JP2007059354A - Connecting device - Google Patents

Connecting device Download PDF

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Publication number
JP2007059354A
JP2007059354A JP2005246794A JP2005246794A JP2007059354A JP 2007059354 A JP2007059354 A JP 2007059354A JP 2005246794 A JP2005246794 A JP 2005246794A JP 2005246794 A JP2005246794 A JP 2005246794A JP 2007059354 A JP2007059354 A JP 2007059354A
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contact pressure
connector
pressure applying
contact
base substrate
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JP2005246794A
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JP4779504B2 (en
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Takeshi Yoshida
岳司 吉田
Yoshiharu Sanagawa
佳治 佐名川
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Panasonic Electric Works Co Ltd
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Matsushita Electric Works Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a connecting device which has a high reliability of wiring from one surface side to the other surface side of a base substrate and is capable of space-saving. <P>SOLUTION: A connector A, which is a connecting device, has a recess 11a formed at each portion corresponding to each connecting terminal 23 of a mating connector B on one surface side of the base substrate 11; and in each recess 11a, a contact part 13 with the connecting terminal 23 and a contact pressure applying part 12 which elastically deforms at the time of connection of the connector terminal 23 and the contact part 13 and gives contact pressure to the connecting terminal 23 and the contact part 13 are arranged. The contact pressure applying part 12 is formed of a material having elasticity and conductivity and also serves as a contact part 13. The base substrate 11 has a penetrating wiring 16, which constitutes a wiring from one surface side to the other surface side of the base substrate 11 together with the contact pressure applying part 12, formed respectively at each portion between the inner bottom face of each recess 11a and the other surface. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、接続装置に関するものである。   The present invention relates to a connection device.

携帯機器などの小型化、薄型化、高性能化に伴って、携帯機器の器体内で2つの回路基板間(例えば、フレキシブル基板とプリント基板との間)を電気的に接続する接続装置としてのコネクタに対して、小型化、薄型化、相手側部材である相手側コネクタの複数の接続端子を各別に接続するコンタクトの数の増大、コンタクトの配列ピッチの狭ピッチ化などが望まれており、コンタクトの配列ピッチを0.5mmとしたコネクタが提供されている。なお、この種のコネクタでは、コンタクトの狭ピッチ化に伴い、配列ピッチの高精度化だけでなく、隣り合うコンタクト間の間隔の高精度化も必要となっている。   As a portable device is miniaturized, thinned, and enhanced in performance, as a connection device for electrically connecting two circuit boards (for example, between a flexible board and a printed board) in the body of the portable device. For connectors, there is a demand for downsizing, thinning, increasing the number of contacts that connect multiple connection terminals of the mating connector, which is the mating member, and narrowing the arrangement pitch of the contacts. A connector having a contact arrangement pitch of 0.5 mm is provided. In this type of connector, along with the narrowing of contacts, it is necessary not only to increase the accuracy of the arrangement pitch but also to increase the accuracy of the spacing between adjacent contacts.

また、近年、BGA(Ball Grid Array)やCSP(Chip Size Package)などの相手側部材において2次元アレイ状に配列された球状の接続端子それぞれと各別に接続される複数のコンタクト部を有する接続装置として、図13に示すように、複数のスパイラル状のコンタクト部102をガラスエポキシ製の絶縁基板からなるベース基板101の一表面側において2次元アレイ状に配列した構成のものが提案されている(例えば、特許文献1参照)。ここにおいて、コンタクト部102は、銅およびニッケルにより形成されている。また、ベース基板101には、当該ベース基板101の厚み方向へのコンタクト部102の変位を可能とするための貫通孔101bが貫設されている。なお、上記特許文献1では、相手側部材の接続端子の配列ピッチを0.4mmとした場合に、ベース基板101の厚みを1mm程度、貫通孔101bの内径を0.3mm程度とすることが記載されている。   Further, in recent years, a connection device having a plurality of contact portions respectively connected to spherical connection terminals arranged in a two-dimensional array on a counterpart member such as BGA (Ball Grid Array) or CSP (Chip Size Package). As shown in FIG. 13, a configuration is proposed in which a plurality of spiral contact portions 102 are arranged in a two-dimensional array on one surface side of a base substrate 101 made of a glass epoxy insulating substrate ( For example, see Patent Document 1). Here, the contact portion 102 is made of copper and nickel. Further, the base substrate 101 is provided with a through-hole 101 b that allows the contact portion 102 to be displaced in the thickness direction of the base substrate 101. In Patent Document 1, it is described that when the arrangement pitch of the connection terminals of the mating member is 0.4 mm, the thickness of the base substrate 101 is about 1 mm and the inner diameter of the through hole 101b is about 0.3 mm. Has been.

ところで、上記特許文献1に開示された接続装置では、ベース基板101の上記一表面側のコンタクト部102とベース基板101の他表面側に設けられた外部接続電極107とが貫通孔101bの内面に形成された配線106を介して電気的に接続されている。ここにおいて、配線106は、スパッタ法などによって貫通孔101bの内面にシード層を形成してから、銅メッキを行うことで形成しているものと考えられる。   Incidentally, in the connection device disclosed in Patent Document 1, the contact portion 102 on the one surface side of the base substrate 101 and the external connection electrode 107 provided on the other surface side of the base substrate 101 are formed on the inner surface of the through hole 101b. They are electrically connected through the formed wiring 106. Here, it is considered that the wiring 106 is formed by forming a seed layer on the inner surface of the through hole 101b by sputtering or the like and then performing copper plating.

なお、上記特許文献1には、貫通孔101bの内側に弾性体を充填することも記載されている。
特開2002−175859号公報
Note that Patent Document 1 also describes that an elastic body is filled inside the through hole 101b.
JP 2002-175859 A

上記特許文献1に開示された接続装置では、ベース基板101の厚み方向に貫設された貫通孔101bの内面に均一な厚みのシード層を形成するのは難しく、銅メッキによってシード層から析出させる金属部の厚みも均一にならないので、配線106が断線してしまう恐れがあり、信頼性に問題があった。そこで、ベース基板101の上記一表面側から上記他表面側への配線として、貫通孔101bの形成部位から離間した適宜位置にベース基板101の厚み方向に貫通する貫通配線を形成することも考えられるが、ベース基板101において貫通孔101bの形成部位の側方に貫通配線を形成するためのスペースを必要とし、コンタクト部102の狭ピッチ化が難しくなってしまう。   In the connection device disclosed in Patent Document 1, it is difficult to form a seed layer having a uniform thickness on the inner surface of the through hole 101b provided in the thickness direction of the base substrate 101, and the seed layer is deposited from the seed layer by copper plating. Since the thickness of the metal part is not uniform, the wiring 106 may be disconnected, and there is a problem in reliability. Therefore, it is also conceivable to form a through wiring penetrating in the thickness direction of the base substrate 101 at an appropriate position separated from the formation site of the through hole 101b as the wiring from the one surface side of the base substrate 101 to the other surface side. However, in the base substrate 101, a space for forming the through wiring is required on the side of the formation portion of the through hole 101b, and it becomes difficult to reduce the pitch of the contact portions 102.

