JP2007073755A - Method of manufacturing chip resistor - Google Patents

Method of manufacturing chip resistor Download PDF

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JP2007073755A
JP2007073755A JP2005259498A JP2005259498A JP2007073755A JP 2007073755 A JP2007073755 A JP 2007073755A JP 2005259498 A JP2005259498 A JP 2005259498A JP 2005259498 A JP2005259498 A JP 2005259498A JP 2007073755 A JP2007073755 A JP 2007073755A
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break groove
surface electrode
forming
chip resistor
electrodes
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JP4875327B2 (en
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Torayuki Tsukada
虎之 塚田
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Rohm Co Ltd
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Rohm Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To positively apply highly accurate trimming adjustment with low resistance in which two probes for conduction contact a single top surface electrode without causing cost raise. <P>SOLUTION: A method of manufacturing a chip resistor includes steps of preparing a base material substrate A in which a plurality of insulation substrates are aligned and integrated and a longitudinal break groove A1 and a lateral break groove A2 are engraved on its surface; forming a pair of right and left top surface electrodes 2 astride a portion of each of the insulation substrates and forming a resistance film 3; performing trimming adjustment so that a resistance value of the resistance film can be a predetermined value while measuring the resistance value while a probe B for conduction contacts both the top surface electrodes; forming side surface electrodes 6 on both the right and left end surfaces of each of the insulation substrates after breaking the substrate along the longitudinal break groove; and further breaking substrate along the lateral break groove A2. In this case, when the top surface electrodes 2 are formed, through hole 2a are formed on a portion overlapping over the longitudinal break groove A1 of the top surface electrodes 2. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は,チップ型にした絶縁基板に,一つの抵抗膜を形成するとともに,この抵抗膜の両端に対する半田付け用の端子電極とを形成して成るチップ抵抗器において,その製造方法に関するものである。   The present invention relates to a chip resistor in which a single resistive film is formed on a chip-type insulating substrate and soldering terminal electrodes are formed on both ends of the resistive film, and a method for manufacturing the chip resistor. is there.

一般に,この種のチップ抵抗器は,従来から良く知られているように,最小限,チップ型にした絶縁基板と,その表面に形成した左右一対の上面電極及びその間に形成した抵抗膜と,前記絶縁基板における左右両端面に前記上面電極に接続するように形成した側面電極とから成り,前記両側面電極をプリント基板等に対して半田付けするように構成している。   In general, this type of chip resistor has, as is well known, a chip-type insulating substrate, a pair of left and right upper electrodes formed on the surface thereof, and a resistance film formed therebetween. The left and right end surfaces of the insulating substrate are side electrodes formed so as to be connected to the upper surface electrode, and the both side surface electrodes are soldered to a printed circuit board or the like.

なお,前記絶縁基板の表面には,前記抵抗膜を覆うカバーコートが形成され,また,前記絶縁基板の裏面には,必要に応じて左右一対の下面電極が,当該両下面電極に前記側面電極が接続するように形成され,更にまた,前記両上面電極,両側面電極及両下面電極の表面には,半田メッキ層が形成されている。   A cover coat covering the resistance film is formed on the surface of the insulating substrate, and a pair of left and right lower electrodes are provided on the back surface of the insulating substrate as necessary, and the side electrodes are connected to the both lower electrodes. Further, solder plating layers are formed on the surfaces of the upper surface electrodes, the both side surface electrodes, and the lower surface electrodes.

従来,前記した構成のチップ抵抗器を製造するに際しては,例えば,特許文献1及び特許文献2に記載されているように,大まかにいって,以下に述べるように,
先ず,前記絶縁基板1の複数個を縦及び横方向に並べて一体化し,且つ,表面に前記各絶縁基板ごとにブレイクするための縦ブレイク溝及び横ブレイク溝を刻設して成る素材基板を用意する。
Conventionally, when manufacturing a chip resistor having the above-described configuration, for example, as described in Patent Document 1 and Patent Document 2, as described below,
First, a material substrate is prepared, in which a plurality of the insulating substrates 1 are aligned and integrated in the vertical and horizontal directions, and a vertical break groove and a horizontal break groove are formed on the surface for breaking each insulating substrate. To do.

