JP2007155466A5 - - Google Patents
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- JP2007155466A5 JP2007155466A5 JP2005350193A JP2005350193A JP2007155466A5 JP 2007155466 A5 JP2007155466 A5 JP 2007155466A5 JP 2005350193 A JP2005350193 A JP 2005350193A JP 2005350193 A JP2005350193 A JP 2005350193A JP 2007155466 A5 JP2007155466 A5 JP 2007155466A5
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- JP
- Japan
- Prior art keywords
- pattern
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- manufacturing
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- Prior art date
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- 238000004519 manufacturing process Methods 0.000 claims 10
- 239000011295 pitch Substances 0.000 claims 2
- 125000006850 spacer group Chemical group 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005350193A JP4858753B2 (ja) | 2005-12-05 | 2005-12-05 | ２次元スケールの製造方法及びエンコーダ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005350193A JP4858753B2 (ja) | 2005-12-05 | 2005-12-05 | ２次元スケールの製造方法及びエンコーダ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007155466A JP2007155466A (ja) | 2007-06-21 |
| JP2007155466A5 true JP2007155466A5 (enrdf_load_stackoverflow) | 2009-01-08 |
| JP4858753B2 JP4858753B2 (ja) | 2012-01-18 |
Family
ID=38240042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005350193A Active JP4858753B2 (ja) | 2005-12-05 | 2005-12-05 | ２次元スケールの製造方法及びエンコーダ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4858753B2 (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2005259A (en) | 2009-09-29 | 2011-03-30 | Asml Netherlands Bv | Imprint lithography. |
| JP2013011800A (ja) * | 2011-06-30 | 2013-01-17 | Fujifilm Corp | パターン位相差フィルム、その製造方法、光学積層体の製造方法、及び３ｄ画像表示装置 |
| DE102013220190B4 (de) * | 2013-10-07 | 2021-08-12 | Dr. Johannes Heidenhain Gmbh | Messteilung und lichtelektrische Positionsmesseinrichtung mit dieser Messteilung |
| KR101835965B1 (ko) * | 2016-04-27 | 2018-03-07 | 주식회사 유알테크놀로지 | 2d 패턴 레이저 모듈 |
| JP7062488B2 (ja) * | 2018-03-28 | 2022-05-06 | 株式会社東京精密 | エンコーダ |
| KR102478482B1 (ko) * | 2020-01-20 | 2022-12-15 | 김은규 | 멀티라인 생성 레이저 장치 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6639686B1 (en) * | 2000-04-13 | 2003-10-28 | Nanowave, Inc. | Method of and apparatus for real-time continual nanometer scale position measurement by beam probing as by laser beams and the like of atomic and other undulating surfaces such as gratings or the like relatively moving with respect to the probing beams |
| JP4074867B2 (ja) * | 2003-11-04 | 2008-04-16 | エーエスエムエル ネザーランズ ビー．ブイ． | 第１及び第２位置合せマークの相対位置を計測する方法及び装置 |
| JP2007096069A (ja) * | 2005-09-29 | 2007-04-12 | Nikon Corp | 位置合わせ方法、重ね合わせ精度計測方法、露光方法、位置合わせ装置、露光装置、及び重ね合わせ精度計測装置 |
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2005
- 2005-12-05 JP JP2005350193A patent/JP4858753B2/ja active Active