JP2007152486A - Manufacturing method of saw wire - Google Patents

Manufacturing method of saw wire Download PDF

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JP2007152486A
JP2007152486A JP2005350200A JP2005350200A JP2007152486A JP 2007152486 A JP2007152486 A JP 2007152486A JP 2005350200 A JP2005350200 A JP 2005350200A JP 2005350200 A JP2005350200 A JP 2005350200A JP 2007152486 A JP2007152486 A JP 2007152486A
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plating layer
abrasive grains
metal
metal wire
fixed
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Hiroyuki Ogami
寛之 大上
Koji Uno
孝二 宇野
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an electrodeposition fixed type saw wire, having high productivity without reducing the surface accuracy of a cut surface of a material to be cut of an electric part material such as semiconductor and a silicon wafer. <P>SOLUTION: In this manufacturing method of a saw wire, abrasive 2 is stuck to a metal wire 1 and the abrasive is fixed to the metal wire by a metal plated layer formed by electroplating. In order to stick the abrasive 2 to the metal wire 1, as the surface preparation, the metal wire is metal-plated (ground plated) by electroplating, the abrasive is stuck to the metal-plated layer 3 (the ground plated layer) of the metal wire formed by the surface preparation to be temporarily stopped, and press-bonded so that some of the abrasive 2 is caused to bite into the ground plated layer 3 and fixed, and after that, a metal plated layer 4 (a fixed plated layer) formed by electroplating is stacked on the ground plated layer 3 where the abrasive is caused to bite, thereby strengthening fixation of the abrasive 2 to the metal wire 1. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

この発明は、半導体、シリコンウエハ、水晶、磁性材料などで代表される電気部品材料などの高価な素材を切断するのに用いられるソーワイヤの製造方法に関するものであり、電着層によって砥粒を固定した固定砥粒式ソーワイヤについて、その砥粒分布を均一にしたものの生産性を改良して、生産コストを低減することができるものである。   The present invention relates to a method of manufacturing a saw wire used for cutting an expensive material such as a semiconductor, a silicon wafer, a crystal, a magnetic material and the like, and the abrasive grains are fixed by an electrodeposition layer. With respect to the fixed abrasive type saw wire, the productivity of the uniform abrasive grain distribution can be improved and the production cost can be reduced.

近年、細い金属線の表面に微細な砥粒を固定した固定砥粒式ソーワイヤが用いられている。この従来の固定砥粒式ソ−ワイヤは、例えば、線径0.2ないし1.0mmに伸線加工した金属細線に電着層(メッキ層)を形成し、当該電着層に砥粒を埋設して固定したものがある。このものの製造方法は、上記金属線を砥粒を分散・沈殿させたメッキ液(Niメッキ液等)中を通し、メッキ処理時に金属線表面にメッキ層の成長と共に砥粒が付着するようにしたものである(特開昭63−22275号公報)。このような電着メッキによるソーワイヤは、基本的には図4に示すようなものであり、金属線材27にメッキ層26を形成し、このメッキ層26によって微小な砥粒25を固定するものである。   In recent years, fixed abrasive saw wires in which fine abrasive grains are fixed on the surface of a thin metal wire have been used. In this conventional fixed abrasive saw wire, for example, an electrodeposition layer (plating layer) is formed on a fine metal wire drawn to a wire diameter of 0.2 to 1.0 mm, and the abrasive is applied to the electrodeposition layer. Some are buried and fixed. In this manufacturing method, the metal wire is passed through a plating solution (Ni plating solution or the like) in which abrasive grains are dispersed and precipitated, so that the abrasive grains adhere to the surface of the metal wire as the plating layer grows during the plating process. (Japanese Patent Laid-Open No. 63-22275). Such a saw wire by electrodeposition plating is basically as shown in FIG. 4, in which a plating layer 26 is formed on a metal wire 27, and minute abrasive grains 25 are fixed by the plating layer 26. is there.