次いで,前記素材基板における表面のうち前記各絶縁基板の箇所に,前記左右一対の上面電極を,前記縦ブレイク溝に跨がるように形成するとともに前記抵抗膜を前記両上面電極に接続するように形成する。   Next, the pair of left and right upper surface electrodes are formed on the insulating substrate in the surface of the material substrate so as to straddle the vertical break grooves, and the resistance film is connected to the both upper surface electrodes. To form.

次いで,前記各絶縁基板における抵抗膜に対して,その両端における両上面電極の各々に通電用プローブを接触した状態で当該抵抗膜における抵抗値を測定しながら,その抵抗値が所定値になるようにトリミング溝を刻設するというトリミング調整を行う。   Next, with respect to the resistance film on each insulating substrate, the resistance value of the resistance film becomes a predetermined value while measuring the resistance value of the resistance film in a state where the upper surface electrodes at both ends are in contact with the energization probes. Trimming adjustment is performed by making a trimming groove on the surface.

次いで,前記素材基板を,その各絶縁基板の表面にカバーコートを形成したのち,縦ブレイク溝に沿ってブレイクし,このブレイクした各絶縁基板における左右両端面の各々に側面電極を形成する。   Next, after forming a cover coat on the surface of each insulating substrate, the material substrate is broken along the vertical break grooves, and side electrodes are formed on the left and right end surfaces of each of the broken insulating substrates.

次いで,前記横ブレイク溝に沿って各絶縁基板ごとにブレイクしたのち,半田メッキ層を形成する。
という方法を採用している。
Next, after breaking for each insulating substrate along the lateral break groove, a solder plating layer is formed.
The method is adopted.

そして,前記した製造方法において,上面電極を縦ブレイク溝に跨がるように形成することは,前記上面電極のうち前記縦ブレイク溝の部分における厚さが厚くなることで,前記縦ブレイク溝に沿ってブレイクすることを困難にする。   In the manufacturing method described above, forming the upper surface electrode so as to straddle the vertical break groove is because the thickness of the vertical break groove portion of the upper surface electrode is increased, so that the vertical break groove is formed in the vertical break groove. Makes it difficult to break along.

そこで,前記特許文献1においては,前記縦ブレイク溝に跨がるように形成する上面電極2を,前記縦ブレイク溝の部分において幅狭くすることにより,また,前記特許文献2においては,前記上面電極2を,前記縦ブレイク溝の部分において分断することによって,前記上面電極2が前記縦ブレイク溝に沿ってのブレイクを困難にすることを低減するように,換言すると,前記縦ブレイク溝に沿ってのブレイクを容易にするように構成している。
特開昭59−75607号公報 特開平7−153608号公報
Therefore, in Patent Document 1, the upper surface electrode 2 formed so as to straddle the vertical break groove is narrowed in the vertical break groove portion, and in Patent Document 2, the upper surface electrode 2 is formed. By dividing the electrode 2 at the portion of the vertical break groove, in order to reduce the difficulty of the upper surface electrode 2 from breaking along the vertical break groove, in other words, along the vertical break groove. It is configured to facilitate all breaks.
JP 59-75607 A JP 7-153608 A

ところで,前記抵抗膜を,低い抵抗値のもとで高い精度でトリミング調整するに際しては,その両上面電極の各々に対して,当該上面電極における幅方向に並べた二本の通電用プローブを同時に接触することによって行うようにしている。   By the way, when performing trimming adjustment of the resistance film with high accuracy under a low resistance value, two energization probes arranged in the width direction of the upper surface electrode are simultaneously applied to each of the upper surface electrodes. I do it by touching.

