JP2009199086A5

JP2009199086A5 -

Info

Publication number: JP2009199086A5
Application number: JP2009040027A
Authority: JP
Filing date: 2009-02-23
Publication date: 2010-03-04
Anticipated expiration: 2027-01-18

Claims

An optical element having an antireflection function, in which a large number of structures composed of convex portions or concave portions are provided on the surface of the substrate at a fine pitch equal to or less than the wavelength of visible light
The structure is provided so as to form a plurality of arc-shaped tracks on the surface of the base,
The above structure is configured to have a depth distribution is a pyramidal structure having a bottom surface having a major axis and a minor axis, the optical element characterized by having a major axis in the circumferential direction of the track.

2. The optical element according to claim 1, wherein the structure has an elliptical cone shape or an elliptical truncated cone shape having a gentle slope at the top and a gradually steep slope toward the bottom.

The above structure is the optical element according to claim 1, characterized in that it constitutes a quasi-hexagonal lattice pattern between adjacent tracks.

The arrangement pitch P1 of the structures in the same track, the optical element according to claim 1, wherein a larger than the arrangement pitch P2 of the structures between two adjacent tracks.

An optical element having an antireflection function, in which a large number of structures having convex portions or concave portions are provided on the surface of the substrate at a fine pitch equal to or less than the wavelength of visible light,
The structure has a depth distribution;
An optical element characterized in that the formation of the depth distribution is random.

An optical element having an antireflection function, in which a large number of structures having convex portions or concave portions are provided on the surface of the substrate at a fine pitch equal to or less than the wavelength of visible light,
The structure includes a first structure and a second structure having a height different from that of the first structure.
The optical element, wherein the second structure is randomly provided on the surface of the substrate.

A master for producing an optical element having an antireflection function, in which a large number of structures consisting of convex portions or concave portions are provided on the surface of the master at a fine pitch equal to or less than the wavelength of visible light,
The structure has a depth distribution;
The depth distribution of each structure is formed on the surface of the master by selectively changing at least two or more values, continuously or piecewise continuously. Master for producing optical elements.

A master for producing an optical element having an antireflection function, in which a large number of structures consisting of convex portions or concave portions are provided on the surface of the master with a fine pitch below the wavelength of visible light,
The structure is provided so as to form a plurality of arc-shaped tracks on the master surface.
The structure is a cone structure having a depth distribution and a bottom surface having a major axis and a minor axis, and has a major axis direction in the circumferential direction of the track. Master .

A master for producing an optical element having an antireflection function, in which a large number of structures consisting of convex portions or concave portions are provided on the surface of the master at a fine pitch equal to or less than the wavelength of visible light,
The structure has a depth distribution;
A master for manufacturing an optical element, wherein the formation of the depth distribution is random.

A master for producing an optical element having an antireflection function, in which a large number of structures consisting of convex portions or concave portions are provided on the surface of the master at a fine pitch equal to or less than the wavelength of visible light,
The structure includes a first structure and a second structure having a height different from that of the first structure.
The master for producing an optical element, wherein the second structure is randomly provided on the surface of the master.

Structure composed of projections or recesses are many provided in the master surface with a wavelength less fine pitch of visible light, a manufacturing method of manufacturing a master for an optical element having an antireflection function,
While rotating the master on which the resist layer is formed on the surface, the laser light is intermittently irradiated to the resist layer while relatively moving the laser light in the rotational radius direction of the master , so that the wavelength is shorter than the wavelength of visible light. A first step of forming a latent image at a pitch;
And developing the resist layer, a second step of forming a resist pattern having a depth distribution on the surface of the master,
The etching process of the mask of the resist pattern by subjecting the above master, a third step of forming an uneven structure on the surface of the master,
I have a,
The latent image is provided so as to form a plurality of arc-shaped tracks on the master surface.
The latent image has a major axis and a minor axis, the manufacturing method of manufacturing a master for the optical element characterized by having a major axis in the circumferential direction of the track.

In the first step, the manufacturing method of manufacturing a master for the optical element according to claim 11, wherein the forming the latent image so as to constitute a quasi-hexagonal lattice pattern between adjacent tracks.

12. The optical element according to claim 11, wherein, in the third step, the etching process using the resist pattern as a mask and the ashing process for the resist pattern are repeated, and the etching process time is gradually increased . Manufacturing method of master for production.

A method for producing an optical element having an antireflection function, wherein a large number of structures consisting of convex portions or concave portions are provided on the substrate surface with a fine pitch equal to or less than the wavelength of visible light,
While rotating the master on which the resist layer is formed on the surface, the resist layer is intermittently irradiated with the laser light while relatively moving the laser light in the rotational radius direction of the master so that the pitch is shorter than the visible light wavelength. A first step of forming a latent image with
And developing the resist layer, a second step to form a resist pattern having depth distribution on the surface of the master,
The etching process of the mask of the resist pattern by subjecting the above master, a third step of forming an uneven structure on the surface of the master,
A fourth step of molding the optical element using the master or a molding die replicated from the master ;
I have a,
The latent image is provided so as to form a plurality of arc-shaped tracks on the master surface.
The method of manufacturing an optical element, wherein the latent image has a major axis and a minor axis, and has a major axis direction in a circumferential direction of the track .