本発明は上記事由に鑑みて為されたものであり、その目的は、ベース基板の一表面側から他表面側への配線の信頼性が高く且つ省スペース化が可能な接続装置を提供することにある。   The present invention has been made in view of the above reasons, and an object of the present invention is to provide a connection device that is highly reliable in wiring from one surface side to the other surface side of a base substrate and can save space. It is in.

請求項1の発明は、ベース基板と、ベース基板の一表面側において相手側部材の接続端子に対応する部位に配設され接続端子が接触するコンタクト部と、接続端子とコンタクト部との接続時に弾性変形して接続端子とコンタクト部との接圧を付与する接圧付与部とを備え、接圧付与部は、弾性および導電性を有する材料により形成され、ベース基板の一表面側から他表面側への配線の一部を構成していることを特徴とする。   According to the first aspect of the present invention, the base substrate, the contact portion disposed on the surface of the base substrate corresponding to the connection terminal of the mating member, the contact portion contacting the connection terminal, and the connection terminal and the contact portion are connected. A contact pressure applying portion that elastically deforms to apply a contact pressure between the connection terminal and the contact portion, and the contact pressure applying portion is formed of a material having elasticity and conductivity, and from one surface side of the base substrate to the other surface A part of the wiring to the side is configured.

この発明によれば、接続端子とコンタクト部との接続時に弾性変形して接続端子とコンタクト部との接圧を付与する接圧付与部を備え、接圧付与部が、弾性および導電性を有する材料により形成され、ベース基板の一表面側から他表面側への配線の一部を構成しているので、従来のようにスパイラル状のコンタクト部の変位を可能とするための貫通孔の内面に配線を形成する場合に比べて配線の信頼性を高めることが可能となり、しかも、ベース基板の一表面側から他表面側への配線を接圧付与部と別途に形成する場合のように配線を引きまわす必要がなく省スペース化が可能になる。   According to this invention, it is provided with the contact pressure imparting portion that elastically deforms when the connection terminal and the contact portion are connected to impart contact pressure between the connection terminal and the contact portion, and the contact pressure imparting portion has elasticity and conductivity. Since it is made of material and forms part of the wiring from one surface side to the other surface side of the base substrate, the inner surface of the through hole for enabling displacement of the spiral contact portion as in the prior art It is possible to increase the reliability of the wiring compared to the case of forming the wiring, and the wiring is formed as if the wiring from one surface side of the base substrate to the other surface side is formed separately from the contact pressure applying portion. Space-saving is possible without having to pull it around.

請求項2の発明は、請求項1の発明において、前記ベース基板は、前記接続端子に対応する部位に凹所が形成されるとともに当該凹所内に前記接圧付与部が配置され、前記凹所の内底面と前記他表面との間の部位に前記接圧付与部とともに前記配線を構成する貫通配線が形成されてなることを特徴とする。   According to a second aspect of the present invention, in the first aspect of the invention, the base substrate has a recess formed in a portion corresponding to the connection terminal, and the contact pressure applying portion is disposed in the recess. A through-wiring that constitutes the wiring together with the contact pressure applying portion is formed in a portion between the inner bottom surface of the substrate and the other surface.

この発明によれば、前記接圧付与部と貫通配線とで前記配線が構成され、前記接圧付与部は凹所内に配置すればよいから、凹所の深さ寸法を適宜設定することで所望の接圧を確保することが可能となる。   According to the present invention, the wiring is constituted by the contact pressure applying portion and the through wiring, and the contact pressure applying portion may be disposed in the recess. Therefore, it is desirable to appropriately set the depth dimension of the recess. It is possible to ensure the contact pressure of.

請求項3の発明は、請求項2の発明において、少なくとも前記凹所の内底面と前記接圧付与部との間に介在する金属層を備えてなることを特徴とする。   The invention of claim 3 is characterized in that, in the invention of claim 2, a metal layer interposed at least between the inner bottom surface of the recess and the contact pressure applying portion is provided.

この発明によれば、前記接圧付与部が、当該接圧付与部との接触面積が大きい金属層を介して前記貫通配線と接続されるので、前記配線の抵抗を低減することが可能となる。   According to this invention, since the contact pressure applying portion is connected to the through wiring via the metal layer having a large contact area with the contact pressure applying portion, the resistance of the wiring can be reduced. .

請求項4の発明は、請求項1の発明において、前記ベース基板は、前記接続端子に対応する部位に貫通穴が形成されるとともに当該貫通穴内に前記接圧付与部が配置されてなることを特徴とする。   According to a fourth aspect of the present invention, in the first aspect of the invention, the base substrate has a through hole formed in a portion corresponding to the connection terminal, and the contact pressure applying portion is disposed in the through hole. Features.

この発明によれば、請求項2の発明における貫通配線を形成する必要がなく、製造が容易になる。   According to this invention, it is not necessary to form the through wiring in the invention of claim 2, and the manufacture is facilitated.

請求項5の発明は、請求項1ないし請求項4の発明において、前記コンタクト部は、金属材料により形成され前記接圧付与部に重ねて配置されてなることを特徴とする。   According to a fifth aspect of the present invention, in the first to fourth aspects of the invention, the contact portion is formed of a metal material and is disposed so as to overlap the contact pressure applying portion.

この発明によれば、前記接圧付与部が前記コンタクト部を兼ねる場合に比べて、前記相手側部材の接続端子と前記コンタクト部との接触抵抗を低減することが可能となる。   According to this invention, it is possible to reduce the contact resistance between the connection terminal of the mating member and the contact portion as compared with the case where the contact pressure applying portion also serves as the contact portion.

