JP2007096191A - Semiconductor device, and the same with radiating mechanism - Google Patents

Semiconductor device, and the same with radiating mechanism Download PDF

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JP2007096191A
JP2007096191A JP2005286423A JP2005286423A JP2007096191A JP 2007096191 A JP2007096191 A JP 2007096191A JP 2005286423 A JP2005286423 A JP 2005286423A JP 2005286423 A JP2005286423 A JP 2005286423A JP 2007096191 A JP2007096191 A JP 2007096191A
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semiconductor device
base plate
conductive grease
recess
insulating substrate
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Toru Matsuoka
徹 松岡
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device in which excess heat conductive grease is extruded efficiently from between a base board and a radiating fin to reduce the thickness of a heat conductive grease film to offer improved heat radiation efficiency. <P>SOLUTION: The semiconductor device connected to the radiating fin via the heat conductive grease includes the base board having a front surface and a back surface, an insulating board placed on the front surface of the base board, and a semiconductor element placed on the insulating board. Recessions are formed on the back surface of the base board, where part of the heat conductive grease is extruded into the recessions when the semiconductor device is connected to the radiating fin. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、電力用の半導体装置、および放熱フィンを備えた放熱機構付き半導体装置に関する。   The present invention relates to a power semiconductor device and a semiconductor device with a heat dissipation mechanism including a heat dissipation fin.

電力用の半導体装置では、表面および裏面に金属配線パターンを備えた絶縁基板の上に、IGBT等の半導体素子が取り付けられる。絶縁基板は、例えば銅からなるベース板の上に固定され、更にベース板は、放熱フィンの上に押し付けるようにボルト等で固定される。ベース板と放熱フィンとの間には、熱の伝導性が良くなるようにシリコーングリース等の熱伝導性グリースが塗布される(例えば、特許文献1参照)。
特開2003−23280号公報
In a power semiconductor device, a semiconductor element such as an IGBT is attached on an insulating substrate having a metal wiring pattern on the front and back surfaces. The insulating substrate is fixed on a base plate made of, for example, copper, and the base plate is further fixed with bolts or the like so as to be pressed onto the radiation fins. Thermal conductive grease such as silicone grease is applied between the base plate and the heat radiating fins so as to improve thermal conductivity (see, for example, Patent Document 1).
Japanese Patent Laid-Open No. 2003-23280

熱伝導性グリースは、気泡等のボイドが熱伝導性グリース中にできないようにある程度の厚みをもって放熱フィンの上に塗布した後、ベース板を放熱フィンに押し付けて、余剰の熱伝導性グリースを押し出して薄くする。熱伝導性グリースの膜厚を薄くすることにより、熱伝導性が向上する。   The thermal conductive grease is applied on the heat radiation fin with a certain thickness so that voids such as bubbles do not appear in the heat conductive grease, and then the base plate is pressed against the heat radiation fin to push out the excess heat conductive grease. And thin. By reducing the thickness of the thermally conductive grease, the thermal conductivity is improved.

しかしながら、従来の半導体装置では、余剰の熱伝導性グリースはベース板の周囲のみから外部に押し出されるため、膜厚を薄くするためには大きな力でベース板を放熱フィンに押し付ける必要があり、熱伝導性グリースの薄膜化には一定の限界があった。   However, in the conventional semiconductor device, excess thermal conductive grease is pushed out only from the periphery of the base plate, so it is necessary to press the base plate against the radiating fin with a large force to reduce the film thickness. There was a certain limit to the thinning of conductive grease.

そこで、本発明は、ベース板と放熱フィンの間から余剰の熱伝導性グリースを効率的に押し出して、熱伝導性グリースの膜厚を薄くする半導体装置の提供を目的とする。   Accordingly, an object of the present invention is to provide a semiconductor device in which excess thermal conductive grease is efficiently extruded from between a base plate and a radiating fin to reduce the thickness of the thermal conductive grease.

本発明は、熱伝導性グリースを介して放熱フィンに接続される半導体装置であって、表面と裏面とを備えたベース板と、ベース板の表面上に配置された絶縁基板と、絶縁基板の上に配置された半導体素子とを含み、ベース板の裏面に、半導体装置を放熱フィンに接続する場合に熱伝導性グリースの一部がその中に押し出される凹部が設けられたことを特徴とする半導体装置である。   The present invention is a semiconductor device connected to a heat radiation fin via a thermally conductive grease, a base plate having a front surface and a back surface, an insulating substrate disposed on the surface of the base plate, and an insulating substrate The semiconductor device is disposed on the back surface of the base plate, and when the semiconductor device is connected to the heat radiating fin, a recess is provided in which a part of the heat conductive grease is pushed out. It is a semiconductor device.

