 mm was formed by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 30Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. On the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed.
[0073]
A predetermined alignment film having a pretilt angle of 1.3 ° was used on the substrate on which the light-shielding film and the light-transmitting film were formed, and was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Thereafter, an alignment film was similarly formed and fired, and both substrates were rubbed so that the twist angle was 90 °.
[0074]
An in-plane spacer made by Sekisui Fine Chemical Co., Ltd. with a diameter of 6 μm is sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals is used around the liquid crystal cell by screen printing as a peripheral sealing material on the opposite substrate. Printed. 3% of conductive beads made by Sekisui Fine Chemical Co., Ltd. were added to the sealing material in order to keep the substrate up and down. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0075]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did.
[0076]
When the gap variation of each segment portion was measured, the deviation was within a maximum of about 0.3 μm, and a cell with good uniformity was formed.
Then, a set of polarizing plates was attached to the both sides of the substrate at a predetermined angle so that the polarization axes were parallel to complete a color liquid crystal display cell.
[0077]
The cell thus created was driven at 1/8 duty, and a backlight using a CCT having a RGB three-color spectrum as a light source was installed on the back surface, and the viewing angle was wide. Good visibility was shown.
[0078]
<Comparative example 1>
The ITO transparent conductive film formed on the glass is patterned, and black pigment dispersion ink is offset printed on one substrate so that the light shielding film is formed inside the display area and the seal of the segment. It was formed to a thickness of 2 μm. The OD value of this film is 1.7, and the insulation resistance value is 3 × 10. ¹³ It was Ω / □. On the opposite substrate, a light-transmitting film was formed at a predetermined position with color ink by a screen printing method. An alignment film having a pretilt angle of 1.3 ° was formed on these substrates, rubbed so as to have a twist angle of 90 °, and cells were formed through 6 μm in-plane spacers. Thereafter, nematic liquid crystal was injected and sealed.
[0079]
After sticking the polarizing plate, it was driven at 1/8 duty, a tungsten lamp backlight was installed on the back surface, and the viewing angle was slightly narrowed when observed from the printing side of the light shielding film. When the edge portion of the segment was observed finely, a domain was generated, and the original characteristics were not obtained. When the cell gap variation was measured, it was found that there was a maximum variation of 2.2 μm in the plane, which was also the cause of the narrow viewing angle. In addition, when observed under direct sunlight, light scattering that appears to be caused by the print pigment particles on the surface of the cell occurred, and the contrast was also lowered.
[0080]
Example 2
Using a substrate in which a silica alkali prevention film is formed on a glass substrate to a thickness of about 200 mm by a sputtering method, a light shielding film material V-259BKIS-H made by Nippon Steel Chemical Co., Ltd. is about 1 μm by a spin coating method. Using a photomask that coats the thickness and shields the display part of the segment display and the part outside the peripheral sealing material provided in the peripheral part of the liquid crystal cell, it is exposed to 300 mJ, developed, dried and baked Was done. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0081]
An ITO transparent conductive film having a thickness of about 2000 mm was formed on the thus formed substrate with a light-shielding film by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 10Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. An alkali prevention film and ITO were sequentially formed on the opposing substrate, and a transparent electrode was similarly formed.
[0082]
A predetermined alignment film having a pretilt angle of about 2 ° was used on the substrate on which the light shielding film was formed, and was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Next, similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 90 °.
[0083]
In-plane spacers made by Sekisui Fine Chemical Co., Ltd. with a diameter of 5 μm are sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals, a thermosetting epoxy resin, is used as the peripheral sealing material on the opposite substrate. Was printed by the screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. were added as a transfer material for conducting conduction between the upper and lower sides of the substrate, and further 5% of glass fiber for maintaining the sealing gap was added. Since the peripheral sealing material is formed on the light shielding film, it is in a position that is hardly visible from the light shielding film side.
[0084]
These substrates are made to face each other and cured through a thermocompression bonding process, and after cutting out the injection port and terminal portion, nematic liquid crystal having Δn of 0.077 is injected by vacuum injection, and UV curable epoxy resin is injected into the injection port. Was applied and sealed. When the gap width of each segment portion was measured, it was about 6 μm, which was equal to the sum of the thicknesses of the in-plane spacer and the light shielding film, and it was confirmed that the spacer did not sink into the light shielding film. When Δnd of this cell was measured, it was 0.46. The in-plane gap deviation is also within a maximum deviation of about 0.3 μm, and cells with good uniformity were formed.
[0085]
Thereafter, a pair of polarizing plates were combined on both sides of the substrate so that the polarization axes were parallel, and were bonded at a predetermined angle to complete a liquid crystal display cell. The cell thus created was driven at 1/2 duty, a tungsten lamp backlight was installed on the back surface, and observed from the side where the light-shielding film was formed, and a contrast ratio of 300: 1 was achieved on the front surface. It was confirmed that it had good visibility.
[0086]
<Comparative example 2>
The ITO transparent conductive film formed on the glass is patterned, and the light-shielding film is printed to a thickness of 4 μm by offset printing so that the light-shielding film is formed inside the segment display part and the seal on one substrate. Formed with. The light shielding film had an OD value of 2.5. Together with the opposing substrates, alignment films having a pretilt angle of 2 ° were formed on these substrates, rubbed so as to have a twist angle of 90 °, and cells were formed through 6 μm in-plane spacers.