請求項6の発明は、請求項5の発明において、前記コンタクト部は、突起状の形状に形成されてなることを特徴とする。   According to a sixth aspect of the invention, in the fifth aspect of the invention, the contact portion is formed in a protruding shape.

この発明によれば、前記相手側部材の前記接続端子の表面が平坦な場合でも前記接続端子と前記コンタクト部との接触信頼性を確保することができる。   According to this invention, even when the surface of the connection terminal of the counterpart member is flat, contact reliability between the connection terminal and the contact portion can be ensured.

請求項7の発明は、請求項1ないし請求項6の発明において、前記ベース基板は、前記接圧付与部と前記他表面との間に、前記接続端子と前記コンタクト部との接続時に前記接圧付与部の一部を逃がす空間からなる逃げ空間が形成されてなることを特徴とする。   According to a seventh aspect of the present invention, in the first to sixth aspects of the invention, the base substrate is connected between the contact pressure applying portion and the other surface when the connection terminal and the contact portion are connected. It is characterized in that an escape space composed of a space for releasing a part of the pressure applying portion is formed.

この発明によれば、前記接圧付与部が弾性変形しやすくなり、前記接続端子が突起状の形状である場合には前記接続端子の突出高さなどのばらつきや前記接続端子の傾きなどを許容することができる。   According to this invention, the contact pressure applying portion is easily elastically deformed, and when the connection terminal has a protruding shape, variation in the protrusion height of the connection terminal, inclination of the connection terminal, and the like are allowed. can do.

請求項1の発明では、ベース基板の一表面側から他表面側への配線の信頼性が高く且つ省スペース化が可能になるという効果がある。   According to the first aspect of the present invention, the reliability of the wiring from the one surface side to the other surface side of the base substrate is high and the space can be saved.

(実施形態1)
本実施形態では、接続装置として、回路基板間の電気的接続に利用可能なコネクタを例示する。
(Embodiment 1)
In this embodiment, the connector which can be utilized for the electrical connection between circuit boards is illustrated as a connection apparatus.

図1(a),(b)に示した本実施形態のコネクタAは、図2に示すようにプリント基板30に実装され、図3に示すようにフレキシブル基板40に実装された相手側部材たるコネクタ(以下、相手側コネクタと称す)Bと電気的に接続される。   The connector A of the present embodiment shown in FIGS. 1A and 1B is a counterpart member mounted on a printed circuit board 30 as shown in FIG. 2 and mounted on a flexible board 40 as shown in FIG. It is electrically connected to a connector (hereinafter referred to as a mating connector) B.

ここにおいて、相手側コネクタBは、樹脂基板を用いて形成した矩形板状のコネクタボディ21と、コネクタボディ21の一表面上に所定の配列ピッチ(例えば、500μm)でマトリクス状(2次元アレイ状)に配列された複数(例えば、100個)の突起状(ここでは、球状)の接続端子23とを備えており、コネクタボディ21の上記一表面上で各接続端子23それぞれに接続された金属配線24がコネクタボディ21の厚み方向に貫設した貫通配線(図示せず)を介してフレキシブル基板40の導体パターン(図示せず)と電気的に接続可能となっている。   Here, the mating connector B is a rectangular plate-like connector body 21 formed using a resin substrate, and a matrix shape (two-dimensional array shape) at a predetermined arrangement pitch (for example, 500 μm) on one surface of the connector body 21. And a plurality of (for example, 100) projecting (here, spherical) connection terminals 23 arranged in the above-mentioned surface of the connector body 21 and connected to the connection terminals 23 respectively. The wiring 24 can be electrically connected to a conductor pattern (not shown) of the flexible substrate 40 via a through wiring (not shown) penetrating in the thickness direction of the connector body 21.

コネクタAは、半導体基板(例えば、シリコン基板)からなるベース基板11を備え、ベース基板11の一表面側において相手側コネクタBの各接続端子23それぞれに対応する各部位に凹所11aが形成され、各凹所11a内に、接続端子23とのコンタクト部13と、接続端子23とコンタクト部13との接続時に弾性変形して接続端子23とコンタクト部13との接圧を付与する接圧付与部12とが配置されている。要するに、相手側コネクタBの複数の接続端子23とコネクタAの複数のコンタクト部13とは一対一で対応している。   The connector A includes a base substrate 11 made of a semiconductor substrate (for example, a silicon substrate), and a recess 11a is formed in each part corresponding to each connection terminal 23 of the mating connector B on one surface side of the base substrate 11. In each of the recesses 11a, contact pressure is applied so that the contact portion 13 with the connection terminal 23 and the contact pressure between the connection terminal 23 and the contact portion 13 are elastically deformed when the connection terminal 23 and the contact portion 13 are connected. The part 12 is arranged. In short, the plurality of connection terminals 23 of the mating connector B and the plurality of contact portions 13 of the connector A correspond one-to-one.

ここにおいて、本実施形態では、接圧付与部12が、シリコーン系導電性接着剤(例えば銀粉末を含んだシリコーン樹脂)により形成されており、接圧付与部12がコンタクト部13を兼ねている。接圧付与部12の材料は特に限定するものではなく、弾性および導電性を有する材料であればよい。   Here, in this embodiment, the contact pressure applying part 12 is formed of a silicone-based conductive adhesive (for example, a silicone resin containing silver powder), and the contact pressure applying part 12 also serves as the contact part 13. . The material of the contact pressure imparting portion 12 is not particularly limited as long as it is a material having elasticity and conductivity.

また、ベース基板11は、各凹所11aそれぞれの内底面と他表面との間の各部位それぞれに、接圧付与部12とともにベース基板11の上記一表面側から上記他表面側への配線を構成する貫通配線16が形成されている。要するに、本実施形態では、接圧付与部12が、ベース基板11の上記一表面側から上記他表面側への配線の一部を構成している。   In addition, the base substrate 11 has wiring from the one surface side of the base substrate 11 to the other surface side together with the contact pressure applying portion 12 in each part between the inner bottom surface and the other surface of each recess 11a. A through wiring 16 is formed. In short, in the present embodiment, the contact pressure applying portion 12 constitutes a part of the wiring from the one surface side of the base substrate 11 to the other surface side.

