JP2009199086A5 - - Google Patents
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- JP2009199086A5 JP2009199086A5 JP2009040027A JP2009040027A JP2009199086A5 JP 2009199086 A5 JP2009199086 A5 JP 2009199086A5 JP 2009040027 A JP2009040027 A JP 2009040027A JP 2009040027 A JP2009040027 A JP 2009040027A JP 2009199086 A5 JP2009199086 A5 JP 2009199086A5
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- master
- optical element
- wavelength
- visible light
- depth distribution
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Claims (14)
上記構造体は、上記基体表面において複数列の円弧状トラックをなすように設けられ、
上記構造体は、深さ分布を有すると共に、長軸と短軸をもつ底面を有する錐体構造であり、上記トラックの円周方向に長軸方向を有することを特徴とする光学素子。 An optical element having an antireflection function, in which a large number of structures composed of convex portions or concave portions are provided on the surface of the substrate at a fine pitch equal to or less than the wavelength of visible light
The structure is provided so as to form a plurality of arc-shaped tracks on the surface of the base,
The above structure is configured to have a depth distribution is a pyramidal structure having a bottom surface having a major axis and a minor axis, the optical element characterized by having a major axis in the circumferential direction of the track.
上記構造体は、深さ分布を有し、The structure has a depth distribution;
上記深さ分布の形成が、ランダムであることを特徴とする光学素子。An optical element characterized in that the formation of the depth distribution is random.
上記構造体は、第1の構造体と、上記第1の構造体とは異なる高さを有する第2の構造体とからなり、The structure includes a first structure and a second structure having a height different from that of the first structure.
上記第2の構造体が、上記基体表面にランダムに設けられていることを特徴とする光学素子。The optical element, wherein the second structure is randomly provided on the surface of the substrate.
上記構造体は、深さ分布を有し、The structure has a depth distribution;
上記各構造体の深さ分布の形成が、上記原盤表面に、少なくとも2種以上の値で選択的に、もしくは連続的に、もしくは区分的に連続に変化してなされていることを特徴とする光学素子の作製用原盤。The depth distribution of each structure is formed on the surface of the master by selectively changing at least two or more values, continuously or piecewise continuously. Master for producing optical elements.
上記構造体は、上記原盤表面において複数列の円弧状トラックをなすように設けられ、
上記構造体は、深さ分布を有すると共に、長軸と短軸をもつ底面を有する錐体構造であり、上記トラックの円周方向に長軸方向を有することを特徴とする光学素子の作製用原盤。 A master for producing an optical element having an antireflection function, in which a large number of structures consisting of convex portions or concave portions are provided on the surface of the master with a fine pitch below the wavelength of visible light,
The structure is provided so as to form a plurality of arc-shaped tracks on the master surface.
The structure is a cone structure having a depth distribution and a bottom surface having a major axis and a minor axis, and has a major axis direction in the circumferential direction of the track. Master .
上記構造体は、深さ分布を有し、The structure has a depth distribution;
上記深さ分布の形成が、ランダムであることを特徴とする光学素子の作製用原盤。A master for manufacturing an optical element, wherein the formation of the depth distribution is random.
上記構造体は、第1の構造体と、上記第1の構造体とは異なる高さを有する第2の構造体とからなり、The structure includes a first structure and a second structure having a height different from that of the first structure.
上記第2の構造体が、上記原盤表面にランダムに設けられていることを特徴とする光学素子の作製用原盤。The master for producing an optical element, wherein the second structure is randomly provided on the surface of the master.
表面にレジスト層が形成された原盤を回転させるとともに、レーザ光を上記原盤の回転半径方向に相対移動させながら、上記レジスト層にレーザ光を間欠的に照射して、可視光の波長よりも短いピッチで潜像を形成する第1の工程と、
上記レジスト層を現像して、深さ分布を有するレジストパターンを上記原盤の表面に形成する第2の工程と、
上記レジストパターンをマスクとするエッチング処理を上記原盤に施すことで、上記原盤の表面に凹凸構造を形成する第3の工程と、
を有し、
上記潜像は、上記原盤表面において複数列の円弧状トラックをなすように設けられ、
上記潜像は、長軸と短軸を有し、上記トラックの円周方向に長軸方向を有することを特徴とする光学素子の作製用原盤の製造方法。 Structure composed of projections or recesses are many provided in the master surface with a wavelength less fine pitch of visible light, a manufacturing method of manufacturing a master for an optical element having an antireflection function,
While rotating the master on which the resist layer is formed on the surface, the laser light is intermittently irradiated to the resist layer while relatively moving the laser light in the rotational radius direction of the master , so that the wavelength is shorter than the wavelength of visible light. A first step of forming a latent image at a pitch;
And developing the resist layer, a second step of forming a resist pattern having a depth distribution on the surface of the master,
The etching process of the mask of the resist pattern by subjecting the above master, a third step of forming an uneven structure on the surface of the master,
I have a,
The latent image is provided so as to form a plurality of arc-shaped tracks on the master surface.