[0087]
Thereafter, the same nematic liquid crystal as in Example 2 was injected and sealed. The injection required four times as long as in Example 2. Further, when the gap width and uniformity were confirmed after sealing, the gap width was 6.2 μm, and it was found that the in-plane spacer was greatly sinked into the printed light-shielding film. It was also found that there was a maximum gap variation of 2.2 μm in the plane.
[0088]
After attaching the polarizing plate, it was driven at 1/2 duty, a backlight of a tungsten lamp was installed on the back surface, and the front contrast was 150: 1 on average when observed from the printing side of the light shielding film. Due to the non-uniformity of the gap, there was a part of 200: 1 and a part of 100: 1. Further, when observed under direct sunlight, the cell surface was scattered and the contrast was slightly lowered.
[0089]
Example 3
A mother substrate in which a plurality of 80 mm × 80 mm cells were laid out was manufactured by the following procedure using a substrate in which a silica alkali prevention film was formed on a glass substrate to a thickness of about 200 mm by sputtering. That is, a portion of the peripheral sealing material provided on the display portion of the segment display and the peripheral portion of the liquid crystal cell by applying the light shielding film material V-259BKIS-H manufactured by Nippon Steel Chemical Co., Ltd. to a thickness of about 1 μm by spin coating. Using a photomask that shields the outer portion from light, exposure was performed at 300 mJ, and development, drying, and baking were performed. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0090]
An ITO transparent conductive film having a thickness of about 2000 mm was formed on the thus formed substrate with a light-shielding film by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 10Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. An alkali prevention film and ITO were sequentially formed on the opposing substrate, and a transparent electrode was similarly formed.
[0091]
A predetermined alignment film having a pretilt angle of about 2 ° was used on the substrate on which the light shielding film was formed, and was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Next, similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 90 °.
[0092]
In-plane spacers made by Sekisui Fine Chemical Co., Ltd. with a diameter of 4 μm are sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals, a thermosetting epoxy resin, is attached to the periphery of the liquid crystal cell as a sealing material on the opposite substrate. It printed by the screen-printing method on the predetermined part which is covered with the light shielding film and the upper and lower electrodes are not facing. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. were added as a transfer material for conducting conduction between the upper and lower sides of the substrate, and further 5% of glass fiber for maintaining the sealing gap was added. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0093]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width of each segment portion was measured, it was about 5 μm, which was almost equal to the total thickness of the in-plane spacer and the light shielding film, and it was confirmed that the spacer was not submerged in the light shielding film. . The in-plane gap deviation is also within a maximum deviation of about 0.2 μm, and a cell with excellent gap uniformity between the central portion and the peripheral portion was formed.
[0094]
Next, a pair of polarizing plates is combined on both sides of the substrate so that the polarization axes are parallel, and bonded at a predetermined angle, and further, color printing is performed on the backlight side on the back surface at predetermined locations according to the display segment. A plastic sheet color-coded was pasted to complete the liquid crystal display cell.
[0095]
The cell thus produced was driven at 1/2 duty, a tungsten lamp backlight was installed on the back surface, and observed from the side where the light-shielding film was formed. As a result, a contrast ratio of about 300: 1 was achieved, and it was confirmed that uniform cells were obtained even in the characteristics.
[0096]
Example 4
A mother substrate in which a plurality of 80 mm × 80 mm cells were laid out was manufactured by the following procedure using a substrate in which a silica alkali prevention film was formed on a glass substrate to a thickness of about 200 mm by sputtering. That is, a portion of the peripheral sealing material provided on the display portion of the segment display and the peripheral portion of the liquid crystal cell by applying the light shielding film material V-259BKIS-H manufactured by Nippon Steel Chemical Co., Ltd. to a thickness of about 1 μm by spin coating. Using a photomask that shields the outer portion from light, exposure was performed at 300 mJ, and development, drying, and baking were performed. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0097]
An ITO transparent conductive film having a thickness of about 2000 mm was formed on the thus formed substrate with a light-shielding film by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 10Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. An alkali prevention film and ITO were sequentially formed on the opposing substrate, and a transparent electrode was similarly formed.
[0098]
A predetermined alignment film having a pretilt angle of about 2 ° was used on the substrate on which the light shielding film was formed, and was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Next, similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 90 °.
[0099]
A 4μm diameter in-plane spacer made by Sekisui Fine Chemical Co. is sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals, which is a thermosetting epoxy resin, is used as a peripheral sealing material on the opposite substrate. Was printed by the screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. were added as a transfer material for conducting conduction between the upper and lower sides of the substrate, and further 5% of glass fiber for maintaining the sealing gap was added. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0100]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width of each segment portion was measured, it was about 5 μm, which was almost equal to the total thickness of the in-plane spacer and the light shielding film, and it was confirmed that the spacer was not submerged in the light shielding film. . The in-plane gap deviation is also within a maximum of about 0.5 μm, and a cell having a slightly large deviation is formed in the gap between the central portion and the peripheral portion.
[0101]
Next, a pair of polarizing plates were combined on both sides of the substrate so that the polarization axes were parallel and pasted at a predetermined angle to complete a liquid crystal display cell.