以上のように、本発明にかかる半導体装置では、ベース板と放熱フィンとの間の熱伝導性グリースを薄くでき、放熱効率の高い半導体装置を提供できる。   As described above, in the semiconductor device according to the present invention, the thermally conductive grease between the base plate and the heat radiating fin can be thinned, and a semiconductor device with high heat dissipation efficiency can be provided.

以下に、図面を参照しながら、本発明の好適な実施の形態について説明する。なお、以下の説明では、「上」、「下」、「左」、「右」およびこれらの用語を含む名称を適宜使用するが、これらの方向は図面を参照した発明の理解を容易にするために用いるものであり、実施形態を上下反転、あるいは任意の方向に回転した形態も、当然に本願発明の技術的範囲に含まれる。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. In the following description, “top”, “bottom”, “left”, “right” and names including these terms are used as appropriate, but these directions make it easy to understand the invention with reference to the drawings. Therefore, a mode in which the embodiment is inverted upside down or rotated in an arbitrary direction is naturally included in the technical scope of the present invention.

図1は、全体が100で表される、本発明の実施の形態にかかる半導体装置の断面図である。また、図2は、かかる半導体装置に含まれるベース板の裏面図である。   FIG. 1 is a cross-sectional view of a semiconductor device according to an embodiment of the present invention, indicated as a whole by 100. FIG. 2 is a back view of a base plate included in the semiconductor device.

半導体装置100は、絶縁基板1を含む。絶縁基板1は、例えばアルミナ基板の両面に銅の配線パターンを有する構造からなる。絶縁基板1の上には、例えばIGBTやフリーホイールダイオードのような半導体素子2が固定されている。半導体素子2と絶縁基板1の配線パターンとは、ボンディングワイヤ等により電気的に接続されている(図示せず)。   The semiconductor device 100 includes an insulating substrate 1. The insulating substrate 1 has a structure having copper wiring patterns on both surfaces of an alumina substrate, for example. On the insulating substrate 1, a semiconductor element 2 such as an IGBT or a free wheel diode is fixed. The semiconductor element 2 and the wiring pattern of the insulating substrate 1 are electrically connected by a bonding wire or the like (not shown).

絶縁基板1は、例えば銅からなるベース板6の上に取り付けられている。更に、ベース板6は、放熱部材、例えばアルミニウムからなる放熱フィン8に、熱伝導性グリース9を介して取り付けられている。ベース板6は、例えばボルトとナット(図示せず)により、放熱フィン8に押し付けられるように固定されている。熱伝導性グリース9には、例えばシリコーングリースが用いられる。   The insulating substrate 1 is attached on a base plate 6 made of, for example, copper. Furthermore, the base plate 6 is attached to a heat radiating member, for example, a heat radiating fin 8 made of aluminum via a heat conductive grease 9. The base plate 6 is fixed so as to be pressed against the radiating fins 8 by, for example, bolts and nuts (not shown). For example, silicone grease is used as the thermally conductive grease 9.

ベース板6の上には、周囲に沿って設けられたケース部3と、ケース部3を上部で閉じる蓋部4とが設けられている。ケース部3の中には、半導体素子2を覆うようにシリコンゲル5が充填されている。   On the base plate 6, a case portion 3 provided along the periphery and a lid portion 4 that closes the case portion 3 at the top are provided. The case portion 3 is filled with silicon gel 5 so as to cover the semiconductor element 2.

更にベース板6には、図2に示すような凹部7が裏面に設けられている。図1において、凹部7は、紙面に垂直方向に配置され、ベース板6の両側に開口端部を有する。   Further, the base plate 6 is provided with a recess 7 as shown in FIG. In FIG. 1, the recess 7 is arranged in a direction perpendicular to the paper surface and has open ends on both sides of the base plate 6.

