JP2008158013A5 - - Google Patents

Claims (13)

An optical element in which a large number of structures composed of convex portions or concave portions are arranged on a substrate surface with a fine pitch equal to or smaller than the wavelength of visible light,
The above structure constitutes a quasi-hexagonal lattice pattern between adjacent three rows of tracks,
The optical element according to claim 1, wherein the structure has an elliptical cone shape or an elliptical truncated cone shape with a gentle top slope and a gradually steep slope from the center to the bottom.   2. The optical element according to claim 1, wherein the structure is arranged so as to form a plurality of rows of arc-shaped tracks on the surface of the base.   2. The optical element according to claim 1, wherein the arrangement pitch P1 of the structures in the same track is longer than the arrangement pitch P2 of the structures between two adjacent tracks. The structure has an elliptical cone shape or an elliptical truncated cone shape having a major axis direction in the circumferential direction of the arc-shaped track. 3. The optical element according to claim 2 , wherein the optical element is formed with a gradually steep slope at the bottom. The height of the structures in the circumferential direction of the arc-shaped track (depth), claim 2, wherein the height of the arcuate track the structures in the radial (depth) smaller than The optical element described. A replica substrate for producing an optical element in which a large number of structures consisting of convex portions or concave portions are arranged on the substrate surface at a fine pitch below the wavelength of visible light,
The above structure constitutes a quasi-hexagonal lattice pattern between adjacent three rows of tracks,
A replica substrate for producing an optical element, wherein the structure has an elliptical cone shape or an elliptical truncated cone shape having a gentle slope at the top and a gradually steep slope from the center to the bottom. A method for producing a replica substrate for producing an optical element, wherein a large number of structures comprising convex portions or concave portions are arranged on the substrate surface at a fine pitch below the wavelength of visible light,
A first step of preparing a substrate having a resist layer formed on the surface;
While rotating the substrate and relatively moving the laser beam in the rotational radius direction of the substrate, the resist layer is intermittently irradiated with the laser beam to form a latent image at a pitch shorter than the wavelength of visible light. A second step;
A third step of developing the resist layer to form a resist pattern on the surface of the substrate;
A fourth step of forming an uneven structure on the surface of the substrate by performing an etching process using the resist pattern as a mask;
Possess a fifth step of preparing a duplicate substrate by transferring an uneven structure of the substrate,
In the second step, the latent image is formed so as to form a quasi-hexagonal lattice pattern between adjacent three rows of tracks . 8. The optical element fabrication according to claim 7, wherein in the fourth step, an etching process using the resist pattern as a mask and an ashing process on the resist pattern are repeated, and the etching process time is gradually increased. Method for manufacturing a replication substrate. In the fifth step, claims, characterized in that after forming a photocurable resin layer on the surface of the substrate, peeling the photocurable resin layer to produce a duplicate substrate that the uneven structure is transferred 7 The manufacturing method of the replication substrate for optical element preparation of description. A method of manufacturing an optical element in which a large number of structures composed of convex portions or concave portions are arranged on a substrate surface with a fine pitch below the wavelength of visible light,
A first step of preparing a substrate having a resist layer formed on the surface;
While rotating the substrate and relatively moving the laser light in the rotational radius direction of the substrate, the resist layer is intermittently irradiated with the laser light to form a latent image at a pitch shorter than the visible light wavelength. Two steps;
A third step of developing the resist layer to form a resist pattern on the surface of the substrate;
A fourth step of forming an uneven structure on the surface of the substrate by performing an etching process using the resist pattern as a mask;
A fifth step of producing a replica substrate of the substrate and forming a metal plating layer on the concavo-convex structure of the replica substrate;
A sixth step of peeling the metal plating layer from the replica substrate to produce a molding die to which the concavo-convex structure is transferred;
Possess a seventh step of the concavo-convex structure is formed a transparent substrate formed on the surface by using the molding die,
In the second step, the latent image is formed so as to form a quasi-hexagonal lattice pattern between adjacent three rows of tracks . The method of manufacturing an optical element according to claim 10 , further comprising an eighth step of cutting the transparent substrate into a predetermined size after the seventh step. 11. The optical element according to claim 10, wherein in the fourth step, an etching process using the resist pattern as a mask and an ashing process on the resist pattern are repeatedly performed, and the etching process time is gradually increased. Production method. In the fifth step, claims, characterized in that after forming a photocurable resin layer on the surface of the substrate, peeling the photocurable resin layer to produce a duplicate substrate that the uneven structure is transferred 10 The manufacturing method of the optical element of description.