The cell thus created was driven at 1/2 duty, a backlight of a tungsten lamp was installed on the back surface, and when observed from the side where the light shielding film was formed, a front contrast ratio of 250: 1 was achieved. Visibility with no problem in practical use was confirmed.
[0102]
<Comparative Example 3>
The ITO transparent conductive film formed on the glass is patterned, and black pigment dispersion ink is offset printed on one substrate so that the light shielding film is formed inside the display area and the seal of the segment. It was formed to a thickness of 4 μm. The light shielding film has an OD value of 3.4 and an insulation resistance value of 1.5 × 10. ¹³ It was Ω / □. Together with the opposing substrates, alignment films having a pretilt angle of 2 ° were formed on these substrates, rubbed so as to have a twist angle of 90 °, and cells were formed via 4 μm in-plane spacers.
[0103]
Thereafter, the same nematic liquid crystal as in Example 3 was injected. When the gap width and uniformity were confirmed after the injection, the gap width was 6 μm, and it was found that color unevenness due to gap unevenness occurred in the central portion and the peripheral portion. At this time, it was found that there was a gap variation of up to 2.6 μm in the plane.
[0104]
The cell after this injection was sealed under pressure at a load of 0.2 kg / □, and then the gap width was confirmed again. The gap width was narrowed to 5.5 μm, and the in-plane gap deviation was 1.0 μm.
After pasting the polarizing plate, it was driven at 1/2 duty, a tungsten lamp backlight was installed on the back surface, and the front contrast was 200: 1 when observed from the printing side of the light shielding film. In addition, color unevenness due to gap unevenness occurred in some places.
[0105]
Example 5
A silica alkali-proof film was formed on a glass substrate by sputtering to a thickness of about 200 mm, and subsequently an ITO transparent conductive film of about 2000 mm was formed by sputtering at a temperature of 300 ° C. The sheet resistance value was about 10Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to prepare an electrode substrate.
[0106]
Using this substrate, a light shielding film material V-259BKIS-H manufactured by Nippon Steel Chemical Co., Ltd. is applied to a thickness of about 1 μm by spin coating, and a peripheral sealing material provided around the display portion of the segment display and the liquid crystal cell Using a photomask that shields light up to the inner part, exposure was performed at 300 mJ, and development, drying, and baking were performed. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □. As the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and an electrode substrate was similarly formed.
[0107]
A predetermined alignment film having a pretilt angle of about 2 ° was used on the substrate on which the light shielding film was formed, and the film was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 90 °.
[0108]
One side of the substrate is sprayed with Sekisui Fine Chemical's in-plane spacers with a diameter of 5 μm, and the opposite substrate is a peripheral sealing material with a struct bond made by Mitsui Chemicals, a thermosetting epoxy resin, in a liquid crystal cell. It was printed by the screen printing method around the periphery. In order to maintain the sealing gap, 3% of Sekisui Fine Chemical Co., Ltd. conductive beads are added to the sealing material as a transfer material for conducting conduction between the upper and lower sides of the substrate. The spacer was mixed. Since this sealing material was formed outside the light shielding film, it was in a position where it could be seen from the light shielding film side.
[0109]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width of each segment portion was measured, it was about 6 μm, which was almost equal to the total thickness of the in-plane spacer and the light shielding film, and it was confirmed that the spacer was not submerged in the light shielding film. . The in-plane gap deviation is also within a maximum deviation of about 0.3 μm, and cells with good uniformity were formed.
[0110]
Next, a pair of polarizing plates were combined on both sides of the substrate so that the polarization axes were parallel and pasted at a predetermined angle to complete a liquid crystal display cell.
When the cell thus produced was driven at 1/2 duty, a backlight of a tungsten lamp was installed on the back surface, and observed from the substrate surface opposite to the side on which the light shielding film was formed, the contrast ratio was 300 on the front surface. 1 was achieved, and a seal could be seen around the cell. Therefore, although the effective display area was somewhat narrow, it was confirmed that it had good visibility.
[0111]
Example 6
Using a substrate in which a silica alkali prevention film is formed on a glass substrate to a thickness of about 200 mm by a sputtering method, a light shielding film material V-259BKIS-H made by Nippon Steel Chemical Co., Ltd. is about 1 μm by a spin coating method. Using a photomask that coats the thickness and shields the display part of the segment display and the part outside the peripheral sealing material provided around the liquid crystal cell, it is exposed to 300 mJ, and is developed, dried and baked. I did it. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0112]
Next, in order to perform predetermined coloring, three photomasks with a light-transmitting film formed on the segment portions are prepared, and red, green, and yellow color resists (V-259R-H and V-259G, respectively) are prepared. -H, V-259Y-H (both manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, and exposure, development, drying, and baking were performed. The insulation resistance value of each obtained translucent film is 3 × 10. ¹⁴ It was Ω / □. These translucent films were formed in a portion slightly narrower than the outer shape of the cell so as not to cover the peripheral sealing material, and a gap of 0.3 mm was provided so that the respective colors did not overlap each other.
[0113]
On the color substrate thus formed, an ITO transparent conductive film having a thickness of about 1000 mm was formed by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 30Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to prepare an electrode substrate. As the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and an electrode substrate was similarly formed.
[0114]
A predetermined alignment film having a pretilt angle of 2 ° was used for the substrate on which the light-shielding film and the light-transmitting film were formed, and the film was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Similarly, an alignment film was formed and baked, and both substrates were rubbed so that the twist angle was 70 °.