熱伝導性グリース9は、気泡等のボイドが熱伝導性グリース9中にできないように、放熱フィン8の上に厚めに塗布される。続いて、上述のように、放熱フィン8にベース板6を押し付けるように固定することにより、余剰の熱伝導性グリース9が放熱フィン8とベース板6との間からはみ出して、熱伝導性グリース9が薄膜化される。   The heat conductive grease 9 is applied thickly on the heat radiation fin 8 so that voids such as bubbles cannot be formed in the heat conductive grease 9. Subsequently, as described above, the base plate 6 is fixed so as to be pressed against the heat radiating fins 8, so that excess heat conductive grease 9 protrudes from between the heat radiating fins 8 and the base plate 6. 9 is thinned.

半導体装置100では、ベース板6の裏面に凹部7が設けられているため、余剰の熱伝導性グリース9は、ベース板6の周囲だけでなく凹部7の中にも押し出される。即ち、ベース板6の裏面に凹部7を設けることにより、所定の力で放熱フィン8にベース板6を押し付けた場合に、余剰の熱伝導性グリース9をより多く押し出すことができる。
この結果、放熱フィン8とベース板6との間の熱伝導性グリース9がより薄膜化され、放熱フィン8とベース板6との間の熱伝導性がよくなる。
In the semiconductor device 100, since the concave portion 7 is provided on the back surface of the base plate 6, excess heat conductive grease 9 is pushed out not only around the base plate 6 but also into the concave portion 7. That is, by providing the recess 7 on the back surface of the base plate 6, when the base plate 6 is pressed against the radiating fins 8 with a predetermined force, it is possible to push out a larger amount of excess thermal conductive grease 9.
As a result, the thermal conductive grease 9 between the radiation fins 8 and the base plate 6 is made thinner, and the thermal conductivity between the radiation fins 8 and the base plate 6 is improved.

なお、ベース板6の裏面に形成される凹部7の位置については、少なくとも絶縁基板1(図2に破線1で表示)の下方(ベース板6を挟んで絶縁基板1と対向する領域)となるように設けることが必要である。更には、絶縁基板1に搭載された半導体素子2(図2に破線2で表示)直下の領域を避け、その近傍あるいは周囲に近接して設けることが好ましい。これは、半導体素子2の直下の領域において、熱伝導性グリース9を薄膜化(例えば、塗布時の厚さが200μmの場合、押圧して結合することにより厚さを50〜100μm又はそれ以下とする)し、放熱効率を向上させるためである。   In addition, the position of the recess 7 formed on the back surface of the base plate 6 is at least below the insulating substrate 1 (indicated by the broken line 1 in FIG. 2) (a region facing the insulating substrate 1 with the base plate 6 in between). It is necessary to provide as follows. Further, it is preferable to avoid the region directly below the semiconductor element 2 (indicated by the broken line 2 in FIG. 2) mounted on the insulating substrate 1 and to provide it in the vicinity or in the vicinity thereof. This is because the thermal conductive grease 9 is thinned in the region immediately below the semiconductor element 2 (for example, when the thickness at the time of application is 200 μm, the thickness is reduced to 50 to 100 μm or less by bonding by pressing. This is to improve the heat dissipation efficiency.

このため、例えば図2に示すように、絶縁基板1の上に複数の半導体素子2が配置されている場合には、半導体素子2に挟まれた領域の下方(ベース板6を挟んで半導体素子2に挟まれた領域と対向する部分)と、かかる半導体素子2に挟まれた領域とは、半導体素子2を挟んで反対側の領域の下方に凹部7を設けることが好ましい。
図2に示すように、凹部7は、ベース板6の両側に開口端部を有する、略直線状の溝部とすることが好ましい。凹部7の作製が容易に行え、コストを抑えることができるからである。
Therefore, for example, as shown in FIG. 2, when a plurality of semiconductor elements 2 are arranged on the insulating substrate 1, below the region sandwiched between the semiconductor elements 2 (semiconductor elements sandwiching the base plate 6). 2 and a region sandwiched between the semiconductor elements 2 are preferably provided with a recess 7 below a region on the opposite side of the semiconductor element 2.
As shown in FIG. 2, the recess 7 is preferably a substantially linear groove having open end portions on both sides of the base plate 6. This is because the recess 7 can be easily manufactured and the cost can be reduced.

