JP2007162514A - Fluid actuator, heat generating device using same and analysis device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a fluid actuator capable of being driven by a simple structure, making fluid easily flow even in a narrow fluid passage, and being manufactured easily. <P>SOLUTION: This actuator is provided with the fluid passage 2 including a base body 3 on a part of an inner wall, a support part 22 erectly provided on a fluid passage inner wall of the base body 3, a tabular vibration body 21 attached on the support part 22 in parallel with the inner wall, and a vibration apply part driving fluid in the fluid passage by inducing bending vibration of the vibration body 21 via the support part 22. Since the vibration body 21 vibrates in bending motion, fluid in the fluid passage is fanned in a condition where the same is fanned by a round fan and the fluid can flow. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a fluid actuator for generating a constant flow or a swirling flow in a fluid using a fin-type vibrating body. The present invention also relates to a heat generating apparatus and an analyzing apparatus using the fluid actuator.

  In recent years, the speed of a microprocessor (MPU) has been remarkably increased, and has reached an operating frequency of several GHz or more. Since high-speed MPU is realized by increasing the integration density, it is inevitable that the heat generation density becomes high. In the current highest speed MPU, the total heat generation amount reaches 100 W or more and the heat generation density reaches 400 W / mm 2 or more, and the heat generation amount continues to increase as the speed increases further.

In order to cool the MPU, there is one in which a fan or a water cooling device is attached to the upper surface of the MPU package. However, although the heat generating part of the MPU is a circuit part formed on a silicon substrate, there is a problem that the cooling efficiency is low because the fan and cooling are performed via a package or the like.
Therefore, as disclosed in Non-Patent Document 1, a structure has been proposed in which a fluid passage is formed in a silicon substrate of an MPU and fluid is circulated through the fluid passage. Cooling is possible in the very vicinity of the semiconductor substrate, which is a heat generating part, and it is possible to cope with an increase in heat generation accompanying the increase in speed of the MPU. However, the MPU water cooling system disclosed in Non-Patent Document 1 uses an electroosmotic pump as a pump. However, in a narrow fluid passage formed on the silicon substrate of the MPU, the fluid passage resistance increases, so that it is about 400V. There is a problem that a high drive voltage is required.

  Also, in micro analysis systems (μTAS (Micro Total Analysis Systems)), electroosmotic flow is used to flow the solvent containing the analysis sample, and electrophoresis and dielectrophoresis are used to move the sample particles in the solvent. Although the principle is used, since an electric field is directly applied to a solution, there is a problem that it is not suitable for a sample that is altered when an electric field is applied.

In view of the above conditions, a fluid actuator that drives a fluid is suitable, and Non-Patent Document 2 discloses a fluid actuator that uses vibration of fins. Non-Patent Document 2 discloses a micropump in which a fin-like fluid actuator that resonates on the bottom surface of a flow path is arranged.
Daniel J. Laser et. Al., "Silicon Electroosmotic Micropumps for Integrated Circuit Thermal Management", IEEE Transducers, pp151-154, 2003 RJ Linderman, Oyvind Nilsen, Victor M. Bright, “The Resonant Micro Fan Gas Pump for Active Breathing Microchannels”, IEEE TRANSDUCERS '03, pp1923-1926, 2003

However, the conventional fluid actuator has the following problems.
The electroosmotic flow pump as a fluid actuator used in the MPU water cooling system of Non-Patent Document 1 has a large fluid passage resistance in a narrow fluid passage formed on the silicon substrate of the MPU, so a high driving voltage of about 400 V is required. is necessary.
Since the micropump using the resonance fin of Non-Patent Document 2 is designed so that the fluid flows only in one direction, there is a problem that it is difficult to change the direction in which the fluid flows.

The present invention has been devised to solve the above-described problems in the prior art, and its purpose is to enable high-power fluid drive at a relatively low voltage, and in the direction of flow. An object of the present invention is to provide a fluid actuator that can be controlled and can be reduced in size and weight.
Another object of the present invention is to provide a heat generating apparatus and an analyzing apparatus that are integrated together with the fluid actuator and do not require an external pump and that can be simultaneously manufactured by a batch process.

