JP2006520923A5 - - Google Patents

Claims (15)

A microscopic structure that diffracts light into the photoresist layer (2) on the substrate (1) by superimposing at least one second uneven structure serving as a diffraction structure (12) on the first uneven structure (5). A method of creating a structure (13) comprising:
a) A first concavo-convex structure (5) formed by molding the shape of the concavo-convex matrix (4) disposed facing the substrate (1) on the exposed surface of the photoresist layer (2). On a flat substrate (1) with a photoresist layer (2) comprising
b) removing the concave / convex matrix (4),
c) The coherent light is decomposed into a branched beam (9) and a reference beam (10), and the branched beam (9) and the reference beam (10) are caused to interfere with each other at a predetermined intersection angle. Create interference fringes on the concavo-convex structure (5) of 1,
d) by rotating the substrate (1) around a normal (15) to the plane of the substrate (1), thereby causing dark light fringes relative to the orientation with respect to the first relief structure (5); Determine the direction of the interference fringes with the bright light stripes separated,
e) exposing the first relief structure (5) in the photoresist layer (2) for a predetermined time using the interference fringes;
f) The photoresist is developed for a predetermined time, and the photoresist material altered by the exposure is partially removed to form a groove (13) of the diffraction structure (12) in the first concavo-convex structure (5). Let
g) drying the photoresist;
A method for producing a microstructure, comprising various steps.   2. A method according to claim 1, characterized in that the development time of the photoresist in step f) is such that the grooves (13) of the diffractive structure reach a maximum depth of 500 nm. 2. A method according to claim 1, characterized in that the development time of the photoresist in step f) is such that the grooves (13) of the diffractive structure reach a maximum depth of 250 nm. In the step a), the photoresist layer (2) is first formed on the substrate (1), the photoresist layer (2) is cured by the action of heat, and then on the stamp (3). The provided concavo-convex matrix (4) is lowered to the surface of the photoresist layer (2), and the shape of the first concavo-convex structure (5) is formed as a negative of the concavo-convex matrix (4). The method according to any one of claims 1 to 3 . In the step a), the photoresist layer (2) is formed by casting. In that case, a liquid photoresist is injected between the substrate (1) and the concave-convex matrix (4), and the photoresist is formed. After being cured by heating and releasing, the exposed surface of the photoresist layer (2) is provided with the first concavo-convex structure (5) as a negative image of the concavo-convex matrix (4). The method according to any one of claims 1 to 3 . Wherein a) in step A method according to any one of claims 1 5, characterized in that formed on the photoresist layer as a periodic grating wherein the first relief structure (5) (2). Wherein a) in step, any one process of claim 1 5, characterized in that formed on the photoresist layer cross grating as the first relief structure (5) (2). In the step a), a periodic grating having a spatial frequency in the range of 1 line / mm to 1000 lines / mm is formed on the photoresist layer (2) as the first uneven structure (5). 8. A method according to any one of claims 1 to 7 , characterized in that In step c), the branch beam (9) and the reference are formed so that a diffractive structure (12) having a spatial frequency corresponding to at least five times the spatial frequency of the first concavo-convex structure (5) is formed. The method according to claim 6 or 7 , characterized in that an angle of intersection with the beam (10) is set. In the step a), any one of the preceding claims, characterized in that formed on the photoresist layer as a single mat structure for scattering light the first relief structure (5) (2) 5 The method described. In the step a), an uneven matrix (4) having a structure having at least one rotational paraboloid (16) and / or conical tip (17) is formed into the shape of the first uneven structure (5). any one process of claim 1 5, characterized by using in formation. It said first concave-convex structure (5), 0.1 [mu] m and 100μm method of any one of claims 1 to 11, characterized in that formed in the range of depth (T) between. Prior to the execution of the step g), at least one additional diffractive structure (12) is formed by repeating the photographic molding operation from the step c) to the step f), in which case the step d) The first concavo-convex structure (5) provided with grooves (13) of the diffractive structure (12) for new interference fringes by rotating the substrate (1) around the normal (15). 13. The method according to any one of claims 1 to 12 , characterized in that the direction is determined. 14. Method according to claim 13 , characterized in that in the repetition of the photographic shaping operation in step c), the angle of intersection between the branch beam (9) and the reference beam (10) is changed. The intersection angle between the branched beam (9) and the reference beam (10) is set so that a diffractive structure (12) having a grating period of maximum 500 nm is formed in the step c). 15. A method according to any one of claims 1 to 14 .