[0115]
In-plane spacers made by Sekisui Fine Chemical Co., Ltd. with a diameter of 5 μm are sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals, a thermosetting epoxy resin, is used as the peripheral sealing material on the opposite substrate. Was printed by the screen printing method. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. were added as a transfer material for conducting conduction between the upper and lower sides of the substrate, and further 5% of glass fiber for maintaining the sealing gap was added. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0116]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width of each segment portion was measured, it was about 6 μm, which was substantially equal to the total thickness of the in-plane spacer and the light shielding film, and it was confirmed that the spacer was not submerged in the light shielding film. The in-plane gap deviation is also within a maximum deviation of about 0.3 μm, and cells with good uniformity were formed.
[0117]
Thereafter, a pair of polarizing plates was combined on both sides of the substrate so that the crossing angle of the polarization axes was 70 ° and pasted at a predetermined angle to complete a liquid crystal display cell.
The cell thus created was driven at 1/2 duty, a backlight using a white LED having an RGB spectrum on the back surface was installed, and observed from the side where the light shielding film was formed. In a direction inclined by 30 ° in the direction, a contrast ratio of 300: 1 was achieved, and it was confirmed that the film had good visibility. In addition, since the light-transmitting film is provided on the inner surface, the display performance is good with no color shift even when viewed obliquely.
[0118]
Example 7
Using a substrate in which a silica alkali prevention film is formed on a glass substrate to a thickness of about 200 mm by a sputtering method, a light shielding film material V-259BKIS-H made by Nippon Steel Chemical Co., Ltd. is about 1 μm by a spin coating method. Using a photomask that coats the thickness and shields the display part of the segment display and the part outside the peripheral sealing material provided around the liquid crystal cell, it is exposed to 300 mJ, and is developed, dried and baked. I did it. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0119]
An ITO transparent conductive film having a thickness of about 2000 mm was formed on the thus formed substrate with a light-shielding film by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 10Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. On the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed.
[0120]
A predetermined alignment film having a pretilt angle of about 2 ° was used on the substrate on which the light shielding film was formed, and the film was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printed film was formed by a sol-gel method. Similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 90 °.
[0121]
One side of the substrate is sprayed with Sekisui Fine Chemical's in-plane spacers with a diameter of 5 μm, and the opposite substrate is a peripheral sealing material with a struct bond made by Mitsui Chemicals, a thermosetting epoxy resin, in a liquid crystal cell. It was printed by the screen printing method around the periphery. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. were added as a transfer material for conducting conduction between the upper and lower sides of the substrate, and further 5% of glass fiber for maintaining the sealing gap was added. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0122]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width of each segment portion was measured, it was about 6 μm, which was substantially equal to the total thickness of the in-plane spacer and the light shielding film, and it was confirmed that the spacer was not submerged in the light shielding film. Further, the gap deviation within the plane is within a deviation of about 0.3 μm at the maximum, and cells with good uniformity were formed.
[0123]
After that, wide view, which is a viewing angle expansion film manufactured by Fuji Photo Film Co., Ltd., is installed on both sides, and a pair of polarizing plates are combined so that their polarization axes are parallel, and pasted at a predetermined angle, and a liquid crystal display cell Was completed.
[0124]
The cell thus created was driven by static drive and observed from the substrate side on which the light shielding film was formed. As a result, a contrast ratio of 300: 1 was achieved on the front side, and further up to 30 ° tilted from the front side in the left-right direction. It was confirmed that it had good visibility showing a contrast of 200: 1 or more.
[0125]
Example 8
Using a substrate in which a silica alkali prevention film is formed on a glass substrate to a thickness of about 200 mm by a sputtering method, a light shielding film material V-259BKIS-H made by Nippon Steel Chemical Co., Ltd. is about 1 μm by a spin coating method. Using a photomask that coats the thickness and shields the display part of the segment display and the part outside the peripheral sealing material provided around the liquid crystal cell, it is exposed to 300 mJ, and is developed, dried and baked. I did it. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0126]
Next, in order to carry out predetermined coloring, three photomasks with a transparent film formed on the segment portions are prepared, and red, green and yellow color resists (V-259R-H and V-259G, respectively) are prepared. -H, V-259Y-H (both manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, and exposure, development, drying, and baking were performed. The insulation resistance value of each obtained translucent film is 3 × 10. ¹⁴ It was Ω / □. These translucent films were formed in a portion slightly narrower than the outer shape of the cell so as not to be sealed, and a gap of 0.3 mm was provided so that the respective colors did not overlap each other.
[0127]
On the color substrate thus formed, an ITO transparent conductive film having a thickness of about 1000 mm was formed by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 30Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. On the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed.
[0128]
A predetermined alignment film having a pretilt angle of 5 ° was used for the substrate on which the light-shielding film and the light-transmitting film were formed, and the film was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 240 °.
[0129]