このために,前記特許文献1に記載されているように,上面電極を,前記縦ブレイク溝の部分において幅狭にするという構成である場合には,前記上面電極のうち幅狭の部分に対して二本の通電用プローブを同時に接触することができず,換言すると,一つの上面電極に対して二本の通電用プローブを接触するという低抵抗で高い精度のトリミング調整を適用することができないという問題がある。   For this reason, as described in Patent Document 1, when the upper surface electrode is configured to be narrower in the vertical break groove portion, the narrower portion of the upper surface electrode is not affected. In other words, the two energization probes cannot be contacted at the same time. In other words, it is not possible to apply trimming adjustment with high accuracy and low resistance in which two energization probes are in contact with one upper surface electrode. There is a problem.

これに対し,前記特許文献2に記載されているように,上面電極を,前記縦ブレイク溝の部分において分断するという構成である場合には,この上面電極は幅狭になっていないことにより,これに二本の通電用プローブを同時に接触することができる。   On the other hand, as described in Patent Document 2, when the upper surface electrode is divided at the vertical break groove portion, the upper surface electrode is not narrowed. Two energization probes can be in contact with this simultaneously.

しかし,その反面,前記抵抗膜は,その耐サージ特性の向上を図るこから出来るだけ長い寸法に構成されるもであることにより,上面電極を縦ブレイク溝の部分において分断することは,当該上面電極のうち通電用プローブを接触することができる部分におけるエリアが,前記の分断によって大幅に狭くなり,この狭いエリアに対して二本の通電用プローブを同時に接触することが著しく困難になるから,この接触に多大の手数及び精度を必要とし,製造コストが可成りアップするという問題がある。   However, on the other hand, the resistive film has a dimension as long as possible in order to improve its surge resistance, so that the upper surface electrode is divided at the vertical break groove portion. The area of the electrode where the energizing probe can be contacted is greatly narrowed by the above-mentioned division, and it becomes extremely difficult to simultaneously contact two energizing probes to this narrow area. There is a problem in that this contact requires a great deal of labor and accuracy, and the manufacturing cost is considerably increased.

本発明は,これらの問題を解消した製造方法を提供することを技術的課題とするものである。   It is a technical object of the present invention to provide a manufacturing method that solves these problems.

この技術的課題を達成するため本発明の請求項1は,
「一つのチップ抵抗器を構成する絶縁基板の複数個を縦及び横方向に並べて一体化し,且つ,表面に前記各絶縁基板ごとにブレイクするための縦ブレイク溝及び横ブレイク溝を刻設して成る素材基板を用意する工程と,
次いで,前記素材基板における表面のうち前記各絶縁基板の箇所に,左右一対の上面電極を前記縦ブレイク溝に跨がるように形成するとともに抵抗膜を前記両上面電極に接続するように形成する工程と,
次いで,前記抵抗膜の両端における両上面電極に通電用プローブを接触した状態で前記抵抗膜における抵抗値を測定しながら,その抵抗値が所定値になるようにトリミング調節する工程と,
次いで,前記素材基板を,前記縦ブレイク溝に沿ってブレイクしたのち,各絶縁基板の左右両端面に側面電極を形成する工程と,
次いで,前記横ブレイク溝に沿って各絶縁基板ごとにブレイクする工程とを備えて成るチップ抵抗器の製造方法において,
前記上面電極を形成する工程が,当該上面電極のうち前記縦ブレイク溝に重なる部分に抜き孔を形成する工程である。」
ことを特徴としている。
In order to achieve this technical problem, claim 1 of the present invention provides:
“A plurality of insulating substrates constituting one chip resistor are integrated in a vertical and horizontal direction, and a vertical break groove and a horizontal break groove are formed on the surface for breaking each insulating substrate. Preparing a material substrate comprising:
Next, a pair of left and right upper surface electrodes are formed on the insulating substrate in the surface of the material substrate so as to straddle the vertical break grooves, and a resistance film is formed so as to connect to both upper surface electrodes. Process,
Next, adjusting the trimming so that the resistance value becomes a predetermined value while measuring the resistance value in the resistance film in a state where the energization probes are in contact with both upper surface electrodes at both ends of the resistance film;
Next, after the material substrate is broken along the vertical break grooves, side electrodes are formed on both left and right end surfaces of each insulating substrate;
Next, in the method of manufacturing a chip resistor, comprising a step of breaking each insulating substrate along the lateral break groove,
The step of forming the upper surface electrode is a step of forming a hole in a portion of the upper surface electrode that overlaps the vertical break groove. "
It is characterized by that.