この場合、金属線表面に十分な厚さのメッキ層26で砥粒25を固定したソーワイヤは、砥粒25の金属線27への固着は十分で、したがって、長時間に亘って切削性能が維持される。しかし、そのためには十分な厚さのメッキ層を形成する必要があり、砥粒25が大径であるほどこの傾向が顕著である。そして、十分な厚さのメッキ層26を形成するには、金属線27をメッキ液中を低速で通過させて、その間に金属線の表面に所要厚さのメッキ層26を形成させる必要がある。したがってこのような製造方法はソーワイヤの生産性が悪く、生産コストが高い。   In this case, the saw wire in which the abrasive grains 25 are fixed to the surface of the metal wire with the plating layer 26 having a sufficient thickness is sufficient to fix the abrasive grains 25 to the metal wire 27, and therefore the cutting performance is maintained for a long time. Is done. However, for that purpose, it is necessary to form a plating layer having a sufficient thickness, and this tendency becomes more remarkable as the abrasive grains 25 have a larger diameter. In order to form the plating layer 26 having a sufficient thickness, it is necessary to pass the metal wire 27 through the plating solution at a low speed and to form the plating layer 26 having a required thickness on the surface of the metal wire during that time. . Therefore, such a manufacturing method has low productivity of saw wire and high production cost.

さらに、この電気メッキによる製造方法は、金属線27を連続的に移動させながら砥粒25を同金属線の表面に着床させていく方式であるため、砥粒25と金属線27との相互間にはその着床過程においても常に相対的な動きがある。この相対的な動きのため、砥粒径が大きい場合には、メッキ層26が成長して砥粒が金属線27に確実に着床される前に、金属線から落下してしまうので、金属線27に固定できる砥粒径の大きさに限界があり、したがって、使用可能な砥粒径の範囲が余り広くない。この問題を解決するために、線材の送りを間欠的にするものが特開平7−227767号公報に記載されている。このものは、金属線を間欠的に送るものであるから、メッキ層の厚さ、砥粒の付着密度が安定しない可能性がある。   Furthermore, since this electroplating manufacturing method is a method in which the abrasive grains 25 are deposited on the surface of the metal wire 27 while continuously moving the metal wire 27, the abrasive grains 25 and the metal wire 27 are mutually connected. There is always relative movement in the process of landing. Because of this relative movement, when the abrasive grain size is large, the plating layer 26 grows and the abrasive grains fall from the metal wire before being reliably deposited on the metal wire 27. There is a limit to the size of the abrasive particle size that can be fixed to the wire 27, and therefore the range of usable abrasive particle size is not so wide. In order to solve this problem, Japanese Patent Application Laid-Open No. 7-227767 discloses that a wire is intermittently fed. In this case, since the metal wire is sent intermittently, the thickness of the plating layer and the adhesion density of the abrasive grains may not be stable.

また、上記製造方法において、金属コ−ティング(例えばNiコーティング)した砥粒を使うと固着速度が速くなり、ソーワイヤの生産性が上がることが知られている。ところが、上記電気メッキでNiコーティングされた砥粒を使用すると、砥粒が凝集した状態で金属線表面に固着することが発生する。これは、金属線上に接触あるいは固着した砥粒の表面にも陰極の電流が流れて、そこに別の砥粒が固着されてしまうからである。このように砥粒が凝集して付着するとその部分の径が大きくなり、また、砥粒の付着も不均一になり、被切断物の表面精度が大きく低下(悪化)してしまう。
特開昭63−22275号公報 特開平7−227767号公報
Further, in the above manufacturing method, it is known that the use of metal coated abrasive grains (for example, Ni coating) increases the fixing speed and increases the productivity of the saw wire. However, when abrasive grains coated with Ni by electroplating are used, the abrasive grains are agglomerated and adhere to the surface of the metal wire. This is because the current of the cathode flows also on the surface of the abrasive grains that are in contact with or fixed on the metal wire, and other abrasive grains are fixed thereto. When the abrasive grains aggregate and adhere as described above, the diameter of the portion becomes large, and the adhesion of the abrasive grains becomes non-uniform, and the surface accuracy of the workpiece is greatly reduced (deteriorated).
Japanese Unexamined Patent Publication No. 63-22275 JP-A-7-227767