  In order to achieve the above object, a liquid actuator according to the present invention includes a fluid passage through which a base body is formed as a part of an inner wall and fluid can move inside, and a support portion erected on the inner wall of the fluid passage of the base body. A flat vibrating body attached to the support portion in a direction parallel to the inner wall, and vibration for driving the fluid in the fluid passage by bending and vibrating the vibrating body via the support portion And an application unit.

According to the liquid actuator of the present invention, since the vibrating body bends and vibrates only by applying vibration from the vibration applying unit, the fluid in the fluid passage is in a state where it is covered with a fan. It can flow.
It is preferable that the mounting position of the vibrating body on the support portion is disposed at a position shifted from the center of the vibrating body in the fluid passage direction. With this structure, when the vibration applying unit is vibrated at a predetermined frequency, the vibrating body performs bending vibrations having different magnitudes on one side and the other side in the fluid passage direction. The fluid flow will flow in one direction. The direction of flow differs depending on the vibration frequency of the vibration application unit.

Therefore, if the vibration frequency of the vibration applying unit can be changed, the direction of fluid flow in the fluid passage can be controlled.
When the fluid can circulate in the fluid passage, the device can be cooled or heated by providing a heat exchanger or a radiator in the fluid passage.
The heat generating device of the present invention is a heat generating device that uses the fluid actuator as a cooling device, and includes a substrate on which the heat generating device is mounted, and the fluid passage is provided on a substrate on which the heat generating device is mounted. Is. With this configuration, the fluid passage can be used as a heat dissipation path that passes in the vicinity of the heat generating device, and heat generated from the substrate on which the heat generating device is mounted is moved to the fluid to cool the heat generating device. High cooling efficiency can be expected.

  The analyzer of the present invention includes a sample supply unit that supplies a fluid sample, and an analysis unit that analyzes the sample, and the fluid passage passes from the sample supply unit to the analysis unit. It is provided so that it may transport. In the conventional analyzer, the sample is transported by using a principle such as electrophoresis, so that the sample that can be handled moves by electrophoresis and is not limited to one that is not destroyed even when a high electric field is applied. Has an advantage that the type of sample is not selected because the fluid is driven by the tilt of the vibrating body to move the sample.

Hereinafter, a fluid actuator of the present invention and a heat generating apparatus and an analysis apparatus using the fluid actuator will be described in detail with reference to the drawings.
FIG. 1 shows a perspective plan view (a) and an AA line sectional view (b) showing an example of an embodiment of a fluid actuator of the present invention.
In this fluid actuator, two upper and lower flat plates 4 and 3 are joined. A groove having a U-shape when viewed in plan is formed on the joint surface of the upper flat plate 4 (hereinafter referred to as “lid 4”). The U-shaped groove forms a cavity that becomes the fluid passage 2 when the two upper and lower flat plates 4 and 3 are bonded together.

The cross-sectional shape of the fluid passage 2 is a rectangular cross section as shown in FIG. 1A, but may be a semicircular cross section, a triangular cross section, or the like.
The lower flat plate 3 (hereinafter referred to as “base 3”) forms a part of the inner wall surface of the fluid passage 2.
One or a plurality of (three in this example) support portions 22 are attached to a part of the fluid passage 2 on the base 3, and a plate-like vibrating body (fin) 21 is attached to the support portion 22. It is attached. The portion where the vibrating body 21 is installed is referred to as “vibration generator 1”.

A piezoelectric vibration applying unit 33 is mounted on the lower surface of the base 3. The piezoelectric vibration applying unit 33 is formed of a piezoelectric material such as piezoelectric ceramics or a piezoelectric single crystal.
Reference numeral 16 denotes a flow rate sensor installed in the fluid passage 2. The flow velocity sensor 16 is connected to a measurement circuit (not shown) so that the flow velocity of the fluid in the fluid passage can be measured.
FIG. 2A is a diagram (an enlarged view of FIG. 1B) showing the vicinity of the vibration generating unit 1. FIG.2 (b) is the BB sectional drawing.

FIG. 3 is an enlarged view of the vibrating body 21 and the support portion 22. (A) is a plan view, (b) is a front view, and (c) is a cross-sectional view.
As shown in FIG. 2 (b), the support portion 22 is composed of two columns erected from the base 3. The supporting part 22 may be any material as long as it is hard enough not to be plastically deformed when vibration is applied. For example, aluminum can be suitably used.