また,本発明の請求項2は,
「前記請求項1の記載において,前記上面電極を形成する工程が,当該上面電極のうち前記縦ブレイク溝に重なる部分に抜き孔を形成すると同時に,当該上面電極における左右両側面のうち前記縦ブレイク溝に重なる部分に凹所を形成する工程である。」
ことを特徴としている。
Further, claim 2 of the present invention is
“In the first aspect of the present invention, the step of forming the upper surface electrode forms a hole in a portion of the upper surface electrode that overlaps the vertical break groove, and at the same time, the vertical break of the left and right side surfaces of the upper surface electrode. This is the process of forming a recess in the part that overlaps the groove. "
It is characterized by that.

前記したように,縦ブレイク溝に跨がって形成する上面電極のうち前記縦ブレイク溝に重なる部分に,抜き孔を形成することにより,前記上面電極が前記縦ブレイク溝に沿ってのブレイクを困難にすることを,前記抜き孔の存在によって確実に低減できる。   As described above, by forming a punched hole in a portion of the upper surface electrode formed over the vertical break groove so as to overlap the vertical break groove, the upper surface electrode causes a break along the vertical break groove. Making it difficult can be reliably reduced by the presence of the hole.

その一方において,前記上面電極のうち前記抜き孔より幅方向の左右両外側の部分においては,上面電極が前記縦ブレイク溝を跨がるように存在していて,この二つの部分に対して幅方向に並べて成る二本の通電用プローブを同時に接触することが可能になる。   On the other hand, in the portion of the upper surface electrode on the left and right outer sides in the width direction from the punched hole, the upper surface electrode exists so as to straddle the vertical break groove, and the width with respect to these two portions is larger. It becomes possible to simultaneously contact two energizing probes arranged in the direction.

これに加えて,前記二つの部分によって,二本の通電用プローブを同時に接触することができるエリアを,前記したように,上面電極を縦ブレイク溝の部分において幅狭にした場合,及び,縦ブレイク溝の部分において分断した場合よりも,抵抗膜に十分な長さ寸法を確保した状態のもとで,大幅に増大できるから,二本の通電用プローブを同時に接触することが容易にできる。   In addition to this, the area where the two energizing probes can be simultaneously contacted by the two portions is reduced when the top electrode is made narrower at the vertical break groove portion as described above, and Compared to the case where the break groove is divided, the resistance film can be greatly increased in a state where a sufficient length dimension is secured, so that two energizing probes can be easily brought into contact with each other at the same time.

従って,本発明によると,一つの上面電極に対して二本の通電用プローブを接触するという低抵抗で高い精度のトリミング調整を,製造コストのアップを招来することなく確実に適用することができる。   Therefore, according to the present invention, it is possible to reliably apply trimming adjustment with low resistance and high accuracy in which two energization probes are in contact with one upper surface electrode without causing an increase in manufacturing cost. .

特に,請求項2の記載によると,縦ブレイク溝に沿ってブレイクすることの容易性を,前記した効果を維持した状態のもとで,更に向上できる。   In particular, according to the second aspect of the present invention, the ease of breaking along the vertical break groove can be further improved while maintaining the above-described effects.

以下,本発明の実施の形態を,図面について説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

この実施の形態による製造方法は,以下に述べる工程を備えている。   The manufacturing method according to this embodiment includes the steps described below.

先ず,図1〜図3に示すように,一つのチップ抵抗器を構成する絶縁基板1の複数個を縦方向及び横方向に並べて一体化して成る素材基板Aを,その表面に,当該素材基板Aを前記各絶縁基板1ごとにブレイクするための縦ブレイク溝A1及び横ブレイク溝A2を刻設して製作する。   First, as shown in FIGS. 1 to 3, a material substrate A formed by integrating a plurality of insulating substrates 1 constituting one chip resistor by arranging them in the vertical direction and the horizontal direction is formed on the surface of the material substrate A. A vertical break groove A1 and a horizontal break groove A2 for breaking A for each of the insulating substrates 1 are formed by engraving.