この発明は、砥粒の凝集を防止し、砥粒径がほぼ均一であって、被切断物の切断面の表面精度を低下させることがなく生産性が高い電着固定式ソーワイヤの製造方法を提供するものである。   The present invention provides a method for manufacturing an electrodeposition-fixed saw wire that prevents agglomeration of abrasive grains, has a substantially uniform abrasive grain size, and has high productivity without reducing the surface accuracy of the cut surface of the workpiece. It is to provide.

この発明の解決手段は、金属線に砥粒を圧着させ、同金属線に電気メッキにて金属メッキしてそのメッキ層で砥粒を固定するソーワイヤの製造方法について、
上記金属線に上記砥粒を付着させるため、下地処理として金属線に電気メッキにより金属メッキ(下地メッキ)し、
上記下地処理による金属線の金属メッキ層(下地メッキ層)に砥粒を均等に付着して仮止し、
これを圧着して上記砥粒の一部を上記下地メッキ層に食い込ませて固定し、
その後、電気メッキによる金属メッキ層(固定メッキ層)を、上記砥粒が食い込んだ下地メッキ層に積層し、これにより金属線に対する上記砥粒の固定を強化したことである。
具体的には次の構成によるものである。
The solution of the present invention is a method of manufacturing a saw wire in which abrasive grains are pressure-bonded to a metal wire, and the metal wire is metal-plated by electroplating and the abrasive grains are fixed by the plating layer.
In order to adhere the abrasive grains to the metal wire, the metal wire is subjected to metal plating (base plating) by electroplating as a base treatment,
Abrasive grains are uniformly attached and temporarily fixed to the metal plating layer (base plating layer) of the metal wire by the above base treatment,
This is pressure-bonded to fix a part of the abrasive grains by biting into the base plating layer,
After that, a metal plating layer (fixed plating layer) by electroplating is laminated on the base plating layer into which the abrasive grains have penetrated, thereby strengthening the fixation of the abrasive grains to the metal wire.
Specifically, this is due to the following configuration.

上記金属線に電気メッキして下地メッキ層を形成し、
上記砥粒を水と混ぜた状態で上記下地メッキ層に均等に塗布し、
上記砥粒が塗布された金属線を加圧ダイス又は加圧ローラを通してその砥粒を下地メッキ層に食い込ませ、
その後、さらに電気メッキによる金属メッキ層(固定メッキ層)を、上記砥粒が食い込んだ下地メッキ層に積層したものであり、
かつ、上記下地メッキがニッケル、銅、亜鉛又はスズのメッキであり、
上記固定メッキは適宜の金属メッキであること。
なお、下地メッキ層の厚さは、砥粒粒径の5乃至80%の厚さが適当であり、また、固定メッキ層の厚さについては砥粒が所要の固定力が固定される程度の厚さが適当である。
Electroplating the metal wire to form a base plating layer,
Apply the abrasive grains evenly to the base plating layer in a mixed state with water,
The metal wire coated with the abrasive grains is made to bite into the ground plating layer through a pressure die or a pressure roller,
Thereafter, a metal plating layer (fixed plating layer) by electroplating is further laminated on the base plating layer into which the abrasive grains have been entrapped,
And the said base plating is plating of nickel, copper, zinc, or tin,
The fixed plating is an appropriate metal plating.
The thickness of the base plating layer is suitably 5 to 80% of the grain size of the abrasive grains, and the thickness of the fixed plating layer is such that the required fixing force of the abrasive grains is fixed. The thickness is appropriate.

