JP2007046008A5 - - Google Patents
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- JP2007046008A5 JP2007046008A5 JP2005234416A JP2005234416A JP2007046008A5 JP 2007046008 A5 JP2007046008 A5 JP 2007046008A5 JP 2005234416 A JP2005234416 A JP 2005234416A JP 2005234416 A JP2005234416 A JP 2005234416A JP 2007046008 A5 JP2007046008 A5 JP 2007046008A5
- Authority
- JP
- Japan
- Prior art keywords
- alkoxysilanes
- active energy
- refractive index
- energy ray
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 Siloxane compound Chemical class 0.000 claims description 10
- NBVXSUQYWXRMNV-UHFFFAOYSA-N Fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 8
- 239000008199 coating composition Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004432 carbon atoms Chemical group C* 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 230000003301 hydrolyzing Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
Description
即ち、本発明は、炭化フッ素基を有するアルコキシシラン類(a1)および炭化フッ素基を有するアルコキシシラン類(a1)以外のアルコキシシラン類(a2)を加水分解・縮合して得られるシロキサン化合物(A)と、活性エネルギー線感応性酸発生剤(B)とを含有し、D線(589nm)における屈折率が1.42以下の硬化被膜を与える活性エネルギー線硬化性低屈折率コーティング用組成物であって、
炭化フッ素基を有するアルコキシシラン類(a1)以外のアルコキシシラン類(a2)が、一般式(1)
The alkoxysilanes (a2) other than the alkoxysilanes (a1) having a fluorocarbon group are represented by the general formula (1).
本発明の活性エネルギー線硬化性低屈折率コーティング用組成物は、炭化フッ素基を有するアルコキシシラン類(a1)および炭化フッ素基を有するアルコキシシラン類(a1)以外のアルコキシシラン類(a2)であって一般式(1)で示されるアルキルシリケート類を含むアルコキシシラン類(a2)を加水分解・縮合して得られるシロキサン化合物(A)と、活性エネルギー線感応性酸発生剤(B)とを含有し、D線(589nm)における屈折率が1.42以下の硬化被膜を与えるものであれば、特に制限されるものではない。 The active energy ray-curable low refractive index coating composition of the present invention, alkoxysilanes having a fluorocarbon group (a1) and alkoxysilanes having a fluorocarbon group (a1) other than alkoxysilanes (a2) met A siloxane compound (A) obtained by hydrolyzing and condensing an alkoxysilane (a2) containing an alkyl silicate represented by the general formula (1), and an active energy ray-sensitive acid generator (B) And if it gives the cured film whose refractive index in D line | wire (589 nm) is 1.42 or less, it will not restrict | limit in particular.
本発明の活性エネルギー線硬化性低屈折率コーティング用組成物に用いるアルコキシシラン類(a2)は、炭化フッ素基を有するアルコキシシラン類(a1)と加水分解・縮合してシロキサン化合物を得ることができる化合物で、炭化フッ素基を有するアルコキシシラン類(a1)以外のアルコキシシラン化合物であって一般式(1)で示されるアルキルシリケートを含む。 The alkoxysilanes (a2) used in the active energy ray-curable low refractive index coating composition of the present invention can be hydrolyzed and condensed with alkoxysilanes (a1) having a fluorocarbon group to obtain a siloxane compound. The compound is an alkoxysilane compound other than alkoxysilanes (a1) having a fluorocarbon group, and includes an alkyl silicate represented by the general formula (1) .
で表されるアルキルシリケート類を使用することが必須である。式中、R1、R2、R3およびR4は独立して炭素原子数1〜5のアルキル基を示し、nは3〜20の整数を示す。これらのうち、R1〜R4の総てがメチル基を示すメチルシリケート類、R1〜R4の総てがエチル基を示すエチルシリケート類が特に好ましい。 It is essential to use alkyl silicates represented by: In the formula, R 1 , R 2 , R 3 and R 4 independently represent an alkyl group having 1 to 5 carbon atoms, and n represents an integer of 3 to 20. Of these, methyl silicates in which all of R 1 to R 4 are methyl groups and ethyl silicates in which all of R 1 to R 4 are ethyl groups are particularly preferable.
Claims (2)
炭化フッ素基を有するアルコキシシラン類(a1)以外のアルコキシシラン類(a2)が、一般式(1)
The alkoxysilanes (a2) other than the alkoxysilanes (a1) having a fluorocarbon group are represented by the general formula (1).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005234416A JP2007046008A (en) | 2005-08-12 | 2005-08-12 | Composition for active energy lay-curable low refractive index coating, and molded product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005234416A JP2007046008A (en) | 2005-08-12 | 2005-08-12 | Composition for active energy lay-curable low refractive index coating, and molded product |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007046008A JP2007046008A (en) | 2007-02-22 |
JP2007046008A5 true JP2007046008A5 (en) | 2008-08-28 |
Family
ID=37849103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005234416A Pending JP2007046008A (en) | 2005-08-12 | 2005-08-12 | Composition for active energy lay-curable low refractive index coating, and molded product |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2007046008A (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101541954B1 (en) * | 2012-11-07 | 2015-08-04 | (주)엘지하우시스 | Coating composition for low refractive layer and transparent conductive film including the same |
US10442899B2 (en) * | 2014-11-17 | 2019-10-15 | Silbond Corporation | Stable ethylsilicate polymers and method of making the same |
US11529230B2 (en) | 2019-04-05 | 2022-12-20 | Amo Groningen B.V. | Systems and methods for correcting power of an intraocular lens using refractive index writing |
US11564839B2 (en) | 2019-04-05 | 2023-01-31 | Amo Groningen B.V. | Systems and methods for vergence matching of an intraocular lens with refractive index writing |
US11583389B2 (en) | 2019-04-05 | 2023-02-21 | Amo Groningen B.V. | Systems and methods for correcting photic phenomenon from an intraocular lens and using refractive index writing |
US11944574B2 (en) | 2019-04-05 | 2024-04-02 | Amo Groningen B.V. | Systems and methods for multiple layer intraocular lens and using refractive index writing |
US11583388B2 (en) | 2019-04-05 | 2023-02-21 | Amo Groningen B.V. | Systems and methods for spectacle independence using refractive index writing with an intraocular lens |
US11678975B2 (en) | 2019-04-05 | 2023-06-20 | Amo Groningen B.V. | Systems and methods for treating ocular disease with an intraocular lens and refractive index writing |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001207120A (en) * | 2000-01-26 | 2001-07-31 | Nippon Paint Co Ltd | Method for producing highly light-transmitting film and coating composition |
JP2001318207A (en) * | 2000-02-28 | 2001-11-16 | Fuji Photo Film Co Ltd | Antireflection film and image display device |
JP4062392B2 (en) * | 2000-08-04 | 2008-03-19 | 信越化学工業株式会社 | Silicone resin for coating composition, method for producing the same, coating composition and article having this cured film |
JP2003266581A (en) * | 2002-03-12 | 2003-09-24 | Sumitomo Chem Co Ltd | Transparent base material having cured coating film |
JP3879657B2 (en) * | 2002-11-20 | 2007-02-14 | 日東電工株式会社 | Curable resin composition for antireflection layer, antireflection layer, antireflection film, optical element and image display device |
JP4742579B2 (en) * | 2003-12-18 | 2011-08-10 | 凸版印刷株式会社 | Anti-reflection laminate |
TWI404776B (en) * | 2003-12-19 | 2013-08-11 | Nissan Chemical Ind Ltd | A film having a low refractive index and a large contact angle with respect to water |
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2005
- 2005-08-12 JP JP2005234416A patent/JP2007046008A/en active Pending
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