JP2007140075A5 - - Google Patents

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Publication number
JP2007140075A5
JP2007140075A5 JP2005333305A JP2005333305A JP2007140075A5 JP 2007140075 A5 JP2007140075 A5 JP 2007140075A5 JP 2005333305 A JP2005333305 A JP 2005333305A JP 2005333305 A JP2005333305 A JP 2005333305A JP 2007140075 A5 JP2007140075 A5 JP 2007140075A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005333305A
Other versions
JP2007140075A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005333305A priority Critical patent/JP2007140075A/ja
Priority claimed from JP2005333305A external-priority patent/JP2007140075A/ja
Priority to EP06121183A priority patent/EP1788440A2/en
Priority to US11/545,425 priority patent/US20070111541A1/en
Priority to CNA2006101485823A priority patent/CN1967387A/zh
Publication of JP2007140075A publication Critical patent/JP2007140075A/ja
Publication of JP2007140075A5 publication Critical patent/JP2007140075A5/ja
Withdrawn legal-status Critical Current

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JP2005333305A 2005-11-17 2005-11-17 バリア膜形成用材料及びそれを用いたパターン形成方法 Withdrawn JP2007140075A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005333305A JP2007140075A (ja) 2005-11-17 2005-11-17 バリア膜形成用材料及びそれを用いたパターン形成方法
EP06121183A EP1788440A2 (en) 2005-11-17 2006-09-25 Barrier film material and pattern formation method using the same
US11/545,425 US20070111541A1 (en) 2005-11-17 2006-10-11 Barrier film material and pattern formation method using the same
CNA2006101485823A CN1967387A (zh) 2005-11-17 2006-11-16 阻挡膜形成用材料及使用了它的图案形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005333305A JP2007140075A (ja) 2005-11-17 2005-11-17 バリア膜形成用材料及びそれを用いたパターン形成方法

Publications (2)

Publication Number Publication Date
JP2007140075A JP2007140075A (ja) 2007-06-07
JP2007140075A5 true JP2007140075A5 (ja) 2008-10-16

Family

ID=37450860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005333305A Withdrawn JP2007140075A (ja) 2005-11-17 2005-11-17 バリア膜形成用材料及びそれを用いたパターン形成方法

Country Status (4)

Country Link
US (1) US20070111541A1 (ja)
EP (1) EP1788440A2 (ja)
JP (1) JP2007140075A (ja)
CN (1) CN1967387A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5124966B2 (ja) * 2006-03-29 2013-01-23 ダイキン工業株式会社 レジストパターン形成法
JP2009004478A (ja) * 2007-06-20 2009-01-08 Toshiba Corp パターン形成方法及び半導体装置の製造方法
JP4922858B2 (ja) * 2007-07-30 2012-04-25 株式会社東芝 パターン形成方法及び洗浄装置
US7704674B1 (en) * 2008-12-31 2010-04-27 Gilles Amblard Method for patterning a photo-resist in an immersion lithography process
JP5424848B2 (ja) * 2009-12-15 2014-02-26 株式会社東芝 半導体基板の表面処理装置及び方法
JP2015108644A (ja) * 2012-03-22 2015-06-11 日産化学工業株式会社 リソグラフィー用レジスト上層膜形成組成物
JP6455979B2 (ja) * 2014-03-18 2019-01-23 Hoya株式会社 レジスト層付ブランク、その製造方法、マスクブランクおよびインプリント用モールドブランク、ならびに転写用マスク、インプリント用モールドおよびそれらの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE0004610D0 (sv) * 2000-12-13 2000-12-13 Astrazeneca Ab Surface modification process
US7084945B2 (en) * 2002-07-12 2006-08-01 Eastman Kodak Company Compensator having particular sequence of films and crosslinked barrier layer
JP3993549B2 (ja) * 2003-09-30 2007-10-17 株式会社東芝 レジストパターン形成方法
JP3954066B2 (ja) * 2004-02-25 2007-08-08 松下電器産業株式会社 バリア膜形成用材料及びそれを用いたパターン形成方法
US20060008746A1 (en) * 2004-07-07 2006-01-12 Yasunobu Onishi Method for manufacturing semiconductor device
JP4485994B2 (ja) * 2005-06-03 2010-06-23 パナソニック株式会社 パターン形成方法

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