  In the example shown in the figure, the vibrating body 21 has a rectangular plate shape. The vibrating body 21 is attached to the base 3 via the two support portions 22, but the mounting position of the support portion 22 with respect to the vibrating body 21 is shifted from the center C of the vibrating body 21 in the longitudinal direction. ing. Since the vibrating body 21 is disposed so that the fluid passage direction and the longitudinal direction of the fluid passage 2 coincide with each other, the mounting position of the support portion 22 with respect to the vibrating body 21 is shifted in the fluid passage direction. In the example shown in the figure, the distance and direction from the mounting position to the center C of the vibrating body 21 are the same distance and the same direction for all three vibrating bodies 21. In this way, if a plurality of vibrating bodies 21 and support portions 22 are configured in the same shape and arranged in a plurality, since all exhibit the same behavior when applying vibrations of the same frequency as will be described later, one piezoelectric vibration applying portion All the fins can be controlled uniformly by the vibrations from 33.

Specifically, as shown in FIG. 3A, when the length of the vibrating body 21 is represented by L + R, the attachment position of the support portion 22 is L from one side of the vibrating body 21 and R from the other side. It has become. There is a relationship of L ≠ R (L <R in the figure).
3B, the thickness of the vibrating body 21 is T2, the height of the support 22 is T1, and the width at the mounting position of the support 22 (the width along the longitudinal direction of the vibrating body 21). Is denoted by W.

  In the above configuration, when the fluid passage 2 is filled with fluid and an AC voltage having a predetermined frequency is applied to the piezoelectric vibration applying unit 33, the piezoelectric vibration applying unit 33 vibrates up and down as shown in FIG. When this vertical vibration propagates through the base body 3 and vibrates the support portion 22, the vibrating body 21 reciprocates as if it is a fan. As a result, a driving force is applied to the fluid in the fluid passage 2 by the vibrating body 21 in the direction of the arrow.

The vertical vibration waveform of the piezoelectric vibration applying unit 33 may be a sine wave, but it is not necessarily a sine wave having a single frequency component, and a constant frequency distribution such as a sawtooth wave or a triangular wave. It may be a vibration waveform having Any type can be used as long as it can reciprocate at least the vibrating body 21.
Due to the vibration of the vibrating body 21, the fluid in the fluid passage 2 is driven in a predetermined direction. The “predetermined direction” is a direction facing the center C of the vibrating body 21 when viewed from the attachment position of the support portion 22.

In FIG. 3, a simulation was performed by a finite element method (FEM) of vibration when the thickness of the vibrating body 21 was T2 = 1 μm, L = 15 μm, and R = 25 μm, and the material of the vibrating body 21 was a single metal of aluminum. The results are shown in FIGS. 4 (a) and 4 (b). The support portion 22 had a width W = 1 μm and a height T1 = 1 μm.
FIG. 4A is a side view showing the vibration displacement of the vibrating body 21 when the piezoelectric vibration applying unit 33 is vibrated at a frequency of 4.5 MHz.

The displacement of the vibrating body 21 is large on the right side of the vibrating body 21 (on the side opposite to the mounting position of the support portion 22 when viewed from the center of the vibrating body 21), and on the left side of the vibrating body 21 (the support portion viewed from the center of the vibrating body 21) It can be seen that the same side as the attachment position of 22) is small. As a result, the fluid in the fluid passage 2 flows to the right in the figure.
FIG. 4B is a side view showing the vibration displacement of the vibrating body 21 when the piezoelectric vibration applying unit 33 is vibrated at a frequency of 12.4 MHz.

In this case, the displacement of the vibrating body 21 is large on the left side of the vibrating body 21 and small on the right side of the vibrating body 21. Therefore, it can be seen that the fluid in the fluid passage 2 flows leftward.
From the above results, it can be seen that the flow direction of the fluid in the fluid passage 2 can be controlled to the left and right by the drive frequency of the piezoelectric vibration applying unit 33.
In addition, the ratio of the flow rate at this time is rightward flow rate (in the case of 4.5 MHz): leftward flow rate (in the case of 12.4 MHz) = 37: 26. The flow rate ratio is not significantly different from 1, and when driving at 12.4 MHz, the same flow velocity can be obtained on both the left and right sides by slightly increasing the driving force by increasing the amplitude of vibration. Recognize.