ニッケル、銅、亜鉛又はスズによる下地メッキ層を施した金属線に、水と砥粒との混合物を均等に塗布すると、水の凝着力によって砥粒が上記下地メッキ層に付着して仮止めされる。このようにして砥粒が均等に付着している金属線を、例えば、加圧ダイス又は加圧ローラを通してその全周を押さえて、砥粒を下地メッキ層に押し込む(金属線に食い込むまで押し込まれてもよい)。下地メッキ層はニッケル、銅又は鉛のメッキ層であるから、砥粒が容易に食い込んで、比較的しっかりと固定される。
次いで、砥粒が固定された金属線にさらに電気メッキしてその金属メッキ層(固定メッキ層)を下地メッキ層に積層する。
砥粒が金属線に食い込むまで圧着すると、金属線材の圧着部が塑性変形による加工硬化を生じて硬くなるので、砥粒の保持力が一層高まる。さらに、固定メッキ層によって保持されるので、砥粒は下地メッキ層と固定メッキ層とに一部を埋め込まれた状態でしっかりと保持されて、強力に固定される。
When a mixture of water and abrasive grains is evenly applied to a metal wire with a base plating layer made of nickel, copper, zinc or tin, the abrasive grains adhere to the base plating layer and are temporarily fixed by the adhesive force of water. The In this way, the metal wire on which the abrasive grains are evenly adhered is pressed, for example, through a pressure die or a pressure roller, and the entire circumference of the metal wire is pushed into the base plating layer (they are pushed in until the metal wire is bitten). May be) Since the base plating layer is a nickel, copper or lead plating layer, the abrasive grains easily bite in and are fixed relatively firmly.
Next, the metal wire on which the abrasive grains are fixed is further electroplated, and the metal plating layer (fixed plating layer) is laminated on the base plating layer.
When pressure is applied until the abrasive grains bite into the metal wire, the pressure-bonding portion of the metal wire material is hardened due to work hardening caused by plastic deformation, so that the holding power of the abrasive grains is further increased. Further, since the abrasive grains are held by the fixed plating layer, the abrasive grains are firmly held in a state where the abrasive grains are partially embedded in the base plating layer and the fixed plating layer, and are firmly fixed.

本発明の実施例を以下に説明する。   Examples of the present invention will be described below.

本発明の実施例を図面に基づいて説明する。
この実施例は、線径0.2mmのピアオ線に電気メッキによりNiメッキを施し、次に、粒径30乃至40μmの砥粒を等分布し、これを固定してソーワイヤを製造するものである。
まず、表面に真鍮メッキされ、線径0.2mmに伸線されたピアノ線に、電気メッキにて厚さ20μmのNiメッキ層(下地メッキ層)を形成する。
次いで、粒径が30乃至40μmのダイヤモンド砥粒を水に混合した混合液(混合割合は、重量比で概略1:1)を金属線の下地メッキ層に均等に塗布する。このとき、砥粒は水の凝着力で下地メッキ層に付着されて仮止めされる。
これを加圧手段に通して、連続して加圧し、上記砥粒を下地メッキ層に押し込んで食い込ませる。この実施例は加圧手段として、図2に示すように加圧ダイス20である。この加圧ダイス20のテーパー面で砥粒2が押さえられ、下地メッキ層3に押し込まれ、その一部が下地メッキ層3に食い込んだ状態で固定される。また、加圧手段は、図3に示すように一対の溝付き加圧ローラ30a,30bによる加圧ローラ30でもよい。
次いで、さらに、電気メッキにて厚さ20μmのNiメッキ層を下地メッキ層に積層する。このNiメッキ層が固定メッキ層になり、砥粒がしっかりと固定される。
Embodiments of the present invention will be described with reference to the drawings.
In this embodiment, Ni plating is performed by electroplating on a piao wire having a wire diameter of 0.2 mm, then abrasive grains having a particle size of 30 to 40 μm are equally distributed, and this is fixed to produce a saw wire. .
First, a 20 μm thick Ni plating layer (base plating layer) is formed by electroplating on a piano wire whose surface is brass-plated and drawn to a wire diameter of 0.2 mm.
Next, a mixed solution (mixing ratio is approximately 1: 1 by weight) in which diamond abrasive grains having a particle size of 30 to 40 μm are mixed with water is uniformly applied to the underlying plating layer of the metal wire. At this time, the abrasive grains are attached to the base plating layer by the adhesive force of water and temporarily fixed.
This is passed through a pressurizing means and continuously pressed, and the abrasive grains are pushed into the underlying plating layer and bite. In this embodiment, as a pressurizing means, a pressurizing die 20 is used as shown in FIG. The abrasive grains 2 are pressed by the taper surface of the pressure die 20 and pressed into the base plating layer 3, and a part of the abrasive grains 2 is fixed in a state of being bitten into the base plating layer 3. Further, the pressure means may be a pressure roller 30 by a pair of grooved pressure rollers 30a and 30b as shown in FIG.
Next, an Ni plating layer having a thickness of 20 μm is further laminated on the base plating layer by electroplating. This Ni plating layer becomes a fixed plating layer, and the abrasive grains are firmly fixed.