次いで,図4及び図5に示すように,前記素材基板Aにおける表面のうち前記各絶縁基板1の箇所に,左右一対の上面電極2を,材料ペーストのスクリーン印刷とその後における焼成にて,前記縦ブレイク溝A1に跨がるように形成する一方,前記素材基板Aにおける裏面のうち前記各絶縁基板1の箇所に,左右一対の下面電極を形成する。   Next, as shown in FIGS. 4 and 5, a pair of left and right upper electrodes 2 are applied to the insulating substrate 1 in the surface of the material substrate A by screen printing of material paste and subsequent firing. While forming so as to straddle the vertical break groove A1, a pair of left and right bottom electrodes are formed on the insulating substrate 1 in the back surface of the material substrate A.

この各上面電極2の形成に際しては,当該各上面電極2のうち前記縦ブレイク溝A1に重なる部分に抜き孔2aを設ける。   In forming each upper surface electrode 2, a hole 2 a is provided in a portion of each upper surface electrode 2 that overlaps with the vertical break groove A <b> 1.

次いで,図6及び図7に示すように,前記素材基板Aにおける表面のうち前記各絶縁基板1の箇所に,抵抗膜3を,材料ペーストのスクリーン印刷とその後における焼成にて,その両端が前記上面電極2に接続するように形成する。   Next, as shown in FIG. 6 and FIG. 7, the resistance film 3 is applied to the portion of each insulating substrate 1 on the surface of the material substrate A by screen printing of material paste and subsequent firing, and both ends thereof are It is formed so as to be connected to the upper surface electrode 2.

この場合において,前記上面電極2及び下面電極を形成する工程と,前記抵抗膜3を形成する工程と入れ換えて,先に抵抗膜3を形成し,次いで,前記上面電極2及び下面電極を形成するようにしても良い。   In this case, the step of forming the upper surface electrode 2 and the lower surface electrode and the step of forming the resistance film 3 are interchanged to form the resistance film 3 first, and then the upper surface electrode 2 and the lower surface electrode are formed. You may do it.

次いで,図8及び図9に示すように,前記素材基板Aにおける表面のうち前記各絶縁基板1の箇所に,抵抗膜3を被覆するガラスによるアンダーコート4を,材料ペーストのスクリーン印刷とその後における焼成にて形成する。   Next, as shown in FIG. 8 and FIG. 9, an undercoat 4 made of glass for covering the resistance film 3 is applied to a portion of each surface of the insulating substrate 1 in the surface of the material substrate A by screen printing of a material paste and thereafter It is formed by firing.

次いで,前記各絶縁基板1における抵抗膜3に対して,その両端における両上面電極2の各々に通電用プローブを接触した状態で当該抵抗膜3における抵抗値を測定しながら,その抵抗値が所定値になるようにトリミング溝3aを刻設するというトリミング調整を行う。   Next, the resistance value of the resistance film 3 in each insulating substrate 1 is measured while the resistance value in the resistance film 3 is measured in a state where the upper surface electrodes 2 at both ends thereof are in contact with the upper surface electrodes 2. Trimming adjustment is performed in which the trimming groove 3a is formed so as to have a value.

このトリミング調整に際しては,図10に示すように,前記各上面電極2のうちこれに設けた抜き孔2aよりも幅方向の左右両外側の部分2bの各々に対して通電用プローブBを接触する。   In the trimming adjustment, as shown in FIG. 10, the energizing probe B is brought into contact with each of the left and right outer portions 2b of the upper surface electrode 2 in the width direction with respect to the hole 2a provided in the upper surface electrode 2. .