As described above, also from the result of the finite element method simulation, this actuator changes the direction of the fluid flow in the fluid passage 2 to any one of the left and right by changing only the drive frequency of the piezoelectric vibration applying unit 33. You can see that you can.
Next, the degree of imbalance from the support portion 22 of the vibrating body 21, that is, the ratio of L and R is changed, and the results of calculating the leftward and rightward flow rates are shown in the diagram showing the simulation results of FIG. . The length L from the attachment position of the support part 22 to the left side of the vibrating body 21 is taken on the horizontal axis of FIG. Note that the relationship of L + R = 40 (μm) is satisfied. The vertical axis represents the fluid flow ratio (rightward flow rate / leftward flow rate) on a logarithmic scale.

The length L is changed in the range of 3 μm to 19 μm. From the graph, when L is 11 μm or less, the rightward flow rate exceeds 10 times the leftward flow rate, it is easy to create a one-way flow. However, if it exceeds 10 times, the effect of creating a reverse flow when the frequency is changed is weakened.
Further, if L is too small and the position where the support portion 22 is provided is too close to the end of the vibrating body 21, the moment applied to the support portion 22 is increased, which may affect the life of the structure.

Therefore, it is preferable that L is 11 μm or more and 19 μm or less because the rightward flow rate and the leftward flow rate approach each other and the ratio becomes 10 or less.
In particular, L is more preferably 15 μm or more and 19 μm from the viewpoint that a balanced left and right flow can be created when the frequency is changed.
Here, a desirable range is defined by the length of L. However, since there is actually a constraint of L + R = 40 μm, it can also be defined by the ratio of L and R. The definition that “L is 11 μm or more and 19 μm or less” is equivalent to “L / R is 11/29 or more and 19/21 or less”.

In the case of L = R = 20 μm, the left and right sides of the vibrating body 21 vibrate by the same amount. Therefore, the fluid cannot be driven to the left and right, and only stirring is performed.
Next, a method for manufacturing the fluid actuator of the present invention using the sacrificial layer etching technique will be described with reference to FIG.
A silicon plate is used as the base 3, and aluminum is used as the material of the support portion 22 and the vibrating body 21.

First, an amorphous silicon film 29 is formed as a sacrificial layer on the substrate 3 to a thickness of 1 μm using a CVD apparatus. Next, a photoresist pattern having an opening in the shape of the support portion 22 is formed on the amorphous silicon film 29 by photolithography at a portion where the support portion 22 is to be formed (see FIG. 6A).
Next, the amorphous silicon film 29 is removed by an RIE apparatus so that a portion where the support portion 22 is formed is opened, and the photoresist is removed with acetone or the like. Next, aluminum is deposited to a thickness of 1 μm by sputtering. Then, by polishing the surface just by 1 μm, an aluminum support 22 is formed in the opening of the amorphous silicon film 29 (see FIG. 6B).

  Next, a photoresist pattern having an opening corresponding to the vibration application portion is formed by photolithography using a negative photoresist such as AZ. Then, 1 μm of aluminum is formed on the entire surface on which the photoresist pattern is formed by vacuum evaporation or the like. Thereafter, when the photoresist is removed by a lift-off method using a stripping solution, an unnecessary portion of aluminum is also removed at the same time, and the support 21 made of aluminum is formed on a part of the amorphous silicon film 29 and the vibrating body 21. Is formed (see FIG. 6C).

Finally, the amorphous silicon is subjected to sacrificial layer etching with xenon fluoride, thereby forming the vibrator 21 on the support portion 22 (see FIG. 6D).
Although the case where silicon is used as the material of the base 3 has been described, a glass substrate or other substrate may be used. Further, although aluminum is used for the support portion 22 and the vibrating body 21, other metals, inorganic materials, or organic materials may be used. Further, the process is not limited to the above method.

Next, as the fluid passage 2, a lid 4 having a groove is produced. PDMS (poly dimethylsiloxane), which is a kind of silicon rubber, is poured into a metal machined mold and polymerized at 80 ° C. for 30 minutes to produce a PDMS lid 4 having grooves.
The lid body 4 and the base body 3 are joined so that the vibration body 21 and the support portion 22 that have been prepared in the groove of the lid body 4 of the PDMS are inserted, so that the vibration body 21 and the support portion 22 are provided inside. The fluid passage 2 in which is installed is completed.