ここで、コネクタAは、接圧付与部12が貫通配線16を介してベース部11の上記他表面の外部接続電極17と電気的に接続されており、図1(b)に示すように各外部接続電極17それぞれが半田ボール18を介してプリント基板30の導体パターン33と電気的に接続可能となっている。なお、各接圧付与部12および各貫通配線16および各外部接続電極17は、図示しない絶縁膜(例えば、シリコン酸化膜)を介してベース基板11と電気的に絶縁されている。   Here, in the connector A, the contact pressure applying portion 12 is electrically connected to the external connection electrode 17 on the other surface of the base portion 11 through the through wiring 16, and each of the connectors A as shown in FIG. Each of the external connection electrodes 17 can be electrically connected to the conductor pattern 33 of the printed circuit board 30 via the solder balls 18. Each contact pressure applying portion 12, each through wiring 16, and each external connection electrode 17 are electrically insulated from the base substrate 11 via an insulating film (for example, a silicon oxide film) not shown.

なお、本実施形態のコネクタAでは、ベース基板11としてシリコン基板を用いているので、ベース基板11における各凹所11aは、フォトリソグラフィ技術およびエッチング技術を利用して精度良く形成することができる。ここにおいて、凹所11aは内底面に近づくにつれて開口面積が徐々に小さくなる断面逆台形状に形成されているので、各凹所11aを形成するエッチングに際しては、アルカリ系溶液(例えば、KOH水溶液、TMAH溶液など)を用いた異方性エッチングを行うようにしている。また、本実施形態のコネクタAでは、各貫通配線16用の各スルーホールも、フォトリソグラフィ技術およびエッチング技術を利用して精度良く形成することができる。ここにおいて、各スルーホールを形成するエッチングに際しては、垂直深掘が可能なドライエッチング装置(例えば、誘導結合プラズマ型のドライエッチング装置など)を用いている。また、接圧付与部12の形成にあたっては、ベース基板11に凹所11aおよび貫通配線16を形成した後で、凹所11aに接圧付与部12の材料を充填すればよい(埋設すればよい)。また、各外部接続電極17の形成にあたっては、各外部接続電極17の基礎となる金属膜を例えばスパッタ法などによって成膜した後で、フォトリソグラフィ技術およびエッチング技術を利用して適宜パターニングすることでそれぞれ上記金属膜の一部からなる外部接続電極17を形成すればよい。   In the connector A of the present embodiment, since the silicon substrate is used as the base substrate 11, each recess 11a in the base substrate 11 can be formed with high accuracy using a photolithography technique and an etching technique. Here, since the recess 11a is formed in an inverted trapezoidal shape in which the opening area gradually decreases as it approaches the inner bottom surface, an alkaline solution (for example, a KOH aqueous solution, for example) is used for etching to form each recess 11a. Anisotropic etching using a TMAH solution or the like is performed. Further, in the connector A of the present embodiment, each through hole for each through wiring 16 can also be formed with high accuracy using a photolithography technique and an etching technique. Here, in the etching for forming each through hole, a dry etching apparatus capable of vertical deep digging (for example, an inductively coupled plasma type dry etching apparatus) is used. Further, in forming the contact pressure applying portion 12, after forming the recess 11a and the through wiring 16 in the base substrate 11, the recess 11a may be filled with the material of the contact pressure applying portion 12 (which may be embedded). ). In forming each external connection electrode 17, a metal film serving as the basis of each external connection electrode 17 is formed by, for example, sputtering, and then appropriately patterned using a photolithography technique and an etching technique. What is necessary is just to form the external connection electrode 17 which consists of a part of said metal film, respectively.

コネクタAの各コンタクト部13それぞれと相手側コネクタBの各接続端子23とを電気的に接続する際には、プリント基板30に実装したコネクタAとフレキシブル基板40に実装した相手側コネクタBとを対向させてから、図1(b)に示すように、コネクタAに相手側コネクタBを近づければよい。ここにおいて、コネクタAは各凹所11a内に配置された接圧付与部12が弾性変形することができるので、球状の接続端子23の突出高さなどのばらつきや接続端子23の傾きなどを許容することができるとともに、所望の接圧を満足することが可能となる。なお、コネクタAと相手側コネクタBとの電気的接続状態を維持するためのロック機構は、例えば、プリント基板30およびフレキシブル基板40を収納する機器(例えば、携帯機器など)の器体や、各基板30,40に設ければよいが、各コネクタA,Bに設けてもよい。   When electrically connecting each contact portion 13 of the connector A and each connection terminal 23 of the mating connector B, the connector A mounted on the printed board 30 and the mating connector B mounted on the flexible board 40 are connected to each other. After facing each other, the mating connector B may be brought close to the connector A as shown in FIG. Here, since the connector A can be elastically deformed by the contact pressure applying portion 12 disposed in each recess 11a, the connector A allows variations in the protruding height of the spherical connection terminal 23, inclination of the connection terminal 23, and the like. And a desired contact pressure can be satisfied. In addition, the lock mechanism for maintaining the electrical connection state of the connector A and the mating connector B includes, for example, the body of a device (for example, a portable device) that houses the printed board 30 and the flexible board 40, It may be provided on the substrates 30 and 40, but may be provided on each connector A and B.

以上説明した本実施形態のコネクタAは、相手側コネクタBの接続端子23とコンタクト部13との接続時に弾性変形して接続端子23とコンタクト部13との接圧を付与する接圧付与部12を備え、接圧付与部12が、弾性および導電性を有する材料により形成され、ベース基板11の上記一表面側から上記他表面側への配線の一部を構成しているので、図13に示した従来構成のようにスパイラル状のコンタクト部102の変位を可能とするための貫通孔101bの内面に配線106を形成する場合に比べて配線の信頼性を高めることが可能となり、しかも、ベース基板11の上記一表面側から上記他表面側への配線を接圧付与部12と別途に形成する場合のように配線を引きまわす必要がなく省スペース化が可能になる。しかして、本実施形態のコネクタAでは、図13に示した従来構成に比べて、コンタクト部13の配列ピッチの狭ピッチ化が可能になる。   The connector A of the present embodiment described above is elastically deformed when the connection terminal 23 of the mating connector B and the contact portion 13 are connected, and the contact pressure applying portion 12 that applies the contact pressure between the connection terminal 23 and the contact portion 13 is provided. 13 is formed of a material having elasticity and conductivity, and constitutes a part of the wiring from the one surface side of the base substrate 11 to the other surface side. Compared with the case where the wiring 106 is formed on the inner surface of the through hole 101b for enabling the displacement of the spiral contact portion 102 as in the conventional configuration shown, it is possible to increase the reliability of the wiring, and Unlike the case where the wiring from the one surface side of the substrate 11 to the other surface side is formed separately from the contact pressure applying portion 12, it is not necessary to draw the wiring, and space can be saved. Therefore, in the connector A of the present embodiment, the arrangement pitch of the contact portions 13 can be narrowed compared to the conventional configuration shown in FIG.