An in-plane spacer made by Sekisui Fine Chemical Co., Ltd. with a diameter of 6 μm is sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals is used around the liquid crystal cell by screen printing as a peripheral sealing material on the opposite substrate. Printed. To the sealing material, 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. was added as a transfer material for conducting conduction between the upper and lower sides of the substrate. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0130]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width variation of each segment portion was measured, the deviation was within a maximum of about 0.3 μm, and a cell with good uniformity was formed.
[0131]
After that, a retardation plate having a predetermined retardation value that is biaxially stretched on both sides of the substrate is installed, and a pair of polarizing plates are attached to the outside so that the polarization axes thereof are orthogonal to each other to display a color liquid crystal display. Completed the cell.
The cell thus produced was driven at 1/32 duty, a tungsten lamp backlight was installed on the back surface, and observed from the side where the light-shielding film was formed. Compared to the 1/8 duty drive TN system. In addition, the viewing angle was wide and showed good visibility.
[0132]
Example 9
Using a substrate in which a silica alkali prevention film is formed on a glass substrate to a thickness of about 200 mm by a sputtering method, a light shielding film material V-259BKIS-H made by Nippon Steel Chemical Co., Ltd. is about 1 μm by a spin coating method. Using a photomask that coats the thickness and shields the display part of the segment display and the part outside the peripheral sealing material provided around the liquid crystal cell, it is exposed to 300 mJ, and is developed, dried and baked. I did it. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0133]
Next, in order to perform predetermined coloring, three photomasks with a light-transmitting film formed on the segment portions are prepared, and red, green, and yellow color resists (V-259R-H and V-259G, respectively) are prepared. -H, V-259Y-H (both manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, and exposure, development, drying, and baking were performed. The insulation resistance value of each obtained translucent film is 3 × 10. ¹⁴ It was Ω / □. These light-transmitting films were formed in a portion slightly narrower than the outer shape of the cell so as not to be sealed, and a gap of 0.3 mm was provided so that the respective colors did not overlap each other.
[0134]
On the color substrate thus formed, an ITO transparent conductive film having a thickness of about 1000 mm was formed by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 30Ω / □. After applying photoresist to this substrate, use a photomask that shields the wiring so that voltage is applied to the segment display area, and after exposure and development, remove unnecessary ITO with an etchant. Further, the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. On the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed.
[0135]
A predetermined alignment film having a pretilt angle of 5 ° was used for the substrate on which the light-shielding film and the light-transmitting film were formed, and the film was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 240 °.
[0136]
One side of the substrate is sprayed with Sekisui Fine Chemical's in-plane spacers with a diameter of 6 μm, and the opposite substrate is printed with a mit bond by Mitsui Chemicals on the periphery of the liquid crystal cell as a peripheral sealing material by screen printing. did. 3% of conductive beads made by Sekisui Fine Chemical Co., Ltd. were added to the sealing material as a transfer material for conducting conduction between the upper and lower sides of the substrate. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0137]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width variation of each segment portion was measured, the deviation was within a maximum of about 0.3 μm, and a cell with good uniformity was formed.
[0138]
Thereafter, a uniaxial retardation plate was placed at a predetermined angle on both sides of the substrate, and a pair of polarizing plates were attached at a predetermined angle to the outside thereof, thereby completing a color liquid crystal display cell.
The cell thus created was driven at 1/32 duty, a white CCT backlight having RGB spectrum was installed on the back surface, and observed from the side where the light shielding film was formed. Compared with the TN system, the viewing angle was wider and the visibility was good.
[0139]
Example 10
Using a substrate in which a silica alkali prevention film is formed on a glass substrate to a thickness of about 200 mm by a sputtering method, a light shielding film material V-259BKIS-H made by Nippon Steel Chemical Co., Ltd. is about 1 μm by a spin coating method. Using a photomask that coats the thickness and shields the display part of the segment display and the part outside the peripheral sealing material provided around the liquid crystal cell, it is exposed to 300 mJ, and is developed, dried and baked. I did it. The OD value of this film is 3.0, and the insulation resistance value is 1 × 10. ¹⁴ It was Ω / □.
[0140]
As the pattern, a so-called F plate whose observation side is the light shielding film side and a so-called R plate whose counter observation side is the light shielding film side are alternately arranged. Then, in order to perform predetermined coloring, three photomasks having a translucent film formed on the segment portions are prepared, and red, green, and yellow color resists (V-259R-H and V-259G-respectively, respectively) are prepared. H, V-259Y-H (both manufactured by Nippon Steel Chemical Co., Ltd.) were sequentially applied by spin coating, and exposure, development, drying, and baking were performed. The insulation resistance value of each obtained translucent film is 3 × 10. ¹⁴ It was Ω / □. These translucent films were formed in a portion slightly narrower than the outer shape of the cell so as not to be sealed, and a gap of 0.3 mm was provided so that the respective colors did not overlap each other.
[0141]
On the color substrate thus formed, an ITO transparent conductive film having a thickness of about 1000 mm was formed by a sputtering method at a temperature of 230 ° C. The sheet resistance value was about 30Ω / □. After applying a photoresist to this substrate, exposure and development are performed using a photomask in which the wiring portion is shielded so that a voltage is applied to the segment display portion designed to correspond to the F and R patterns of the light shielding film. After that, unnecessary portions of ITO were removed with an etching solution, and the resist was peeled off with an aqueous NaOH solution to form a transparent electrode. The ITO wiring gap was designed to be a minimum of about 70 μm, and the ITO coverage of the entire surface was set to 90% or more.
[0142]
Also on the opposing substrate, an alkali prevention film and an ITO transparent conductive film were sequentially formed, and a transparent electrode was similarly formed using a photomask in which F and R patterns were alternately arranged. The thickness of the wiring here is not particularly narrow so that the necessary routing resistance can be secured.
