JP2007067218A5 - - Google Patents

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Publication number
JP2007067218A5
JP2007067218A5 JP2005252220A JP2005252220A JP2007067218A5 JP 2007067218 A5 JP2007067218 A5 JP 2007067218A5 JP 2005252220 A JP2005252220 A JP 2005252220A JP 2005252220 A JP2005252220 A JP 2005252220A JP 2007067218 A5 JP2007067218 A5 JP 2007067218A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2005252220A
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Japanese (ja)
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JP2007067218A (en
JP4642608B2 (en
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Publication date
Application filed filed Critical
Priority to JP2005252220A priority Critical patent/JP4642608B2/en
Priority claimed from JP2005252220A external-priority patent/JP4642608B2/en
Priority to TW095132060A priority patent/TWI400753B/en
Priority to CNB200610126445XA priority patent/CN100500941C/en
Priority to KR1020060083863A priority patent/KR100853573B1/en
Publication of JP2007067218A publication Critical patent/JP2007067218A/en
Publication of JP2007067218A5 publication Critical patent/JP2007067218A5/ja
Application granted granted Critical
Publication of JP4642608B2 publication Critical patent/JP4642608B2/en
Active legal-status Critical Current
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JP2005252220A 2005-08-31 2005-08-31 Substrate processing apparatus and substrate processing system Active JP4642608B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005252220A JP4642608B2 (en) 2005-08-31 2005-08-31 Substrate processing apparatus and substrate processing system
TW095132060A TWI400753B (en) 2005-08-31 2006-08-30 A substrate processing apparatus and a substrate processing system
CNB200610126445XA CN100500941C (en) 2005-08-31 2006-08-31 Substrate processing device and substrate processing system
KR1020060083863A KR100853573B1 (en) 2005-08-31 2006-08-31 Substrate processing apparatus and substrate processing system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005252220A JP4642608B2 (en) 2005-08-31 2005-08-31 Substrate processing apparatus and substrate processing system

Publications (3)

Publication Number Publication Date
JP2007067218A JP2007067218A (en) 2007-03-15
JP2007067218A5 true JP2007067218A5 (en) 2008-10-02
JP4642608B2 JP4642608B2 (en) 2011-03-02

Family

ID=37817364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005252220A Active JP4642608B2 (en) 2005-08-31 2005-08-31 Substrate processing apparatus and substrate processing system

Country Status (4)

Country Link
JP (1) JP4642608B2 (en)
KR (1) KR100853573B1 (en)
CN (1) CN100500941C (en)
TW (1) TWI400753B (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101165869B (en) * 2007-08-29 2010-11-03 常州亿晶光电科技有限公司 Silicon loading-unloading device
KR100925172B1 (en) * 2007-12-24 2009-11-05 주식회사 에이디피엔지니어링 Apparatus and method for opening and closing lid
KR101007711B1 (en) * 2008-05-19 2011-01-13 주식회사 에스에프에이 Plasma processing apparatus
WO2010082467A1 (en) * 2009-01-14 2010-07-22 株式会社アルバック Plasma cvd apparatus
CN101673810B (en) * 2009-09-03 2011-06-22 东莞宏威数码机械有限公司 Opening and closing mechanism of cavity cover
JP4917660B2 (en) * 2009-10-05 2012-04-18 株式会社日立国際電気 Substrate processing apparatus, substrate processing apparatus control method, semiconductor device manufacturing method, apparatus state transition method, substrate processing apparatus maintenance method, and state transition program
JP5560909B2 (en) * 2010-05-31 2014-07-30 東京エレクトロン株式会社 Lid holding jig
JP5585238B2 (en) * 2010-06-24 2014-09-10 東京エレクトロン株式会社 Substrate processing equipment
JP5575558B2 (en) * 2010-06-30 2014-08-20 東京エレクトロン株式会社 Processing equipment
JP5595202B2 (en) * 2010-09-28 2014-09-24 東京エレクトロン株式会社 Processing apparatus and maintenance method thereof
KR101171758B1 (en) 2010-09-29 2012-08-07 스미도모쥬기가이고교 가부시키가이샤 Chamber line
CN102590924B (en) * 2011-01-07 2014-08-20 志圣工业股份有限公司 Light guide plate manufacturing method, light guide plate and cover plate
CN103911598A (en) * 2012-12-31 2014-07-09 光达光电设备科技(嘉兴)有限公司 Metal organic chemical vapor deposition equipment
DE102014104011A1 (en) 2014-03-24 2015-09-24 Aixtron Se Device for separating nanotubes
JP5941943B2 (en) * 2014-05-08 2016-06-29 ワイエイシイ株式会社 Lid opening / closing device and multi-chamber processing system
CN105441876B (en) * 2014-09-02 2019-04-23 北京北方华创微电子装备有限公司 A kind of film deposition equipment
KR101685406B1 (en) * 2015-10-19 2016-12-13 주식회사 티이에스 Apparatus including lid opener
KR101910367B1 (en) * 2018-04-27 2018-10-23 김중민 Auto-lid capable of horizontal control of an cover and method for opening and closing the cover by using the same
CN108914090B (en) * 2018-09-14 2024-01-02 江苏润阳悦达光伏科技有限公司 Semi-automatic graphite boat stuck point replacing machine
CN110289235B (en) * 2019-07-09 2021-07-09 北京北方华创微电子装备有限公司 Cover opening device and semiconductor processing equipment

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05335406A (en) * 1992-06-03 1993-12-17 Fujitsu Ltd Substrate housing equipment
JPH0745684A (en) * 1993-07-27 1995-02-14 Kokusai Electric Co Ltd Treatment chamber of semiconductor manufacturing device
JP3122617B2 (en) * 1996-07-19 2001-01-09 東京エレクトロン株式会社 Plasma processing equipment
JPH10303277A (en) 1997-04-28 1998-11-13 Toshiba Corp Door opening/closing device
JPH11140648A (en) * 1997-11-07 1999-05-25 Tokyo Electron Ltd Process chamber device and treating device
JP3205312B2 (en) * 1999-03-17 2001-09-04 株式会社日立製作所 Plasma processing apparatus and maintenance method for plasma processing apparatus
JP3527450B2 (en) * 1999-12-22 2004-05-17 東京エレクトロン株式会社 Processing equipment
JP4896337B2 (en) * 2000-05-17 2012-03-14 東京エレクトロン株式会社 PROCESSING DEVICE AND ITS MAINTENANCE METHOD, PROCESSING DEVICE PARTS ASSEMBLY MECHANISM AND ITS ASSEMBLY METHOD, LOCK MECHANISM AND LOCK METHOD THEREOF
JP2001298016A (en) 2001-02-20 2001-10-26 Matsushita Electric Ind Co Ltd Plasma cleaning device
JP3397203B2 (en) * 2001-03-28 2003-04-14 松下電器産業株式会社 Plasma cleaning equipment
JP4199062B2 (en) * 2003-07-07 2008-12-17 株式会社神戸製鋼所 Vacuum deposition equipment
KR100552804B1 (en) * 2003-08-29 2006-02-22 동부아남반도체 주식회사 Apparatus and method for preventing falling of wafer
KR100544490B1 (en) * 2003-11-11 2006-01-23 주식회사 디엠에스 Appararus for treatment works under vacuum
KR100515955B1 (en) * 2003-11-18 2005-09-23 주식회사 에이디피엔지니어링 Processing chamber of FPD manufacturing machine having a device for opening the cover

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