つまり,前記各上面電極2のうち前記抜き孔2aより幅方向の左右両外側の部分2bにおいては,上面電極2が前記縦ブレイク溝A1を跨がるように存在していて,この二つの部分2bに対して幅方向に並べて成る二本の通電用プローブBを同時に接触することが可能であり,しかも,前記二つの部分2bによって,二本の通電用プローブBを同時に接触することができるエリアを,抵抗膜3に十分な長さ寸法を確保した状態のもとで,大幅に増大できる。   That is, the upper surface electrode 2 exists so as to straddle the vertical break groove A1 in the left and right outer portions 2b of the upper surface electrode 2 in the width direction from the punch hole 2a. It is possible to simultaneously contact two energization probes B arranged in the width direction with respect to 2b, and to allow two energization probes B to be simultaneously contacted by the two portions 2b. Can be significantly increased under the condition that the resistance film 3 has a sufficient length dimension.

次いで,図11及び図12に示すように,前記素材基板Aにおける表面のうち前記各絶縁基板1の箇所に,抵抗膜3を被覆するカバーコート5を,材料ペーストのスクリーン印刷とその後における焼成(カバーコートがガラスの場合)又は乾燥(カバーコートが耐熱性合成樹脂の場合)にて形成する。   Next, as shown in FIGS. 11 and 12, a cover coat 5 for covering the resistive film 3 is applied to the portion of each insulating substrate 1 on the surface of the material substrate A by screen printing of material paste and subsequent firing ( The cover coat is made of glass) or dried (when the cover coat is a heat-resistant synthetic resin).

次いで,図13に示すように,前記素材基板Aを,前記縦ブレイク溝A1に沿って棒状の素材基板A′にブレイクする。   Next, as shown in FIG. 13, the material substrate A is broken into a rod-shaped material substrate A ′ along the vertical break groove A1.

前記縦ブレイク溝A1に沿ってのブレイクに際して,この縦ブレイク溝A1に跨がっている上面電極2には,抜き孔2aが形成されていることにより,前記上面電極2が前記縦ブレイク溝A1に沿ってのブレイクを困難にすることを,前記抜き孔2aの存在によって確実に低減でき,換言すると,前記縦ブレイク溝A1に沿って容易にブレイクすることができる。   When breaking along the vertical break groove A1, the upper surface electrode 2 straddling the vertical break groove A1 is formed with a punch hole 2a, so that the upper surface electrode 2 is formed into the vertical break groove A1. Can be reliably reduced by the presence of the hole 2a, in other words, the break can be easily made along the vertical break groove A1.

次いで,図14に示すように,前記棒状の素材基板A′における左右両側面a′,a″に,各絶縁基板1のおける左右両端面1aに対する側面電極6を,材料ペーストの塗布とその後における焼成(材料ペーストが金属系導電性ペーストの場合)又は乾燥(材料ペーストが非金属系導電性ペーストの場合)にて,前記上面電極2及び下面電極に接続するように形成する。   Next, as shown in FIG. 14, the side electrodes 6 for the left and right end surfaces 1a of each insulating substrate 1 are applied to the left and right side surfaces a ′, a ″ of the rod-shaped material substrate A ′. By baking (when the material paste is a metal-based conductive paste) or drying (when the material paste is a non-metallic conductive paste), it is formed so as to be connected to the upper surface electrode 2 and the lower surface electrode.

次いで,図15に示すように,前記棒状の素材基板A′を,横ブレイク溝A2に沿って各絶縁基板1ごとにブレイクしたのち,バレルメッキなどのメッキ処理を行うことにより,前記上面電極1,下面電極及び側面電極6の表面に半田メッキ層を形成してチップ抵抗器の完成品を得る。   Next, as shown in FIG. 15, the bar-shaped material substrate A ′ is broken for each insulating substrate 1 along the horizontal break groove A 2, and then subjected to a plating process such as barrel plating, whereby the upper surface electrode 1. , A solder plating layer is formed on the surface of the lower electrode and the side electrode 6 to obtain a finished chip resistor.