[0143]
A predetermined alignment film having a pretilt angle of 1.3 ° was used for the substrate on which the light-shielding film and the light-transmitting film were formed, and was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. Similarly, an alignment film was formed and baked, and both the substrates were rubbed so that the twist angle was 90 °.
[0144]
One side of the substrate is sprayed with Sekisui Fine Chemical's in-plane spacers with a diameter of 6 μm, and the opposite substrate is used as a peripheral sealing material, and Mitsui Chemicals' tract bond is screen printed around the liquid crystal cell. Printed. 3% of conductive beads manufactured by Sekisui Fine Chemical Co., Ltd. were added to the sealing material as a transfer material for conducting conduction between the upper and lower sides of the substrate. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0145]
These substrates are made to face each other and cured through a thermocompression bonding process, and after the injection port and terminal portion are cut out, nematic liquid crystal is injected by a vacuum injection method, and UV curable epoxy resin is applied to the injection port and sealed. did. When the gap width variation of each segment portion was measured, the deviation was within a maximum of about 0.3 μm, and a cell with good uniformity was formed. Thereafter, a pair of polarizing plates were attached at a predetermined angle so that the polarization axes were parallel to both sides of the substrate, and a color liquid crystal display cell was completed.
[0146]
A backlight was installed on the back surface of the cell thus prepared, and the cell was driven at 1/8 duty. When observed from the side of the substrate on which the light-shielding film was formed, the viewing angle was wide as in the case of Example 1, and good visibility was exhibited. Further, even when observed from the opposite side of the light shielding film, visibility comparable to that of the light shielding film side was obtained under a normal indoor environment. Although the surface reflection was slightly strong under direct sunlight, the routing pattern was not visible, and practically sufficient performance was obtained.
[0147]
Example 11
A model in which a plurality of 80 mm × 80 mm liquid crystal panels were laid out using a mother substrate in which a silica alkali prevention film was formed on a glass substrate by sputtering to a thickness of about 200 mm was manufactured by the following procedure. That is, a light shielding film material V-259BKIS-H manufactured by Nippon Steel Chemical Co., Ltd. is applied to a thickness of about 0.5 μm by spin coating, and a display portion for segment display and a seal portion provided around the liquid crystal cell Using a photomask that shields light from the outer portion, exposure was performed at 300 mJ, and development, drying, and baking were performed. The OD value of this film is 1.5, and the insulation resistance value is 2 × 10. ¹⁴ It was Ω / □.
[0148]
A transparent conductive film of about 1000 mm was formed on this substrate by sputtering at a temperature of 230 ° C. The sheet resistance value was about 30Ω / □. Furthermore, after applying photoresist, exposure and development were performed using a photomask that shielded the wiring so that a voltage was applied to the segment display part, and then unnecessary ITO was removed with an etching solution. The resist was peeled off with an aqueous NaOH solution to prepare an electrode substrate.
[0149]
As the opposing substrate, an alkali prevention film and ITO were sequentially formed, and an electrode substrate was similarly formed. A polyimide-based alignment film material was used for the substrate on which the light-shielding film was formed, and was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printed film was formed by a sol-gel method. After that, an alignment film was similarly formed and baked, and both substrates were rubbed in parallel in the same direction.
[0150]
Spectral spheres made by Catalytic Kasei Kogyo Co., Ltd. having a diameter of 1.5 μm are sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals Co., Ltd. is applied to the opposite substrate around the liquid crystal cell and on the display part It printed by the screen-printing method so that it might arrange | position in the column shape in the part covered with. A seal material mixed with conductive beads was printed on a portion provided with an electrode for conducting the opposing substrate, and was made conductive. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0151]
These substrates are made to face each other and cured through a thermocompression bonding process, and after cutting out the injection port, terminal portion, etc., the liquid crystal cell and the liquid crystal injection boat are heated, and the antiferroelectric liquid crystal is brought into an isotropic state by a vacuum injection method. Then, a UV curable epoxy resin was applied to the inlet and sealed. When the gap variation of each segment portion was measured, it was within a deviation of about 0.1 μm at the maximum, and cells with good uniformity were formed. The antiferroelectric liquid crystal used has a phase series of “isotropic-SmA-SmCA * -crystal” and has antiferroelectricity (SmCA) in a temperature range of about −10 ° C. to about + 60 ° C. *) Blend product showing.
[0152]
After that, a set of polarizing plates was attached at a predetermined angle so that the polarization axes were orthogonal to both sides and the light was not applied when no voltage was applied, thereby completing the antiferroelectric liquid crystal display panel.
When a CCT backlight was installed on the back surface of the cell thus prepared, and 16 lines were driven by line-sequential writing driving taking advantage of memory characteristics, the viewing angle was wide and good visibility was exhibited.
[0153]
Example 12
A model in which a plurality of 80 mm × 80 mm liquid crystal panels were laid out using a mother substrate in which a silica alkali prevention film was formed on a glass substrate by sputtering to a thickness of about 200 mm was manufactured by the following procedure. That is, a light shielding film material V-259BKIS-H manufactured by Nippon Steel Chemical Co., Ltd. is applied to a thickness of about 0.5 μm by spin coating, and a display portion for segment display and a seal portion provided around the liquid crystal cell Using a photomask that shields the outer portion from light, exposure was performed at 300 mJ, and development, drying, and baking were performed. The OD value of this film is 1.5, and the insulation resistance value is 2 × 10. ¹⁴ It was Ω / □.
[0154]