ところで、図13に示した構成の接続装置では、ベース基板101の基礎となる絶縁基板に貫通孔101bを形成する工程において、ドリル加工により各貫通孔101bを個別に形成しているので、貫通孔101bの配列ピッチおよび貫通孔101b間の間隔それぞれの高精度化が難しいとともに、貫通孔101bのより一層の狭ピッチ化が難しく、接続装置全体としてのより一層の小型化が難しかった。   By the way, in the connection apparatus having the configuration shown in FIG. 13, each through hole 101 b is individually formed by drilling in the step of forming the through hole 101 b in the insulating substrate serving as the base of the base substrate 101. It is difficult to increase the accuracy of the arrangement pitch of 101b and the interval between the through holes 101b, and it is difficult to further reduce the pitch of the through holes 101b, and it is difficult to further reduce the size of the entire connecting device.

これに対して、本実施形態のコネクタAは、一般的な半導体プロセスにより形成することができるので、従来に比べて薄型化、小型化、狭ピッチ化が可能になる。   On the other hand, since the connector A of the present embodiment can be formed by a general semiconductor process, it can be made thinner, smaller, and narrower than conventional ones.

また、本実施形態では、接圧付与部12と貫通配線16とでベース基板11の上記一表面側から上記他表面側への配線が構成され、接圧付与部12を凹所11a内に配置すればよいから、凹所11aの深さ寸法を適宜設定することで所望の接圧を確保することが可能となる。また、コンタクト部13を図13に示した従来構成のようなスパイラル状の形状に形成する必要もないので、相手側コネクタBの突起状の接続端子23の突出高さのばらつきに起因したコンタクト部13の破損が起こりにくくなる。   In the present embodiment, the contact pressure applying portion 12 and the through wiring 16 form a wiring from the one surface side of the base substrate 11 to the other surface side, and the contact pressure applying portion 12 is disposed in the recess 11a. Therefore, a desired contact pressure can be secured by appropriately setting the depth dimension of the recess 11a. Further, since it is not necessary to form the contact portion 13 in a spiral shape as in the conventional configuration shown in FIG. 13, the contact portion is caused by the variation in the protruding height of the protruding connection terminal 23 of the mating connector B. 13 is less likely to break.

(実施形態2)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態1と略同じであって、図4(a),(b)に示すように、ベース基板11において相手側コネクタBの各接続端子23それぞれに対応する各部位それぞれに厚み方向に貫通する貫通穴11bが形成されており、ベース基板11の上記他表面側において貫通穴11bが外部接続電極17によって閉塞されるとともに、貫通穴11bの内側に接圧付与部12が配置され、接圧付与部12と外部接続電極17とが実施形態1にて説明した貫通配線16を設けることなく電気的に接続されている点などが相違する。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 2)
The basic configuration of the connector A exemplified as a connection device in the present embodiment is substantially the same as that of the first embodiment, and as shown in FIGS. 4A and 4B, each connection of the mating connector B on the base substrate 11 is performed. A through hole 11b penetrating in the thickness direction is formed in each part corresponding to each of the terminals 23, and the through hole 11b is blocked by the external connection electrode 17 on the other surface side of the base substrate 11, and the through hole 11b. The contact pressure applying part 12 is arranged on the inner side, and the contact pressure applying part 12 and the external connection electrode 17 are electrically connected without providing the through wiring 16 described in the first embodiment. . In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted.

本実施形態のコネクタAでは、各貫通穴11b内に配置された接圧付与部12が弾性変形することができるので、球状の接続端子23の突出高さなどのばらつきや接続端子23の傾きなどを許容することができるとともに、所望の接圧を満足することが可能となる。   In the connector A of the present embodiment, the contact pressure applying portion 12 disposed in each through-hole 11b can be elastically deformed, so that variations in the protruding height of the spherical connection terminal 23, inclination of the connection terminal 23, etc. Can be allowed, and a desired contact pressure can be satisfied.

しかして、本実施形態のコネクタAでは、実施形態1のコネクタAにおける貫通配線16を形成する必要がなく、製造が容易になる。   Therefore, in the connector A of the present embodiment, it is not necessary to form the through wiring 16 in the connector A of the first embodiment, and the manufacture becomes easy.

(実施形態3)
実施形態2のコネクタAでは、相手側コネクタBの接続端子23とコンタクト部13との接続時に各貫通穴11b内に配置された接圧付与部12が弾性変形するが、外部接続電極17が貫通穴11bを閉塞するように配置され、外部接続電極17の中央部に半田ボール18が形成されているので、接圧付与部12の弾性変形によるコンタクト部13の変位量が制限されやすく、外部接続電極17にストレスがかかりやすくなってしまう。
(Embodiment 3)
In the connector A of the second embodiment, when the connection terminal 23 of the mating connector B and the contact portion 13 are connected, the contact pressure applying portion 12 disposed in each through hole 11b is elastically deformed, but the external connection electrode 17 is penetrated. Since the solder ball 18 is formed in the central portion of the external connection electrode 17 so as to close the hole 11b, the displacement amount of the contact portion 13 due to elastic deformation of the contact pressure applying portion 12 is easily limited, and the external connection Stress is easily applied to the electrode 17.

これに対して、本実施形態において接続装置として例示するコネクタAの基本構成は実施形態2と略同じであって、図5(a),(b)に示すように、外部接続電極17がベース基板11の上記他表面側で貫通穴11bを閉塞しないように配置され、外部接続電極17の中央部に半田ボール18が形成されている点が相違する。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。   On the other hand, the basic configuration of the connector A exemplified as the connection device in this embodiment is substantially the same as that of the second embodiment, and the external connection electrode 17 is a base as shown in FIGS. The difference is that the through hole 11 b is not closed on the other surface side of the substrate 11, and a solder ball 18 is formed at the center of the external connection electrode 17. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted.