図3は、図2をA−A方向に見た場合の断面図である。図3に示すように、凹部7は、ベース板6の両側面に開口端部を有する略直線状の溝部からなり、溝部の深さは、2つの開口端部の中央近傍が最も浅く、開口端部に向かうほど漸次深くなっている。
このような凹部7を有することにより、ベース板6が放熱フィン8に押し付けられる際の、凹部7内における空気の排出が速やかとなるため、ベース板6の放熱フィン8への取り付け作業効率を向上させることができる。
FIG. 3 is a cross-sectional view of FIG. 2 when viewed in the AA direction. As shown in FIG. 3, the recess 7 is composed of a substantially straight groove having opening ends on both side surfaces of the base plate 6, and the depth of the groove is shallowest in the vicinity of the center of the two opening ends. It gradually becomes deeper toward the end.
By having such a concave portion 7, when the base plate 6 is pressed against the heat radiating fin 8, air is quickly discharged from the concave portion 7, so that the work efficiency of attaching the base plate 6 to the radiating fin 8 is improved. Can be made.

図4は、本実施の形態にかかる半導体装置100に含まれる他のベース板6の裏面図である。図4のベース板6では、図2のベース板6と同じ方向に凹部17が設けられているが、両側に開口端の無い構造となっている。   FIG. 4 is a back view of another base plate 6 included in the semiconductor device 100 according to the present embodiment. The base plate 6 shown in FIG. 4 has a recess 17 in the same direction as the base plate 6 shown in FIG.

図5は、本実施の形態にかかる半導体装置100に含まれる他のベース板6の裏面図である。図5のベース板6では、ベース板6の周囲に沿って凹部27が設けられている。   FIG. 5 is a back view of another base plate 6 included in the semiconductor device 100 according to the present embodiment. In the base plate 6 of FIG. 5, a recess 27 is provided along the periphery of the base plate 6.

なお、ベース板6の裏面に設けられる凹部は、図2〜5に示す構造に限定されるものではなく、余剰の熱伝導性グリースを逃がすことができる構成であれば、他の形状であっても構わない。   In addition, the recessed part provided in the back surface of the base board 6 is not limited to the structure shown in FIGS. 2-5, If it is the structure which can escape an excess thermal conductive grease, it is another shape. It doesn't matter.

また、凹部7は、放熱フィン8に設けることもできるが、絶縁基板1の下方や、複数の半導体素子2に挟まれた領域の下方に正確に配置するためには、ベース板6に設けることが好ましい。   In addition, the recess 7 can be provided in the heat radiating fin 8, but it is provided in the base plate 6 in order to accurately place the recess 7 below the insulating substrate 1 or below the region sandwiched between the plurality of semiconductor elements 2. Is preferred.

なお、半導体装置100は、放熱フォン8を取り付けない状態、取り付けた状態のいずれでも取引の対象となり、販売等がなされる。   Note that the semiconductor device 100 is subject to transaction in both the state where the heat radiating phone 8 is not attached and the state where it is attached, and is sold.

本発明の実施の形態にかかる半導体装置の断面図である。It is sectional drawing of the semiconductor device concerning embodiment of this invention. 本発明の実施の形態にかかる半導体装置に含まれるベース板の裏面図である。It is a reverse view of the base board contained in the semiconductor device concerning embodiment of this invention. 本発明の実施の形態にかかる半導体装置に含まれるベース板の断面図である。It is sectional drawing of the base board contained in the semiconductor device concerning embodiment of this invention. 本発明の実施の形態にかかる半導体装置に含まれる他のベース板の裏面図である。It is a reverse view of the other base board contained in the semiconductor device concerning embodiment of this invention. 本発明の実施の形態にかかる半導体装置に含まれる他のベース板の裏面図である。It is a reverse view of the other base board contained in the semiconductor device concerning embodiment of this invention.

符号の説明Explanation of symbols

1 絶縁基板、2 半導体素子、3 ケース部、4 蓋部、5 シリコンゲル、6 ベース板、7 凹部、8 放熱フィン、9 熱伝導性グリース、100 半導体装置。

DESCRIPTION OF SYMBOLS 1 Insulation substrate, 2 Semiconductor element, 3 Case part, 4 Cover part, 5 Silicon gel, 6 Base plate, 7 Recessed part, 8 Radiation fin, 9 Thermally conductive grease, 100 Semiconductor device.