A transparent conductive film of about 1000 mm was formed on this substrate by sputtering at a temperature of 230 ° C. The sheet resistance value was about 30Ω / □. Furthermore, after applying a photoresist, after exposing and developing using a photomask that shields the wiring portion so that a voltage is applied to the segment display portion, the unnecessary portion of ITO is removed with an etching solution. The resist was peeled off with an aqueous NaOH solution to prepare an electrode substrate.
[0155]
As the opposing substrate, an alkali prevention film and ITO were sequentially formed, and an electrode substrate was similarly formed. A polyimide-based alignment film material was used for the substrate on which the light-shielding film was formed, and was formed to a thickness of about 600 mm by a transfer printing method. In order to form an inorganic insulating film in which titania and silica were mixed on the opposing substrate, a printing film was formed by a sol-gel method. After that, an alignment film was similarly formed and baked, and both substrates were rubbed in parallel in the same direction.
[0156]
Spectral spheres made by Catalytic Kasei Kogyo Co., Ltd. having a diameter of 1.5 μm are sprayed on one side of the substrate, and a struct bond made by Mitsui Chemicals Co., Ltd. is applied to the opposite substrate around the liquid crystal cell and on the display part It printed by the screen-printing method so that it might arrange | position in the column shape in the part covered with. A seal material mixed with conductive beads was printed on a portion provided with an electrode for conducting the opposing substrate, and was made conductive. Since this sealing material was formed on the light shielding film, it was in a position that was hardly visible from the light shielding film side.
[0157]
These substrates are made to face each other and cured through a thermocompression bonding process, and after cutting out the injection port, terminal portion, etc., the liquid crystal cell and the liquid crystal injection boat are heated, and the ferroelectric liquid crystal is made into a nematic or isotropic state for the vacuum injection method. Then, a UV curable epoxy resin was applied to the inlet and sealed. When the gap variation of each segment portion was measured, it was within a deviation of about 0.1 μm at the maximum, and cells with good uniformity were formed. The ferroelectric liquid crystal used has a phase series of “isotropic-N-SmA-SmC * -crystal” and is ferroelectric (SmC) in a temperature range of about −10 ° C. to about + 60 ° C. *) Blend product showing.
[0158]
After that, a pair of polarizing plates is set at a predetermined angle with respect to the alignment direction of the liquid crystal so that the polarization axes are perpendicular to each other and the light shielding and the light transmission are switched by applying a voltage. A liquid crystal display panel was completed.
When a CCT backlight was installed on the back surface of the cell thus prepared, and 16 lines were driven by line-sequential writing driving taking advantage of memory characteristics, the viewing angle was wide and good visibility was exhibited.
[0159]
【The invention's effect】
As described above, the liquid crystal display device of the present invention can not only make the gap width in the cell uniform, but also make the gap width itself narrower.
[0160]
Therefore, color unevenness in the display surface does not occur, and options such as display mode, cell optical design, and liquid crystal material are increased, display with higher contrast, display with a wide viewing angle, and display with a quick response speed, Excellent product appearance can be realized.
In addition, since the light shielding film has high electrical insulation, a transparent electrode can be formed directly on the light shielding film, which not only simplifies the process but also improves the reliability of the transparent electrode in the terminal portion.
Furthermore, if the light shielding film extends to the inside or the inside of the peripheral sealing material, light leakage can be effectively prevented without providing an extra external light shielding film, and the effective display area can be expanded.
[0161]
In addition, by providing a support made of the same material as the peripheral sealing material on at least a part of the light-shielding film located in the display area, even in a liquid crystal cell in which it has been difficult to achieve a uniform gap in the past. Even if pressure sealing is not performed, the cell central portion does not swell, and a cell with good uniformity of characteristics can be created. In particular, in the STN model, a pressure sealing process is essential, but according to this configuration, a uniform cell can be created without performing pressure sealing. In this case, since the sealing material used for the support and the peripheral sealing material are the same material, it is not necessary to prepare a new sealing material for the support.
[0162]
Furthermore, in the case of a liquid crystal display element using a ferroelectric liquid crystal or an anti-ferroelectric liquid crystal that does not self-recover if the alignment is disturbed, not only the gap uniformity is improved by providing a support, but also external stress, impact, Disturbance of alignment due to vibration or the like can be prevented, and this is an effective means particularly when used in a vehicle-mounted or portable liquid crystal display device.
[0163]
Panels with a light-shielding film are also used for projection displays such as head-up displays, but the conventional printing method cannot form the light-shielding film in a fine pattern, so the projection magnification rate can be doubled. Although it was a limit, according to the present invention, since it can be formed by a photolithography method, fine processing is possible, and a quality that can withstand projection expansion of 3 times or more can be achieved.
[0164]
Further, as a backlight, a tungsten lamp, a xenon lamp, and an EL are often used in the past, and the vividness of the color has not been required so much, but according to the present invention, a new backlight such as a white LED can be used. Effects such as taking advantage of high-saturated colors are achieved by the combination.
[Brief description of the drawings]
FIG. 1 is a schematic cross-sectional view showing a liquid crystal display device as one embodiment according to the present invention.
FIG. 2 is a schematic cross-sectional view of a liquid crystal display device using a light shielding film by a conventional printing method.
[Explanation of symbols]
10, 10A liquid crystal display device
11,12 Transparent substrate
11a terminal
111, 121 transparent electrode
131,132 Lead electrode
14 Peripheral sealing material
15 LCD
161, 162 Polarizing plate
17 Backlight
21 Shading film
22 Translucent membrane (color filter)

