JP2007121346A5 - - Google Patents

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Publication number
JP2007121346A5
JP2007121346A5 JP2005309242A JP2005309242A JP2007121346A5 JP 2007121346 A5 JP2007121346 A5 JP 2007121346A5 JP 2005309242 A JP2005309242 A JP 2005309242A JP 2005309242 A JP2005309242 A JP 2005309242A JP 2007121346 A5 JP2007121346 A5 JP 2007121346A5
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Japan
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JP2005309242A
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English (en)
Japanese (ja)
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JP4859437B2 (ja
JP2007121346A (ja
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Priority to JP2005309242A priority Critical patent/JP4859437B2/ja
Priority claimed from JP2005309242A external-priority patent/JP4859437B2/ja
Publication of JP2007121346A publication Critical patent/JP2007121346A/ja
Publication of JP2007121346A5 publication Critical patent/JP2007121346A5/ja
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Publication of JP4859437B2 publication Critical patent/JP4859437B2/ja
Expired - Fee Related legal-status Critical Current
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JP2005309242A 2005-10-25 2005-10-25 被膜形成用樹脂組成物 Expired - Fee Related JP4859437B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005309242A JP4859437B2 (ja) 2005-10-25 2005-10-25 被膜形成用樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005309242A JP4859437B2 (ja) 2005-10-25 2005-10-25 被膜形成用樹脂組成物

Publications (3)

Publication Number Publication Date
JP2007121346A JP2007121346A (ja) 2007-05-17
JP2007121346A5 true JP2007121346A5 (pl) 2008-12-04
JP4859437B2 JP4859437B2 (ja) 2012-01-25

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ID=38145293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005309242A Expired - Fee Related JP4859437B2 (ja) 2005-10-25 2005-10-25 被膜形成用樹脂組成物

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JP (1) JP4859437B2 (pl)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4763511B2 (ja) * 2006-05-26 2011-08-31 信越化学工業株式会社 レジスト保護膜材料及びパターン形成方法
JP5045759B2 (ja) * 2007-09-27 2012-10-10 Ｊｓｒ株式会社 微細パターン形成用樹脂組成物および微細パターン形成方法
US7745077B2 (en) * 2008-06-18 2010-06-29 Az Electronic Materials Usa Corp. Composition for coating over a photoresist pattern
JP5573578B2 (ja) * 2009-10-16 2014-08-20 信越化学工業株式会社 パターン形成方法及びレジスト材料
KR101311446B1 (ko) * 2011-01-21 2013-09-25 금호석유화학 주식회사 수용성 수지 조성물 및 이를 이용하여 미세패턴을 형성하는 방법
KR102028109B1 (ko) * 2011-12-23 2019-11-15 금호석유화학 주식회사 미세패턴 형성용 수용성 수지 조성물 및 이를 이용한 미세패턴의 형성방법
US9448483B2 (en) * 2014-07-31 2016-09-20 Dow Global Technologies Llc Pattern shrink methods
JP6483397B2 (ja) * 2014-10-17 2019-03-13 東京応化工業株式会社 レジストパターン形成方法
JP6503206B2 (ja) 2015-03-19 2019-04-17 東京応化工業株式会社 レジストパターン修復方法
TWI615460B (zh) 2015-06-03 2018-02-21 羅門哈斯電子材料有限公司 用於圖案處理的組合物和方法
CN106249540A (zh) * 2015-06-03 2016-12-21 陶氏环球技术有限责任公司 图案处理方法
TWI617900B (zh) * 2015-06-03 2018-03-11 羅門哈斯電子材料有限公司 圖案處理方法
TWI627220B (zh) * 2015-06-03 2018-06-21 羅門哈斯電子材料有限公司 用於圖案處理之組合物及方法
US10133179B2 (en) 2016-07-29 2018-11-20 Rohm And Haas Electronic Materials Llc Pattern treatment methods
CN114431339B (zh) * 2022-02-14 2023-06-27 浙江汇能生物股份有限公司 一种低添加增稳微囊化二甲酸钾饲料添加剂及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5672954A (en) * 1979-11-19 1981-06-17 Sumitomo Chemical Co Article molded with coating polycarbonate group resin
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
DE3742472A1 (de) * 1987-12-15 1989-06-29 Belland Ag Aminogruppen enthaltendes polymerisat, verfahren zu seiner herstellung und verwendung
CA2020629C (en) * 1989-07-21 2000-02-01 Frank Landy Shelf stable fast-cure aqueous coating
US6818384B2 (en) * 2002-10-08 2004-11-16 Samsung Electronics Co., Ltd. Methods of fabricating microelectronic features by forming intermixed layers of water-soluble resins and resist materials

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