JP2007067218A5 - - Google Patents
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- JP2007067218A5 JP2007067218A5 JP2005252220A JP2005252220A JP2007067218A5 JP 2007067218 A5 JP2007067218 A5 JP 2007067218A5 JP 2005252220 A JP2005252220 A JP 2005252220A JP 2005252220 A JP2005252220 A JP 2005252220A JP 2007067218 A5 JP2007067218 A5 JP 2007067218A5
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005252220A JP4642608B2 (en) | 2005-08-31 | 2005-08-31 | Substrate processing apparatus and substrate processing system |
TW095132060A TWI400753B (en) | 2005-08-31 | 2006-08-30 | A substrate processing apparatus and a substrate processing system |
CNB200610126445XA CN100500941C (en) | 2005-08-31 | 2006-08-31 | Substrate processing device and substrate processing system |
KR1020060083863A KR100853573B1 (en) | 2005-08-31 | 2006-08-31 | Substrate processing apparatus and substrate processing system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005252220A JP4642608B2 (en) | 2005-08-31 | 2005-08-31 | Substrate processing apparatus and substrate processing system |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007067218A JP2007067218A (en) | 2007-03-15 |
JP2007067218A5 true JP2007067218A5 (en) | 2008-10-02 |
JP4642608B2 JP4642608B2 (en) | 2011-03-02 |
Family
ID=37817364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005252220A Active JP4642608B2 (en) | 2005-08-31 | 2005-08-31 | Substrate processing apparatus and substrate processing system |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4642608B2 (en) |
KR (1) | KR100853573B1 (en) |
CN (1) | CN100500941C (en) |
TW (1) | TWI400753B (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101165869B (en) * | 2007-08-29 | 2010-11-03 | 常州亿晶光电科技有限公司 | Silicon loading-unloading device |
KR100925172B1 (en) * | 2007-12-24 | 2009-11-05 | 주식회사 에이디피엔지니어링 | Apparatus and method for opening and closing lid |
KR101007711B1 (en) * | 2008-05-19 | 2011-01-13 | 주식회사 에스에프에이 | Plasma processing apparatus |
WO2010082467A1 (en) * | 2009-01-14 | 2010-07-22 | 株式会社アルバック | Plasma cvd apparatus |
CN101673810B (en) * | 2009-09-03 | 2011-06-22 | 东莞宏威数码机械有限公司 | Opening and closing mechanism of cavity cover |
JP4917660B2 (en) * | 2009-10-05 | 2012-04-18 | 株式会社日立国際電気 | Substrate processing apparatus, substrate processing apparatus control method, semiconductor device manufacturing method, apparatus state transition method, substrate processing apparatus maintenance method, and state transition program |
JP5560909B2 (en) * | 2010-05-31 | 2014-07-30 | 東京エレクトロン株式会社 | Lid holding jig |
JP5585238B2 (en) * | 2010-06-24 | 2014-09-10 | 東京エレクトロン株式会社 | Substrate processing equipment |
JP5575558B2 (en) * | 2010-06-30 | 2014-08-20 | 東京エレクトロン株式会社 | Processing equipment |
JP5595202B2 (en) * | 2010-09-28 | 2014-09-24 | 東京エレクトロン株式会社 | Processing apparatus and maintenance method thereof |
KR101171758B1 (en) | 2010-09-29 | 2012-08-07 | 스미도모쥬기가이고교 가부시키가이샤 | Chamber line |
CN102590924B (en) * | 2011-01-07 | 2014-08-20 | 志圣工业股份有限公司 | Light guide plate manufacturing method, light guide plate and cover plate |
CN103911598A (en) * | 2012-12-31 | 2014-07-09 | 光达光电设备科技(嘉兴)有限公司 | Metal organic chemical vapor deposition equipment |
DE102014104011A1 (en) | 2014-03-24 | 2015-09-24 | Aixtron Se | Device for separating nanotubes |
JP5941943B2 (en) * | 2014-05-08 | 2016-06-29 | ワイエイシイ株式会社 | Lid opening / closing device and multi-chamber processing system |
CN105441876B (en) * | 2014-09-02 | 2019-04-23 | 北京北方华创微电子装备有限公司 | A kind of film deposition equipment |
KR101685406B1 (en) * | 2015-10-19 | 2016-12-13 | 주식회사 티이에스 | Apparatus including lid opener |
KR101910367B1 (en) * | 2018-04-27 | 2018-10-23 | 김중민 | Auto-lid capable of horizontal control of an cover and method for opening and closing the cover by using the same |
CN108914090B (en) * | 2018-09-14 | 2024-01-02 | 江苏润阳悦达光伏科技有限公司 | Semi-automatic graphite boat stuck point replacing machine |
CN110289235B (en) * | 2019-07-09 | 2021-07-09 | 北京北方华创微电子装备有限公司 | Cover opening device and semiconductor processing equipment |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05335406A (en) * | 1992-06-03 | 1993-12-17 | Fujitsu Ltd | Substrate housing equipment |
JPH0745684A (en) * | 1993-07-27 | 1995-02-14 | Kokusai Electric Co Ltd | Treatment chamber of semiconductor manufacturing device |
JP3122617B2 (en) * | 1996-07-19 | 2001-01-09 | 東京エレクトロン株式会社 | Plasma processing equipment |
JPH10303277A (en) | 1997-04-28 | 1998-11-13 | Toshiba Corp | Door opening/closing device |
JPH11140648A (en) * | 1997-11-07 | 1999-05-25 | Tokyo Electron Ltd | Process chamber device and treating device |
JP3205312B2 (en) * | 1999-03-17 | 2001-09-04 | 株式会社日立製作所 | Plasma processing apparatus and maintenance method for plasma processing apparatus |
JP3527450B2 (en) * | 1999-12-22 | 2004-05-17 | 東京エレクトロン株式会社 | Processing equipment |
JP4896337B2 (en) * | 2000-05-17 | 2012-03-14 | 東京エレクトロン株式会社 | PROCESSING DEVICE AND ITS MAINTENANCE METHOD, PROCESSING DEVICE PARTS ASSEMBLY MECHANISM AND ITS ASSEMBLY METHOD, LOCK MECHANISM AND LOCK METHOD THEREOF |
JP2001298016A (en) | 2001-02-20 | 2001-10-26 | Matsushita Electric Ind Co Ltd | Plasma cleaning device |
JP3397203B2 (en) * | 2001-03-28 | 2003-04-14 | 松下電器産業株式会社 | Plasma cleaning equipment |
JP4199062B2 (en) * | 2003-07-07 | 2008-12-17 | 株式会社神戸製鋼所 | Vacuum deposition equipment |
KR100552804B1 (en) * | 2003-08-29 | 2006-02-22 | 동부아남반도체 주식회사 | Apparatus and method for preventing falling of wafer |
KR100544490B1 (en) * | 2003-11-11 | 2006-01-23 | 주식회사 디엠에스 | Appararus for treatment works under vacuum |
KR100515955B1 (en) * | 2003-11-18 | 2005-09-23 | 주식회사 에이디피엔지니어링 | Processing chamber of FPD manufacturing machine having a device for opening the cover |
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2005
- 2005-08-31 JP JP2005252220A patent/JP4642608B2/en active Active
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2006
- 2006-08-30 TW TW095132060A patent/TWI400753B/en active
- 2006-08-31 KR KR1020060083863A patent/KR100853573B1/en active IP Right Grant
- 2006-08-31 CN CNB200610126445XA patent/CN100500941C/en active Active