JP2007155466A5 - - Google Patents

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Publication number
JP2007155466A5
JP2007155466A5 JP2005350193A JP2005350193A JP2007155466A5 JP 2007155466 A5 JP2007155466 A5 JP 2007155466A5 JP 2005350193 A JP2005350193 A JP 2005350193A JP 2005350193 A JP2005350193 A JP 2005350193A JP 2007155466 A5 JP2007155466 A5 JP 2007155466A5
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JP
Japan
Prior art keywords
pattern
plate
manufacturing
alignment
scale
Prior art date
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Application number
JP2005350193A
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English (en)
Japanese (ja)
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JP4858753B2 (ja
JP2007155466A (ja
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Priority to JP2005350193A priority Critical patent/JP4858753B2/ja
Priority claimed from JP2005350193A external-priority patent/JP4858753B2/ja
Publication of JP2007155466A publication Critical patent/JP2007155466A/ja
Publication of JP2007155466A5 publication Critical patent/JP2007155466A5/ja
Application granted granted Critical
Publication of JP4858753B2 publication Critical patent/JP4858753B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2005350193A 2005-12-05 2005-12-05 ２次元スケールの製造方法及びエンコーダ Expired - Lifetime JP4858753B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005350193A JP4858753B2 (ja) 2005-12-05 2005-12-05 ２次元スケールの製造方法及びエンコーダ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005350193A JP4858753B2 (ja) 2005-12-05 2005-12-05 ２次元スケールの製造方法及びエンコーダ

Publications (3)

Publication Number Publication Date
JP2007155466A JP2007155466A (ja) 2007-06-21
JP2007155466A5 true JP2007155466A5 (https=) 2009-01-08
JP4858753B2 JP4858753B2 (ja) 2012-01-18

Family

ID=38240042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005350193A Expired - Lifetime JP4858753B2 (ja) 2005-12-05 2005-12-05 ２次元スケールの製造方法及びエンコーダ

Country Status (1)

Country Link
JP (1) JP4858753B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005259A (en) 2009-09-29 2011-03-30 Asml Netherlands Bv Imprint lithography.
JP2013011800A (ja) * 2011-06-30 2013-01-17 Fujifilm Corp パターン位相差フィルム、その製造方法、光学積層体の製造方法、及び３ｄ画像表示装置
DE102013220190B4 (de) * 2013-10-07 2021-08-12 Dr. Johannes Heidenhain Gmbh Messteilung und lichtelektrische Positionsmesseinrichtung mit dieser Messteilung
KR101835965B1 (ko) * 2016-04-27 2018-03-07 주식회사 유알테크놀로지 2d 패턴 레이저 모듈
JP7062488B2 (ja) * 2018-03-28 2022-05-06 株式会社東京精密 エンコーダ
KR102478482B1 (ko) * 2020-01-20 2022-12-15 김은규 멀티라인 생성 레이저 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6639686B1 (en) * 2000-04-13 2003-10-28 Nanowave, Inc. Method of and apparatus for real-time continual nanometer scale position measurement by beam probing as by laser beams and the like of atomic and other undulating surfaces such as gratings or the like relatively moving with respect to the probing beams
JP4074867B2 (ja) * 2003-11-04 2008-04-16 エーエスエムエル ネザーランズ ビー．ブイ． 第１及び第２位置合せマークの相対位置を計測する方法及び装置
JP2007096069A (ja) * 2005-09-29 2007-04-12 Nikon Corp 位置合わせ方法、重ね合わせ精度計測方法、露光方法、位置合わせ装置、露光装置、及び重ね合わせ精度計測装置

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