Claims (6)

熱伝導性グリースを介して放熱フィンに接続される半導体装置であって、
表面と裏面とを備えたベース板と、
該ベース板の表面上に配置された絶縁基板と、
該絶縁基板の上に配置された半導体素子とを含み、
該ベース板の裏面に、該半導体装置を該放熱フィンに接続する場合に該熱伝導性グリースの一部がその中に押し出される凹部が設けられたことを特徴とする半導体装置。
A semiconductor device connected to a heat dissipation fin via a thermal conductive grease,
A base plate having a front surface and a back surface;
An insulating substrate disposed on the surface of the base plate;
A semiconductor element disposed on the insulating substrate,
A semiconductor device characterized in that a recess is provided on the back surface of the base plate to allow a part of the thermally conductive grease to be pushed into the semiconductor device when the semiconductor device is connected to the radiating fin.
上記凹部が、上記ベース板を挟んで上記絶縁基板と対向する位置に設けられたことを特徴とする請求項1に記載の半導体装置。   The semiconductor device according to claim 1, wherein the recess is provided at a position facing the insulating substrate across the base plate. 上記半導体素子が配置された領域を除いた該絶縁基板と、上記ベース板を挟んで対向する位置に、上記凹部が設けられたことを特徴とする請求項1に記載の半導体装置。   2. The semiconductor device according to claim 1, wherein the recess is provided at a position facing the insulating substrate excluding a region where the semiconductor element is disposed across the base plate. 上記凹部が、上記ベース板の対向する側面にそれぞれ開口端部を有する略直線状の溝からなることを特徴とする請求項1〜3のいずれかに記載の半導体装置。   The semiconductor device according to claim 1, wherein the concave portion is formed by a substantially linear groove having open end portions on opposite side surfaces of the base plate. 上記凹部が、2つの上記開口端部の略中央から該開口端部に向かって、漸次深くなることを特徴とする請求項4に記載の半導体装置。   The semiconductor device according to claim 4, wherein the recess gradually becomes deeper from a substantially center of the two opening end portions toward the opening end portion. 請求項1〜5のいずれかに記載の半導体装置と、
該半導体装置に含まれる該ベース板の裏面に熱伝導性グリースを介して接続された放熱フィンとを含み、
該ベース板と該放熱フィンとの間から該凹部内に、該熱伝導性グリースが押し出されたことを特徴とする放熱機構付き半導体装置。

A semiconductor device according to any one of claims 1 to 5;
A heat dissipating fin connected to the back surface of the base plate included in the semiconductor device via a heat conductive grease;
A semiconductor device with a heat dissipation mechanism, wherein the thermally conductive grease is extruded into the recess from between the base plate and the heat dissipation fin.

JP2005286423A 2005-09-30 2005-09-30 Semiconductor device, and the same with radiating mechanism Pending JP2007096191A (en)

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JP2013138113A (en) * 2011-12-28 2013-07-11 Toyota Motor Corp Cooling structure
CN103350057A (en) * 2012-09-19 2013-10-16 上海逸航汽车零部件有限公司 Positioning tool for coating heat-conductive silicone grease layers on radiators, and method thereof
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JP2017034167A (en) * 2015-08-04 2017-02-09 株式会社日本自動車部品総合研究所 Semiconductor device

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JP2010092999A (en) * 2008-10-07 2010-04-22 Toyota Motor Corp Heat dissipation structure and inverter for vehicle
JP2013120866A (en) * 2011-12-08 2013-06-17 Aisin Seiki Co Ltd Semiconductor device
JP2013138113A (en) * 2011-12-28 2013-07-11 Toyota Motor Corp Cooling structure
CN103350057A (en) * 2012-09-19 2013-10-16 上海逸航汽车零部件有限公司 Positioning tool for coating heat-conductive silicone grease layers on radiators, and method thereof
WO2015097874A1 (en) * 2013-12-27 2015-07-02 三菱電機株式会社 Semiconductor device
US20160240456A1 (en) * 2013-12-27 2016-08-18 Mitsubishi Electric Corporation Semiconductor device
JP6024838B2 (en) * 2013-12-27 2016-11-16 三菱電機株式会社 Semiconductor device
US9543227B2 (en) 2013-12-27 2017-01-10 Mitsubishi Electric Corporation Semiconductor device
JP2017034167A (en) * 2015-08-04 2017-02-09 株式会社日本自動車部品総合研究所 Semiconductor device

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