The latent image has a major axis and a minor axis, the manufacturing method of manufacturing a master for the optical element characterized by having a major axis in the circumferential direction of the track.
表面にレジスト層が形成された原盤を回転させるとともに、レーザ光を上記原盤の回転半径方向に相対移動させながら、上記レジスト層にレーザ光を間欠的に照射して、可視光波長よりも短いピッチで潜像を形成する第1の工程と、
上記レジスト層を現像して、深さ分布を有するレジストパターンを上記原盤の表面に形成する第2の工程と、
上記レジストパターンをマスクとするエッチング処理を上記原盤に施すことで、上記原盤の表面に凹凸構造を形成する第3の工程と、
上記原盤、または上記原盤から複製された成形金型を用いて、上記光学素子を成形する第4の工程と、
を有し、
上記潜像は、上記原盤表面において複数列の円弧状トラックをなすように設けられ、
上記潜像は、長軸と短軸を有し、上記トラックの円周方向に長軸方向を有することを特徴とする光学素子の製造方法。 A method for producing an optical element having an antireflection function, wherein a large number of structures consisting of convex portions or concave portions are provided on the substrate surface with a fine pitch equal to or less than the wavelength of visible light,
While rotating the master on which the resist layer is formed on the surface, the resist layer is intermittently irradiated with the laser light while relatively moving the laser light in the rotational radius direction of the master so that the pitch is shorter than the visible light wavelength. A first step of forming a latent image with
And developing the resist layer, a second step to form a resist pattern having depth distribution on the surface of the master,
The etching process of the mask of the resist pattern by subjecting the above master, a third step of forming an uneven structure on the surface of the master,
A fourth step of molding the optical element using the master or a molding die replicated from the master ;
I have a,
The latent image is provided so as to form a plurality of arc-shaped tracks on the master surface.
The method of manufacturing an optical element, wherein the latent image has a major axis and a minor axis, and has a major axis direction in a circumferential direction of the track .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009040027A JP5257131B2 (en) | 2009-02-23 | 2009-02-23 | Manufacturing method of optical element, master for manufacturing optical element, and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009040027A JP5257131B2 (en) | 2009-02-23 | 2009-02-23 | Manufacturing method of optical element, master for manufacturing optical element, and manufacturing method thereof |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007009628A Division JP4539657B2 (en) | 2007-01-18 | 2007-01-18 | Anti-reflection optical element |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009199086A JP2009199086A (en) | 2009-09-03 |
JP2009199086A5 true JP2009199086A5 (en) | 2010-03-04 |
JP5257131B2 JP5257131B2 (en) | 2013-08-07 |
Family
ID=41142555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009040027A Expired - Fee Related JP5257131B2 (en) | 2009-02-23 | 2009-02-23 | Manufacturing method of optical element, master for manufacturing optical element, and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5257131B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011065429A1 (en) * | 2009-11-27 | 2011-06-03 | シャープ株式会社 | Die for moth-eye, and method for producing die for moth-eye and moth-eye structure |
JP2012020389A (en) * | 2010-07-16 | 2012-02-02 | Oji Paper Co Ltd | Method for manufacturing single-particle film-coated roller, method for manufacturing irregularity-forming roller, method for manufacturing irregularity-forming film, and single-particle film-coating device |
KR101351596B1 (en) | 2013-03-12 | 2014-01-15 | 주식회사 탑나노임프린팅 | Anti-reflection material |
JP5848320B2 (en) | 2013-12-20 | 2016-01-27 | デクセリアルズ株式会社 | Cylindrical substrate, master, and method for manufacturing master |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003131390A (en) * | 2001-03-22 | 2003-05-09 | Seiko Epson Corp | Method of manufacturing fine structure, method of manufacturing electronic device and apparatus for manufacturing the same |
JP2003187459A (en) * | 2001-12-19 | 2003-07-04 | Sony Corp | Disc recording medium |
JP4197100B2 (en) * | 2002-02-20 | 2008-12-17 | 大日本印刷株式会社 | Anti-reflective article |
JP4393042B2 (en) * | 2002-08-05 | 2010-01-06 | 大日本印刷株式会社 | Antiglare antireflection member and optical member |
JP2006251318A (en) * | 2005-03-10 | 2006-09-21 | Matsushita Electric Ind Co Ltd | Manufacturing method of member having antireflective structure |
JP4539657B2 (en) * | 2007-01-18 | 2010-09-08 | ソニー株式会社 | Anti-reflection optical element |
-
2009
- 2009-02-23 JP JP2009040027A patent/JP5257131B2/en not_active Expired - Fee Related
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