しかして、本実施形態のコネクタAでは、実施形態2のコネクタAに比べて、接圧付与部12の弾性変形によるコンタクト部13の変位量が制限されにくくなり、外部接続電極17にかかるストレスを低減できる。   Therefore, in the connector A of the present embodiment, compared to the connector A of the second embodiment, the displacement amount of the contact portion 13 due to the elastic deformation of the contact pressure applying portion 12 is less restricted, and the stress applied to the external connection electrode 17 is reduced. Can be reduced.

(実施形態4)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態1と略同じであって、図6(a),(b)に示すように、凹所11aの内面と接圧付与部12との間に介在する金属層15を備え、接圧付与部12と金属層15と貫通配線16とで、ベース基板11の上記一表面側から上記他表面側への配線を構成している点が相違する。ここにおいて、金属層15は、ベース基板11の上記一表面側における凹所11aの周部まで延設されている。また、金属層15は、図示しない絶縁膜によりベース基板11と電気的に絶縁されている。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 4)
The basic configuration of the connector A exemplified as a connection device in this embodiment is substantially the same as that of the first embodiment, and as shown in FIGS. 6A and 6B, the inner surface of the recess 11 a and the contact pressure applying portion 12. And the contact pressure applying portion 12, the metal layer 15, and the through wiring 16 constitute a wiring from the one surface side of the base substrate 11 to the other surface side. Is different. Here, the metal layer 15 extends to the peripheral portion of the recess 11 a on the one surface side of the base substrate 11. The metal layer 15 is electrically insulated from the base substrate 11 by an insulating film (not shown). In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted.

しかして、本実施形態のコネクタAでは、接圧付与部12が、当該接圧付与部12との接触面積が大きい金属層15を介して貫通配線16と接続されるので、配線の抵抗を低減することが可能となる。なお、本実施形態のコネクタAでは、金属層15が凹所11aの内面の全体にわたって形成されているが、少なくとも凹所11aの内底面に形成してあればよい。要するに、金属層15は、少なくとも凹所11aの内底面と接圧付与部12との間に介在すればよい。   Therefore, in the connector A of the present embodiment, the contact pressure applying portion 12 is connected to the through wiring 16 through the metal layer 15 having a large contact area with the contact pressure applying portion 12, and thus the resistance of the wiring is reduced. It becomes possible to do. In the connector A of the present embodiment, the metal layer 15 is formed over the entire inner surface of the recess 11a, but may be formed at least on the inner bottom surface of the recess 11a. In short, the metal layer 15 may be interposed between at least the inner bottom surface of the recess 11 a and the contact pressure applying portion 12.

(実施形態5)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態4と略同じであって、図7(a),(b)に示すように、凹所11aの開口面積が略一定である点が相違する。なお、実施形態4と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 5)
The basic configuration of the connector A exemplified as a connection device in the present embodiment is substantially the same as that of the fourth embodiment, and the opening area of the recess 11a is substantially constant as shown in FIGS. 7 (a) and 7 (b). The point is different. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 4, and description is abbreviate | omitted.

実施形態4では実施形態1と同様に凹所11aがアルカリ系溶液を用いた異方性エッチングにより形成されているのに対して、本実施形態では、凹所11aを垂直深掘が可能なドライエッチング装置(例えば、誘導結合プラズマ型のドライエッチング装置など)を用いたドライエッチングにより形成している。   In the fourth embodiment, the recess 11a is formed by anisotropic etching using an alkaline solution, as in the first embodiment, whereas in this embodiment, the recess 11a is a dry that allows vertical deep digging. It is formed by dry etching using an etching apparatus (for example, an inductively coupled plasma type dry etching apparatus).

しかして、本実施形態のコネクタAでは、実施形態4のコネクタAに比べて、凹所11aの開口面積を小さくすることができるとともに凹所11aの配列ピッチを短縮することができ、ベース基板11の平面サイズの小型化を図れる。   Thus, in the connector A of the present embodiment, the opening area of the recesses 11a can be reduced and the arrangement pitch of the recesses 11a can be shortened as compared with the connector A of the fourth embodiment. The planar size can be reduced.

(実施形態6)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態1と略同じであって、図8(a),(b)に示すように、コンタクト部13が金属材料により形成され、接圧付与部12に重ねて配置されている点が相違する。すなわち、本実施形態では、コンタクト部13が、接圧付与部12の形成後に接圧付与部12上に形成した金属薄膜により構成されている。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 6)
The basic configuration of the connector A exemplified as a connection device in the present embodiment is substantially the same as that of the first embodiment. As shown in FIGS. 8A and 8B, the contact portion 13 is formed of a metal material, The difference is that the pressure application unit 12 is arranged to overlap. That is, in the present embodiment, the contact portion 13 is constituted by a metal thin film formed on the contact pressure applying portion 12 after the contact pressure applying portion 12 is formed. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted.

しかして、本実施形態のコネクタAでは、実施形態1のように接圧付与部12がコンタクト部13を兼ねる場合に比べて、相手側コネクタBの接続端子23とコンタクト部13との接触抵抗を低減することが可能となる。   Therefore, in the connector A of the present embodiment, the contact resistance between the connection terminal 23 of the mating connector B and the contact portion 13 is smaller than that in the case where the contact pressure applying portion 12 also serves as the contact portion 13 as in the first embodiment. It becomes possible to reduce.

(実施形態7)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態2と略同じであって、図9(a),(b)に示すように、コンタクト部13が金属材料により形成され、接圧付与部12に重ねて配置されている点が相違する。すなわち、本実施形態では、コンタクト部13が、接圧付与部12の形成後に接圧付与部12上に形成した金属薄膜により構成されている。なお、実施形態2と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 7)
The basic configuration of the connector A exemplified as a connection device in the present embodiment is substantially the same as that of the second embodiment. As shown in FIGS. 9A and 9B, the contact portion 13 is formed of a metal material, The difference is that the pressure application unit 12 is arranged to overlap. That is, in the present embodiment, the contact portion 13 is constituted by a metal thin film formed on the contact pressure applying portion 12 after the contact pressure applying portion 12 is formed. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 2, and description is abbreviate | omitted.

しかして、本実施形態のコネクタAでは、実施形態2のように接圧付与部12がコンタクト部13を兼ねる場合に比べて、相手側コネクタBの接続端子23とコンタクト部13との接触抵抗を低減することが可能となる。   Therefore, in the connector A of the present embodiment, the contact resistance between the connection terminal 23 of the mating connector B and the contact portion 13 is smaller than that in the case where the contact pressure applying portion 12 also serves as the contact portion 13 as in the second embodiment. It becomes possible to reduce.