Finally, the piezoelectric vibration applying unit 33 is attached to the surface of the base 3 opposite to the fluid passage 2. By applying a predetermined alternating voltage to the piezoelectric vibration applying unit 33, the vibrating body 21 can be vibrated.
In the case of the actuator having the shape used in the above-described simulation, it is possible to flow a fluid in a predetermined direction by vibrating the piezoelectric vibrating body 21 at 4.5 MHz, and by driving the piezoelectric vibrating body 21 at 12.4 MHz. The fluid can be flowed in the opposite direction.

The fluid actuator of the present invention is not limited to the above structure. For example, the shape of the fluid passage 2 is arbitrary. It is not limited to the U-shape shown in FIG. 1, but may be linear or on an arc. It may be a "U" shape bent at a right angle.
In the above description, the example in which the piezoelectric vibration applying unit is mounted on the lower surface of the base has been described. However, the present invention is not limited to this, and the piezoelectric vibration applying unit may be embedded or fitted in the base. Furthermore, the base body itself may be formed of a piezoelectric body, and the base body and the piezoelectric vibration applying unit may be configured in common.

Furthermore, although the example using what has a rectangular shape as a vibrating body was demonstrated, it does not restrict to this. Furthermore, a fin may be provided at the tip of the vibrating body that vibrates most intensely in order to increase the tilting effect.
In the example shown in the figure, the number of fins is three. However, in reality, a large number of fins are arranged in a plurality of rows vertically and horizontally with respect to the fluid passage, and at the same time from the vibration applying unit. It is preferable to obtain a necessary flow rate by applying a predetermined vibration.

7A is a plan view showing an example in which the fluid actuator of the present invention is applied to a device that generates heat (referred to as a heat generating device) such as an integrated circuit, an external storage device, a light emitting element, and a cold cathode tube, and FIG. It is line sectional drawing (b).
In FIG. 7, a semiconductor substrate is used as the lid 4 of the fluid actuator. As the semiconductor substrate, for example, an SOI (Silicon on Insulator) substrate in which SiO ₂ is sandwiched between silicon as an insulating layer is used.

A semiconductor circuit 32 is formed in the lower silicon layer 23, and an upper silicon layer 25 sandwiching the insulating layer 24 is etched by ICP-RIE using an aluminum film as a mask to form a meander-like fluid passage 2 is doing.
Vibration generating portions 1a and 1b are arranged at two positions corresponding to the fluid passage 2 of the base 3, respectively. And the side which formed the fluid channel | path 2 of the semiconductor substrate is joined to the base | substrate 3 with which the vibration generation parts 1a and 1b were mounted. A piezoelectric vibration applying unit 33 is attached to the base 3 on the back side of the vibration generating units 1a and 1b, thereby completing the heat generating device.

As a fluid, a mixture of 72% pure water, 24% propylene glycol, 4% such as a metal preservative, a mixture of 75% pure water and 25% ethylene glycol, a light reforming oil, or the like is used.
Note that the number of vibration generating units is not limited to two, and may be one or three or more.

In the structure of FIG. 7, in the vibration generators 1a and 1b, the directions in which the fluid is driven are set in the −x direction. Therefore, if the fluid is driven by the vibration generators 1a and 1b, respectively, the fluid in the fluid passage 2 can flow in one direction as a whole.
A container 6 for storing fluid is connected to both ends 26 and 27 of the fluid passage 2 through piping. The fluid in the container 6 circulates through the piping and the fluid passage 2 and returns to the container 6. In the middle of this circulation, a heat exchanger 28 such as a radiation fin is provided, and heat generated in the semiconductor circuit can be released to the outside by this heat exchanger.

FIG. 8 is a plan view (a) and a cross-sectional view (b) showing an embodiment of an analyzer using the fluid actuator of the present invention.
FIG. 8A is a plan view showing the lid 40 of the analyzer of the present invention, and the lid 40 has a substantially cross-shaped groove. By joining the lid body 40 to the base 3, a lateral fluid passage 2a and a longitudinal fluid passage 2b are formed.