また,本発明における別の実施の形態では,前記各上面電極2における左右両側面のうち前記縦ブレイク溝A1に重なる部分に,図10に二点鎖線で示すように,凹所2cを形成するようにして良いのであり,このように構成することにより,縦ブレイク溝a1に沿ってブレイクすることの容易性をより向上できる。   Further, in another embodiment of the present invention, a recess 2c is formed in the left and right side surfaces of each upper surface electrode 2 in a portion overlapping with the vertical break groove A1, as shown by a two-dot chain line in FIG. In this way, the ease of breaking along the vertical break groove a1 can be further improved.

第1の製造工程を示す斜視図である。It is a perspective view which shows a 1st manufacturing process. 図1のII−II視拡大断面図である。FIG. 2 is an enlarged sectional view taken along line II-II in FIG. 1. 図1のIII −III 視拡大断面図である。FIG. 3 is an enlarged sectional view taken along line III-III in FIG. 1. 第2の製造工程を示す斜視図である。It is a perspective view which shows a 2nd manufacturing process. 図4のV−V視拡大断面図である。FIG. 5 is an enlarged sectional view taken along line VV in FIG. 4. 第3の製造工程を示す斜視図である。It is a perspective view which shows a 3rd manufacturing process. 図6のVII −VII 視拡大断面図である。FIG. 7 is an enlarged sectional view taken along the line VII-VII in FIG. 6. 第4の製造工程を示す斜視図である。It is a perspective view which shows a 4th manufacturing process. 図8のIX−IX視拡大断面図である。FIG. 9 is an enlarged sectional view taken along the line IX-IX in FIG. 8. トリミング調整している状態を示す拡大斜視図である。It is an expansion perspective view which shows the state which is adjusting trimming. 第5の製造工程を示す斜視図である。It is a perspective view which shows a 5th manufacturing process. 図11のXII −XII 視拡大断面図である。FIG. 12 is an enlarged sectional view taken along line XII-XII in FIG. 11. 第6の製造工程を示す斜視図である。It is a perspective view which shows a 6th manufacturing process. 図13のXIV −XIV 視拡大断面図である。FIG. 14 is an enlarged sectional view taken along line XIV-XIV in FIG. 13. 第7の製造工程を示す斜視図である。It is a perspective view which shows a 7th manufacturing process.

符号の説明Explanation of symbols

1 絶縁基板
2 上面電極
2a 抜き孔
3 抵抗膜
3a トリミング溝
4 アンダーコート
5 カバーコート
6 側面電極
A 素材基板
A1 縦ブレイク溝
A2 横ブレイク溝
A′ 棒状素材基板
B 通電用プローブ
DESCRIPTION OF SYMBOLS 1 Insulation board | substrate 2 Upper surface electrode 2a Punching hole 3 Resistive film 3a Trimming groove 4 Undercoat 5 Cover coat 6 Side electrode A Material board A1 Vertical break groove A2 Horizontal break groove A 'Rod-shaped material board B Current probe

Claims (2)