(実施形態8)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態6と略同じであって、図10(a),(b)に示すように、コンタクト部13が突起状の形状に形成されている点が相違する。ここにおいて、コンタクト部13は半球状のバンプ(金属突起)により構成されている。なお、実施形態6と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 8)
The basic configuration of the connector A exemplified as a connection device in the present embodiment is substantially the same as that of the sixth embodiment, and as shown in FIGS. 10A and 10B, the contact portion 13 is formed in a protruding shape. Is different. Here, the contact portion 13 is constituted by a hemispherical bump (metal protrusion). In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 6, and description is abbreviate | omitted.

しかして、本実施形態のコネクタAでは、相手側部材たる相手側コネクタBの接続端子23の表面が図10(b)に示すように平坦な場合でも接続端子23とコンタクト部13との接触信頼性を確保することができる。   Thus, in the connector A of the present embodiment, the contact reliability between the connection terminal 23 and the contact portion 13 even when the surface of the connection terminal 23 of the counterpart connector B, which is the counterpart member, is flat as shown in FIG. Sex can be secured.

(実施形態9)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態7と略同じであって、図11(a),(b)に示すように、コンタクト部13が突起状の形状に形成されている点が相違する。ここにおいて、コンタクト部13は半球状のバンプ(金属突起)により構成されている。なお、実施形態7と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 9)
The basic configuration of the connector A exemplified as a connection device in the present embodiment is substantially the same as that of the seventh embodiment, and as shown in FIGS. 11A and 11B, the contact portion 13 is formed in a protruding shape. Is different. Here, the contact portion 13 is constituted by a hemispherical bump (metal protrusion). In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 7, and description is abbreviate | omitted.

しかして、本実施形態のコネクタAでは、相手側部材たる相手側コネクタBの接続端子23の表面が図11(b)に示すように平坦な場合でも接続端子23とコンタクト部13との接触信頼性を確保することができる。   Therefore, in the connector A of the present embodiment, the contact reliability between the connection terminal 23 and the contact portion 13 even when the surface of the connection terminal 23 of the mating connector B as the mating member is flat as shown in FIG. Sex can be secured.

(実施形態10)
本実施形態において接続装置として例示するコネクタAの基本構成は実施形態1と略同じであって、図12(a),(b)に示すように、凹所11aの内周面に段差部11cが形成されており、接圧付与部12と凹所11aの内底面との間に接続端子23とコンタクト部13との接続時に接圧付与部12の一部を逃がす空間からなる逃げ空間19が形成されている点、凹所11aの内面と接圧付与部12との間に介在する金属層15を備え、接圧付与部12と金属層15と貫通配線16とで、ベース基板11の上記一表面側から上記他表面側への配線を構成している点などが相違する。ここにおいて、金属層15は、ベース基板11の上記一表面側における凹所11aの周部まで延設されている。また、金属層15は、図示しない絶縁膜によりベース基板11と電気的に絶縁されている。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 10)
The basic configuration of the connector A exemplified as a connection device in the present embodiment is substantially the same as that of the first embodiment. As shown in FIGS. 12A and 12B, a step portion 11c is formed on the inner peripheral surface of the recess 11a. A relief space 19 is formed between the contact pressure applying portion 12 and the inner bottom surface of the recess 11a. The escape space 19 is a space that allows part of the contact pressure applying portion 12 to escape when the connection terminal 23 and the contact portion 13 are connected. It is provided with a metal layer 15 interposed between the inner surface of the recess 11 a and the contact pressure applying portion 12, and the contact pressure applying portion 12, the metal layer 15, and the through wiring 16, A difference is that a wiring is formed from one surface side to the other surface side. Here, the metal layer 15 extends to the peripheral portion of the recess 11 a on the one surface side of the base substrate 11. The metal layer 15 is electrically insulated from the base substrate 11 by an insulating film (not shown). In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted.

しかして、本実施形態のコネクタAでは、接圧付与部12とベース基板11の上記他表面との間に、接続端子23とコンタクト部13との接続時に接圧付与部12の一部を逃がす空間からなる逃げ空間19が形成されているので、接圧付与部12が弾性変形しやすくなり、突起状の接続端子23の突出高さなどのばらつきや接続端子23の傾きなどを許容することができる。また、本実施形態のコネクタAでは、接圧付与部12が、当該接圧付与部12との接触面積が大きい金属層15を介して貫通配線16と接続されるので、配線の抵抗を低減することが可能となる。   Therefore, in the connector A of the present embodiment, a part of the contact pressure applying portion 12 is released between the contact pressure applying portion 12 and the other surface of the base substrate 11 when the connection terminal 23 and the contact portion 13 are connected. Since the clearance space 19 composed of a space is formed, the contact pressure applying portion 12 is easily elastically deformed, and variation in the protruding height of the projecting connection terminal 23 or inclination of the connection terminal 23 can be allowed. it can. Further, in the connector A of the present embodiment, the contact pressure applying portion 12 is connected to the through wiring 16 via the metal layer 15 having a large contact area with the contact pressure applying portion 12, thereby reducing the wiring resistance. It becomes possible.

上記各実施形態では、接続装置として、回路基板間の電気的な接続に用いるコネクタAを例示したが、接続装置は、回路基板間の電気的な接続に用いるコネクタに限定するものではなく、接続装置の相手側部材も相手側コネクタBに限らず、例えば、BGAやCSPやベアチップなどでもよい。   In each of the above embodiments, the connector A used for electrical connection between circuit boards is illustrated as the connection device. However, the connection device is not limited to the connector used for electrical connection between circuit boards. The counterpart member of the apparatus is not limited to the counterpart connector B, and may be, for example, a BGA, a CSP, a bare chip, or the like.