は、実施例の断面を模式的に示す断面図である。These are sectional drawings which show the section of an example typically. (a)は、加圧手段の一例を示す断面図、(b)は図(a)のAーA矢視図、(c)は図(a)のBーB矢視図である。(A) is sectional drawing which shows an example of a pressurizing means, (b) is an AA arrow directional view of figure (a), (c) is a BB arrow directional view of figure (a). (a)は加圧手段の他の一例を示す概略側面図、(b)は図(a)のXーX矢視図である。(A) is a schematic side view which shows another example of a pressurization means, (b) is a XX arrow directional view of Fig. (A). は、従来技術例の長手方向断面を模式的に示す断面図である。These are sectional drawings showing typically a longitudinal section of a prior art example.

符号の説明Explanation of symbols

1 金属線(金属線材)
2 砥粒
3 下地メッキ層
4 固定メッキ層
20 加圧ダイス
30 加圧ローラ
1 Metal wire (metal wire)
2 Abrasive grains 3 Base plating layer 4 Fixed plating layer 20 Pressure die 30 Pressure roller

Claims (3)

金属線に砥粒を付着させ、同金属線に電気メッキによる金属メッキ層で上記砥粒を固定するソーワイヤの製造方法について、
上記金属線に砥粒を付着させるため、その下地処理として金属線に電気メッキにより金属メッキ(下地メッキ)し、
上記下地処理による金属線の金属メッキ層(下地メッキ層)に砥粒を付着して仮止し、
これを圧着して上記砥粒の一部を上記下地メッキ層に食い込ませて固定し、
その後、電気メッキによる金属メッキ層(固定メッキ層)を、上記砥粒が食い込んだ下地メッキ層に積層し、これにより金属線に対する上記砥粒の固定を強化するソーワイヤの製造方法。
About a method of manufacturing a saw wire in which abrasive grains are attached to a metal wire, and the abrasive grains are fixed to the metal wire with a metal plating layer by electroplating.
In order to attach abrasive grains to the metal wire, metal plating (base plating) is performed on the metal wire by electroplating as a base treatment.
Attaching the abrasive grains to the metal plating layer (base plating layer) of the metal wire by the above base treatment, temporarily fixing it,
This is pressure-bonded to fix a part of the abrasive grains by biting into the base plating layer,
Thereafter, a metal plating layer (fixed plating layer) by electroplating is laminated on the base plating layer into which the abrasive grains have sunk, thereby strengthening the fixing of the abrasive grains to the metal wire.
金属線に砥粒を付着させ、同金属線に電気メッキよる金属メッキ層で砥粒を固定するソーワイヤの製造方法について、
上記金属線に電気メッキして下地メッキ層を形成し、
上記砥粒を水と混ぜた状態で上記下地メッキ層に均等に塗布し、
上記砥粒が塗布された金属線を加圧ダイス又は加圧ローラを通してその砥粒を下地メッキ層に食い込ませ、
その後、さらに電気メッキによる金属メッキ層(固定メッキ層)を、上記砥粒が食い込んだ下地メッキ層に積層したものであり、
かつ、上記下地メッキがニッケル、銅又は鉛のメッキであり、
上記固定メッキが適宜の金属メッキであるソーワイヤの製造方法。
About a method of manufacturing a saw wire in which abrasive particles are attached to a metal wire and the abrasive particles are fixed to the metal wire by a metal plating layer by electroplating.
Electroplating the metal wire to form a base plating layer,
Apply the abrasive grains evenly to the base plating layer in a mixed state with water,
The metal wire coated with the abrasive grains is made to bite into the ground plating layer through a pressure die or a pressure roller,
Thereafter, a metal plating layer (fixed plating layer) by electroplating is further laminated on the base plating layer into which the abrasive grains have been entrapped,
And the said base plating is plating of nickel, copper, or lead,
A saw wire manufacturing method wherein the fixed plating is an appropriate metal plating.
下地メッキの厚さが砥粒粒径の5乃至80%の厚さであり、固定メッキにより砥粒が固定される請求項2のソーワイヤの製造方法。   The method of manufacturing a saw wire according to claim 2, wherein the thickness of the base plating is 5 to 80% of the grain size of the abrasive grains, and the abrasive grains are fixed by fixed plating.
JP2005350200A 2005-12-05 2005-12-05 Manufacturing method of saw wire Pending JP2007152486A (en)