Claims

A pair of transparent substrates sandwiched by a peripheral sealing material with a liquid crystal layer sandwiched between them, a polarizing plate attached to the outer surface thereof, and the one polarized light that is the back surface side when viewed from the display surface side Light shielding means provided behind the plate, and shields light from portions corresponding to the non-display area on the inner surface side of the one transparent substrate and the non-display section excluding the portion corresponding to the display pattern in the display area. In a transmissive liquid crystal display device, in which a film is provided and a voltage higher than the excitation of the liquid crystal layer is applied to a desired transparent electrode in the display pattern,
The non-display portion in the display region has a plurality of sections of 1 mm × 1 mm or more, and the light-shielding film has an electrical insulation property of an insulation resistance of 10 ¹² Ω / □ or more, and an optical per 1 μm film thickness. density (OD value) is not less than 2.0, Ri name by patterning the photosensitive light-shielding resin material,
In the one transparent substrate, the transparent electrode is directly formed on the light shielding film without a smoothing layer for insulation,
The light shielding film is arranged without providing a smoothing layer also below the peripheral sealing material, and the end of the light shielding film is stopped within the width of the peripheral sealing material over the entire circumference. Liquid crystal display device.

A light-transmitting film having a predetermined transmission color is further provided so as to cover a portion corresponding to the display pattern, and the light-transmitting film has an insulation resistance value of 10 ¹² Ω / □ or more, and is photosensitive. Patterned resin material,
The liquid crystal display device according to claim 1, wherein the transparent electrode is directly formed on the light shielding film and the light transmitting film without a smoothing layer interposed therebetween.

3. The liquid crystal display device according to claim 1, wherein a support column made of the same material as that of the peripheral sealing material is provided on at least a part of the light shielding film located in the display region.

A plurality of transparent films which the transparent film has a transparent color of a different color, according to claim 2, wherein the transparent film between the transparent color of the different colors are disposed so as not to overlap each other A liquid crystal display device according to 1.

The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is approximately 90 °, and the pair of polarizing plates are arranged so that their polarization axes are parallel to each other. the liquid crystal display device according to any one of claims 1 to 4 form a pretilt angle of the transparent substrate is equal to or less than 1.5 degrees.

The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is approximately 90 °, and the pair of polarizing plates are arranged so that their polarization axes are orthogonal to each other. claims 1, wherein the Δnd which is the product of the distance d between the transparent conductive film forming the sexual Δn and the display pattern is between 0.4~0.6μm any one of 4 A liquid crystal display device according to 1.

The liquid crystal layer is a nematic liquid crystal layer, the twist angle between the transparent substrates is 70 to 80 °, and the pair of polarizing plates is arranged so that the crossing angle of the polarization axes is 70 to 80 °. The product of the refractive index anisotropy Δn of the nematic liquid crystal and the distance d between the transparent conductive films forming the display pattern is in a range of 0.4 to 0.6 μm. 5. The liquid crystal display device according to any one of 1 to 4 .

The liquid crystal layer is a nematic liquid crystal layer, and a twist angle between the transparent substrates is 180 to 270 °, and at least between the one polarizing plate and the transparent substrate facing the retardation plate There is disposed, the liquid crystal display device according to any one of claims 1, characterized in that said pair of polarizing plates are arranged to be switched shielding the transmission voltage application 4.

The liquid crystal layer is a ferroelectric liquid crystal or an anti-ferroelectric liquid crystal, and the pair of polarizing plates are arranged so that their polarization axes are substantially perpendicular to each other, and light shielding and transmission can be switched by applying a voltage. Item 5. The liquid crystal display device according to any one of Items 1 to 4 .

A liquid crystal layer is a nematic liquid crystal layer, the liquid crystal display device according to any one of claims 1 to 5, characterized in that the duty ratio for driving the same nematic liquid crystal layer is 1 / 1-1 / 33 .

The liquid crystal layer is a nematic liquid crystal layer, the liquid crystal display device according to claim 6 or 7, wherein the duty ratio for driving the same nematic liquid crystal layer is 1 / 1-1 / 4.

The liquid crystal layer is a nematic liquid crystal layer, the liquid crystal display according to any one or claims 10 or 11 according to claim 1 to 7, characterized in that the dichroic dye in the nematic liquid crystal layer is added apparatus.

The liquid crystal display device according to any one of claims 1 to 12 , wherein the illuminating means comprises a white light source having a spectrum of three colors of RGB.

The light-shielding resin material, to any one of claims 1 to 13, characterized in that it consists of a resin material having a resin composition is polymerized and cured to an epoxy acrylate acid adduct of the alkali-soluble comprising an insulating carbon The liquid crystal display device described.

The transmissive film of the resin material, according to any one of claims 2, characterized in that it consists of a resin material obtained by polymerizing and curing a resin composition containing an epoxy acrylate acid adduct of the alkali-soluble 14 Liquid crystal display device.