実施形態1におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 1 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 同上におけるコネクタを示し、(a)はプリント基板に表面実装した状態の概略斜視図、(b)は(a)の要部拡大図である。The connector in the same as above is shown, (a) is a schematic perspective view in a state where it is surface-mounted on a printed circuit board, and (b) is an enlarged view of a main part of (a). 同上における相手側コネクタを示し、(a)はフレキシブル基板に表面実装した状態の概略斜視図、(b)は(a)の要部拡大図である。The other party connector in the same as the above is shown, (a) is a schematic perspective view in a state where it is surface-mounted on a flexible substrate, and (b) is an enlarged view of a main part of (a). 実施形態2におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 2 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態3におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 3 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態4におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 4 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態5におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 5 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態6におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 6 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態7におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 7 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態8におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 8 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態9におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 9 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 実施形態10におけるコネクタを示し、(a)は概略断面図、(b)は相手側コネクタと接続した状態の概略断面図である。The connector in Embodiment 10 is shown, (a) is a schematic sectional drawing, (b) is a schematic sectional drawing of the state connected with the other party connector. 従来例を示し、(a)は概略平面図、(b)は(a)のC−C’断面図である。A prior art example is shown, (a) is a schematic plan view, and (b) is a C-C 'sectional view of (a).

符号の説明Explanation of symbols

A コネクタ
B 相手側コネクタ
11 ベース基板
11a 凹所
12 接圧付与部
13 コンタクト部
16 貫通配線
17 外部接続電極
23 接続端子
A connector B mating connector 11 base substrate 11a recess 12 contact pressure applying portion 13 contact portion 16 through wiring 17 external connection electrode 23 connection terminal

Claims (7)

ベース基板と、ベース基板の一表面側において相手側部材の接続端子に対応する部位に配設され接続端子が接触するコンタクト部と、接続端子とコンタクト部との接続時に弾性変形して接続端子とコンタクト部との接圧を付与する接圧付与部とを備え、接圧付与部は、弾性および導電性を有する材料により形成され、ベース基板の一表面側から他表面側への配線の一部を構成していることを特徴とする接続装置。   A base substrate, a contact portion disposed on a surface of the base substrate corresponding to the connection terminal of the mating member, the contact portion contacting the connection terminal, and a connection terminal elastically deformed when the connection terminal and the contact portion are connected to each other; A contact pressure applying portion that applies contact pressure to the contact portion, and the contact pressure applying portion is formed of a material having elasticity and conductivity, and a part of the wiring from one surface side of the base substrate to the other surface side The connection apparatus characterized by comprising. 前記ベース基板は、前記接続端子に対応する部位に凹所が形成されるとともに当該凹所内に前記接圧付与部が配置され、前記凹所の内底面と前記他表面との間の部位に前記接圧付与部とともに前記配線を構成する貫通配線が形成されてなることを特徴とする請求項1記載の接続装置。   In the base substrate, a recess is formed in a portion corresponding to the connection terminal, and the contact pressure applying portion is disposed in the recess, and the base substrate is formed in a portion between the inner bottom surface of the recess and the other surface. The connection device according to claim 1, wherein a through wiring that constitutes the wiring is formed together with a contact pressure applying portion. 少なくとも前記凹所の内底面と前記接圧付与部との間に介在する金属層を備えてなることを特徴とする請求項2記載の接続装置。   The connection device according to claim 2, further comprising a metal layer interposed between at least an inner bottom surface of the recess and the contact pressure applying portion. 前記ベース基板は、前記接続端子に対応する部位に貫通穴が形成されるとともに当該貫通穴内に前記接圧付与部が配置されてなることを特徴とする請求項1記載の接続装置。   The connection device according to claim 1, wherein the base substrate has a through hole formed in a portion corresponding to the connection terminal, and the contact pressure applying portion is disposed in the through hole. 前記コンタクト部は、金属材料により形成され前記接圧付与部に重ねて配置されてなることを特徴とする請求項1ないし請求項4のいずれかに記載の接続装置。   5. The connection device according to claim 1, wherein the contact portion is formed of a metal material and is disposed so as to overlap the contact pressure applying portion. 前記コンタクト部は、突起状の形状に形成されてなることを特徴とする請求項5記載の接続装置。   The connection device according to claim 5, wherein the contact portion is formed in a protruding shape. 前記ベース基板は、前記接圧付与部と前記他表面との間に、前記接続端子と前記コンタクト部との接続時に前記接圧付与部の一部を逃がす空間からなる逃げ空間が形成されてなることを特徴とする請求項1ないし請求項6のいずれかに記載の接続装置。   In the base substrate, a clearance space is formed between the contact pressure applying portion and the other surface. The escape space includes a space that allows a part of the contact pressure applying portion to escape when the connection terminal and the contact portion are connected. The connection device according to claim 1, wherein the connection device is a device.
JP2005246794A 2005-08-26 2005-08-26 Connection device Expired - Fee Related JP4779504B2 (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943009A (en) * 1982-08-04 1984-03-09 チバ−ガイギ−・アクチエンゲゼルシヤフト Vinylpyridine copolymer, manufacture and use as sulfonating agent
JPH09115577A (en) * 1995-10-06 1997-05-02 Whitaker Corp:The Connector and manufacture thereof
JPH1186954A (en) * 1997-09-05 1999-03-30 Denso Corp Waterproof housing
JP2000208675A (en) * 1999-01-11 2000-07-28 Matsushita Electronics Industry Corp Semiconductor device and its manufacture
JP2002025711A (en) * 2000-07-03 2002-01-25 Sumitomo Wiring Syst Ltd Panel-attaching type connector
JP2002075492A (en) * 2000-08-30 2002-03-15 Taiko Denki Co Ltd Stacked connector and its manufacturing method
WO2004068649A1 (en) * 2003-01-27 2004-08-12 Taiko Denki Co., Limited Microconnector and method of producing socket therefor

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943009A (en) * 1982-08-04 1984-03-09 チバ−ガイギ−・アクチエンゲゼルシヤフト Vinylpyridine copolymer, manufacture and use as sulfonating agent
JPH09115577A (en) * 1995-10-06 1997-05-02 Whitaker Corp:The Connector and manufacture thereof
JPH1186954A (en) * 1997-09-05 1999-03-30 Denso Corp Waterproof housing
JP2000208675A (en) * 1999-01-11 2000-07-28 Matsushita Electronics Industry Corp Semiconductor device and its manufacture
JP2002025711A (en) * 2000-07-03 2002-01-25 Sumitomo Wiring Syst Ltd Panel-attaching type connector
JP2002075492A (en) * 2000-08-30 2002-03-15 Taiko Denki Co Ltd Stacked connector and its manufacturing method
WO2004068649A1 (en) * 2003-01-27 2004-08-12 Taiko Denki Co., Limited Microconnector and method of producing socket therefor

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