一つのチップ抵抗器を構成する絶縁基板の複数個を縦及び横方向に並べて一体化し,且つ,表面に前記各絶縁基板ごとにブレイクするための縦ブレイク溝及び横ブレイク溝を刻設して成る素材基板を用意する工程と,
次いで,前記素材基板における表面のうち前記各絶縁基板の箇所に,左右一対の上面電極を前記縦ブレイク溝に跨がるように形成するとともに抵抗膜を前記両上面電極に接続するように形成する工程と,
次いで,前記抵抗膜の両端における両上面電極に通電用プローブを接触した状態で前記抵抗膜における抵抗値を測定しながら,その抵抗値が所定値になるようにトリミング調節する工程と,
次いで,前記素材基板を,前記縦ブレイク溝に沿ってブレイクしたのち,各絶縁基板の左右両端面に側面電極を形成する工程と,
次いで,前記横ブレイク溝に沿って各絶縁基板ごとにブレイクする工程とを備えて成るチップ抵抗器の製造方法において,
前記上面電極を形成する工程が,当該上面電極のうち前記縦ブレイク溝に重なる部分に抜き孔を形成する工程であることを特徴とするチップ抵抗器の製造方法。
A plurality of insulating substrates constituting one chip resistor are integrated in a vertical and horizontal direction, and a vertical break groove and a horizontal break groove are formed on the surface for breaking each insulating substrate. Preparing a material substrate;
Next, a pair of left and right upper surface electrodes are formed on the insulating substrate in the surface of the material substrate so as to straddle the vertical break grooves, and a resistance film is formed so as to connect to both upper surface electrodes. Process,
Next, adjusting the trimming so that the resistance value becomes a predetermined value while measuring the resistance value in the resistance film in a state where the energization probes are in contact with both upper surface electrodes at both ends of the resistance film;
Next, after the material substrate is broken along the vertical break grooves, side electrodes are formed on both left and right end surfaces of each insulating substrate;
Next, in the method of manufacturing a chip resistor, comprising a step of breaking each insulating substrate along the lateral break groove,
The method of manufacturing a chip resistor, wherein the step of forming the upper surface electrode is a step of forming a punch hole in a portion of the upper surface electrode that overlaps the vertical break groove.
前記請求項1の記載において,前記上面電極を形成する工程が,当該上面電極のうち前記縦ブレイク溝に重なる部分に抜き孔を形成すると同時に,当該上面電極における左右両側面のうち前記縦ブレイク溝に重なる部分に凹所を形成する工程であることを特徴とするチップ抵抗器の製造方法。   2. The method according to claim 1, wherein the step of forming the upper surface electrode forms a hole in a portion of the upper surface electrode that overlaps the vertical break groove, and at the same time, the vertical break groove of the left and right side surfaces of the upper surface electrode. A method of manufacturing a chip resistor, which is a step of forming a recess in a portion overlapping with the chip resistor.
JP2005259498A 2005-09-07 2005-09-07 Manufacturing method of chip resistor Expired - Fee Related JP4875327B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014045104A (en) * 2012-08-28 2014-03-13 Panasonic Corp Manufacturing method of chip resistor
JP2017034289A (en) * 2016-11-15 2017-02-09 パナソニックIpマネジメント株式会社 Method of manufacturing chip resistor

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JPS60116203A (en) * 1983-11-28 1985-06-22 Fujitsu Ltd Microwave integrated circuit
JPH0636901A (en) * 1992-07-15 1994-02-10 Koa Corp Measuring resistor and manufacturing method thereof
JPH06275402A (en) * 1993-03-24 1994-09-30 Rohm Co Ltd Chip resistor, and method and circuit for detection of current
JPH08339912A (en) * 1995-04-13 1996-12-24 Rohm Co Ltd Electronic-component forming substrate and electronic component using substrate thereof
JPH11283802A (en) * 1998-03-30 1999-10-15 Kyocera Corp Chip resistor
JP2001326111A (en) * 2000-05-15 2001-11-22 Rohm Co Ltd Chip resistor

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Publication number Priority date Publication date Assignee Title
JPS5975607A (en) * 1982-10-22 1984-04-28 ロ−ム株式会社 Method of producing chip resistor
JPS60116203A (en) * 1983-11-28 1985-06-22 Fujitsu Ltd Microwave integrated circuit
JPH0636901A (en) * 1992-07-15 1994-02-10 Koa Corp Measuring resistor and manufacturing method thereof
JPH06275402A (en) * 1993-03-24 1994-09-30 Rohm Co Ltd Chip resistor, and method and circuit for detection of current
JPH08339912A (en) * 1995-04-13 1996-12-24 Rohm Co Ltd Electronic-component forming substrate and electronic component using substrate thereof
JPH11283802A (en) * 1998-03-30 1999-10-15 Kyocera Corp Chip resistor
JP2001326111A (en) * 2000-05-15 2001-11-22 Rohm Co Ltd Chip resistor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014045104A (en) * 2012-08-28 2014-03-13 Panasonic Corp Manufacturing method of chip resistor
JP2017034289A (en) * 2016-11-15 2017-02-09 パナソニックIpマネジメント株式会社 Method of manufacturing chip resistor

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