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Cited By (11)

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JP2011098407A (en) * 2009-11-05 2011-05-19 Nakamura Choko:Kk Wire saw and manufacturing method of wire saw
US8425640B2 (en) 2009-08-14 2013-04-23 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated body
US9028948B2 (en) 2009-08-14 2015-05-12 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated body, and methods of forming thereof
US9186816B2 (en) 2010-12-30 2015-11-17 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9211634B2 (en) 2011-09-29 2015-12-15 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated substrate body having a barrier layer, and methods of forming thereof
US9254552B2 (en) 2012-06-29 2016-02-09 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9278429B2 (en) 2012-06-29 2016-03-08 Saint-Gobain Abrasives, Inc. Abrasive article for abrading and sawing through workpieces and method of forming
US9375826B2 (en) 2011-09-16 2016-06-28 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9409243B2 (en) 2013-04-19 2016-08-09 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9878382B2 (en) 2015-06-29 2018-01-30 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
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US9862041B2 (en) 2009-08-14 2018-01-09 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated body
US8425640B2 (en) 2009-08-14 2013-04-23 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated body
US9028948B2 (en) 2009-08-14 2015-05-12 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated body, and methods of forming thereof
US9067268B2 (en) 2009-08-14 2015-06-30 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated body
JP2011098407A (en) * 2009-11-05 2011-05-19 Nakamura Choko:Kk Wire saw and manufacturing method of wire saw
US9186816B2 (en) 2010-12-30 2015-11-17 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9248583B2 (en) 2010-12-30 2016-02-02 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9375826B2 (en) 2011-09-16 2016-06-28 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9211634B2 (en) 2011-09-29 2015-12-15 Saint-Gobain Abrasives, Inc. Abrasive articles including abrasive particles bonded to an elongated substrate body having a barrier layer, and methods of forming thereof
US9254552B2 (en) 2012-06-29 2016-02-09 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9278429B2 (en) 2012-06-29 2016-03-08 Saint-Gobain Abrasives, Inc. Abrasive article for abrading and sawing through workpieces and method of forming
US9687962B2 (en) 2012-06-29 2017-06-27 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9902044B2 (en) 2012-06-29 2018-02-27 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US10596681B2 (en) 2012-06-29 2020-03-24 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9409243B2 (en) 2013-04-19 2016-08-09 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US9878382B2 (en) 2015-06-29 2018-01-30 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
US10137514B2 (en) 2015-06-29 2018-11-27 Saint-Gobain Abrasives, Inc. Abrasive article and method of forming
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