In a state where the lid 40 is joined to the base 3, both ends of the lateral fluid passage 2 a communicate with fluid passages 2 c and 2 d provided in the base 3, and both ends of the vertical fluid passage 2 b are connected to the base 3. The fluid passages 2e and 2f provided are in communication.
Vibration generating portions 1c and 1d are disposed at positions corresponding to the fluid passages 2a and 2b on the base 3, respectively. One of the vibration generators 1c and 1d is driven by a switch (not shown). Reference numeral 43 denotes a measurement unit that measures the sample fluid. The measurement principle of the measurement unit is not limited. For example, the sample fluid is analyzed by measuring an absorbance spectrum.

The sample fluid S is caused to flow through the fluid passages 2c, 2a, and 2d, and the carrier fluid for transporting the sample fluid to the measurement point of the measurement unit 43 is caused to flow through the fluid passages 2e, 2b, and 2f.
As the sample fluid, blood, a sample solution containing cells or DNA, a buffer solution, or the like can be used.

When the vibration generator 1c is driven, the sample fluid S is flowed through the fluid passages 2c, 2a, and 2d as shown in FIG. 9A.
When the switch is switched in this state to drive the vibration generating unit 1d, the carrier fluid flows through the fluid passages 2e, 2b, and 2f as shown in FIG. 9B. At this time, the carrier fluid can transport the sample fluid S present in the cross connection portion through the fluid passage 2 b to the measurement point of the measurement unit 43. Therefore, the sample fluid can be measured by the measurement unit 43.

It is a figure which shows typically an example of embodiment of the fluid actuator of this invention, (a) is a perspective top view of a fluid actuator, (b) shows the AA sectional view. It is an enlarged view which shows the structure of the fluid actuator near a vibration generation part, (a) is an AA sectional view, (b) is a BB sectional drawing. It is the top view (a) which shows the structure of the vibrating body attached to the support part, front view (b), and sectional drawing (c). (A) is a side view which shows the vibration displacement of a vibrating body when it vibrates with a frequency of 4.5 MHz. (B) is a side view showing the vibration displacement of the vibrating body when vibrating at a frequency of 12.4 MHz. It is a diagram which shows the result of having changed the unbalance degree from the support part of a vibrating body, and having calculated the flow ratio of left direction and right direction. It is process drawing which shows the manufacturing method of the fluid actuator of this invention using a sacrificial layer etching technique. It is the top view (a) which shows typically the structural example of the heat generating apparatus provided with the fluid actuator of this invention, and the FF sectional view (b). It is the top view (a) and HH sectional view (b) which show typically the structural example of the analyzer provided with the fluid actuator of this invention. FIG. 9 is an enlarged view of the plan view (FIG. 8A), in which FIG. 8A is a view showing a state in which a sample fluid S is caused to flow through a lateral fluid passage in the analyzer, and FIG. It is a figure which shows the state by which the sample fluid S is poured through the fluid passage 2a.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Vibration generating part 2 Fluid passage 3 Base | substrate 4 Lid body 5 Power supply 6 Container 21 Vibrating body 22 Support part 32 Heat generating part 33 Piezoelectric vibration application part 40 Analyzer 43 Analyzing part

Claims (6)

A substrate;
A fluid passage having the base body in a part of an inner wall and allowing fluid to move inside;
A support portion erected on the inner wall of the fluid passage of the substrate;
A flat plate-like vibrator attached to the support portion in a direction parallel to the inner wall;
A fluid actuator, comprising: a vibration applying unit that drives the fluid in the fluid passage by bending and vibrating the vibrating body via the support unit.   The fluid actuator according to claim 1, wherein a mounting position of the vibrating body on the support portion is arranged at a position shifted from the center of the vibrating body in the fluid passage direction.   The fluid actuator according to claim 1, wherein a vibration frequency of the vibration applying unit is changeable.   The fluid actuator according to claim 1, wherein fluid can circulate in the fluid passage. A heat generating device using the fluid actuator according to claim 4 as a cooling device,
Having a substrate on which the heat generating device is mounted;
The fluid passage is a heat generating device provided in the substrate. An analyzer comprising the fluid actuator according to any one of claims 1 to 4,
A sample supply unit for supplying a fluid sample and an analysis unit for analyzing the sample are provided;
The fluid passage is an analyzer provided to transport the fluid sample from the sample supply unit to the analysis unit.

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